U.S. patent application number 12/007511 was filed with the patent office on 2013-02-07 for electron beam apparatus and a device manufacturing method by using said electron beam apparatus.
This patent application is currently assigned to Ebara Corporation. The applicant listed for this patent is Takao Kato, Takeshi Murakami, Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Kenji Watanabe. Invention is credited to Takao Kato, Takeshi Murakami, Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Kenji Watanabe.
Application Number | 20130032716 12/007511 |
Document ID | / |
Family ID | 27531925 |
Filed Date | 2013-02-07 |
United States Patent
Application |
20130032716 |
Kind Code |
A1 |
Nakasuji; Mamoru ; et
al. |
February 7, 2013 |
ELECTRON BEAM APPARATUS AND A DEVICE MANUFACTURING METHOD BY USING
SAID ELECTRON BEAM APPARATUS
Abstract
An electron beam apparatus, in which an electron beam emitted
from an electron gun having a cathode and an anode is focused and
irradiated onto a sample, and secondary electrons emanated from the
sample are directed into a detector, the apparatus further
comprising means for optimizing irradiation of the electron beam
emitted from the electron gun onto the sample, the optimizing means
may be two-stage deflectors disposed in proximity to the electron
gun which deflects and directs the electron beam emitted in a
specific direction so as to be in alignment with the optical axis
direction of the electron beam apparatus, the electron beam emitted
in the specific direction being at a certain angle with respect to
the optical axis due to the fact that, among the crystal
orientations of said cathode, a specific crystal orientation
allowing a higher level of electron beam emission out of alignment
with the optical axis direction.
Inventors: |
Nakasuji; Mamoru;
(Yokohama-shi, JP) ; Kato; Takao; (Tokyo, JP)
; Noji; Nobuharu; (Zushi-shi, JP) ; Satake;
Tohru; (Chigasaki-shi, JP) ; Murakami; Takeshi;
(Tokyo, JP) ; Watanabe; Kenji; (Fujisawa-shi,
JP) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Nakasuji; Mamoru
Kato; Takao
Noji; Nobuharu
Satake; Tohru
Murakami; Takeshi
Watanabe; Kenji |
Yokohama-shi
Tokyo
Zushi-shi
Chigasaki-shi
Tokyo
Fujisawa-shi |
|
JP
JP
JP
JP
JP
JP |
|
|
Assignee: |
Ebara Corporation
Tokyo
JP
|
Family ID: |
27531925 |
Appl. No.: |
12/007511 |
Filed: |
January 11, 2008 |
Related U.S. Patent Documents
|
|
|
|
|
|
Application
Number |
Filing Date |
Patent Number |
|
|
11304680 |
Dec 16, 2005 |
7361895 |
|
|
12007511 |
|
|
|
|
10731163 |
Dec 10, 2003 |
7005641 |
|
|
11304680 |
|
|
|
|
PCT/JP02/05786 |
Jun 11, 2002 |
|
|
|
10731163 |
|
|
|
|
Current U.S.
Class: |
250/310 |
Current CPC
Class: |
H01J 37/063 20130101;
H01J 3/021 20130101; H01J 3/10 20130101; H01J 2237/2817 20130101;
B82Y 40/00 20130101; H01J 37/1471 20130101; H01J 37/073 20130101;
H01J 37/3174 20130101; B82Y 10/00 20130101; H01J 37/1472 20130101;
H01J 2237/06316 20130101; G01N 23/225 20130101 |
Class at
Publication: |
250/310 |
International
Class: |
H01J 37/07 20060101
H01J037/07 |
Foreign Application Data
Date |
Code |
Application Number |
Jun 15, 2001 |
JP |
2001-181955 |
Jun 26, 2001 |
JP |
2001-192597 |
Sep 6, 2001 |
JP |
2001-269880 |
Sep 6, 2001 |
JP |
2001-270935 |
Sep 10, 2001 |
JP |
2001-273078 |
Claims
1. An electron beam apparatus for evaluating a sample surface
comprising: an electron gun having a cathode and an anode for
emitting an electron beam which is focused and irradiated as a
primary electron beam onto the sample surface, wherein the cathode
comprises a thermionic emission cathode for emitting a thermionic
beam as the primary electron beam toward the sample surface to
thereby irradiate the thermionic beam on the sample surface; a
detector for detecting secondary electron beams emanated from the
sample surface to provide an electric signal corresponding to an
intensity of the detected secondary electron beam; a noise meter
connected to the detector, for detecting a noise level from the
electric signal; and a system for evaluating signal/noise (S/N)
ratios or noise levels, and determining a value of electric power
to be supplied for heating the thermionic emission cathode, on the
basis of the evaluation results of the signal/noise ratios or the
noise levels, in which the noise levels are measured by the noise
meter while changing electric power for heating the thermionic
emission cathode, and the signal/noise ratios are obtained from the
measured noise levels.
2. An electron beam apparatus as claimed in claim 1, wherein the
value for the heating electric power to be supplied for heating
said thermionic emission cathode is determined so that said
signal/noise ratio exceeds a predetermined value, or said noise
level is not greater than a predetermined value when a certain
level of a beam current is applied to said thermionic emission
cathode.
3. An electron beam apparatus as claimed in claim 1, wherein the
value of the heating electric power to be supplied for heating said
thermionic emission cathode is determined so that an increasing
rate of said signal/noise ratio with respect to the heating
electric power is not greater than a predetermined value, or a
decreasing rate of said noise level is not greater than a
predetermined value when a certain level of a beam current is
applied to said thermionic emission cathode.
4. An electron beam apparatus as claimed in claim 1, wherein the
value of the heating electric power to be supplied for heating said
thermionic emission cathode is determined by evaluating a noise
current/beam current ratio, in addition to the signal/noise ratios
or the noise levels.
5. An electron beam apparatus as claimed in claim 1, wherein before
ultimately determining the value of the heating electric power to
be supplied for heating said thermionic emission cathode, the value
is preliminarily determined so that a variation in an electron gun
current observed during the period when the heating electric power
being changed is moderate.
6. An electron beam apparatus as claimed in claim 1, wherein the
value of the heating electric power to be supplied for heating said
thermionic emission cathode is determined by evaluating a
relationship between the heating electric power and said
signal/noise ratio and another relationship between the heating
electric power and a lifetime of said thermionic emission cathode,
in addition to the signal/noise ratios or the noise levels.
Description
[0001] This application is a divisional of U.S. application Ser.
No. 11/304,680, filed Dec. 16, 2005, which is a divisional of U.S.
Pat. No. 7,005,641, issued on Feb. 28, 2006, which is a
continuation of International Application No. PCT/JP02/05786, filed
Jun. 11, 2002.
FIELD OF THE INVENTION
[0002] The present invention relates to an electron beam apparatus
and a device manufacturing method by using the electron beam
apparatus, and more specifically to an electron beam apparatus
which can evaluate a sample containing a device pattern having a
minimum line width not greater than 0.1 .mu.m with high throughput
and high reliability, and to a device manufacturing method which
can improve a yield of products by using the electron beam
apparatus to evaluate a wafer in the course of processing.
DESCRIPTION OF THE RELATED ART AND PROBLEMS TO BE SOLVED BY THE
INVENTION
[0003] There has been suggested such an electron beam based
inspection apparatus for inspecting defects in patterns formed on a
surface of an object to be inspected, and more particularly, an
inspection apparatus useful, for example, in inspecting defects on
a wafer in a semiconductor manufacturing process, which includes
irradiating an object to be inspected with an electron beam,
detecting secondary electrons which vary in accordance with the
properties of the surface thereof to form image data, and
inspection patterns formed on the surface of the object to be
inspected based on the image data at a high throughput, and a
method of manufacturing devices at a high yield rate using the
inspection apparatus.
[0004] In such an electron beam apparatus, in conjunction with a
high integration of semiconductor device and a micro-fabrication of
pattern thereof, an inspection apparatus with higher resolution and
throughput has been desired.
[0005] So far, for example, there has been already suggested an
electron beam apparatus in which an electron beam formed by
focusing electron beam into fine flux is irradiated onto a sample
so as to scan a surface thereof for evaluation; the sample having a
device pattern with a line width not greater than 0.1 .mu.m,
wherein since an electron gun to be used in this kind of apparatus
is required to produce the electron beam with a narrower diameter
and a higher current, the temperature of a cathode is increased so
that the electron gun may be used with an intensified brightness.
Accordingly, the cathode is typically required to have such
properties as including, a lower work function, a higher fusing
point and a lower vapor pressure and also an excellent physical and
chemical stability at high temperature. Conventionally, a
mono-crystal of LaB6 has been used as a material having such
properties, and the use of mono-crystal of tantalum carbide (TaC)
is also under consideration.
[0006] In comparison between LaB6 and TaC, the work function is 2.6
eV for LaB6 and 3.4 eV for TaC, while to the contrary, a figure of
merit (which is considered to be one of major measures for
evaluating the material for the cathode and determined from the
work function divided by a temperature at which the vapor pressure
indicates to be 10.sup.-5 Torr, wherein a smaller figure of merit
is considered more advantageous) is 1.27.times.10.sup.-3 for LaB6
and 1.2.times.10.sup.-3 for TaC, demonstrating that TaC is superior
to LaB6. Accordingly, from the viewpoint of excellent stability at
high temperatures, preferably TaC should be used as a material for
making the cathode.
[0007] However, if a TaC chip is used to cause a field emission,
due to the fact that among the crystal orientations of the TaC
chip, a specific crystal orientation allowing a higher level of
electron beam emission is not in alignment with an optical axis
direction, such an intensified electron beam could not be emitted
along a direction of the optical axis of the electron beam
apparatus but emitted in directions at an angle of 19 degrees and
an angle of 34 degrees symmetrically with respect to the optical
axis by four times (i.e. 90 degrees spaced positions about the
optical axis), respectively. Due to this, the use of the TaC chip
has been problematic in that it can not be applied to the electron
beam apparatus without modification.
[0008] Therefore, a first object of the present invention is to
solve the above problem and to provide an electron beam apparatus,
in which one of the electron beams emitted toward the directions
other than the optical axis is guided in the direction of the
optical axis with minimized aberration, whereby even such a
material may be utilized as the cathode material, that has
favorably a smaller figure of merit but has been considered
difficult to be used as the material for making the cathode because
of the reason that the intensified electron beam is not emitted in
the direction of the optical axis.
