U.S. patent application number 16/514987 was filed with the patent office on 2021-01-21 for semiconductor structure and manufacturing method thereof.
This patent application is currently assigned to Taiwan Semiconductor Manufacturing Co., Ltd.. The applicant listed for this patent is Taiwan Semiconductor Manufacturing Co., Ltd.. Invention is credited to Ching-Hua Hsieh, Hsaing-Pin Kuan, Chun-Yen Lan, Chih-Wei Lin, Chun-Cheng Lin, Yu-Wei Lin.
Application Number | 20210020581 16/514987 |
Document ID | / |
Family ID | 1000005313108 |
Filed Date | 2021-01-21 |
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United States Patent
Application |
20210020581 |
Kind Code |
A1 |
Kuan; Hsaing-Pin ; et
al. |
January 21, 2021 |
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
Abstract
A semiconductor structure and a manufacturing method thereof are
provided. A semiconductor structure includes a first semiconductor
die, an insulating encapsulation laterally encapsulating the first
semiconductor die, an electromagnetic shielding structure enclosing
the first semiconductor die and a first portion of the insulating
encapsulation, and a redistribution structure. The electromagnetic
shielding structure includes a first conductive layer and a
dielectric frame laterally covering the first conductive layer. The
first conductive layer surrounds the first portion of the
insulating encapsulation and extends to cover a first side of the
first semiconductor die. The dielectric frame includes a first
surface substantially leveled with the first conductive layer. The
redistribution structure is disposed on a second side of the first
semiconductor die opposing to the first side, and the
redistribution structure is electrically coupled to the first
semiconductor die and the first conductive layer of the
electromagnetic shielding structure.
Inventors: |
Kuan; Hsaing-Pin; (Hsinchu
City, TW) ; Hsieh; Ching-Hua; (Hsinchu, TW) ;
Lin; Chih-Wei; (Hsinchu County, TW) ; Lin;
Chun-Cheng; (New Taipei City, TW) ; Lin; Yu-Wei;
(New Taipei City, TW) ; Lan; Chun-Yen; (Hsinchu,
TW) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Hsinchu |
|
TW |
|
|
Assignee: |
Taiwan Semiconductor Manufacturing
Co., Ltd.
Hsinchu
TW
|
Family ID: |
1000005313108 |
Appl. No.: |
16/514987 |
Filed: |
July 17, 2019 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 21/768 20130101;
H01L 23/28 20130101; H01L 23/5385 20130101; H01L 21/56 20130101;
H01L 23/552 20130101 |
International
Class: |
H01L 23/552 20060101
H01L023/552; H01L 23/28 20060101 H01L023/28; H01L 23/538 20060101
H01L023/538; H01L 21/56 20060101 H01L021/56; H01L 21/768 20060101
H01L021/768 |
Claims
1. A semiconductor structure, comprising: a first semiconductor
die; an insulating encapsulation laterally encapsulating the first
semiconductor die; an electromagnetic shielding structure enclosing
the first semiconductor die and a first portion of the insulating
encapsulation, the electromagnetic shielding structure comprising:
a first conductive layer surrounding the first portion of the
insulating encapsulation and extending to cover a first side of the
first semiconductor die; and a dielectric frame laterally covering
the first conductive layer and comprising a first surface
substantially leveled with the first conductive layer; and a
redistribution structure disposed on a second side of the first
semiconductor die opposing to the first side, and the
redistribution structure electrically coupled to the first
semiconductor die and the first conductive layer of the
electromagnetic shielding structure.
2. The semiconductor structure of claim 1, wherein the dielectric
frame of the electromagnetic shielding structure further comprises
a second surface opposite to the first surface and facing the
redistribution structure, and a surface area of the second surface
is less than that of the first surface.
3. The semiconductor structure of claim 1, wherein the first
conductive layer of the electromagnetic shielding structure
comprises: a cap section covering the first side of the first
semiconductor die and the portion of the insulating encapsulation,
and a rounded corner adjacent to the cap section and comprising a
thickness less than a thickness of the cap section.
4. The semiconductor structure of claim 1, wherein the dielectric
frame of the electromagnetic shielding structure comprises: an
inner sidewall in contact with the first conductive layer, and an
outer sidewall opposite to the inner sidewall and substantially
leveled with a sidewall of the redistribution structure.
5. The semiconductor structure of claim 1, further comprising: a
second semiconductor die disposed aside the first semiconductor
die, laterally encapsulated by a second portion of the insulating
encapsulation, and electrically coupled to the redistribution
structure, wherein the dielectric frame of the electromagnetic
shielding structure is interposed between the first semiconductor
die and the second semiconductor die.
6. The semiconductor structure of claim 5, wherein the
electromagnetic shielding structure further comprising: a second
conductive layer surrounding the second portion of the insulating
encapsulation and extending to cover the second semiconductor die,
wherein the dielectric frame is interposed between the first
conductive layer and the second conductive layer.
7. A semiconductor structure, comprising: semiconductor dies
separately disposed from one another; an insulating encapsulation
laterally covering each of the semiconductor dies; and an
electromagnetic shielding compartment, at least one of the
semiconductor dies and a portion of the insulating encapsulation
disposed within the electromagnetic shielding compartment, the
electromagnetic shielding compartment comprising: a first
dielectric frame; and a first conductive layer disposed along an
inner sidewall of the first dielectric frame and extending to
shield the at least one of the semiconductor dies disposed within
the first dielectric frame, wherein a turning section of the first
conductive layer located at a corner of the insulating
encapsulation is thinner than a cap section of the first conductive
layer located on the at least one of the semiconductor dies.
8. The semiconductor structure of claim 7, wherein the first
dielectric frame comprises a first surface substantially leveled
with the cap section of the first conductive layer.
9. The semiconductor structure of claim 8, wherein the first
dielectric frame further comprises a second surface opposite to the
first surface and substantially leveled with the insulating
encapsulation.
10. The semiconductor structure of claim 7, further comprising: a
redistribution structure disposed on the semiconductor dies, the
insulating encapsulation, and the electromagnetic shielding
compartment, and electrically coupled to the semiconductor dies and
the first conductive layer of the electromagnetic shielding
compartment.
11. The semiconductor structure of claim 7, wherein the
electromagnetic shielding compartment further comprises: a second
dielectric frame in contact with at least an edge of the first
dielectric frame, wherein another one of the semiconductor dies and
another portion of the insulating encapsulation are disposed within
the second dielectric frame; and a second conductive layer disposed
between an inner sidewall of the second dielectric frame and a
sidewall of the another portion of the insulating encapsulation,
and extending to shield the another one of the semiconductor dies
and the another portion of the insulating encapsulation.
12. The semiconductor structure of claim 11, wherein an outer
sidewall of the second dielectric frame of the electromagnetic
shielding compartment is partially in contact with an outer
sidewall of the first dielectric frame of the electromagnetic
shielding compartment.
13. The semiconductor structure of claim 11, wherein the
electromagnetic shielding compartment further comprises: a third
conductive layer disposed along outer sidewalls of the first
dielectric frame and the second dielectric frame and extending to
cover the semiconductor dies unconfined by the electromagnetic
shielding compartment.
