Patent | Date |
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Semiconductor processing chamber for multiple precursor flow Grant 11,361,939 - Samir , et al. June 14, 2 | 2022-06-14 |
Methods and apparatus for dynamical control of radial uniformity in microwave chambers Grant 11,355,317 - Kobayashi , et al. June 7, 2 | 2022-06-07 |
Multi-zone Semiconductor Substrate Supports App 20220148894 - Samir; Mehmet Tugrul ;   et al. | 2022-05-12 |
Cylindrical Cavity With Impedance Shifting By Irises In A Power-supplying Waveguide App 20220093364 - Kobayashi; Satoru ;   et al. | 2022-03-24 |
Multi-zone semiconductor substrate supports Grant 11,276,590 - Samir , et al. March 15, 2 | 2022-03-15 |
Semiconductor processing chamber for multiple precursor flow Grant 11,276,559 - Samir , et al. March 15, 2 | 2022-03-15 |
Chemical control features in wafer process equipment Grant 11,264,213 - Liang , et al. March 1, 2 | 2022-03-01 |
Substrate Processing Apparatus App 20210384012 - CHOI; Jinhyuk ;   et al. | 2021-12-09 |
Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same Grant 11,195,696 - Shin , et al. December 7, 2 | 2021-12-07 |
Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide Grant 11,195,699 - Kobayashi , et al. December 7, 2 | 2021-12-07 |
Process Chamber For Cyclic And Selective Material Removal And Etching App 20210217591 - TRAN; Toan Q. ;   et al. | 2021-07-15 |
High temperature RF heater pedestals Grant 11,062,887 - Park , et al. July 13, 2 | 2021-07-13 |
Semiconductor substrate supports with embedded RF shield Grant 11,049,755 - Benjaminson , et al. June 29, 2 | 2021-06-29 |
Ceramic Showerheads With Conductive Electrodes App 20210189564 - Kalita; Laksheswar ;   et al. | 2021-06-24 |
Substrate Processing Apparatus And Semiconductor Device Manufacturing Method Using The Same App 20210151300 - JUNG; Jieun ;   et al. | 2021-05-20 |
Process chamber for cyclic and selective material removal and etching Grant 11,004,661 - Tran , et al. May 11, 2 | 2021-05-11 |
Electron Beam Generator, Plasma Processing Apparatus Having The Same And Plasma Processing Method Using The Same App 20210110997 - SHIN; Dongkyu ;   et al. | 2021-04-15 |
Substrate Processing Apparatus App 20210074558 - NAM; Sang Ki ;   et al. | 2021-03-11 |
Plasma health determination in semiconductor substrate processing reactors Grant 10,920,320 - Kim , et al. February 16, 2 | 2021-02-16 |
Ceramic showerheads with conductive electrodes Grant 10,920,319 - Kalita , et al. February 16, 2 | 2021-02-16 |
Systems and methods for radial and azimuthal control of plasma uniformity Grant 10,903,052 - Kobayashi , et al. January 26, 2 | 2021-01-26 |
Systems and methods for internal surface conditioning assessment in plasma processing equipment Grant 10,796,922 - Park , et al. October 6, 2 | 2020-10-06 |
Ceramic Showerheads With Conductive Electrodes App 20200224313 - Kalita; Laksheswar ;   et al. | 2020-07-16 |
Systems and methods for internal surface conditioning in plasma processing equipment Grant 10,707,061 - Park , et al. | 2020-07-07 |
Corrosion Resistant Ground Shield Of Processing Chamber App 20200185203 - Lubomirsky; Dmitry ;   et al. | 2020-06-11 |
Flow Control Features Of Cvd Chambers App 20200149166 - CHUC; Kien N. ;   et al. | 2020-05-14 |
Systems And Methods For Improved Semiconductor Etching And Component Protection App 20200118845 - Tan; Tien Fak ;   et al. | 2020-04-16 |
Plasma Etching Systems And Methods With Secondary Plasma Injection App 20200111643 - Tran; Toan Q. ;   et al. | 2020-04-09 |
Systems And Processes For Plasma Tuning App 20200090907 - Kim; Junghoon ;   et al. | 2020-03-19 |