[0009] Also, there has been known an apparatus for evaluating a
sample containing MOS transistor with non-destructive method by
using electron beam with high reliability, and also a device
manufacturing method for evaluating a wafer by using the same
apparatus each time respective processes are finished.
[0010] Such a technology has been known as an electron beam
lithography system that uses an electron beam to raster-scan an
entire surface of a sample, in which the beam is emitted
exclusively onto a small region to be exposed but blocked to the
other regions.
[0011] It has been also recognized in the trend of a gate oxide
film of transistors becoming thinner and thinner every year that a
large dose of electron beam may cause a potential difference
between respective surfaces of the oxide film, sometimes leading to
a dielectric breakdown.
[0012] In a prior-art defect inspection apparatus (an electron beam
apparatus) using an electron beam, the electron beam has been
irradiated over an entire region of a limited area of a sample
wafer, to detect secondary electrons.
[0013] In the prior-art defect inspection apparatus using the
electron beam, however, there arises a problem that if the gate
oxide film with a thickness of 1 nm or less is subjected to a
relatively high dose level of electron beam, non-negligible
probability of breakdown of the oxide film could be caused by the
electron beam irradiation. On the other hand, there has been a
problem, however, that if the dose level of the electron beam is
insufficient, a signal could not have sufficient S/N ratio in
forming the image, which leads to a failure in accomplishing a
highly reliable defect inspection.
[0014] Accordingly, a second object of the present invention is to
provide an electron beam apparatus which enables a highly reliable
evaluation, including a defect inspection, to be carried out
without causing any breakdowns in a portion of the sample, such as
the gate oxide film or the like.
[0015] Further, in the field of electron beam apparatus for
inspecting a sample for any defects, there has been known an
electron beam apparatus that uses a TFE electron gun and focuses an
electron beam therefrom into a crossover on a sample thus to scan a
surface thereof and to detect secondary electrons emanated from the
sample.
[0016] In such an electron beam apparatus, if the TFE electron gun
is used, a beam current as high as 100 nA is obtainable with a beam
diameter of 100 nm, and if it is driven by a clock of 100 MHz, then
a shot noise, I.sub.N, for a secondary electron yield .eta. of 50%,
will be expressed as;
i N = ( 2 .eta. .times. i b .times. .DELTA. f ) 1 / 2 = ( 2 e
.times. 50 .times. 10 - 9 .times. 100 .times. 10 6 ) 1 / 2 = 1.265
.times. 10 - 9 A , ##EQU00001##
(where, e=charge of an electron, i.sub.b=a beam current, and
.DELTA.f=a frequency band of a secondary electron detector) and
accordingly, a S/N ratio will be expressed as;
S / N = i b / i N = 50 .times. 10 - 9 / 1.265 .times. 10 - 9 = 39.5
, ##EQU00002##
which can not satisfy a condition of S/N>45 required to perform
an defect inspection or the like, and consequently scanning should
be repeated by several times and then an averaging and adding
operation applied.
[0017] Accordingly, a third object of the present invention is to
provide an electron beam apparatus in which a beam is obtainable
that enables a resolution of 100 nm to be obtained with the
condition of S/N>45 for the scanning at 100 MHz without the need
for the averaging and adding operation.
[0018] Further, conventionally, it has been known that an electron
beam apparatus employing an objective lens of a decelerating
electric field type is useful, because it can effectively reduce an
axial chromatic aberration coefficient and a spherical aberration.
On the other hand, it has been also well known that, if an
objective lens of a non-decelerating electric field type is used,
it may be possible to evaluate a wafer over a surface including its
edge portion.
[0019] However, there has been such a problem with the electron
beam apparatus comprising the objective lens of the above-mentioned
decelerating electric field type, in which a decelerating electric
filed is produced between the objective lens and the wafer, that if
the edge portion of the wafer is located adjacent to an optical
axis, an aberration is induced by turbulence in the electric field
caused by the peripheral edge of the wafer, which leads to an
erroneous evaluation. Specifically there has been such a problem in
the case of evaluating a pattern with dimensions not greater than
0.1 .mu.m, which is commonly used nowadays, that the evaluation is
effective only for a region defined as an inner side with respect
to the peripheral edge of the wafer by a distance not smaller than
15 mm.
[0020] On the other hand, there has also been a problem with a use
of the objective lens of the non-decelerating electric field type
that the axial chromatic aberration is rather intensified and if
the beam is converged to be made narrower, then a beam current may
be greatly lowered.
[0021] Therefore, a fourth object of the present invention is to
provide an electron beam apparatus which can evaluate any region of
the wafer requiring an evaluation without any effect from the
chromatic aberration by using an objective lens having a smaller
axial chromatic aberration coefficient.
[0022] It has been conventionally known that a shot noise,
i.sub.f.sup.2, in the case of a current of I.sub.0 being applied to
an infra-red detector can be expressed by an equation;
.sub.f.sup.2=2eI.sub.0.GAMMA..sup.2.DELTA.f
and that if an electron gun is under a temperature limited
condition, said .GAMMA. is 1.0, and if the electron gun is under a
space charge limited condition, said .GAMMA. falls in a range of
0.1 to 1.0 (see R. A. Smith, et. al, "The Detection and Measurement
of Infra-red Radiation" Oxford at the Clarend on Press 1968, p
195).
[0023] Further, it has been known that a shot noise, i.sub.n.sup.2,
as a electron tube noise is expressed by an equation;
.sub.n.sup.2=.GAMMA..sup.22eI.sub.pB.sub.f
where, i.sub.n.sup.2=a mean square of a noise current, e=charge of
an electron, I.sub.p=an anode current, and B.sub.f=a frequency band
of a signal amplifier, and said .GAMMA..sup.2 is a decreasing
function with respect to a cathode temperature T.sub.k, for which a
value in a range of 0.16 to 0.018 has been actually measured (see
"Communication Engineering Handbook" edited by Institute of
Telecommunications Engineers, p 471, 1957).
[0024] However, so far as the signal detection in the electron beam
apparatus is concerned, the information with regard to the
infra-red technology and the electron tube technology has not been
utilized effectively, and the shot noise has been treated as
.GAMMA.=1. Besides, in spite of the fact that if the cathode
temperature of the electron gun is increased, the shot noise could
be decreased, the cathode temperature has been determined in
practice without taking the shot noise into account.
[0025] Accordingly, a fifth object the present invention is to
provide an electron beam apparatus which can decrease the shot
noise and thus increase the S/N ratio by determining the cathode
temperature with the shot noise taken into account, so that the
secondary electrons or the likes emanated from the sample may be
detected efficiently.
[0026] Another object of the present invention is to provide a
device manufacturing method aiming for improving inspection
accuracy and throughput by using said electron beam apparatus to
inspect a semiconductor device in the course of processing or to
inspect a finished product.
SUMMARY OF THE INVENTION
[0027] The objects of the above described may be accomplished by
the features of the present invention, which comprises an electron
beam apparatus, in which an electron beam emitted from an electron
gun having a cathode and an anode is focused and irradiated onto a
sample and secondary electrons emanated from the sample are
directed into a detector, wherein the electron beam apparatus
characterized in further comprising means for optimizing
irradiation of the electron beam emitted from the electron gun onto
the sample.
[0028] By these arrangements, the problems described above may be
dissolved and thereby irradiation efficiency of the electron beam
onto the sample is increased and, thus, S/N ratio of the electron
beam apparatus is improved, which results in high throughput and
high reliability of the electron beam apparatus.
[0029] More specifically, the first object of the present invention
described above may be accomplished by the first invention of the
present invention, wherein the electron beam apparatus is
constituted in such a way that an electron beam emitted from an
electron gun having a cathode and an anode is focused and
irradiated onto a sample and secondary electrons emanated from said
sample are directed into a detector, wherein the optimizing means
includes two-stage deflectors disposed in the proximity to the
electron gun, wherein the two-stage deflectors are adapted so as to
deflect and direct an electron beam emitted in a specific direction
so as to be in alignment with an optical axis direction, the
electron beam emitted in the specific direction being at a certain
angle with respect to the optical axis due to the fact that, among
crystal orientations of the cathode, a specific crystal orientation
allowing a higher level of electron beam emission is out of
alignment with the optical axis direction. With this configuration,
it is possible to orient one of the electron beams emitted in the
specific directions other than that of the optical axial, so as to
be in alignment with the optical axial direction while minimizing
any aberration.
[0030] Further, in one mode of the first invention, one deflector
of the two-stage of deflectors, which has been disposed in a closer
location to the electron gun, is designed to be an electromagnetic
deflector and the other deflector of the two-stage deflectors,
which is disposed in a closer location to the sample, is designed
to be an electrostatic deflector. This configuration enables the
electron beams emitted in the direction other than that of the
optical axis to be guided into the optical axial direction without
causing any chromatic aberrations.
[0031] In another mode of the first invention, the crystal of the
cathode is defined as such crystal that is composed of carbide,
boride or nitride of transition metals.
[0032] According to a further aspect of the first invention, the
electron beam apparatus is constituted as a one, in which an
electron beam emitted from an electron gun is focused and
irradiated into a sample and a secondary electrons emanated from
the sample are directed into a detector, wherein the optimizing
means comprises the cathode, an anode having a potential near to
that of the cathode and the anode, wherein only an electron beam
that has been emitted in a particular direction among a plurality
of electron beams emitted in different directions from the electron
gun is directed onto the sample, and the electron beams emitted in
the directions other than the particular direction are absorbed
into said anode having potential near to that of the cathode and
thus discarded.
[0033] In order to accomplish the second object described above,
according to the second invention, the electron beam apparatus is
constituted in such a way that an electron beam is irradiated
against a sample and secondary electrons emanated from an electron
beam irradiated region on a surface of the sample are detected so
as to evaluate the sample, wherein the sample has a partial region
on the surface thereof which is relatively week against or
susceptible to dielectric breakdown possibly caused by electron
beam irradiation, wherein the optimizing means is constituted as
means for controlling irradiation of the electron beam so as not to
irradiate the susceptible region but to irradiate the other regions
exclusively.
[0034] In the electron beam apparatus of the second invention, a
region having a gate oxide film of transistor formed thereon and a
region having an electric connection with the region of gate oxide
film may be selected as the region relatively weak against
dielectric breakdown.
