U.S. patent number D888,903 [Application Number D/673,685] was granted by the patent office on 2020-06-30 for deposition ring for physical vapor deposition chamber.
This patent grant is currently assigned to APPLIED MATERIALS, INC.. The grantee listed for this patent is APPLIED MATERIALS, INC.. Invention is credited to David Gunther, Kirankumar Neelasandra Savandaiah, Cheng-Hsiung Tsai.
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United States Patent |
D888,903 |
Gunther , et al. |
June 30, 2020 |
Deposition ring for physical vapor deposition chamber
Claims
CLAIM The ornamental design for a deposition ring for a physical
vapor deposition chamber, as shown and described.
Inventors: |
Gunther; David (San Jose,
CA), Tsai; Cheng-Hsiung (Cupertino, CA), Savandaiah;
Kirankumar Neelasandra (Bangalore, IN) |
Applicant: |
Name |
City |
State |
Country |
Type |
APPLIED MATERIALS, INC. |
Santa Clara |
CA |
US |
|
|
Assignee: |
APPLIED MATERIALS, INC. (Santa
Clara, CA)
|
Appl.
No.: |
D/673,685 |
Filed: |
December 17, 2018 |
Current U.S.
Class: |
D23/269;
D23/259 |
Current International
Class: |
2301 |
Field of
Search: |
;D23/269,262,249,259
;D15/138-139,143
;277/351-360,504,563,572,316,364-365,394,397,406-407,418,449,451-454,458-460,491,517,529,602,610,612,641-642,644,648
;285/339,343 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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206573738 |
|
Oct 2017 |
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CN |
|
207176067 |
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Apr 2018 |
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CN |
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223429 |
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May 1994 |
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TW |
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223430 |
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May 1994 |
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TW |
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M431893 |
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Jun 2012 |
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TW |
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201413868 |
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Apr 2014 |
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TW |
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D180764 |
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Jan 2017 |
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TW |
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D181803 |
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Mar 2017 |
|
TW |
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I600108 |
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Sep 2017 |
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TW |
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D188898 |
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Mar 2018 |
|
TW |
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D191626 |
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Jul 2018 |
|
TW |
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Other References
Search Report for Taiwan Design Application No. 108303547, dated
Dec. 10, 2019. cited by applicant .
International Search Report and Written Opinion for
PCT/US2019/065900 dated Apr. 10, 2020. cited by applicant.
|
Primary Examiner: Wierenga; Amy C
Attorney, Agent or Firm: Moser Taboada Taboada; Alan
Description
FIG. 1 is a perspective view of a deposition ring for a physical
vapor deposition chamber, according to the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a left side elevation view thereof.
FIG. 7 is a right side elevation view thereof.
FIG. 8 is a cross-sectional view taken along line 8-8 in FIG.
2.
FIG. 9 is a perspective view of a deposition ring for a physical
vapor deposition chamber, according to the novel design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a front elevation view thereof.
FIG. 13 is a back elevation view thereof.
FIG. 14 is a left side elevation view thereof.
FIG. 15 is a right side elevation view thereof; and,
FIG. 16 is a cross-sectional view taken along line 16-16 in FIG.
10.
The dashed lines in FIGS. 9-16 represent unclaimed environment
forming no part of the claimed design.
* * * * *