14. A manufacturing method of a semiconductor structure,
comprising: forming a conductive material along an outer surface of
a dielectric pattern and extending within an area enclosed by the
dielectric pattern; disposing a first semiconductor die on the
conductive material in the area enclosed by the dielectric pattern;
forming an insulating material on the conductive material at least
in the area enclosed by the dielectric pattern to cover the first
semiconductor die; and leveling the insulating material, the
dielectric pattern, and the conductive material to respectively
form an insulating encapsulation, a dielectric frame of an
electromagnetic shielding compartment, and a conductive layer of
the electromagnetic shielding compartment, wherein an active
surface of the first semiconductor die is accessibly revealed by
the insulating encapsulation.
15. The manufacturing method of claim 14, wherein before forming
the conductive material, a dielectric material is formed and cured
to form the dielectric pattern with a bell-shaped profile in a
cross section.
16. The manufacturing method of claim 14, wherein providing the
dielectric pattern with a predetermined thickness greater than a
thickness of the semiconductor die, and thinning the dielectric
pattern to be substantially leveled with the semiconductor die.
17. The manufacturing method of claim 14, wherein the conductive
material is formed on the outer surface of the dielectric pattern
and extends outside the area enclosed by the dielectric pattern,
and before forming the insulating material, a second semiconductor
die is disposed on the conductive material outside the area
enclosed by the dielectric pattern.
18. The manufacturing method of claim 17, wherein the insulating
material is formed on the conductive material at a region where the
second semiconductor die is disposed on, and after leveling the
insulating material, the second semiconductor die is laterally
encapsulated by the insulating encapsulation.
19. The manufacturing method of claim 14, further comprising:
electrically coupling a redistribution structure to the first
semiconductor die and the conductive layer of the electromagnetic
shielding compartment after leveling the insulating material, the
dielectric pattern, and the conductive material.
20. The manufacturing method of claim 19, further comprising:
cutting through the dielectric frame of the electromagnetic
shielding compartment and the redistribution structure.
Description
BACKGROUND
[0001] The semiconductor industry has experienced rapid growth due
to continuous improvements in the integration density of a variety
of electronic components (e.g., transistors, diodes, resistors,
capacitors, etc.). For the most part, these improvements in
integration density have come from repeated reductions in minimum
feature size, which allows more components to be integrated into a
given area. Technological advances in integrated circuit (IC)
design have produced generations of ICs where each generation has
smaller and more complex circuit designs than the previous
generation. For example, various types and dimensions of
semiconductor structures performing different functionalities are
integrated and packaged into an integrated fan-out package, and
numerous manufacturing operations are implemented for integration
of various types of semiconductor packages. In the currently
fabricated integrated fan-out packages, an electromagnetic
interference (EMI) shielding structure may be used to shield the
semiconductor components which require isolation from external EMI.
However, there are more challenges to modify a semiconductor
package and improve the manufacturing operations.
BRIEF DESCRIPTION OF THE DRAWINGS
[0002] Aspects of the present disclosure are best understood from
the following detailed description when read with the accompanying
figures. It is noted that, in accordance with the standard practice
in the industry, various features are not drawn to scale. In fact,
the dimensions of the various features may be arbitrarily increased
or reduced for clarity of discussion.
[0003] FIG. 1 is a schematic top plan view illustrating a
configuration of semiconductor dies and electromagnetic shielding
structures in an intermediate state of formation of a semiconductor
structure.
[0004] FIGS. 2A, 2B, 3A, 3B, 4A, 4B, 5A, 5B, 6A, 6B, 7, 8, and 9
illustrate various stages in the formation of a semiconductor
structure, in accordance with some exemplary embodiments of the
disclosure.
[0005] FIG. 10 is a schematic, enlarged cross-sectional view of the
dashed area A outlined in FIG. 2B, in accordance with some
exemplary embodiments of the disclosure.
[0006] FIG. 11 is a schematic, enlarged cross-sectional view of the
dashed area B outlined in FIG. 3B, in accordance with some
exemplary embodiments of the disclosure.
[0007] FIG. 12 is a schematic, enlarged cross-sectional view of the
dashed area C outlined in FIG. 6B, in accordance with some
exemplary embodiments of the disclosure.
[0008] FIG. 13 is a schematic, enlarged cross-sectional view of the
dashed area D outlined in FIG. 6B, in accordance with some
exemplary embodiments of the disclosure.
[0009] FIG. 14A is a schematic top plan view illustrating a
semiconductor structure before performing a singulation process in
accordance with some exemplary embodiments of the disclosure.
[0010] FIG. 14B is a schematic cross-sectional view of a
semiconductor structure taken along section line 14B-14B of FIG.
14A after singulating along scribe lines, in accordance with some
exemplary embodiments of the disclosure.
[0011] FIG. 15A is a schematic top plan view illustrating a
semiconductor structure before performing a singulation process in
accordance with some exemplary embodiments of the disclosure.
[0012] FIG. 15B is a schematic cross-sectional view of a
semiconductor structure taken along section line 15B-15B of FIG.
15A after singulating along scribe lines, in accordance with some
exemplary embodiments of the disclosure.
[0013] FIG. 15C is a schematic cross-sectional view of a
semiconductor structure taken along section line 15B-15B of FIG.
15A after singulating along scribe lines, in accordance with some
exemplary embodiments of the disclosure.
DETAILED DESCRIPTION
[0014] The following disclosure provides many different
embodiments, or examples, for implementing different features of
the provided subject matter. Specific examples of components and
arrangements are described below to simplify the present
disclosure. These are, of course, merely examples and are not
intended to be limiting. For example, the formation of a first
feature over or on a second feature in the description that follows
may include embodiments in which the first and second features are
formed in direct contact, and may also include embodiments in which
additional features may be formed between the first and second
features, such that the first and second features may not be in
direct contact. In addition, the present disclosure may repeat
reference numerals and/or letters in the various examples. This
repetition is for the purpose of simplicity and clarity and does
not in itself dictate a relationship between the various
embodiments and/or configurations discussed.
[0015] Further, spatially relative terms, such as "beneath,"
"below," "lower," "above," "upper" and the like, may be used herein
for ease of description to describe one element or feature's
relationship to another element(s) or feature(s) as illustrated in
the figures. The spatially relative terms are intended to encompass
different orientations of the device in use or operation in
addition to the orientation depicted in the figures. The apparatus
may be otherwise oriented (rotated 90 degrees or at other
orientations) and the spatially relative descriptors used herein
may likewise be interpreted accordingly.
[0016] Other features and processes may also be included. For
example, testing structures may be included to aid in the
verification testing of the 3D packaging or 3DIC devices. The
testing structures may include, for example, test pads formed in a
redistribution layer or on a substrate that allows the testing of
the 3D packaging or 3DIC, the use of probes and/or probe cards, and
the like. The verification testing may be performed on intermediate
structures as well as the final structure. Additionally, the
structures and methods disclosed herein may be used in conjunction
with testing methodologies that incorporate intermediate
verification of known good dies to increase the yield and decrease
costs.