Semiconductor Substrate Supports With Embedded Rf Shield App 20200090972 - Benjaminson; David ;   et al. | 2020-03-19 |
High Temperature Rf Heater Pedestals App 20200090912 - Park; Soonam ;   et al. | 2020-03-19 |
Systems and methods for internal surface conditioning in plasma processing equipment Grant 10,593,523 - Park , et al. | 2020-03-17 |
Magnetic induction plasma source for semiconductor processes and equipment Grant 10,593,560 - Cho , et al. | 2020-03-17 |
Systems And Methods For Internal Surface Conditioning Assessment In Plasma Processing Equipment App 20200058516 - Park; Soonam ;   et al. | 2020-02-20 |
Ceramic ring test device Grant 10,551,328 - Kobayashi , et al. Fe | 2020-02-04 |
Flow control features of CVD chambers Grant 10,550,472 - Chuc , et al. Fe | 2020-02-04 |
Optical emission spectroscopic techniques for monitoring etching Grant 10,541,184 - Jung , et al. Ja | 2020-01-21 |
Systems and methods for improved semiconductor etching and component protection Grant 10,522,371 - Tan , et al. Dec | 2019-12-31 |
Chemical Control Features In Wafer Process Equipment App 20190385823 - Liang; Qiwei ;   et al. | 2019-12-19 |
Systems and methods for improved semiconductor etching and component protection Grant 10,504,754 - Tan , et al. Dec | 2019-12-10 |
Particle generation suppresor by DC bias modulation Grant 10,504,697 - Baek , et al. Dec | 2019-12-10 |
Plasma etching systems and methods with secondary plasma injection Grant 10,504,700 - Tran , et al. Dec | 2019-12-10 |
Systems And Methods For Radial And Azimuthal Control Of Plasma Uniformity App 20190362944 - Kobayashi; Satoru ;   et al. | 2019-11-28 |
Systems and methods for internal surface conditioning assessment in plasma processing equipment Grant 10,490,418 - Park , et al. Nov | 2019-11-26 |
High temperature chuck for plasma processing systems Grant 10,468,285 - Tran , et al. No | 2019-11-05 |
Rotatable substrate support having radio frequency applicator Grant 10,460,915 - Kobayashi , et al. Oc | 2019-10-29 |
Generalized Cylindrical Cavity System For Microwave Rotation And Impedance Shifting By Irises In A Power-supplying Waveguide App 20190326099 - Kobayashi; Satoru ;   et al. | 2019-10-24 |
Texturing And Plating Nickel On Aluminum Process Chamber Components App 20190323127 - Kalita; Laksheswar ;   et al. | 2019-10-24 |
Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion Grant 10,453,655 - Kobayashi , et al. Oc | 2019-10-22 |
Semiconductor Processing Chamber For Multiple Precursor Flow App 20190311883 - Samir; Mehmet Tugrul ;   et al. | 2019-10-10 |
Rf Tailored Voltage On Bias Operation App 20190311884 - KOBAYASHI; Satoru ;   et al. | 2019-10-10 |
Semiconductor Chamber Coatings And Processes App 20190304756 - Kalita; Laksheswar ;   et al. | 2019-10-03 |
Systems and methods for radial and azimuthal control of plasma uniformity Grant 10,431,429 - Kobayashi , et al. O | 2019-10-01 |
Magnetic Induction Plasma Source For Semiconductor Processes And Equipment App 20190272999 - Cho; Tae Seung ;   et al. | 2019-09-05 |
Optical Emission Spectroscopy (oes) For Remote Plasma Monitoring App 20190259580 - Cho; Tae Seung ;   et al. | 2019-08-22 |
Chemical control features in wafer process equipment Grant 10,354,843 - Liang , et al. July 16, 2 | 2019-07-16 |
Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide Grant 10,340,124 - Kobayashi , et al. | 2019-07-02 |
Methods And Apparatus For Dynamical Control Of Radial Uniformity In Microwave Chambers App 20190189399 - KOBAYASHI; SATORU ;   et al. | 2019-06-20 |
Optical emission spectroscopy (OES) for remote plasma monitoring Grant 10,319,649 - Cho , et al. | 2019-06-11 |
Systems And Processes For Plasma Filtering App 20190119815 - Park; Soonam ;   et al. | 2019-04-25 |
