U.S. patent application number 11/091660 was filed with the patent office on 2005-08-04 for electron microscope.
This patent application is currently assigned to HITACHI, LTD.. Invention is credited to Kaji, Kazutoshi, Otaka, Tadashi, Terada, Shohei.
Application Number | 20050167589 11/091660 |
Document ID | / |
Family ID | 32290229 |
Filed Date | 2005-08-04 |
United States Patent
Application |
20050167589 |
Kind Code |
A1 |
Kaji, Kazutoshi ; et
al. |
August 4, 2005 |
Electron microscope
Abstract
An electron microscope is provided, which enables an observation
with high resolution. The electron microscope is able to detect the
deviation of an electron beam relative to the opening of a slit
quantitatively, thereby shifting the electron beam accurately to
the center of the opening of slit so as to execute energy
selection. The electron microscope has an energy filter control
unit for adjusting a relative position between an electron beam and
a slit by shifting the position of electron beam based on a signal
delivered by an energy filter electron beam detector. Also a method
for controlling an energy filter is provided, which includes the
steps of shifting the position of an electron beam, determining the
position of electron beam and letting the electron beam pass
through the center of an opening of the slit by controlling the
position of slit or position of electron beam.
Inventors: |
Kaji, Kazutoshi; (Tokyo,
JP) ; Terada, Shohei; (Tokyo, JP) ; Otaka,
Tadashi; (Ibaraki, JP) |
Correspondence
Address: |
HOGAN & HARTSON L.L.P.
500 S. GRAND AVENUE
SUITE 1900
LOS ANGELES
CA
90071-2611
US
|
Assignee: |
HITACHI, LTD.
|
Family ID: |
32290229 |
Appl. No.: |
11/091660 |
Filed: |
March 28, 2005 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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11091660 |
Mar 28, 2005 |
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11052586 |
Feb 7, 2005 |
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11052586 |
Feb 7, 2005 |
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10620958 |
Jul 16, 2003 |
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Current U.S.
Class: |
250/311 |
Current CPC
Class: |
H01J 37/05 20130101;
H01J 37/28 20130101; H01J 2237/2594 20130101 |
Class at
Publication: |
250/311 |
International
Class: |
H01J 040/00; G21K
007/00 |
Foreign Application Data
Date |
Code |
Application Number |
Nov 18, 2002 |
JP |
2002-333020 |
Claims
1-10. (canceled)
11. An energy filter for selecting an electron beam having a
required range of energy levels comprising: an energy dispersion
section for dispersing an electron beam according to energy levels;
a slit for selecting the electron beam dispersed by the energy
dispersion section; and an energy filter control unit for adjusting
a relative position between the slit and the electron beam; wherein
when an electron beam is applied, which conducts a reciprocating
motion on the slit, the energy filter control unit adjusts the
relative position according to an electron beam which has passed
through the slit.
12. An energy filter according to claim 11, wherein the
reciprocating motion is a cyclical motion carried out relative to a
center position on which an electron beam without adjustment
illuminates.
13. An energy filter according to claim 11, wherein the slit is
disposed at a position on which the electron beam dispersed by the
energy dispersion section illuminates and an electron beam does not
illuminate when dispersion is not carried out by the energy
dispersion section.
14. An energy filter according to claim 11, wherein the energy
filter is disposed in one of upstream and downstream of a specimen
relative to a direction of traveling of an electron beam.
15. A method for adjusting a position of one of an energy filter
which selects an electron beam having a required range of energy
levels, a slit and an electron beam applied to the slit, the method
comprising the steps of: guiding an electron beam into an energy
dispersion section for dispersing the electron beam according to
energy levels; applying the electron beam dispersed by the energy
dispersion section to the slit; and adjusting a relative position
between the slit and the electron beam according to intensity of an
electron beam which has passed through the slit; wherein applying
the electron beam comprises controlling one of the electron beam
and the slit so that the electron beam carries out an reciprocal
motion on the slit.
