U.S. patent number 6,711,052 [Application Number 10/185,488] was granted by the patent office on 2004-03-23 for memory having a precharge circuit and method therefor.
This patent grant is currently assigned to Motorola, Inc.. Invention is credited to Thomas W. Andre, Joseph J. Nahas, Chitra K. Subramanian.
United States Patent |
6,711,052 |
Subramanian , et
al. |
March 23, 2004 |
Memory having a precharge circuit and method therefor
Abstract
A magnetoresistive random access memory (MRAM) has separate read
and write paths. Switchable current mirrors, each having multiple
series-connected stages, receive a common reference current. A
timing circuit provides control signals to word and bit decoders
and to the switchable current mirrors to selectively complete
current paths through a predetermined write word line and a
predetermined write bit line. Bit lines are connected together at a
common end, and word lines are connected together at a common end.
By precharging a common rail having multiple write bit lines
connected together, the write noise immunity is improved and
current spikes are minimized. Groups of bit lines may be connected
via a metal option to adjust a transition time of a programming
current.
Inventors: |
Subramanian; Chitra K. (Austin,
TX), Andre; Thomas W. (Austin, TX), Nahas; Joseph J.
(Austin, TX) |
Assignee: |
Motorola, Inc. (Schaumberg,
IL)
|
Family
ID: |
29779641 |
Appl.
No.: |
10/185,488 |
Filed: |
June 28, 2002 |
Current U.S.
Class: |
365/158;
365/230.03 |
Current CPC
Class: |
G11C
11/1657 (20130101); G11C 11/16 (20130101); G11C
11/1655 (20130101); G11C 11/1675 (20130101); G11C
2207/2263 (20130101) |
Current International
Class: |
G11C
11/02 (20060101); G11C 11/16 (20060101); G11C
007/00 () |
Field of
Search: |
;365/158,230.03 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Tran; M.
Attorney, Agent or Firm: King; Robert L. Hill; Daniel D.
Parent Case Text
RELATED APPLICATIONS
This application is related to: U.S. patent application Ser. No.
09/978,859, now U.S. Pat. No. 6,545,906, entitled "A Method of
Writing to a Scalable Magnetoresistance Random Access Memory
Element," filed Oct. 16, 2001, and assigned to the assignee hereof;
U.S. patent application Ser. No. 10/186,141, entitled "Circuit and
Method of Writing a Toggle Memory," filed simultaneously herewith,
and assigned to the assignee hereof; U.S. patent application Ser.
No. 10/185,868, entitled "MRAM Architecture With Electrically
Isolated Read and Write Circuitry," filed simultaneously herewith,
and assigned to the assignee hereof; U.S. patent application Ser.
No. 10/185,075, entitled "Memory Having Write Current Ramp Rate
Control," filed simultaneously herewith, and assigned to the
assignee hereof; and U.S. patent application Ser. No. 10/185,888,
entitled "Memory Architecture With Write Circuitry and Method
Therefor," filed simultaneously herewith, and assigned to the
assignee hereof.
Claims
What is claimed is:
1. A memory comprising: a plurality of memory cells organized in
rows and columns, each of the plurality of memory cells located at
intersections of the rows and columns; a plurality of write lines,
each of the plurality of write lines having a first end and a
second end, wherein a current flowing from the first end to the
second end is used for placing a data value in a predetermined
memory cell of the plurality of memory cells, the second end
coupled to a reference voltage terminal for allowing the current to
flow to the reference voltage terminal; a plurality of write decode
switches, each of the plurality of write decode switches having a
first terminal connected to the second end of a corresponding one
of the plurality of write lines, and a second terminal, the second
terminal of each of the plurality of write decode switches being
commonly connected at a first common node; a write circuit having
an output connected to the first common node for controlling
writing the plurality of memory cells; and a precharge circuit
directly connected to the first common node for precharging the
first common node to a first predetermined voltage.
2. A memory comprising: a plurality of memory cells organized in
rows and columns, each of the plurality of memory cells located at
intersections of the rows and columns; a plurality of write lines,
each of the plurality of write lines having a first end and a
second end, wherein a current flowing from the first end to the
second end is used for placing a data value in a predetermined
memory cell of the plurality of memory cells; a plurality of write
decode switches, each of the plurality of write decode switches
having a first terminal connected to the second end of a
corresponding one of the plurality of write lines, and a second
terminal, the second terminal of each of the plurality of write
decode switches being commonly connected at a first common node; a
write circuit having an output connected to the first common node
for controlling writing the plurality of memory cells; and a
precharge circuit connected to the first common node for
precharging the first common node to a first predetermined voltage,
wherein the first end of each of the plurality of write lines are
coupled together at a second common node, the second common node
for receiving a second predetermined voltage, wherein the second
predetermined voltage is different than the first predetermined
voltage by a voltage approximating a threshold voltage of a
metal-oxide semiconductor transistor.
3. The memory of claim 2, wherein the precharge circuit recharges
the second terminal of each of the plurality of write decode
switches after a write cycle of the memory.
4. The memory of claim 2, wherein the memory is characterized as
being a magnetoresistive random access memory.
5. The memory of claim 4, wherein the data value is placed in the
predetermined memory cell by toggling the predetermined memory cell
between two logic states.
6. The memory of claim 5, further comprising a write control
circuit, coupled to the write circuit, for initiating a read
operation prior to a write cycle, the write control circuit for
terminating at least a portion of the write cycle if a currently
stored data value is identical to a new data value desired to be
written to the predetermined memory cell.
7. The memory of claim 2, wherein the plurality of write lines are
characterized as being a plurality of write bit lines, a write bit
line of the plurality of write bit lines corresponding to a column
of the plurality of memory cells.
8. The memory of claim 2, wherein the plurality of write lines are
characterized as being a plurality of write word lines, a write
word line of the plurality of write word lines corresponding to a
row of the plurality of memory cells.
9. The memory of claim 2, wherein first ends of the plurality of
write lines are all connected to a common node for receiving a
power supply voltage.
10. A memory comprising: a plurality of memory cells organized in
rows and columns, each of the plurality of memory cells located at
intersections of the rows and columns; a plurality of write bit
lines, each of the plurality of write bit lines having a first end
and a second end, wherein a first current flowing from the first
end to the second end of a selected one of the plurality of write
bit lines is used for placing a data value in a predetermined
memory cell of the plurality of memory cells; a plurality of write
word lines, each of the plurality of write word lines having a
first end and a second end, wherein a second current flowing from
the first end to the second end of a selected one of the plurality
of write word lines is used for placing the data value in the
predetermined memory cell of the plurality of memory cells; a
plurality of write bit decode switches, each of the plurality of
write bit decode switches having a first terminal connected to the
second end of a corresponding one of the plurality of write bit
lines, and a second terminal, each second terminal of the plurality
of write bit decode switches being commonly connected to a first
common node; a first write circuit having an output connected to
the first common node for controlling writing a first portion of
the plurality of memory cells; and a plurality of write word decode
switches, each of the plurality of write word decode switches
having a first terminal connected to the second end of a
corresponding one of the plurality of write word lines, and a
second terminal, each second terminal of the plurality of write
word decode switches being commonly connected to a second common
node; a second write circuit having an output connected to the
second common node for controlling writing a second portion of the
plurality of memory cells; a first precharge circuit connected to
the first common node for precharging each second terminal of the
plurality of write bit decode switches to a first predetermined
voltage; and a second precharge circuit connected to the second
common node for precharging each second terminal of the plurality
of write word decode switches to a second predetermined
voltage.
11. The memory of claim 10, wherein the memory is characterized as
being a magnetoresistive random access memory and the data value is
placed in the predetermined memory cell by toggling the
predetermined memory cell between two logic states.
12. The memory of claim 11, further comprising a write control
circuit, coupled to the first write circuit, for initiating a read
operation prior to a write cycle, the write control circuit
terminating at least a portion of the write cycle if a currently
stored data value is identical to a new data value desired to be
written to the predetermined memory cell.
13. The memory of claim 10, wherein the first end of the plurality
of write bit lines are connected to a third common node with a
third predetermined voltage, the first predetermined voltage being
different from the third predetermined voltage by about a threshold
voltage of a metal-oxide semiconductor transistor.
14. The memory of claim 10, wherein the first end of the plurality
of write word lines are connected to a third common node with a
third predetermined voltage, the second predetermined voltage being
different from the third predetermined voltage by about a threshold
voltage of a metal-oxide semiconductor transistor.
15. The memory of claim 10, wherein the first precharge circuit
recharges the first common node after a write cycle of the
memory.
16. The memory of claim 10, wherein the second precharge circuit
recharges the second common node after a write cycle of the
memory.
17. In a memory having a plurality of magnetoresistive random
access memory cells organized in rows and columns, a plurality of
write lines is coupled together at a common node, a write circuit
coupled to the common node for causing a write current to flow
through a selected write line of the plurality of write lines, a
method for writing a data value in a predetermined memory cell of
the plurality of magnetoresistive random access memory cells
comprising the steps of: precharging the common node to a
predetermined voltage; initiating a read operation of the
predetermined memory cell to determine a presently stored data
value of the predetermined memory cell; comparing the presently
stored data value of the predetermined memory cell to a new data
value to be written to the predetermined memory cell and
determining that the new data value is different than the presently
stored data value; and initiating a write operation of the
predetermined memory cell by causing the write current to flow in
the selected write line of the plurality of write lines for
toggling the presently stored data value to the new data value.
Description
FIELD OF THE INVENTION
This invention relates to Magnetoresistive Random Access Memories
(MRAMs), and more particularly to architectures for MRAMs.