[0035] Further, in the electron beam apparatus of the second
invention, a scanning operation of the electron beam may be adapted
to be applied over an entire surface of the sample, but the
electron beam may be blanked when the electron beam is to scan the
region relatively weak against dielectric breakdown.
[0036] According to another aspect of the second invention, when a
surface of a sample is segmented into a region relatively weak
against dielectric breakdown and the other regions, the optimizing
means is constituted as means for controlling the irradiation of
the electron beam so that a different dose level of electron beam
is applied to each of the respective different regions so as to
evaluate the surface of the sample.
[0037] In order to accomplish the third object of the present
invention, according to the third invention of the present
invention, the electron beam apparatus is constituted in such a way
that an electron beam emitted from an electron gun having a hot
cathode is irradiated against an aperture and the electron beam
after having passed through the aperture is contracted and
projected onto a sample, two-stage of deflectors are operated to
scan the sample, and secondary electrons emanated from the sample
are accelerated by an electric field produced by an objective lens
and guided by an E.times.B separator into a secondary electron
detector, wherein the optimizing means is constituted as means for
setting a pivot point of deflection by the two-stage of deflectors
in such a location that can minimize a transverse chromatic
aberration in the proximity of said objective lens.
[0038] In the second invention, the electron gun can be operative
under a space charge limited condition. In addition, the aperture
can be formed in a square shape. Furthermore, a negative voltage
can be applied to the sample and a voltage having a lower potential
than that of the sample can be applied to a lower electrode of the
objective lens.
[0039] In order to accomplish the fourth object of the present
invention described above, according to the fourth invention of the
present invention, the electron beam apparatus comprises an
electron optical system which produces a decelerating electric
field for a primary electron beam between an objective lens and a
sample so that a focused electron beam can scan a surface of the
sample, in which secondary electrons emanated from said sample,
after having passed through the objective lens, are deflected from
the electron optical system so as to be detected, wherein the
optimizing means is constituted as means for establishing such a
dimensional relationship as represented by an expression:
W+D/2.ltoreq.5 mm
where "W" is a working distance of the objective lens, and "D" is a
bore diameter of an electrode of the objective lens disposed in a
closest location to the sample.
[0040] According to the fourth invention as described above, since
the objective lens has been designed based on the above expression,
at least a region of a sample subject to the inspection defined as
an inner side with respect to the peripheral edge of the sample by
a distance not smaller than 5 mm is substantially free from the
interference of the turbulence in the electrostatic field caused by
the peripheral edge of the sample, and thereby the sample can be
evaluated in that region with high accuracy in the lower aberration
condition. Since, typically, chips larger than 5 mm squares are
fabricated in most cases, with the apparatus according to the
fourth invention which can evaluate a region 5 mm or more distant
from a peripheral edge of a wafer, almost all samples can be
properly handled for accurate evaluation.
[0041] According to the second aspect of the second invention, the
electron beam apparatus is composed to be able to evaluate a flat
wafer within a range defined as an inner side with respect to a
periphery of the wafer by a distance not less than "R" mm, by using
an electron optical system having an objective lens of a
decelerating electric field type, wherein the optimizing means is
constituted as a means for establishing such a dimensional
relationship as represented by an expression:
W+D/2.ltoreq.Rmm
where "W" is a working distance of the objective lens, and "D" is a
bore diameter of an electrode of the objective lens disposed in
location closest to said sample.
[0042] According to the second aspect of the second invention,
since the objective lens has been designed based on the basis of
above expression, at least a region of a sample subject to the
inspection defined as an inner side with respect to the peripheral
edge of the sample by a distance not smaller than "R"mm is
substantially free from interference of the turbulence in the
electrostatic field caused by the peripheral edge of the sample,
and thereby the sample can be evaluated in that region with high
accuracy in the lower aberration condition. Further, it can be seen
from the above expression that as the bore diameter "D" reduced, a
smaller value for "R" may be determined to extend the region
subject to the inspection, and thus an outer diameter of the
objective lens can be reduced.
[0043] According to a third aspect of the second invention, in
accordance with either one of the above-described aspects, at least
the objective lens has an electrode of axisymmetric structure made
of an insulating material with a metal coating applied selectively
onto a surface thereof.
[0044] According to the third aspect of the second invention, the
diameter of the objective lens may be further reduced, whereby a
diameter of a optical column for accommodating the electron optical
system can be made smaller.
[0045] According to a fourth aspect of the second invention, a
plurality of electron optical systems having the features of either
one of the above described aspect is arranged in parallel above a
sheet of sample. With this configuration, since different electron
images for different regions on the sample can be obtained in
respective electron optical systems, the throughput of the sample
inspection may be improved in proportion to the number of employed
electron optical systems. In the above respective aspects of the
present invention, in which the diameter of the objective lens can
be adaptively made smaller in design, a plurality of electron
optical systems can be accommodated in parallel, and the third
aspect of the present invention is especially preferable, in which
the diameter of the objective lens can be made smallest.
[0046] In order to accomplish the fifth object of the present
invention, according to the fifth invention, the electron beam
apparatus has an electron optical lens column configured such that
an electron beam emitted from a thermionic emission cathode may be
irradiated against a sample and either one of secondary electrons,
back scattered electrons or absorbed electrons, which has been
emanated from the sample, may be focused onto a detecting system,
wherein the optimizing means is constituted as means for
determining a value for a heating electric power of the thermionic
emission cathode by evaluating a signal/noise ratio or a noise
level detected in the detecting system during a period when said
electron beam is irradiated against the sample while changing a
heating electric power of the thermionic emission cathode.
[0047] According to a second aspect of the fifth invention, a value
for the heating electric power of the thermionic emission cathode
can be determined in such a manner that a signal/noise ratio
exceeds a predetermined value, or such that a noise level is not
greater than a predetermined value when a certain level of beam
current is applied to the sample from the electron beam emitted
from the thermionic emission cathode.
[0048] According to a third aspect of the fifth invention, the
value for the heating electric power of the thermionic emission
cathode can be determined in such a manner that an increase in rate
of the signal/noise ratio with respect to the heating electric
power is not greater than a predetermined value, or a decreasing
rate of said noise level is not greater than a predetermined value
when a certain level of beam current is applied to the sample from
the electron beam emitted from the thermionic emission cathode.
[0049] According to a fourth aspect of the fifth invention, the
value for the heating electric power of said thermionic emission
cathode may be determined by evaluating a noise current/beam
current ratio.
[0050] According to a fifth aspect of the fifth invention, the
value for the heating electric power of the thermionic emission
cathode may be roughly tuned in such a manner that a variation in
an electron gun current observed during a period when the heating
electric power of the thermionic emission cathode is changed may be
moderate, and following this roughly tuning, the value for the
heating electric power of the thermionic emission cathode can be
finely tuned based on an evaluation of the signal/noise ratio or
the noise level detected in the detecting system.
[0051] According to a sixth aspect of the fifth invention, the
value for the heating electric power of the thermionic emission
cathode can be determined in consideration of a relationship
between the heating electric power of the thermionic emission
cathode and the signal/noise ratio and another relationship between
the heating electric power of the thermionic emission cathode and a
lifetime of the thermionic emission cathode.
[0052] According to a sixth invention, a device manufacturing
method may be implemented, which is characterized by evaluating a
wafer in the course of processing or after completion of processing
by using either one of the electron beam apparatuses described
above.
[0053] These and other aspects and actions and effects of the
present invention may be further understood by reading the
following description with reference to the attached drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0054] FIG. 1 is a schematic diagram of an optical system of an
electron beam apparatus according to an embodiment of a first
invention of the present invention;
[0055] FIG. 2 is a schematic diagram of the main parts of an
optical system of an electron beam apparatus according to another
embodiment of the first invention of the present invention;
[0056] FIG. 3 is a schematic diagram of an electron beam apparatus
according to an embodiment of a second invention of the present
invention;
[0057] FIG. 4 is a schematic partial plan view illustrating an
example for identifying a region relatively weak against a
dielectric breakdown due to an electron beam irradiation;
[0058] FIG. 5(a) is a schematic diagram of an electron beam
apparatus according to an embodiment of a third invention of the
present invention and FIG. 5(b) is a diagram illustrating a setting
of a pivot point of deflection in the electron beam apparatus of
FIG. 5(a);
[0059] FIG. 6 is a graphic chart indicating a calculation result of
a beam current to be obtained in an optical system in the
embodiment of FIG. 5;
[0060] FIG. 7 is a side sectional view and a top view illustrating
a schematic configuration of an electron beam apparatus according
to an embodiment of a fourth invention of the present
invention;
[0061] FIG. 8 is a diagram illustrating a simulation result
obtained by evaluating an effect of outer diameter of a wafer
sample in order to demonstrate a principle of the fourth
invention;
[0062] FIG. 9 is a schematic diagram of an electron beam apparatus
according to an embodiment of a fifth invention of the present
invention;
[0063] FIG. 10 is a graphic chart indicating measured values for a
S/N ratio and a noise level in the embodiment shown in FIG. 9;
[0064] FIG. 11 is a flow chart showing a series of semiconductor
device manufacturing processes according to a sixth invention of
the present invention; and
[0065] FIG. 12 is a flow chart showing a lithography process as a
part of the semiconductor device manufacturing processes of FIG.
11.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0066] Preferred embodiments of an electron beam apparatus
according to the present invention will be described below with
reference to the attached drawings.
Embodiments of a First Invention
[0067] FIG. 1 schematically shows an electron beam apparatus 100 of
an embodiment according to a first invention of the present
invention. This electron beam apparatus 100 comprises a primary
optical system 110, a secondary optical system 120 and an
inspection unit 130. The primary optical system 110 is an optical
system for irradiating an electron beam against a surface of a
sample S (a sample surface), and comprises an electron gun 111 for
emitting the electron beam, an electromagnetic deflector 112 and an
electrostatic deflector 113 for deflecting the electron beam
emitted from the electron gun, a condenser lens 114 for focusing
the electron beam, an aperture 115 defining an numerical aperture,
electrostatic deflectors 116 and 117 for controlling the electron
beam so as to scan a surface of the sample, an E.times.B separator
118 and an objective lens 19, wherein those components described
above are arranged along an optical axis "A" of the primary optical
system 110 in a sequential order with the electron gun 111 at the
topmost location as shown in FIG. 1.