16. A method for adjusting a position of one of an energy filter
which selects an electron beam having a required range of energy
levels, a slit and an electron beam applied to the slit, wherein
the energy filter comprises an energy dispersion section for
dispersing an electron beam according to energy levels and a slit
having a gap which is formed by at least a first shield and a
second shield, the method comprising the steps of: repeating
shifting of a position of an electron beam on the slit at least
once from a first position where the electron beam is intercepted
by the first shield, via the gap, to a second position where the
electron beam is intercepted by the second shield; and controlling
the position of the electron beam according to a change of
intensity of an electron beam passing through the slit.
17. A method according to claim 15, prior to guiding the electron
beam into the energy dispersion section, the method further
comprising the step of: adjusting coarsely one of the slit, the
energy dispersion section and a trajectory of an electron beam so
that the electron beam is positioned on the slit.
Description
FIELD OF THE INVENTION
[0001] The present invention relates to an electron microscope
having an energy filter and a method thereof for observation of a
specimen.
BACKGROUND OF THE INVENTION
[0002] Observation with an electron microscope has been playing an
important role in an analysis of micro constituents as a result of
the recent development in the areas such as semiconductor devices
and magnetic head elements, which have been experiencing continuous
improvement in size toward minuteness. It is known that the spatial
resolution of an electron microscope can be improved by decreasing
the energy width of an incident electron beam with an energy
filter, which is also called a monochrometer, so as to narrow an
electron beam probe.
[0003] U.S. Pat. No. 5,097,126 discloses an energy filter which can
adjust and stabilize the position of an electron beam on a slit,
which has a sensor capable of detecting the electron beam, such as
a fluorescent material which is able to detect a difference of
intensity of an incident electron beam.
[0004] Also another U.S. Pat. No. 5,798,524 discloses an electron
microscope, in which a predetermined percentage of an electron beam
passing through the opening of a slit is defined and an automatic
adjustment is performed for the electron microscope if the electron
beam falls below the predetermined value. The automatic adjustment
such as focusing of spectrum has the following steps: comparing the
amounts of incident electron beam on upper and lower slit haves
respectively; shifting the electron beam away from a slit half
intercepting the greater amount and toward the other slit half
intercepting the lesser amount; measuring the integrated intensity
of an image of electron beam; and analyzing the surface plot of
intensity.
[0005] Furthermore, the other U.S. Pat. No. 5,640,012 discloses an
apparatus, in which the width of an opening of slit is controlled
by shifting one of slit halves with an actuator according to an
output signal detected by a light detector, which detects the light
passing through the opening of slit.
[0006] As the width of the opening of slit is as small as some
micron meters, it is difficult to let an electron beam pass through
the center thereof.
[0007] Even after the electron beam passes through the opening
successfully, a position of electron beam on the slit shifts due to
the effect of instability of an electron beam source and the like,
so that the electron beam is intercepted, which results in
difficulty of observation with high resolution.
[0008] The apparatus according to the U.S. Pat. Nos. 5,097,126 and
5,798,524 is not able to compensate a deviation when the electron
beam is dislocated so away from the opening of slit that the
electron beam lies on a slit half. On the other hand, U.S. Pat. No.
5,640,012, which discloses a technique for controlling the width of
a slit accurately, does not refer to another technique for
controlling a position of electron beam on the slit so that the
electron beam is positioned in the center of the opening of
slit.
SUMMARY OF THE INVENTION
[0009] An electron microscope according to the present invention
enables an observation with high resolution, in which the deviation
of an electron beam relative to the opening of a slit is detected
quantitatively and the electron beam is shifted accurately to the
center of the opening of slit so as to execute energy
selection.
[0010] The electron microscope has an energy filter control unit
for adjusting a relative position between an electron beam and a
slit by shifting the position of electron beam based on a signal
delivered by an energy filter electron beam detector.