BACKGROUND OF THE INVENTION
Non-volatile memory devices, such as FLASH memories, are extremely
important components in electronic systems. FLASH is a major
non-volatile memory device in use today. Disadvantages of FLASH
memory include high voltage requirements and slow program and erase
times. Also, FLASH memory has a poor write endurance of 10.sup.4
-10.sup.6 cycles before memory failure. In addition, to maintain
reasonable data retention, the scaling of the gate oxide is
restricted by the tunneling barrier seen by the electrons. Hence,
FLASH memory is limited in the dimensions to which it can be
scaled.
To overcome these shortcomings, magnetic memory devices are being
evaluated. One such device is magnetoresistive RAM (hereinafter
referred to as "MRAM"). To be commercially practical, however, MRAM
must have comparable memory density to current memory technologies,
be scalable for future generations, operate at low voltages, have
low power consumption, and have competitive read/write speeds.
For an MRAM device, the stability of the nonvolatile memory state,
the repeatability of the read/write cycles, and the memory
element-to-element switching field uniformity are three of the most
important aspects of its design characteristics. A memory state in
MRAM is not maintained by power, but rather by the direction of the
magnetic moment vector. Storing data is accomplished by applying
magnetic fields and causing a magnetic material in a MRAM device to
be magnetized into either of two possible memory states. Recalling
data is accomplished by sensing the resistive differences in the
MRAM device between the two states. The magnetic fields for writing
are created by passing currents through strip lines external to the
magnetic structure or through the magnetic structures
themselves.
As the lateral dimension of an MRAM device decreases, three
problems occur. First, the switching field increases for a given
shape and film thickness, requiring a larger magnetic field to
switch. Second, the total switching volume is reduced so that the
energy barrier for reversal decreases. The energy barrier refers to
the amount of energy needed to switch the magnetic moment vector
from one state to the other. The energy barrier determines the data
retention and error rate of the MRAM device and unintended
reversals can occur due to thermofluctuations (superparamagnetism)
if the barrier is too small. A major problem with having a small
energy barrier is that it becomes extremely difficult to
selectively switch one MRAM device in an array. Selectablility
allows switching without inadvertently switching other MRAM
devices. It is important to control the current flowing during a
write operation in the array to avoid undesired current surges or
spikes during transistor switching.
Finally, because the switching field is produced by shape, the
switching field becomes more sensitive to shape variations as the
MRAM device decreases in size. With photolithography scaling
becoming more difficult at smaller dimensions, MRAM devices will
have difficulty maintaining tight switching distributions. In any
memory type, including MRAMs, there is a continuing desire to
reduce the memory size and increase performance. One important
aspect of performance is the speed with which the memory is read
and programmed (written). Speed limitations include such things as
the performance of the bit cell and the capacitance of the lines
running through the array. A variety of techniques have been
developed to improve these characteristics. For example, memory
arrays have commonly been divided into subarrays so that no single
line is excessively capacitive. This can also reduce power
consumption. It is important in memories to efficiently switch the
write circuitry to allow the write cycle speed to approximate the
read cycle speed. The inability of a FLASH to accomplish this
objective is a major disadvantage of FLASH.
The promise of MRAMs is, however, that of a universal memory that
can be high speed and non-volatile. Thus, the need for improvements
in speed and memory area efficiency continue. Thus, there is need
for further improvements in architecture for MRAMs.
BRIEF DESCRIPTION OF THE DRAWINGS
The foregoing and further and more specific objects and advantages
of the instant invention will become readily apparent to those
skilled in the art from the following detailed description of a
preferred embodiment thereof taken in conjunction with the
following drawings:
FIG. 1 is a simplified sectional view of a magnetoresistive random
access memory device;
FIG. 2 is a simplified plan view of a magnetoresistive random
access memory device with word and bit lines;
FIG. 3 is a graph illustrating a simulation of the magnetic field
amplitude combinations that produce the direct or toggle write mode
in the magnetoresistive random access memory device;
FIG. 4 is a graph illustrating the timing diagram of the word
current and the bit current when both are turned on;
FIG. 5 is a diagram illustrating the rotation of the magnetic
moment vectors for a magnetoresistive random access memory device
for the toggle write mode when writing a `1` to a `0`;
FIG. 6 is a diagram illustrating the rotation of the magnetic
moment vectors for a magnetoresistive random access memory device
for the toggle write mode when writing a `0` to a `1`;
FIG. 7 is a graph illustrating the rotation of the magnetic moment
vectors for a magnetoresistive random access memory device for the
direct write mode when writing a `1` to a `0`;
FIG. 8 is a graph illustrating the rotation of the magnetic moment
vectors for a magnetoresistive random access memory device for the
direct write mode when writing a `0` to a state that is already a
`0`;
FIG. 9 is a graph illustrating the timing diagram of the word
current and the bit current when only the bit current is turned
on;
FIG. 10 is a graph illustrating the rotation of the magnetic moment
vectors for a magnetoresistive random access memory device when
only the bit current is turned on;
FIG. 11 is a block diagram of a toggle memory;
FIG. 12 is a more detailed diagram of a portion of the memory of
FIG. 11;
FIG. 13 is a timing diagram useful in understanding the operation
of the memory of FIG. 11;
FIG. 14 is a circuit diagram of a portion of the memory of FIG. 11
showing an embodiment of the inventive architecture;
FIG. 15 is a first cross section of a memory cell used in the
implementation of the architecture of FIG. 14;
FIG. 16. is a second cross section of the memory cell of FIG. 15
and also shows another memory cell used in the implementation of
the architecture of FIG. 14;
FIG. 17 is a circuit diagram showing a variation on the circuit
diagram of FIG. 14;
FIG. 18 is a partial schematic diagram of another embodiment of an
inventive MRAM architecture;
FIG. 19 is a graphical diagram of current pulses required to toggle
an MRAM cell;
FIG. 20 is a schematic diagram of a delay circuit for use in toggle
programming an MRAM cell.
FIG. 21 is a timing diagram of signals associated with the MRAM
architecture of FIG. 18 to optimize speed and power conservation
during a write operation; and
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
A memory architecture uses separate word lines for the read and
write operations as well as separate bit lines for the read and
write operations and is grouped into groups of bits with common
local read bit lines. The groups are further folded so that two
groups that are selectively coupled to the same global bit line
share the same word lines. These characteristics provide the
benefits of smaller write driver area, smaller average bit size for
the memory core, allowing overlap between read and write
operations, reduced global bit line capacitance, and higher voltage
writing.
Turn now to FIG. 1, which illustrates a simplified sectional view
of an MRAM array 3 in accordance with the preferred embodiment of
the present invention. In this illustration, only a single
magnetoresistive memory device 10 is shown, but it will be
understood that MRAM array 3 consists of a number of MRAM devices
10 and we are showing only one such device for simplicity in
describing the writing method.
MRAM device 10 includes a write word line 20 and a write bit line
30. Write word line 20 and write bit line 30 include conductive
material such that a current can be passed therethrough. In this
illustration, write word line 20 is positioned on top of MRAM
device 10 and write bit line 30 is positioned on the bottom of MRAM
device 10 and is directed at a 90.degree. angle to word line 20
(See FIG. 2). As an alternative, write word line 20 may be
positioned on the bottom of MRAM device 10 and write bit line 30
may be positioned on top of MRAM device 10
MRAM device 10 includes tunnel junction comprising a first magnetic
region 15, a tunneling barrier 16, and a second magnetic region 17,
wherein tunneling barrier 16 is sandwiched therebetween first
magnetic region 15 and second magnetic region 17. In the preferred
embodiment, magnetic region 15 includes a tri-layer structure 18,
which has an anti-ferromagnetic coupling spacer layer 65 between
two ferromagnetic layers 45 and 55. Anti-ferromagnetic coupling
spacer layer 65 has a thickness 86 and ferromagnetic layers 45 and
55 have thicknesses 41 and 51, respectively. Further, magnetic
region 17 has a tri-layer structure 19, which has an
anti-ferromagnetic coupling spacer layer 66 between two
ferromagnetic layers 46 and 56. Anti-ferromagnetic coupling spacer
layer 66 has a thickness 87 and ferromagnetic layers 46 and 56 have
thicknesses 42 and 52, respectively.
Generally, anti-ferromagnetic coupling spacer layers 65 and 66
include at least one of the elements Ru, Os, Re, Cr, Rh, Cu, or
combinations thereof. Further, ferromagnetic layers 45, 55, 46, and
56 include at least one of elements Ni, Fe, Mn, Co, or combinations
thereof. Also, it will be understood that magnetic regions 15 and
17 can include synthetic anti-ferromagnetic (SAF) layer material
structures other than tri-layer structures and the use of tri-layer
structures in this embodiment is for illustrative purposes only.
For example, one such synthetic anti-ferromagnetic layer material
structure could include a five-layer stack of a ferromagnetic
layer/anti-ferromagnetic coupling spacer layer/ferromagnetic
layer/anti-ferromagnetic coupling spacer layer/ferromagnetic layer
structure.
Ferromagnetic layers 45 and 55 each have a magnetic moment vector
57 and 53, respectively, that are usually held anti-parallel by
coupling of the anti-ferromagnetic coupling spacer layer 65. Also,
magnetic region 15 has a resultant magnetic moment vector 40 and
magnetic region 17 has a resultant magnetic moment vector 50.
Resultant magnetic moment vectors 40 and 50 are oriented along an
anisotropy easy-axis in a direction that is at an angle, preferably
45.degree., from write word line 20 and write bit line 30 (See FIG.
2). Further, magnetic region 15 is a free ferromagnetic region,
meaning that resultant magnetic moment vector 40 is free to rotate
in the presence of an applied magnetic field. Magnetic region 17 is
a pinned ferromagnetic region, meaning that resultant magnetic
moment vector 50 is not free to rotate in the presence of a
moderate applied magnetic field and is used as the reference
layer.