[0068] In the electron gun 111, a mono-crystal TaC cathode of
<100> orientation is employed as a thermal field emission
(TFE) cathode 111a, and an anode 111b is used to draw out the
electron beam. Since the emission direction of the electron beam is
defined at the angle of about 18.5.degree. with respect to the
optical axis A, the anode 111b is formed in a conical shape
inclined at an angle .theta. of 18.5.degree. with respect to a
plane M-M normal to the optical axis A and is provided with an
aperture 111c formed therein for allowing one of the four beams to
pass through.
[0069] The secondary optical system 120 is arranged along an
optical axis B inclined with respect to the optical axis A of the
primary optical system 110 in a location proximal to the E.times.B
separator 118 of the primary optical system 110.
[0070] The inspection unit 130 comprises a detector 131.
[0071] In the electron beam apparatus as described above, the
electron beam emitted from the cathode 111a of the electron gun 111
is accelerated by an anode 111b, and the electron beam 150, after
having exited from the aperture 111c of the anode, is deflected at
an angle of deflection .alpha. into the direction indicated by the
arrow 151 (i.e. toward the optical axial direction) by the
electromagnetic deflector 112 and further deflected back at an
angle of deflection .beta. in the direction indicated by the arrow
152 by the electrostatic deflector 113, so that the electron beam
150 may be oriented in the direction in alignment with the optical
axis A. In this way, the electron beam 150, which has been emitted
in the direction at a certain angle with respect to the optical
axis, due to the fact that among the crystal orientations of the
mono-crystal TaC cathode, a specific crystal orientation allowing a
higher level of electron beam emission is out of alignment with
said optical axis direction, can be oriented in a direction in
alignment with the optical axial direction (i.e., directed along
the optical axial direction) by using the two-stage of deflectors
112 and 113.
[0072] The electron beam is then focused by the condenser lens 114
to be formed into a crossover in the electron gun side of the
objective lens 119 and further focused by the objective lens 119
onto the sample S. At that time, the electron beam is deflected by
the electrostatic deflector 116 and the electrostatic deflector 117
of the E.times.B separator 118 and irradiated onto the sample S so
as to scan the surface thereof.
[0073] The secondary electrons emanated from the sample S by the
irradiation of this electron beam are accelerated and focused by an
accelerating electric field applied between the objective lens 119
and the sample S, and then pass through the objective lens 119. The
secondary electrons, after having passed through the objective
lens, are deflected by the E.times.B separator 118 in the direction
in alignment with that of the optical axis B and then detected by
the detector 131 of the inspection unit 130 for evaluating the
sample S.
[0074] In such an electron beam apparatus as described above, it is
required to reduce any chromatic aberration caused by the
deflection in the two-stage of deflectors in order to improve a
resolution of the optical system. To achieve this, a distance
between a tip end portion of the cathode 111a and the
electromagnetic deflector 112 is set to be equal to a distance
between the electromagnetic deflector 112 and the electrostatic
deflector 113, thereby making the angle of deflection .alpha. twice
that of the angle of deflection .beta. and thus reducing chromatic
aberration caused by the deflection. Although the TaC is favorable
from the fact that if the TaC is used, since an angular current
density value as large as 10 mA/sr can be obtained, the electron
beam of 800 nA with 100 nm.phi. is obtainable, yet the crystal of
the cathode is not limited to this but may be a crystal of other
transition metals composed of carbide, boride or nitride.
[0075] Further, it is also possible to appropriately change the
number of deflectors, the angle of inclination .theta. of the anode
111b, and the location of the aperture 111c of the anode, depending
on the kinds of the transition metals employed, so that only an
electron beam that has been emitted in a specific direction among a
plurality of electron beams emitted in different directions can be
guided onto the sample S and those electron beams emitted in the
directions other than the specific direction may be all
discarded.
[0076] FIG. 2 shows a second embodiment of the first invention. In
this embodiment, a condenser lens, an aperture, an electrostatic
deflector, an E.times.B separator and an objective lens included in
a primary optical system, respective components included in a
secondary optical system and an inspection unit, all of them have
the same configurations as those of the first embodiment, and
accordingly those components are omitted in FIG. 2 but only the
components different from those of the first embodiment are shown
in FIG. 2. In addition, such components as equivalent to those of
the first embodiment are designated with the same reference
numerals. In this embodiment, an anode of an electron gun 111 has a
unique configuration, in which an anode 111e having a potential
near to that of a cathode 111a is independently provided in
addition to a typical anode 111d so as to form a two-stage of
anodes 111d and 111e. The anode 111e has been made in a similar
form to the anode 111b of the first embodiment. In such a
configuration, those electron beams emitted from the cathode 111a
in the direction of discarding are absorbed into the anode 111e
having a potential near to that of the cathode. Thereby, heat
generated in the anode may be reduced, which allows a small
capacity of power supply 111f to be used for the electron gun.
Other operations of the electron beam apparatus according to this
embodiment are similar to those explained with reference to the
first embodiment of FIG. 1.
[0077] Incidentally, in the second embodiment described above, the
electrostatic deflectors 112 and 113 are not necessarily
indispensable since a specific crystal orientation allowing a
higher level of electron beam emission can be selected so as to be
in alignment with the optical direction.
[0078] According to the first invention described above,
advantageously the following effects can be obtained.
[0079] (1) An intensified electron beam obtained by means of a
mono-crystal TaC cathode may be effectively guided to an optical
axis of a primary optical system.
[0080] (2) Since an electron beam with a beam size of 100 nm.phi.
and an electron beam current of 800 nA is obtainable, the
throughput of the electron beam apparatus can be improved.
[0081] (3) The electron beam can be deflected at an angle in the
range of 38.degree. without substantially causing chromatic
aberration.
[0082] (4) With a use of TaC, which has a smaller figure of merit
as compared to LaB6, such an electron gun having a longer operating
life and an intensified brightness can be obtained.
[0083] (5) As is the case in the second embodiment, if an anode is
provided in the form of two-stage of anodes, majority of emission
current can be absorbed into an anode having a potential near to
that of the cathode and accordingly heat generation in the anode
can be reduced, which allows a smaller capacity of power supply for
the electron gun to be employed.
Embodiments of a Second Invention
[0084] FIG. 3 is a schematic diagram of an electron beam apparatus
according to an embodiment of a second invention of the present
invention.
[0085] The electron beam apparatus 200 according to the present
embodiment comprises a three-electrode type electron gun 201
comprising a Wehnelt 221, a cathode 222 and an anode 223, for
emitting a primary electron beam; axial aligning electrostatic
deflectors 224, 225 for aligning an axis of the primary electron
beam with respect to a subsequent lens; a condenser lens 238; an
electrostatic deflector 227; an E.times.B separator (229, 230); an
objective lens 231; an axisymmetric electrode 232; and a detector
228 for detecting a secondary electron beam emanated from a sample
233. The sample 233 is mounted on a stage for transferring the
sample 233 within an X-Y plane. By way of this, secondary electron
images of the sample 233 for an overall region to be inspected can
be obtained.
[0086] An electron beam emitted from the electron gun 201 is
focused by the condenser lens unit 238 so as to form a crossover in
a deflection center 242 of a blanking deflector 238, and then is
further focused by the objective lens 231 to form a small spot on a
surface of the sample 233. The deflector 227 and an electromagnetic
deflector 229 within an E.times.B separator 229, 230 function
cooperatively to deflect the beam so as to raster-scan the sample
233. Secondary electrons emanated from scanned points of the sample
233 are accelerated and focused by an accelerating electric field
produced by the objective lens 231, deflected by the E.times.B
separator 229, 230 in the right hand direction in FIG. 3, and then
detected by the secondary electron detector 228, which combines the
detection result with a scanning signal to form a SEM image. It is
to be noted that prior to this image formation, registration should
be performed so as to determine accurately which location on the
sample 233 is being scanned.
[0087] The axisymmetric electrode 232 disposed between the
objective lens 231 and the sample 233 is functioning for providing
a voltage further lower than a voltage on the sample surface and
thereby partially decreasing an axial potential to a lower level
than that on the sample surface, so that the secondary electrons
emanating from a pattern having a higher voltage may be reflected
back to the sample side, and thus a potential contrast can be
measured.
[0088] The condenser lens 238 is made of a single ceramic piece,
which is processed into an axisymmetric base body 226 with a metal
coating 239 applied selectively onto the surface thereof, thus
forming; an upper electrode 234; a central electrode 235; and a
lower electrode 236. By this design, it becomes possible to
fabricate a condenser lens having a smaller diameter. In the
condenser lens 238, the voltage is applied to the central electrode
235 via a lead fitting 237.
[0089] As for the objective lens 231, as similarly to the condenser
lens 238, one piece of ceramic is processed into an axisymmetric
shape and the metal coating is applied selectively onto the surface
thereof, thereby forming an upper electrode 243, a central
electrode 244 and a lower electrode 245. With this design, it
becomes possible to fabricate an objective lens having a smaller
diameter. In the objective lens 231, a voltage is applied to the
central electrode 244 via a lead fitting 246, and upon application
of this voltage, the decelerating electric field for the primary
electron beam is produced between the objective lens 231 and the
sample 233, as well as the lens effect provided by the objective
lens 231.
[0090] If there is a region on the sample 233 to be evaluated that
is relatively weak against a dielectric breakdown possibly caused
by the electron beam, for example, a location in which a gate oxide
film is formed, then said weak region and the other regions should
be identified separately from the pattern data and stored in a
pattern memory 240. Then, a signal is applied to a blanking control
circuit 239 in synchronism with a scanning timing for that weak
region, so that the beam may be deflected by the blanking deflector
238 so as not to pass through the blanking aperture 241 during
scanning within said weak region. Thus, the beam is blocked and
prevented from proceeding to the sample 233. Since such a blanking
method is a technology common with the one applied to an electron
beam lithography system, in which a pattern writing is performed
with raster scanning being applied to a sample while successively
moving the sample table (Herriott et al., EBES: A practical
Electron Lithography System, IEEE Transactions on Electron Devices
Vol.-ED-22, No. 6, July, 1975 pp 385-391), detailed description
will not be given here.
[0091] FIG. 4 shows typical segmentation between the above-stated
weak region and the other regions (i.e., robust regions). FIG. 4 is
an extracted view of a MOS transistor on a TEG (Test Element
Group). The MOS transistor comprises a drain 211, a source 212 and
a gate 213. A region 215 surrounded by the dotted line where the
gate oxide film is formed to be thinner and a region 214 of the
gate 213 surrounded by the chain line, and containing therein a
region connected to the gate electrode, are identified separately
as regions relatively weak against the dielectric breakdown.