[0011] Also a method for controlling an energy filter is provided,
which includes the following steps: shifting the position of an
electron beam; determining the position of electron beam according
to an amount thereof, which has passed through a filter and is
detected by an electron beam detector; and letting the electron
beam pass through the center of an opening of the slit by
controlling the position of slit or position of electron beam. The
method provides a technique which enables regular detection of a
deviation by shifting an, electron beam from a position where the
electron beam is intercepted by the slit to the other position
where the electron beam is intercepted again after traversing the
opening of slit. The method also provides an alternative technique
for performing regular detection, which employs cyclical shifting
of an area on the slit illuminated by the electron beam. Cyclical
shifting in this case, for example, refers to shifting of a
position of electron beam back and forth relative to the initial
position on the slit in a direction of the width of opening.
[0012] An electron microscope according to the present invention,
which is able to selectively turn on or off an energy dispersion
section, allows an electron beam with energy dispersion to pass
through a slit while the energy dispersion section is on, or allows
an electron beam without energy dispersion to illuminate a specimen
directly while off.
[0013] An electron microscope disclosed in U.S. Pat. No. 5,097,126
has a slit whose location is fixed in the trajectory of an electron
beam independent of the operation of energy filter. In this way,
the electron microscope, in which the electron beam passes through
the slit even if the energy filter is not -in operation, inevitably
decreases an amount of electron beam, thereby lowering contrast in
an obtained image. On the other hand, an electron microscope
according to the present invention, which has switching of an
energy dispersion section, enables a type of observation of
specimen with high contrast and speed and the other type with high
resolution as well, which can be selected by simple switching.
BRIEF DESCRIPTION OF THE DRAWINGS
[0014] FIG. 1 is a schematic diagram showing major parts of an
electron microscope according to an embodiment of the present
invention.
[0015] FIG. 2 is a flow diagram showing an example of adjustment of
an electron microscope from axis adjustment to observation
according to an embodiment of the present invention.
[0016] FIG. 3 is a flow diagram showing an example of coarse
adjustment shown in FIG. 2.
[0017] FIG. 4 is a flow diagram showing an example of fine
adjustment shown in FIG. 2.
[0018] FIGS. 5A to 5D are diagrams showing a position of electron
beam and intensity of secondary electrons.
[0019] FIG. 6 is a diagram showing an example of slit shown in FIG.
1.
[0020] FIG. 7 is a schematic diagram showing major parts of an
electron microscope according to another embodiment of the present
invention.
[0021] FIG. 8 is a schematic diagram showing major parts of an
electron microscope according to the other embodiment of the
present invention.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0022] Electron microscopes are categorized as a scanning electron
microscope (SEM), a transmission electron microscope (TEM) and a
scanning transmission electron microscope (STEM).
[0023] An energy filter imposes a magnetic or electric field on an
incident charged particle such as an electron beam so that the
particle experiences energy dispersion, thereby taking out a
portion of the electron beam having a desirable energy width with a
slit disposed on an energy dispersion plane. An energy filter
mainly includes an energy dispersion section for causing energy
dispersion, a slit having an opening for letting an electron beam
pass through with a width of some micron meters to some ten
millimeters in a direction of energy dispersion and a dispersion
controller for controlling the intensity of magnetic or electric
field of the energy dispersion section.
[0024] SEM and TEM require a reduced electron probe in order to
improve spatial resolution. An energy filter, which performs energy
dispersion for an electron beam emitted by an electron beam source
and selection of electron beam with a slit, can narrow the energy
width of electron beam and the electron probe.
[0025] TEM and STEM, which perform energy dispersion for an
electron beam having transmitted through a specimen and select a
portion of the electron beam with a slit, focus an image with the
selected portion by which an observation of the specimen is
conducted. An electron beam experiences energy loss intrinsic to an
element, namely electronic structure as a result of interaction
with elements of a specimen while the electron beam transmits
through the specimen. An electron energy loss spectroscopy (EELS),
which conducts energy analysis for electrons having transmitted
through a specimen by an electron spectroscope, can provide
analysis for elements contained in the specimen. Furthermore, an
energy shift of some electron volts appears, resulting from
difference in chemical bonding, especially difference in electronic
structure of an element. Therefore, EELS is able to perform
measurement with high resolution if accurate selection of electron
beam is accomplished.