[0017] FIG. 1 is a schematic top plan view illustrating a
configuration of semiconductor dies and electromagnetic shielding
structures in an intermediate state of formation of a semiconductor
structure, in accordance with some exemplary embodiments of the
disclosure. Referring to FIG. 1, a plurality of semiconductor dies
SD and electromagnetic shielding structures SS are illustrated. It
should be noted that the semiconductor dies SD and electromagnetic
shielding structures SS may be fabricated from a variety of
materials such as metals (copper, aluminum, gold, etc.) and
polymers (polyimide, PBO, epoxy, etc.), various features of the
semiconductor dies SD and the electromagnetic shielding structures
SS are omitted from FIG. 1 for the sake of clarity, and the details
thereof will be description later in other embodiments. The various
semiconductor dies SD performing the same or different functions
are separately disposed on a temporary carrier 10. In some
embodiments, the electromagnetic shielding structures SS may
include a plurality of discrete elements. For example, the discrete
elements may be formed as frames or rings for encircling the
semiconductor dies SD therein. For example, the electromagnetic
shielding structures SS define a plurality of compartments, and one
or more than one semiconductor dies SD may be disposed within one
of the compartments.
[0018] In some embodiments, the electromagnetic shielding
structures SS include the shape of a square, a rectangular, a
circle, an oval, a polygon, a zig-zag, or other irregular shape(s)
in a top plan view. The dimension of the electromagnetic shielding
structures SS may vary with the size or the number of semiconductor
dies SD enclosed therein. The semiconductor dies SD and the
electromagnetic shielding structures SS may be disposed as a
plurality of groups (e.g., GP and GP') on a temporary carrier 10.
In some embodiments, after formation, the semiconductor dies SD and
the electromagnetic shielding structure SS in each group (e.g., GP
or GP') may be packaged to form a system in package (SiP). The
structures in some groups GP/GP' may be identical to one another
for ease of fabrication. It should be appreciated that the
configuration shown in FIG. 1 merely serves as an illustrative
example. It should also be noted that the electromagnetic shielding
structures SS may be formed according to a variety of shapes,
sizes, or configurations, and are not limited to the examples
illustrated herein. Different arrangements of the group GP/GP'
including various sizes of semiconductor dies SD and/or
electromagnetic shielding structure SS may be employed depending on
the design requirements.
[0019] FIGS. 2A, 2B, 3A, 3B, 4A, 4B, 5A, 5B, 6A, 6B, 7, 8, and 9
illustrate various stages in the formation of a semiconductor
structure, in accordance with some exemplary embodiments of the
disclosure. The group GP outlined in FIG. 1 is taken as an
illustrative example to show a manufacturing method of a
semiconductor structure. In addition, FIGS. 2A, 2B, 3A, 3B, 4A, 4B,
5A, 5B, 6A, and 6B are top plan and cross-sectional views, where
figures ending with an "A" designation are top plan views, and
figures ending with a "B" designation are cross-sectional views
taken along section lines (e.g., a section line 2B-2B in FIG. 2A, a
section line 3B-3B in FIG. 3A, a section line 4B-4B in FIG. 4A, a
section line 5B-5B in FIG. 5A, and a section line 6B-6B in FIG. 6A)
of the corresponding top plan view. FIG. 10 is a schematic,
enlarged cross-sectional view of the dashed area A outlined in FIG.
2B, FIG. 11 is a schematic, enlarged cross-sectional view of the
dashed area B outlined in FIG. 3B, FIG. 12 is a schematic, enlarged
cross-sectional view of the dashed area C outlined in FIG. 6B, and
FIG. 13 is a schematic, enlarged cross-sectional view of the dashed
area D outlined in FIG. 6B, in accordance with some exemplary
embodiments of the disclosure.
[0020] Referring to FIG. 2A, FIG. 2B, and FIG. 10, a dielectric
pattern 110 is formed over the temporary carrier 10. The temporary
carrier 10 may include a temporary material during processing, such
as a glass substrate, a ceramic substrate, a metal carrier, a
carrier made of polymer, a silicon wafer, or the like. In some
embodiments, a release layer 11 is formed over the temporary
carrier 10 to enhance the releaseability between the subsequently
formed structure and the temporary carrier 10. For example, the
release layer 11 includes a layer of light-to-heat-conversion
(LTHC) release coating and a layer of associated adhesive. The
dielectric pattern 110 may be formed in one or multiple ring
shape(s) around the predetermined area(s). In some embodiments, the
dielectric pattern 110 may be formed as a wall structure having a
closed-loop shape in a top plan view. It will be appreciated that
the dielectric pattern 110 may form other shapes and still achieve
its purposes. In some embodiments, the dielectric pattern 110
includes more than one wall structures (e.g., a first wall
structure 112 and a second wall structure 114). For example, the
first wall structure 112 and the second wall structure 114 are
integratedly formed. The first wall structure 112 may have at least
one edge in contact with one edge of the second wall structure 114.
In some embodiments, an outer sidewall of the first wall structure
112 is partially connected to an outer sidewall of the second wall
structure 114 (as the illustration of the group GP' in FIG. 1). In
other embodiments, the first wall structure 112 and the second wall
structure 114 of the dielectric pattern 110 may share at least one
sidewall. For example, an entirety of the outer sidewall of the
first wall structure 112 is connected to the outer sidewall of the
second wall structure 114. The configuration of the dielectric
pattern 110 may be adjusted depending on the design requirements,
which is not limited thereto.
[0021] In some embodiments, the first wall structure 112 and the
second wall structure 114 respectively define a first opening area
112a and a second opening area 114a. The first opening area 112a
enclosed by the first wall structure 112 and the second opening
area 114a enclosed by the second wall structure 114 may be sized to
accommodate the subsequently disposed semiconductor dies (e.g., the
dashed boxes located within the first opening area 112a and the
second opening area 114a as illustrated in FIG. 2A). It should be
noted that as shown in FIG. 2A, the dashed boxes located outside
the first wall structure 112 and the second wall structure 114
indicate the reserved space for other semiconductor dies.
[0022] The dielectric pattern 110 may include a polymeric material,
such as an epoxy, a resin, polyimide, polybenzoxazole (PBO),
benzocyclobutene (BCB), the like, or a combination thereof. In some
embodiments, the dielectric pattern 110 is made of a filler-free
polymer. In other embodiments, the material of the dielectric
pattern 110 includes a plurality of non-conductive particulate
fillers dispersed in the polymeric base material. In some
embodiments, the dielectric pattern includes a curable material
such as an ultraviolet (UV) cured resin. For example, a dielectric
material may be provided in semi-liquid form and may be
subsequently cured to harden so as to from the dielectric pattern
110. In some embodiments, the dielectric material may be at
intermediate stage between liquid and fully cured polymer, and the
dielectric material may be fully cured together with the
subsequently formed conductive material. The dielectric pattern 110
may be formed using ink jet printing, spraying, or dispensing,
optionally followed by a curing step. The curing process may
include a ultra-violet (UV) light exposure process, an infrared
(IR) energy exposure process, combinations thereof, or a
combination thereof with a heating process. Other suitable
processes may be used to form the dielectric pattern 110.
Alternatively, the dielectric pattern 110 is pre-formed and
disposed over the temporary carrier 10 using a pick and place
process.
[0023] In some embodiments, after performing the curing process,
the dielectric pattern 110 (e.g., the first wall structure 112 and
the second wall structure 114) includes a top 110T and a bottom
110B. The top 110T may have a curve surface such as a hemispherical
shape, a semi-ellipsoidal shape, or a reverse U-shaped profile in a
cross section. For example, the bottom profile of the dielectric
pattern 110 is formed in a shape of an exponential curve in a cross
section. In some embodiments, the dielectric pattern 110 has a
bell-shaped profile in a cross section as shown in FIG. 10. In
other embodiments in which the dielectric pattern 110 is pre-formed
or formed by other techniques, the first wall structure 112 and the
second wall structure 114 may have substantially vertical sidewalls
without the footing bottom, and the top 110T of the first wall
structure 112 and the second wall structure 114 may be rounded or
substantially flat.
