Yang; Jang-Gyoo

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yang; Jang-Gyoo.The latest application filed is for "flow control features of cvd chambers".

Company Profile

7.39.51

Yang; Jang-Gyoo - San Jose CA
Yang; Jang Gyoo - Seongnam-si KR
Yang; Jang-Gyoo - Santa Clara CA
Yang; Jang Gyoo - Sunnyvale CA
Yang; Jang Gyoo - US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Batch curing chamber with gas distribution and individual pumping Grant 11,408,075 - Khan , et al. August 9, 2	2022-08-09
Chemical control features in wafer process equipment Grant 11,264,213 - Liang , et al. March 1, 2	2022-03-01
Flow Control Features Of Cvd Chambers App 20200149166 - CHUC; Kien N. ; et al.	2020-05-14
Flow control features of CVD chambers Grant 10,550,472 - Chuc , et al. Fe	2020-02-04
Chemical Control Features In Wafer Process Equipment App 20190385823 - Liang; Qiwei ; et al.	2019-12-19
Chemical control features in wafer process equipment Grant 10,354,843 - Liang , et al. July 16, 2	2019-07-16
Semiconductor processing system and methods using capacitively coupled plasma Grant 10,283,321 - Yang , et al.	2019-05-07
Batch Curing Chamber With Gas Distribution And Individual Pumping App 20190048470 - KHAN; Adib ; et al.	2019-02-14
Batch curing chamber with gas distribution and individual pumping Grant 10,113,236 - Khan , et al. October 30, 2	2018-10-30
Pedestal with multi-zone temperature control and multiple purge capabilities Grant 10,062,587 - Chen , et al. August 28, 2	2018-08-28
RPS assisted RF plasma source for semiconductor processing Grant 10,056,233 - Chen , et al. August 21, 2	2018-08-21
Semiconductor processing with DC assisted RF power for improved control Grant 10,032,606 - Yang , et al. July 24, 2	2018-07-24
Chemical control features in wafer process equipment Grant 9,978,564 - Liang , et al. May 22, 2	2018-05-22
Rps Assisted Rf Plasma Source For Semiconductor Processing App 20170301517 - CHEN; Xinglong ; et al.	2017-10-19
RPS assisted RF plasma source for semiconductor processing Grant 9,741,545 - Chen , et al. August 22, 2	2017-08-22
Chemical Control Features In Wafer Process Equipment App 20170236691 - Liang; Qiwei ; et al.	2017-08-17
Plasma System, Plasma Processing Method, And Plasma Etching Method App 20170186586 - Oh; Sejin ; et al.	2017-06-29
Rps Assisted Rf Plasma Source For Semiconductor Processing App 20170125220 - CHEN; Xinglong ; et al.	2017-05-04
RPS assisted RF plasma source for semiconductor processing Grant 9,502,218 - Chen , et al. November 22, 2	2016-11-22
Semiconductor Processing With Dc Assisted Rf Power For Improved Control App 20160300694 - Yang; Jang-Gyoo ; et al.	2016-10-13
Dry-etch selectivity Grant 9,384,997 - Ren , et al. July 5, 2	2016-07-05
Semiconductor processing with DC assisted RF power for improved control Grant 9,373,517 - Yang , et al. June 21, 2	2016-06-21
Pedestal With Multi-zone Temperature Control And Multiple Purge Capabilities App 20160126118 - Chen; Xinglong ; et al.	2016-05-05
Pedestal with multi-zone temperature control and multiple purge capabilities Grant 9,267,739 - Chen , et al. February 23, 2	2016-02-23
Electrostatic Chuck Assemblies Having Recessed Support Surfaces, Semiconductor Fabricating Apparatuses Having The Same, And Plasma Treatment Methods Using The Same App 20160035610 - Park; Myoung Soo ; et al.	2016-02-04
Chemical Control Features In Wafer Process Equipment App 20160005572 - Liang; Qiwei ; et al.	2016-01-07
Batch Curing Chamber With Gas Distribution And Individual Pumping App 20150329970 - KHAN; Adib ; et al.	2015-11-19
Semiconductor processing system and methods using capacitively coupled plasma Grant 9,144,147 - Yang , et al. September 22, 2	2015-09-22
Chemical control features in wafer process equipment Grant 9,132,436 - Liang , et al. September 15, 2	2015-09-15
Rps Assisted Rf Plasma Source For Semiconductor Processing App 20150221479 - CHEN; Xinglong ; et al.	2015-08-06
Dry-etch Selectivity App 20150132968 - Ren; He ; et al.	2015-05-14
Dry-etch selectivity Grant 8,969,212 - Ren , et al. March 3, 2	2015-03-03
Flow Control Features Of Cvd Chambers App 20150013793 - CHUC; Kien N. ; et al.	2015-01-15
Flow control features of CVD chambers Grant 8,894,767 - Chuc , et al. November 25, 2	2014-11-25
Plasma source design Grant 8,771,538 - Lubomirsky , et al. July 8, 2	2014-07-08
Plasma source design Grant 8,742,665 - Lubomirsky , et al. June 3, 2	2014-06-03
Dry-etch Selectivity App 20140141621 - Ren; He ; et al.	2014-05-22
Chemical Control Features In Wafer Process Equipment App 20140097270 - Liang; Qiwei ; et al.	2014-04-10
Semiconductor Processing With Dc Assisted Rf Power For Improved Control App 20140057447 - Yang; Jang-Gyoo ; et al.	2014-02-27
Pedestal With Multi-zone Temperature Control And Multiple Purge Capabilities App 20140021673 - Chen; Xinglong ; et al.	2014-01-23
Precursor Distribution Features For Improved Deposition Uniformity App 20130306758 - Park; Soonam ; et al.	2013-11-21