[0026] An electron microscope according to the present embodiment
has an electron beam source, an energy filter, an energy filter
detector, an electron beam shifting controller, a slit shifting
controller and a control unit. The electron beam source generates
an electron beam. The energy filter has an energy dispersion
section for dispersing the energy of electron beam and a slit for
selection of the energy of dispersed electron beam. The energy
filter detector detects the electron beam selected by the energy
filter. The electron beam shifting controller is able to control
the electron beam on the slit cyclically. The slit shifting
controller is able to control the position of slit cyclically. The
control unit controls the position of electron beam in the slit
based on an output signal delivered by one of the electron beam
shifting controller and slit shifting controller.
[0027] The electron microscope includes a scanning electron
microscope (SEM) or a scanning transmission electron microscope
(STEM), which has a scanning coil between a slit and a specimen to
scan an electron beam having passed through the slit, or a
transmission electron microscope (TEM) which has a specimen
downstream the slit relative to a direction of traveling of the
electron beam. The present invention can provide an image of high
spatial resolution obtained by an electron microscope.
[0028] Also the electron microscope includes a transmission
electron microscope (TEM) or a scanning transmission electron
microscope (STEM), which has one of specimen stage and holder for
setting a specimen between an electron beam source and an energy
dispersion section. The present invention can provide element
analysis or chemical bonding analysis with high accuracy.
[0029] Next, description is made for a method according to the
present invention.
[0030] The electron microscope according to the present invention
is able to shift an electron beam on a slit cyclically or shift at
least one of upper and lower shields cyclically so that the
position of electron beam can be controlled. A method associated
with controlling the electron microscope has the following steps. A
change in an electron beam is measured, for example in terms of
period and amplitude of the intensity of electron beam, responsive
to a cyclical change in the position of electron beam. Then, the
position of electron beam is determined in detail based on the
intensity of electron beam having passed through the opening of
slit or the intensity of secondary electrons emitted by a specimen
illuminated by the electron beam.
[0031] Also, the method has a step of measuring a change in the
intensity of electron beam when the electron beam or slit is
shifted in one direction, so that the position of electron beam can
be determined. In this connection, being shifted in one direction
means that shifting of an electron beam starts at one shield and
stops at the other shield traversing an opening of slit. It is also
described differently that the slit is shifted so that the electron
beam is intercepted, passes through the opening and intercepted
again.
[0032] The electron microscope is able to detect the position of
electron beam on the slit accurately based on measurement results
of the intensity of electron beam, thereby shifting the electron
beam to the center of the opening of slit. In this way, the
electron microscope can restrict a decrease in the intensity of
electron beam, thereby extracting the electron beam having higher
energy resolution or a narrow energy width.
[0033] In an electron microscope of conventional technique, an
electron beam having passed through a specimen has an energy
distribution due to inelastic scattering with the specimen. An
electron beam is selected from the energy distribution by an energy
filter having an energy dispersion section and a slit. In this way,
an observation is made for an image of electron microscope or a
spectrum of electron energy loss spectroscopy (EELS) using the
selected electron beam. On the other hand, an electron microscope
according to the present invention is able to control to keep a
position of electron beam in the center of an opening of slit
accurately, thereby providing an observation with higher energy
resolution for an image or a spectrum of electron microscope.
[0034] A method according to the present invention for adjusting an
electron microscope for observation of a specimen has steps which
enable an accurate control for positioning an electron beam in the
center of an opening of slit. The steps include: shifting the
position of electron beam cyclically or shifting at least one of
shields cyclically and detecting the electron beam having passed
through the opening of slit or second electrons emitted by the
specimen illuminated by the electron beam. The method for
controlling the beam position allows illuminating the specimen with
the electron beam of a narrow energy width, which has passed
through an energy filter. Or the method permits illuminating a
specimen with an electron beam probe of a small diameter, using the
electron beam of a narrow energy width. In this way, the method
achieves observation of a specimen with higher spatial
resolution.
[0035] The method according to the present invention has a feature
that a position of electron beam on the slit is controlled based on
at least one of the period and amplitude of an output signal
detected by an electron beam detector, comparing the period with
another period of an output signal delivered by a shifting
controller which controls cyclical shifting of the electron beam on
the slit.