[0024] Continue to FIG. 10, in an exemplary embodiment, the
dielectric pattern 110 includes a ratio of a height H to a bottom
width W4 of a bottom surface Db (i.e. a first surface) greater than
1 or substantially equal to 1. In some embodiments, a ratio of the
height H to the bottom width W4 of the dielectric pattern 110 is
less than 1. In some embodiments, the top 110T of the dielectric
pattern 110 (e.g., the portion having a hemispherical profile) may
be considered sacrificial in the sense that the top 110T is
ultimately removed (the process will be described later in FIG. 6A
and FIG. 6B). For example, the boundary BL outlined in dashed
indicates the borderline of the sacrificial top and the remaining
portion RP. In some embodiments, a ratio of a height Hs of the
sacrificial top to a height Hr of the remaining portion RP is about
1:2. For example, a ratio of a height Hr of the remaining portion
RP to the bottom width W4 is less than 1 (e.g., in a range of about
0.7 to about 1.5) or substantially equal to 1. It should be noted
that other ratios are also possible depending on the sizes of the
dielectric pattern 110 and the to-be-disposed semiconductor dies.
In some embodiments, the remaining portion RP including the bottom
110B has a width W3 opposite to the bottom width W4, and a sloped
sidewall S connected to the bottom width W4 and the width W3. The
bottom width W4 is greater than the width W3. In some embodiments,
the sloped sidewall S slopes from the bottom 110B upwardly towards
the boundary BL at an angle less than or substantially equal to 90
degrees, creating a footing profile at the bottom of the dielectric
pattern 110. The bottom 110B includes a footing part FP extending
outwardly. The footing part FP includes various footing widths
(e.g., F1, F2) in a cross section. The maximum footing widths F1
and F2 of the footing part FP may be substantially uniform or may
not be uniform in a cross section (e.g., as shown in FIG. 10). In
some embodiments, a ratio of the maximum footing width (e.g., F1
plus F2) of the footing portion FP to the total bottom width W4 of
the bottom surface Db is about 20% to about 50%. It should be noted
that other ratios are also possible depending on the material and
the process technology of formation of the dielectric pattern
110.
[0025] Referring to FIG. 3A, FIG. 3B, and FIG. 11, a conductive
material 120 is formed on the dielectric pattern 110. For example,
the conductive material 120 is formed along an outer surface of the
dielectric pattern 110 and extending within the areas (e.g., the
first opening area 112a and the second opening area 114a) enclosed
by the dielectric pattern 110. The conductive material 120 may be a
conformal blanket layer covering the dielectric pattern 110, the
first opening area 112a, the second opening area 114a, and the area
outside the dielectric pattern 110. In some embodiments, the
conductive material 120 is formed over the temporary carrier 10,
following the contour of the first wall structure 112 and the
second wall structure 114. It should be noted that as shown in FIG.
3A, the first wall structure 112 and the second wall structure 114
are illustrated by the dot-dash lines to indicate the dielectric
pattern 110 is covered by the conductive material 120 at this
stage.
[0026] For example, the conductive material 120 is formed by spray
coating, sputtering, plating, a combination thereof, or other
suitable deposition process. In some embodiments, the conductive
material 120 includes a conductive paste (e.g., silver paste,
copper paste, etc.) and may be sprayed on the dielectric pattern
110 and the release layer 11. Subsequently, the conductive paste is
cured to form the conductive material 120. In some embodiments, the
dielectric pattern 110 is fully cured when performing the curing
process onto the conductive paste. The conductive paste may include
an adhesive base material and conductive fillers (e.g., pure metal
(e.g., copper, silver, gold, etc.) particles, metal alloy (e.g.,
copper-silver alloy) particles, or the mixture thereof, etc.) mixed
with the adhesive base material. In some embodiments, a seed
material including a titanium/copper composite layer (not shown) is
sputtered on the dielectric pattern 110 and the release layer 11,
and then a copper layer (not shown) is plated on the seed material
to form the conductive material 120.
[0027] Continue to FIG. 11, in some embodiments, the conductive
material 120 has varying thicknesses (e.g., T1, T2, and T3). For
example, the thickness of the conductive material 120 may be in a
range of about 10 .mu.m to about 20 .mu.m. Other thickness of the
conductive material 120 may also be possible depending on the
design requirements. It should be appreciated that the illustration
of the dielectric pattern 110 and the conductive material 120 are
schematic and are not in scale. The conductive material 120 formed
on different locations may have different thickness. In some
embodiments, the thickness T1 of a portion of the conductive
material 120 formed on the release layer 11 is greater than the
thickness T2 of a portion of the conductive material 120 formed on
the bottom 110B of the dielectric pattern 110. The thickness T2 may
correspond to the turning section of the bottom 110B of the
conductive material 120. The thickness T3 of a portion of the
conductive material 120 formed on the sidewall of the dielectric
pattern 110 may be greater than the thickness T2 of the portion of
the conductive material 120. The portion of the conductive material
120 formed on the bottom 110B of the dielectric pattern 110 may
have a smallest thickness. The thickness T1 may be substantially
equal to or slightly greater than the thickness T3. Alternatively,
the thickness T3 may be slightly greater than the thickness T1.
[0028] Referring to FIG. 4A and FIG. 4B, a plurality of
semiconductor dies (e.g., SD1, SD2, SD3, SD4) are disposed on the
conductive material 120, and at least one of the semiconductor dies
(e.g., SD1, SD3) may be disposed within the area enclosed by the
dielectric pattern 110. Other semiconductor dies (e.g., SD2, SD4)
may be disposed in the unconfined area UA (e.g., the region outside
the area confined by the dielectric pattern 110). It should be
appreciated that although only semiconductor dies SD1 and SD3 are
respectively disposed within the first opening area 112a and the
second opening area 114a, the first opening area 112a and the
second opening area 114a can accommodate more semiconductor dies.
In some embodiments, each semiconductor die (e.g., SD1, SD2, SD3,
SD4) is provided with a bonding layer 130 attached to a back
surface BS of the respective semiconductor die (e.g., SD1, SD2,
SD3, SD4). The bonding layer 130 may be or may include a LTHC
material, a die attach film (DAF), or the like. For example, the
semiconductor dies (e.g., SD1, SD2, SD3, SD4) may be bonded to the
conductive material 120 through the bonding layer 130.
[0029] Each of the semiconductor dies (e.g., SD1, SD2, SD3, SD4)
may include a semiconductor substrate 212, a plurality of
conductive contacts 214 disposed on the semiconductor substrate
212, and a protection layer 216 disposed on the semiconductor
substrate 212 and covering the conductive contacts 214. The
semiconductor substrate 212 may be a silicon substrate including
active components (e.g., transistors, or the like) and/or passive
components (e.g., resistors, capacitors, inductors, or the like)
formed therein. The conductive contacts 214 may include conductive
bumps and/or conductive pads. A material of the protection layer
216 may include polyimide (PI), polybenzoxazole (PBO),
benzocyclobutene (BCB), combinations thereof, or a dielectric layer
formed by other suitable polymers. In some embodiments, the
protection layer 216 is thick enough to cover the conductive
contacts 214, thereby preventing the conductive contacts 214 from
damage during processing. Alternatively, the protection layer 216
is omitted and the conductive contacts 214 are exposed. It should
be noted that various layers and features (e.g., an interconnection
layer, a passivation layer, a post-passivation layer, etc.) of the
semiconductor dies are omitted from the figures.