While anti-ferromagnetic coupling layers are illustrated between
the two ferromagnetic layers in each tri-layer structure 18, it
will be understood that the ferromagnetic layers could be
anti-ferromagnetically coupled through other means, such as
magnetostatic fields or other features. For example, when the
aspect ratio of a cell is reduced to five or less, the
ferromagnetic layers are anti-parallel coupled from magnetostatic
flux closure.
In the preferred embodiment, MRAM device 10 has tri-layer
structures that have a length/width ratio in a range of 1 to 5 for
a non-circular plan. However, we illustrate a plan that is circular
(See FIG. 2). MRAM device 10 is circular in shape in the preferred
embodiment to minimize the contribution to the switching field from
shape anisotropy and also because it is easier to use
photolithographic processing to scale the device to smaller
dimensions laterally. However, it will be understood that MRAM
device 10 can have other shapes, such as square, elliptical,
rectangular, or diamond, but is illustrated as being circular for
simplicity.
Further, during fabrication of MRAM array 3, each succeeding layer
(i.e. 30, 55, 65, etc.) is deposited or otherwise formed in
sequence and each MRAM device 10 may be defined by selective
deposition, photolithography processing, etching, etc. in any of
the techniques known in the semiconductor industry. During
deposition of at least the ferromagnetic layers 45 and 55, a
magnetic field is provided to set a preferred easy magnetic axis
for this pair (induced anisotropy). The provided magnetic field
creates a preferred anisotropy axis for magnetic moment vectors 53
and 57. The preferred axis is chosen to be at a 45.degree. angle
between write word line 20 and write bit line 30, as will be
discussed presently.
Turn now to FIG. 2, which illustrates a simplified plan view of a
MRAM array 3 in accordance with the present invention. To simplify
the description of MRAM device 10, all directions will be
referenced to an x-and y-coordinate system 100 as shown and to a
clockwise rotation direction 94 and a counter-clockwise rotation
direction 96. To further simplify the description, it is again
assumed that N is equal to two so that MRAM device 10 includes one
tri-layer structure in region 15 with magnetic moment vectors 53
and 57, as well as resultant magnetic moment vector 40. Also, only
the magnetic moment vectors of region 15 are illustrated since they
will be switched.
To illustrate how the writing methods work, it is assumed that a
preferred anisotropy axis for magnetic moment vectors 53 and 57 is
directed at a 45.degree. angle relative to the negative x-and
negative y-directions and at a 45.degree. angle relative to the
positive x-and positive y-directions. As an example, FIG. 2 shows
that magnetic moment vector 53 is directed at a 45.degree. angle
relative to the negative x-and negative y-directions. Since
magnetic moment vector 57 is generally oriented anti-parallel to
magnetic moment vector 53, it is directed at a 45.degree. angle
relative to the positive x-and positive y-directions. This initial
orientation will be used to show examples of the writing methods,
as will be discussed presently.
In the preferred embodiment, a write word current 60 is defined as
being positive if flowing in a positive x-direction and a write bit
current 70 is defined as being positive if flowing in a positive
y-direction. The purpose of write word line 20 and write bit line
30 is to create a magnetic field within MRAM device 10. A positive
write word current 60 will induce a circumferential write word
magnetic field, H.sub.w 80, and a positive write bit current 70
will induce a circumferential write bit magnetic field, H.sub.B 90.
Since, in this example, write word line 20 is above MRAM device 10,
in the plane of the element, H.sub.w 80 will be applied to MRAM
device 10 in the positive y-direction for a positive write word
current 60. Similarly, since write bit line 30 is below MRAM device
10, in the plane of the element, H.sub.B 90 will be applied to MRAM
device 10 in the positive x-direction for a positive write bit
current 70. It will be understood that the definitions for positive
and negative current flow are arbitrary and are defined here for
illustrative purposes. The effect of reversing the current flow is
to change the direction of the magnetic field induced within MRAM
device 10. The behavior of a current induced magnetic field is well
known to those skilled in the art and will not be elaborated upon
further here.
Turn now to FIG. 3, which illustrates the simulated switching
behavior of a SAF tri-layer structure. The simulation consists of
two single domain magnetic layers that have close to the same
moment (a nearly balanced SAF) with an intrinsic anisotropy, are
coupled anti-ferromagnetically, and whose magnetization dynamics
are described by the Landau-Lifshitz equation. The x-axis is the
write word line magnetic field amplitude in Oersteds, and the
y-axis is the write bit line magnetic field amplitude in Oersteds.
The magnetic fields are applied in a pulse sequence 101 as shown in
FIG. 4 wherein pulse sequence 101 includes write word current 60
and write bit current 70 as functions of time.
There are three regions of operation illustrated in FIG. 3. In a
region 92 there is no switching. For MRAM operation in a region 95,
the direct writing method is in effect. When using the direct
writing method, there is no need to determine the initial state of
the MRAM device because the state is only switched if the state
being written is different from the state that is stored. The
selection of the written state is determined by the direction of
current in both write word line 20 and write bit line 30. For
example, if a `1` is desired to be written, then the direction of
current in both lines will be positive. If a `1` is already stored
in the element and a `1` is being written, then the final state of
the MRAM device will continue to be a `1`. Further, if a `0` is
stored and a `1` is being written with positive currents, then the
final state of the MRAM device will be a `1`. Similar results are
obtained when writing a `0` by using negative currents in both the
write word and write bit lines. Hence, either state can be
programmed to the desired `1` or `0`with the appropriate polarity
of current pulses, regardless of its initial state. Throughout this
disclosure, operation in region 95 will be defined as "direct write
mode".
For MRAM operation in a region 97, the toggle writing method is in
effect. When using the toggle writing method, there is a need to
determine the initial state of the MRAM device before writing
because the state is switched every time the MRAM device is written
to, regardless of the direction of the currents as long as the same
polarity current pulses are chosen for both write word line 20 and
write bit line 30. For example, if a `1` is initially stored then
the state of the device will be switched to a `0` one positive
current pulse sequence is flowed through the write word and write
bit lines. Repeating the positive current pulse sequence on the
stored `0` state returns it to a `1`. Thus, to be able to write the
memory element into the desired state, the initial state of MRAM
device 10 must first be read and compared to the state to be
written. The reading and comparing may require additional logic
circuitry, including a buffer for storing information and a
comparator for comparing memory states. MRAM device 10 is then
written to only if the stored state and the state to be written are
different. One of the advantages of this method is that the power
consumed is lowered because only the differing bits are switched.
An additional advantage of using the toggle writing method is that
only uni-polar voltages are required and, consequently, smaller
N-channel transistors can be used to drive the MRAM device.
Throughout this disclosure, operation in region 97 will be defined
as "toggle write mode".
Both writing methods involve supplying currents in write word line
20 and write bit line 30 such that magnetic moment vectors 53 and
57 can be oriented in one of two preferred directions as discussed
previously. To fully elucidate the two switching modes, specific
examples describing the time evolution of magnetic moment vectors
53, 57, and 40 are now given.
Turn now to FIG. 5 which illustrates the toggle write mode for
writing a `1` to a `0` using pulse sequence 100. In this
illustration at time to, magnetic moment vectors 53 and 57 are
oriented in the preferred directions as shown in FIG. 2. This
orientation will be defined as a `1`.
At a time t.sub.1, a positive write word current 60 is turned on,
which induces H.sub.w 80 to be directed in the positive
y-direction. The effect of positive H.sub.w 80 is to cause the
nearly balanced anti-aligned MRAM tri-layer to "FLOP" and become
oriented approximately 90.degree. to the applied field direction.
The finite anti-ferromagnetic exchange interaction between
ferromagnetic layers 45 and 55 will allow magnetic moment vectors
53 and 57 to now deflect at a small angle toward the magnetic field
direction and resultant magnetic moment vector 40 will subtend the
angle between magnetic moment vectors 53 and 57 and will align with
H.sub.w 80. Hence, magnetic moment vector 53 is rotated in
clockwise direction 94. Since resultant magnetic moment vector 40
is the vector addition of magnetic moment vectors 53 and 57,
magnetic moment vector 57 is also rotated in clockwise direction
94.
At a time t.sub.2, positive write bit current 70 is turned on,
which induces positive H.sub.B 90. Consequently, resultant magnetic
moment vector 40 is being simultaneously directed in the positive
y-direction by H.sub.w 80 and the positive x-direction by H.sub.B
90, which has the effect of causing effective magnetic moment
vector 40 to further rotate in clockwise direction 94 until it is
generally oriented at a 45.degree. angle between the positive x-and
positive y-directions. Consequently, magnetic moment vectors 53 and
57 will also further rotate in clockwise direction 94.
At a time t.sub.3, write word current 60 is turned off so that now
only H.sub.B 90 is directing resultant magnetic moment vector 40,
which will now be oriented in the positive x-direction. Both
magnetic moment vectors 53 and 57 will now generally be directed at
angles passed their anisotropy hard-axis instability points.
At a time t.sub.4, write bit current 70 is turned off so a magnetic
field force is not acting upon resultant magnetic moment vector 40.
Consequently, magnetic moment vectors 53 and 57 will become
oriented in their nearest preferred directions to minimize the
anisotropy energy. In this case, the preferred direction for
magnetic moment vector 53 is at a 45.degree. angle relative to the
positive y-and positive x-directions. This preferred direction is
also 180.degree. from the initial direction of magnetic moment
vector 53 at time t.sub.0 and is defined as `0`. Hence, MRAM device
10 has been switched to a `0`. It will be understood that MRAM
device 10 could also be switched by rotating magnetic moment
vectors 53, 57, and 40 in counter clockwise direction 96 by using
negative currents in both write word line 20 and write bit line 30,
but is shown otherwise for illustrative purposes.