Although the pattern of the gate 213 includes a diagonal line, the
weak region has been defined by using exclusively a rectangular
shape because if the diagonal line is used to define the region,
data volume greatly increases.
[0092] The raster scanning is applied to the region denoted by
reference numerals 216 and 217. That is, the beam has a regular
intensity for the portion 216 indicated by the solid line, and the
beam is blanked for the portion 217 indicated by the broken line,
so as to prevent the beam from passing though that portion. Only
the regions 214,215 can be scanned again with a weakened beam, or
scanned again with a beam having a regular intensity but at a
higher scanning rate than usual. In the case of re-scanning, the
beam is blanked for the portion defined by the solid line 216.
[0093] Alternatively, a pattern of the regions 214 and 215 are
stored in the pattern memory 240 in advance, and when the regions
214 and 215 are scanned, only the regions 214,215 can be scanned
with a weakened beam or scanned with a beam having a regular
intensity but at a higher scanning rate than usual.
[0094] In the electron beam apparatus according to the second
invention, the beam is controlled in such a manner that a low dose
level of electron beam or no electron beam irradiation can be
applied specifically to a region relatively weak against dielectric
breakdown possibly caused by the electron beam irradiation, so that
the wafer can be evaluated without damaging any portions such as a
gate oxide film or the like formed thereon.
[0095] In general, since said relatively weak region is small in
area by ratio, even if a defect in that region were overlooked, a
possibility that there is actually a defect in such a region is
negligible from the viewpoint of taking all the regions into
consideration.
Further, if there should be no skipped evaluation without
exception, the lower dose level of electron beam may be applied to
the wafer for evaluation with a tolerance for undesirable S/N
ratio. Alternatively, the dose level of the beam to be applied onto
said weak region may be chosen to be 0, 1/3, 1/2 and so forth, in
comparison with the normal dose level.
Embodiment of a Third Invention
[0096] A preferred embodiment of an electron beam apparatus
according to the third invention will now be described with
reference to FIGS. 5 and 6. Referring to FIG. 5(a), an electron
beam apparatus 300 according to the third invention comprises an
electron gun 350, axial aligning deflectors 304 and 305 for an
axial-aligning of a primary electron beam, a condenser lens 306, an
aperture 307 of square shape formed in a plate-like material, an NA
aperture 319, a condenser lens 309, axial aligning deflectors 308
and 320 for axial aligning between the NA aperture 319 and the
condenser lens 309, an electrostatic deflector 310 for controlling
a scanning operation of the primary electron beam, an E.times.B
separator 313 consisting of an electrostatic deflector 311 and an
electromagnetic deflector 312, an objective lens 360 consisting of
an upper electrode 314, a central electrode 315 and a lower
electrode 316, and a secondary electron detector 318 of a detecting
system functioning for detecting a detection signal for secondary
electrons emanated from a sample 317.
[0097] The electron gun 350 is composed mainly of a thermionic
emission cathode 301, a Wehnelt 302 and an anode 303 and functions
to emit a primary electron beam so as to be irradiated against the
sample 317. The thermionic emission cathode 301 is formed by
polishing a mono-crystal of LaB.sub.6 having a crystal orientation
<100> on a surface thereof so that a diameter of a tip end
portion of the crystal may be 50 .mu.m. A flat Wehnelt having an
aperture with a diameter of 1.5 mm is employed as the Wehnelt 302.
Further, the anode 303 has an aperture with a diameter of 8 mm, and
is disposed in a location distant from the Wehnelt 302 by 5 mm
along an optical axis direction.
[0098] The primary electron beam emitted from the thermionic
emission cathode 301 of the electron gun 350 is controlled by the
axial aligning deflectors 304 and 305 so as to be axially aligned
with an optical axis of the condenser lens 306, and irradiated
against the aperture 307, where the primary electron beam is formed
to have a square shaped section profile. The primary electron beam,
after having passed though the aperture 307, is axially aligned by
the axial aligning deflectors 308 and 320 with respect to the NA
aperture 319 and the condenser lens 309, and then focused by the
condenser lens 306 to form a crossover in the NA aperture 319. The
primary electron beam, after having passed through the NA aperture
319, is focused by the condenser lens 309 (a reducing lens) onto
the objective lens 360. The primary electron beam to be focused on
the sample 317 by the condenser lens 309 is further contracted by
the objective lens 360 so as to be projected and thus focused into
an image on the sample 317 as the beam size of 100 nm square.
[0099] A negative voltage of -4000V is applied to the sample 317
and a negative voltage of -4100V is applied to the lower electrode
316 of the objective lens 360. This means that a voltage having a
lower potential than that of the negative voltage applied to the
sample 317 is applied to the lower electrode 316 of the objective
lens 360. With this voltage condition, secondary electrons emanated
from the higher potential pattern on the surface of the sample 317
are reflected back and only the secondary electrons emanated from
the lower potential pattern are selectively allowed to pass through
the objective lens 360, which make it possible to obtain a
potential contrast on the sample 317 with a high S/N ratio.
[0100] Since a voltage of 20 KV is applied to the central electrode
315 of the objective lens 360, the secondary electrons emanated
from the scanned points on the sample 317 are, under a normal
operation, attracted and thus accelerated and focused by the high
positive voltage applied to the central electrode 315 of the
objective lens 360 (accelerated by an electric field produced by
the objective lens 360), and the secondary electrons are then
separated by the E.times.B separator 313 from a primary optical
system and collected in the secondary electron detector 318. This
E.times.B separator 313 comprises the electrostatic deflector 311
with eight poles, and a saddle-type deflector wound on the outside
of said electrostatic deflector 311, and further a core is formed
on the outside of said saddle-type deflector by a permalloy
ring.
[0101] The scanning operation of the primary electron beam on the
sample 317 is controlled through a two-stage deflection by the
two-stage of deflector consisting of the electrostatic deflector
310 and the electrostatic deflector 311 of the E.times.B separator
313. Upon this operation, a pivot point of deflection of the
two-stage deflectors is set in a location that may minimize the
transverse chromatic aberration in the proximity of the objective
lens 360. More specifically, the pivot point of deflection of the
two-stage deflectors is set at a point slightly above the upper
electrode 314 of the objective lens 360, thereby minimizing
chromatic aberration due to deflection in the proximity of the
objective lens 360. For example, as shown in FIG. 5(b), when a
deflection amount of the second electrostatic deflector 311 is
varied while a deflection amount of the first electrostatic
deflector 310 is fixed, the trajectory for a principal ray of the
electron beam changes as shown by arrows A, B and C, and,
accordingly, the pivot point of deflection of the two-stage of
deflectors changes as shown by points a, b and c. The location
where the transverse chromatic aberration is minimum is determined
by measuring a blur of the beam while varying the deflection amount
of the two-stage deflectors to find an optimal point.
[0102] The detector 318 detects the condensed secondary electrons
and outputs a detection result as an electric signal representing
intensity thereof (a detection signal of the secondary electron) to
an image forming section, though not shown. The image forming
section is additionally supplied with a scanning signal applied to
the electrostatic deflector 310 and the electrostatic deflector 311
for deflecting the primary electron beam. The image forming section
can synthesize the scanning signal and the electric signal to form
image data, thus to make up and/or display an image (SEM image)
representing a scanned surface of the sample 317. This image data
may be compared with reference data for an indefectible sample so
as to detect any defects in the sample 317.
[0103] Since a plurality of electrodes of the E.times.B separator
313 is formed by processing a machine-processable ceramic and
thereafter applying a metal coating selectively to the surface
thereof, an outer diameter of the E.times.B separator 313 can be
made smaller. In addition, since the electromagnetic deflector 312
is a saddle-type deflector, the outer diameter thereof can also be
made smaller. Owing to these facts, the E.times.B separator 313 can
have an outer diameter of about 40 mm, thereby contributing to an
increase of the throughput. That is, for example, if a total of
twelve sets of electron optical column is disposed over a sheet of
sample 317, a throughput increased by 12 times can be obtained.
[0104] Further, by minimizing the transverse chromatic aberration
through a optimum pivot point of deflection in the proximity of the
objective lens 360 as described above, the beam current of 20 nA or
higher is obtainable with a beam diameter of 110 nm. This will be
explained more specifically. FIG. 6 shows a graphic chart for
calculating the beam current to be obtained in the above-described
optical system when a pivot point of deflection by the two-stage
deflectors is set in a location that minimize transverse chromatic
aberration in the proximity of the objective lens 360, and a
distance between the lower electrode 316 of the objective lens 360
and the sample 317 is assumed to be 2 mm in the optical axis
direction. More specifically, a bore diameter of the upper
electrode 314, the central electrode 315 and the lower electrode
316 is 4 mm, 2 mm and 3 mm, respectively, each space between these
three electrodes is 2 mm, and a thickness each of these electrodes
is 2 mm.
A deflection point of the two-stage deflectors 310 and 311 is set
substantially at a position of lower surface of the upper electrode
314 and an object point is set at 100 mm above the upper surface of
the central electrode 315. In FIG. 6, "Ct" designates transverse
chromatic aberration, "Cax" designates axial chromatic aberration,
"Co" designates coma aberration, "Sp" designates spherical
aberration and "As" designates astigmatic aberration. Further, "T"
denotes a diameter of a beam without any aberration measured on the
sample 317 upon obtaining a beam diameter of 110 nm, and T may be
determined from the expression:
T.sup.2=110.sup.2-Ct.sup.2-Cax.sup.2-Co.sup.2-Sp.sup.2-As.sup.2,
which will be shown as a curve in FIG. 6. Reference numeral 390
designates a straight line inclined down in the rightward direction
at an angle of 45.degree., and a contact point of this straight
line 390 with the curve T may be defined to show an optimal value,
i.e. a condition where a maximum beam current is obtained with the
beam diameter of 110 nm. That is, the half-angle of aperture=33
mrad, Topt=76.4 nm, and the beam current I may be expressed as:
I = .pi..alpha. 2 B .pi. ( d / 2 ) 2 = .pi. 2 ( 33 .times. 10 - 3 )
2 .times. ( 76.4 .times. 10 - 5 / 2 ) 2 .times. 1.5 .times. 10 5 =
( .pi. .times. 1.26 .times. 10 - 5 .times. 1 .times. 10 - 2 ) 2
.times. 1.5 .times. 10 5 = 23.5 nA , ##EQU00003##
[0105] (where, .alpha.: the half-angle of aperture, d: Topt, B:
brightness)
indicating that a beam current equal to or more than 20 nA can be
obtained. It is to be appreciated that the above result comes from
a calculation where the crossover image has been contracted to be a
probe, and a higher beam current may be obtained for the case where
a contracted image of the electron beam having passed though the
aperture is used as the probe.
