U.S. patent number 3,862,397 [Application Number 05/397,631] was granted by the patent office on 1975-01-21 for cool wall radiantly heated reactor.
This patent grant is currently assigned to Applied Materials Technology, Inc.. Invention is credited to Emmett R. Anderson, Douglas S. Schatz.
United States Patent |
3,862,397 |
Anderson , et al. |
January 21, 1975 |
COOL WALL RADIANTLY HEATED REACTOR
Abstract
A cool wall radiantly heated chemical vapor deposition reactor
includes a plurality of banks of elongated heat lamps surrounding
the radiant energy transmissive wall of the reactor for heating the
susceptor in the reactor on which the wafer substrates are
supported. Each bank of lamps includes a segmented reflector
assembly having the reflector segments spaced from each other to
provide slots aligned with the lamp filaments for permitting a
gaseous coolant to be introduced from a cooling structure into
contact with the lamps and with the wall of the reactor and which
precludes direct reflection of radiant heat back on the lamp
filaments which would cause damage thereto and shorten lamp life.
Furthermore, reflector segments are arranged to isolate the
individual lamps in each bank from each other to further enhance
lamp life by precluding direct filament-to-filament radiation
transfer between adjacent lamps. The reflector segments are hollow
and the cooling structure is designed to introduce the gaseous
coolant directly into the hollow interior of the reflector segments
from which the coolant thereafter circulates through the slots and
over the lamps. Each reflector segment may also be provided with
conduit means through with a liquid coolant is circulated to
additionally cool the segments.
Inventors: |
Anderson; Emmett R. (Saratoga,
CA), Schatz; Douglas S. (Los Gatos, CA) |
Assignee: |
Applied Materials Technology,
Inc. (Santa Clara, CA)
|
Family
ID: |
26930935 |
Appl.
No.: |
05/397,631 |
Filed: |
September 17, 1973 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
Issue Date |
|
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237698 |
Mar 24, 1972 |
|
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Current U.S.
Class: |
219/405; 118/724;
362/294; 392/356; 432/31; 362/92; 362/346; 392/423 |
Current CPC
Class: |
C23C
16/481 (20130101); H05B 3/0047 (20130101); C30B
25/10 (20130101) |
Current International
Class: |
C30B
25/10 (20060101); C23C 16/48 (20060101); H05B
3/00 (20060101); H05b 001/00 (); F27b 005/14 ();
F21v 029/00 () |
Field of
Search: |
;219/411,343,347-349,354,377,405 ;240/47 ;432/202,206 ;118/49.5
;432/31 ;34/4 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Bartis; A.
Attorney, Agent or Firm: Flehr, Hohbach, Test, Albritton
& Herbert
Parent Case Text
This application is a continuation of application Ser. No. 237,698,
filed Mar. 24, 1972 and now abandoned.
Claims
We claim:
1. A cool wall radiantly heated chemical vapor deposition reactor
comprising in combination a plurality of banks of elongated radiant
energy heat lamps for heating substrates to be treated in said
reactor, each of said lamps including an elongated filament
therein; a radiant energy transmissive cool wall reaction chamber
in which said substrates are to be treated, said banks of lamps
being oriented to generally surround said reaction chamber to
transmit radiant energy through the wall thereof; a reflector
assembly; for each bank comprising a plurality of adjacently
disposed reflector segments; and cooling structure in conjunction
with said reaction chamber and each of said lamp banks, said lamps
of each bank being spaced from each other and from the wall of said
reaction chamber with portions of adjacent segments of each
reflector assembly being interposed between adjacent lamps to
prevent direct transmission of radiant energy between the filaments
of such adjacent lamps; each reflector assembly having the
plurality of said reflector segments spaced from each other so that
elongated generally slot shaped openings are provided between
adjacent reflector segments, each of said lamps being positioned so
that its elongated filament lies generally in line with one of said
elongated openings, said openings being at least as wide as the
width of said filaments and at least as long as the lenght of said
filaments aligned therewith so that radiant energy passing in one
direction from each said filament may exit length an adjacent
opening so that reflection of said energy back toward said lamp
filament is precluded; said cooling structure comprising dual
purpose conduit means associated with each reflector assembly for
introducing a coolant through said slot shaped openings of each
reflector assembly, such coolant upon passing through such openings
passing over each of said lamps in said bank positioned in line
therewith to effect cooling of such lamps, and further passing over
the wall of said reaction chamber to assist in maintaining such
chamber wall cool during treatment of substrates in said
reactor.