[0030] In some embodiments, the semiconductor dies (e.g., SD1, SD2,
SD3, SD4) may be the same type of dies or different types of dies
performing various functions. For example, the semiconductor dies
(e.g., SD1, SD2, SD3, SD4) may include a radio frequency (RF)
integrated circuit die, a baseband (BB) die, a WiFi die, an
integrated passive device (IPD), a surface mount device (SMD), an
application-specific integrated circuit (ASIC) die, a sensor die, a
memory die, a logic die, a digital die, an analog die, a passive
component die, a micro-electro mechanical system (MEMS) die,
combinations thereof, or other suitable types of die(s). In some
embodiments, the semiconductor dies (e.g., SD1, SD2, SD3, SD4) may
be referred as a chip or an integrated circuit of combination-type.
For example, one of the semiconductor dies (e.g., SD1, SD2, SD3,
SD4) may be a WiFi chip simultaneously including both of a RF die
and a digital die. It should be noted that different types of the
semiconductor dies may have different components formed therein,
and the semiconductor dies (e.g., SD1, SD2, SD3, SD4) throughout
the drawings are merely intended to be illustrative and are not
intended to limit the embodiments. In some embodiments, any types
of the semiconductor dies which require isolation from external
electromagnetic interference (EMI) may be disposed within the first
opening area 112a and/or the second opening area 114a. Since RF
dies may be more susceptible to electromagnetic interference than
logic dies, in some embodiments, at least one of the semiconductor
dies (e.g., SD1, SD3) including RF components may be disposed on
the conductive material 120 and within the first opening area 112a
and/or the second opening area 114a such that a leakage of RF
signals generated by the RF die out of the semiconductor structure
may be prevented.
[0031] Continue to FIG. 4B, the dielectric pattern 110 is formed
with a predetermined thickness (or highness) greater than a
thickness of the semiconductor die (e.g., SD1, SD2, SD3, SD4), and
after disposing the semiconductor dies SD1, SD2, SD3, SD4, the top
of dielectric pattern 110 is higher than the top of semiconductor
dies SD1, SD2, SD3, SD4 using the temporary carrier 10 as a
reference plane. In some embodiments, the dielectric pattern 110 is
about 10% higher than the semiconductor dies SD1, SD2, SD3, SD4. In
some embodiments, a shortest distance Dl measured from a top
surface of the protection layer 216 of respective semiconductor die
(e.g., SD1, SD2, SD3, SD4) to the temporary carrier 10 is less than
a shortest distance D2 measured from a top surface of the
conductive material 120 covering the rounded top 110B of the
dielectric pattern 110 to the temporary carrier 10. For example,
the shortest distance D2 may be greater than the shortest distance
D1 at least about 20 .mu.m.
[0032] In other embodiments, the shortest distance D1 and the
shortest distance D2 are substantially equal. It should be noted
that the difference of the shortest distances D1 and D2 may vary
with process technology, the dimensions of the dielectric pattern
and the semiconductor dies, which is not limited in the disclosure.
In some embodiments, after disposing the semiconductor dies SD1 and
SD3 within the first opening area 112a and the second opening area
114a, a first trench TR1 is formed between the semiconductor die
SD1 and the conductive material 120 covering the inner sidewalls of
the first wall structure 112. Similarly, a second trench TR2 is
formed between the semiconductor die SD3 and the conductive
material 120 covering the inner sidewalls of the second wall
structure 112. In some embodiments, a width W1 of the first trench
TR1 and a width W2 of the second trench TR2 may be in a range of
about 50 um to about 500 um. The width W1 of the first trench TR1
and the width W2 of the second trench TR2 may be substantially
equal or different. The widths W1 and W2 may be adjusted depending
on the material or process technology of the subsequently formed
insulting encapsulation.
[0033] Referring to FIG. 5A and FIG. 5B, an insulting material 130'
is formed on the conductive material 120 to encapsulate the
semiconductor dies SD1, SD2, SD3, and SD4. It should be noted that
as shown in FIG. 5A, the semiconductor dies SD1, SD2, SD3, and SD4
are illustrated by the dash lines to indicate they are covered by
the insulting material 130' at this stage. The insulating material
130' may fill the first trench TR1 and the second trench TR2 to be
in physical contact with the sidewalls of the semiconductor dies
SD1 and SD3. The insulating material 130' may be formed in the
unconfined area UA to at least cover the sidewalls of the
semiconductor dies SD2 and SD4 which are disposed in the unconfined
area UA. For example, the semiconductor dies SD1, SD2, SD3, and SD4
are over-molded by compression molding, transfer molding, or other
suitable techniques. The insulating material 130' may include a low
moisture absorption rate and may be rigid after solidification for
protecting the semiconductor dies SD1, SD2, SD3, and SD4. For
example, the insulating material 130' includes a molding compound
(e.g., epoxy resins), a molding underfill, or other suitable
electrically insulating materials. In some embodiments, the
insulating material 130' includes a base material 134 (e.g., a
polymer, a resin, an epoxy, etc.) and a plurality of filler
particles 135 (e.g., dielectric particles of SiO.sub.2,
Al.sub.2O.sub.3, silica, etc.) distributed in the base material 134
as depicted in the enlarged views of FIG. 12 and FIG. 13.
[0034] Referring to FIG. 6A, FIG. 6B, FIG. 12, and FIG. 13, a
planarization process is performed onto the insulating material
130', the dielectric pattern 110, and the conductive material 120
to respectively form an insulating encapsulation 130, a dielectric
frame DF of an electromagnetic shielding compartment 100, and a
conductive layer CL of the electromagnetic shielding compartment
100. The planarization process may include mechanical grinding,
chemical mechanical polishing (CMP), etch back technique, or the
like. The excess portions of the insulating material 130' over the
semiconductor dies SD1, SD2, SD3, and SD4 are removed, and the
respective semiconductor die SD1, SD2, SD3, and SD4 is at least
laterally encapsulated by the insulating encapsulation 130 for
protection.
[0035] In some embodiments, during the planarization process, the
protection layer 216 and/or the conductive contacts 214 may be
slightly grinded until the conductive contacts 214 are accessibly
revealed for further electrical connection. The surface that the
conductive contacts 214 are exposed may be referred to as an active
surface AS of respective semiconductor die SD1, SD2, SD3, and SD4.
It should be noted that the conductive contacts 214 of respective
semiconductor die (e.g., SD1, SD2, SD3, and SD4) are omitted in the
top view of FIG. 6A.