[0036] The method described above can be applied to an electron
beam which transmits through a specimen. The method is thus
applicable to a transmission electron microscope, in which an
electron beam can be observed that has undergone energy selection
and transmitted through the specimen.
[0037] An electron microscope according to the present invention
has a feature that a slit is disposed away from the trajectory of
electron beam when an energy dispersion section of energy filter is
turned off. This allows an adjustment of electron trajectory, from
an electron beam source to a specimen without the slit, thereby
simplifying the steps associated with axis adjustment. Furthermore,
the electron microscope facilitates selection for different types
of observation by introducing simple switching. One is an
observation which does not require an energy filter and the other
is an observation requiring an energy filter to acquire high
spatial resolution with an electron beam having a narrow energy
width.
[0038] a. Electron Microscope
[0039] An embodiment of an electron microscope according to the
present invention is now described in detail referring to the
accompanying drawings.
[0040] FIG. 1 is a schematic diagram illustrating major parts of a
scanning electron microscope having an energy filter according to
the embodiment of the present invention. An electron beam 2
generated by an electron beam source 1 is converged by a condenser
lens 3 and then directed to an energy filter 5. The energy filter 5
includes an energy dispersion section 6 and a slit 7 disposed on a
dispersion plane of electron beam. Magnets or electrodes in the
energy dispersion section 6 produce a magnetic or electric field,
which is in an out-of-plane direction in FIG. 1, thereby dispersing
the electron beam according to the energies. Any type of energy
dispersion section may be selected other than the configuration
shown in FIG. 1 as long as it can disperse energy of an electron
beam.
[0041] When the energy filter 5 is in operation, an electron beam
undergoes dispersion caused by a magnetic field generated by the
energy dispersion section 6. The electron beam selected by the slit
7 is thus emitted from the energy filter 5. On the other hand; when
the energy filter 5 is not in operation, the energy dispersion
section 6 does not generate a magnetic field and thereby the
electron beam 2 travels straight out of the energy filter 5.
[0042] An objective lens 12 forms a probe on a specimen 13 with the
electron beam coming out of the energy filter 5. An electron beam
scanning coils 10 scans the electron beam on the specimen 13 in two
dimensions and a secondary electron detector 15 detects secondary
electrons 14 emitted by the specimen 13. In this way, an image of
secondary electrons of the specimen 13 is shown on a display unit
25.
[0043] The electron microscope according to the present embodiment
has also an energy filter electron beam detector 11 for measuring
an electron beam coming out of the energy filter 5. Furthermore,
the electron microscope has a deflection coil 9 for guiding the
electron beam into the energy filter electron beam detector 11 or
for correcting the trajectory of electron beam coming out of the
energy filter 5.
[0044] A control unit 20, to which an input unit 26 is electrically
connected, has an electron microscope controller 21, an energy
filter controller 22, a shifting controller 23 and a signal
analyzer 24. The electron microscope controller 21 controls the
conditions for acceleration of electron in the electron beam source
1 and the conditions for setting of coils. The energy filter
controller 22 controls the energy filter 5, which includes coils
for generating a magnetic field or electrodes for generating an
electric field for the energy dispersion section 6. The shifting
controller 23 generates modulation signals for controlling a
position of electron beam on a slit 7 or a position of at least one
of upper and lower shields 31, 32. The signal analyzer 24 analyzes
the position of electron beam on the slit 7 based on an output
signal delivered by the secondary electron detector 15 or energy
filter electron beam detector 11 as well as an output signal
delivered by the shifting controller 23.
[0045] The conditions for acceleration of electron in the electron
beam source 1, the magnetic or electric field intensity of the
energy dispersion section 6 or a deflection coil 4, which is
disposed between the condenser lens 3 and the energy filter 5, can
be used for controlling of a position of electron beam on the slit
7. As shown in FIG. 6, the slit 7 according to the present
invention is able to adjust the position of electron beam. The slit
7 has a pair of upper and lower shields 31, 32 and a pair of
piezoelectric devices 33 and 34. At least one of upper and lower
shields 31, 32 is connected to one of piezoelectric devices 33 and
34. The adjustment is performed in such a manner that the
piezoelectric devices 33 and 34 are controlled according to the
output signal delivered by the shifting controller 23 so that whole
slit 7 can be shifted or the width of an opening of slit 7 can be
controlled.
