U.S. patent application number 10/269619 was filed with the patent office on 2003-05-08 for apparatus and method for evaluating a wafer of semiconductor material.
Invention is credited to Borden, Peter G., Li, Jiping, Nijmeijer, Regina G..
Application Number | 20030085730 10/269619 |
Document ID | / |
Family ID | 22253657 |
Filed Date | 2003-05-08 |
United States Patent
Application |
20030085730 |
Kind Code |
A1 |
Borden, Peter G. ; et
al. |
May 8, 2003 |
Apparatus and method for evaluating a wafer of semiconductor
material
Abstract
An apparatus and method uses diffusive modulation (without
generating a wave of carriers) for measuring a material property
(such as any one or more of: mobility, doping, and lifetime) that
is used in evaluating a semiconductor wafer. The measurements are
carried out in a small area, for use on wafers having patterns for
integrated circuit dice. The measurements are based on measurement
of reflectance, for example as a function of carrier concentration.
In one implementation, the semiconductor wafer is illuminated with
two beams, one with photon energy above the bandgap energy of the
semiconductor, and another with photon energy near or below the
bandgap. The diameters of the two beams relative to one another are
varied to extract additional information about the semiconductor
material, for use in measuring, e.g. lifetime.
Inventors: |
Borden, Peter G.; (San
Mateo, CA) ; Nijmeijer, Regina G.; (Mountain View,
CA) ; Li, Jiping; (Mountain View, CA) |
Correspondence
Address: |
SILICON VALLEY PATENT GROUP LLP
2350 MISSION COLLEGE BOULEVARD
SUITE 360
SANTA CLARA
CA
95054
US
|
Family ID: |
22253657 |
Appl. No.: |
10/269619 |
Filed: |
October 11, 2002 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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10269619 |
Oct 11, 2002 |
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09544280 |
Apr 6, 2000 |
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6489801 |
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09544280 |
Apr 6, 2000 |
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09095804 |
Jun 10, 1998 |
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6049220 |
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Current U.S.
Class: |
324/754.23 ;
257/E21.53; 324/762.05 |
Current CPC
Class: |
G01N 21/1717 20130101;
G01R 31/311 20130101; G01R 31/2656 20130101; G01R 31/2648 20130101;
H01L 22/12 20130101 |
Class at
Publication: |
324/765 |
International
Class: |
G01R 031/26 |
Claims
What is claimed is:
1. An apparatus for evaluating a wafer, said apparatus comprising:
a first source of a first beam of photons having a first intensity
modulated at a frequency sufficiently low to avoid creation of a
wave of charge carriers in a region of said wafer when said first
beam is incident on said region; a second source of a second beam
of photons, said photons in said second beam having energy
sufficiently lower than said energy of said photons in said first
beam to avoid creation of more than a negligible number of charge
carriers in said region when said second beam is incident on said
region; and a photosensitive element located in a path of a portion
of said second beam, said portion being modulated at said frequency
after reflection by said region, said photosensitive element
generating a first signal indicative of a first concentration of
said charge carriers created in said region by incidence of said
first beam.
2. The apparatus of claim 1 further comprising: a computer coupled
to said photosensitive element and programmed to determine a value
of a material property in said region by use of said first signal
and a second signal generated by said photosensitive element in
response to a change in a parameter related to generation of at
least one of said first beam and said second beam.
3. The apparatus of claim 2 wherein: said parameter is intensity of
said first beam; and said computer is programmed to: compute a
ratio of (a) difference between said first signal and said second
signal and (b) difference between said first intensity and said
second intensity; and compare said ratio with a corresponding ratio
of a predetermined wafer having a known mobility to determine
mobility in said region.
4. The apparatus of claim 2 wherein: said computer determines a
value of an attribute, the attribute being a change in said second
signal for a unit change in said first signal; and said computer
uses the formula 44 unk = m ref m unk ref to compute mobility in
said region, wherein M.sub.unk is said value of said attribute,
m.sub.ref is another value of said attribute for a reference wafer,
and .mu..sub.ref is the mobility of said reference wafer.
5. The apparatus of claim 2 wherein: said second signal is
generated at a distance from said region, said parameter being said
distance; and said computer uses a predetermined range of lifetimes
of wafers that are acceptable, and a corresponding range of
intensity measurements at said distance of wafers having known
lifetimes to determine whether said wafer has an acceptable
lifetime.
6. The apparatus of claim 2 wherein: said parameter is the diameter
of one of said beams; and said computer uses a predetermined range
of lifetimes of wafers that are acceptable, and a corresponding
range of intensity measurements for said diameter of said probe
beam to determine whether said wafer has an acceptable
lifetime.
7. The apparatus of claim 2 wherein said computer is programmed to:
compute a plurality of coefficients of at least a group of said
signals when plotted against corresponding values of said
parameter; and compare at least one coefficient in said plurality
with a corresponding coefficient of a predetermined wafer having a
known value of a material property to determine a value of said
material property in said region.
8. The apparatus of claim 7 wherein: said parameter is intensity of
said first beam; and said coefficient is a first order coefficient
and the material property is junction depth.
9. The apparatus of claim 7 wherein: said parameter is intensity of
said first beam; and the coefficient is a first order coefficient
and the material property is mobility.
10. The apparatus of claim 7 wherein: said parameter is intensity
of said first beam; and the coefficient is a zeroth order
coefficient and the material property is surface concentration.
11. The apparatus of claim 7 wherein: said parameter is intensity
of said first beam; and the coefficient is a first order
coefficient and the material property is sheet resistance.
12. The apparatus of claim 2 wherein said computer is programmed
to: compute a plurality of coefficients of a plot of said signals
against corresponding values of said parameter, said parameter
being intensity of said first beam; and compare at least one
coefficient in said plurality with a corresponding coefficient of a
predetermined wafer having been subjected to a process at a known
value of a process condition to determine a value of said process
condition for said wafer.
13. The apparatus of claim 2 wherein said computer is programmed
to: determine an intersection point of a first line that
approximates a high power portion formed by a first group of said
signals at a first extremity in a range of values of said signals
and a second line that approximates a low power portion formed by a
second group of said signals at a second extremity in said range;
and compare a coordinate of said intersection point with a
corresponding coordinate of an intersection point of a
predetermined wafer having a known concentration of active dopants
to determine the concentration of active dopants in said
region.
14. The apparatus of claim 2 wherein: said parameter is a diameter
of one of said beams; and the material property is lifetime.
15. The apparatus of claim 2 wherein: said parameter is a distance
between said first beam and said second beam; and the material
property is lifetime.
16. The apparatus of claim 1 further comprising: a wafer processing
unit; and a computer coupled to said wafer processing unit and to
said photosensitive element, said computer being programmed to
control operation of said wafer processing unit based on at least
said first signal.
17. The apparatus of claim 16 further comprising a rapid thermal
annealer, wherein: said wafer processing unit includes an ion
implanter; and said computer is coupled to said rapid thermal
annealer, and is programmed to control operation of at least one of
said ion implanter and said rapid thermal annealer based on at
least said first signal.
18. The apparatus of claim 1 further comprising: a rapid thermal
annealer; and a computer coupled to said rapid thermal annealer and
programmed to control operation of said rapid thermal annealer
based on at least said first signal.
19. The apparatus of claim 1 further comprising: a computer
programmed to display on a monitor a message indicating acceptance
or rejection of a wafer under measurement, the computer being
couled to said photosensitive element.
20. The apparatus of claim 1 further comprising: means for
processing said wafer; and a computer coupled to said means for
processing and to said photosensitive element, said computer being
programmed to control said means for processing in response to at
least said first signal generated by said photosensitive
element.
21. The apparatus of claim 1 further comprising: a stage capable of
moving said wafer with respect to said first source and said second
source; wherein: said photosensitive element generates a plurality
of signals related to a corresponding plurality of regions on said
wafer when said wafer is moved by said stage.
22. The apparatus of claim 21 further comprising: a computer
coupled to said photosensitive element and programmed to compute a
ratio of a local maximum in said plurality of signals to a local
minimum in said plurality of signals, compare the ratio with a
predetermined limit, and display a message on a monitor indicating
acceptance or rejection of said wafer.
23. The apparatus of claim 21 further comprising: a computer
coupled to said photosensitive element and programmed to check if
any of said plurality of signals falls outside a predetermined
range, and display a message on a monitor indicating acceptance or
rejection of said wafer.
24. The apparatus of claim 21 further comprising: a computer
coupled to said photosensitive element and programmed to determine
a value of a material property in said region by use of said first
signal and a second signal generated by said photosensitive element
for said region after a change in intensity of said first beam.
25. The apparatus of claim 21 wherein: said stage moves said wafer
in two dimensions; and said photosensitive element generates at
least one signal in said plurality of signals at each region in
said plurality of regions.
26. The apparatus of claim 21 further comprising: a rapid thermal
annealer; and said computer is programmed to control operation of
said rapid thermal annealer in response to one of said plurality of
signals.
27. The apparatus of claim 1 wherein: said first source generates
first photons having energy greater than bandgap energy of a
semiconductor material in said region; and said second source
generates second photons having energy lesser than said bandgap
energy.
28. The apparatus of claim 27 wherein: said first photons have a
first wavelength smaller than 950 nm; and said second photons have
a second wavelength larger than 950 nm.
29. The apparatus of claim 1 wherein: said first beam has a first
diameter at a surface of said wafer; said second beam has a second
diameter at said surface; and said first diameter is greater than
or equal to said second diameter.
30. An apparatus for generating an electrical signal indicative of
a property of a region in a wafer, said wafer including a
semiconductor material at said region, said apparatus comprising:
an oscillator oscillating at a frequency lower than 1000 KHz during
operation; a first source of a first beam, said first source being
coupled to said oscillator to generate said first beam at an
intensity modulated at said frequency, said first beam containing a
plurality of first photons having energy greater than the bandgap
energy of said semiconductor material thereby to create a plurality
of charge carriers when incident on said region, the number of said
plurality of charge carriers being modulated at said frequency
without the creation of a wave; a second source of a second beam,
said second beam containing a plurality of second photons having
energy lower than said bandgap energy; a partially transmissive
mirror located in the path of each of said first beam and said
second beam, said partially transmissive mirror being positioned to
reflect one of said first beam and said second beam along a path
coincident with the path of the other of said first beam and said
second beam thereby to create a combined beam; a beam splitter
positioned in said coincident path; a sensor capable of sensing
said second photons, said sensor being coupled to said beam
splitter to receive a group of second photons reflected by said
region; a lock-in amplifier coupled to said oscillator and to said
sensor, said lock-in amplifier having an output line; wherein said
lock-in amplifier generates on said output line a signal indicative
of an average number of said second photons modulated at said
frequency and reflected by said region.
31. The apparatus of claim 30 wherein: said sensor includes
germanium.
32. The apparatus of claim 30 wherein said first beam has a power
that is adjustable by said first source, and the apparatus further
comprises: a computer coupled to said output line and programmed to
determine a value of a material property in said region in response
to a plurality of values of said second signal generated by
adjusting said power of said first beam to a corresponding
plurality of levels.
33. The apparatus of claim 30 wherein: said frequency of modulation
by said first source is smaller than 10 Khz.
34. An apparatus for measuring a property of a wafer, said wafer
including a semiconductor material, said apparatus comprising: an
oscillator capable oscillating at a frequency smaller than 1000
KHz; a first source of a first beam, said first source being
coupled to said oscillator to generate said first beam at an
intensity modulated at said frequency, said first beam containing a
plurality of first photons having energy greater than the bandgap
energy of said semiconductor material thereby to create a plurality
of charge carriers when incident on a region of the semiconductor
material, the number of said plurality of charge carriers being
modulated at said frequency; a second source of a second beam, said
second beam containing a plurality of second photons having energy
lower than said bandgap energy, said second beam being polarized; a
partially transmissive mirror located in the path of each of said
first beam and said second beam, said partially transmissive mirror
being positioned to reflect one of said first beam and said second
beam along a path coincident with the path of the other of said
first beam and said second beam; a polarizing beam splitter located
in the path of reflection of said second beam from said wafer; a
first sensor coupled to said polarizing beam splitter to receive a
first portion of electromagnetic radiation from said polarizing
beam splitter; and a second sensor coupled to said polarizing beam
splitter to receive a second portion of electromagnetic radiation
from said polarizing beam splitter; wherein said first portion and
said second portion are respectively the sum and difference
components of interference of: a portion of said second beam prior
to said reflection by said wafer; and another portion of said
second beam subsequent to said reflection by said wafer.
35. The apparatus of claim 34 further comprising: a lock-in
amplifier coupled to said first sensor and to said second sensor;
wherein said lock-in amplifier generates a third signal indicative
of the difference between a first signal from said first sensor and
a second signal from said second sensor on receipt of said first
signal and said second signal, said third signal being in phase
with oscillations of said oscillator.
36. The apparatus of claim 34 wherein said power of said first beam
generated by said first source is adjustable, and the apparatus
further comprises: a computer coupled to said lock-in amplifier and
programmed to determine a value of a material property in said
region in response to a plurality of values of said third signal
generated by adjusting said power of said first beam to a
corresponding plurality of levels.
37. A method for evaluating a wafer, said method comprising:
creating a plurality of charge carriers in a region of said wafer,
the number of said charge carriers being modulated at a frequency
that is sufficiently low to avoid creation of a wave of said charge
carriers; focusing on said region a first beam of first photons
having energy lower than bandgap energy of a semiconductor material
in said region; and measuring a first intensity of a portion of
said first beam modulated at said frequency after reflection by
said region.
38. The method of claim 37 further comprising: changing a parameter
used in said creating; measuring a second intensity after said
changing; and using each of said first intensity and said second
intensity to determine a value of a material property in said
region.
39. The method of claim 37 wherein: said parameter is a distance
between said first beam and said region; and said material property
is lifetime.
40. The method of claim 37 wherein: said parameter is diameter of
one of said beams; and said material property is lifetime.
41. The method of claim 37 wherein: said creating includes focusing
on said region a second beam of second photons having a second
intensity modulated at said frequency; and said parameter is an
average of said second intensity over a cycle at said
frequency.
42. The method of claim 41 further comprising: determining an
attribute of a function, said function at least approximately
relating said first intensity and said average of said second
intensity to the corresponding values of said parameter before and
after said changing; and interpolating said attribute with respect
to a plurality of attributes of corresponding functions of
semiconductor materials having known values of a material property
thereby to determine the value of said material property in said
region.
43. The method of claim 42 wherein: said attribute is a coefficient
of a straight line that approximates at least a portion of said
function; and said property is one of junction depth, surface
concentration, sheet resistance and mobility.
44. The method of claim 43 wherein: said coefficient is slope; said
portion approximates a group of said signals at a high end of a
range of said plurality of signals; and said material property is
mobility.
45. The method of claim 43 wherein: said coefficient is slope; said
portion approximates a group of said signals at a low end of a
range of said plurality of signals; and said material property is
junction depth.
46. The method of claim 43 wherein: said coefficient is intercept;
and said material property is surface concentration.
47. The method of claim 42 wherein: said attribute is a coordinate
of an intersection point of a first line that approximates a high
power portion formed by a first group of said signals at a first
extremity in a range of values of said signals and a second line
that approximates a low power portion formed by a second group of
said signals at a second extremity in said range; and said property
is doping concentration.
48. The method of claim 42 wherein said wafer is a patterned wafer
and said method further comprising: annealing said wafer prior to
said measuring; and adjusting annealing of another patterned wafer
depending on at least said second intensity.
49. The method of claim 42 further comprising: repeating said
creating and said focusing in a plurality of regions of said wafer;
and measuring a plurality of intensities corresponding to said
plurality of regions.
50. The method of claim 49 further comprising: comparing each of
said intensities with a predetermined limit to determine a number
of defects, each defect being indicated by an intensity exceeding
said predetermined limit.
51. The method of claim 49 further comprising: computing a ratio of
a local maximum in said plurality of intensities to a local minimum
in said plurality of intensities; and comparing the ratio with a
predetermined limit to determine acceptance or rejection of said
wafer
52. The method of claim 37 further comprising: changing an average
concentration of charge carriers in said region; measuring a second
intensity after said changing; using each of said first intensity
and said second intensity to determine a value of a material
property in said region; repeating said creating and said focusing
in a plurality of regions of said wafer; and measuring a plurality
of intensities corresponding to said plurality of regions.
53. A method for evaluating a wafer, said method comprising:
focusing on a region of said wafer a first beam of first photons
having energy lower than the bandgap energy of a semiconductor
material in said region, said first beam being polarized; focusing
on said region a second beam of second photons having energy
greater than said bandgap energy, said second beam having an
intensity modulated at a predetermined frequency, said second beam
creating a plurality of charge carriers when incident on said
region, said predetermined frequency being sufficiently small to
avoid the creation of a wave of said charge carriers; reflecting
said first beam at said predetermined frequency by using said
charge carriers; interfering a reflected portion of said first beam
with an unreflected portion of said first beam to obtain a sum
component and a difference component; measuring a difference
between a first magnitude of said sum component and a second
magnitude of said difference component.
54. The method of claim 53 further comprising, prior to said
interfering: passing said reflected portion and said unreflected
portion through a filter, said filter blocking the passage of said
second beam.
55. The method of claim 53 further comprising: annealing said wafer
prior to said focusing; and adjusting annealing of another wafer
depending on said difference.
56. The method of claim 53 further comprising: interpolating said
difference with respect to a plurality of difference measurements
of semiconductor materials having known values of a material
property to determine a value of said material property in said
region.
57. The method of claim 53 further comprising: changing a parameter
used in said focusing on said region; and measuring another
difference after said changing.
58. The method of claim 53 further comprising: determining a
coefficient of a function, said function relating said difference
and said another difference to the corresponding values of said
parameter before and after said changing; and interpolating said
coefficient with respect to a plurality of coefficients of
corresponding functions of semiconductor materials having known
values of a material property to determine a value of said material
property in said region.
59. The method of claim 53 wherein: said wafer has a plurality of
doped regions.
60. A method for evaluating a wafer, said method comprising:
creating a plurality of charge carriers in a region of said wafer,
the number of said charge carriers being modulated at a frequency
that is sufficiently low to avoid creation of a wave of said charge
carriers; focusing on said region a probe beam of photons having
energy lower than bandgap energy of a semiconductor material in
said region; measuring a first intensity of a portion of said probe
beam modulated at said frequency after reflection by said region;
changing the concentration of said charge carriers at a surface of
said wafer; measuring, after said changing, a second intensity of a
portion of said beam modulated at said frequency after reflection
by said region; determining a value of an attribute of a function
that relates, at least approximately, said first intensity and said
second intensity to the corresponding values of said concentration
before and after said changing; and interpolating said attribute
with respect to a plurality of attributes of corresponding
functions of semiconductor materials having known values of a
property thereby to determine the value of said property in said
region.
61. The method of claim 60 wherein: said property is mobility
.mu..sub.unk; and said interpolating includes using the formula 45
unk = m ref m unk ref to compute mobility, wherein M.sub.unk is
said value of said attribute, m.sub.ref is another value of said
attribute for a reference wafer, and .mu..sub.ref is the mobility
of said reference wafer.
62. The method of claim 60 wherein said creating includes focusing
on said region a generation beam having an intensity modulated at
said frequency, said method further comprising: moving said probe
beam relative to said generation beam; measuring intensity after
said moving; repeating said moving and said measuring at least
once; determining a value of said distance at which said intensity
is the largest; and using said value to maintain said probe beam in
alignment with said generation beam.
63. The method of claim 60 wherein said wafer is formed of prime
material.
Description
CROSS-REFERENCES TO RELATED APPLICATIONS
[0001] This application is related to and incorporates by reference
herein in their entirety, the following three commonly owned,
copending U.S. Patent Applications:
[0002] Ser. No. 08/638,944, entitled "SYSTEM AND METHOD FOR
MEASURING THE DOPING CONCENTRATION AND DOPING PROFILE OF A REGION
IN A SEMICONDUCTOR SUBSTRATE", filed Apr. 24, 1996, by Peter G.