Plasma Reactor Having Digital Control Over Rotation Frequency Of A Microwave Field With Direct Up-conversion App 20190108981 - Kobayashi; Satoru ;   et al. | 2019-04-11 |
Optical Emission Spectroscopic Techniques For Monitoring Etching App 20190019734 - Jung; Soonwook ;   et al. | 2019-01-17 |
Plasma Health Determination In Semiconductor Substrate Processing Reactors App 20180366378 - Kim; Junghoon ;   et al. | 2018-12-20 |
Plasma Power Tool Matching Using Dc Voltage Feedback App 20180366300 - Jung; Soonwook ;   et al. | 2018-12-20 |
Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion Grant 10,153,133 - Kobayashi , et al. Dec | 2018-12-11 |
Multi-zone Semiconductor Substrate Supports App 20180337074 - Samir; Mehmet Tugrul ;   et al. | 2018-11-22 |
Semiconductor Processing Chamber For Improved Precursor Flow App 20180337024 - Tan; Tien Fak ;   et al. | 2018-11-22 |
Semiconductor Processing Chamber For Multiple Precursor Flow App 20180337057 - Samir; Mehmet Tugrul ;   et al. | 2018-11-22 |
Optical Emission Spectroscopy (oes) For Remote Plasma Monitoring App 20180294198 - Cho; Tae Seung ;   et al. | 2018-10-11 |
Systems And Methods For Internal Surface Conditioning Assessment In Plasma Processing Equipment App 20180240654 - Park; Soonam ;   et al. | 2018-08-23 |
Systems And Methods For Radial And Azimuthal Control Of Plasma Uniformity App 20180226230 - Kobayashi; Satoru ;   et al. | 2018-08-09 |
Semiconductor processing with DC assisted RF power for improved control Grant 10,032,606 - Yang , et al. July 24, 2 | 2018-07-24 |
Chemical control features in wafer process equipment Grant 9,978,564 - Liang , et al. May 22, 2 | 2018-05-22 |
Systems and methods for internal surface conditioning assessment in plasma processing equipment Grant 9,966,240 - Park , et al. May 8, 2 | 2018-05-08 |
Cobalt-containing material removal Grant 9,947,549 - Wang , et al. April 17, 2 | 2018-04-17 |
Cobalt-containing Material Removal App 20180102259 - Wang; Xikun ;   et al. | 2018-04-12 |
Adjustable remote dissociation Grant 9,922,840 - Park , et al. March 20, 2 | 2018-03-20 |
Ceramic Ring Test Device App 20180073994 - Kobayashi; Satoru ;   et al. | 2018-03-15 |
Particle generation suppresor by DC bias modulation Grant 9,892,888 - Baek , et al. February 13, 2 | 2018-02-13 |
Alkali Metal And Alkali Earth Metal Reduction App 20180025900 - Park; Soonam ;   et al. | 2018-01-25 |
In-situ spatially resolved plasma monitoring by using optical emission spectroscopy Grant 9,874,524 - Cho , et al. January 23, 2 | 2018-01-23 |
Ceramic ring test device Grant 9,846,130 - Kobayashi , et al. December 19, 2 | 2017-12-19 |
Radial waveguide systems and methods for post-match control of microwaves Grant 9,837,249 - Kobayashi , et al. December 5, 2 | 2017-12-05 |
Systems And Methods For Improved Semiconductor Etching And Component Protection App 20170338134 - Tan; Tien Fak ;   et al. | 2017-11-23 |
Systems And Methods For Improved Semiconductor Etching And Component Protection App 20170338133 - Tan; Tien Fak ;   et al. | 2017-11-23 |
High Temperature Chuck For Plasma Processing Systems App 20170309509 - Tran; Toan Q. ;   et al. | 2017-10-26 |
Dual discharge modes operation for remote plasma Grant 9,773,648 - Cho , et al. September 26, 2 | 2017-09-26 |
In-situ Spatially Resolved Plasma Monitoring By Using Optical Emission Spectroscopy App 20170254755 - CHO; Tae Seung ;   et al. | 2017-09-07 |
Rotatable Substrate Support Having Radio Frequency Applicator App 20170236693 - KOBAYASHI; Satoru ;   et al. | 2017-08-17 |
Particle Generation Suppresor By Dc Bias Modulation App 20170236689 - BAEK; Jonghoon ;   et al. | 2017-08-17 |