[0036] In some embodiments, during the planarization process, the
first wall structure 112 and the second wall structure 114 of the
dielectric pattern 110 are truncated or thinned to respectively
form a first dam DF1 and a second dam DF2 of the dielectric frame
DF. When the first wall structure 112 and the second wall structure
114 of the dielectric pattern 110 are truncated, a portion of the
conductive material 120 covering the truncated part of the
dielectric pattern 110 is also removed. For example, the rounded
top 110T (e.g., shown in FIG. 10) of the dielectric pattern 110 and
the conductive material 120 formed on the rounded top 110 are
removed during the planarization process. In some embodiments,
after performing the planarization process, a flat top surface Dt
of the dielectric frame DF and a flat top surface Ct of the
conductive layer CL are formed. After performing the planarization
process, the top surface 130t of the insulating encapsulation 130,
the top surface Dt of the dielectric frame DF, the top surface Ct
of the conductive layer CL, and the active surface AS of the
semiconductor dies (e.g., SD1, SD2, SD3, and SD4) are substantially
leveled.
[0037] In some embodiments, the width (or diameter) W3 of the top
surface Dt of the dielectric frame DF is less than the bottom width
W4 of the bottom surface Db of the dielectric frame DF. A surface
area of the top surface Dt of the dielectric frame DF may be less
than a surface area of the bottom surface Db of the dielectric
frame DF. In alternative embodiments in which the dielectric
pattern has substantially vertical sidewalls without the footing
bottom, the surface areas of the top surface and the bottom surface
of the dielectric frame may be substantially equal. In some
embodiments, the top portion of the dielectric frame DF may include
sidewalls inclined toward each other, and the conductive layer CL
following the profile of the dielectric frame DF may also include
sidewalls inclined toward each other in a cross section as
illustrated in FIG. 12.
[0038] In some embodiments, after performing the planarization
process, some of the filler particles of the insulating material
130' may be partially removed as shown in FIG. 12. In certain
embodiments in which the conductive material 120 includes the
conductive fillers, after performing the planarization process,
some of the conductive fillers may also be partially removed. After
the planarization process, the insulating encapsulation 130 may
include a plurality of discrete portions separated by the
dielectric frame DF. For example, a first portion 131 of the
insulating encapsulation 130 is disposed between the first dam DF1
and the semiconductor die SD1 to spatially separate the
electromagnetic shielding compartment 100 and the semiconductor die
SD1. A second portion 132 of the insulating encapsulation 130 may
be disposed between the second dam DF2 and the semiconductor die
SD2 to spatially separate the electromagnetic shielding compartment
100 and the semiconductor die SD2. The insulating encapsulation 130
may further include a third portion 133 disposed outside the
electromagnetic shielding compartment 100 to surround the
semiconductor dies SD3 and SD4. In some embodiments in which the
dielectric frame DF includes the footing bottom, the bottom corners
of the insulating encapsulation 130 may be rounded as shown in FIG.
13.
[0039] The conductive layer CL may include a first inner portion
C1, a second inner portion C2, and a third outer portion C3. For
example, the first inner portion C1 has two opposite sides which
are respectively in physical contact with the inner sidewalls of
the first dam DF1 and the first portion 131 of the insulating
encapsulation 130. The first inner portion C1 may serve as an
electromagnetic interference (EMI) shielding to the semiconductor
dies shielded therein. The second inner portion C2 may have two
opposite sides which are respectively in physical contact with the
inner sidewalls of the second dam DF2 and the second portion 132 of
the insulating encapsulation 130. The third outer portion C3 may be
located between the third portion of the 133 of the insulating
encapsulation 130 and the dielectric frame DF. For example, the
first dam DF1 and the second dam DF2 of the dielectric frame DF may
be formed in one-piece, and the third outer portion C3 is a
continuous layer covering the outer sidewalls of the first dam DF1
and the second dam DF2. In some embodiments, a turning section TS
of the first inner portion C1 (or the second inner portion C2) in
physical contact with the bottom corner of the insulating
encapsulation 130 and the footing bottom of the first dam DF1 may
be thinner than other sections of the first inner portion C1 (or
the second inner portion C2) as shown in FIG. 13.
[0040] Referring to FIG. 7, a redistribution structure 140 is
formed on the insulating encapsulation 130, the electromagnetic
shielding compartment 100, and the semiconductor dies SD1, SD2,
SD3, and SD4. The redistribution structure 140 may include a
patterned dielectric layer 142 and a patterned conductive layer
144. The patterned conductive layer 144 may be referred to as a
redistribution circuit layer and may include various conductive
features (e.g., patterns, lines, vias, pads, etc.). For example,
the patterned conductive layer 144 includes a conductive pattern
144a and a plurality of conductive vias 144b connected to the
conductive pattern 144a. In some embodiments, the patterned
conductive layer 144 of the redistribution structure 140 may
provide signal, power, and ground connections to the semiconductor
dies (e.g., SD1, SD2, SD3, and SD4). For example, a portion of the
conductive vias 144b or conductive pattern 144a is electrically
coupled to a ground contact (e.g., a contact configured to be
connected to an electrical ground; not labeled).
[0041] In an exemplary embodiment, the manufacturing method of the
redistribution structure 140 includes at least the following steps.
The patterned dielectric layer 142 is formed on the top surface
130t of the insulating encapsulation 130, the top surface Dt of the
dielectric frame DF, the top surface Ct of the conductive layer CL,
and the active surface AS of the semiconductor dies (e.g., SD1,
SD2, SD3, and SD4) using lithography and etching or other suitable
deposition process. The patterned dielectric layer 142 may include
a plurality of openings (not shown) exposing at least a portion of
the conductive contacts 214 of the semiconductor dies (e.g., SD1,
SD2, SD3, and SD4) and at least a portion of the top surface Ct of
the conductive layer CL of the electromagnetic shielding
compartment 100. Next, a conductive material is formed and
patterned on the surface of the patterned dielectric layer 142 and
inside the openings of the patterned dielectric layer 142 to form
the patterned conductive layer 144. The conductive pattern 144a may
be the portion of the patterned conductive layer 144 formed on the
surface of the patterned dielectric layer 142, and the conductive
vias 144b may be the portion of the patterned conductive layer 144
formed in the openings of the patterned dielectric layer 142. Some
of the conductive vias 144b are in physical and electrical contact
with the conductive contacts 214. Some other conductive vias 144b
may be in physical and electrical contact with the first inner
portion C1 (and the second inner portion C2; not shown) of the
conductive layer CL. In some embodiments, the conductive vias 144b
not electrically connected to the semiconductor dies (e.g., SD1,
SD3) may be employed to ground an EMI shield. The third outer
portion C3 of the conductive layer CL may be or may not be in
electrical contact with the patterned conductive layer 144 of the
redistribution structure 140. The abovementioned steps may be
performed multiple times to obtain a multi-layered redistribution
structure as required by the circuit design. In some embodiments,
the topmost one of the patterned conductive layers 144 includes
under-ball metallurgy (UBM) pattern for the subsequent
ball-mounting process. Alternatively, the patterned conductive
layer may be formed prior to the formation of the patterned
dielectric layer. In addition, the numbers of the patterned
dielectric layer and the patterned conductive layer may be selected
based on demand, which are not limited in the disclosure.
[0042] Continue to FIG. 7, one or more conductive terminals 150 are
formed on the topmost one of the patterned conductive layers 144.