Semiconductor Processing System And Methods Using Capacitively Coupled Plasma App 20130153148 - Yang; Jang-Gyoo ; et al.	2013-06-20
Semiconductor Processing System And Methods Using Capacitively Coupled Plasma App 20130082197 - Yang; Jang-Gyoo ; et al.	2013-04-04
Flowable dielectric equipment and processes Grant 8,357,435 - Lubomirsky , et al. January 22, 2	2013-01-22
Dielectric film formation using inert gas excitation Grant 8,329,262 - Miller , et al. December 11, 2	2012-12-11
Apparatus for multiple frequency power application Grant 8,237,517 - Shannon , et al. August 7, 2	2012-08-07
Semiconductor Processing System And Methods Using Capacitively Coupled Plasma App 20120180954 - Yang; Jang-Gyoo ; et al.	2012-07-19
Apparatus For Multiple Frequency Power Application App 20110291771 - Shannon; Steven C. ; et al.	2011-12-01
Capacitively Coupled Plasma Reactor With Magnetic Plasma Control App 20110201134 - Hoffman; Daniel J. ; et al.	2011-08-18
Apparatus for multiple frequency power application Grant 7,994,872 - Shannon , et al. August 9, 2	2011-08-09
Remote plasma source seasoning Grant 7,989,365 - Park , et al. August 2, 2	2011-08-02
Dielectric Film Formation Using Inert Gas Excitation App 20110165347 - Miller; Matthew L. ; et al.	2011-07-07
High density plasma gapfill deposition-etch-deposition process etchant Grant 7,972,968 - Lee , et al. July 5, 2	2011-07-05
Capacitively coupled plasma reactor with magnetic plasma control Grant 7,955,986 - Hoffman , et al. June 7, 2	2011-06-07
Plasma Source Design App 20110114601 - LUBOMIRSKY; Dmitry ; et al.	2011-05-19
Plasma Source Design App 20110115378 - Lubomirsky; Dmitry ; et al.	2011-05-19
Remote Plasma Source Seasoning App 20110045676 - Park; Soonam ; et al.	2011-02-24
Flow Control Features Of Cvd Chambers App 20110011338 - Chuc; Kien N. ; et al.	2011-01-20
Plasma Source For Chamber Cleaning And Process App 20100098882 - Lubomirsky; Dmitry ; et al.	2010-04-22
High Density Plasma Gapfill Deposition-etch-deposition Process Using Fluorocarbon Etchant App 20100041207 - Lee; Young S. ; et al.	2010-02-18
Apparatus For Multiple Frequency Power Application App 20100013572 - SHANNON; STEVEN C. ; et al.	2010-01-21
Flowable Dielectric Equipment And Processes App 20090280650 - Lubomirsky; Dmitry ; et al.	2009-11-12
Flowable Dielectric Equipment And Processes App 20090277587 - Lubomirsky; Dmitry ; et al.	2009-11-12
Method of controlling plasma distribution uniformity by superposition of different constant solenoid fields App 20090250335 - Hoffman; Daniel J. ; et al.	2009-10-08
Method of controlling plasma distribution uniformity by time-weighted superposition of different solenoid fields App 20090250432 - Hoffman; Daniel J. ; et al.	2009-10-08
Hybrid Etch Chamber With Decoupled Plasma Controls App 20090004873 - Yang; Jang Gyoo ; et al.	2009-01-01
Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output Grant 7,375,947 - Yang , et al. May 20, 2	2008-05-20
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output Grant 7,359,177 - Yang , et al. April 15, 2	2008-04-15
Capacitively coupled plasma reactor with magnetic plasma control App 20080023143 - Hoffman; Daniel J. ; et al.	2008-01-31
Method Of Feedback Control Of Esc Voltage Using Wafer Voltage Measurement At The Bias Supply Output App 20070127188 - Yang; Jang Gyoo ; et al.	2007-06-07
Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface Grant 7,196,283 - Buchberger, Jr. , et al. March 27, 2	2007-03-27
Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent Grant 7,141,757 - Hoffman , et al. November 28, 2	2006-11-28
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output App 20060256499 - Yang; Jang Gyoo ; et al.	2006-11-16
Capacitively coupled plasma reactor with magnetic plasma control App 20060157201 - Hoffman; Daniel J. ; et al.	2006-07-20
Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface App 20050178748 - Buchberger, Douglas A. JR. ; et al.	2005-08-18
Capacitively coupled plasma reactor with uniform radial distribution of plasma Grant 6,900,596 - Yang , et al. May 31, 2	2005-05-31
Plasma chamber having multiple RF source frequencies App 20050106873 - Hoffman, Daniel J. ; et al.	2005-05-19
Capacitively coupled plasma reactor with magnetic plasma control Grant 6,853,141 - Hoffman , et al. February 8, 2	2005-02-08
Capacitively coupled plasma reactor with magnetic plasma control App 20050001556 - Hoffman, Daniel J. ; et al.	2005-01-06
Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent App 20040159287 - Hoffman, Daniel ; et al.	2004-08-19
Capacitively coupled plasma reactor with uniform radial distribution of plasma App 20040056602 - Yang, Jang Gyoo ; et al.	2004-03-25
Cathode pedestal for a plasma etch reactor App 20040040664 - Yang, Jang Gyoo ; et al.	2004-03-04
Capacitively coupled plasma reactor with magnetic plasma control App 20030218427 - Hoffman, Daniel J. ; et al.	2003-11-27

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