Borden;
[0003] Ser. No. 08/637,244, entitled "SYSTEM AND METHOD FOR
MEASURING PROPERTIES OF A SEMICONDUCTOR SUBSTRATE IN A FABRICATION
LINE," filed Apr. 24, 1996, by Peter G. Borden; and
[0004] Serial No. [attorney docket no. M-5438], entitled "AN
APPARATUS AND METHOD FOR MEASURING A PROPERTY OF A LAYER IN A
MULTILAYERED STRUCTURE," filed concurrently, by Peter G. Borden et
al.
BACKGROUND OF THE INVENTION
[0005] 1. Field of the Invention
[0006] This invention relates generally to the evaluation of a
wafer of semiconductor material, and in particular to the
measurement of a property of the semiconductor material.
[0007] 2. Description of Related Art
[0008] In the processing of a semiconductor wafer to form
integrated circuits, charged atoms or molecules are directly
introduced into the wafer in a process called ion implantation. Ion
implantation normally causes damage to the lattice structure of the
wafer, and to remove the damage, the wafer is normally annealed at
an elevated temperature, typically 600.degree. C. to 1100.degree.
C. Prior to annealing, material properties at the surface of the
wafer may be measured, specifically by using the damage caused by
ion implantation.
[0009] For example, U.S. Pat. No. 4,579,463 granted to Rosencwaig
et al. (that is incorporated herein by reference in its entirety)
describes a method for measuring a change in reflectance caused by
a periodic change in temperature of a wafer's surface (see column
1, lines 7-16). Specifically, the method uses "thermal waves [that]
are created by generating a periodic localized heating at a spot on
the surface of a sample" (column 3, lines 54-56) with "a radiation
probe beam . . . directed on a portion of the periodically heated
area on the sample surface," and the method "measur[es] the
intensity variations of the reflected radiation probe beam
resulting from the periodic heating" (column 3, lines 52-66).
[0010] As another example, U.S. Pat. No. 4,854,710 to Opsal et al.
(also incorporated herein by reference in its entirety) describes a
method wherein "the density variations of a diffusing electron-hole
plasma are monitored to yield information about features in a
semiconductor" (column 1, lines 61-63). Specifically, Opsal et al.
state that "changes in the index of refraction, due to the
variations in plasma density, can be detected by reflecting a probe
beam off the surface of the sample within the area which has been
excited" (column 2, lines 23-31) as described in "Picosecond
Ellipsometry of Transient Electron-Hole Plasmas in Germanium," by
D. H. Auston et al., Physical Review Letters, Vol. 32, No. 20, May
20, 1974.
[0011] Opsal et al. further state (in column 5, lines 25-31 of U.S.
Pat. No. 4,854,710): "The radiation probe will undergo changes in
both intensity and phase. In the preferred embodiment, the changes
in intensity, caused by changes in reflectivity of the sample, are
monitored using a photodetector. It is possible to detect changes
in phase through interferometric techniques or by monitoring the
periodic angular deflections of the probe beam."
[0012] A brochure entitled "TP-500: The next generation ion implant
monitor" dated April, 1996 published by Therma-Wave, Inc., 1250
Reliance Way, Fremont, Calif. 94539, describes a measurement device
TP-500 that requires "no post-implant processing" (column 1, lines
6-7, page 2) and that "measures lattice damage" (column 2, line 32,
page 2). The TP-500 includes "[t]wo low-power lasers [that] provide
a modulated reflectance signal that measures the subsurface damage
to the silicon lattice created by implantation. As the dose
increases, so does the damage and the strength of the TW signal.
This non-contact technique has no harmful effect on production
wafers" (columns 1 and 2 on page 2). According to the brochure,
TP-500 can also be used after annealing, specifically to "optimize
. . . system for annealing uniformity and assure good
repeatability" (see bottom of column 2, on page 4).
SUMMARY
[0013] A method in accordance with this invention: (1) creates
charge carriers in a concentration that changes in a cyclical
manner (also called "modulation") only with respect to time, in a
region (also called "illuminated region") of a semiconductor
material, and preferably also (2) maintains the charge carriers at
an average concentration that remains the same (or at least
approximately the same e.g. varies less than 10%) before and during
a measurement indicative of the number of charge carriers created
in the illuminated region by act (1).
[0014] In one embodiment (also called "scanning embodiment"), one
or more such measurements are compared each with the other, thereby
to identify a sudden change in the measurements. In another
embodiment (also called "measurement embodiment"), one or more
measurements are compared with similar measurements on wafers (also
called "reference wafers") processed under known conditions and
having known properties, thereby to determine one or more process
conditions or properties of a wafer under fabrication.
[0015] In one implementation, an attribute derived from
measurements on a wafer is interpolated with respect to
corresponding attributes of wafers having a known material property
(or process condition), thereby to determine a corresponding
property (or condition) of the wafer under measurement. An example
of a process condition is the temperature (also called "annealing
temperature") at which the wafer is annealed. Examples of material
properties include surface concentration, mobility, junction depth,
lifetime and defects that cause leakage current at the junction
(when the junction is reversed biased).
[0016] The charge carriers (also called "excess carriers") being
created and measured as described above are in excess of a number
of charge carriers (also called "background charge carriers") that
are normally present in the semiconductor material (e.g. due to
dopant atoms) even in the absence of illumination. Therefore, in
the first act described above, a number of excess carriers are
created in the above-discussed region (also called "illuminated
region"), e.g. by focusing thereon a laser beam or an electron
beam. The concentration of excess carriers is modulated, both at
the surface and in the bulk only as a function of time (e.g. by
modulating the intensity of the just-described laser or electron
beam that is also called "generation beam").
[0017] The frequency of modulation of the concentration of excess
carriers is deliberately selected to be sufficiently low to avoid
modulation in space (i.e. avoid the creation of a wave of charge
carriers). A carrier concentration that is devoid of a wave in
space is created when at least a majority of the charge carriers
(i.e. greater than 50%) move out of the illuminated region by
diffusion. Such a temporal modulation under diffusive conditions
(also called "diffusive modulation") is used to measure the
reflectance caused by excess carriers, e.g. by detection of the
intensity of a beam (also called a "probe beam") reflected by the
illuminated region at the modulation frequency.
[0018] In the second act, an average concentration (e.g. root mean
square average) of the excess carriers is determined from a
measurement of the above-described reflectance over the time period
of a modulation cycle. The average concentration is maintained the
same (or approximately the same) prior to and during the
measurement of reflectance. Specifically, the creation of new
charge carriers (also called "measurement-related" carriers) in
addition to the background charge carriers and the excess carriers
is minimized or avoided during the reflectance measurement, thereby
to maintain the total carrier concentration at or about the
just-described average prior to the measurements.
[0019] An apparatus (also called "profiler") that implements the
above-described method includes, in one embodiment, a source that
produces a probe beam formed of photons of energy lower than the
bandgap energy (the energy necessary to generate conduction
electrons) of the semiconductor material. Use of such a probe beam
source eliminates the measurement-related carriers and the
resulting errors that are otherwise created by a prior art
apparatus, e.g. in measuring the reflectance with a probe beam that
has photons of energy greater than the bandgap energy of silicon
(such as the He-Ne laser probe beam described at column 15, line 56
of U.S. Pat. No. 4,854,710).
[0020] In addition to the above-described probe beam source, the
profiler also includes a photosensitive element (such as a
"photodiode") that is located in the path of a portion of the probe
beam reflected by the illuminated region. The photosensitive
element generates an electrical signal (e.g. a voltage level) that
indicates the intensity of the probe beam portion reflected by the
illuminated region. The intensity in turn indicates reflectance
caused by the excess charge carriers (e.g. created by incidence of
a generation beam).
[0021] So, in one embodiment, the intensity measurement is used by
the profiler as a measure of the concentration of excess charge
carriers in the illuminated region. In this embodiment, the
profiler also includes a computer that is coupled to the
photosensitive element to receive the electrical signal, and that
is programmed to determine the value of a material property in the
illuminated region from one or more such measurements.
[0022] In another embodiment, the profiler creates
measurement-related carriers by use of a probe beam having photons
at or slightly above the bandgap energy of the semiconductor
material. Even in the presence of such measurement-related
carriers, the profiler maintains the overall accuracy of a
measurement of a material property (as described herein) within a
predetermined limit (e.g. 10% error) by limiting the number of such
measurement-related carriers to a small percentage (e.g. up to 10%)
of the excess carriers.
[0023] In the just-described embodiment, a diffusive modulation of
charge carriers is created by use of a generation beam that has a
wavelength and power chosen so that the rate of carriers generated
by this beam is sufficiently larger, e.g. one order (preferably two
orders) of magnitude larger than the rate of carriers generated by
the probe beam so as to make the latter negligible.
[0024] In one implementation, in addition to the above-described
probe beam source, the profiler includes a source that produces a
generation beam (formed of photons) having an intensity that is
modulated at a sufficiently low frequency to avoid creation of a
wave of charge carriers. The powers of the two beams are maintained
by the profiler to be at least approximately the same. Other
implementations have two beams that each have a power different
from the other, and yet maintain the measurement-related carriers
(created by the probe beam) at a negligible percentage (e.g. the
probe beam has photons of energy higher than the bandgap energy but
has a power that is half or one-fourth the power of the generation
beam, assuming that the power of the reflected portion of the probe
beam is detected with sufficient accuracy as described above).
[0025] Measurement of intensity of a reflected portion of the probe
beam while (1) using diffusive modulation and (2) generating
negligible (preferably none) percentage of measurement-related
carriers is a critical aspect of one embodiment of the invention.
One or more such measurements provide a measure of a process
condition or a property of the semiconductor material in the
illuminated region. Such measurements are performed in one
embodiment after annealing to activate the dopants, thereby to
obtain a measure that is more indicative of the electrical behavior
of the devices being fabricated than a property that is measured
prior to annealing (as described in U.S. Pat. No. 4,854,710).
[0026] The above-described intensity measurements (from which
reflectance measurements are derived), and one or more properties
(also called "material properties") are preferably (but not
necessarily) monitored during fabrication, to control a process
step (e.g. to control annealing temperature of a wafer that has
been ion implanted) used in fabricating a wafer. As the material
properties are measured directly on the wafer undergoing
fabrication (also called "patterned wafer" or "annealed wafer"
depending on the stage of fabrication), a measurement as described
herein increases yield, as compared to an off-line measurement of a
test wafer's properties.
[0027] During operation, the profiler (described above) performs a
number of reflectance measurements, each measurement being for a
different value of a parameter used either (1) in the generation of
the excess carriers or (2) in the measurement of the concentration
of excess carriers. In one embodiment, the profiler fits two or
more such measurements to one or more straight lines or to a curved
line, and compares an attribute of the fitted line (e.g. compares a
first order coefficient, also called "slope," of the fitted line),
with corresponding attributes of corresponding lines generated from
such measurements on wafers having known properties, thereby to
determine a material property corresponding to the fitted line.
[0028] Moreover, a process condition (e.g. the temperature at which
a patterned wafer has been annealed) can also be determined from
such comparison of reflectance measurements, if the process
condition affects the semiconductor material. Depending on the
implementation, the comparison can be performed either manually or
by a computer.
[0029] In a first implementation, the parameter varied between the
measurements is the average concentration of charge carriers that
is controlled by, e.g., changing the power or the diameter of the
generation beam used to generate the charge carriers. Thereafter, a
material property, such as mobility (or junction depth) is
determined from intensity measurements by comparison of the
above-described attribute with the corresponding attributes of
wafers having known mobilities (or junction depths).
[0030] In one example, the wafer is undoped and mobility is
determined by computing the slope of a plot of the intensity
measurement against the power of the generation beam. In another
example, the wafer has doped regions, and mobility is determined by
comparing a slope obtained from the measurements (in the same
manner as the just-described slope for the undoped wafer) with
slopes of wafers having known mobilities.
[0031] In a second implementation, the varied parameter is the
distance between the two beams that are used in performing an
intensity measurement. In two variants of this implementation, the
location of either (1) the generation beam, or (2) the probe beam,
is changed relative to the wafer. The material property determined
from such intensity measurements is lifetime.
[0032] In a third implementation, the parameter that is varied is
the relative size of the two beams used in the intensity
measurement e.g. the diameter of the probe beam is changed (while
keeping the power of the probe beam the same). In this
implementation as well, the material property determined from the
intensity measurements is lifetime.
[0033] In another embodiment (also called "polarized embodiment"),
a laser beam that is linearly polarized is used as a probe beam
(also called "polarized probe beam"). The polarized probe beam need
not have photons of energy below the bandgap energy of the
semiconductor material, i.e. a beam of photons at or slightly above
the bandgap energy (as described above) can be used if
polarized.
[0034] On reflection from the illuminated region, a plane of
polarization of the probe beam rotates through two different
angles, depending on the following two reflection coefficients: one
coefficient in a plane (also called "surface plane") of the surface
of the illuminated region, and another coefficient in a plane (also
called "normal plane") perpendicular to the surface plane.
[0035] After reflection, a portion of the probe beam that has been
reflected is interfered with another portion that was not
reflected. Next, two measurements are made, specifically of the sum
and difference signals generated by the interference. Thereafter, a
difference (hereinafter "in-phase difference") between the two
measurements that is in phase with the modulation of charge
carriers is determined using a phase detector. The in-phase
difference signal provides a measure of the concentration of excess
carriers in the illuminated region.
[0036] Thereafter, one or more of the material properties discussed
above are determined by use of in-phase difference signal (instead
of using the intensity measurement described above). Use of a
polarized probe beam (as described herein) provides an increase in
sensitivity of the measurement of material properties by about two
orders of magnitude over the use of a non-polarized beam, because
of the increased sensitivity of a phase detector used in the
polarized embodiment (as compared to an amplitude detector that is
otherwise used) to measure the power of the reflected portion of
the probe beam.
BRIEF DESCRIPTION OF THE DRAWINGS
[0037] FIG. 1A illustrates, in a.high level block diagram, a system
including an apparatus (called "active dopant profiler") in
accordance with the invention.
[0038] FIG. 1B illustrates, in a graph, the temporal modulation of
charge carriers by the active dopant profiler of FIG. 1A, without
creation of a wave, in a critical aspect of one embodiment.
[0039] FIG. 1C illustrates, in a cross-sectional view, use of a
probe beam and a generation beam, each beam focused coincident with
the other by the active dopant profiler of FIG. 1A.
[0040] FIGS. 1D and 1E illustrate, in graphs, variation of a
measurement of intensity of a portion of the probe beam reflected
by the wafer of FIG. 1C, as a function of a piezoelectric voltage
that controls the distance between the two beams of FIG. 1C along
axis x (FIG. 1D) and axis y (FIG. 1E), the two axes being
illustrated in FIG. 8A.
[0041] FIGS. 1F and 1G illustrate, in a cross-sectional view and a
plan view respectively, beams 151 and 152 of FIG. 1C offset from
each other, (and also superimposed in the view of FIG. 1F is a
graph of the concentration 164 of excess charge carriers as a
function of the distance from axis 161 of generation beam 151).
[0042] FIG. 1H illustrates, in a cross-sectional view, beams 151
and 152 of FIG. 1C wherein the diameter of probe beam 152 has been
increased (e.g. by an order of magnitude) as compared to the
diameter illustrated in FIG. 1C.
[0043] FIG. 1I illustrates, in a cross-sectional view, use of a
common lens 815 to form probe beam 152 that has a smaller diameter
at wafer surface 153 than generation beam 151, wherein the relation
is reverse prior to passage through lens 815.
[0044] FIG. 2A illustrates, in a flowchart, the acts performed by
the system of FIG. 1A in one implementation.
[0045] FIG. 2B illustrates, in a flowchart, creation of charge
carriers by the generation beam of FIG. 1C.
[0046] FIG. 2C illustrates, in a flow chart, the acts performed by
profiler 103 of FIG. 1A to align two beams for use in reflectance
measurement with coincident beams.
[0047] FIG. 3A illustrates, in a graph, intensity measurements
(made by the profiler of FIG. 1A in a scanning embodiment) plotted
along y axis as a function of position along the x axis for three
wafers.
[0048] FIG. 3B illustrates in a two-dimensional map, intensity
measurements obtained from scanning an area 95.times.95 .mu.m.sup.2
of an annealed, ion implanted wafer.
[0049] FIG. 3C illustrates, in a key, values of intensity
measurements (in units of microvolts) shown in the map of FIG.
3B.
[0050] FIG. 4A illustrates, in a flow chart, acts performed on
intensity measurements (by the profiler of FIG. 1A) to determine a
material property or a process condition during fabrication of the
wafer.
[0051] FIG. 4B illustrates, in a graph, intensity measurements as a
function of a parameter (e.g. generation beam's power) that is
varied to obtain the measurement, and fitting of the intensity
measurements to two straight lines 471L and 471H to obtain
coefficients (e.g. slope and intercept) used in measuring
semiconductor material properties and process conditions.
[0052] FIG. 5A illustrates, in a graph, intensity measurements
plotted on the y axis as a function of the power of generation beam
151 (FIG. 1C) at the source plotted along the x axis for wafers
annealed at four different temperatures.
[0053] FIGS. 5B and 5C illustrate, in graphs, the variation of fit
coefficients (specifically the high power intercept and the low
power slope obtained from FIG. 5A) as a function of the temperature
at which the wafer was annealed plotted along the x axis.
[0054] FIGS. 5D and 5E illustrate, in graphs, the just-described
coefficients plotted along the y axis as a function of junction
depth and surface concentration respectively.
[0055] FIG. 5F illustrates, in a graph, another attribute
(specifically the inflection point) of a line in FIG. 5A plotted
along the y axis as a function of the doping concentration on the x
axis for wafers having four different junctions depths.
[0056] FIG. 5F-I illustrates, in a key, values of junction depth
down in FIG. 5F.
[0057] FIG. 5G illustrates, in a graph, a normalized attribute
(specifically the normalized high power slope) plotted along the y
axis as a function of the sheet resistance (in ohms per square)
plotted along the x axis.
[0058] FIG. 5H illustrates, in a graph, the variation of high power
slope m.sub.H plotted along the y axis as a function of mobility
plotted along the x axis.
[0059] FIG. 6A illustrates, in a graph, the spreading resistance
profile SRP (plotted along the y axis) as a function of the depth d
(plotted along the x axis) from wafer surface 153 (FIG. 1C).
[0060] FIGS. 6B and 6C illustrate relationships known in the prior
art for the bulk mobility and the bulk lifetime for use in one
embodiment of profiler 103.
[0061] FIG. 7A illustrates in a graph, a normalized intensity
measurement plotted along the y axis as a function of the radius of
the probe beam (in .mu.m) plotted along the x axis for material
with normal lifetime, and degraded lifetime.
[0062] FIG. 7B illustrates, in a graph, the concentration per unit
volume (at wafer surface 153 in FIG. 1C, and called "surface
concentration") of the excess carriers plotted along the y axis as
a function of the distance from axis 155 (FIG. 1C) of generation
beam 151 plotted along the x axis for two materials: one with
normal lifetime and the other with degraded lifetime (degraded by a
factor of 10,000).
[0063] FIGS. 8A and 8B illustrate, in block diagrams, various
components used in one implementation of the active dopant profiler
of FIG. 1A.
[0064] FIG. 9A illustrates, in a graph, a variation of the
logarithm of the surface concentration plotted along the y axis as
function of the radial distance (from the central axis 155 of
generation beam 151 shown in FIG. 1C) plotted along the x axis,
obtained by numerical modeling.
[0065] FIG. 9B illustrates, in a cross-sectional diagram, a beam
incident on a semiconductor material having a layer of dopants in a
concentration greater than the concentration of dopants in the bulk
material, and superimposed thereon a graph of the potential
distribution resulting from illumination by the beam.
[0066] FIG. 9C illustrates, in graphs, carrier concentration
n.sub.e plotted along y axis as a function (obtained by numerical
modeling) of the power P of the generation beam plotted along x
axis for different doping concentrations.