2. The combination of claim 1 in which at least some of said
reflector segments are hollow and have a coolant entrance so that
coolant from said cooling structure may enter said segments to cool
the same internally.
3. The combination of claim 2 in which said conduit means comprises
an air manifold defined by a plurality of conduit sections, each of
said conduit sections being aligned with the coolant entrance
extending into a hollow reflector segment, whereby coolant may be
introduced directly into said reflector segments and thereafter may
circulate from such segments into and through said slot shaped
openings over said lamps.
4. The combination of claim 1 in which said cooling structure
further includes elongated conduits positioned within at least some
of said reflector segments, said conduits being operatively
connected with means for introducing a coolant into said conduits
for circulation therethrough and through said segments.
5. The combination of claim 1 in which said conduit means comprises
an air manifold defined by a plurality of conduit sections arranged
to direct air over and between said segments of each reflector
assembly.
Description
BACKGROUND OF THE INVENTION
Field of the Invention
This invention relates to the field of radiant energy assemblies.
More particularly, the field of this invention involves radiant
energy sources for transmitting heat energy against a surface to be
heated thereby. This invention further relates to the field of high
temperature radiant heat lamps, and reflectors therefor, such as
high intensity lamps capable of producing and transmitting radiant
heat energy at short wave lengths, such as approximately one
micron.
Still more particularly, this invention relates to the field of
utilization of radiant heat energy in the heating of silicon or
like wafer substrates used in the production of semiconductor
devices while chemical vapor films are deposited on such
substrates. This invention further relates to the field of means
for cooling high temperature radiant heat sources and for
prolonging the useful life of high temperature lamps utilized as
radiant heat sources.
Description of the Prior Art
Radiant heat sources comprising one or more radiant heat lamps
utilized to heat silicon wafer substrates or susceptors supporting
such substrates in the production of semi-conductor devices have
been known heretofore. However, so far as is known, the particular
reflector assembly and cooling structure embodied in the heat
source of the present invention has not been known or utilized
heretofore. The reflector assembly of the present invention has
been designed to enhance lamp life and efficiency, by facilitating
cooling of lamps used as a source of high temperature radiant heat,
and by minimizing lamp damage by eliminating reflected radiation
which heretofore has been directed back against the lamp by prior
known reflector assemblies.
By way of example of one desirable field of use of the present
invention, in chemical vapor deposition systems, it is highly
desirable to carry out the deposition reaction in a cold wall type
reaction chamber. By maintaining the reaction chamber walls in the
relatively unheated state, such walls receive little or no film
deposition thereon during substrate coating. Cold wall systems are
additionally desirable because they insure the deposition of high
purity films on the substrates being coated. Impurities can be
evolved from or permeate through heated reaction chamber walls.
Thus, because such impurities would interfere with and adversely
affect the purity of the substrate coating, cold wall reaction
chambers preferably are employed.
Cold wall chemical vapor deposition processes have been developed
which permit heating of the substrate positioned within a reaction
chamber without simultaneously heating the reaction chamber walls.
Such processes frequently involve the use of radio frequency (RF)
induction heating of a graphite susceptor positioned within a
reaction chamber, the walls of which are formed of non-conducting
material, such as quartz. However, RF heating of graphite or like
susceptors positioned within a quartz reaction chamber has inherent
drawbacks which are well known in the art.
As a result, improved cold wall reactors have been devised within
recent years to replace the prior known RF reactors used in
conjunction with the vapor deposition of oxide, nitride, metal or
other similar films on substrates. Such improved reactors and
processes overcome the disadvantages of prior known RF induction
heated systems by utilizing radiant heat sources which transmit
heat energy from a radiant heat lamp positioned outside a
transparent reaction chamber. The wave length of the radiated heat
energy and of the material from which the reactor walls are formed
are selected so that the radiant heat energy is transmitted through
the walls of the reaction chamber with minimal absorption so that
the walls remain essentially unheated.
The radiant heat source utilized preferably comprises one or more
high intensity, high temperature lamps which operate at a filament
temperature in the range of 5,000.degree. to 6,000.degree.F., by
way of example. Such lamps may be selected from the type which
produce radiant heat energy in the short wave length range of, for
example, approximately one micron. Radiant heat energy at such
short wave length passes through material found suitable for
defining the walls of the reaction chamber, of which quartz is
preferred. Quartz possesses excellent radiant energy transmission
characteristics at the short wave length noted so that minimal
radiation is absorbed by the walls, thus insuring the advantages of
cool wall reaction systems as noted previously to preclude the
deposition of chemical vapor films on the reactor walls during a
chemical vapor deposition procedure.