Turn now to FIG. 6 which illustrates the toggle write mode for
writing a `0` to a `1` using pulse sequence 100. Illustrated are
the magnetic moment vectors 53 and 57, as well as resultant
magnetic moment vector 40, at each of the times t.sub.0, t.sub.1,
t.sub.2, t.sub.3, and t.sub.4 as described previously showing the
ability to switch the state of MRAM device 10 from `0` to `1` with
the same current and magnetic field directions. Hence, the state of
MRAM device 10 is written to with toggle write mode, which
corresponds to region 97 in FIG. 3.
For the direct write mode, it is assumed that magnetic moment
vector 53 is larger in magnitude than magnetic moment vector 57, so
that magnetic moment vector 40 points in the same direction as
magnetic moment vector 53, but has a smaller magnitude in zero
field. This unbalanced moment allows the dipole energy, which tends
to align the total moment with the applied field, to break the
symmetry of the nearly balanced SAF. Hence, switching can occur
only in one direction for a given polarity of current.
Turn now to FIG. 7 which illustrates an example of writing a `1` to
a `0` using the direct write mode using pulse sequence 100. Here
again, the memory state is initially a `1` with magnetic moment
vector 53 directed 45.degree. with respect to the negative x-and
negative y-directions and magnetic moment vector 57 directed
45.degree. with respect to the positive x-and positive
y-directions. Following the pulse sequence as described above with
positive write word current 60 and positive write bit current 70,
the writing occurs in a similar manner as the toggle write mode as
described previously. Note that the moments again `FLOP` at a time
t.sub.1, but the resulting angle is canted from 90.degree. due to
the unbalanced moment and anisotropy. After time t.sub.4, MRAM
device 10 has been switched to the `0` state with resultant
magnetic moment 40 oriented at a 45.degree. angle in the positive
x-and positive y-directions as desired. Similar results are
obtained when writing a `0` to a `1` only now with negative write
word current 60 and negative write bit current 70.
Turn now to FIG. 8 which illustrates an example of writing using
the direct write mode when the new state is the same as the state
already stored. In this example, a `0` is already stored in MRAM
device 10 and current pulse sequence 100 is now repeated to store a
`0`. Magnetic moment vectors 53 and 57 attempt to "FLOP" at a time
t.sub.1, but because the unbalanced magnetic moment must work
against the applied magnetic field, the rotation is diminished.
Hence, there is an additional energy barrier to rotate out of the
reverse state. At time t.sub.2, the dominant moment 53 is nearly
aligned with the positive x-axis and less than 45.degree. from its
initial anisotropy direction. At a time t.sub.3, the magnetic field
is directed along the positive x-axis. Rather than rotating further
clockwise, the system now lowers its energy by changing the SAF
moment symmetry with respect to the applied field. The passive
moment 57 crosses the x-axis and the system stabilizes with the
dominant moment 53 returned to near its original direction.
Therefore, at a time t.sub.4 when the magnetic field is removed,
and the state stored in MRAM device 10 will remain a `0`. This
sequence illustrates the mechanism of the direct write mode shown
as region 95 in FIG. 3. Hence, in this convention, to write a `0`
requires positive current in both write word line 60 and write bit
line 70 and, conversely, to write a `1` negative current is
required in both write word line 60 and write bit line 70.
If larger fields are applied, eventually the energy decrease
associated with a flop and scissor exceeds the additional energy
barrier created by the dipole energy of the unbalanced moment which
is preventing a toggle event. At this point, a toggle event will
occur and the switching is described by region 97.
Region 95 in which the direct write mode applies can be expanded,
i.e. toggle mode region 97 can be moved to higher magnetic fields,
if the times t.sub.3 and t.sub.4 are equal or made as close to
equal as possible. In this case, the magnetic field direction
starts at 45.degree. relative to the bit anisotropy axis when write
word current 60 turns on and then moves to parallel with the bit
anisotropy axis when write bit current 70 turns on. This example is
similar to the typical magnetic field application sequence.
However, now write word current 60 and write bit current 70 turn
off substantially simultaneously, so that the magnetic field
direction does not rotate any further. Therefore, the applied field
must be large enough so that the resultant magnetic moment vector
40 has already moved past its hard-axis instability point with both
write word current 60 and write bit current 70 turned on. A toggle
writing mode event is now less likely to occur, since the magnetic
field direction is now rotated only 45.degree., instead of
90.degree. as before. An advantage of having substantially
coincident fall times, t.sub.3 and t.sub.4, is that now there are
no additional restrictions on the order of the field rise times
t.sub.1, and t.sub.2. Thus, the magnetic fields can be turned on in
any order or can also be substantially coincident.
The writing methods described previously are highly selective
because only the MRAM device that has both write word current 60
and write bit current 70 turned on between time t.sub.2 and time
t.sub.3 will switch states. This feature is illustrated in FIGS. 9
and 10. FIG. 9 illustrates pulse sequence 102 when write word
current 60 is not turned on and write bit current 70 is turned on.
FIG. 10 illustrates the corresponding behavior of the state of MRAM
device 10. At a time t.sub.0, magnetic moment vectors 53 and 57, as
well as resultant magnetic moment vector 40, are oriented as
described in FIG. 2. In pulse sequence 102, write bit current 70 is
turned on at a time t.sub.2. During this time, H.sub.B 90 will
cause resultant magnetic moment vector 40 to be directed in the
positive x-direction.
Since write word current 60 is never switched on, resultant
magnetic moment vectors 53 and 57 are never rotated through their
anisotropy hard-axis instability points. As a result, magnetic
moment vectors 53 and 57 will reorient themselves in the nearest
preferred direction when write bit current 70 is turned off at a
time t.sub.3, which in this case is the initial direction at time
t.sub.0. Hence, the state of MRAM device 10 is not switched. It
will be understood that the same result will occur if write word
current 60 is turned on at similar times described above and write
bit current 70 is not turned on. This feature ensures that only one
MRAM device in an array will be switched, while the other devices
will remain in their initial states. As a result, unintentional
switching is avoided and the bit error rate is minimized.
Shown in FIG. 11 is a memory 110 comprising a memory array 112, a
write word decoder 114, a write word line driver 116, a read word
decoder 118, a read word line driver 120, one or more sense
amplifiers 122, a read bit decoder 124, a write bit decoder 126, a
write bit driver 128, a comparator 130, and an output driver 132.
These elements are coupled together by multiple lines. For example
read bit decoder 124 receives a column address made up of multiple
address signals. Memory array 112 is an array of memory cells that
can be switched with a toggle operation. A section of memory cells
for the memory array 112 is memory array 200 shown in FIG. 14,
which is an MRAM cell array that is written in the method described
for memory array 3 of FIG. 1 in that writing occurs in four steps
of 45.degree. angles until 180.degree. is reached. In this
particular preferred cell array, there are separate word lines and
bit lines for a write operation and a read operation.
Read word decoder 118 receives a row address and is coupled to read
word line driver 120, which in turn is coupled to memory array 112.
For a read, read word decoder 118 selects a read word line in
memory array 112 based on the row address. The selected word line
is driven by read line driver 120. Read bit decoder 124, which
receives the column address and is coupled between sense amplifier
122 and memory array 112, selects a read bit line from read bit
decoder 124, based on the column address, from memory array 112 and
couples it to sense amplifier 122. Sense amplifier 122 detects the
logic state and couples it to output driver 132 and comparator 130.
Output driver 132, for a read, provides a data output signal DO.
For a write operation, comparator 130 compares the logic state of
the selected cell, which is provided by sense amplifier 122, to the
desired logic state to be written as provided by the data in.
Write word decoder 114 receives the row address and is coupled to
write word line driver 116, which in turn is coupled to memory
array 112. For a write, write word decoder 114 selects a write word
line, based on the row address, in memory array 112, and write word
line driver in turn drives that selected write word line. Write bit
decoder 126 receives the column address and is coupled to the write
bit driver 128, which is coupled to the memory array 112. Writer
bit decoder 126 selects a write bit line, based on the column
address, and write bit driver 128 in turn drives the selected write
bit line in order to toggle the state of the selected cell.
Since memory array 112 is a toggle memory, a write toggling
operation is completed only if the logic state of the cell needs to
be flipped in order to achieve the desired resulting logic state
for the selected cell. Thus, comparator 130 receives the output of
a read operation on the selected cell from sense amplifier 122 and
determines if the selected cell already has the desired logic
state. If the selected cell, as determined by the row and column
address, does have the desired logic state, then the write
operation is terminated. If the logic state of the selected cell is
different from the desired state then the comparator indicates to
write bit driver 128 that the write is to continue and the write
bit driver for the selected write bit line drives the selected
write bit line.
Shown in FIG. 12 is a portion of memory 110 of FIG. 11 comprising
the write word line driver 116 coupled to write word lines WL,
write bit driver 128 coupled to write bit lines BL, and cells 134,
136, 138, and 140 coupled at intersection of write bit lines BL and
write word lines WL. For a write to occur, current is provided to a
selected word line WL, while no current is flowing in the selected
write bit line, for sufficient time to cause the first angle change
in the memory cells along the selected write word line. While
current is still flowing in the selected write word line, current
is flowed through the selected write bit line to cause the second
angle change to the selected memory cell. Only at the intersection
of the current carrying write bit line and write word line does
this second angle change occur. While current is still flowing
through the write bit line, current flow is terminated through the
selected write word line to cause a third angle change in the
selected memory cell. Only at the intersection of the selected
write bit line and the selected write word line does this third
change occur. A fourth angle change of the selected memory cell
occurs when the current through the selected write bit line is
terminated.