[0067] FIG. 10A illustrates, in a schematic diagram, the rotation
of a plane of polarization of a probe beam after reflection by the
semiconductor material.
[0068] FIG. 10B illustrates, in a graph, the reflectance
measurement plotted along the y axis as a function of angle of
incidence of the probe beam plotted along the x axis, wherein solid
and dotted lines show relative effect of a small increase in the
index of refraction (dotted line higher index than solid) due to an
increase in the surface carrier concentration of the two
polarization components rs and rp.
[0069] FIG. 10C illustrates, in a vector diagram, an angle through
which the polarization plane is rotated after reflection as
illustrated in FIG. 10A.
[0070] FIG. 11 illustrates, in a flowchart, various acts performed
by the active dopant profiler of FIG. 1A using a polarized probe
beam as illustrated in FIG. 10A.
[0071] FIG. 12 illustrates, in a block diagram, another
implementation of the active dopant profiler of FIG. 1A.
[0072] FIG. 13 illustrates, in a graph, the signal-to-noise ratio
plotted along the y axis as a function of the concentration of
carriers plotted along the x axis as straight lines for four
different wavelengths of the probe beam.
DETAILED DESCRIPTION
[0073] A wafer fabrication system 100 (FIG. 1A) in accordance with
the invention is used to create integrated circuit (abbreviated as
"IC") dice by processing a wafer to form a "patterned wafer",
measuring a material property of the patterned wafer, and adjusting
the processing in real time if necessary. The just-described
processing can include annealing, and the measurement of a material
property can be performed on a patterned wafer after annealing,
thereby to determine process conditions not obtainable by prior art
methods, e.g. to determine anneal temperature from measurements on
the annealed wafer. Measurements on patterned wafers during
fabrication as described herein eliminates test wafers that may be
otherwise required in the prior art solely to monitor the
fabrication process, thus reducing costs. Moreover, measurements on
annealed wafers as described herein provide a measure of one or
more properties that are related to the electrical characteristics
(such as processing speed) of the devices being fabricated, because
annealing results in activation of the dopants used in the
devices.
[0074] System 100 includes a wafer processing unit 101 that
performs an act 211 (FIG. 2A) e.g. by operating an ion implanter
101I to create, in a wafer 104 (FIG. 1A), one or more regions (e.g.
doped region 130 in FIG. 1C) that have dopant atoms (e.g. boron
atoms in silicon). Instead of ion implantation, any other process
for creating doped regions, e.g. chemical vapor deposition,
epitaxial deposition, evaporation, diffusion, or plasma deposition
can be used in unit 101 (FIG. 1A) to perform act 211.
[0075] Thereafter, a patterned wafer 105 having one or more
patterns of doped regions is transferred to a rapid thermal
annealer 102 (FIG. 1A) that may be included in system 100. Rapid
thermal annealer (also called "annealer") 102 performs an annealing
act 213 (FIG. 2A), e.g. by heating wafer 105 (FIG. 1A) to a
predetermined temperature (also called "annealing temperature"),
e.g. to remove damage that is normally caused by ion implanter 101
to the lattice structure of the semiconductor material in the doped
regions of wafer 105. Instead of a rapid thermal annealer, a
furnace may be included in system 100 and used to anneal wafer 105
in act 213 (FIG. 2A).
[0076] Annealing in act 213 causes the dopant atoms (also called
"dopants") to move into the lattice of the semiconductor material
in a doped region 130, where the dopants act as donors (forming
n-type material) or acceptors (forming p-type material). The extent
to which the dopants incorporate into the lattice structure during
act 213 is a function of the temperature at which and the time for
which act 213 is performed. The incorporation is more complete at a
higher temperature or after a longer time.
[0077] However, the dopants also diffuse (i.e. move) during act
213, thereby increasing the junction depth. The diffusion proceeds
more rapidly at a higher temperature, and it is necessary to
carefully control the annealing temperature. Therefore, a profile
of the concentration of dopants as a function of depth is measured
after act 213, and the profile is compared with predetermined
information (e.g. a specification or profiles of wafers known to be
good) to determine a change (if any) to be made to the annealing
process. Dynamic feedback of such to-be-made changes to the
annealing process in real time as described herein improves the
yield of good wafers obtained from annealing in a manner not
otherwise possible in the prior art.
[0078] Therefore, an annealed wafer 106 (FIG. 1A) is transferred
from rapid thermal annealer 102 to a measurement device
(hereinafter "active dopant profiler" or "profiler") 103, and
positioned therein (see act 220 in FIG. 2A). In an alternative
embodiment, an active dopant profiler is integrated into a rapid
thermal annealer and does not require positioning after completion
of anneal. In one embodiment, profiler 103 is moved relative to
wafer 106 instead of moving wafer 104.
[0079] Also, a non-annealed wafer 105 can be used (moved via path
109 in FIG. 1A) as illustrated by branch 212 in FIG. 2A e.g. if
dopant regions do not require annealing due to use of a method
other than ion implantation, such as diffusion (wherein dopants are
diffused into wafer 105 thermally, and are active, and there is no
need to anneal out implant damage). Profiler 103 evaluates the
efficacy of the dopants in a nonannealed wafer 105 in a manner
similar to that described above for annealed wafer 106. A starting
wafer 104 can also be used as illustrated by path 112 in FIG. 1A
and by branch 215 in FIG. 2A. Therefore, in the following
description, the notation "104/105/106" is used to indicate that
the description is equally applicable to each of wafers 104, 105
and 106. Similarly the notation "105/106" indicates each of wafers
105 and 106.
[0080] Next, after a wafer 104/105/106 is properly positioned,
profiler 103 creates (see act 230 in FIG. 2A) in a region of the
wafer, a number of charge carriers that are modulated at a
predetermined frequency. The predetermined frequency is selected to
ensure that a wave of the charge carriers is not created during the
act of measurement (see act 240 in FIG. 2A). As profiler 103 does
not use a "plasma wave" as described in U.S. Pat. No. 4,854,710,
profiler 103 is as effective in measuring a property of an annealed
wafer 106 as in measuring a property of a non-annealed wafer
104/105.
[0081] Profiler 103 (FIG. 1A) measures a property (in act 240 in
FIG. 2A) that is affected by charge carriers present in a doped
region 130 (FIG. 1C) in a wafer 105/106, In one implementation,
profiler 103 measures the reflectance that is thereafter used to
determine various properties such as mobility, junction depth,
surface carrier concentration, doping concentration, lifetime, and
the number of active dopants as a function of depth "d" from
surface 153 of wafer 105/106. A function (called "active dopant
profile") can be plotted in a graph as illustrated in FIG. 6A
described below. In act 240, instead of the reflectance, profiler
103 can measure other properties affected by the created charge
carriers, such as the refractive index.
[0082] One or more of these measurements are used (see act 260 in
FIG. 2A) to determine if annealed wafer 106 conforms to the
specification for such wafers. If wafer 106 conforms to the
specifications, wafer 106 is identified as acceptable (e.g. by
movement in the direction for further processing) and the
conditions in wafer processing unit 101 (FIG. 1A) and in rapid
thermal annealer 102 are left undisturbed. Thereafter, the
above-described acts are repeated (as illustrated by branch 275) on
another wafer or after further processing on the same wafer.
[0083] If a wafer 106 does not conform to the specifications, wafer
106 is identified as unacceptable (e.g. discarded) and optionally
profiler 103 is used (in act 263 in FIG. 2A) to adjust (either
automatically or under manual control) (1) the conditions (e.g.
dosage of dopants) in unit 101 by driving a signal on a line 107
(FIG. 1A), or (2) the conditions (e.g. annealing temperature) in
annealer 102 by driving a signal on line 108, or both. Then the
above-described acts and acts are again repeated (as illustrated by
branch 275).
[0084] Profiler 103 can perform an alignment at any time (e.g.
after identifying a wafer as accepted/rejected as shown by act 270
in FIG. 2A). In one embodiment, profiler 103 includes two
piezoelectric actuators that control the positions of beams 151 and
152. Specifically, the actuators (not shown) move a collimating
lens of a laser that generates probe beam 152 along each of two
orthogonal axes x, y that are both perpendicular to axis 155 of
generation beam 151, thereby shifting the position of probe beam
152 relative to generation beam 151.
[0085] In this particular embodiment, profiler 103 aligns (see act
270 in FIG. 2A) beams 151 and 152 to be coincident in the following
manner. Specifically, profiler 103 repeatedly moves probe beam 152
relative to probe beam 151 along an axis (e.g. along x axis), as
illustrated in FIGS. 1F and 1G and obtains an intensity
measurements after each movement. Thereafter, profiler 103
optionally plots the intensity measurements as a function of the
relative position as illustrated in FIG. 1D, and determines the
position (in this embodiment the voltage applied to the
piezoelectric actuator) at which the intensity measurement is at a
maximum, e.g. 25 volts in FIG. 1D.
[0086] In one embodiment, profiler 103 moves (see act 271 in FIG.
2C) probe beam 152 relative to generation beam 151 in a first
direction (e.g. along the positive x axis) by an incremental
distance .DELTA.x (e.g. 0.1 .mu.m), measures (see act 272) if the
measured intensity is larger than the largest intensity so far, and
if so, saves (see act 274) the voltage signal that was used to
maintain the current total distance between beams 151 and 152 and
also saves the measured intensity as the largest intensity.
Thereafter, profiler 103 repeats acts 271-274 until the total
distance between beams 151 and 152 will exceed a predetermined
distance, e.g. 1/2 of the diameter of the larger of beams 151 and
152, wherein the incremental distance .DELTA.x is {fraction (1/10)}
of the larger diameter.
[0087] Next, profiler 103 moves probe beam 152 relative to
generation beam 151 in a second direction (e.g. along the negative
x axis) that is opposite to the first direction, and performs acts
271-274. Profiler 103 uses the value of the largest intensity from
the previous performance of acts 271-274 during act 273 in the
second direction performed for the first time--e.g. treats the
negative and positive x axis travel to be a continuum and so
obtains the voltage signal of 25 volts (FIG. 1D) corresponding to
the maximum intensity measurement along x axis.
[0088] Similarly, profiler 103 moves probe beam 152 relative to
generation beam 151 along another axis (e.g. y axis) that is
orthogonal to the just-described movement, and once again
determines the voltage applied to the piezoelectric actuator at
which the intensity measurement is maximum, e.g. 40 volts in FIG.
1E. Therefore, profiler 103 automatically connects drift in optical
alignment by performing act 270.
[0089] Thereafter, profiler 103 uses the just-described voltage
levels to align the two beams, thereby to ensure that beams 151 and
152 remain coincident in the next set of measurements. Profiler 103
performs such alignment of beams 151 and 152 as often as required
to obtain intensity measurements within the accuracy required by
the system, e.g. once every N measurements (e.g. if profiler 103 is
known to maintain alignment within the required accuracy for N
measurements). In one particular example, the number of movements N
between two acts of alignment is 1000.
[0090] As described below, the measurement performed by profiler
103 is non-destructive, is performed in a few square microns, and
can be performed in a relatively short time (e.g. five seconds in
one region or 50 seconds at 10 regions over a wafer). Measuring a
property of annealed wafer 106 during (or immediately after)
fabrication as described herein increases yield, as compared to an
off-line measurement of a test wafer's properties.
[0091] Prior to measuring a material property by performing act
240, profiler 103 creates (see act 230 in FIG. 2A), in a region 120
(also called "illuminated region") of wafer 106, a concentration ne
of excess carriers, and modulates concentration ne (i.e. increases
and decreases) as a function of time t but not as a function of
distance x from a central axis 155 (FIG. 1C) of region 120.
Specifically, over a time period that is the inverse of the
modulation frequency, profiler 103 changes concentration n.sub.e
between the values n.sub.ea-n.sub.en, wherein
n.sub.en.ltoreq.n.sub.ej.ltoreq.n.sub.ei.ltoreq.n.sub.ea (FIG. 1B).
Therefore, at any given time ti, the value n.sub.ei of the carrier
concentration in semiconductor material 156 decays as a function of
the distance x, without the creation of a wave in space. Profiler
103 ensures that there is no periodicity in space of the value of
concentration n.sub.e. Instead, concentration ne simply decays
radially (e.g. roughly exponentially as a function of radial
distance) outside region 120, as illustrated in FIG. 1B.
[0092] To ensure the absence of a wave in space, the frequency of
modulation of carrier concentration C is selected to be several
times (e.g. one or more orders of magnitude) smaller than the
modulation frequencies used in the prior art to generate waves as
described in, for example, U.S. Pat. No. 4,854,710. Specifically,
in one implementation of this invention, the modulation frequency
is approximately 1 KHz that is one thousand times (three orders of
magnitude) smaller than a 1 MHz frequency described in column 15,
line 18 of U.S. Pat. No. 4,854,710 by Opsal. Use of such a low
modulation frequency is a critical aspect in one embodiment, and
leads to unexpected results due to the elimination of a wave in
space, such as the "wave" described by Opsal. In another
embodiment, the modulation frequency is any frequency lower than
1000 Khz (e.g. 900 Khz) and profiler 103 still provides a measure
of a material property as described herein.
[0093] In one embodiment, profiler 103 implements the
above-described act 230 (FIG. 2A) by: generating (act 231 in FIG.
2B) a beam 151 (FIG. 1C) of photons that have energy greater than
the bandgap energy of the semiconductor material in doped region
130, modulating (act 232 in FIG. 2B) beam 151 at a frequency
selected to avoid the creation of a wave (as described above), and
focusing (act 233 in FIG. 2B) beam 151 on doped region 130.
[0094] Depending on the implementation, profiler 103 modulates the
intensity of generation beam 151 at any frequency in the range of 1
Hz to 20,000 Hz, as described below in reference to FIG. 4B. The
modulation frequency can be, for example, 1000 Hz, and may require
at least 10 cycles for a lock-in amplifier to generate a
reflectance measurement (based on a probe beam as described below
in reference to act 242), or 10 milliseconds to perform each
reflectance measurement. In one example, the throughput is 30
wafers per hour, or 120 seconds per wafer, with each wafer having a
measurement taken in at least ten regions.
[0095] If a material property measurement requires several
reflectance measurements (e.g. a single region 120 requires a
number of reflectance measurements for each of a corresponding
number of average carrier concentrations), profiler 103 takes
several seconds (e.g. 10 seconds) for each wafer 104/105/106.
Hence, the 10 millisecond speed of reflectance measurement per
region allows for real time control in the fabrication of wafers by
apparatus 100 (FIG. 1A) using method 200 (FIG. 2A).
[0096] In another implementation of act 230, instead of using beam
151 of photons, profiler 103 uses a beam of charged particles, such
as electrons or ions. The beam of charged particles is modulated
and focused in the same manner as that described above in reference
to beam 151 to generate the charge carriers in doped region 130.
Instead of a beam of photons or a beam of electrons, any other
mechanism (such as a combination of photons and electrons) can be
used to create charge carriers in act 230 (FIG. 2A).
[0097] In act 240, one implementation of profiler 103 focuses (see
act 242 in FIG. 2A) on a region (also called "illuminated region")
120 illuminated by beam 151, another beam 152 (FIG. 1C) that is
used to detect the number of charge carriers in wafer 104/105/106
when illuminated by beam 151. In one embodiment, beam 152 (also
called "probe beam") contains photons having energy lower than the
bandgap energy of the semiconductor material in illuminated region
120. Such a probe beam 152 avoids the creation of
measurement-related carriers when beam 152 is incident on
illuminated region 120, thereby to maintain the charge carrier
concentration the same prior to and during measurement (see act 243
in FIG. 2A) of a property as described below.
[0098] Next, profiler 103 measures (see act 243 in FIG. 2A) the
intensity of a reflected portion of beam 152 (FIG. 1C) that is
modulated at the frequency of modulation of the charge carriers in
illuminated region 120. The intensity measurement provides an
indication of an average concentration n.sub.av of charge carriers
in doped region 130 near surface 153, wherein the average
concentration n.sub.av is a root mean square average that is
measured over the period of one (or more) modulation cycle(s) at
the modulation frequency of generation beam 151. Concentration
n.sub.av in turn indicates, under certain conditions as discussed
below, a material property, e.g. the mobility of charge carriers in
doped region 130. Each intensity measurement is a measure of
reflectance if the power of generation beam 151 is unity (e.g. 1
watt).
[0099] Although in FIG. 1C, beams 151 and 152 are illustrated as
being coincident, with a common axis 155, in another embodiment,
one of the beams, e.g. probe beam 152, is displaced with respect to
the other beam to obtain an intensity measurement, e.g. location of
generation beam 151 is changed on performance of one variant of act
244 (FIG. 2A). So beams 151 and 152 are separated each from the
other as illustrated by a non-zero distance .DELTA.x between the
respective axes 162 and 161 in FIG. 1F.
[0100] An intensity measurement obtained in such an offset position
(FIG. 1F) of probe beam 152 with respect to generation beam 151 is
used to measure various properties of the semiconductor material in
doped region 130 a manner similar to the measurements obtained from
coincident beams (FIG. 1C). The measurement obtained in the offset
position (FIG. 1F) provides a measure of carrier concentration,
because the concentration decays with distance d from illuminated
region 120. Determination of lifetime from an intensity measurement
in the offset position and another intensity measurement in the
coincident position (FIG. 1C) is described below in reference to
FIG. 7B.
[0101] In another embodiment, probe beam 152 is larger in diameter
than generation beam 151 (as illustrated in FIG. 1H) due either to
the difference in wavelengths of beams 151 and 152 or to properties
of the beams such as the diameter and angle of divergence from a
central axis. Specifically, probe beam 152 has a longer wavelength
than generation beam 151, to ensure that the rate (also called
"generation rate") of generation of carriers due to probe beam 152
is significantly less than the generation rate due to generation
beam 151.
[0102] As the diameter of a beam generated by a lens scales
linearly with wavelength, when both beams 151 and 152 use lenses of
the same diameter, the diameter of probe beam 152 at surface 153 is
larger than the diameter of generation beam 151 as illustrated in
FIG. 1C. The just-described larger diameter of probe beam 152
simplifies the alignment required to fully overlay generation beam
151 with probe beam 152, as compared to the alignment of beams
having the same diameter.
[0103] In one embodiment, the diameter of probe beam 152 is made
larger (see act 244 in FIG. 2A) than that required to obtain the
above-described difference in the rate of carrier generation, e.g.
2 to 50 times the diameter of generation beam 151. As the diameter
of probe beam 152 is increased, the reflected portion of probe beam
152 becomes more sensitive to the radial decay of carrier
concentration 158 outside illuminated region 120, as shown in FIG.
1B. According to one aspect of the invention, the change in the
rate of decay provides a measure of the degradation of carrier
lifetime, as described below in reference to FIGS. 7A and 7B.
Examples of intensity measurements generated with such a
configuration of beams 151 and 152 are illustrated by points
502A-502N in FIG. 5A.
[0104] In one implementation, probe beam 152 has an initial
diameter Dp that is approximately the same diameter Dl of lens 815
(described below in reference to FIG. 8A), and generation beam 151
has an initial diameter Dg that is sufficiently large to ensure
that radius Wg (FIG. 1C) of generation beam 151 at surface 153 is
larger than (or approximately equal to) the radius Wp of probe beam
152 (at surface 153).
[0105] In another embodiment, probe beam 152 has a diameter that is
smaller than or equal to the diameter of generation beam 151 and is
used to eliminate the effect of lifetime variations on the
measurements of mobility and doping concentration (as described
herein). The smaller size of probe beam 152 is achieved (as
illustrated in FIG. 1C) by enlarging the diameter and/or the
divergence angle of generation beam 151, e.g. by moving a lens used
to generate beam 151.