Prior to the subject invention, however, the useful life of lamps
utilized to emit radiant heat energy in a chemical vapor deposition
reaction or other procedure was shortened because of difficulty in
providing adequate coolant in conjunction with the lamp to overcome
the high filament temperatures at which such lamps operate.
Additionally, because such lamps normally are utilized in
conjunction with a highly polished reflector structure to insure
maximum heat transfer to the articles being heated, radiant energy
emanating from the filaments of the lamps was directed back onto
such filament, or onto the filaments of adjacent lamps, which
resulted in lamp damage and shortened lamp life.
The present invention relates to an improved radiant heat lamp
reflector assembly and cooling structure, particularly as the same
is utilizable in conjunction with a chemical vapor deposition
reactor. Thus, the advantages of use of radiant heat energy
generally recognized as favorable in conjunction with a cool wall
reaction chamber is retained while improved lamp life is
insured.
In applicants' assignee's McNeilly et al. U.S. Pat. No. 3,623,712,
dated Nov. 30, 1971, and in applicants' assignee's pending Rosler
application Ser. No. 208,732, filed Dec. 16, 1971, improved cool
wall radiation heated systems are disclosed which were designed to
replace the RF type and other previously known reaction systems
utilized theretofore. In that regard, the subject invention is
illustrated and described herein in conjunction with one of the
reactor embodiments disclosed in said Rosler application but it
should be understood that utility of the present invention is not
restricted to such an environment and that the same may be utilized
in conjunction with the other reactor construction shown in the
Rosler application as well as with the various reactor structures
shown in said McNeilly et al. patent, as well as in other
environments.
SUMMARY OF THE INVENTION
This invention relates generally to an improved heat source. More
particularly, this invention relates to an improved radiant energy
heat source well suited for use in conjunction with a chemical
vapor deposition apparatus, or other apparatus requiring a heat
source in conjunction therewith. Still more particularly, this
invention relates to an improved radiant lamp assembly, and
associated cooling structure, well suited for use in conjunction
with a cool wall chemical vapor deposition reactor, and to improved
reflector means which permits lamp coolant to be effectively
circulated relative to the lamp assembly and reaction chamber
associated therewith, and which precludes the reflection back of
radiant energy onto the filaments of the lamps or onto the
filaments of adjacent lamps.
While this invention is disclosed herein in conjunction with a
chemical vapor deposition reactor, it should be understood that its
utility is not so limited and that the same is applicable in any
apparatus or system requiring radiant energy transmission and the
reflection and focusing of such energy onto an object to be heated.
That is, while this invention has particular utility in conjunction
with a chemical vapor deposition system for coating substrates with
various types of known films, including epitaxial, polycrystalline
and amorphous films, its utility is not so limited. Similarly,
while this invention is disclosed herein in conjunction with a
particular type of chemical vapor deposition reactor, it should be
understood that utility of this invention in conjunction with other
types and constructions of reactors also is contemplated.
To prolong the life of each lamp utilized as a heat source in the
manner noted, the reflector of this invention which is associated
with such a lamp is provided with improved means which defines a
slotted base structure through which a suitable coolant, such as
air, may be introduced along the length of the lamp. With tubular
radiant heat lamps of the type commonly utilized for the noted
purpose, such coolant introduction along the length of the lamp is
particularly important. Heretofore, coolant, such as air,
necessarily was introduced and passed longitudinally of the tubular
lamps; such coolant circulation along the length of the lamp was
less than fully effective.
Additionally, with prior known lamp reflector assemblies not
possessing the slotted base structure of the present invention,
radiant energy emanating from the filament of the lamp was
reflected directly back onto the lamp, resulting in damage, due to
overheating, to the transparent quartz envelope surrounding the
lamp filament and to the seals at the lamp ends, with attendant
shortened lamp life and lowered lamp efficiency. With the subject
invention, the slotted base structure of the reflector also
provides an exit passage for radiant heat energy emanating from the
filament so that damaging reflection of radiant energy back to the
lamp is precluded.
In a modified embodiment, a suitable liquid, such as water, may be
introduced into the reflector assembly to further assist in cooling
the same.
