Adiabatic plate for substrate processing apparatus
Saiki , et al. July 13, 2
U.S. patent number D924,823 [Application Number D/672,222] was granted by the patent office on 2021-07-13 for adiabatic plate for substrate processing apparatus. This patent grant is currently assigned to KOKUSAI ELECTRIC CORPORATION. The grantee listed for this patent is KOKUSAI ELECTRIC CORPORATION. Invention is credited to Koji Saiki, Makoto Tsuri.
| United States Patent | D924,823 |
| Saiki , et al. | July 13, 2021 |
Adiabatic plate for substrate processing apparatus
Claims
CLAIM We claim the ornamental design for an adiabatic plate for substrate processing apparatus, as shown and described.
| Inventors: | Saiki; Koji (Toyama, JP), Tsuri; Makoto (Toyama, JP) | ||||||||||
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| Applicant: |
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| Assignee: | KOKUSAI ELECTRIC CORPORATION
(Tokyo, JP) |
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| Appl. No.: | D/672,222 | ||||||||||
| Filed: | December 4, 2018 |
Foreign Application Priority Data
| Jul 19, 2018 [JP] | 2018-015809 | |||
| Current U.S. Class: | D13/182 |
| Current International Class: | 1303 |
| Field of Search: | ;D13/102,182,199 ;D8/19,20,366 ;D5/99 |
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Attorney, Agent or Firm: Fitch, Even, Tabin & Flannery LLP
Description
FIG. 1 is a front, bottom and right side perspective view of an adiabatic plate for substrate processing apparatus showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a top plan view thereof;
FIG. 5 is a bottom plan view thereof;
FIG. 6 is a left side elevational view thereof;
FIG. 7 is a right side elevational view thereof; and,
FIG. 8 is a cross-sectional view take along line 8-8 in FIG. 2.
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