[0106] Instead of changing a parameter used in the intensity
measurements (as described above in reference to act 244), profiler
103 can change a parameter used in the creation of charge carriers
in illuminated region 120 (see act 147 in FIG. 2A) to obtain a
number of intensity measurements (see act 243). For example,
profiler 103 can change the rate of carrier generation in region
120 by changing either the power of generation beam 151 (while
holding all other parameters constant), or the diameter of
generation beam 151 (while holding other parameters, e.g. power)
constant, as described below in reference to FIG. 7A.
Alternatively, profiler 103 can change the location of illuminated
region 120 and perform a number of intensity measurements.
[0107] Profiler 103 can also change both parameters, namely the
parameter used in creating the charge carriers as well as the
parameter used in measuring the concentration of charge carriers
(e.g. by performing each of acts 241 and 244), as would be evident
to a person skilled in semiconductor physics in view of the
disclosure. In one implementation discussed below in reference to
FIG. 2C, the locations of each of probe beam 152 and generation
beam 151 are changed to obtain a linear scan across a wafer
104/105/106, while holding the beams 151 and 152 coincident each
with the other.
[0108] Although in the above-described embodiments, a probe beam
152 having photons of energy below the bandgap energy of wafer 156
is used (to avoid the creation of measurement-related carriers
during the measurement), in another embodiment a small percentage
of charge carriers in addition to the charge carriers created by
generation beam 151 are created by use of a probe beam 152 (same
reference numeral is used for convenience) having photons of energy
at or slightly above the bandgap energy. The measurement-related
carriers created by such a probe beam 152 are in a sufficiently
small percentage (e.g. an order of magnitude smaller than the
number created by the generating beam) to provide a reasonably
accurate measurement of reflectance (e.g. to within 5%). Note that
the overall accuracy of a measurement as described herein is also
governed by other inaccuracies involved in the act of measuring,
e.g. inaccuracies in a measurement device, such as an amplitude
detector 818.
[0109] Therefore, in one embodiment the inaccuracy caused by the
measurement-related carriers is kept only as small as necessary to
maintain the overall accuracy below a predetermined limit.
Specifically, the percentage of measurement-related carriers is
kept sufficiently small when the rate per unit volume of the
carriers generated by generation beam 151 (obtained by dividing the
photon flux per unit area by the absorption length), is at least
one order of magnitude (or more) larger than for probe beam
152.
[0110] The photon flux per unit area described above is the number
of photons per unit energy obtained by dividing the power P of
generation beam 151 by the area (.pi.W.sub.0.sup.2) of illumination
by Plank's constant h and the ratio of the speed c of light to the
wavelength .lambda. as shown in the following formula: photon
flux=(P/.pi.W.sub.0.sup.2) (1/h(c/.lambda.)). The absorption length
is the depth from surface 153 at which the intensity of generation
beam 151 drops to (1/e) of the intensity at surface 153 (see
equation 23).
[0111] In one implementation, the intensities of beams 151 and 152
are kept approximately equal (e.g. 100 milliwatts per cm.sup.2),
and the number of charge carriers (also called "measurement-related
carriers") created by beam 152 is less than 10% of the number of
charge carriers (also called "excess carriers") that are created by
generation beam 151 due to the difference in absorption lengths.
Instead of intensities, the powers of beams 151 and 152 can be kept
identical in case of an undoped layer of a wafer 104 because the
dependence of carrier concentration on the diameter of beams 151
and 152 drops out as described below in reference to equation
(5).
[0112] Note that in other implementations, beams 151 and 152 can
have powers different from each other (e.g. 100 milliwatts and 25
milliwatts respectively), and yet maintain the number of
measurement-related carriers at a negligible percentage. For
example, probe beam 152 can have photons of energy greater than the
bandgap energy, if the power of probe beam 152 is sufficiently less
than the power of generation beam 151 (to keep the
measurement-related carriers at a negligible percentage).
[0113] In one implementation, probe beam 152 has a generation rate
one or more orders of magnitude smaller than the generation rate of
generation beam 151. As noted above, the difference in generation
rates is obtained by using beams 151 and 152 that have different
absorption lengths in the semiconductor material of wafer 156, or
by generating beams 151 and 152 at different powers or different
diameters, or all of the above. In various implementations, the
pair of beams 151 and 152 are generated by one of the following
pairs of lasers: (AlGas, InGaAs), (Ar, InGaAs), (NdiYAG, InGaAs),
and (NdiYAG, AlGaAs).
[0114] In one or more of the implementations, e.g. for use of
lasers (NdiYAG, AlGaAs), the power of probe beam's laser (e.g.
AlGaAs) is maintained less than the power of generation beam's
laser (e.g. NdiYAG) because the absorption length of the probe beam
is a fraction (e.g. one-tenth) of the absorption length of the
generation beam. In another example, a probe beam 152 formed by a
HeNe laser is maintained at a power less than or equal to
1/4.sup.th power of generation beam 151 formed by an Ar laser
(having an absorption length 1.2 .mu.m that is 1/4.sup.th the 3.0
.mu.m length of the HeNe laser beam). In the just-described
implementation, the power of the reflected portion of probe beam
152 is maintained large enough (by having a sufficiently large
power of probe beam 152) to be detected with sufficient accuracy
(e.g. with error of 5% or less) required for reflectance
measurements as described herein.
[0115] In one variant of this implementation, the difference
between the generation rates of beams 151 and 152 is one order of
magnitude only at surface 153 (FIG. 1C). In a second variant, the
order of magnitude difference is maintained throughout junction
depth "Xj" of doped region 130 in wafer 105/106, e.g. throughout
depth of 0.3 microns. In a third variant, the order of magnitude
difference is maintained throughout a predetermined fraction (e.g.
1/2) of the junction depth Xj.
[0116] In one embodiment, the above-described intensity measurement
obtained in act 243 is used directly to detect electrically active
defects that could lie at various depths d near (e.g. within 1-2
.mu.m) surface 153 (FIG. 1C) in wafer 105. Specifically variations
in intensity measurements across a wafer 105/106 are detected by
changing (as illustrated by act 247 in FIG. 2A) the region 130
illuminated by beams 151 and 152, and repeating the measurement in
the new region. Note that beams 151 and 152 remain coincident (as
illustrated in FIG. 1C and unlike FIG. 1D) when focused on the new
region.
[0117] In a first embodiment, (also called "scanning embodiment"),
the measured intensity is plotted (in a graph) along the y axis, as
a function of position along the x axis (see FIG. 3A), in response
to movement of coincident beams 151 and 152 across wafer 105/106,
to determine if wafer 105/106 is within the specifications (as
illustrated by act 260 in FIG. 2A). In one implementation, computer
103C displays on a monitor 103M (FIG. 1A) various graphs for either
a linear scan (as illustrated in FIG. 3A) or an area scan (as
illustrated in FIG. 3B).
[0118] Specifically, lines 370, 380 and 390 in FIG. 3A illustrate
the measured intensity in microvolts as a function of position in
microns, over a 20 micron movement of the following wafers (not
shown): (1) a first wafer that has not been patterned generates
line 380 that is used to characterize rapid thermal anneals, (2) a
second wafer that was pre-amorphized with a high energy silicon
implant (e.g. a uniform dose of 5.times.10.sup.14 silicon atoms per
square centimeter at an energy of 100 Kev to cause uniform damage,
and annealed at 1000.degree. C. for 10 seconds to remove
sub-surface defects) generates line 370, and (3) a third wafer
having a uniform epitaxial region (e.g. grown with a thickness of 4
microns and a doping concentration of 1.times.10.sup.15 boron atoms
per cubic centimeter) generates line 390.
[0119] As seen from FIG. 3A, the intensity measurement varies as a
function of the expected defect level. The empirical data in FIG.
3A is explained below in reference to equation (12a). Specifically,
the carrier concentration (indicated by an intensity measurement)
drops when the lifetime drops due to a defect in a wafer 104 that
does not have a junction. The analysis for a wafer 105/106 having a
junction is similar, although requiring a more complicated
analytical solution. Instead of such an analytical solution, a
numerical model is prepared, in one implementation using Atlas
software in computer 103C as described below.
[0120] Specifically, the defect level is expected to be highest on
the first wafer (see line 380 in FIG. 3A), because the first wafer
is the lowest quality wafer among the just-described three wafers.
Line 380 has the largest variation (as compared to lines 370 and
390), with defects at each of valleys 380A-380P (where
A.ltoreq.I.ltoreq.P, P being the number of valleys, in this example
P=8).
[0121] The second wafer with an annealed silicon implant is
expected (due to the anneal) to have less defects, and as
illustrated by line 370 has less variation than line 380 and fewer
valleys 310A-310P (where P=5 in this example). The lowest defect
level is expected in the third wafer since an epitaxial wafer
includes a pure silicon crystal layer at the surface, so that the
surface has no residual polishing damage. As illustrated by line
390, small sized (e.g. with a dimension <100 .ANG.) defects near
(within a depth of 1-2 .mu.m from surface 153 in FIG. 1C) have
electrical activity (wherein such defects act as sites for charge
carriers of opposite polarity to recombine, thus reducing the
lifetime) that causes a small variation (as illustrated in FIG. 3A)
in the intensity measurements.
[0122] In one implementation, a ratio (also referred to as
"peak-valley" ratio) is determined by dividing the signal value at
a peak (i.e. a local maximum, e.g. peak 372 having a signal value
of Sh1) by the signal value at a valley (i.e. a local minimum, e.g.
valley 370A having a signal value of S1), to obtain a ratio e.g.
Sh1/Sl1 for line 370 (and similarly ratio Sh2/Sl2 for line 380 and
ratio Sh3/Sl3 for line 390). Thereafter, the ratios for wafers
undergoing the same fabrication process, if smaller than or equal
to a predetermined ratio identify acceptable wafers. For example,
if ratio (Sh1/Sl1) of wafer 105/106 is greater than the
predetermined ratio (Shm/Slm) as illustrated in FIG. 3A, wafer
1015/106 is identified as unacceptable (e.g. by placing in a bin of
rejected wafers).
[0123] In one implementation, computer 103C displays on monitor
103M a message indicating that measurements identify a wafer
104/105/106 as unacceptable, while in another implementation
computer 103C drives a signal to a robot (not shown) to move wafer
104/105/106 into a bin of rejected wafers (if rejected). The
acceptable wafers are processed further in the normal manner (see
act 262 in FIG. 2A).
[0124] A predetermined ratio (Shm/Slm) is set empirically by
comparing the above-described ratios of one or more reference
wafers (wherein the reference wafers are known to be good or bad
based on electrical tests for conformance to the specification for
such wafers), thereby to identify a maximum limit on the ratio for
acceptable wafers. The empirical method used can be any method such
as one of the methods described in "STATISTICAL QUALITY CONTROL
HANDBOOK" available from AT&T Technologies, Commercial Sales
Clerk, Select Code 700-444, P.O. Box 19901, Indianapolis, Ind.
46219, phone 1-800-432-6600, second edition, 1958.
[0125] Specifically, the variations in such a peak-valley ratio are
correlated with the performance of a reference wafer during
electrical tests that identify reference wafers (that are good). In
one example, four different wafers have 1%, 5%, 10% and 20%
variation from the peak-valley ratio Sh3/S13 (e.g. ratio 1.2) of an
epitaxial wafer, and have the respective variations in performance
speed of 8%, 10%, 20% and 25% during electrical testing of
integrated circuit dies formed from the respective wafers.
[0126] Assuming that 10% and greater variation in speed is
unacceptable, the predetermined ratio is set for this example at 5%
variation. Therefore, all wafers having variation of peak-valley
ratio lower than 5% are identified as acceptable wafers (as
illustrated by act 262 in FIG. 2A). Note that if the peak-valley
ratios of a number of wafers that have been successively processed
are close to the predetermined ratio (e.g. all greater than 4.5% in
the just-described example), one or more parameters used in
processing the wafers may be adjusted (e.g. as described herein in
reference to act 263 of FIG. 2A) even though none of the wafers are
discarded.
[0127] In another implementation, instead of computing a ratio and
comparing the ratio to a predetermined limit, a difference (also
called "measured difference") Sh1-Sl1 between local maximum 372 and
local minimum 371, is compared directly with a predetermined limit
Shm-Slm on such a difference, and the number of times the measured
difference (over a unit distance) exceeds the predetermined limit
is used as an indication of the number of defects in the wafer. The
number of defects in wafers that have been annealed are
detected(e.g. as valleys 380A-380P in FIG. 3A), and compared with a
predetermined limit (e.g. 0 defects) on the number of defects, to
accept or reject a wafer. In one implementation, computer 103C
displays a message indicating the number of defects on monitor
103M.
[0128] In still another implementation, each measured intensity for
a wafer 104/105/106 is compared with a predetermined range (e.g.
the range Shm-Slm in FIG. 3A), and if any intensity falls outside
the range, the wafer is rejected. Therefore in one example, if two
wafers represented by lines 380 and 390 are formed by the same
process, the wafer represented by line 380 is rejected and the
wafer represented by line 390 is accepted.
[0129] Moreover, defects in an annealed wafer 106 cause changes in
the shape of a plot of the measured intensity vs. power of the
generation beam (see FIG. 3A described below). Therefore, in one
embodiment, after identifying the locations of defects (e.g. the
x-coordinate of each valley 380A-380N in FIG. 3A), a number of
intensity measurements are performed at each location, and used to
obtain a material property or process condition at the
location.
[0130] Such material properties are of interest in the processing
of wafers because of the sensitivity of reflectance measurements as
described herein to the removal or creation of defects by processes
such as annealing. Specifically, when the above-described act 240
(FIG. 2A) is performed on a wafer 104 before processing in wafer
processing unit 101 (FIG. 1A), defective wafers are screened out at
the beginning, i.e. prior to any processing as described herein
(e.g. formation of doped regions), thereby eliminating two types of
defects: (1) defects in a wafer caused by polishing and (2) defects
in epitaxial material. Moreover, when act 240 is performed on a
wafer 105/106, any defects caused by a fabrication process (e.g.
ion implantation, annealing, etching or patterning) is identified
(as described herein).
[0131] In addition, act 240 is used in one implementation to screen
out starting wafers formed of bare silicon. When defects in such
bare silicon are identified at the beginning, the method results in
correction of the wafer fabrication process to ensure a
sufficiently low defect level and eliminate the cost and use of a
starting wafer 106 formed of epitaxial material. Starting wafers
formed of pure silicon (also called "prime wafers") are processed
by profiler 103 in a manner identical to starting wafer 104 as
described herein.
[0132] Anneals are typically done by heating the wafer rapidly with
lamps (not shown) in annealer 102 (FIG. 1A). The illumination by
the lamps in annealer 102 may not be uniform, and the amount of
heat that enters a patterned wafer 105 at any point may be a
function of the thickness of dielectric layers (such as silicon
dioxide or silicon nitride to be formed on surface 153), and the
integrated circuit pattern therein. Specifically, the different
layers (not shown) in wafer 105 reflect different amounts of power,
thereby causing variations in the amount of heating of wafer
105.
[0133] Thus annealing of implanted wafer 105 may not be uniform,
and the characteristics of a junction (formed at an interface
between doped region 130 and semiconductor material 156 in FIG. 1C
at a depth xj from surface 153) in annealed wafer 106 may vary from
point-to-point. Lines 370, 380 and 390 (FIG. 3A) indicate to a
person skilled in semiconductor physics the variations in junction
properties on a micron and sub-micron scale. Therefore, such lines
are used by a human operator of profiler 103 to check if the
just-formed transistors are uniform all across wafer 105/106, and
to conform to specifications (e.g. by adjusting the anneal, implant
or circuitry design) the transistors in a to-be-formed wafer.
[0134] Instead of a human operator, such checking is automated by
computer 103C in another embodiment. For example, instead of
forming a display (as shown in FIGS. 3A and 3B), computer 103C (1)
automatically uses the measurements of each wafer to compute the
mean and standard deviation values, over a large number of wafers
(typically several hundred or more), and (2) automatically uses
these values of mean and standard deviation to identify when an
implant or anneal process is out of specification, using
statistical process control methods that generate control
parameters (as described in pages 5-30 of the above-referenced book
from AT&T Technologies, and these pages are incorporated by
reference herein) to be provided to unit 101 or annealer 102.
[0135] As noted above, although a linear scan is illustrated in
FIG. 3A, an area scan is performed in another embodiment as
illustrated in FIG. 3B. Specifically, profiler 103 (FIG. 1A)
performs a number of reflectance measurements in a corresponding
number of regions (e.g. by repeating acts 244 and 243 in FIG. 2A)
in a closely spaced grid (e.g. a grid that divides a wafer 105/106
into a number of regions, each region having an area 10 microns by
10 microns). The reflectance measurements are plotted to form on
monitor 103M (FIG. 1A) a graph of the measured intensity vs. x-y
position (e.g. in the form of various types of hatched regions as
shown in FIG. 3B or preferably as a three dimensional image).
Thereafter the graph of the area scan is used by an engineer
skilled in semiconductor physics to evaluate wafer 105/106, in a
manner similar to the the use of a scanning electron
microscope.
[0136] Instead of plotting a graph to be manually checked, the
reflectance measurements are checked automatically in another
implementation, using statistical process control methods as
described above. Also, each reflectance measurement obtained by act
243 (FIG. 2A) provides an indication of a material property (e.g.
the mobility of charge carriers) in wafer 105/106 (FIG. 1A).
Specifically, profiler 103 is programmed to obtain a number of
measurements (in at least one region 301) that are used (as
described below in reference to FIGS. 5A-5H) to calibrate a
measurement with respect to the material property (e.g. obtain a
sealing factor to convert a reflectance measurement into doping
concentration or a slope from a number of measurements into
mobility).
[0137] In one implementation, profiler 103 performs a group of
measurements (e.g. at least two measurements for two different
powers of generation beam 151) in each region of wafer 105/106.
Therefore in the just-described embodiment, profiler 103 functions
as a scanning mobility microscope that displays on monitor 103M the
mobility of various regions on wafer 104/105/106, and can be used
in a manner similar to the use of a scanning electron microscope.
In one example, four hundred measurements are taken in an area of
100 .mu.m.times.100 .mu.m and displayed in a three dimensional
graph wherein the x and y axes define, in the two dimensions, a
region on patterned wafer 105, and the hatch pattern (that is
displayed on monitor 103M in a third dimension) indicates the
measured reflectance.
[0138] In another embodiment, the location at which the charge
carriers are created is not changed between two or more
measurements. Instead, in performing act 241 (FIG. 2A), profiler
103 (FIG. 1A) creates charge carriers in the same location, and
changes a parameter used to create the charge carriers. The
parameter can be, for example, the average carrier concentration
nav in region 120. Concentration nav is changed e.g. by changing
the intensity of generation beam 151 (e.g. by changing the power or
the diameter), as described below in reference to FIG. 5A.
[0139] Also, instead of or in addition to act 241, profiler 103
changes a parameter used in the measurement as illustrated by act
244 in FIG. 2A, e.g. changes the diameter of probe beam 152 or
changes the location at which the reflectance is measured by
offsetting the position of beam 152 relative to beam 151, as
described above in reference to FIG. 1F.
[0140] In one embodiment, two or more of the reflectance
measurements made in act 243 (FIG. 2A) are used to measure a
material property of wafer 104/105/106 by one or more acts 451-455
(FIG. 4A). Specifically, in act 451, profiler 103 fits the
reflectance measurements to a line, such as curved line 471 (FIG.
4B). Curved line 471 is a plot (along the y axis) of the intensity
of probe beam 152 (FIG. 1C) after reflection by region 120, as a
function of the parameter being varied (along the x axis), e.g.
power of generation beam 151 incident on region 120. Profiler 103
(FIG. 1A) uses points 471A-471N obtained by each of the intensity
measurements to fit a curved line 471 (FIG. 4B) for a wafer (e.g.
by connecting points 471A-471N with line segments).