[0106] Further, the electron gun 350 may be activated with a space
charge limited condition. In this case, assuming the yield
(transmittance) of the secondary electron to be 50% similarly to
that with the TFE electron gun, the shot noise, I.sub.N, is
expressed as:
I N = .GAMMA. .times. ( 2 eI .DELTA. F ) 1 / 2 ( where , .GAMMA. =
0.13 and I = 20 .times. 0.5 .times. 10 - 9 = 10 .times. 10 - 9 ) =
0.13 .times. ( 2 .times. 1.6 .times. 10 - 19 .times. 10 .times. 10
- 9 .times. 100 .times. 10 6 ) 1 / 2 = 7.35 .times. 10 - 11 A
##EQU00004##
and accordingly, the S/N will be expressed as:
S/N=10.times.10.sup.-9/7.35.times.10.sup.-11=136,
meaning that the shot noise can be reduced so as to satisfy the
condition of S/N>45, which is required to perform defect
inspection or the like; and there is no need to repeat the
scanning, e.g. two or four times, and then to apply the averaging
and adding operation as is the case in the prior art. However, but
a sufficient signal can be obtained with one-time scanning in the
operation at a frequency level of 100 MHz or higher, and a beam can
be obtained that enables a resolution of 100 nm with the condition
of S/N>45.
[0107] According to a first aspect of the third invention as
described above, since an innovative electron beam apparatus has
been provided, in which an electron beam emitted from the electron
gun having a hot cathode is irradiated against the aperture and the
electron beam after having passed through said aperture is
contracted and projected onto the sample, and secondary electrons
emanated from the sample are accelerated by the electric field
produced by the objective lens and guided by the E.times.B
separator into the secondary electron detector, wherein when the
two-stage of deflectors is operated to scan the sample, the pivot
point of deflection by said two-stage of deflectors is set in such
a location that may minimize a transverse chromatic aberration due
to the optimum deflection pivot in the proximity of said objective
lens, therefore the beam diameter will not become larger even after
the beam has been deflected. Further, since the contracted image of
the aperture is used as the beam, a higher beam current can be
obtained.
[0108] According to another aspect of third invention, since in the
first aspect of the third invention as described above, said
electron gun is adapted to be operative under the space charge
limited condition, a shot noise can be reduced so as to satisfy the
condition of S/N>45, which is required to perform defect
inspection or the like, and there is no need for applying the
averaging and adding operation. Rather, a sufficient signal can be
obtained with one-time scanning, and a beam can be obtained that
enables a resolution of 100 nm with the condition of S/N>45.
[0109] According to a third aspect of the third invention, since in
the first aspect of the third invention as described above, said
aperture is square shaped, therefore a higher beam current can be
obtained with a lower brightness.
[0110] According to a fourth aspect of the third invention, since
in the first aspect of the third invention as described above, a
negative voltage is applied to the sample and a voltage having a
lower potential than that of said sample is applied to the lower
electrode of the objective lens, therefore a voltage contrast on
the sample can be obtained with a preferable S/N ratio.
Embodiment of a Fourth Invention
[0111] FIG. 7 shows a side sectional view and a top view,
respectively, of an electron beam apparatus according to an
embodiment of a fourth invention.
[0112] As shown in the top view of FIG. 7, the electron beam
apparatus according to the present embodiment comprises a plurality
of similarly configured optical column 402 (eight optical columns
in the example shown in FIG. 7) arranged in parallel with one
another above a wafer 408. One optical column 401 among those
optical columns 402 comprises, as shown in the side sectional view
of FIG. 7, a three-electrode type electron gun 420 comprising a
Wehnelt 421, a cathode 422 and an anode 423, for emitting a primary
electron beam; axial aligning electrostatic deflectors 424, 425 for
aligning an axis of the primary electron beam with respect to a
subsequent lens; a condenser lens 438; an electrostatic deflector
427; an E.times.B separator (429, 430); an objective lens 431; an
axisymmetric electrode 432; and a detector 428 for detecting a
secondary electron beam emanated from the wafer 408. The wafer 408
is mounted on a stage 447 for transferring the wafer 408 within an
X-Y plane. By way of this, secondary electron images of the wafer
408 for an overall region to be inspected can be obtained.
[0113] In each of the optical columns, the primary electron beam
emitted from the electron gun 420 is once focused by the condenser
lens 438 into a crossover image in the electron gun side of the
E.times.B separator (429, 430) and further focused through the
objective lens 431 onto the sample surface 433. During this
process, the electrostatic deflector 427 and the electromagnetic
deflector 429 cooperate to make the primary beam scan the sample
surface 433. The secondary electron beam emanated from a scanned
point of the wafer is accelerated by the objective lens 431, and
the secondary electron beam, after having passed through said lens
431, is deflected by the E.times.B separator (429, 430) toward the
direction indicated by the dotted line in the drawing to be
detected by the detector 428. An output signal from the detector
428 is sent to an image processing section, though not shown in the
drawing, where the secondary electron image of the sample surface
433 is generated.
[0114] The axisymmetric electrode 432 disposed between the
objective lens 431 and the wafer 408 functions to provide a voltage
lower than a voltage on the sample surface, thereby partially
decreasing an axial potential to a lower level than that on the
sample surface, so that the secondary electrons emanated from a
pattern having a higher voltage may be reflected back to the sample
side, and thus a voltage contrast can be improved. This will be
explained later. To obtain a topology image or an image
representing a difference in the material, a higher voltage than
the wafer 408 may be applied to the axisymmetric electrode 432 so
as to increase a detecting yield of the secondary electron.
[0115] The condenser lens 438 is made of a single ceramic piece,
which is processed into an axisymmetric base body 426 with a metal
coating 439 applied selectively onto the surface thereof, thus
forming an upper electrode 434, a central electrode 435 and a lower
electrode 436. With this design, it becomes possible to fabricate
such a condenser lens having a smaller diameter. In the condenser
lens 438, a voltage is applied to the central electrode 435 via a
lead fitting 437.
[0116] As for the objective lens 431, similar to the condenser lens
438, a single ceramic piece is processed into an axisymmetric
shape, and the metal coating is applied selectively onto the
surface thereof, thereby forming an upper electrode 440, a central
electrode 442 and a lower electrode 443. With this design, it
becomes possible to fabricate an objective lens having a smaller
diameter. In the objective lens 431, a voltage is applied to the
central electrode 442 via a lead fitting 445, and upon this voltage
application, a decelerating electric field for the primary electron
beam is produced between the objective lens 431 and the wafer 408,
as well as the lens effect provided by the objective lens 431.
[0117] Thus in this embodiment, since it has become possible to use
the electrodes having a smaller diameter for the condenser lens 438
and the objective lens 431, which allows an overall outer diameter
of the optical column 401 to be made much smaller, therefore it is
possible to install a plurality of optical columns arranged in
parallel with one another, as shown in FIG. 7. Since in respective
optical columns, different secondary electron images corresponding
to different regions of the wafer 408 can be obtained, throughput
of the wafer evaluation may be improved in proportion to the number
of employed optical columns.
[0118] FIG. 8 is a diagram illustrating a result of simulation by
calculating a voltage to be applied to the central electrode which
can satisfy a focusing condition of the objective lens, as a
function of the outer diameters of the wafer sample, by using a
parameter W representing a working distance of the objective lens
431 and another parameter D representing a bore diameter of the
lower electrode 432 of said objective lens 431 disposed most
proximal to the wafer. In this context, the working distance of the
objective lens 431, W, is meant to be a distance between the sample
surface 433 and the under surface of the lower electrode 432 of the
objective lens 431 disposed most proximal to the wafer.
[0119] As shown in FIG. 8, assuming that a voltage to be applied to
the central electrode 442, which can satisfy the focusing condition
for the sample surface with a sufficiently large outer diameter, is
denoted as V.sub.20 and a voltage to be applied to the central
electrode, which can satisfy the focusing condition for the sample
surface with an outer diameter of R mm, is denoted as V.sub.R, then
the Y-axis indicates a value representing a difference between
those two values which has been normalized by V.sub.20, i.e.,
|V.sub.20-V.sub.R|/V.sub.20.
[0120] Variation in focusing condition means that the axial
potential distribution is varied due to the effect depending on a
different outer diameter of the sample surface. It has been judged
that if the value for |V.sub.20-V.sub.R|/V.sub.20 is not greater
than 10.sup.-4, the effect from the outer diameter of the sample
surface is negligible.
[0121] As can been seen from FIG. 8, under the given condition of
W=2 mm, the voltage difference representing the focusing condition
falls into a range not greater than 10.sup.-4 with the sample
surface outer diameter size R equal to or greater than 9 mm for the
bore diameter of 14 mm; with the R equal to or greater than 7 mm
for the bore diameter of 10 mm; with the R equal to or greater than
4 mm for the bore diameter of 4 mm; and with the R equal to or
greater than 3 mm for the bore diameter of 2 mm. Accordingly, if
"(the working distance W)+(half of the bore diameter
D/2).ltoreq.R", then it is determined that there would be
substantially no effect from the outer diameter of the sample
surface.
[0122] From the above result, it is considered that, in order to
evaluate the region on the wafer 408 defined as the inner side with
respect to the peripheral edge of the wafer 408 by a distance not
smaller than R mm, if the axisymmetric objective lens 31 is
fabricated so as to satisfy the condition:
W+D/2.ltoreq.R
expression (1), then the region of the sample surface 433 subject
to the inspection, which is defined as the inner side with respect
to the wafer peripheral edge by a distance not smaller than R mm,
may be appropriately evaluated yet with avoiding substantially any
effects by the peripheral edge of the wafer 408.