From the foregoing, it should be understood that objects of this
invention include the provision of an improved radiant heat lamp
source; the provision of means for prolonging the effective life of
a radiant heat lamp source; the provision of an improved reflector
assembly and associated cooling structure for a radiant heat lamp
source and reaction chamber associated therewith; and the provision
of an improved reflector assembly for a radiant heat lamp
comprising slotted base means which permits a coolant to be
effectively introduced into contact with the lamp and which permits
the selective escape of radiant heat energy through the reflector
assembly.
These and other objects of this invention will become apparent from
a study of the following description in which reference is directed
to the attached drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a generally schematic vertical sectional view through a
chemical vapor deposition reactor showing the subject invention
positioned to heat a susceptor positioned therein;
FIG. 2 is a horizontal sectional view through the reactor of FIG. 1
taken in the plane of line 2--2 of FIG. 1;
FIG. 3 is a partial vertical sectional view, on an enlarged scale,
taken generally in the area defined by line 3--3 of FIG. 1;
FIGS. 4 and 5 are sectional views of prior art conventional radiant
heat lamp and reflector assemblies;
FIGS. 6 and 7 are sectional views of a portion of a reflector
assembly having the improved construction of the present
invention;
FIG. 8 is a view corresponding generally to a portion of FIG. 3
showing additional cooling means provided in conjunction with the
reflector assembly thereof;
FIG. 9 is an isometric illustration of a modified embodiment of the
subject invention utilized in conjunction with a single lamp rather
than a bank of lamps.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Preferred embodiments of radiant heat source reflectors and cooling
structures are disclosed herein in conjunction with one exemplary
embodiment of a chemical vapor deposition reactor of the type
disclosed in the above identified Rosler application. However, full
structural details of such reactor and its mode of operation are
not described in detail herein. For a full understanding of the
construction and operation of a radiant heated reactor of the type
illustrated herein, reference is directed to the aforementioned
Rosler et al. application and to the aforementioned McNeilly et al.
U.S. Pat. No. 3,623,712. The chemical vapor deposition procedure
effected within the reaction chamber of the illustrated reactor is
fully described in said McNeilly et al. patent.
Generally, it should be understood that the reactor with which the
subject radiant heat source is illustrated is designed to produce
various chemical reactions and/or thermal pyrolysis reactions to
deposit a variety of films on silicon wafers or like substrates.
Such films include various types of epitaxial, polycrystalline or
amorphous films, such as silicon, aluminum oxide, silicon nitride
and silicon dioxide, as well as metal films such as molybdenum,
titanium, zirconium, and tungsten, depositable in accordance with
known chemical vapor deposition reactions in the presence of
heat.
In that regard, the heat source illustrated desirably comprises one
or more tungsten filament lamps, such as tungsten filament
quartz-halogen high intensity lamps of which quartz-iodine and
quartz-bromide are exemplary. Such lamps are commercially available
as described in said McNeilly et al. patent. Such lamps are capable
of producing high filament temperatures in the range of
5,000.degree. to 6,000.degree.F. The lamps chosen desirably are
selected from the type which produces maximum radiant heat energy
in the short wave length, preferably approximately one micron.
Radiant heat energy in such short wave length passes through
material found suitable for defining the walls of a chemical vapor
deposition reaction chamber, of which quartz is preferred.
Reactors of the type described briefly herein have been effectively
used heretofore for producing films of the type identified with
film thickness uniformity of plus or minus 5 percent from substrate
to substrate within a given run. Highly effective results are
insured because operating temperatures can be controlled closely
and uniformly with the radiant heat source described. Such
operating temperature uniformity can now be even more closely
controlled, and heat source life extended, by utilizing a reflector
assembly and cooling structure of the present invention.
Referring first to the showing of FIGS. 1 and 2 in which an
exemplary barrel type chemical vapor deposition reactor system is
shown, it should be understood that the reactor structure is
intended to be enclosed within a surrounding cabinet (not shown) in
and on which the necessary gaseous reactant flow controls,
electrical power sources and other attendant mechanisms are to be
housed and mounted. For purposes of understanding the subject
invention, only those portions of the reactor necessary to
illustrate the environment in which the improved radiant lamp and
reflector assembly is utilized have been illustrated. It should be
understood that those portions of the reactor illustrated are
intended to be supported within the aforementioned cabinet in any
suitable fashion and that suitable power supply sources are
provided for energizing the lamps shown.