[0141] Next, in act 252 (FIG. 4A), profiler 103 determines one or
more attributes that describe curved line 471, e.g., determines the
first order coefficient (also called "slope") and the zeroth order
coefficient (also called "intercept") of one or more straight lines
that approximate various portions (e.g. two portions described
below) of curved line 471, and/or determines an inflection point
(e.g. a point at which a second or higher order derivative becomes
zero). In the example illustrated in FIG. 4B, curved line 471 has a
point (hereinafter "inflection point") at which the slope changes
in such a manner as to allow a majority (greater than 50%) of the
intensity measurements greater than the measurement at inflection
point IP to be approximated by a straight line 471H. Similarly, a
majority of the intensity measurements below the measurement at
inflection point IP are approximated by another straight line
471L.
[0142] So curved line 471 has a high-power portion HP that
corresponds to a condition called "high level injection" wherein
the concentration of excess carriers created by generation beam 151
(FIG. 1C) is greater than the concentration of background charge
carrier normally present in doped region 130 due to activated
dopants. Line 471 also has a the low power portion LP that
represents a condition called "low level injection" wherein for
powers of generation beam 151 lower than powers in portion HP, the
rate of generation of excess carriers in doped region 130 is
smaller than the concentration of background charge carriers due to
the activated dopants. Low power portion LP and high power portion
HP are each separated from the other by the just-described
inflection point IP.
[0143] Lines 471H and 471L are obtained by computer 103C (FIG. 1A)
without knowledge of inflection point IP by using two or more of
the intensity measurements at the extreme ends of the range of
measurements. For example, two points 471A and 471B that represent
the highest intensity measurement and the next highest intensity
measurement can be used to determine line 471H, while two other
measurements 471N and 471M that represent the lowest intensity
measurement and the next lowest intensity measurement are used (by
computer 103C) to determine line 471L. Instead of using two points,
in another embodiment three adjacent points at the high end of the
range, e.g. points 471A-471C, are used to obtain a best fit line
471H, while three adjacent points 471K-471N at the low end of the
range are used to obtain the best fit line 471L. In one
implementation, inflection point 471I is found from the
just-described lines 471L and 471H, as the point on curve line 471
that is the closest to an intersection point of lines 471L and
471H.
[0144] As noted above, in FIG. 4B the parameter varied in act 244
or act 247 (FIG. 2A) is plotted along the x axis. Therefore,
depending on the implementation, the intensity measurement (see y
axis) is plotted against one of the following: the power of
generation beam 151 (as illustrated in FIG. 5A), the parameter of
probe beam 152 (as illustrated in FIG. 7A), and the offset distance
between beams 151 and 152 (as illustrated in FIG. 7B).
[0145] Although a pair of straight lines 471L and 471H are used to
approximate curved line 471 in one implementation, other
implementations use other numbers of straight lines (e.g. a single
straight line for the entire curved line 471, or three or more
straight lines). In alternative implementations, instead of using
straight lines, computer 103C uses quadratic or higher order
functions that approximate curved line 471, e.g. to obtain three or
more such coefficients.
[0146] In one implementation, programmed computer 103C generates a
number of curved lines 501-504 (FIG. 5A) from intensity
measurements on four different wafers. For example, profiler 103
obtains a number of measurements 502A-502N with beams 151 and 152
coincident in the same region 120 (FIG. 1C) by changing the power
of the generation beam 151. Thereafter, computer 103C generates
lines 502H and 502L in the manner described above in reference to
FIG. 4B, and thereafter determines the respective slopes m.sub.H
and m.sub.L, and the respective y intercepts YH and YL by
performing acts 246A and 246B (FIG. 4A). In the just-described
example, wafers represented by lines 501, 502, and 503 have known
material properties, while the properties of a wafer represented by
line 502 are unknown.
[0147] In one implementation, the properties and process conditions
of wafers represented by lines 501, 502 and 503 are plotted as
functions of one or more of the above-described coefficients, e.g.
high power intercept YH and low power slope m.sub.L, as illustrated
by FIGS. 5B, 5C, SD and 5E. Thereafter, the corresponding
coefficients of line 502 are used to look up the respective
properties and/or processing conditions.
[0148] Specifically, in the example illustrated in FIG. 5A, curved
lines 501-504 have the following fit coefficients shown in Table
1.
1TABLE 1 Anneal Temperature in Line m.sub.L m.sub.H YL YH Degrees
Centigrade 501 2.70 1.88 -13.9 20.6 950 502 4.05 1.89 -12.5 89.1
1000 503 4.13 2.92 -25.7 51.8 1050 504 1.94 2.52 -6.8 -49.5 900
[0149] Therefore, computer 103C uses the high power intercept YH of
value 89.1 as illustrated in FIG. 5B to obtain the anneal
temperature as 999.degree. C. from line 510 that is obtained from
the known anneal temperatures of each of wafers represented by
lines 501, 503 and 504. Similarly, computer 103C uses the low power
slope mL of value 4.05 in FIG. 5C to obtain an anneal temperature
of 1000.degree. C. from line 309 again obtained from the known
anneal temperatures. Although each of FIGS. 5B and 5C provide the
same information for the wafer represented by line 302, i.e. an
anneal temperature of around 999.5.degree. C. (average of the two
measurements obtained from FIGS. 5B and 5C), FIG. 5C is useful when
FIG. 5B provides ambiguous information, e.g. indicates two anneal
temperatures of 980.degree. C. and 1040.degree. C. when high power
intercept is 60. The low power slope can be used to pick one of the
two values 980.degree. C. and 1040.degree. C., e.g. pick
980.degree. C. when the low power slope is less than 4.0.
[0150] In the above-described example of the wafer represented by
curve line 302, programmed computer 103C compares the measured
value of 999.5.degree. C. with the specification of 975.degree. C.
(as illustrated by act 260 in FIG. 2A), and identifies the wafer as
being rejected (e.g. by moving the wafer into a bin of rejected
wafers), and thereafter adjusts a process parameter e.g. drives a
signal on line 108 (FIG. 1A) to reduce the temperature by
25.degree. C.
[0151] Instead of, or in addition to determining a process
condition (e.g. anneal temperature as described above in reference
to FIGS. 5B and 5C), the above-described attributes derived from
the intensity measurements can be used to determine one or more
properties of the semiconductor material in illuminated region 120.
Specifically, profiler 103 uses the low power slope m.sub.L to
determine junction depth Xj (FIG. 1C) by looking up a graph (FIG.
5D) of such slopes plotted against junction depth of wafers having
known properties. In the above-described example, the low power
slope ML has a value of 4.05, and line 511 (FIG. 5D) yields a
junction depth of 580 angstroms.
[0152] Thereafter, profiler 103 compares the value of 580 angstroms
with a predetermined range of acceptable junction depths e.g. the
range of 400 to 600 angstroms. As the value of 580 falls within the
range, wafer 105/106 is identified as acceptable, and is processed
further in the normal manner (as illustrated by act 262 in FIG.
2A). If the measured junction depth falls outside the predetermined
range, wafer 105/106 is rejected (as illustrated by act 260 in FIG.
2A), and one or more process conditions are adjusted e.g. by
adjusting the addition of dopants (as illustrated in act 263).
[0153] Note that the adjustment of a process condition can also be
performed even when a wafer is accepted (as illustrated by act
262), e.g. if the measured property (such as the junction depth)
falls closed to the limits of the range, e.g. within 5 percent of
the limit (in the above-described example within the range of
400-408, or within the range of 475-500). As noted above, to adjust
the process condition, profiler 103 provides a signal to either or
both of unit 101 and annealer 202 to return the value of the
measured property back to the middle of the predetermined range
(e.g. to 500 angstroms).
[0154] Measuring junction depths as described above in reference to
FIG. 5D provides an unexpected result, considering that at least
one prior art reference, namely U.S. Pat. No. 4,854,710 granted to
Opsal teaches that depth information cannot be obtained in the
absence of a plasma wave (specifically, Opsal states in column 4,
lines 33-35, "[h]owever, in applications where sample variations as
a function of depth need to be studied, it is necessary to generate
and study plasma waves").
[0155] Similarly, profiler 103 uses another attribute, specifically
the high power intercept YH to look up the concentration of active
dopants at surface 153 (FIG. 1C). Specifically, profiler 103 uses
the high power intercept YH of value 89.1 to obtain a surface
concentration of 7.times.10.sup.19 atoms/cm.sup.3 from line 512
(FIG. 5E) formed by plotting the high power intercepts of a number
of wafers having known surface concentrations.
[0156] Instead of, or in addition to the use of a coefficient (e.g.
one of the above-described slopes or intercepts to measure the
concentration of dopants at the surface (as discussed above in
reference to FIG. 5E), profiler 103 can use another attribute of
curved line 502, specifically an inflection point IP of line 502 at
which the second or higher order differential close to zero.
Specifically, in one implementation, profiler 103 uses the x
coordinate XI of the inflection point IP to determine the power of
generation beam 151 and uses another graph (FIG. 5F) to look up the
concentration of active dopants in material 156 (FIG. 1C).
[0157] Curved line 514 (FIG. 5F) is used directly with the
generation beam's power at the inflection point IP as determined
from FIG. 5A to look up the doping concentration. For example, when
the value of the x coordinate of the inflection point IP is 43,
curve line 154 yields a value of 7.times.10.sup.19 atoms/cm.sup.3
value for the doping. Line 514 (FIG. 5F) is obtained by programming
the Atlas software into computer 103C to form a simulator as
described herein, and providing to the simulator information on the
material structure (description of the doped layers) and generation
beam 151 (description of diameter, power and wavelength), for
various doping concentrations and various powers.
[0158] Sheet resistance Rs of region 130 (FIG. 1C) can also be
determined from the high order slope m.sub.H of line 502 (FIG. 5A)
from a plot of the slope versus the sheet resistance as illustrated
in FIG. 5G. Specifically, profiler 103 normalizes the measured
slope to the slope of a wafer having a step junction, a 0.2
micrometer deep doped region 130, doped with 20 KeV implant into
N-type epi wafer at a dose of 1.times.10.sup.15 atoms/cm.sup.3,
with a probe beam 152 having a diameter 2 micrometers and power
41.5 mW, and generation beam 151 having a diameter 2 .mu.m, and
power varied from 0 to 90 mW.
[0159] Therefore, in one implementation, line 381 (FIG. 5G) is
obtained by modeling the sheet resistance Rs using a finite element
simulator, such as computer 103C (FIG. 1A) programmed with the
software "Atlas" available from Silvaco of Sunnyvale, Calif. Such a
simulator is set up (in a manner apparent to the skilled engineer
in view of the disclosure) to model the carrier concentration at
surface 153 (FIG. 1C) of semiconductor material 156 in response to
illumination by generation beam 151, thereby to determine according
to the model, a reflectance that is normalized with respect to the
reflectance obtained from a wafer having a step junction 0.2
micrometer deep, and doped with 20 KeV implants into n-type epi on
an n-type wafer.
[0160] The normalized reflectance is plotted as a function of the
sheet resistance Rs to yield line 516, and the measured values are
scaled (by normalization) to yield line 515 (FIG. 5G) coincident
with line 516. Sheet resistance Rs varies inversely with each of
doping concentration (FIG. 5F), and with junction depth Xj (FIG.
5D). Therefore, the junction depth Xj is held constant, by
implanting with a constant energy while varying the dosage and
therefore the doping concentration to create a variation in sheet
resistance Rs.
[0161] The slope m.sub.H of the high power portion HP (FIG. 4B) is
proportional to inverse of the mobility, which is in turn
proportional to doping concentration (as illustrated by the FIG.
6B). Therefore, the normalized high power slope m.sub.H (described
above) is sensitive to the sheet resistance Rs, as demonstrated
both by experiment and the simulator (and shown in FIG. 5G).
[0162] Profiler 103 extracts sheet resistance Rs as follows.
Specifically, profiler 103 measures, for a wafer having a known
sheet resistance Rs, a high power slope m.sub.H as described above
(FIG. 5G) in the high power portion HP, e.g. such a reference wafer
has sheet resistance of 500 ohms per square, thereby calibrating
the slope value of 0.6. Thereafter, profiler 103 uses the
calibrated value to plot the high power slopes against the sheet
resistance, and obtain line 515.
[0163] Next, profiler 103 measures the reflected powers and
determines a slope for a wafer with the same implant energy as the
wafer having known properties used to calibrate lines 515 and 516.
For example, the wafer with the unknown sheet resistance may have a
slope of 0.8, and therefore profiler 103 determines the sheet
resistance (from FIG. 5G) to be 1000 ohms/square.
[0164] For a step junction (a junction having one constant level of
doping for depth values from the surface to the junction depth and
a second constant level of doping for depth greater than the
junction depth), the sheet resistance is given by 1 R s = Xj = 1 q
nXj
[0165] where p is the resistivity, Xj is the junction depth, .mu.
is the mobility, and n is the active carrier concentration. Thus,
the sheet resistance Rs combines mobility, active doping
concentration, and junction depth so that one of these can be
determined from the others. For example, profiler 103 determines
mobility using the above-described equation, after determining
sheet resistance (from FIG. 5G), doping (from FIG. 5P) and junction
depth (from FIG. 5D) as described above.
[0166] The high power slope m.sub.H of a plot of intensity
measurements as a function of the power of generation beam 151
(e.g. lines 501-504 in FIG. 5A) is used to obtain mobility by
simply dividing slope (for high injection) with a corresponding
slope of a reference wafer and multiplying by the known mobility as
shown by the formula: 2 unk = m ref m unk ref
[0167] Specifically, for high-level injection, the current is
radial as described below in reference to FIG. 9B. Therefore, the
carrier concentration is given by equation (5) that is also
described below. Combining equations (5), (21) and (22) described
below gives the high power slope 3 m H = q 3 ( 1 - R 0 ) 2 ( m 0 2
- 1 ) 0 s m * 2 kTE ph ( 1 )
[0168] where m.sub.H is the slope of the high power portion of the
line obtained by plotting along the y axis the reflection signal
normalized to the absolute reflection as a function of the
generation beam 151's power plotted along the x axis, q is the
electron charge, R.sub.0 is the absolute reflection, .alpha. is the
absorption coefficient, equal to the inverse of the absorption
length m.sub.0 is the index of refraction of the silicon,
.epsilon..sub.s and .epsilon..sub.0 are the dielectric constants of
free space and the silicon, me is the carrier effective mass,
.omega. is the radial frequency of the probe beam, k is Boltzmann's
constant, T is the temperature, and E.sub.ph is the energy of one
photon at the generation beam wavelength, and p is the
mobility.
[0169] A curve such as line 517 (FIG. 5H) is found from the above
equation. In more complex situations, line 517 can be found by
numerical modeling. Line 517 also can be found empirically by
measuring m.sub.H and correlating to mobilities measured, for
example, by constructing transistors on the same material and
measuring the mobility based on the performance characteristics of
the transistor. Thereafter, profiler 103 uses the high power slope
m.sub.H of a wafer under fabrication to look up mobility using line
517.
[0170] Graphs, such as lines 509-513 in FIGS. 5B-5F, that are used
to determine a material property or a process condition are
generated in one of the two following ways (in two different
embodiments). In the first embodiment, a set of wafers (also called
"reference wafers") is selected or prepared to have a range of
material properties (by varying process conditions, such as implant
energy, dose or anneal temperature), and thereafter profiler 103 is
used to obtain intensity measurements and generate fit coefficients
or other attributes for each of the reference wafers (as described
above). Thereafter, the fit coefficients or attributes are used to
plot lines 509-513 and 515. In a second embodiment, a number of
wafers (also called "reference wafers") are subjected to intensity
measurements in profiler 103 (as described above), followed by use
of a conventional measurement technique, such as spreading
resistance profiling to determine the actual doping profile
therein.
[0171] In one example, lines 501-504 in FIG. 5A represent wafers
created by ion implantation at an energy of 2 KeV and dosage of
1.times.10.sup.15 using boron, followed by annealing at each of the
following temperatures: 950.degree. C. for line 501, 1000.degree.
C. for line 502, 1050.degree. C. for line 503 and 900.degree. C.
for line 504. Thereafter, intensity measurements are obtained as
described above, and plotted to form the graphs in FIG. 5A. Next,
spreading resistance profiles (abbreviated as "SRP") are prepared,
as illustrated in FIG. 6A, wherein the reference numerals obtained
by adding 100 to the reference numerals in FIG. 5A indicate lines
corresponding to the same wafers (e.g. line 501 in FIG. 5A
corresponds to line 601 in FIG. 6A).
[0172] SRP lines 601-604 illustrated in FIG. 6A, are prepared by
breaking the wafers to expose the ion-implanted layer followed by
beveled edging and probing to measure the profile of the
concentration of active dopants as a function of depth. Therefore,
at the end of the preparation of SRP, the graphs (FIG. 6A) provide
a plot of the active dopant concentration (atoms/cm.sup.3) along
the y axis as a function of depth (in microns) along the x axis.
From lines 601-604, programmed computer 103C determines the surface
concentrations 601Y-604Y, that are thereafter used to generate line
512 illustrated in FIG. 5E. Moreover, programmed computer 103C
determines the depths at the dopant concentration value of
1.times.10.sup.19, specifically x coordinates of points 601J-604J,
and uses these values to generate a plot of low power slope versus
junction depth illustrated as line 511 in FIG. 5D. Straight lines
generated by the above-described methods fit (in an act called
"curve-fitting") the measurements well, e.g. R.sup.2 values of
greater than 0.95 in FIGS. 5D and 5E.
[0173] Therefore, after one or more of the above-described graphs
(see FIGS. 5B-5G) are prepared, the material properties of a wafer
under fabrication are determined by the above-described method 200
(FIG. 2A) without the need to break and lap the wafer, because
profiler 103 simply uses the above-described graphs to generate
measurements of material properties. Therefore, profiler 103
eliminates the cost associated with test wafers otherwise required
by the prior art methods (for breaking and lapping).
[0174] Although in the above description, computer 103C has been
described as performing various computations for preparation of
lines (e.g. line 512 in FIG. 5E) used to measure material
properties, such graphs can be prepared by another computer, or
alternatively can be prepared manually by performing the
above-described acts.
[0175] Moreover, although in one embodiment the above-described
lines (e.g. FIGS. 5A-5G) are prepared, in another embodiment such
graphs are not prepared and instead the reflectance measurements
are simply used to perform the various acts of method 200 by use of
equations related to such graphs. For example, instead of drawing a
line 512 (FIG. 5E), the slope and intercept of such a line are
determined, and thereafter an equation containing the slope and
intercept is used with the high power intercept to obtain the
surface concentration.
[0176] Also, instead of line 512 being a straight line, a curved
line can be used, and alternatively, a second or higher order
differential equation can be fitted to the intensity measurements
to obtain the property measurement (in the manner described herein,
as would be apparent to a person skilled in the art of computer
programming).
[0177] Furthermore, well known relationships, such as the relation
of mobility to dopant concentration (as illustrated by line 611 in
FIG. 6B) can be used in addition to (or instead of) the
above-described graphs (in FIGS. 5B-5G). Specifically, in one
embodiment, profiler 103 uses a line 611 (FIG. 6B) in the range of
10.sup.16 to 10.sup.19/cm.sup.3, a range that is in common use in
integrated circuit processing, to obtain mobility of the value 100
centimeters per second from a dopant concentration of
4.2.times.10.sup.19 atoms/cm.sup.3 that is obtained as described
above in reference to FIG. 5E. Note that although the surface
concentration obtained from FIG. 5E is higher than the dopant
concentration in the bulk, the mobility obtained from line 611
approximates the mobility in the bulk, because the mobility drops
only slightly between 10.sup.19 and 10.sup.20 atoms/cm.sup.3
dopings, as described below in reference to FIG. 9C.
[0178] Another well known relationship, illustrated by line 613
(FIG. 6C) can be used to estimate the bulk lifetime from a
knowledge of the dopant concentration as follows. Specifically,
profiler 103 uses the dopant concentration e.g. of value
4.2.times.10.sup.19 to lookup, from line 613, a bulk lifetime of
value 1.1.times.10.sup.-5 milliseconds. The surface dopant
concentration provides an estimate of the lifetime in the bulk
material 156 (FIG. 1C).