[0046] The slit 7 is placed so that the electron beam can bypass
the slit 7 when the energy filter 5 is turned off. In this way, the
electron microscope is able to provide a measurement with higher
contrast and a substantial amount of electron beam if such a
measurement without energy dispersion is desired. An observation
with high resolution, which requires a narrow energy width of
electron beam, brings reduction in the contrast of an image due to
decrease in an amount of electron beam. The electron microscope
according to the present invention is thus able to provide
flexibility in observation to select a high speed and contrast
observation or a high resolution observation. In this connection,
the selection can be done by simple switching.
[0047] b. Method for Adjusting an Electron Microscope for a High
Contrast Observation
[0048] Next, an embodiment of method for adjusting an electron
microscope for observation of a specimen according to the present
invention is described referring to FIGS. 2, 3, 4 and 5.
[0049] As described above, the electron microscope according to the
present invention is able to perform a measurement with a
substantial amount of electron beam by turning off an energy filter
5. First, an adjustment of axis of the electron microscope is
performed while the energy filter 5 is turned off (Step 101). Since
a magnetic field is not imposed on an energy dispersion section 6
while the energy filter 5 is turned off, an incident electron beam
travels straight, leaving out of the energy filter 5. After
completion of step 101, a measurement of the intensity Is0 of
secondary electrons emitted by a specimen 13 using a secondary
electron detector 15 or the other measurement of the intensity If0
of electron beam using an energy filter electron beam detector 11
is performed (Step 102). When the intensity If0 of electron beam is
measured, a deflection coil 9 controls the trajectory of electron
beam so that the electron beam is directed to the energy filter
electron beam detector 11.
[0050] c. Method for Adjusting an Energy Filter
[0051] The width of an opening of a slit 7 in an energy filter 5 is
set to be an initial value W0 (Step 103). The initial value W0 can
be selected so that the width is large enough to let every
dispersed electron beam pass through the opening of slit 7, for
example. Setting the initial value W0 for the width of opening of
slit 7, the intensity Is1 of secondary electrons is measured by a
secondary electron detector 15 or the intensity If1 of electron
beam is measured by an energy filter electron beam detector 11
(Step 104). If the measured intensity Is1 or If1 is equal to or
greater than zero (Step 105), the width of the opening of slit 7 is
set to be a desired value W1 (Step 106). If Is1 or If1 is
approximately equal to zero, which means that the slit 7 intercepts
almost all the electron beam and very small amount thereof passes
through the energy filter 5, a coarse adjustment for the axis of
energy filter 5 should be performed (Step 120).
[0052] d. Method for Coarse Adjustment of Axis for an Energy
Filter
[0053] An embodiment of a method for coarse adjustment of axis for
an energy filter 5 is described referring to FIG. 3.
[0054] An electron beam on a slit 7 or at least one of upper and
lower shields 31 and 32 is shifted with a period X and amplitude A1
(Step 121). The intensity Is1 (.omega.) of secondary electrons is
measured by a secondary electron detector 15 or the intensity If1
(.omega.) of electron beam is measured by an energy filter electron
beam detector 11 (Step 122). The amplitude A1 is increased until
Is1 (.omega.) or If1 (.omega.) reaches equal to or greater than
zero (Steps 123, 125) and an amplitude at this timing is
denominated A2. It is determined on which one of the upper and
lower shields 31, 32 the electron beam exists, by analyzing the
intensity Is1 (.omega.) or If1 (.omega.) (Step 126),. Then, the
width of opening of slit 7 is set to be the predetermined value W1
(Step 127). The position of electron beam on the slit 7 is shifted
toward the opening by a distance of .delta.X (Step 128). .delta.X
is determined in the following manner. If the distance between the
position of electron beam on the slit 7 and the opening thereof
does not change after executing Step 127, .delta.X should be set
according to the equation: .delta.X=A2+W1.times.1/2. If the
distance increases, for example by W0-W1, .delta.X should be set
according to the equation: .delta.X=A2+W0-W1>1/2. A coarse
adjustment of axis completes by setting amplitude of 2.times.W1 for
shifting of the position of electron beam on the slit 7 or shifting
of at least one of the upper and lower shields 31, 32(Step
129).
