Mask
Chen August 1, 2
U.S. patent number D526,094 [Application Number D/233,630] was granted by the patent office on 2006-08-01 for mask. Invention is credited to Chun-Nan Chen.
| United States Patent | D526,094 |
| Chen | August 1, 2006 |
Mask
Claims
CLAIM The ornamental design for a mask, as shown and described.
| Inventors: | Chen; Chun-Nan (Tainan, TW) |
|---|---|
| Appl. No.: | D/233,630 |
| Filed: | July 7, 2005 |
| Current U.S. Class: | D29/108 |
| Current International Class: | 2902 |
| Field of Search: | ;D29/102-110,122 ;2/5,6.1,6.3,6.5-6.7,411,414,423-425,431,8-9,427 ;128/201.24,206.21,206.28 ;D24/110.1,110.2,110.3 |
References Cited [Referenced By]
U.S. Patent Documents
| D317063 | May 1991 | Johnson |
| D373224 | August 1996 | Pernicka et al. |
| D384441 | September 1997 | Badger |
| D407858 | April 1999 | Cyr et al. |
| D412376 | July 1999 | Jurga et al. |
| 6176239 | January 2001 | Grove et al. |
| 6381749 | May 2002 | Cyr |
| D484281 | December 2003 | Gagnon et al. |
| D487534 | March 2004 | Broersma |
| D497039 | October 2004 | Dehaan et al. |
| 6886183 | May 2005 | DeHaan et al. |
| 6938272 | September 2005 | Brown |
Description
FIG. 1 is a perspective view of a mask showing my new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
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