[0179] Instead of using the known relationships (e.g. lines 611 and
613 in the respective FIGS. 6B and 6C), relationships specific to
the wafers being fabricated can also be prepared as described above
in reference to FIG. 5H from the appropriate measurements of the
mobility and lifetime using conventional methods, and these
relationships are thereafter used in profiler 103 to measure the
mobility and lifetime of a wafer under fabrication as described
herein.
[0180] The above-described known relationships (such as the
relationship between mobility and dopant concentration described
above in reference to FIG. 6B) provides an accurate estimate only
in the absence of effects (such as surface roughness and dopant
segregation) that reduce mobility. Specifically, surface roughness
causes scattering that degrades the value of surface mobility to a
level below bulk mobility, so that the surface mobility that
determines line 502 (FIG. 5A) may not be the same as the bulk
mobility corresponding to the carrier concentration that determines
inflection point IP (FIG. 5A).
[0181] Therefore, one embodiment uses two attributes together to
obtain a property e.g. (1) uses inflection point IP (as described
above in reference to FIG. 5F) to obtain dopant concentration, and
(2) uses line 502 (specifically the high power intercept YH) to
obtain surface concentration (as described in reference to FIG. 5E)
to determine a change in the doping concentration (independent of
surface roughness). Specifically, the inflection point indicates a
condition when the concentration of excess carriers equals the
doping concentration. For example, if the surface mobility is half
the bulk value, then a doping concentration extracted from a
mobility of 100, using point 612 indicates a value of
4.times.10.sup.19, while a doping concentration extracted from the
inflection point using FIG. 5F, indicates a value of
1.times.10.sup.18.
[0182] Instead of changing the power of generation beam 151 between
reflectance measurements to generate lines 501-504 (FIG. 5A),
another parameter can be changed as illustrated by act 244
described above in reference to FIG. 2A. Specifically, in one
implementation, the diameter of either probe beam 152 or generation
beam 151 is changed between reflectance measurements, and therefore
yields measurements that are sensitive to the rate dn.sub.ei/dx of
carrier concentration 158 as shown in FIG. 1B. The change in rate
n.sub.ei is used to measure degradation of carrier lifetime as
illustrated in FIGS. 7A and 7B.
[0183] Specifically, lines 701 and 702 (FIG. 7A) illustrate limits
of a range of acceptable lifetimes of a wafer under fabrication,
and represent along the y axis the normalized intensity
measurement, plotted against the radius of probe beam 152 (FIG.
1H). The intensity measurement illustrated in FIG. 7A is normalized
to the intensity measurement obtained by use of a probe beam 152 of
the diameter 1 micrometer for no degradation in the lifetime, on a
wafer 105/106 having a step junction 0.2 micrometer deep, doped
with a p-type dopant at a dosage of 5.times.10.sup.18.
[0184] Therefore, profiler 103 simply plots point 703 in the graph
of FIG. 7A from a measurement obtained for a wafer under
fabrication, and checks to see if point 703 falls within a region
704 defined to be the acceptable region between limits 701 and 702.
If so, profiler 103 decides that wafer 105/106 that generated
measurement 703 has an acceptable lifetime. Note that the
above-described measurement represented by point 703 is a single
measurement, and therefore the single measurement is adequate to
decide the acceptance or rejection of a wafer as described
herein.
[0185] Moreover, in one implementation, a number of additional
lines, e.g. lines 700I and 700J are included, and profiler 103
estimates the lifetime at point 703 by interpolation, e.g. to be
500 times degraded (because point 703 falls between line 700I for
100 times degradation and line 700J for 1000 times degradation). A
plot of the normalized intensity measurement versus the probe beam
diameter provides an accurate test for checking the lifetime of a
wafer 105/106, because the intensity measurement is linearly
proportional to the concentration of carriers generated by
generation beam 151 at surface 153, as illustrated by lines 711 and
712 (FIG. 7B) corresponding to the above-described lines 701 and
702.
[0186] Note that in FIG. 7B, the x axis indicates radial distance
from axis 155 (FIG. 1H) of generation beam 151. The relationship
between intensity measurement and the surface concentration is
described below in reference to equations 21 and 22. Note that in
view of equations 21 and 22, instead of a reflectance measurement
being used to measure a property of the semiconductor material, a
change in the index of refraction can also be used in a similar
manner.
[0187] In one implementation, beam 152 (FIG. 1C) is a laser beam
having a wavelength greater than 1 .mu.m (the wavelength at which
photons have approximately the same energy as the bandgap energy of
silicon). Note that the wavelength of beam 152 depends on the
bandgap energy and therefore on the specific material in wafer
105/106, and is different for germanium.
[0188] In one example, probe beam 152 is generated by a laser 801
(FIG. 8A), such as a 1480 nm fiber coupled laser diode, model
CQF756/D having a maximum output power of 70 milliwatts, available
from Philips Corporation, Eindhoven, The Netherlands. Laser 801 is
mounted separate from other components in profiler 103, and is
coupled to a collimator 803 by a fiber 802 that carries beam 152.
Collimator 803 can be, for example, part number WT-CY3-163-10B-0.5
available from Wave Optics, Mountain View, Calif.
[0189] In this implementation, generation beam 151 is created by an
above bandgap laser 805, such as 830 nm laser diode model
SDL-5432-H1 having a maximum output power of 200 milliwatts,
available from Spectra Diode Labs, San Jose, Calif. Profiler 103
includes a lens 806, which is part number 06GLC002/810 available
from Milles Griot Corporation, Irvine, Calif. Lens 806 collimates
the generation beam 151, and is mounted on a positioner (not shown)
for providing motion to beam 151 with respect to beam 152.
[0190] The relation between wavelengths of beams 151 and 152
produced by lasers 801 and 805 is a critical aspect in one
embodiment and leads to unexpected results, for example when beam
151 contains photons having energy above silicon's bandgap energy
and beam 152 contains photons having energy approximately the same
as or less than the bandgap energy. In this example, for a silicon
wafer the 830 nm and 1480 nm wavelength beams provide one or more
benefits described herein (e.g. generate a negligible percentage of
measurement-related carriers).
[0191] Profiler 103 also includes an isolator 807, such as part
number OIM-12-812 available from Karl-Lambrecht Corp., of Chicago,
Ill. Isolator 807 prevents back reflections from entering laser
805. Profiler 103 also includes a photo-diode 821a that is used to
measure the intensity of beam 151 after reflection by wafer 106.
Moreover, an anamorphic prism (not shown) is inserted in beam 151
to circularize beam 151 that is generated in a polarized manner by
laser 805.
[0192] Profiler 103 also includes lenses 808 and 809 that function
as 2.times. beam reducer, with focal lengths of 37.5 mm and 75 mm
respectively. Lens 808 mounts on a stage (not shown) to allow
adjustment of the position along the X-axis with respect to laser
805, and therefore can be used to de-collimate beam 151, thereby
varying the spot size with respect to beam 152. Profiler 103 also
includes partially transmissive mirror 810, such as a dichroic
mirror that combines beams 151 and 152, thereby to create a
combined beam 811. Diodes 821B and 821C are "reference diodes" that
are used for absolute calibration of the transmitted and reflected
power of a probe beam 152.
[0193] Profiler 103 also includes a photo cell 821b (such as a
photo diode) that detects leakage through mirror 810, thereby
measuring the forward power of beam 151. Beam 811 passes through
50:50 beam splitter 813, and 90:10 beam splitter 814 to objective
lens 815. Objective lens 815 can be, for example, 100.times., 0.9NA
lens part number 81814 available from Nikon Corporation of
Yokohama, Japan. Lens 815 focuses the combined beam 811 onto the
surface of wafer 106.
[0194] Profiler 103 also includes photo cell (also called "photo
diode") 821C that is used to measure the forward power in beam 811.
Profiler 103 also includes stage 829 that is used to move wafer 106
relative to beam 812 in the X, Y and Z directions. Specifically,
stage 829 can be moved in the vertical direction along the Z axis
to adjust focus, and in a horizontal plane to adjust the position
of region 120 of FIG. 1B relative to beam 812 (also required by
step 244 in FIG. 2A).
[0195] Beam 812, after reflection by region 120 passes back through
objective lens 815 to 90:10 beam splitter 814. Splitter 814
deflects 10% or the return beam to second lens 819 that acts as a
microscope eyepiece. Lens 819 has a magnification of, for example,
10.times., such as part number 81845 from Nikon of Yokohama,
Japan.
[0196] After passing through lens 819, the deflected portion of
beam 812 is incident on a camera 820, such as model 85400 available
from FJW Industries of Palatine, Ill. Lens 819 and camera 820
together form a microscope to allow the measurement of focus, beam
size and beam overlay using a vision system, such as model
ASP-60CR-11-S available from Cognex Corporation, Boston, Mass.
[0197] Ninety percent of the reflected portion of beam 812R passes
to beam splitter 813 that diverts the reflected portion through
filter 817, such as Schott glass RG830, available from Spindler
& Hoyer Corporation of Goettingen, Germany to photo cell 818,
such as J16-8SP-RO5M-HS from EG&G Judson of Montgomeryville,
Pa., USA.
[0198] Filter 817 removes photons of generation beam 151 from
combined beam 812R, thereby allowing detector 818 to see only the
photons of probe beam 152. Filter 817 is a critical component in
one embodiment and provides the unexpected result of eliminating
feedthrough of the modulated signal (generated by beam 151) to
detector 818 that would otherwise be present when using a prior art
system of the type disclosed by Smith as discussed above. In this
particular implementation, germanium is used in photo detector 818
to provide sensitivity to photons of wavelength 1480 nanometers
that are generated by laser 801.
[0199] Profiler 103 includes signal processing circuit 830 and
drive circuit 840 that are used respectively to process the
reflected portion 812R and to generate the generation beam 151.
Specifically, laser driver 842 (such as model 8000 from Newport
Corporation of Irvine, Calif.) drives laser 805 to generate beam
151 in response to signal on modulation input terminal 842M. Laser
driver 842 includes thermo-electric cooler power supply(not shown)
to maintain the stability of laser diodes 805 and 801. Drive
circuit 840 also includes reference oscillator 843, such as a bench
variable frequency oscillator, that is used to drive a signal on
modulation input terminal 842M. Reference oscillator 843 provides
100% modulation of beam 151. Reference oscillator 843 has a
frequency that is set manually to a value in the range of 1 Hz to
20,000 Hz to avoid the creation of a wave of carriers in region 130
(FIG. 1C).
[0200] Combined beam 812 after reflection by region 120 is incident
on photo cell 818 included in signal processing circuit 830. Photo
cell 818 converts the power of the instant beam into a current that
is supplied to current-to-voltage converter 833 also included in
signal processing circuit 830. Converter 833 can be, for example, a
single stage op-amp transimpedance amplifier using an OP-27A
integrated circuit available from Burr-Brown of Tuscon, Ariz.
[0201] Converter 833 converts the current from photo cell 818 into
a voltage that is provided to a single gain stage 834 also included
in circuit 830. Gain stage 834 provides an additional signal gain
over the gain provided by converter 833, because converter 833 is
limited to a few kilohms. The gain in converter 833 is limited
because converter 833 is dc coupled, and the power of reflected
portion 812R is a few milliwatts, so that excess transimpedance
gain will cause converter 833 to saturate.
[0202] Converter 833 is ac coupled to amplifier 834. In one
embodiment, a constant component of the reflectance (as opposed to
the reflectance component at the modulation frequency) is measured
from the signal at a node 838 that is located between converter 833
and amplifier 834. Profiler 103 uses the constant component to
normalize the intensity measurement, and compares the normalized
measurement between wafers (e.g. between a wafer under fabrication
and a reference wafer). The voltage signal provided by amplifier
834 is used by a lock-in amplifier 835, such as model 830 available
from Stanford Research Systems, Sunnyvale, Calif. Lock-in amplifier
835 is coupled to reference oscillator 843 that provides a signal
modulated at the same frequency as the signal on modulation
terminal 842m of laser driver 842. Lock-in amplifier 835 provides a
signal indicating the intensity of reflected portion 812R modulated
at the frequency provided by oscillator 843 to processor 836, such
as a personal computer running software to capture and display the
signal in an appropriate manner.
[0203] In one implementation, personal computer 836 has a line 837
that is coupled to lines 107 and 108 (described above in reference
to FIG. 1A) thereby to control the acts performed by ion implanter
101 and rapid thermal annealer 102 based on measurement of one or
more material properties as described herein.
[0204] Mobility is a material property that affects current
transport in semiconductors 156, and is defined through the
following equation: 4 J = q nE - kT q n x ( 1 )
[0205] where J is the current density, n is the carrier
concentration, E is the electric field, k is Boltzmann's constant,
q is the electron charge, T is the temperature, and .mu. is the
mobility. Appearing in both terms of equation (1), mobility .mu. is
the fundamental material constant that defines the current flow
(See Sze, "Physics of Semiconductor Devices", pages 50-51,
incorporated by reference herein).
[0206] Mobility .mu. directly relates to fundamental device
performance, including speed and power dissipation. For example, in
a field effect transistor (the fundamental building block of modern
integrated circuits) the transconductance g.sub.m (change of
current with respect to applied gate voltage) is linearly
proportional to the mobility through the factor 5 g m Z L C 0 ( 2
)
[0207] where Z and L are the channel width and length respectively,
and C.sub.0 is the gate capacitance. The mobility near (e.g. within
a depth less than the mean free path of the carriers) surface 153
(FIG. 1C) depends on a number of parameters affected by the
process, such as surface roughness, doping and defect density (See
Grove, "Physics and Technology of Semiconductor Devices", page 326,
incorporated by reference herein).
[0208] Lifetime is a measure of how long a carrier exists before it
recombines, and is determined from a measurement of the radial
decay of the concentration of excess carriers as described herein
(e.g. is reference to FIGS. 7A and 7B). Contamination causes the
lifetime to drop rapidly, as does an increase in defect density.
Thus, lifetime is a sensitive indicator of material quality and
process contamination. Near the surface 153 (FIG. 1C), lifetime may
be dominated by trapping centers at the interface between a silicon
dioxide layer and the silicon. The lifetime near surface 153
becomes an indicator of the quality of this interface.
[0209] Active dopants modify the conduction properties of a
semiconductor material 156 (FIG. 1C), thereby making devices such
as transistors. Active dopants are also used to isolate devices,
form contacts, and adjust operating voltage levels. Profiler 103
indicates how much of an implanted dose becomes electrically active
and therefore the efficacy of such structures. In many cases,
process problems relate to uniformity of the anneal and activation,
so that measuring only an implanted dose in an unannealed wafer 105
is of less value than measuring in an annealed wafer 106 a profile
of active dopants (e.g. lines 601-604 described above in reference
to FIG. 6A).
[0210] The photons of beam 151 (FIG. 1C) generate free
electron-hole pairs. Because the index of refraction of
semiconductor material 156 is large compared to free space
(silicon, for example, has a relative index of refraction of 3.42),
the incident rays refract sharply to the normal 155, and the beam
shape approximates a cylinder 157 for a depth of a few microns
(e.g. 5 microns beneath the surface).
[0211] When the diffusion length L (the distance excess carriers
travel before they recombine, given by L.sup.2=(kT/q).mu..tau.,
where .tau. is the lifetime and k is Boltzmann's constant, T the
temperature, and q the electron charge) is long compared to the
radius w.sub.0 of illuminated region 120--as is commonly the case
in some processes--the carrier concentration within this cylinder
is independent of radius w.sub.0, and varies as the inverse of the
mobility, .mu.. Furthermore, reflectance relates directly to the
carrier concentration C, so that a reflected power measurement
provides a direct measure of mobility A.
[0212] Outside the illuminated cylinder, carrier concentration C
drops rapidly, the drop being approximately exponential function of
the ratio r/L, where r is the radius from the cylinder and L is the
diffusion length. Because of the cylindrical geometry, the drop off
is a Bessel function, which is the cylindrical symmetry equivalent
of an exponential function. Thus, knowledge of the mobility .mu.
from an intensity measurement (see act 243 in FIG. 2A) within
illuminated region 120 coupled with another intensity measurement
of the carrier concentration as a function of distance from
illuminated region 120 allows determination of lifetime .tau. as
described above (in reference to FIGS. 7A and 7B).
[0213] Furthermore, in silicon of the type used to make
semiconductor devices (such as integrated circuits), the
concentration of active dopants directly relates to the mobility.
Thus, a measurement of the mobility allows determination of the
active dopant concentrations 601Y-604Y (FIG. 6A). Finally, adding a
layer of material with a concentration of dopants different from
the bulk, as by ion implantation and annealing as described above,
affects the reflectance as a function of the power of beam 151
(FIG. 1C), and the function can be used to determine the active
dopant profile in the added layer.
[0214] Carrier concentrations in a bulk material (i.e. a material
that is uniformly doped) can be calculated assuming that the
diffusion length L is very long compared to the cylinder radius,
i.e. (D.tau.>>w.sub.0.sup.2) so that there is no
recombination in the cylinder. In this formula D is the diffusion
coefficient D=(kT/q).mu., where .mu. is the mobility. Thus, the
diffusion coefficient and the mobility are directly related.
Furthermore, it is assumed that the absorption length
.alpha..sup.-1 of the beam 151 (FIG. 1C) used to generate carriers
is long compared to the cylinder diameter 2w.sub.0, so that the
generation is approximately constant in depth d.
[0215] Under these assumptions, all carriers generated in cylinder
157 exit out the side, and there is negligible current along the
normal 155 that is the axis of the cylinder 157. This case usually
applies, since the radius w.sub.0 typically 0.5-3 .mu.m, the
diffusion length L may be 20 .mu.m or longer, and the absorption
length .alpha..sup.-1 is 5-20 .mu.m (the former for a wavelength
.lambda. of 670 nanometers, the latter for a .lambda. wavelength of
810 nm).
[0216] The rate G of carrier generation per unit volume in a
cylinder 157 of radius w.sub.0 (also called "spot size") in a
region between depth z and z+dz is
G(r)=.pi.r.sup.2(1-R).PHI.(e.sup.-.alpha.z-e.sup.-.alpha.(z+dz)).apprxeq..-
pi.r.sup.2(1-R).PHI..alpha.e.sup.-.alpha.zdz, (3)
[0217] where r is the distance from normal 155, R is the surface
reflectance, F is the incident photon flux of beam 151, w.sub.0 is
the radius of cylinder 157, and .alpha. is the absorption
coefficient of material 156.
[0218] The flux F out of a cylinder of radius r is this number G of
carriers generated per unit time per unit volume found in equation
(3), divided by the area of the wall of cylinder 157, 6 F ( r ) = G
2 rdz = r ( 1 - R ) - z 2 = - D n r = - kT q n e r . ( 4 )
[0219] The last two equalities in equation (4) are due to the fact
that the flux F is limited to diffusion (in the absence of a wave),
and a relationship between the diffusion coefficient D and mobility
.mu. is applied from an equation (6) to be discussed below.
[0220] This solution in equation (4) ignores surface recombination
of charge carriers. One embodiment of the invention is used on
semiconductor wafers undergoing integrated circuit processing, and
these wafers usually have surface passivation, that suppresses
surface recombination.
[0221] The carrier concentration in a cylinder is independent of
the cylinder's radius under the conditions described herein as
shown below. Integrating both sides of equation (4) with respect to
r from zero to the cylinder radius gives 7 n e ( w 0 ) = 0 w 0 n r
r = q ( 1 - R ) - z 4 kT ( w 0 2 ) = [ q ( 1 - R ) - z 4 kTE p ] (
1 ) P l ( 5 )
[0222] where P.sub.1 is the power of generation beam 151, E.sub.p
is the energy of a single photon, and the mobility and diffusivity
relate as 8 D = kT q ( 6 )
[0223] where k, T and q have been described above in reference to
diffusion length L. Equation (5) shows that when the spot size
(also called "beam diameter") w.sub.0 is small, excess carrier
concentration ne in any cylinder is independent of radius, and is
solely a function of known physical parameters (a constant shown in
square brackets in equation (5)), and the inverse of mobility
.mu..