The conductive terminals 150 may be electrically coupled to the
semiconductor dies SD1, SD2, SD3, and SD4 through the
redistribution structure 140. In some embodiments, the conductive
terminals 150 include conductive materials with low resistivity,
such as Sn, Pb, Ag, Cu, Ni, Bi, or an alloy thereof. The conductive
terminals 150 may be solder balls, ball grid array (BGA) balls, or
other suitable conductive materials formed in other shapes. For
example, the conductive terminals 150 are disposed on the UBM
pattern of the patterned conductive layer 144 using a ball
placement process and an optional reflow process. It should be
noted that the number, the dimension, and the shape of the
conductive terminals 150 are provided for illustrative purposes,
which construe no limitation in the disclosure. In some
embodiments, the ground contact of the semiconductor die (e.g.,
SD1) is coupled to the electrical ground (not shown) through one of
the conductive terminals 150.
[0043] Referring to FIG. 8 and FIG. 9, after the conductive
terminals 150 are formed, the temporary carrier 10 may be detached
from the electromagnetic shielding compartment 100. In some
embodiments in which the release layer 11 is a LTHC layer, suitable
light illumination (e.g., UV light, UV laser irradiation, etc.) may
be applied from the carrier side of the structure to weaken the
bonds of the LTHC material such that the temporary carrier 10 may
be separated from the remaining structure. Other techniques may be
employed to remove the temporary carrier 10. In any case, any
remaining adhesive of the release layer 11 may be cleaned from the
electromagnetic shielding compartment 100. Subsequently, the
remaining structure is placed on a dicing tape 12, and then a
singulation process may be performed to form a plurality of
semiconductor structures S1. For example, the remaining structure
on the dicing tape 12 may be singulated along scribe lines SL1. The
singulation process may use a mechanical sawing process, a laser
cutting process, or the like. The singulating process may cut
through the redistribution structure 140, the underlying third
portion 133 of the insulating encapsulation 130, and the underlying
third outer portion C3 of the conductive layer CL to form a
substantially vertical sidewall SW1 of the semiconductor structure
S1. In some embodiments, the singulating process cuts through the
redistribution structure 140 and the underlying first dam DF1 (or
second dam DF2) to form a substantially vertical sidewall SW2 of
the semiconductor structure S1. The sidewalls SW1 and SW2 may be
opposite to each other. The positions of the scribe lines SL1 may
be adjusted depending on the process requirements and the
variations will be described later in other embodiments.
[0044] In some embodiments, the semiconductor structure S1 includes
the semiconductor dies (e.g., SD1, SD2, SD3, SD4, where SD3 and SD4
are not illustrated in the cross-sectional view of FIG. 9), the
insulating encapsulation 130 laterally encapsulated each of the
semiconductor dies SD1, SD2, SD3, and SD4, the electromagnetic
shielding compartment 100 surrounding the insulating encapsulation
130 and shielding the semiconductor dies SDI, SD2, SD3, and SD4,
the redistribution structure 140 disposed on the insulating
encapsulation 130, the semiconductor dies SD1, SD2, SD3, and SD4,
and the electromagnetic shielding compartment 100, and the
conductive terminals 150 disposed on the redistribution structure
140. In some embodiments, the conductive terminals 150 are
available to be mounted onto additional electrical component(s)
(e.g., circuit carrier(s), system board(s), mother board(s), etc.).
In some embodiments, grounding of the conductive layer CL of the
electromagnetic shielding compartment 100 is provided by the
patterned conductive layer 144 of the redistribution structure 140
and the conductive terminals 150 that may be coupled to local
circuit ground of the additional electrical component(s).
[0045] The semiconductor structure Si may include a first side RS1
and a second side RS2 opposite to each other. A cap section CP of
the first inner portion C1 of the conductive layer CL of the
electromagnetic shielding compartment 100 and the bottom surface Db
of the singulated dielectric frame DF' are located at the first
side RS1. In some embodiments, the cap section CP and bottom
surface Db of the singulated dielectric frame DF' are substantially
leveled or coplanar. The conductive terminals 150 may be
distributed at the second side RS2. The rounded corners CC (or
turning section) of the first inner portion C1 of the conductive
layer CL may be adjacent to or may be connected to the cap section
CP. The rounded corner CC may be thinner than the cap section CP.
The profile of the rounded corners CC of the first inner portion C1
may be associated with the profile of the footing bottom of the
singulated dielectric frame DF'. The curved sidewalls CW of the
first inner portion C1 of the conductive layer CL may be adjacent
to or may be connected to the rounded corners CC. The curved
sidewalls CW of the first inner portion C1 may be interposed
between the singulated dielectric frame DF' and the first portion
131 of the insulating encapsulation 130. In some embodiments, two
curved sidewalls CW may be inclined opposite to each other, and the
profile of the curved sidewalls CW is associated with the profile
of the sidewalls of the dielectric frame DF. The third outer
portion C3 of the conductive layer CL may cover the back surface of
the semiconductor die SD2 and extend to interpose between the outer
sidewall of the singulated dielectric frame DF' and the third
portion 133 of the insulating encapsulation 130. In some
embodiments, the first inner portion C1 of the conductive layer CL
may be grounded to provide shielding from electromagnetic
interference (EMI) for the semiconductor die (e.g., SD1). In some
embodiments, the first inner portion C1 of the conductive layer CL
may be provided for isolating the semiconductor die (e.g., SD1)
from other components in a system in package (SiP) implementation,
thereby preventing external interference and signal leakage and
reducing electromagnetic susceptibility (EMS).
[0046] FIG. 14A is a schematic top plan view illustrating a
semiconductor structure before performing a singulation process in
accordance with some exemplary embodiments of the disclosure, and
FIG. 14B is a schematic cross-sectional view of a semiconductor
structure S2 taken along section line 14B-14B of FIG. 14A after
singulating along scribe lines SL2, in accordance with some
exemplary embodiments of the disclosure. The manufacturing method
of the semiconductor structure S2 is similar to that of the
semiconductor structure S1, and the detailed descriptions are
omitted for brevity. Like elements in throughout the drawings are
designated with the same reference numbers for ease of
understanding and the details thereof are not repeated herein.
Referring to FIG. 14A and FIG. 14B, the semiconductor dies SD1 and
SD3 enclosed by the first dam DF1 and the second dam DF2 may be
shielded by the first inner portion C1 and the second inner portion
C2, respectively. One of the semiconductor dies (e.g., SD4 or SD2)
disposed within the unconfined area UA may has a dimension greater
than the adjacent ones of the semiconductor dies (e.g., SD1 and/or
SD3) disposed within the electromagnetic shielding compartment 100.
For example, the semiconductor die SD4 has a width W5 greater than
a width W6 of the closest one side of the electromagnetic shielding
compartment 100 (i.e. the side of the first dam DF1.). The
semiconductor die SD2 in the unconfined area UA may have a width
greater than a width of the closest one side of the second dam DF2.
In such embodiments, the scribe lines SL2 are positioned beyond the
boundary of the semiconductor dies SD2 and SD4 located in the
unconfined area UA to avoid damage to the semiconductor dies SD2
and SD4, and the dielectric frame DF of the electromagnetic
shielding compartment 100 may remain substantially intact. The
first inner portion C1 and the second inner portion C2 may prevent
or reduce the electromagnetic inference generated by the
semiconductor dies SD1 and SD3 from interfering with other
semiconductor dies SD2 and SD4 in the system. After performing the
singulation process along the scribe lines SL2, the semiconductor
structure S2 is formed as shown in FIG. 14B.