The reactor illustrated in FIG. 1, generally designated 1, is
defined by an enclosure, generally designated 2, within which the
subject heat source, generally designated 3, is positioned. The
enclosure 2 is defined by a pair of opposed upper and lower plates,
4 and 6, the upper one of which is apertured for the purpose to
become apparent.
Heat source 3, as will be described in greater detail hereinafter,
is defined by a plurality of banks of high intensity lamps capable
of producing and transmitting radiant heat energy at the short wave
length noted previously. As seen from FIG. 2, heat source 3 is
defined by a plurality of four banks of radiant lamps designated 7,
8, 9 and 11, respectively. Such banks of lamps are positioned at
right angles to each other to surround the reaction chamber of the
reactor, which in the embodiment shown in FIG. 1, is defined by a
quartz bell jar 12 which is transparent to heat energy emanating
from the heat source at the wave length noted.
The bell jar surrounds the susceptor structure 14 of the reactor
which corresponds in construction to that shown in the
aforementioned Rosler application. At its lower end, the bell jar
is provided with a circular peripheral flange 16 which is supported
upon the lower plate 6 of the enclosure 2.
Susceptor 14 includes a vertically extending shaft 17 which extends
upwardly through a boss 18 provided in lower plate 6 and through a
bearing 19 positioned in the boss as seen in FIG. 1. Within the
reaction chamber, shaft 17 is provided with an enlarged retaining
ring 21 which supports the susceptor for rotation within the
reaction chamber. In that regard, the lower portion 22 of the shaft
is operatively connectable with suitable means for rotating the
same (not shown) so that the entire susceptor is rotatable within
the reaction chamber in the presence of radiant heat energy
emanating from the banks of radiant heat lamps surrounding the
chamber.
The susceptor further comprises a plurality of graphite or like
susceptor slabs, designated 23, each of which carries a plurality
of wafer substrates S to be chemically vapor deposition coated in
the known manner. In that regard, each of such slabs is separable
from the supporting framework of the susceptor when the bell jar is
removed from around the susceptor by raising the same in the
direction of the arrows shown at the top of FIG. 1.
Suitable chemical vapor reactants are introducible into the
reaction chamber through a conduit 26 for contacting the substrates
to be coated in the presence of heat emanating from the radiant
heat source. The spent gaseous reactants are withdrawable from the
reaction chamber through a conduit 27 after the reactants have been
maintained in contact with the substrates for a suitable period of
time to effect the desired chemical coating reaction.
During introduction of gaseous reactants into the reaction chamber,
the susceptor structure 14 preferably is rotated by the means noted
previously to insure uniform heating of all substrates to be
coated. While such rotation is not required under all
circumstances, relatively slow rotation in the range of
approximately 10-15 revolutions per minute has been found effective
to insure uniform heating of the susceptor slabs 23 and substrates
carried thereby.
It will be noted from FIG. 2 that each of the lamp banks 7, 8, 9
and 11 is supported by lower plate 6 and is enclosed within a
vertical framework, generally designated 31, which extends between
the upper and lower plates 4 and 6 of the enclosure 2. The lamp
banks, as seen in FIG. 1, are generally coextensive with the
susceptor to insure effective heating thereof.
In that regard, each bank of lamps comprises a plurality of
vertically spaced radiant heat lamps 32 of the aforementioned type;
five such lamps are illustrated in each bank in the reactor
embodiment shown. It should be noted further from FIG. 2 that each
of the lamps 32 is tubular in construction and elongated in
configuration to extend substantially the full width of one side of
the reactor enclosure. Each such lamp has a transparent envelope
surrounding an elongated filament F extending longitudinally
thereof which produces the infrared radiant heat energy emanating
therefrom.
The combined four lamp banks, as seen in FIG. 2, completely
surround the reaction chamber to insure effective heating of the
susceptor 14 positioned therein as noted. It will be noted that
each lamp envelope at each of its opposite ends is sealed around a
metal electrical contact which in turn is received in and clamped
by a metal contact clamp, each designated 33. Such contact clamps
are operatively connected with a suitable electrical source (not
shown) in known fashion. Thus, to replace a lamp it is merely
necessary to slip the same from its associated pair of electrical
contact clamps and substitute a new lamp therefor, as may be
required.
Heretofore the life of such lamps has been unnecessarily shortened
because of the inability to effectively cool the same, and
furthermore because of the contact of radiant energy with the lamp
which is reflected from the lamp itself or emanates from an
adjacent lamp in a bank of lamps. The present invention obviates
the cooling problem noted, as well as the radiant energy problem
noted by including in the lamp assembly an improved reflector
assembly and cooling structure.