[0224] Therefore, a measurement of intensity of probe beam 152
after reflection by the charge carriers anywhere in illuminated
region 120 (FIG. 1C) on surface 153 of semiconductor material 156
provides a direct measure of mobility .mu. (scaled by the
just-described constant) when power Pl of the generation beam 151
is 1 watt.
[0225] In one embodiment, the reflected intensity of beam 152 as a
function of power of beam 151 is measured. As shown below, the
reflected intensity varies linearly with carrier concentration
n.sub.e. Therefore, a plot of reflected intensity v/s generation
beam power for a wafer without a doped layer at the surface, as
shown by line 901 in FIG. 9A, approximates a straight line. The
slope of line 801 is the product of known physical parameters and
the inverse of the mobility.
[0226] Therefore, equation (5) illustrates the physical basis of
the measurement of carrier concentration n.sub.e by profiler 103
within the illuminated region. The exact solution for the carrier
concentration n.sub.e is found using the diffusion equation in
cylindrical coordinates, 9 n e t = G - n e 0 + D ( 2 n e r 2 + 1 r
n e r ) ( 7 )
[0227] where n.sub.e is the concentration of excess carriers and G
is the generation rate per unit volume, with
G=.alpha..PHI. (8)
[0228] where, as above, .PHI. is the incident photon flux per unit
area and .alpha. is the absorption coefficient.
[0229] For periodically varying incident radiation, all quantities
vary in time as exp(j.omega.t), and (7) reduces to 10 ( 2 n e r 2 +
1 r n e r ) - n e ( 1 D 0 + j D ) + G = 0 ( 9 )
[0230] To avoid creation of a wave of charge carriers as described
herein, the real part of the second term in equation (9) needs to
be significantly larger than the imaginary part, a condition that
requires the frequency .omega.=2.pi.f=1/10.tau..sub.0. For a
lifetime of 10 .mu.sec, the modulation frequency f should be less
than 1600 Hz. The imaginary part of equation (9) when significantly
larger than the real part leads to a wave-like solution at high
frequencies and is avoided under the conditions described herein.
The present invention operates at sufficiently low frequencies, to
allow the imaginary term to be dropped. This assumption reduces
equation (9) to
.rho..sup.2n"(.rho.)+.rho.n'(.rho.)-.rho..sup.2n(.rho.)=0 (10)
[0231] where r.sup.2=r.sup.2/Dt.sub.0=r.sup.2/L.sup.2 and
n=n.sub.e-G t.sub.0.
[0232] The solution to equation (10) is written in terms of the
hyperbolic Bessel functions of order zero, 11 n ( r L ) = AI 0 ( r
L ) + BK 0 ( r L ) ( 11 )
[0233] where K.sub.0 tends to zero at infinity and becomes infinite
at zero. Conversely, I.sub.0 diverges as r approaches infinity but
tends to zero for small arguments. Consequently, within the
cylinder 157 formed by beam 151 (FIG. 1C), A is finite and B is
zero. Outside the cylinder, B is finite and A is zero. The
coefficients A and B are found by recognizing that the carrier
concentration C and its derivative are continuous at the cylinder
wall, r=w.sub.0.
[0234] Applying the above conditions gives the exact solutions as
follows, where "n" is the carrier concentration that is in excess
of the concentration with zero illumination: 12 n ( r w 0 ) = G [ 1
+ K 1 ( w 0 L ) I 0 ( r L ) K 0 ( w 0 L ) I 1 ( w 0 L ) - I 0 ( w 0
L ) K 1 ( w 0 L ) ] and (12a) n ( r w 0 ) = G I 1 ( w 0 L ) K 0 ( r
L ) K 0 ( w 0 L ) I 1 ( w 0 L ) - I 0 ( w 0 L ) K 1 ( w 0 L )
(12b)
[0235] FIG. 9A shows lines 901-904 that illustrate the solution
inside equation (12a) and outside equation (12b) illuminated region
120. Equation (12a) yields the same result as equation (5) for
w.sub.0<<L. Specifically, FIG. 9A illustrates, in a graph,
curved lines 901-904 that indicate the logarithm (along the y axis)
of carrier concentration (for corresponding doping concentrations)
as a function of the radial distance (along the x axis) from the
central axis 155 (FIG. 1C), with no ion implants in the respective
wafers. The doping concentrations for curved lines 901-904 are
respectively 10.sup.19, 10.sup.18, 10.sup.17, and 10.sup.16
atoms/cm.sup.3, and the measurements were taken about r=0, where
beams 151 and 152 (FIG. 1C) overlay. As beam 151 is cylindrically
symmetric, the linear coordinates (different from angular
coordinates .theta.) are depth D and radius r.
[0236] In FIG. 9A, the carrier concentration (vertical axis) is
shown as a function of radius near surface 153 (depth=0) resulting
from illumination by an generation beam 151 (FIG. 1C) of uniform
spatial intensity (e.g. assume a constant beam intensity for a
radius between zero (the beam axis) and the beam radius w.sub.0
(FIG. 1C), and zero intensity beyond the beam radius w.sub.0). The
beam radius w.sub.0 in one example is 0.5 .mu.m the power is 20
milliwatts, and the wavelength is 810 nanometers (for silicon).
[0237] As shown herein, the carrier concentration ne in region 120
(FIG. 1C) is constant, independent of beam radius w.sub.0, and
inversely proportional to the mobility of the charge carriers. The
mobility is inversely proportional to the doping concentration, so
the carrier concentration increases with doping. Also, the
reflectance measurement increases linearly with the carrier
concentration, and so the reflectance measurement provides a
measure of 1/mobility.
[0238] The rate at which the concentration n.sub.e drops outside
illuminated region 120 (FIG. 1C) is a function of the lifetime T
and the diffusion length L=(DT) Since D is known from the
reflectance measurement within illuminated region 120, a set of
reflectance measurements radially outward from the cylinder edge
determines the lifetime .tau..
[0239] Carrier concentration ne can also be determined in material
with a shallow doped layer 911 (FIG. 9B) formed by introduction of
dopant atoms through surface 153. FIG. 9C illustrates a
semiconductor structure in wafer 105/106 under illumination, the
potential drop across the structure, and the currents out of the
region of the shallow doped layer under illumination. Regions
912-914 are, respectively, a shallow doped layer, a low doped
epitaxial layer, and a high doped substrate. All are assumed to be
doped p-type, although n-type doping, or various combinations of n-
and p-type doping give similar results. Junction 916 exists between
shallow doped layer 912 and epitaxial layer 913.
[0240] The semiconductor surface 923 is illuminated with laser beam
911, creating a cylindrical region of illumination in the
substrate, and illuminating region 915 of shallow doped layer 912.
The illumination causes a potential drop across the structure, with
the surface at the most negative point. Most of the potential drop
is taken up at the interface between the epitaxial layer 913 and
substrate 914, drop 918, and the interface between the shallow
doped layer 912 and epitaxial layer 913, drop 919. Lesser drops
occur in the substrate 914, epi layer 913, and shallow doped layer
912, which are drops 920, 921 and 922 respectively.
[0241] Two currents flow out of the shallow doped layer 913. One is
a vertical current 917, flowing perpendicular to the surface. The
second is a radial current 916, flowing parallel to the surface.
These currents are assumed to be due to diffusion. There are four
components: the vertical hole current, the vertical electron
current, the radial hole current, and the radial electron current.
These are, respectively: 13 J Vp = - qD p p z (13a) J Vn = qD n n z
(13b) J Rp = - qD p p r (13c) J Rn = qD n n r (13d)
[0242] where q is the electron charge, D.sub.p and D.sub.n are the
hole and electron diffusion coefficients respectively, p is the
hole concentration, n is the electron concentration, z is the
variable in the depth direction, and r is the variable in the
radial direction. D.sub.p and D.sub.n are related to the electron
and hole mobilities as D.sub.n(p)=(kT/q).mu..sub.n(p), where k is
Boltzmann's constant, T is the temperature, and .mu..sub.n(p) is
the electron (hole) mobility.
[0243] A qualitative analysis (described below) of the structure
shown in FIG. 9C explains how the surface carrier concentration,
and, hence, the reflection signal, is a function of the power of
generation beam 911. The qualitative analysis further explains how
the curve may have inflection points and regions with differing
slopes, as shown by line 471 in FIG. 4B (described above), and how
material properties related to a profile of dopants in the shallow
doped region 912 are extracted from curve 471.
[0244] Currents 916 and 917 are driven by the gradient of the
carrier concentration, as shown in equations 13a-d above. The
gradient in the vertical direction scales as the carrier
concentration divided by the junction depth. The gradient in the
radial direction scales as the carrier concentration divided by the
diffusion length in layer 912. Typically, the junction depth is
0.02-0.1 .mu.m and the diffusion length is several microns, so at
low level injection the vertical current dominates.
[0245] The carrier concentration at the surface is found by
integrating current 917, given by equations 13a and 13b, from the
surface 923 to the junction 916, with the boundary condition that
the carrier concentration must be zero at junction 916 since,
according to potential drop 919, junction 916 is reverse biased.
This integral increases with junction depth. Therefore, the signal
at low level injection is sensitive to junction depth. Experimental
results, such as line 511 in FIG. 5D (described above), confirm
this dependence.
[0246] Under high level injection, the effect of the background
doping concentration disappears, and the potential drop 919 across
the junction between regions 912 and 913 disappears. The gradient
of the carrier concentration in the vertical direction is now due
to the optical absorption of photons, a distance characterized by
the absorption length. The gradient of the carrier concentration in
the radial direction is still due to the diffusion length in layer
912.
[0247] For 830 nm radiation, the absorption length is about 20
.mu.m. The radial gradient is on a scale of 2-4 .mu.m (see, for
example, the decay of the radial electron concentration lines 701
and 702 in FIG. 7A). Now, the radial current 916 is larger than the
vertical current 917. The surface carrier concentration is
sensitive to the near-surface mobility, and sensitivity to the
junction depth disappears.
[0248] According to the above description, line 471 (FIG. 4B) when
fit in the region below inflection point IP (FIG. 4B), corresponds
to low level injection, as illustrated by straight line 471L, and
to the region above inflection point 471I, by straight line 471H.
The slope and intercept of line 471L are each used to characterize
the junction depth and the slope and intercept of line 471H are
each used to characterize the mobility near the surface. As the
inflection point IP occurs at the transition from low to high level
injection (as described above in reference to FIG. 4B), at this
point the excess carriers have a concentration that approximately
equals the doping concentration. Thus, shifts in the inflection
point IP correspond to shifts in the doping concentration.
[0249] Because of the complexity of the equations governing a doped
layer in the real world (as compared to the just-described model
illustrated by regions 912-914 in FIG. 9A), the concentration of
excess carriers ne is obtained by using numerical modeling by
computer 103C, rather than analytical equations. Such solutions, as
well as actual measurements (see for example, FIG. 5B) have various
attributes such as inflection points that are used to determine the
various material properties (such as surface concentration,
mobility and junction depth) as described above.
[0250] Lines 951-953 (FIG. 9B) illustrate surface carrier
concentration C in illuminated region 120 as a function of power of
generation beam 151, as obtained from numerical modeling.
Specifically, lines 951-953 are for doping concentrations of
10.sup.16, 10.sup.17, and 10.sup.18 atoms/cm.sup.3, for a 0.2 .mu.m
thick implanted layer, on an epitaxial layer doped p-type at a
level of 10.sup.16 atoms/cm.sup.3, with beam 151 having radius 0.5
.mu.m and wavelength 810 nm for structure 910.
[0251] For line 951, regions 912 and 913 have the same doping
concentration, and the carrier concentration (at surface 923) as a
function of power of generation beam 151 is a straight line, with
the slope determined by the mobility. Inflection points 912I and
913I move to higher levels of power of generation beam 151 with
increasing doping concentration, and the slopes m.sub.H at high
level injection (slopes of regions 912H and 913H) drop as the
doping increases, reducing the mobility. The slopes of line 951 and
region 952H are approximately equal because the mobility drops only
slightly (e.g. less than 5%) between 10.sup.16 and
10.sup.17/cm.sup.3 doping.
[0252] As with bulk material 912 discussed above, the mobility and
lifetime of layer 911 may also be found. To account for the
complexity introduced by the multi-layered structure 910, a
numerical model is created by computer 103C, and then fit with data
such as carrier concentration C vs. laser power p and vs. radius r
from the optical axis 155 (FIG. 1C) to determine material
properties e.g. the mobility and lifetime. For example, the
numerical model may indicate that an intensity measurement of a
certain value (also called "expected value") is expected from a
certain doped layer. If the mobility near the surface is degraded,
the measured value is altered from the expected value, thus
identifying a problem.
[0253] A reflected signal that is measured in step 243 (FIG. 2A)
arises from the change in the surface reflection coefficient (also
called "reflectance") due to concentration of excess carriers
caused by beam 151 (FIG. 1C). The excess carriers (not shown)
oscillate in the electric field of beam 151 illuminating the
surface 153 (FIG. 1C). The oscillating carriers re-radiate light
from beam 152. This re-radiated light adds to the reflection of
beam 152 that occurs normally even in the absence of the excess
carriers.
[0254] A solution for the reflected signal can be found
analytically as described below using the Drude theory of
conduction (see Handbook of Optics, Volume II, pages 35.3-35.7;
Jackson "Classical Electrodynamics", sec. 7.7 and 7.8). The
propagation constant in gaussian units for a poor conductor (4
ps/we<<1) is 14 k = m ( c ) = [ m ( 1 + i 2 ) ] ( c ) ( 14
)
[0255] where s is the conductivity, .omega. is the radial frequency
of the light, c is the speed of light, m is the index of
refraction, .mu..sub.m is the magnetic permeability, and .epsilon.
is the dielectric permittivity The first term is the complex index
of refraction. In the present case, the magnetic permeability
.mu..sub.m=1, and .epsilon.=m.sub.o.sup.2, where m.sub.o is the
index of refraction in the absence of illumination (3.42 for
silicon).
[0256] From the Drude theory, the conductivity in the infrared is
15 = - n e ( r ) q 2 im e * - n h ( r ) q 2 im h * = - q 2 i ( n e
( r ) m e * + n h ( r ) m h * ) ( 15 )
[0257] where q is the electron charge, m.sub.e* and m.sub.h* are
the electron and hole effective masses, and n.sub.e and n.sub.h are
the electron and hole concentrations.
[0258] For silicon, the hole effective mass is independent of
orientation. The electron effective mass, however, is orientation
dependent, varying from 0.19 to 0.98 times the electron mass. For
light illuminating a (100) crystal surface--this cut being the most
common in integrated circuit processing--the effective mass has
four-fold symmetry. Consequently, a reflected signal due to
illumination with a polarization vector that rotates at a frequency
f has a 4f frequency component due to the electrons, provides a
means for measuring the electron concentration.
[0259] The imaginary conductivity means that the propagation
constant in equation (14) is real. This is because optical
frequency is so high that the electric field moves the carriers a
very small distance and they do not collide with the lattice. The
result is that they do not give up energy, so there is no
absorption.
[0260] Combining equations (14) and (15), and multiplying the
conductivity by 1/4pe.sub.o to convert to MKS units, the index of
refraction is 16 m = m o + m = - q 2 2 o m o m * 2 ( n e ( r ) m e
* + n h ( r ) m h * ) ( 16 )
[0261] For normal incidence on conductive media from air (index of
refraction=1), the reflection coefficient is given by 17 R = ( 1 -
) 2 + 2 ( 1 + ) 2 + 2 ( 17 )
[0262] This equation is an approximation, because probe beam 152 is
focused on the surface 153 (FIG. 1C), so that the incident rays are
not normal. However, the approximation is suitable to estimate the
performance of profiler 103, and simplifies the analysis.
[0263] The variables in equation (17) relate to the index of
refraction m by
m=.eta.+i.kappa. (18)
[0264] and the imaginary (absorption) term is related to the
absorption coefficient of the medium by 18 = 4 ( 19 )
[0265] The form of the change in reflectance .DELTA.R due to a
change in index .DELTA.m is found as follows. Ignoring the
component of reflectivity due to absorption, which is typically
very small, the reflectivity is 19 R = ( m - 1 ) 2 ( m + 1 ) 2 ( m
0 - 1 ) 2 ( m 0 + 1 ) 2 ( 1 + 4 m m 0 2 - 1 ) = R 0 ( 1 + 4 m m 0 2
- 1 ) ( 20 )
[0266] where the approximation is found by substituting an index of
refraction of the form m=m.sub.0+.DELTA.m, and retaining terms to
order .DELTA.m. From equation 20, 20 R ( r r ) = 4 m ( r r ) m 0 2
- 1 R 0 ( 21 )
[0267] The form of the change in index is found from the Drude
theory (equation 20 above), 21 m ( r r ) = q 2 n ( r r ) 2 0 s m *
2 ( 22 )
[0268] where q=1.602.times.10.sup.-19 coulomb is the electron
charge, .epsilon..sub.0=8.86.times.10.sup.-12 F/m is the dielectric
constant of free space, .epsilon.S=11.7 is the relative dielectric
constant of silicon, m* is the carrier effective mass, and w is the
radial frequency of the infrared beam, .omega.=2 pc/l, where
c=3.times.10.sup.8 m/sec is the speed of light and 1 is the
wavelength. In equation (22), n(r.sub.r) is the radial carrier
distribution, given by equation (12a) within the region 120
illuminated by generation beam 151, and equation (12b) outside the
illuminated region 121, or as found using numerical models.
[0269] Therefore, in one embodiment, computer 103C (FIG. 1A is
programmed to use equations (21) and (22) to determine the carrier
distribution n(r.sub.r). Note that computer 103C multiplies
n(r.sub.r) by 10.sup.6 to convert from /cm.sup.3 to /m.sup.3 if the
constants given above are used, and the effective mass is in
kilograms.
[0270] In equation (22) the electron and hole concentrations are
assumed to be equal, since a photon generates an electron-hole
pair, and net charge neutrality generally exists. For convenience,
the electron and hole effective masses are considered equal,
although this will not always be true.
[0271] Therefore, carrier concentration C is measured by profiler
103 (FIG. 1A) overlaying two beams (as shown in FIG. 1C): (1)
generation beam 151 that generates excess carriers, and (2) probe
beam 152 used to measure the reflectance attributable to the excess
carriers. Wavelength l of the generation beam 151 is, in one
embodiment, shorter than the wavelength of the probe beam 152,
since the photon energy varies inversely with the wavelength,
according to the relation 22 E ph = h c ( 23 )
[0272] where h is Plank's constant and c is the speed of light.
[0273] Furthermore, the minimum spot size w.sub.0 varies with the
wavelength as 23 w 0 = 0.61 NA ( 24 )
[0274] where NA is the numerical aperture of the focusing lens 415
(FIG. 8A)
[0275] As these relations indicate, probe beam 152 has a larger
minimum spot size than generation beam 151 when both beams 151 and
152 use identical lenses and have identical diameters. However, as
discussed above, relative beam diameters can be chosen to make
beams 151 and 152 of equal diameter at surface 153 (FIG. 1I). In
one embodiment, equation (24) is used by computer 103C to measure
the lifetime of the semiconductor material 156 (FIG. 1C), since the
carrier concentration C decays away from the region illuminated by
generation beam 151 as a function of {square root}{square root over
(D.tau.)}, where .tau. is the lifetime.
[0276] In a first approach, profiler 103 overlays the axes of both
beams 151 and 152 and starts with probe beam 152 larger than
generation beam 151. Then, profiler 103 gradually expands the size
of generation beam 151 until beam 151 is as large as probe beam
152. During the process, profiler 103 measures the reflectance at
each of a number of sizes of the generation beam 151, and plots
these measurements to obtain a curved line, followed by determining
various attributes (e.g. coefficients) for the curved line.
Therefore, profiler 103 compares the coefficient values for a
region (e.g. through a graph) with coefficient values of regions
having known material properties, thereby to interpolate one or
more material properties of the region.
