Mask
Chen November 20, 2
U.S. patent number D555,837 [Application Number D/266,393] was granted by the patent office on 2007-11-20 for mask. Invention is credited to Chun-Nan Chen.
| United States Patent | D555,837 |
| Chen | November 20, 2007 |
Mask
Claims
CLAIM The ornamental design for a mask, as shown and described.
| Inventors: | Chen; Chun-Nan (Tainan, TW) |
|---|---|
| Appl. No.: | D/266,393 |
| Filed: | September 20, 2006 |
| Current U.S. Class: | D29/110 |
| Current International Class: | 2902 |
| Field of Search: | ;D29/102-111,122 ;2/9,6.3,6.7,15,10,452,410,422-425,427,431,436,206 ;128/207.11,857-858,201.17,201.19,201.23,201.24,206.21,206.12,206.28 ;D24/110.2,110.3 ;D16/300,301,309,310,312 |
References Cited [Referenced By]
U.S. Patent Documents
| D407858 | April 1999 | Cyr et al. |
| 6957447 | October 2005 | Broersma |
| D518605 | April 2006 | Chen |
| D522697 | June 2006 | Chen |
| D526094 | August 2006 | Chen |
| D529234 | September 2006 | Broersma |
| D529662 | October 2006 | Broersma |
| D536833 | February 2007 | Broersma |
| 2004/0049825 | March 2004 | DeHaan et al. |
| 2006/0090234 | May 2006 | Cyr |
Attorney, Agent or Firm: Kamrath; Alan Kamrath & Associates PA
Description
FIG. 1 is a perspective view of a mask showing my design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
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