The write operation of memory 110 is further explained by reference
to the timing diagram of FIG. 13. Both a read operation and a write
toggle operation are initiated by a change in the row or column
address as shown by enabling a read word line WLA as shown in FIG.
13. Although the write cannot be executed until it has been
determined that the logic state needs to flipped, nonetheless, the
write cycle can begin as noted by the write word line being enabled
prior to the sense amplifier providing its output and the
comparator determining if the logic state needs to be flipped.
Enabling (causing current to flow through) the write word line does
cause the first angle change in the selected cell as well as all of
the cells along the selected write word line, but this change is
reversed if the current is terminated without enabling the write
bit line.
Thus, the selected write word line can be enabled prior to the
comparator making its determination because the first angle change
is reversed simply by removing the current. This must be the case
because all of the cells on a selected write word line experience
the first angle change and all but one are not selected. Only the
selected cell, however, experiences the second angle change and
that occurs when the write bit line is enabled. This is shown as
occurring after the comparator has made its determination that a
logic state change is desired. The first angle change is shown as
being from 0.degree. to 45.degree. and the second change is from
45.degree. to 90.degree.. The third angle change is shown as
occurring when the write word line is disabled (current is
terminated). This is shown as being from 90.degree. to 135.degree..
The final angle change shown is the fourth angle change and occurs
when the write bit line is disabled. This angle change is shown as
being from 135.degree. to 180.degree..
This also shows that the final stages of the write can continue
after the next address change, which initiates another cycle. The
beginning of a cycle always begins with a read even if the cycle is
a write cycle. Address A is changed to address B and causes read
word line B to be selected. This does not interfere with the
writing of the previously selected cell. This depicts a read word
line change, but even if the address is a column only change so
that the selected read word line does not change, the continued
flow of current does not adversely affect the completion of the
write. Also note that it is not necessary that the write enable be
active at the time the cycle begins, because all cycles begin with
a read operation anyway. The write enable signal must be active
sufficiently early though for the write bit line to become
active.
The explanation has been with respect to a single cell being
selected, but this was for ease of understanding. In practice,
typically a number of cells will be selected and that is indicated
in FIG. 11 by the signal connections between the elements being
multiple signal lines. Thus, for example, if memory 110 were a x16
memory, comparator 130 would actually make 16 different
comparisons, one for each selected cell. Of the sixteen
comparisons, only those that indicated a non-match would cause a
write operation of those selected cells with the non-match. The
selected cells that resulted in a match would not be flipped.
Shown in FIG. 14 is a portion of memory array 200 and a plurality
of driver, decoder, and sensing blocks that combine to form a
memory core 201. The portion of memory array 200 comprises MRAM
devices 202, 204, 206, 208, 210, 212, 213, 214, 216, 218, 220, 222,
224, 226, 227, and 228. Each of these MRAM devices has three
current paths. A first current path and second current path of
these three paths, which are shown as orthogonal to each other,
represent the write paths. These two paths carry the signals, shown
in FIGS. 12 and 13, that switch the logic state of the cell. The
third current path, which is shown as a resistor at a 45 degree
angle, represents a read current path through a magnetoresistive
tunnel junction that is programmed to one of two possible resistive
states. The memory array 200 further comprises select transistors
230, 232, 234, 236, 238, 240, 242, 244, 260, 262, 264, 266, 268,
270, 272, and 274, that are in series with the third current path,
which is the read current path, of corresponding MRAM devices 202,
204, 206, 208, 210, 212, 213, 214, 216, 218, 220, 222, 224, 226,
227, and 228, respectively. This connection of the select
transistors is with one current electrode of these transistors
coupled to the third current path and the second current electrode
coupled to ground (VSS). Each combination of a select transistor
device and MRAM device comprises a memory cell.
The memory core 201 comprises write word lines WWL0, WWL1, WWL2,
and WWL3 that run through the first current paths of the MRAM
devices. WWL0, runs through MRAM devices 202, 210, 216, and 224.
WWL1, runs through MRAM devices 204, 212, 218, and 226. WWL2 runs
through MRAM devices 206, 213, 220, and 227. WWL3 runs through MRAM
devices 208, 214, 222, and 228. Memory array 200 further comprises
write bit lines WBL0, WBL1, WBL2, and WBL3 that run through the
second current paths of the MRAM devices. WBL0 runs through MRAM
devices 202, 204, 206, and 208. WBL1 runs through MRAM devices 210,
212, 213, and 214. WBL2 runs through MRAM devices 216, 218, 220,
and 222. WBL3 runs through MRAM devices 224, 226, 227, and 228. Yet
further memory array 200 comprises read word lines RWL0, RWL1,
RWL2, and RWL3 that are coupled to the gate of the select
transistors. RWL0 is coupled to select transistors 230, 238, 260,
and 268. RWL1 is coupled to select transistors 232, 240, 262, and
270. RWL2 is coupled to select transistors 234, 242, 264, and 272.
RWL3 is coupled to select transistors 236, 244, 266, and 274.
Memory array 200 also comprises read global bit lines RGBL0 and
RGBL1 group select lines GS0, GS1, GS2, and GS3.
Memory array 200 further comprises group select transistors 250,
252, 254, 256, 276, 278, 280, and 282 that are for coupling groups
of memory cells to read global bit lines. Also comprising memory
array 200 are local bit lines 251, 253, 255, 257, 277, 279, 281,
and 283, which are each coupled to the third current paths of the
MRAM devices for their groups. That is, there is one of these local
bit lines for each group.
Transistors 250 and 252 have first current electrodes coupled
together and to read global bit line RGBL0. Transistors 254 and 256
have first current electrodes coupled together and to read global
bit line RGBL0. Transistors 276 and 278 have first current
electrodes coupled together and to read global bit line RGBL1.
Transistors 280 and 282 have first current electrodes coupled
together and to read global bit line RGBL1. Transistors 250, 252,
254, 256, 276, 278, 280, and 282 each have second current
electrodes coupled to local bit lines 251, 253, 255, 257, 277, 279,
281, and 283. Local bit lines 251, 253, 255, 257, 277, 279, 281,
and 283 are coupled to the third current path of MRAM devices 202
and 204, 206 and 208, 210 and 212, 213 and 214, 216 and 218, 220
and 222, 224 and 226, and 227 and 228, respectively. Group select
line GS0, is coupled to group select transistor 250 and 276. Group
select line GS1 is coupled to group select transistor 252 and 278.
Group select line GS2 is coupled to group select transistor 254 and
280. Group select line GS3 is coupled to group select transistor
256 and 282.
Memory core 201, in addition to memory array 200, comprises write
column decoder/drivers 283, 284, 285, and 286; write row
decoder/drivers 287, 289, 291, and 293; read row decoder/drivers
288, 290, 292, and 294; and read column decoder/sense amplifiers
295 and 296. Write column decoder/drivers 283, 284, 285, and 286
are connected to write bit lines WBL0, WBL1, WBL2, and WBL3,
respectively. Write row decoder/drivers 287, 289, 291, and 293 are
coupled to write word lines WWL0, WWL1, WWL2, and WWL3,
respectively. Read row decoder/drivers 288, 290, 292, and 294 are
coupled to read word lines RWL0, RWL1, RWL2, and RWL3,
respectively. Read column decoder/sense amplifiers 296 and 295 are
coupled to read global bit lines RGBL 0 and RGBL 1,
respectively.
In operation, an MRAM device, such as MRAM device 202, is written
by applying current through a selected write word line, such as
WWL0, and a selected write bit line, such as WBL0 in this example,
to toggle the state of the memory. Also, the state can be written
directly through WWL0, and WBL0 as well if the memory cell is a
direct write cell instead a toggle cell. All of the MRAM devices
are selected by flowing current through the write word lines and
write bit lines for the particular MRAM device. The state of an
MRAM device, such as MRAM device 202, is read by applying a
sufficient voltage to the gate of its corresponding select
transistor, such as transistor 230 via read word line RWL0 applying
a sufficient voltage to the gate of the corresponding group
transistor, such as transistor 250 via group select line GS0, and
sensing the state of the selected MRAM device, MRAM device 202 in
this example via read global bit RGBL0 by column decoder/sense
amplifier 296. A group is made up MRAM devices that have their
third current paths commonly connected. Thus the capacitance added
to the read global bit lines by the cells themselves is limited to
the cells that are in the group. Also transistors, 250 and 252 have
commonly connected current electrodes, the gates are coupled to
different select lines. This has the effect of folding groups to
have a common global bit line and having the selection between
groups achieved by separate global select lines. Thus there are
additional lines in the row direction and fewer in the column
direction. The benefit is that the increase in lines in the row
direction is one for each group of cells. If the group is 32, which
is considered a preferred amount, then there is an additional
global select lines for a distance of 32 cells. For the unfolded
case, there is one read global bit line for each column instead of
one for every two columns for the folded case. Thus, the effect of
the unfolded case compared to the folded case is one extra read
global bit line for every two columns, which is two cell widths.
Thus, the tradeoff is clearly in the favor of the folded bit line.
This space advantage can be used to either increase the size of
lines to reduce their resistance or decrease the size of the memory
core, or a combination of the two.
Further, by separating the write from the read lines, one end of
the write lines can be directly connected to a power supply, VDD
eliminating a second current switch that is required if the read
and write share the same line. Thus, the total area for the write
driver is smaller and the average bit size for the memory core is
smaller. Also by eliminating the need to switch a line between read
and write, the write voltages can be optimized for performance
without the risk of damaging the read circuits. Further, because
the select transistors do not receive the write voltages, these
select transistors can be made to much smaller sizes because they
do not have to receive the write-level voltages. This reduces the
size of the memory cell. This is particularly significant, when it
is common to have transistors made differently for differing
voltage requirements.
