Electrode cover for a plasma processing device

Nakatani June 14, 2

Patent Grant D954986

U.S. patent number D954,986 [Application Number D/731,604] was granted by the patent office on 2022-06-14 for electrode cover for a plasma processing device. This patent grant is currently assigned to Hitachi High-Tech Corporation. The grantee listed for this patent is Hitachi High-Tech Corporation. Invention is credited to Shintarou Nakatani.


United States Patent D954,986
Nakatani June 14, 2022

Electrode cover for a plasma processing device

Claims

CLAIM The ornamental design for an electrode cover for a plasma processing device, as shown and described.
Inventors: Nakatani; Shintarou (Tokyo, JP)
Applicant:
Name City State Country Type

Hitachi High-Tech Corporation

Tokyo

N/A

JP
Assignee: Hitachi High-Tech Corporation (Tokyo, JP)
Appl. No.: D/731,604
Filed: April 16, 2020

Foreign Application Priority Data

Oct 18, 2019 [JP] 2019-023330
Current U.S. Class: D24/224; D24/187
Current International Class: 2402
Field of Search: ;D24/107,110.6,113,129,144,193,197,206,216,224,225 ;D23/200,213-215,222,223,229,269,283 ;D15/17,126,138,140,199 ;D13/182 ;D12/212 ;D8/66,358,375 ;D9/454

References Cited [Referenced By]

U.S. Patent Documents
4579354 April 1986 Vassallo
D638550 May 2011 Bedingham
D667561 September 2012 Bedingham
D770992 November 2016 Tauchi
D803917 November 2017 Harada
D804556 December 2017 Harada
D810705 February 2018 Krishnan
D827592 September 2018 Ichino
D830435 October 2018 Wakisaka
D840364 February 2019 Ichino
D868993 December 2019 Isozaki
D868995 December 2019 Tanaka
D870314 December 2019 Isozaki
D871608 December 2019 Okuda
D871609 December 2019 Isozaki
D891636 July 2020 Isozaki
D917026 April 2021 Pacheco
D933725 October 2021 Koppa
Foreign Patent Documents
D1598998 May 2018 JP

Other References

4'' Storz Pressure Gasket. Online, published date unknown. Retrieved on Feb. 20, 2022 from URL: https://www.firehosedirect.com/4-storz-pressure-gasket. cited by examiner.

Primary Examiner: Agilee; Omeed
Attorney, Agent or Firm: Crowell & Moring LLP

Description



FIG. 1 is a front, bottom and right side perspective view of an electrode cover for a plasma processing device according to the design;

FIG. 2 is a rear, bottom and right side perspective view thereof;

FIG. 3 is a front view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a rear view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 3;

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 9;

FIG. 11 is an enlarged front, bottom and right side perspective view of a cross-sectional view taken along line 9-9 of FIG. 3; and,

FIG. 12 is an enlarged rear, bottom and right side perspective view of a cross-sectional view taken along line 9-9 of FIG. 3.

The broken lines show the boundary of enlarged portions and form no part of the claimed design.

* * * * *

References


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