[0055] e. Method for Fine Adjustment of Axis for an Energy
Filter
[0056] An embodiment of a method for controlling the position of
electron beam on a slit 7 accurately (Step 150) is described
referring to FIGS. 4 and 5.
[0057] An electron beam on the slit 7 or at least one of upper and
lower shields 31, 32 is shifted with a period .omega. and amplitude
A5 (Step 151). A maximum intensity Is5 max of secondary electrons
is measured by a secondary electron detector 15 or a maximum
intensity If5max of electron beam is measured by an energy filter
electron beam detector 11 (Step 152). The amplitude A5 should be a
half of the width W1 of opening of slit 7 or approximately same as
W1. An analysis is performed for a period .theta. of intensity
change of secondary electrons or electron beam (Step 153) and a
judgment is made on whether or not the period .theta. is equal to
2.omega. (Step 154).
[0058] If the period .theta. is equal to 2.omega., a fine
adjustment is completed (Step 155). If the period .theta. is equal
to .omega., another adjustment should be performed. A method for
detecting a position of electron beam on a slit is described first
and then a method for the adjustment is described.
[0059] FIGS. 5A through 5D show an intensity change of secondary
electrons and a position change of electron beam when the position
of electron beam on slit 7 is cyclically oscillated with amplitude
of W1.
[0060] FIG. 5A illustrates a case where the position of electron
beam is in the center of opening of slit 7 when an oscillation is
not applied.
[0061] FIG. 5B illustrates a case where the position of electron
beam is at an end of the opening of slit 7 or the electron beam is
at an end of upper shield 31.
[0062] FIG. 5C illustrates a case where the position of electron
beam is shifted by W1.times.1/2 from the end of the opening of slit
7 toward the upper shield 31.
[0063] FIG. 5D illustrates a case where the position of electron
beam is shifted by W1 from the end of the opening of slit 7 toward
the upper shield 31.
[0064] As is obvious by these figures, the intensity change of
secondary electrons has a period of 2.omega. only if the electron
beam is in the center of opening of slit 7 and otherwise the period
takes a value of .omega..
[0065] As shown in FIG. 5B, when an electron beam is at an end of
the opening of slit 7, a maximum intensity Imax appears twice a
period. If the electron beam shifts further away from the opening,
the maximum intensity Imax appears only once a period as shown in
FIG. 5C. If the electron beam shifts much further, the intensity of
electron beam constantly takes a smaller value than the Imax as
shown in FIG. 5D. In this way, it is possible to judge whether or
not a fine adjustment is required according to,,a period of
intensity change. It is also possible to know how much an electron
beam on the slit 7 is offset from the center of the opening of slit
7 according to the number of appearances of the maximum intensity
Imax in a period.
[0066] A method for a fine adjustment when a period .theta. of the
intensity change of secondary electrons is not equal to 2.omega.,
for example .theta.=.omega., is now described below.
[0067] A number N of appearances of the maximum intensity Imax of
secondary electrons or electron beam in a period of .omega. is
inspected by a secondary electron detector 15 or an energy filter
electron beam detector 11, respectively (Step 156). If N is equal
to two (N=2), one of the following adjustments should be made at
Step 157. An analysis is performed for determining an amount of
shifting of electron beam which maximizes the intensity of
secondary electrons, and hen the electron beam is shifted
accordingly. Alternatively, another analysis is performed for
determining an amount of shifting of slit 7 which maximizes the
intensity of electron beam and then the slit 7 is shifted
accordingly. If N is equal to one or zero (N=1 or 0), the electron
beam on the slit 7 is shifted toward the opening by a half of the
width W1 thereof (Step 158). Subsequently, the flow returns to Step
152 where a measurement is performed for the intensity of secondary
electrons or electron beam.