Shown in FIG. 15 is a cross section of a memory cell comprised of
MRAM device 202 and transistor 230. This shows the common elements
of a MRAM device arranged to take advantage of the architecture of
FIG. 14. In a typical application of MRAM technology, the MRAM
devices will be present on a circuit with extensive logic such as a
microprocessor. In such a case there would be several levels of
metal to accommodate the logic design and the storage element of
the MRAM device would be manufactured after those metal layers have
been formed. This is due to the typical tunnel junction not being
able to handle temperatures above about 400 degrees Celsius without
degradation.
MRAM device 202 comprises a tunnel junction 300, interconnect 306,
and interconnect 304, and write current paths 314 and 302.
Interconnect 304 is also local bit line 251. Transistor 230
comprises a source 324, a drain 322, and a gate 323. The drain 322
of transistor 230 is connected to MRAM device 202 via an
interconnect 318, an interconnect 308, an interconnect 310, and an
interconnect 312, which are formed as metal layers for use as
logic. These metal interconnect layers are connected together by
vias as is well known. Write current path 314 is formed in the same
metal layer as interconnect 318. Gate 323 is part of the read word
line RWL0 periodically connected to interconnect 320. The use of
interconnect 320 is to reduce the resistance of RWL0. This is a
common strapping technique to avoid the relatively high resistance
of polysilicon.
Shown in FIG. 16 is cross section taken through MRAM device 202 and
transistor 230 as indicated in FIG. 15. This cross section is
extended to include MRAM device 210 and transistor 238. This shows
read global bit line RGBL0 at the same level of interconnect as
interconnect 310. Notice that tunnel junction 300 and WWL0, are
offset from the cross section line and so are not present in FIG.
16. The portion of MRAM device 210 present in FIG. 16 is write bit
line WBL1. Similar to MRAM device 202, the third current path of
MRAM device 210 is connected to transistor 232 by interconnect 340,
interconnect 338, interconnect 336, interconnect 334, and
interconnect 330. Interconnect 330 and 306 provide the direct
connection to the tunnel junctions of MRAM devices 210 and 202,
respectively. These cross sections show that this architecture can
be made without requiring unusual structures that would require
special processing.
Shown in FIG. 17 is a portion of an alternative to that shown in
FIG. 14. In this case the memory cells in each group are arranged
as a series memory. Each of the plurality of groups of adjacent bit
cells is connected in series to a reference. In this case the
reference is ground. There is no local bit line in this
alternative. Similar device numbers are retained for similar
features.
Illustrated in FIG. 18 is an MRAM architecture 350 generally having
an array 352, a bit write driver 354, a timer 356, a word write
decoder 358, a word write driver 360, a bit write decode/compare
362, and references 364. It should be well understood that read
circuitry associated with MRAM architecture 350 is not illustrated
for purposes of simplification to explain a write or program
operation.
Array 352 has a plurality of parallel write bit lines such as write
bit lines 366, 367, 368, 369, 370 and 371. Array 352 also has a
plurality of write word lines such as write word lines 374, 375 and
376. At the intersection of each word line and bit line is an MRAM
memory cell that is illustrated for purposes of convenience simply
as a circle. A power supply, V.sub.DD, is connected to each bit
line and to each word line. Each of the MRAM memory cells is
programmed by the use of a bit line current, Ib, and a word line
current Iw. Also, each bit line has a significant parasitic
resistance, Rb, associated therewith.
Within bit write driver 354 is a plurality of bit line or column
select transistors, such as write column decode transistor switches
390-395, each having a gate controlled by a control signal provided
by a bit write decode/compare circuit 362. A drain of transistor
390 is connected to a bottom memory cell in bit line 366, a gate
connected to a control signal B0-0, and a source connected to a
first common rail 397. A drain of transistor 391 is connected to a
bottom memory cell in bit line 367, a gate connected to a control
signal B0-1, and a source connected to the first common rail 397. A
drain of transistor 392 is connected to a bottom memory cell in bit
line 368, a gate connected to a control signal B0-31, and a source
connected to the first common rail 397. A drain of transistor 393
is connected to a bottom memory cell in bit line 369, a gate
connected to a control signal B1-0, and a source connected to a
second common rail 399. A drain of transistor 394 is connected to a
bottom memory cell in bit line 370, a gate connected to a control
signal B1-1, and a source connected to the second common rail 399.
A drain of transistor 395 is connected to a bottom memory cell in
bit line 371, a gate connected to a control signal B1-31, and a
source connected to the second common rail 399. A metal option 398
is connected to each of the first common rail 397 and the second
common rail 399 for selectively connecting the first common rail
397 to the second common rail 399. It should be well understood
that variations of the implementation of metal option 398 may be
readily used. For example, for reasons that will be discussed
below, the first common rail 397 and the second common rail 399 may
be initially connected together by a programmable fuse and then
selectively blown and disconnected if desired for the reasons
described below. A precharge transistor 402 for precharging the
first common rail 397 has a source connected to a voltage potential
equal to (V.sub.DD -Vt) where Vt is the threshold voltage of an
N-channel transistor used in the column select circuitry. A gate of
transistor 402 is connected to a precharge control signal, P0,
provided by the Bit Write Decode/Compare circuit 362. A drain of
transistor 402 is connected to the first common rail 397. A
parasistic capacitance 405 exists between the first common rail 397
and Vss. A precharge transistor 404 for precharging the second
common rail 399 has a source connected to the voltage potential
equal to (V.sub.DD -Vt). A gate of transistor 404 is connected to a
precharge control signal, P1, provided by the Bit Write
Decode/Compare circuit 362. A drain of transistor 404 is connected
to the second common rail 399.
A References circuit 364 provides a reference current, Iref, via a
conductor 416 to a drain of a transistor 410. The drain of
transistor 410 is connected to a gate thereof and to the gate of
transistor 412. A source of transistor 410 is connected to a clean
voltage reference terminal, V.sub.ssc. A source of transistor 412
is connected to the clean voltage reference terminal, V.sub.ssc.
Transistor 412 also has a drain. A gate of transistor 414 is
connected to the conductor 416. A source of transistor 414 is
connected to a conductor 418. A parasitic resistance of conductor
416 between the gate of transistor 414 and the gate of transistor
410 is approximately ten times greater than a parasitic resistance
of conductor 418 between the source of transistor 414 and
V.sub.ssc.
A drain of transistor 414 is connected to a drain of a transistor
420 having a gate thereof connected to the drain of transistor 420
and to a gate of transistor 424. A source of transistor 420 is
connected to a drain of a transistor 422. A source of transistor
422 is connected to V.sub.DD. A source of transistor 424 is
connected to a drain of a transistor 426. A gate of transistor 422
is connected to a gate of transistor 426 for receiving a control
signal labeled A1 provided by the Bit Write Decode/Compare circuit
362. A source of transistor 426 is connected to V.sub.DD. The drain
of transistor 424 is connected to a drain of a transistor 430
having its gate connected thereto and to a gate of transistor 434.
A source of transistor 430 is connected to a drain of a transistor
432. A gate of transistor 432 is connected to V.sub.DD and a source
of transistor 432 is connected to V.sub.ss. A drain of transistor
434 is connected to the second common rail 399. A source of
transistor 434 is connected to a drain of a transistor 436. A gate
of transistor 436 is connected to a control signal C1 that is
provided by the Bit Write Decode/Compare circuit 362. A source of
transistor 436 is connected to V.sub.ss. The drain of transistor
412 is connected to a drain of a transistor 440 having its gate
connected thereto and to a gate of transistor 444. A source of
transistor 440 is connected to a drain of a transistor 442. A
source of transistor 442 is connected to V.sub.DD. A source of
transistor 444 is connected to a drain of a transistor 446. A
source of transistor 446 is connected to V.sub.DD. A gate of
transistor 446 is connected to the gate of transistor 442 to form a
control terminal for receiving a timing signal A0 provided by the
Bit Write Decode/Compare circuit 362. A drain of transistor 444 is
connected to a drain of a transistor 450 having a gate connected
thereto and to a gate of transistor 454. A source of transistor 450
is connected to a drain of a transistor 452. A source of transistor
452 is connected to V.sub.ss. A gate of transistor 452 is connected
to V.sub.DD. A source of transistor 454 is connected to a drain of
a transistor 456. A gate of transistor 456 is connected to a
control signal C0 provided by the Bit Write Decode/Compare circuit
362. A source of transistor 456 is connected to V.sub.ss. A drain
of transistor 454 is connected to the first common rail 397.
The Bit Write Decode/Compare circuit 362 provides the control
signals A, B, C and P described herein. A timer 356 has a first
output connected to a first input of the Bit Write Decode/Compare
circuit 362. Bit Write Decode/Compare circuit 362 has a second
input for receiving multi-bit output data, DATA OUT, a third input
for receiving multi-bit input data, DATA IN, and a fourth input for
receiving a multi-bit Bit Address. A second output of timer 356 is
connected to a first input of a word write decoder 358. A second
input of word write decoder 358 receives a multi-bit word address.
An output of word write decoder 358 is connected to an input of a
word write driver 360. The word write driver 360 has a plurality of
outputs, each of which is connected to a predetermined row or word
line in the memory array 352. In the illustrated form, transistors
402, 404, 446, 444, 442, 440, 426, 422, 424 and 420 are P-channel
transistors and all other transistors illustrated in FIG. 18 are
N-channel transistors. It should be appreciated that details of the
bit write driver are illustrated in FIG. 18. For purposes of
simplification, details of the word write driver 360 are not
explicitly shown but have an analogous structure as the bit write
drivers 354.