Before describing the preferred embodiment of the improved
reflector assembly and cooling structure of this invention,
reference is directed to FIGS. 4 and 5 which illustrate the
problems encountered in the prior art constructions. FIG. 4 shows a
standard highly polished parabolic metal reflector of the type
commonly used and readily available on the market in conjunction
with lamps of the type noted. Such reflector, designated 36, is
formed from any suitable reflective temperature-resistant material.
A lamp 32 is positioned to extend generally longitudinally through
the focal point of the reflector so that the parabolic
configuration of the reflector base will direct radiant energy
emanating from the filament F of the lamp back towards the body to
be heated. In that regard, it will be noted by arrow 37 in FIG. 4
that a portion of the radiant energy emanating from the filament F
of the lamp will strike the base of the parabolic reflector surface
and will be directed thereby back onto the filament. Such
reflective energy traveling back to the lamp filament tends to
shorten the filament life and, accordingly, the lamp life. Also,
such reflective energy causes overheating of the transparent quartz
envelope surrounding the filament, which produces softening of the
envelope and attendant expansion or bubbling thereof. Such
reflected energy also creates oxidation of the electrical contacts
at the lamp end due to overheating thereof. Thus, such conditions
appreciably shorten lamp life and efficiency.
FIG. 4 also illustrates the standard procedure for cooling such
radiant heat lamps, namely the utilization therewith of a coolant
barrier, designated 39, which extends longitudinally of the lamp.
Such a coolant barrier comprises a transparent sheet, such as a
sheet of quartz, which extends longitudinally of the reflector 36
and the lamp 32. The purpose of such barrier sheet is to retain
cooling air in contact with the lamp during operation thereof. Such
cooling air is introduced longitudinally of the lamp at one end of
the reflector and exits from the other end thereof. However, such
longitudinal coolant flow is not fully effective and does not
produce uniform lamp cooling. Additionally, the requirement for a
quartz or like air barrier complicates the construction of the lamp
assembly unnecessarily.
In FIG. 5 a further prior art arrangement is illustrated, which
possesses the inherent disadvantages noted previously, in
conjunction with a bank of lamps. As illustrated by the arrows 37'
in such figure, the problem of reflected energy from the base of
the reflector 36' onto the filaments of the respective lamps 32 is
encountered. Additionally, as illustrated by arrows 41, the
embodiment of FIG. 5 has the further disadvantage in that radiant
heat energy may pass directly from the filament of one lamp onto
another which further shortens the lamp filament and envelope
effectiveness and life as above noted. The requirement for a quartz
or like for barrier 39' with its inherent disadvantages and
ineffective cooling similarly is encountered in the prior art bank
of lamps shown in FIG. 5.
In the schematic showings of FIGS. 6 and 7, the improved features
of the present invention are illustrated. Such features comprise a
simple yet highly effective modification of the base of the
reflector structure utilized in conjunction with a radiant heat
lamp so that more effective coolant circulation around the lamps
and reaction chamber 12 may be effected and so that reflected
radiant energy back onto the filament of the lamp is precluded. The
schematic showings of FIGS. 6 and 7 should be taken in conjunction
with the detailed showing of the reflector assembly of this
invention, generally designated 46 in FIG. 3.
In the embodiment of FIG. 3, the reflector assembly 46 comprises a
reflector structure defined by a series of adjacent reflector
elements designated 47 adjacent which the respective lamps 32 are
positioned. The reflector assembly illustrated in FIGS. 1 through 3
is defined by a plurality of said reflector segments 47 mounted
closely adjacent each other but in vertically spaced orientation
relative to adjacent segments. Thus, two adjacent reflector
segments 47 cooperate as seen in FIG. 3 to define a single
parabolic reflector surface, designated 48, adjacent which the
respective lamps 32 are positioned.
In that regard, each reflector segment 47 is formed with a
generally triangular tip portion comprising a peak lying between a
pair of highly polished concave reflecting surfaces, the contour of
which is designed to define the parabolic reflecting surface 48
mentioned previously when such reflector segment is positioned
adjacent a similarly contoured reflector segment. However, because
of the vertical spacing of adjacent reflector segments, the base of
each parabolic reflector surface is provided with a discontinuous
or open structure which extends the full length of the reflector.