[0123] As for the region requiring an evaluation in an 8'' (inch)
wafer or a 12'' (inch) wafer, it is not necessary to evaluate such
a region that is distant from the wafer edge by an amount not
greater than 5 mm even in the case of fabricating 5 mm square
chips. Typically, chips greater than 5 mm square are fabricated in
most cases, and therefore even if the evaluation could be
successfully applied only to a region distant from the wafer
peripheral edge by a distance of not less than 5 mm, it would be
considered sufficient. Accordingly, in that case, the above
expression (1) may be;
W+D/2.ltoreq.5 mm expression (2)
[0124] The electron beam apparatus according to this embodiment
evaluates the wafer 408 based on the obtained secondary electron
image in a manner, for example, as described below.
[0125] In a pattern defect inspecting method by way of the pattern
matching applied to the wafer 408, a control section (not shown)
controls the electron beam apparatus, compares a secondary electron
beam reference image for the wafer, which has no defect and has
been stored in a memory in advance, to an actually detected
secondary electron beam image and then calculates a similarity
between them. For example, if the similarity falls below a
threshold value, then it is determined that "a defect exists", and
a similarity exceeding the threshold value is determined as "no
defect". At this stage, the detected image can be indicated in a
display, though not shown. This will allow an operator to confirm
and evaluate ultimately whether or not the wafer 408 actually has a
defect. Further, images for partial regions may be compared for
matching to one another, so that the particular region including a
defective pattern may be automatically detected.
[0126] Further, for such a wafer that includes a plurality of the
same dies, by comparing detected images of the dies to one another,
a defective portion can be detected without the need for using the
reference image as in the case above. For example, if it is
determined that a first detected die image is not similar to a
second detected die image, and a third detected die image is the
same or similar to the first detected die image, then it may be
determined that the second detected die image does have a defect.
If a further precise algorithm for the comparative matching is
used, it may become possible to detect the defective portion
defined in the second detected die image.
[0127] Further, the electron beam apparatus according to this
embodiment can also be used as a line width measuring apparatus for
measuring a line width of a pattern formed on a wafer. A width of a
part where an actual intensity signal of a secondary electron
obtained by scanning an actual pattern on the wafer in a specific
direction continuously exceeds a threshold level, which has been
determined in advance through calibration, can be measured as the
line width of that specific pattern. If the thus measured line
width falls out of the predetermined range, then it may be
determined that said pattern does have a defect.
[0128] The above line width measuring method can be applied to
measurement of an aligning accuracy between respective layers of a
wafer 408 containing a plurality of layers. For example, a second
aligning pattern to be formed by the lithography applied to a
second layer should be formed in advance in the proximity of a
first aligning pattern to be formed by the lithography applied to a
first layer. Said line width measuring method is used to measure a
pattern interval between those two patterns, and then the measured
value is compared with a design value so as to determine aligning
accuracy between those two layers. It is a matter of course that
this method may be applied to a wafer containing three or more
layers. In that case, if the interval between the first and the
second aligning patterns is set to be approximately equal to a beam
interval between any adjacent beams of a plurality of primary
electron beams, accuracy can be measured with a minimum scanning
amount.
[0129] Further, the electron beam apparatus according to this
embodiment may be used as an apparatus for measuring a voltage
contrast between patterns formed on the wafer 408. For example, it
is assumed that if a potential of -10V had been applied to the
axisymmetric electrode 432 with respect to a wafer potential of 0V,
those two patterns formed on the wafer have potentials of -4V and
0V, respectively. In that case, since the secondary electron
emanated from the lower potential pattern has an upward speed
corresponding to a kinetic energy of 2 eV on the equipotential
surface of -2V, therefore the secondary electron can run over the
potential barrier and escape from the axisymmetric electrode 432,
which will be detected by the detector. On the other hand, the
secondary electron emanated from the higher potential pattern
cannot overcome the potential barrier of -2V but is pushed back
toward the wafer surface, which would not be detected. Accordingly,
the detected image of the lower potential pattern is brighter,
while the detected image of the higher potential pattern is darker.
Thus, the voltage contrast for the region to be inspected on the
wafer 408 can be accomplished. If the brightness and the potential
for the detected image had been calibrated in advance, the
potential of the pattern may be measured from the detected image.
Also from the potential distribution, a defective portion of the
pattern can be evaluated.
[0130] If a blanking deflector is arranged in the electron beam
apparatus of this embodiment so as to deflect the primary electron
beam to a stopper (not shown) disposed in the vicinity of the
crossover focused point at a predetermined cycle and thereby to
permit said beam to pass through for a short period and to block it
for the rest of the period, which will be repeated, then it will be
possible to form a bundle of beams having a short pulse width. If
such a beam having a short pulse width is used to measure the
potential on the wafer as described above, the device operation can
be analyzed with high time resolution. That is, the electron beam
apparatus of the present invention can be used as what is called an
EB tester.
[0131] The preferred embodiments of the fourth invention have been
described as above, but the fourth invention is not limited only to
the above-discussed examples.
[0132] For example, although the objective lens working distance
and the bore diameter have been denoted W and D, respectively, and
the values relating to the lower electrode 432 disposed most
proximal to the wafer have been used in the above embodiments, for
a case where this lower electrode has not been provided or not been
operative, the objective lens working distance W and the bore
diameter D may be determined with respect to the electrode 443 of
the objective lens 431.
[0133] Further, although in the above examples, the semiconductor
device has been used as the sample to be inspected, the fourth
invention is not limited to this, but an arbitrary sample
including, for example, a mask having a pattern formed thereon, for
which a defect may be detected by using the electron beam, may be
an object to be evaluated.
[0134] Further, a configuration of the electron beam apparatus may
be modified as desired, and the small-diameter lenses may be used
in the apparatus without being limited to the condenser lens or the
objective lens.
[0135] Further, as far as the pattern of the wafer 408 can be
inspected, a charged particle beam other than the electron beam may
be used.
[0136] As has been described above in detail, according to the
electron beam apparatus of the fourth invention, for such an
electron beam apparatus that uses an objective lens of a
decelerating electric field type that can reduce an axial chromatic
aberration coefficient and a spherical aberration, advantageously a
design scheme of the objective lens aiming for a highly accurate
evaluation of a sample by eliminating substantially any effect from
a peripheral edge of the sample has been obtained.
[0137] Further, according to one aspect of the fourth invention,
since at least objective lens has been designed to have such an
electrode that is made of insulating material formed into an
axisymmetric structure with a metal coating applied selectively
onto a surface thereof, advantageously a lens diameter may be
successfully reduced.
[0138] Further, according to another aspect of the fourth
invention, since a plurality of electron optical systems has been
installed above a single sheet of wafer, advantageously a
throughput of the sample evaluation may be improved.
Embodiment of a Fifth Invention
[0139] FIG. 9 is a schematic diagram showing an embodiment
implementing an electron beam apparatus according to a fifth
invention. As shown in FIG. 9, the electron beam apparatus
comprises a plurality of similarly configured electron optical
columns 560 (eight optical columns in the illustrated example)
arranged in parallel with one another above a sample 512. One
electron optical column 561 among those optical columns comprises
an electron gun 550, axial aligning deflectors 504, 505 functioning
for axial aligning of a primary electron beam, a condenser lens
506, an electrostatic deflector 507 for controlling a scanning
operation of the primary electron beam, an E.times.B separator 551
consisting of an electromagnetic deflector 509 and an electrostatic
deflector 510, an objective lens 511, and a detector 508 for
detecting a detection signal of either one of secondary electrons,
back scattered electrons or absorbed electrons, which have emanated
from the sample 512.
[0140] The electron gun 550 comprises a Wehnelt 502, a thermionic
emission cathode 501 and an anode 503, and functions for emitting a
primary electron beam so as to be irradiated onto the sample 512.
The thermionic emission cathode 501 is made of a mono-crystal of
LaB6. The primary electron beam emitted from the thermionic
emission cathode 501 of the electron gun 550 is axially aligned by
the axial aligning deflectors 504 and 505 with respect to the
condenser lens 506, which then focuses the primary electron beam
onto the sample 512. The primary electron beam, after having been
focused by the condenser lens 506, is then formed into an image on
the sample 512 by the objective lens 511. At the same time with
this step, the electrostatic deflector 507 and the electromagnetic
deflector 509 of the E.times.B separator 551 cooperate to deflect
the primary beam so as to scan the surface of the sample 512. Since
the angle of deflection by the electromagnetic deflector 509 has
been set approximately twice as much as the angle of deflection by
the electrostatic deflector 507, therefore there will be little
transverse chromatic aberration.
[0141] Either one of the secondary electrons, back scattered
electrons or absorbed electrons emanated from a scanned point on
the sample 512 is attracted by a high positive voltage applied to a
central electrode 519 of the objective lens 511 and thereby
accelerated and focused, and subsequently separated from a primary
optical system by the E.times.B separator 551 and introduced into a
secondary optical system thus to be focused on the detector
508.
[0142] The detector 508 detects either one of the focused secondary
electrons, back scattered electrons or absorbed electrons, and then
sends an electric signal representing the intensity thereof (a
detection signal for either one of the secondary electrons, back
scattered electrons or absorbed electrons) to an image forming
section, though not shown in the drawing. The image forming section
is further supplied with a scanning signal which has been given to
the electrostatic deflector 507 and the electromagnetic deflector
509 for deflecting the primary electron beam. The image forming
section can synthesize the scanning signal and the electric signal
to make the image data so that the image (SEM image) representing
the scanned surface area of the sample 512 may be formed or
displayed. The image data is compared with reference image data
representing a normal sample without any defects thus to detect any
defective portion of the sample 512.
[0143] Further, as shown in FIG. 9, the condenser lens 506 is a
lens made of a single ceramic piece as an insulating material,
which has been processed to include a plurality of electrodes with
a metal coating applied selectively to a surface thereof. The
plurality of electrodes of the condenser lens 506 consists of an
upper electrode 514, a central electrode 515 and a lower electrode
516, and a voltage is applied to the condenser lens 506 via a lead
fitting 552. Further, the objective lens 511 is, similar to the
condenser lens 506, a lens made of single ceramic piece as an
insulating material, which has been processed to include a
plurality of electrodes with a metal coating applied selectively to
a surface thereof. The plurality of electrodes of the objective
lens 511 consists of an upper electrode 518, a central electrode
519 and a lower electrode 520, and a voltage is applied to the
objective lens 511 via a lead fitting 553. As discussed above, the
condenser lens 506 and the objective lens 511 can be processed as
lenses with smaller outer diameters and thus the electron optical
column 561 can be fabricated with a smaller outer diameter, whereby
a large number of electron optical columns 561 may be accommodated
in side-by-side arrangement over a sheet of sample 512.