In operation, MRAM architecture 350 has a plurality of memory
cells, such as memory cell 380, that are organized in rows and
columns, each of the plurality of memory cells being located at
intersections of the rows and columns. The plurality of write bit
lines, such as write bit line 366, intersect with the plurality of
write word lines. Each write bit line has a first end and a second
end. Similarly, each write word line has a first end and a second
end. Current flowing from the first end to the second end on a
selected write bit line and a selected write word line results in a
write operation to the memory cell that is located at the
intersection of the two lines. The first end of the plurality of
write bit lines is directly connected to a common node or bus (i.e.
rail). In the illustrated form, the common node is a power supply
terminal V.sub.DD. It should be understood that the power supply
terminals in FIG. 18 could be reversed and the first end connected
to V.sub.ss. Additionally, there could be provided transistor
switches (not shown) to connect the common node at the first end to
a predetermined power supply terminal. It should be further
appreciated that all of this discussion is equally applicable for
the write word lines of FIG. 18.
Data is written to, stored in and read from array 352. Word write
decoders enable the word write drivers to select one word line in
the array 352 to execute a write operation. Similarly, the bit
write decoder/compare circuit 362 enables the bit write driver 354
to select one column or bit line of array 352 to execute the write
operation. The addressed memory cell of array 352 is the
intersection of the selected bit line and word line. Timer 356
provides relevant timing information to the word write decode 358
and bit write decode/compare circuitry 362. The timing signals
generated within timer 356 are designed to be less
voltage/temperature (VT) sensitive by using RC time delay elements
as will be discussed below in connection with FIG. 20 for
generation of the timing signals.
Within the bit write driver 354 there are two bit groupings. The
bit lines of a first bit group are connected to the first common
rail 397 through individual write column decode switches 390-392.
Similarly, the bit lines of a second bit group are connected to the
second common rail 399 through individual write column decode
switches 393-395. Within bit write driver 354 there is illustrated
three stages of series-connected current mirrors wherein half of a
first one of the stages, formed by transistors 410, 412 and 414, is
continuously conductive, i.e. transistor 410 is continuously
conductive. Each common rail 397, 399 is respectively connected to
a switchable current mirror stage 419 and a switchable current
mirror stage 425. Intervening switchable current mirror stages 421
and 423 are respectively coupled between each of the switchable
current mirror stages 419, 425 and the first stage.
Transistors 440, 442, 444 and 446 form switchable current mirror
stage 421, and transistors 450, 452, 454 and 456 form switchable
current mirror stage 419 of FIG. 18. Transistors 420, 422, 424 and
426 form switchable current mirror stage 423, and transistors 430,
432, 434 and 436 form switchable current mirror stage 425. Both of
the three stage series-connected current mirrors are biased from
the common references 364. The Iref current reference from
references 364 flows through a shared N-channel mirror device,
transistor 410, of the first mirror stage to a noise-free,
segregated ground terminal labeled V.sub.ssc where the "c" stands
for "clean". The gate voltage on transistor 410 forms a reference
voltage from the Iref current and is coupled to the intervening
switchable current mirror stage 421 by setting up a reference
current through transistor 412 to V.sub.ssc. Similarly, the gate
voltage on transistor 410 forms a reference voltage from the Iref
current and is coupled to the intervening switchable current mirror
stage 423 by setting up a reference current through transistor 414
to V.sub.ssc.
Typically, references 364 are physically located on an integrated
circuit in a remote (relatively) location from the other modules
illustrated in FIG. 18 because the references 364 are typically
shared by other circuitry (not shown). Therefore, the resistance of
the conductor carrying Iref from references 364 to the first mirror
stage comprising transistors 410, 412 and 414 is significantly
large. To minimize resistive voltage drop on this conductor, each
of the three current mirror stages in the bit write driver 354 has
a predetermined designed current magnification significant enough
to make the write drive current sufficiently large (e.g.
milliampere range) to perform a write operation thereby allowing
Iref current to be minimal (e.g. tens of microamperes). In
addition, the reference current Iref through transistor 410
conducts continuously as a standby current. Therefore, minimizing
Iref permits a reduction in the amount of standby power consumed.
The current mirror ratio from transistors 412 and 414 to transistor
410 as well as in the switchable stages of the current mirrors are
for exemplary purposes only shown to be a factor of ten within each
mirroring stage. Therefore, the current through each of transistors
412 and 414 is ten times the current through transistor 410.
Conductors 416 and 418 are designed so the voltage drop due to
parasitic resistance is as equal as possible. In the illustrated
form of FIG. 18, conductor 416 is illustrated as having a parasitic
resistance that is 10R and conductor 418 is illustrated as having a
parasitic resistance that is R, where R is an arbitrary resistance
unit. In other words, conductors 416 and 418 are processed to
intentionally have physical properties (widths, lengths, depths,
material type, etc.) that result in a 10:1 ratio of their parasitic
resistances. The presence of a clean (i.e. not subject to voltage
transitions from other sources) V.sub.ssc ground terminal and the
balanced resistive drop on conductors 418 and 416 makes the
gate-to-source voltage of transistors 414 and 412 equal to the
gate-to-source voltage of transistor 410.
Illustrated in FIG. 19 is a graph that helps understand the write
operation of MRAM architecture 350 of FIG. 18. FIG. 19 illustrates
the magnitude and timing relationship between the write word line
current and the write bit line current for any of the memory cells
of array 352. In the illustrated form, a toggle MRAM write
operation will be assumed. In order to perform a write to a
predetermined memory cell, it is first necessary at a time
t.sub.en1 to increase write word line current from zero (or a near
zero value) to a predetermined magnitude over a fixed transition
time tRW. The write word line current is held substantially
constant until time t.sub.en3. In a toggle operation, once a
predetermined memory cell is identified from a memory address
decode operation and prior to time t.sub.en2, a determination must
be made as to what the existing data value of the address location
is. If the new data value is the same logic value as the existing
stored value (i.e. a compare step performed in Bit Write
Decode/Compare circuit 362), then no write bit line current is
applied and a write operation is not fully made for that memory
cell. In other words, Bit Write Decode/Compare circuit 362
functions to compare an existing data value (Data Out) with a
desired input data value (Data In) for a given address (Bit
Address) to determine whether a toggle operation is necessary or
not. At a time t.sub.en2, the write bit line current is increased
from zero (or a near zero value) to a predetermined magnitude over
a fixed transition time tRB. The magnitude of the word current and
the magnitude of the bit current are illustrated as being different
for purposes of illustration and clarity, but the two currents may
be the same magnitude. The write bit line current is held
substantially constant until time t.sub.en4. At t.sub.en3 the word
line current transitions back to a near zero value over a fixed
transition time tFW. At time t.sub.en4 the bit line current
transitions back to a near zero value over a fixed transition time
tFB.
The precise timing of events related to the write operation as
defined by t.sub.en1, t.sub.en2, t.sub.en3 and t.sub.en4 are
generated from timer 356 of FIG. 18. A detailed implementation of
timer 356 is illustrated in FIG. 20. Timer 356 has an input
terminal for receiving an input enable signal, IN, generated from
initiation of a write operation. An input of an inverter 460 is
connected to the input enable signal. Inverter 460 has an output
connected to a first terminal of a resistor 462. A second terminal
of resistor 462 is connected to a first electrode of a capacitor
464 and to an input of an inverter 463. A second electrode of
capacitor 464 is connected to a voltage reference terminal labeled
V.sub.ss. An output of inverter 463 provides the signal en1 and is
connected to an input of an inverter 466. An output of inverter 466
is connected to a first terminal of a resistor 468. A second
terminal of resistor 468 is connected to a first electrode of a
capacitor 470 and to an input of an inverter 472. A second
electrode of capacitor 470 is connected to the V.sub.ss voltage
reference terminal. An output of inverter 472 provides the signal
en2 and is connected to an input of an inverter 474. An output of
inverter 474 is connected to a first terminal of a resistor 476. A
second terminal of resistor 476 is connected to a first electrode
of a capacitor 478 and to an input of an inverter 480. A second
electrode of capacitor 478 is connected to the V.sub.ss voltage
reference terminal. An output of inverter 480 provides the en3
signal and is connected to an input of an inverter 482. An output
of inverter 482 is connected to a first terminal of a resistor 484.
A second terminal of resistor 484 is connected to a first electrode
of a capacitor 486 and to an input of an inverter 488. A second
electrode of capacitor 486 is connected to the V.sub.ss voltage
reference terminal. An output of inverter 488 provides the en4
signal.
Additionally, the en 1 signal is connected to a first input of a
NAND gate 490. The en3 signal is connected to an input of an
inverter 491. An output of inverter 491 is connected to a second
input of NAND gate 490. An output of NAND gate 490 provides a
timing signal to the word write decoder 358. The en2 signal is
connected to a first input of a NAND gate 492. The en4 signal is
connected to an input of an inverter 493. An output of inverter 493
is connected to a second input of NAND gate 492. An output of NAND
gate 492 provides a timing signal to the Bit Write Decode/Compare
circuit 362.
It is desired to make the relative difference between times
t.sub.en1, t.sub.en2, ten.sub.3 and t.sub.en4 independent of
process, voltage and temperature variations. In operation, timer
356 has a plurality of RC (resistance/capacitance) delay stages.
For example, resistor 462 and capacitor 464 form a first RC delay
stage. The RC delay stages provide a certain amount of immunity to
circuit variations caused by process, voltage and temperature
variations. Each delay stage within timer 356 introduces a precise
delay from its input terminal to its output terminal and determines
a specific one of the en1, en2, en3 and en4 signals. Additionally,
the outputs en1-en4 are precisely timed relative to each other. The
signals en1-en4 established by timer 356 have timing that
corresponds directly with t.sub.en1 -t.sub.en4 of FIG. 19.
Therefore, the timing of signals en1 and en3 establish the
initiation and completion of the write word current pulse of FIG.
