Mask
Chen February 3, 2
U.S. patent number D586,050 [Application Number D/297,854] was granted by the patent office on 2009-02-03 for mask. Invention is credited to Chun-Nan Chen.
| United States Patent | D586,050 |
| Chen | February 3, 2009 |
Mask
Claims
CLAIM The ornamental design for a mask, as shown and described.
| Inventors: | Chen; Chun-Nan (Tainan, TW) |
|---|---|
| Appl. No.: | D/297,854 |
| Filed: | November 20, 2007 |
| Current U.S. Class: | D29/110 |
| Current International Class: | 2902 |
| Field of Search: | ;D29/102-112,122 ;D24/110.1-110.4,191 ;267/142-146,113,64.13 ;2/410-414,416,422-425,9,10,206,427,429,5,6.3,6.5,6.7 ;128/857-858 |
References Cited [Referenced By]
U.S. Patent Documents
| D407858 | April 1999 | Cyr et al. |
| D518605 | April 2006 | Chen |
| D522697 | June 2006 | Chen |
| D526094 | August 2006 | Chen |
| D529234 | September 2006 | Broersma |
| D555837 | November 2007 | Chen |
| D570551 | June 2008 | Broersma |
| 2006/0090234 | May 2006 | Cyr |
| 2007/0050896 | March 2007 | Stevens |
| 2008/0086795 | April 2008 | Cyr et al. |
Attorney, Agent or Firm: Kamrath; Alan Kamrath & Associates PA
Description
FIG. 1 is a perspective view of a mask showing my design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
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