Each such discontinuous base includes a longitudinal opening or
slot 49 extending therealong as seen in FIG. 3 and illustrated
generally schematically in FIGS. 6 and 7.
As noted in those latter figures, the purpose of each slot 49 is
two-fold, namely to permit the introduction of coolant through the
reflector assembly to pass over and around a lamp to cool the same
so that the temperature thereof may be effectively controlled, and,
secondly, to permit the selective escape of radiant energy
emanating from the filament F of the lamp in the manner seen in
FIG. 7 so that such energy is not reflected directly back onto the
lamp in the manner characteristic of prior known reflector
assemblies so that envelope, end seal and filament damage are
obviated. Thus, efficiency and lamp life are enhanced. Also, as
noted from FIGS. 1 and 2, after the coolant passes over the lamps
32, it contacts the wall of the reaction chamber 12, and passes
thereover prior to exiting through the apertured top of the
reactor. Thus, cool wall deposition reactions as discussed
hereinabove are further enhanced.
Each reflector segment 47 is mounted in its operative position by
securing opposite ends 51 and 52 thereof in any suitable fashion
(by bolting or bonding) to mounting blocks 53 and 54 which extend
vertically of the framework 31 within which the lamp and reflector
assemblies are positioned. The mounting blocks 53 and 54 may be of
any suitable insulating material to preclude unwanted transmission
of heat from the reflector assembly to the framework.
Each reflector segment 47 is formed from any known reflective
material used in the art heretofore. The various parabolic
respective reflecting surfaces 48 preferably are gold plated and
are highly polished for most effective radiant heat energy
transmission. The actual material from which the reflector segments
are formed may be chosen from a list of ceramics or metals which
are known to be capable of withstanding the substantial heat to
which the segments are subjected.
As noted from FIG. 3, each reflector segment in the embodiment
illustrated preferably is hollow in construction and includes a
main recess 56 extending its full length which is in communication
with an open longitudinal slot 57 provided opposite from the peak
between the two curved reflecting surfaces of each segment.
Additionally, a generally semi-spherical extension of the main
recess 56, designated 58, is provided in the tip portion of each
reflector segment for the purpose to be described.
The hollow interior thus provided in the respective reflector
segments is provided therein to admit a coolant fluid into the
interior of the segments to maintain the temperature thereof at a
workable level during operation of the lamp bank assembly. In that
regard, provided in conjunction with the reflector assembly is a
coolant manifold, generally designated 61, defined by a main
conduit 62 which is positioned in operative communication with a
source of coolant fluid (not shown), such as a supply of cool air
under pressure. Branching from the main conduit 62 are a series of
vertically spaced branch conduits 63, each of which is positioned
to extend through openings provided in the side walls 64 of the
framework 31 surrounding the lamp assembly, each such side wall
forming a baffle plate positioned behind the respective reflector
assemblies.
Thus, cooling fluid such as air introduced through the respective
conduits 63 passes into the opening behind the reflector assembly
and such cooling fluid enters the respective hollow interiors of
the reflector segments 47, circulates therein, and passes out
therefrom to subsequently pass between the respective segments
through the slots 49 to pass over the lamps 32. As a result, the
temperature of the reflector segments and of the lamps may be
maintained below the critical level. Additionally, such cooling
fluid also passes over the wall of the reaction chamber 12 to
enhance the cool wall deposition reaction capability carried out in
that chamber as discussed previously herein.
It will be noted that the branch conduits 63 are positioned
generally in line with the slots 57 provided in the respective
reflector segments to insure direct introduction of coolant into
the hollow interiors of the segments for most effective cooling
thereof. With the arrangement illustrated, a cooling fluid may be
introduced into contact with the reflector assembly in a manner
unknown heretofore to cool the reflector segments as well as to
pass therefrom into contact with the high temperature lamps 32 to
maintain the temperature of such lamps at a workable level
also.
FIG. 8 shows a modified arrangement for the cooling structure of
the reflector assembly shown in FIG. 3 which includes additional
means for introducing coolant into contact with the respective
segments 47. In that regard, each such segment is provided with a
fluid conduit, such as a length of copper tubing, designated 66,
positioned in the semi-spherical extension 58 of the hollowed out
interior of each reflector segment. Each such conduit extends
longitudinally for the full length of its associated reflector
segment and such conduit is maintained in position within the
segment by means of a threaded wedge bolt 67 which passes through a
threaded plate member 68 positioned within the hollow interior of
each segment 47. The wedge bolt 67 urges a conduit 66 against the
bottom of extension 58 and holds the same in operative position
within the respective reflector segments.