[0047] In some embodiments, the singulating process cuts through
the redistribution structure, the underlying third portion of the
insulating encapsulation, and the underlying third outer portion of
the conductive layer to form substantially vertical sidewalls SW3
and SW4 of the semiconductor structure S2. For example, the
singulated third portion of the insulating encapsulation 133' may
have an outer sidewall substantially aligned with the outer
sidewalls of the singulated redistribution structure 140' and the
singulated third outer portion C3' of the conductive layer CL. The
electromagnetic shielding compartment 100 including the dielectric
frame DF and the conductive layer CL are laterally encapsulated by
the singulated third portion of the insulating encapsulation 133'.
The top surface singulated third portion of the insulating
encapsulation 133' opposite to the singulated redistribution
structure 140' may be covered by the singulated third outer portion
C3' of the conductive layer CL.
[0048] FIG. 15A is a schematic top plan view illustrating a
semiconductor structure before performing a singulation process in
accordance with some exemplary embodiments of the disclosure, FIG.
15B is a schematic cross-sectional view of a semiconductor
structure S3 taken along section line 15B-15B of FIG. 15A after
singulating along scribe lines SL3, in accordance with some
exemplary embodiments of the disclosure, and FIG. 15C is a
schematic cross-sectional view of a semiconductor structure S4
taken along section line 15B-15B of FIG. 15A after singulating
along scribe lines SL4, in accordance with some exemplary
embodiments of the disclosure. The manufacturing method of the
semiconductor structures S3 and S4 is similar to that of the
semiconductor structure S1, and the detailed descriptions are
omitted for brevity. Like elements in throughout the drawings are
designated with the same reference numbers for ease of
understanding and the details thereof are not repeated herein.
[0049] Referring to FIG. 15A and FIG. 15B, the semiconductor die
SD1 is laterally encapsulated by the first portion 131 of the
insulating encapsulation and shielded by the electromagnetic
shielding structure 100A. The electromagnetic shielding structure
100A form an electromagnetically shield around the semiconductor
die SD1 to prevent or reduce electromagnetic interference or
electromagnetic susceptibility. The first inner portion C1 of the
conductive layer CL of the electromagnetic shielding structure 100A
may surround the first portion 131 of the insulating encapsulation
130 and extend to cover the back side of the semiconductor die SD1.
The dielectric frame DF' of the electromagnetic shielding structure
100A may be a single frame and laterally cover the first inner
portion C1 of the conductive layer CL. It should be noted that
although only one semiconductor die is illustrated, multiple
semiconductor dies and electromagnetic shielding structures may be
disposed in an array, and a singulation process is performed to
form a plurality of semiconductor structures S3. In other
embodiments, a plurality of dielectric frames DF' may be formed as
a grid, and one of the dielectric frames DF' may have sidewalls
sharing with the adjacent ones of the dielectric frames DF'.
[0050] In some embodiments, the scribe lines SL3 is positioned at
the dielectric frame DF' of the electromagnetic shielding structure
100A. After performing the singulation process along the scribe
lines SL3, the semiconductor structure S3 is formed as shown in
FIG. 15B. In some embodiments, the singulating process cuts through
the redistribution structure and the underlying dielectric frames
DF' to form substantially vertical sidewalls of the semiconductor
structure S3. For example, the singulated dielectric frames DF' may
have the outer sidewalls OW1 substantially aligned with the outer
sidewalls OW2 of the singulated redistribution structure 140'. The
inner sidewalls IW of the singulated dielectric frames DF' opposite
to the outer sidewalls OW1 may be in physical contact with the
first inner portion C1 of the conductive layer CL.
[0051] Referring to FIG. 15A and FIG. 15C, the semiconductor
structure S4 is formed by singulating along the scribe lines SL4.
The scribe lines SL4 may be positioned beyond the boundary of the
dielectric frame DF', so the dielectric frame DF' may remain intact
after the singulation process. For example, the singulating process
cuts through the redistribution structure, the underlying third
portion of the insulating encapsulation, and the underlying third
outer portion of the conductive layer to form substantially
vertical sidewalls of the semiconductor structure S4. For example,
the singulated third portion of the insulating encapsulation 133'
may have the outer sidewalls substantially aligned with the outer
sidewalls of the singulated redistribution structure 140' and the
singulated third outer portion C3' of the conductive layer CL. It
should be noted that the positions of the scribe lines SL4 may be
vary depending on the process equipment. For example, the scribe
lines SL4 may be close to the sidewalls of the third outer portion
of the conductive layer CL or may be positioned between the
sidewalls of the third outer portion of the conductive layer CL and
the dielectric frame DF. In such embodiments, the third portion of
the insulating encapsulation may not be present in the
semiconductor structure.
[0052] According to some embodiments, a semiconductor structure
includes a first semiconductor die, an insulating encapsulation
laterally encapsulating the first semiconductor die, an
electromagnetic shielding structure enclosing the first
semiconductor die and a first portion of the insulating
encapsulation, and a redistribution structure. The electromagnetic
shielding structure includes a first conductive layer and a
dielectric frame laterally covering the first conductive layer. The
first conductive layer surrounds the first portion of the
insulating encapsulation and extends to cover a first side of the
first semiconductor die. The dielectric frame includes a first
surface substantially leveled with the first conductive layer. The
redistribution structure is disposed on a second side of the first
semiconductor die opposing to the first side, and the
redistribution structure is electrically coupled to the first
semiconductor die and the first conductive layer of the
electromagnetic shielding structure.
[0053] According to some alternative embodiments, a semiconductor
structure includes semiconductor dies separately disposed from one
another, an insulating encapsulation laterally covering each of the
semiconductor dies, and an electromagnetic shielding compartment.
At least one of the semiconductor dies and a portion of the
insulating encapsulation are disposed within the electromagnetic
shielding compartment. The electromagnetic shielding compartment
includes a first dielectric frame and a first conductive layer. The
first conductive layer is disposed along an inner sidewall of the
first dielectric frame and extends to shield the at least one of
the semiconductor dies disposed within the first dielectric frame.
A turning section of the first conductive layer located at a corner
of the insulating encapsulation is thinner than a cap section of
the first conductive layer located on the at least one of the
semiconductor dies.
[0054] According to some alternative embodiments, a manufacturing
method of a semiconductor structure includes at least the following
steps. A conductive material is formed along an outer surface of a
dielectric pattern and extends within an area enclosed by the
dielectric pattern. A first semiconductor die is disposed on the
conductive material in the area enclosed by the dielectric pattern.
An insulating material is formed on the conductive material at
least in the area enclosed by the dielectric pattern to cover the
first semiconductor die. The insulating material, the dielectric
pattern, and the conductive material are leveled to respectively
form an insulating encapsulation, a dielectric frame of an
electromagnetic shielding compartment, and a conductive layer of
the electromagnetic shielding compartment. An active surface of the
first semiconductor die is accessibly revealed by the insulating
encapsulation.
[0055] The foregoing outlines features of several embodiments so
that those skilled in the art may better understand the aspects of
the present disclosure. Those skilled in the art should appreciate
that they may readily use the present disclosure as a basis for
designing or modifying other processes and structures for carrying
out the same purposes and/or achieving the same advantages of the
embodiments introduced herein. Those skilled in the art should also
realize that such equivalent constructions do not depart from the
spirit and scope of the present disclosure, and that they may make
various changes, substitutions, and alterations herein without
departing from the spirit and scope of the present disclosure.
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