[0144] A feature of the fifth invention will now be described. A
heating electric power of said thermionic emission cathode 501 is
adjusted by means of a current to be applied to graphite (not
shown) compressed against both sides of the cathode 501. In a
coarse tuning of the heating electric power of the thermionic
emission cathode 501, as practiced in the prior art, the heating
electric power is set such that a lower increasing rate of the
emission current of the electron gun 550 may be accomplished during
the period when the heating electric power of the thermionic
emission cathode 501 is increased. Then, after the axial alignment
having been applied to the primary electron beam with respect to
the lens by the axial aligning deflectors 504 and 505 and the
electrostatic deflector 507, the primary electron beam is
irradiated against the sample 512, as described above, so as to
scan the surface of the sample 512 by superposing the scanning
voltage and the scanning current onto the electrostatic deflector
507 and the electromagnetic deflector 509 of the E.times.B
separator 551. Then, a secondary electron signal (a detection
signal) obtained at a time of line scanning on the sample 512 such
as a flat sample of bare silicon or the like is indicated on the
CRT (cathode-ray tube), while an effective value for the shot noise
is measured by a noise meter 562. The noise meter 562 has been
designed with such a configuration, in which the secondary electric
signal is passed though a band-pass filter, and the noise current
included in that band is commutated and smoothed so as to cause a
wave in the meter to indicate the effective value. Subsequently, a
certain level of beam current is applied to the thermionic emission
cathode 501, and the signal/noise ratio (the S/N ratio) or the
noise level measured in the detector 508 during the period when the
primary electron beam is irradiated against the sample 512 while
changing the heating electric power of the thermionic emission
cathode, is evaluated thus to determine a value for the heating
electric power of the thermionic emission cathode 501.
[0145] FIG. 10 shows the measured values of the signal/noise ratio
(the S/N ratio) and the noise level measured in the detector 508
during a period when the primary electron beam is irradiated
against the sample 512 while changing the heating electric power of
the thermionic emission cathode 501. In FIG. 10, a curve designated
by reference numeral 521 represents the S/N ratio when a certain
level of beam current is applied to the thermionic emission cathode
501. A curve designated by reference numeral 522 represents a
lifetime of the thermionic emission cathode 501, which has been
estimated from a relationship between the electric power and the
temperature in the thermionic emission cathode 501. A curve
designated by reference numeral 523 represents an emission current
of the electron gun 550. A curve designated by reference numeral
524 represents the noise level measured when a certain level of
beam current is applied to the thermionic emission cathode 501. It
is to be noted that in the coarse tuning, the heating electric
power of the thermionic emission cathode 501 is set within a range
in which the electron gun current of the electron gun 550 is
saturated (the range defined by and between reference numerals 525
and 525').
[0146] As can be seen from FIG. 10, as the heating electric power
of the thermionic emission cathode 501 is increased, that is, as
the temperature of the thermionic emission cathode 501 is
increased, the shot noise (the noise level resultant from a
statistical variation in the number of electron) is decreased,
thereby increasing the S/N ratio. Accordingly, by evaluating the
signal/noise ratio (the S/N ratio) or the noise level measured in
the detector 508 during a period when a certain level of beam
current is applied to the sample from the current emitted from the
thermionic emission cathode 501 and the primary electron beam is
irradiated against the sample 512 while changing the heating
electric power of the thermionic emission cathode 501 and thereby
determining the value for the heating electric power of the
thermionic emission cathode 501, the shot noise can be reduced and
the S/N ratio can be increased and thereby the secondary electrons
or the like emanated from the sample can be detected with an
improved S/N ratio. Further, since the temperature of the
thermionic emission cathode 501 can be controlled so as not to
reach an undesirable high temperature, the operating lifetime of
the thermionic emission cathode 501 can be extended. In addition,
by tentatively setting the cathode temperature easily under the
condition by the prior art where the emission current is saturated,
a condition accomplishing a higher S/N ratio can be established in
a relatively short time to facilitate easy setting of the optimal
cathode heating electric power. Furthermore, by applying firstly
the coarse tuning of the heating electric power of the thermionic
emission cathode 501 and secondly the fine tuning of the heating
electric power of the thermionic emission cathode 501 according to
the method of the present invention described above, an optimal
cathode heating condition can be established in a short time.
[0147] Alternatively, the value for the heating electric power of
the thermionic emission cathode 501 can be determined in such a
manner that the S/N ratio may exceed a predetermined value or the
noise level may fall onto or below a predetermined value when a
certain level of beam current is applied to the sample from the
electron flow emitted from the thermionic emission cathode 501. For
example, the value for the heating electric power of the thermionic
emission cathode 501 (the heating current of the cathode.times.the
cathode heating voltage) may be determined to be a value designated
by reference numeral 529 such that the S/N ratio can exceed the
value designated by reference numeral 528 in FIG. 10.
Alternatively, the value for the heating electric power of the
thermionic emission cathode 501 may be determined to be a value
designated by reference numeral 527 such that the noise level is
not greater than a value designated by reference numeral 526.
[0148] Alternatively, the value for the heating electric power of
the thermionic emission cathode 501 may be determined in such a
manner that the increasing rate of the S/N ratio to the heating
electric power can fall onto or below a predetermined value or the
decreasing rate of the noise level can fall onto or below a
predetermined value when a certain level of beam current is applied
to the sample from the beam emitted from the thermionic emission
cathode 501. For example, the value for the heating electric power
of the thermionic emission cathode 501 may be determined to be a
value designated by reference numeral 534 such that the increasing
rate of the S/N ratio to the heating electric power defined by
reference numeral 530 or 531 can be within the range of increasing
rate defined by reference numeral 531 in FIG. 10. Alternatively,
the value for the heating electric power of the thermionic emission
cathode 501 may be determined to be a value designated by reference
numeral 535 such that the decreasing rate of the noise level as
designated by reference numeral 532 or 533 can fall within a range
of decreasing rate defined by reference numeral 533.
[0149] In an alternative way, the value for the heating electric
power of the thermionic emission cathode 501 may be determined by
evaluating the noise current/beam current ratio. That is, the value
for the heating electric power of the thermionic emission cathode
501 may be determined such that the value defined by normalizing
the noise current by the beam current may not be greater than a
predetermined value.
[0150] According to the fifth invention, since such an innovative
electron optical column has been provided, which is configured such
that the electron beam emitted from the thermionic emission cathode
is irradiated onto the sample and either one of the secondary
electrons, the back scattered electrons or the absorbed electrons,
which has been emanated from the sample, is focused onto the
detecting system, wherein the value for the heating electric power
of the thermionic emission cathode is determined based on the
evaluation of the signal/noise ratio or the noise level measured in
the detecting system during the period when the electron beam is
irradiated onto the sample while changing the heating electric
power of the thermionic emission cathode, therefore the shot noise
is decreased and the S/N ratio is increases, so that the secondary
electron or the like emanated from the sample can be detected with
an improved S/N ratio.
Embodiment of a Sixth Invention
[0151] The present embodiment uses an electron beam apparatus as
described in the preceding embodiments to be applied to an
evaluation of a wafer in a semiconductor device manufacturing
process.
[0152] An example of the device manufacturing process will now be
described with reference to a flow chart of FIG. 11.
[0153] The manufacturing process includes the following main
processes.
[0154] (1) A wafer manufacturing process for manufacturing a wafer
(or wafer preparing process for preparing a wafer). (Step 600)
[0155] (2) A mask manufacturing process for fabricating a mask to
be used in the exposure (or a mask preparing process). (Step
601)
[0156] (3) A wafer processing process for performing any processing
treatments necessary for the wafer. (Step 602)
[0157] (4) A chip assembling process for cutting out those chips
formed on the wafer one by one to make them operative. (Step
603)
[0158] (5) A chip inspection process for inspecting an assembled
chip. (Step 604)
[0159] It is to be appreciated that each of those processes further
comprises several sub-processes.
[0160] Among those main processes, the principal process that gives
a critical affection to the performance of the semiconductor device
is the wafer processing process. In this wafer processing process,
the designed circuit patterns are stacked on the wafer one on
another, thus to form many chips, which will function as memories
and MPUs. This wafer processing process includes the following
sub-processes.
[0161] (1) A thin film deposition process for forming a dielectric
thin film to be used as an insulation layer and/or a metallic thin
film to be formed into a wiring section or an electrode section, or
the likes (by using the CVD process or the sputtering).
[0162] (2) An oxidizing process for oxidizing the formed thin film
and/or the wafer substrate.
[0163] (3) A lithography process for forming a pattern of the
resist by using a mask (reticle) in order to selectively process
the thin film layer and/or the wafer substrate.
[0164] (4) An etching process for processing the thin film layer
and/or the wafer substrate in accordance with the pattern of the
resist (by using, for example, the dry etching technology).
[0165] (5) An ions/impurities implant and diffusion process.
[0166] (6) A resist stripping process.
[0167] (7) An inspection process for inspecting the processed
wafer.
[0168] It should be noted that the wafer processing process must be
performed repeatedly as desired depending on the number of layers
contained in the wafer, thus to manufacture the device that will be
able to operate as designed.
[0169] FIG. 12 shows the lithography process included as a core
process in said wafer processing process. The lithography process
comprises the respective processes as described below.
[0170] (1) A resist coating process for coating the wafer having a
circuit pattern formed thereon in the preceding stage with the
resist. (Step 610)
[0171] (2) An exposing process for exposing the resist. (Step
611)
[0172] (3) A developing process for developing the exposed resist
to obtain the pattern of the resist. (Step 612)
[0173] (4) An annealing process for stabilizing the developed
pattern. (Step 613)
[0174] Known procedures may be applied to all of the semiconductor
manufacturing process, the wafer processing process, and the
lithography process described above.
[0175] When the electron beam apparatus according to the
above-described respective embodiments is applied to the wafer
inspection process (7) described above, such a semiconductor device
having a minute pattern can be evaluated with high throughput and
high precision, thus improving the yield of the products and
prohibiting any defective products from being delivered.
[0176] According to the device manufacturing method of the sixth
invention, since a wafer in the course of processing or after
completion of the process can be evaluated reliably with a high
throughput by using the electron beam apparatus described above,
advantageously it becomes possible to improve a yield of products
and to prevent defective products from being delivered.
* * * * *