Electrode cover for a plasma processing apparatus

Description

FIG. 1 is a front, top and right side enlarged perspective view of an electrode cover for a plasma processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6; and,

FIG. 9 is an enlarged portion view taken along line 9-9 of FIG. 8.

Claims

CLAIM The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.

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Inventors:	Tauchi; Susumu (Tokyo, JP), Uemura; Takashi (Tokyo, JP), Sato; Kohei (Tokyo, JP)
Applicant:	Name City State Country Type Hitachi High-Technologies Corporation Minato-ku, Tokyo N/A JP
Assignee:	Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.:	D/544,070
Filed:	October 30, 2015

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Foreign Application Priority Data

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Jun 12, 2015 [JP]			2015-013037

Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/158-177,182,184 ;204/286.1,297.1 ;205/118,123 ;200/1R,5R,52R,315,310,6A,302.1,308,314,317,11R,16B

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References Cited [Referenced By]

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U.S. Patent Documents

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D404372	January 1999	Ishii
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D557226	December 2007	Uchino
D559993	January 2008	Nagakubo et al.
D559994	January 2008	Nagakubo et al.
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D709536	July 2014	Yoshimura et al.
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D709539	July 2014	Kuwabara et al.

Foreign Patent Documents

	D1184862		Sep 2003		JP
	D1208795		Jun 2004		JP
	D1210214		Jun 2004		JP
	D1267920		Apr 2006		JP
	D1438663		Apr 2012		JP
	D1444749		Jun 2012		JP
	D1444992		Jun 2012		JP

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Crowell & Moring LLP