Sputtering chamber coil

Description

FIG. 1 is a front elevational view;

FIG. 2 is a top view;

FIG. 3 is a right side elevational view;

FIG. 4 is a bottom view; and,

FIG. 5 is a rear elevational view of our sputtering chamber coil.

The left side elevation view (not shown) is the same as the right side elevational view (FIG. 3) because of coil symmetry.

Claims

The ornamental design for sputtering chamber coil, as shown and described.

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Inventors:	Gopalraja; Praburam (San Jose, CA), Xu; Zheng (Foster City, CA), Rosenstein; Michael (Sunnyvale, CA), Forster; John C. (San Francisco, CA), Ding; Peijun (San Jose, CA)
Assignee:	Applied Materials, Inc. (Santa Clara, CA)
Appl. No.:	D/090,631
Filed:	July 13, 1998

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Related U.S. Patent Documents

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	Application Number	Filing Date	Patent Number	Issue Date
	039695	Mar 16, 1998

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Current U.S. Class:	D15/144.2
Current International Class:	1509
Field of Search:	;D15/144.2,199 ;204/298,192.12,192.13,298.03,298.19,298.2,298.01,298.02,298.05,298.37,298.38 ;315/111.21,111.41,111.51,111.81

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References Cited [Referenced By]

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Other References

US. application No. 08/559,345 filed Nov. 15, 1995. . U.S. application No. 08/730,722 filed Oct. 8, 1996. . U.S. application No. 09/049,276 filed Mar. 27, 1998. . Search report in PCT/US98/10058 issued Nov. 4, 1998. . Applied Materials, Inc., Exhibit A, Dated prior to Jul. 13, 1998, the filing date of the present application.(Exhibit A is a drawing of a prior art coil design which is prior to the design of the present application). . S.M. Rossnagel et al., "Magnetron Sputter Deposition with High Levels of Metal Ionization," Appl. Phys. Lett., vol. 63, pp. 3285-3287, 1993. . J. Hopwood et al., "Mechanisms for Highly Ionized Magnetron Sputtering," J. Appl. Phys., vol. 78, pp. 758-765, 1995. . S.M. Rossnagel, "Directional and Ionized Sputter Deposition for Microelectronics Applications," Proc. of 3rd ISSP (Tokyo), pp. 253-260, 1995. . N. Jiwari et al., "Helicon wave plasma reactor employing single-loop antenna," J. of Vac. Sci. Technol., A 12(4), pp. 1322-1327, Jul./Aug. 1994. . U.S. application No. 08/856,335, filed May 14, 1997. . U.S. application No. 08/857,719, filed May 16, 1997. . U.S. application No. 08/857,944, filed May 16, 1997. . U.S. application No. 09/039,695, filed Mar. 16, 1998. . U.S. application No. 09/064,355, filed Apr. 22, 1998. . U.S. application No. 09/113,577, filed Jul. 10, 1998. . U.S. application No. 29/090,618, filed Jul. 13, 1998. . U.S. application No. 29/109,892. . U.S. application No. 29/109,870. . U.S. application No. 29/109,893..

Primary Examiner: Davis; Antoine Duval
Attorney, Agent or Firm: Konrad Raynes & Victor