The conduits 66 may be positioned in the segments during any stage
of production thereof. It should be understood that the respective
conduits in turn are operatively connected with a fluid manifold
(not shown) at each of the opposite ends of the respective
reflector assemblies. The manifold at one end of the assembly
introduces cooling fluid, such as water, through the respective
conduits 66 and the manifold at the other end removes the fluid
from the respective segments after the fluid has passed
longitudinally the length of the respective segments.
With the arrangement shown in FIG. 8, a gaseous coolant such as air
may be introduced into contact with the reflector segments and
lamps 32 in the manner described previously with respect to FIG. 3
and additionally a liquid coolant may be passed longitudinally of
the respective reflector segments to further effectively cool the
same.
It should be understood from the foregoing description that with
the subject arrangement a reflector assembly may be fabricated to
any desired size, depending upon the nature of the work piece or
susceptor to be heated, merely by adding or subtracting reflector
units and lamps from the assembly. In that regard, suitable
fasteners, such as bolts, or other means such as bonding adhesive,
may be utilized to position the reflector segments in place in the
manner seen in FIG. 2.
It should also be noted from FIGS. 3 and 8 that the peaked center
portions of adjacent reflector segments 47 provide shields which
prevent direct radiation from passing between adjacent lamps of the
lamp bank, thereby prolonging lamp life in a fashion not possible
with the prior art arrangement of FIG. 5.
Reference is now directed to FIG. 9 for an illustration of a
modified arrangement of the subject reflector structure. In the
FIG. 9 embodiment, the lamp 32 is held in place in opposed clip
members 33 in the manner described previously, such clip members
being secured to suitable mounting plates corresponding to the
mounting plates 53 and 54 described previously. Such mounting
plates 53 and 54 also provide means for mounting segments of a
reflector in the manner shown. In that regard, the single lamp
reflector illustrated in FIG. 9 comprises a pair of spaced opposed
reflector segments 71 and 72 which define a slot 73 for the passage
of coolant therebetween in the manner described previously. It will
be noted that each of the segments 71 and 72 forms essentially
one-half of a segment of the type described previously.
Additionally, each such segment is generally solid, that is, it
does not include recess portions 56, 57 and 58 described previously
with respect to segments 47. However, the respective segments 71
and 72 each includes a portion of a curved reflective surface of
the type noted previously with the portions of the two segments
cooperating to define a parabolic reflecting surface of the type
described previously. Such parabolic surface is continuous except
for the slotted opening 73 passing therethrough to permit coolant
to be circulated around the lamp 32 as previously noted.
With the arrangement shown in FIG. 9, a single lamp heating unit
may be employed, or a plurality of reflector units of the type
shown in FIG. 9 may be positioned adjacent each other to form a
composite reflector assembly useable with a bank of lamps in an
arrangement similar to that shown in FIGS. 1 through 3.
It should be understood that the slots 49 in the reflector assembly
of FIG. 3 and the slot 73 in the modified arrangement of FIG. 9 may
vary in width to meet particular needs. However, each such slot
should have a width which is at least equal to the thickness of the
filament F of the lamp with which the reflector is to be used so
that radiant energy emanating from the filament and directed
towards the base of an associated parabolic reflecting surface will
pass through the slot and none of such energy will be reflected
directly back to the lamp filament and its surrounding quartz
envelope.
While the subject invention has been illustrated in conjunction
with an upright reactor utilizing a generally barrel shaped
susceptor of the type shown in the aforementioned Rosler et al.
application, it should be understood that reflector assemblies of
this invention may be utilized with horizontal reactors of the type
shown in the aforementioned McNeilly et al. patent. Similarly, as
previously noted, the improved reflector assembly and cooling
structure illustrated herein may be utilized in conjunction with
the heating or other radiant energy treatment of various other
structures in addition to susceptors or substrates used in chemical
vapor deposition reactors as illustrated and described herein.
Furthermore, while this invention has been illustrated herein in
conjunction with an elongated tubular lamp, it should be understood
that the principles disclosed herein are also applicable for use in
effectively cooling other high temperature lamps having
configurations and sizes different from those of the lamp
shown.
Having thus made a full disclosure of this invention, reference is
directed to the appended claims for the scope of protection to be
afforded thereto.
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