[0068] f. Observation of Electron Microscope After Fine Axis
Adjustment
[0069] If a position and an incident angle of electron beam
incident on an energy dispersion section 6 are changed by a
deflection coil 4 as a result of the adjustment described above,
another adjustment should be made to compensate the change with a
deflection coil 9.
[0070] Since the position and angle of electron beam are corrected
at both entrance and exit of energy filter 5, the electron beam is
able to travel in the same trajectory as that which occurs while
dispersion generated by the energy filter 5 is turned off. As a
result, an energy width of electron beam passing through the energy
filter 5 can be narrowed.
[0071] A probe of an electron beam with a narrow energy width is
formed on a specimen 13 using an objective lens 12. The electron
beam passing through the energy filter 5, which has a small energy
width, can restrict the effect of chromatic aberration caused by
the objective lens 12. As a result, the diameter of electron beam
probe on the plane of specimen 13 can be reduced to approximately a
half of that, which is achieved when an electron beam does not pass
through an energy filter.
[0072] Scanning with an electron beam probe is performed
two-dimensionally on the plain of specimen 13 by controlling an
electron beam scanning coils 10. Secondary electrons 14 emitted by
the specimen 13 is detected by the secondary electron detector 15
and an image of secondary electrons is observed by a signal
analyzer 24. In this way, using a small electron beam probe, it is
possible to observe an image of secondary electrons with higher
spatial resolution.
[0073] While an observation of image of electron microscope is
performed, checking is made for axial shifting of electron beam as
required and a fine adjustment of axis should be made. Checking of
axial shift based on change of intensity has the following steps:
oscillating an electron beam on the slit 7 with a period .omega.
and amplitude 2.times.W1; measuring the intensity of secondary
electrons with the secondary electron detector 15 or the intensity
of electron beam with the energy filter electron beam detector 11.
A judgment on shifting of electron beam is based on a period
.theta. of intensity change and a number N of appearances of
maximum intensity of electron beam. Checking in parallel with the
observation facilitates maintaining higher resolution easily,
thereby allowing a desirable observation with an electron
microscope.
[0074] Though description has been made for a scanning electron
microscope (SEM) exemplarily in the present embodiment, a same type
of energy filter as the energy filter 5 can be used for a scanning
transmission electron microscope (STEM). Therefore, the schematic
diagram of the present embodiment shown in FIG. 1 can be applied to
an STEM.
[0075] FIG. 7 is a schematic diagram showing major parts of a
transmission electron microscope according to another embodiment,
which has an energy filter. An electron beam 2 generated by an
electron beam source 1 is controlled by a condenser lens 3 and an
objective lens 12, illuminating a specimen 13. The electron beam
having transmitted through the specimen 13 enters an energy filter
5 where the electron beam undergoes energy dispersion made by an
energy dispersion section 6 and energy selection executed by a slit
7. Subsequently, the electron beam, which is projected in an
observation chamber with intermediate and projection lenses, is
used for observing an image of electron microscope and measurement
of electron beam energy loss spectrum. The energy filter 5
according to the present embodiment is same as that of the
embodiment shown in FIG. 1.
[0076] FIG. 8 is a schematic diagram showing a transmission
electron microscope according to the other embodiment, which has
two energy filters. The transmission electron microscope includes
an electron beam source 1, an energy dispersion section 6A which is
disposed upstream a specimen 13 and narrows an energy width of
electron beam generated by the electron beam source 1 and the other
energy dispersion section 6B for analyzing the electron beam having
transmitted through the specimen 13. In this connection, a detector
for observing an image of electron microscope and the like are
omitted. The transmission electron microscope according to the
present embodiment illuminates an electron beam with a narrow
energy width, thereby allowing an observation of image with higher
spatial resolution. Furthermore, the transmission electron
microscope can perform an energy analysis of electron beam having
transmitted through the specimen, thereby providing an accurate
image for element distribution and also an accurate image and
spectrum for the state of chemical bonding.
* * * * *