[0277] In a second approach, profiler 103 overlays the two beams
151 and 152 with both at their minimum size. Then profiler 103
scans the generation beam 151 back and forth along a line, with the
scan amplitude approximately equal to the diameter of probe beam
152. During the scanning, profiler 103 measures the reflected
intensity, and provides an AC (alternating current) signal. Such an
AC signal is detected with improved signal-to-noise ratio as
compared to a direct current (DC) signal.
[0278] FIG. 1G shows the geometry of scanning one beam with respect
to the other to determine a profile of the concentration of excess
carriers as a function of distance along surface 153. The radii of
the probe and generation beams 152 and 151 are Wp and Wg
respectively. The axis of generation beam 151 is displaced from the
axis of probe beam 152 by a distance Dx along the x axis, wherein
the x and y axes define the surface plane of a wafer 105/106.
[0279] The power of a reflected portion of probe beam 152 is found
by integrating the reflection coefficient over the area of the
probe beam 152. A point within the probe-beam 152 defined in
cylindrical coordinates as (r,.phi.) is a distance 24 r r = r ( cos
( ) - x r ) 2 + sin ( ) 2 = r 1 - 2 x r cos ( ) + ( x r ) 2 ( 25
)
[0280] from the origin of generation beam 151. The reflected power
is then given by 25 P ref = 0 2 0 w IR I i ( r ) R ( r r ) r r ( 26
)
[0281] where Ii(r) is the incident intensity of probe beam 152. For
a uniform beam, I.sub.i(r)=P.sub.IR/(PW.sub.ir.sup.2), and 26 P ref
= P IR w IR 2 0 2 0 w IR R ( r r ) r r ( 27 )
[0282] A method of measuring material properties using equation
(27) is described above in reference to FIG. 7B. For example, FIG.
7B shows the excess carrier concentration (y axis) as a function of
radial position displaced from the axis 155 of generation beam 151.
As probe beam 152 is displaced according to the above procedure,
probe beam 152 illuminates a region having a smaller number of
carriers, and the reflection signal drops. The magnitude of this
drop, and of the peak signal, is a function of the lifetime. A
greater signal is obtained from a wafer without degraded lifetime
(line 711) as opposed to a wafer with degraded lifetime (line
712).
[0283] Signal-to-noise ratio (SNR) can also be determined for the
measurement method (e.g. method 200) described herein. The
reflected signal is given by using equation (20) for the real part
of the index, equation (23) for the imaginary part, and equation
(21) for the fraction of power reflected,
.DELTA.P=(R-R.sub.0)P.sub.lw (28)
[0284] where 27 R o = ( 1 - m o ) 2 ( 1 + m o ) 2 ( 29 )
[0285] and P.sub.lw is the laser power of probe beam 152 at the
wafer surface 153 (FIG. 1C).
[0286] The noise of the system is dominated by the shot noise in
the detector photocell 818. The RMS shot noise power in the
photocell 818 is 28 P noise = 2 qR o P lw L ( BW ) A ( 30 )
[0287] where BW is the bandwidth, A is the conversion efficiency of
the photocell, and L is the loss in transmission through the
optical system. For a reflectance R.sub.o=0.35, laser power
P.sub.lw=100 mW, a loss L=0.2, a lock-in amplifier noise bandwidth
of 0.3 Hz, and a conversion efficiency of A=0.6 amps/watt, the
noise power is P.sub.noise=34 picowatts. For a typical reflectance
signal .DELTA.R/R=10.sup.-6, where .DELTA.R is the change in
reflectance due to the concentration of excess carriers at the
surface, the signal power is 20 nanowatts, and the signal-to-noise
ratio (SNR) is 588. This is well above the SNR of 100 required to
obtain a .+-.1% accuracy.
[0288] Although the generation beam 151 is modulated, the probe
beam 152 is operated continuously at constant power (without
modulation). The just-described act of beams 151 and 152 allows
separation in measurement of two reflectances: a reflectance caused
by the excess carriers from the background reflectance, since the
former changes at the modulation frequency and can be detected in a
synchronous manner.
[0289] The above calculations did not include the heating of
surface 153 due to absorption of energy from generation beam 151.
Such heating has the effect of reducing mobility. The temperature
of region 120 (FIG. 1C) can be calculated using the radial
diffusion equation. For silicon, limiting the incident power of
generation beam 151 to a power on the order of 100 milliwatts
limits the heating to a few (e.g. less than 10) degrees Centigrade,
and therefore the above calculations still hold.
[0290] Alternatively, by increasing the power of generation beam
151, profiler 103 measures mobility as a function of temperature,
thereby measuring mobility at the temperature that an integrated
circuit in wafer 105/106 is expected to operate.
[0291] As described above, beam 151 that is used to generate
carriers has photons of energy (also called "photon energy")
greater than the bandgap energy of the semiconductor material, and
beam 152 that is used to measure reflection has a photon energy
lower than the bandgap energy. Therefore, the bandgap energy
defines a "boundary line" between the photon energies of two beams
151 and 152 used in one embodiment. The use of two beams, one on
each side of such a boundary line is a critical aspect in this
embodiment. At 300 degrees Kelvin, the boundary line is 1.12 eV
(wavelength of 1.11 .mu.m) for silicon, 1.42 eV (0.87 .mu.m) for
GaAs, 0.66 eV (1.88 .mu.m) for Ge, and 1.35 eV (0.92 .mu.m) for
InP.
[0292] In an alternative method, an act 1800 (FIG. 11) uses a
polarized beam (not shown) of light that is focused (act 1801) onto
surface 163 (FIG. 10A) of a semiconductor material 166 that has
charge carriers generated (act 1802) by focusing an generation beam
151 (FIG. 1C) modulated as described above. The polarized beam is
reflected (act 1803 in FIG. 11), and undergoes a polarization
rotation upon reflection. The polarization rotation is caused by
different reflection coefficients for the polarization components
parallel and perpendicular to surface 163. The rotation is a
function of the index of refraction. Therefore profiler 103
interferes (act 1804) the reflected portion with an unreflected
portion of the incident beam, and measures (act 1805) a difference
in magnitudes between the sum and difference components at the
modulation frequency.
[0293] Thereafter, profiler 103 relates (act 1806) the measured
difference to a property of the semiconductor material. Act 1806 is
similar to act 250 described above in reference to FIG. 2A.
However, in act 1800, instead of acts 244 and 241, profiler 103
performs the respective acts 1807 and 1808 and uses the measured
differences to determine the material property in act 1806 as
described herein.
[0294] The index of refraction is changed as a result of a change
in the carrier concentration, as described by equation 22. A beam
of polarized light reflected from surface 163 undergoes rotation of
polarization that is a function of the index of refraction at
surface 163. A measurement of this rotation is used to measure the
change of index of refraction and, using equation 22, the
concentration of excess carriers at surface 163.
[0295] Specifically, the polarization rotation measurement is used
to measure material properties in a manner identical to the use of
reflectance measurements as described earlier, in reference to
FIGS. 5A-5H. Therefore, act 1800 (FIG. 11) is performed by profiler
103 (FIG. 1A) instead of act 240. That is, profiler 103 performs
one or more of acts 210, 211, 213, 220 and 230 prior to act 1800,
and performs acts 250 and 260 subsequent to act 1800, while using
the polarization rotation measurement instead of the intensity
measurement.
[0296] Moreover, profiler 103 measures various material properties
of the semiconductor material (such as the dopant concentration,
mobility, junction depth, lifetime, and defects that cause leakage
of current during the act of an FET) in the manner described above
except that profiler 103 uses the polarization rotation measurement
instead of the intensity measurement. For example, in an act
similar to the above-described act 243 (FIG. 2A), a number of
polarization rotation measurements are obtained in a single
location by changing the power of generation beam 151, and the
measurements are plotted against the corresponding powers in a
graph similar to FIG. 5A. Thereafter the slope of a line connecting
the measurements is obtained and inverse of the slope indicates
mobility as described above.
[0297] Specifically, a scaling factor is determined based on
measurement of a reference sample, (similar to intensity
measurement conversion to mobility as described above), to convert
from units of signal to units of doping. The rotation measurements
can also be performed in an offset position (FIG. 1F), or with
generation and probe beams of differing size (FIG. 1G) to yield
lifetime. Moreover, coincident beams 151 and 152 (FIG. 1C) can be
scanned across a wafer in a manner similar to that described above
in reference to FIGS. 3A and 3B, to identify changes in the
material properties of the wafer.
[0298] At non-normal incidence of a light ray in the probe beam
(not shown), there are two different reflection coefficients: One
for the component of the electric field in the plane of the surface
(called the "s component") and one for the component in a plane
perpendicular to the plane of the surface (called the "p
component"). The reflection coefficients for the s and p components
are both functions of angle and the index of refraction of the
semiconductor material 166 (FIG. 10), but have different forms.
Consequently, the ratio of the s and p components is different
before and after reflection. The reflected light emerging from a
lens 168 has a different polarization from the incident light.
[0299] This polarization rotation is measured by interfering the
reflected light with a reference beam coherent with the incident
beam. Such a measurement may provide an increase in sensitivity of
about two orders of magnitude over the use of a non-polarized beam
(in act 240 of FIG. 2A), as described below in reference to
equation (48).
[0300] A plane wave with polarization along the x axis illuminates
a lens 168 (FIG. 10A). The incident planewave has an electric field
amplitude E.sub.ix. The plane wave illuminating lens 168 is made up
of a set of rays of light. To derive the polarization rotation, the
following analysis traces one of these rays as it reflects from
interface 163.
[0301] Specifically, a ray Ri of the polarized beam intercepts lens
168 at a radius r and angle .phi. with respect to the x axis. Lens
168 diffracts ray Ri so that diffracted ray Rd propagates toward
the focus f, located at the origin, a distance f from lens 168
along the z axis. Diffracted ray Rd has electric field components
E.sub.is parallel to the x-y plane (a plane parallel to the wafer
surface), and E.sub.ip in a plane perpendicular to the x-y plane.
The angle of the diffracted ray Rd with respect to the z axis is
q.
[0302] After reflection, ray Rr has electric field components
E.sub.rs=r.sub.sE.sub.is and E.sub.rp=r.sub.pE.sub.ip, where
r.sub.s and r.sub.p are the amplitude reflection components. These
components are illustrated as a function of angle in the graph in
FIG. 10B. Since r.sub.s and r.sub.p are equal only at q=0 (for a
ray along the z axis), the ratios E.sub.ix/E.sub.iy and
E.sub.rx/E.sub.ry are not equal, and the polarization of reflected
ray RR is rotated with respect to incident ray RI (the polarization
is the direction of the electric field vector, which is the vector
sum of the s- and p-components, as shown in the graph in FIG.
10C.
[0303] Reflected ray r.sub.r (FIG. 10A) strikes lens 168 at a
radius r. The lens refracts the reflected ray parallel to the z
axis. Refracted ray r.sub.r emerges parallel to the incident ray,
but with a changed polarization.
[0304] The reflection coefficients r.sub.s and r.sub.p are
functions of the angle of incidence and the index of refraction. A
change in the index of refraction causes a shift in both reflection
coefficients, as shown qualitatively by the dotted lines in the
graph in FIG. 10B. Consequently, any change in the index of
refraction causes a change in the polarization of the exiting ray
RP. An interferometer measures the polarization rotation resulting
from any change in the index of refraction of the silicon.
[0305] A profiler 1900 (FIG. 12) that uses polarization as
described above includes elements 1918, 1930, 1931, and 1932a and b
that together form an interferometer. Profiler 1900 operates in a
manner similar or identical to the above-described act of profiler
103 except for the following differences. 50:50 beam splitter 1913
diverts 50% of the reflected beam to the left, in the direction of
the detectors. Splitter 1913 also diverts 50% of the beam incident
from lasers 1901 and 1905 to the right to create the reference
beam. Phase plate 1930 is a retarder that is rotated to align the
polarization of the reference beam. Mirror 1931 reflects the
reference beam back toward the detector. The net retardation of the
reference beam is double the retardation from a single pass through
phase plate 1930. Both the reference beam and the reflected beam
pass through narrow band filter 1917 to remove the generation beam
radiation from laser 1905, allowing only radiation at the probe
beam wavelength from laser 1901 to reach the detector.
[0306] Polarizing beam splitter 1918 interferes the two beams.
Splitter 1918 is aligned with polarization axes at approximately
45.degree. to polarization axes of the reflected and reference
beams, so that components representing the sum and difference of
the reflected and reference beam electric fields are sent to
detectors 1932a and 1932b. The currents from detectors 1932a and
1932b, which are germanium photodiodes, are converted to voltages
using trans-impedance amplifiers. The voltages from the two
amplifiers are subtracted from one another to provide a signal that
is fed to the lock-in amplifier and detected with reference to the
modulation of the pump laser 1905.
[0307] Assume an incident electric field polarized along the x-axis
with amplitude 29 E 0 = P 1 w 2 ( 34 )
[0308] where P.sub.l is the probe laser power incident at the
objective lens and w is the beam radius. Through ray tracing, the
reflected beam vector emerging from lens 30 E r = E 0 ( E rx E 0 ,
E ry E 0 ) = E 0 ( r p cos 2 ( ) cos ( ) - r s sin 2 ( ) , sin ( )
cos ( ) ) ( r p cos ( ) + r s ) ( 35 )
[0309] where r.sub.s and r.sub.p are the amplitude reflection
coefficients for the s- and p-polarizations, and transmission loss
in the lens has been ignored. The amplitude reflection coefficients
are given by the relations 31 r s = sin ( - 1 ) sin ( + 1 ) and r s
= tan ( - 1 ) tan ( + 1 )
[0310] where q.sub.1 is related to the angle of incidence with
respect to the surface normal q by 32 sin ( ) sin ( 1 ) = 1 n s
[0311] where ns is the index of refraction of the silicon and the
incident medium is assumed to be air, with an index of refraction
of one.
[0312] The carrier concentration dependence of the polarization
rotation comes in through the amplitude reflection coefficients
r.sub.s and r.sub.p, which are both functions of the complex index
of refraction,
{overscore (n)}=n.sub.S+ik (36)
[0313] In semiconductors, the real part is given by 33 n = n so + n
= n so - q 2 N 2 o n so m * 2 = n so - 2 2 q 2 N 2 o n so m * c 2 (
37 )
[0314] where n.sub.so is the index of refraction in the absence of
carrier concentration N, q is the electron charge, e.sub.0 is the
dielectric constant of free space, m* is the effective mass of the
carriers, c is the speed of light, l the wavelength, and w is the
frequency of the probe light. Equation (37) is found using the
Drude theory, described in Jackson.
[0315] The imaginary part k relates to the absorption coefficient a
and the wavelength .lambda. as 34 k = ( ) 4 ( 38 )
[0316] In silicon, a has two main components, one due to
band-to-band absorption and a second due to free carriers,
.alpha.(.lambda.)=.alpha..sub.bb(.lambda.)+.alpha..sub.b(.lambda.)
(39)
[0317] .alpha..sub.bb may be looked up in common references. A fit,
valid over the wavelength range of 0.4 to 1.5 .mu.m, is
log.sub.10
(.alpha.(.lambda.))=9.519-19.826.lambda.+23.26.lambda..sup.2-10-
.857.lambda..sup.3 (40)
[0318] An approximate form of the free carrier absorption term in
silicon is 35 f = 4 N 10 17 ( 9 ) 2 ( 41 )
[0319] where the wavelength .lambda. is in units of microns and the
free carrier concentration N is in units of 1/cm.sup.3.
[0320] From equations (37) and (41), it is seen that both the real
and imaginary parts of the index of refraction are functions of the
carrier concentration. Note that the dependence becomes stronger at
longer wavelengths, and therefore use of a longer wavelength probe
beam is preferred.
[0321] The size of the probe beam spot cannot be made arbitrarily
large, however, since too large a spot may not fit into patterns in
integrated circuits. The diameter of the spot for a gaussian beam
is 36 2 w 0 = 1.22 NA ( 42 )
[0322] where the wavelength l is in units of microns and NA is the
numerical aperture of the lens. For a wavelength of 0.8 .mu.m and
NA of 0.9, the spot size is about 1 .mu.m.
[0323] The polarization rotation is measured by interfering the
reflected beam with the reference beam. The reference and reflected
beams propagate along the same axis to the polarizing beam splitter
1918, which sends sum and difference components to the two
detectors 1932a and 1932b. The field for the sum component is 37 E
+ = ( E rx + E ref 2 ) ( 43 )
[0324] and for the difference component is 38 E - = ( E ry - E ref
2 ) ( 44 )
[0325] The current in each detector is proportional to the incident
power, which is the squared magnitude of the electric field. At
each illuminated point on the surface of the photocell receiving
the sum component there is a power density 39 P + = E ref 2 2 + E
ref 2 ( E rx + E rx * ) + E rx 2 ( 45 )
[0326] and on the photocell receiving the difference component
there is a power density 40 P - = E ref 2 2 - E ref 2 ( E ry + E ry
* ) + E ry 2 . ( 46 )
[0327] The net signal current is found by integrating these power
densities over each photocell, multiplying by the conversion
efficiency A (usually in amps/watt), and subtracting from one
another. The result is 41 I netsig = A E ref 2 0 2 0 w ( E rx + E
rx * + E ry + E ry * ) r r ( 47 )
[0328] where the terms in E.sub.rx.sup.2 and E.sub.ry.sup.2 are
neglected as small. The signal current is the difference between
the net signal current and the signal current when the generation
beam power is zero, given by 42 I sig = A E ref 2 [ 0 2 0 w [ ( E
rx + E rx * + E ry + E ry * ) ] r r - 0 2 0 w [ ( E rx0 + E rx0 * +
E ry0 + E ry0 * ) ] r r ] ( 48 )
[0329] Shot noise is usually the largest contributor to noise,
given by 43 I shot = A 2 q B W A ( P 1 2 ) = q AP 1 BW ( 49 )
[0330] The factor of two arises because the reference beam is split
between the two photocells. The signal-to-noise ratio (SNR) is the
ratio I.sub.sig/I.sub.shot.
[0331] FIG. 13 illustrates the SNR in dB (10 dB per decade) as a
function of the log.sub.10 of the doping concentration. The NA is
0.9 and the probe laser power at the silicon and the reference beam
powers are both 1 mW. The beam radius is 0.35 cm and the
photodetector conversion efficiency is 0.4 A/W, for simplicity
assumed independent of wavelength. The noise bandwidth is 0.3 Hz.
The background doping concentration is 10.sup.15 for the 10.sup.16
doping point, and 10.sup.16 for the other points.
[0332] Graphs of SNR as a function of the log of dosage are shown
in FIG. 13 for four wavelengths (0.53 .mu.m for line 2004, 0.67
.mu.m for line 2003, 0.83 .mu.m for line 2002, and 1.48 .mu.m for
line 2001). The response to doping is linear, and the effect of
wavelength is small. Note that the SNR is in the range of 10-20 dB
for even the lowest doping, and is greater than 20 dB for doping
concentration in excess of 10.sup.17/cm.sup.3. The linear nature of
line 2001 indicates that the polarized beam measurement can be used
in each of the methods discussed above, e.g. in reference to FIGS.
5A-5H.
[0333] Numerous modifications and adaptations of the
above-described embodiments will become apparent to a person
skilled in the art of semiconductor physics. For example, although
computer 103C is described as being programmed with one or more
specific equations, computer 103C can be programmed with other
equations described herein, or with one or more equations that
approximate any of the relations between material properties as
described herein, for use with measurements performed by profiler
103 while creating a diffusive modulation of charge carriers in a
wafer under measurement. For example, an approximate equation used
by profiler 103 to measure a material property can be obtained by
curve-fitting to measurement data from reference wafers, or by
curve-fitting to data obtained from a numerical model, or both
depending on the specific implementation.
[0334] Therefore, numerous such modifications and adaptations of
the above-described embodiments are encompassed by the attached
claims.
* * * * *