19. The timing of signals en2 and en4 establish the initiation and
completion of the write bit current pulse of FIG. 19. The output of
NAND gate 490 is provided to word write decoder 358, and the output
of NAND gate 492 is provided to bit write decode/compare 362.
The predetermined current magnitude for the write word line and the
write bit line during a write operation requires precise control
and is of the order of several milliamperes. The magnitude control
function is performed by the bit write driver 354 along with
references 364. As discussed previously, the reference current Iref
provided by references 364 is magnified through the
series-connected current mirror stages of bit write driver 354. To
reduce standby leakage current, the second and third stages of the
series-connected current mirrors are made switchable. The
switchable current mirror stages are turned on by timing signals A
and C only during a write operation. The outputs of timer 356 that
are connected to the inputs of Bit Write Decode/Compare circuit 362
generate the control timing signals A and C that activate the
switchable current mirror stages, and control timing signal B that
activates the column decode switches 390-395.
Illustrated in FIG. 21 is the timing associated with the switch
control signals A, B and C. In the illustrated form, a Valid
address exists in decode logic (not shown). An active low external
Write Enable signal has been received by logic circuitry (not
shown) that initiates a Write operation. One of the functions
initiated with the beginning of a Write operation is the generation
of the input signal, IN, to timer 356. The external Write Enable
signal only needs to be active for a predetermined amount of time
during the illustrated timing example. During a write cycle, a
valid data input is provided to the Bit Write Decode/Compare
circuit 362. As soon as the decoded address is available to the Bit
Write Decode/Compare circuit 362 during a write operation, control
signal A (A0 or A1, etc. depending upon the decoded address value)
is made active. Control signal A0 turns on the second switchable
current mirror stage allowing amplified current from the first
current mirror stage to flow into the third switchable current
mirror stage that is initially disabled by control signal C0.
During this time, the parasitic capacitances associated with the
second and third switchable current mirror stages are charged by
the resulting current flow and the associated voltages become
stable. In the meantime, a Read operation is executed and the data
output from the read is provided to the Bit Write Decode/Compare
circuit 362. Bit Write Decode/Compare circuit 362 compares the bit
inputs from the Data Out signal against the bit inputs from the
Data In signal to determine whether a write toggle operation is
necessary. Next, the Bit Write Decode/Compare circuit 362 provides
an active B control signal by making only one of the B0-0 through
B0-31 or B1-0 through B1-31 signals active depending upon the
decoded column address. Since C0 is not active, no current flows
through the selected Write bit line. In one form, the B signal is
made active right after the Read operation is executed. In another
form, the B signal may be made active before the Read operation is
completed. Once a decision to toggle an addressed memory cell is
made by Bit Write Decode/Compare circuit 362, signal C is made
active by Bit Write Decode/Compare circuit 362. The activation of
signal C turns on transistor 456 or transistor 436 depending upon
whether C0 or C1 is made active. At this point current begins to
flow through the Write Bit line that has been addressed. It should
be again noted that although the discussion herein is devoted
exclusively to the write bit line circuitry, the same operation
exists for the write word line circuitry (not shown in detail). One
difference for the write word line circuitry is that the generation
of the C control signal may occur before the decision whether or
not to toggle is made.
As explained previously in connection with FIG. 19, once control
signal C is activated and current begins to flow through the write
bit line, a certain transition time, tRB, is required to change
from near zero current to high current flow. The transition time
tRB needs to be substantially constant irrespective of the
magnitude of the write current, and voltage and temperature
variations. The constant transition time is provided by the MRAM
architecture 350. The switchable current mirror 419 draws a
constant value of current, Is, through the parasitic resistance RB
of the Write bit line and the parasitic capacitance 405 of the
common rail 397 once control signal C0 is active. Because a
constant current, Is, is conducted through resistor RB that
functions with the parasitic capacitance 405, an RC network is
utilized to make the transition time of the write current IB more
insensitive to voltage and temperature variations and therefore be
substantially constant. The transition time TRB can be adjusted to
different values by varying the value of the RC time constant. This
adjustment is accomplished in MRAM architecture 350 by allowing for
metal option 398 that directly connects common rail 397 to common
rail 399 when used. It should be understood that metal option 398
is a conventional circuit design technique that permits a designer
to provide a connection and then create a new photomask containing
the connection to implement the connected rail design in an
integrated circuit. Other connection techniques may be used rather
than a metal option. For example, programmable fuses or transistor
switches may be implemented to complete the connections to adjust
the transition time TRB as desired. The conductive path doubles the
capacitance seen by the constant current Is and therefore doubles
the transition time TRB of the write current IB. Although a single
metal option is shown connecting two common rails are shown, it
should be understood that any number of metal option connections
may be used to connect multiple common rail sections.
Referring again to FIG. 19, beyond the transition time the current
through the Write bit line maintains a constant predetermined
value. This value is determined by the reference current Iref and
the magnification factor through the three series-connected current
mirror stages. Maintaining a constant current value of the iword
and the ibit currents when these currents are at their elevated
current values is very important over process, temperature and
voltage variations. MRAM cells require precise programming currents
and these requirements are not very sensitive to temperature,
voltage and many process conditions. Therefore the programming
currents must also be insensitive to ensure stable and accurate
programming. Therefore, current reference 364 that generates the
reference current Iref is made temperature and voltage insensitive
by using insensitive circuitry such as a bandgap reference voltage
generator.
At the end of the constant current period, t.sub.en4 in FIG. 19,
control signal C0 is deactivated as illustrated in FIG. 21. The
transition time tFB is accomplished in the same manner as
previously described for transition time tRB. This completes the
write cycle wherein write word current and write bit current are
utilized as illustrated in FIG. 19 to toggle the selected memory
cell. Therefore, control signals B0 and A0 can also be deactivated
at the completion of the write cycle. Typically the write operation
is allowed to overlap into the next cycle that can be either a read
or a write cycle. If the subsequent cycle is a write operation
requiring the same current mirrors to be activated, A0 can remain
activated into a subsequent write cycle (not shown).
At the end of the write cycle, the common rail attains a voltage
that is approximately V.sub.DD -Vt, where Vt is the threshold
voltage of the column decode switch that was previously activated,
such as the transistor used to implement column decode switch 390.
In the illustrated form, the Vt is a threshold voltage of a
metal-oxide semiconductor transistor. If another write operation is
performed immediately, the activated column decode switch is able
to immediately conduct because the gate-to-source voltage of the
activated column decode switch is instantly near a Vt potential.
However, if the subsequent write operation occurs a significant
amount of time after an earlier first write operation, then the
potential of the common rail 397 can drop toward V.sub.SS due to
charge leakages through transistor 454 and junction leakage from
other devices on common rail 397. If a potential drop occurs on
common rail 397 when the column decode switch 390 is made
conductive by control signal B0-0, the parasitic capacitance
associated with the write bit line which is charged fully to
V.sub.DD discharges through the column decode switch 390 onto the
common rail parasitic capacitance 405. This charge sharing between
the parasitic capacitances 405 results in a potentially damaging
current spike through the selected write bit line. The current
spike may result in an unintended write operation of any selected
cell on the write bit line. To avoid this problem, a precharge
circuit denoted by transistors 402 and 404 enable the common rails
397 and 399 to be held at V.sub.DD -V.sub.T between write
operations where V.sub.DD -V.sub.T is a voltage generated by
References 364 which approximates V.sub.DD -V.sub.T. Control signal
P0 illustrated in FIG. 21 is provided by the Bit Write
Decode/Compare circuit 362 to control transistors 402 and 404.
Control signal P (P0, P1, etc.) is made nonconductive during a
write operation. The value of the precharge voltage may not be
significantly greater than V.sub.DD -V.sub.T because when C0 is
activated for a write operation, the charge on parasitic
capacitance 405 must first discharge through the constant current
Is to the point that the voltage on the common rail 397 drops to
V.sub.DD -V.sub.T before the column decode switch 390 activated by
signal B0 begins to significantly conduct thereby drawing current
from the Write Bit line to perform the write operation. This
introduces a delay at the start of the write operation that
negatively impacts the speed of the memory. Thus, precharge voltage
values departing significantly from the V.sub.DD -Vt value is
detrimental. Higher values reduce the speed and lower values
increase the probability of an inadvertent write. The circuitry
within the references 364 are designed to track voltage, process
and temperature variations of the threshold voltage Vt of the
column decode switches and of the power supply V.sub.DD.
By now it should be apparent that there has been provided an MRAM
architecture having circuit features that enable an efficient and
fast toggle write operation of an MRAM. Power savings are achieved
with the use of series-connected switchable multiple stage current
mirrors. By precharging a common rail having multiple write bit
lines connected together, the write noise immunity is improved and
current spikes are minimized. Additionally, the speed of a write
operation is enhanced. The use of RC circuits, including the
advantageous use of parasitic resistance and capacitance, results
in insensitivity to voltage and temperature variations. Timing of
the write operation control signals is selective so that the
program currents transition between values in a precise controlled
time range. Additionally, the length of time that programming
currents are present and the value of the programming current is
accurately controlled to ensure reliable programming. Various
changes and modifications to the embodiments herein chosen for
purposes of illustration will readily occur to those skilled in the
art. For example, although a toggle programming MRAM is discussed
for some applications, it should be apparent that other types of
memory cells may utilize the features disclosed herein. Variations
in the types of conductivities of transistors, the types of
transistors, etc. may be readily made. Although specific logic
circuits have been shown, numerous logic circuit implementations
may be used to implement the functions discussed herein. To the
extent that such modifications and variations do not depart from
the spirit of the invention, they are intended to be included
within the scope thereof which is assessed only by a fair
interpretation of the following claims.
* * * * *