Cover ring for a plasma processing apparatus

Description

FIG. 1 is a front, top and right side perspective view of cover ring for a plasma processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a right side elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a rear elevational view thereof; and,

FIG. 7 is a bottom plan elevational view thereof.

Claims

CLAIM We claim the ornamental design for cover ring for a plasma processing apparatus, as shown.

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Inventors:	Nakamura; Tsutomu (Hikari, JP), Tauchi; Susumu (Shunan, JP), Makino; Akitaka (Hikari, JP)
Assignee:	Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.:	D/236,933
Filed:	August 25, 2005

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Current U.S. Class:	D24/232
Current International Class:	2401
Field of Search:	;D24/169,186,216,231-232 ;D13/122,138,144,199 ;D15/144,144.1,199 ;118/715,728 ;156/345.51 ;204/192.2 ;239/548 ;257/776 ;414/609

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References Cited [Referenced By]

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U.S. Patent Documents

D404370	January 1999	Kimura
D404372	January 1999	Ishii
6068441	May 2000	Raaijmakers et al.
6423175	July 2002	Huang et al.
D490450	May 2004	Hayashi et al.
D491963	June 2004	Doba
D494552	August 2004	Tezuka et al.
D496008	September 2004	Takahashi et al.
2003/0146084	August 2003	Fu
2005/0150452	July 2005	Sen et al.
2005/0258280	November 2005	Goto et al.
2007/0007660	January 2007	Nguyen et al.
2007/0166819	July 2007	Ghosh et al.

Primary Examiner: Delehanty; Robert A.
Assistant Examiner: Cavanna; Mark
Attorney, Agent or Firm: Antonelli, Terry, Stout & Kraus, LLP.