Chemical Control Features In Wafer Process Equipment App 20170236691 - Liang; Qiwei ;   et al. | 2017-08-17 |
Process Chamber For Dielectric Gapfill App 20170226637 - Lubomirsky; Dmitry ;   et al. | 2017-08-10 |
Systems And Methods For Internal Surface Conditioning In Plasma Processing Equipment App 20170229293 - Park; Soonam ;   et al. | 2017-08-10 |
Low Temperature Chuck For Plasma Processing Systems App 20170229326 - Tran; Toan Q. ;   et al. | 2017-08-10 |
High temperature chuck for plasma processing systems Grant 9,728,437 - Tran , et al. August 8, 2 | 2017-08-08 |
Selective etch for metal-containing materials Grant 9,711,366 - Ingle , et al. July 18, 2 | 2017-07-18 |
Particle Generation Suppresor By Dc Bias Modulation App 20170148611 - BAEK; Jonghoon ;   et al. | 2017-05-25 |
Grooved insulator to reduce leakage current Grant 9,659,753 - Cho , et al. May 23, 2 | 2017-05-23 |
Generalized Cylindrical Cavity System For Microwave Rotation And Impedance Shifting By Irises In A Power-supplying Waveguide App 20170125219 - Kobayashi; Satoru ;   et al. | 2017-05-04 |
Radial Waveguide Systems And Methods For Post-match Control Of Microwaves App 20170110290 - Kobayashi; Satoru ;   et al. | 2017-04-20 |
Particle generation suppressor by DC bias modulation Grant 9,593,421 - Baek , et al. March 14, 2 | 2017-03-14 |
Process Chamber For Cyclic And Selective Material Removal And Etching App 20170069466 - TRAN; Toan Q. ;   et al. | 2017-03-09 |
Plasma Etching Systems And Methods With Secondary Plasma Injection App 20170062184 - Tran; Toan Q. ;   et al. | 2017-03-02 |
Radial waveguide systems and methods for post-match control of microwaves Grant 9,564,296 - Kobayashi , et al. February 7, 2 | 2017-02-07 |
Adjustable Remote Dissociation App 20170011931 - Park; Soonam ;   et al. | 2017-01-12 |
Plasma-free metal etch Grant 9,472,417 - Ingle , et al. October 18, 2 | 2016-10-18 |
Semiconductor Processing With Dc Assisted Rf Power For Improved Control App 20160300694 - Yang; Jang-Gyoo ;   et al. | 2016-10-13 |
Plasma generation chamber with smooth plasma resistant coating Grant 9,460,898 - Kim , et al. October 4, 2 | 2016-10-04 |
Plasma Reactor Having Digital Control Over Rotation Frequency Of A Microwave Field With Direct Up-conversion App 20160284519 - Kobayashi; Satoru ;   et al. | 2016-09-29 |
Systems And Methods For Internal Surface Conditioning In Plasma Processing Equipment App 20160240402 - Park; Soonam ;   et al. | 2016-08-18 |
Low Temperature Chuck For Plasma Processing Systems App 20160225652 - Tran; Toan Q. ;   et al. | 2016-08-04 |
High Temperature Chuck For Plasma Processing Systems App 20160225651 - Tran; Toan Q. ;   et al. | 2016-08-04 |
Dry-etch selectivity Grant 9,384,997 - Ren , et al. July 5, 2 | 2016-07-05 |
Radial Waveguide Systems And Methods For Post-match Control Of Microwaves App 20160189933 - Kobayashi; Satoru ;   et al. | 2016-06-30 |
Semiconductor processing with DC assisted RF power for improved control Grant 9,373,517 - Yang , et al. June 21, 2 | 2016-06-21 |
Systems and methods for internal surface conditioning in plasma processing equipment Grant 9,355,922 - Park , et al. May 31, 2 | 2016-05-31 |
Selective Etch For Metal-containing Materials App 20160118268 - Ingle; Nitin K. ;   et al. | 2016-04-28 |
Systems And Methods For Internal Surface Conditioning In Plasma Processing Equipment App 20160104648 - Park; Soonam ;   et al. | 2016-04-14 |
Systems And Methods For Internal Surface Conditioning Assessment In Plasma Processing Equipment App 20160104606 - Park; Soonam ;   et al. | 2016-04-14 |
Selective etch for metal-containing materials Grant 9,299,582 - Ingle , et al. March 29, 2 | 2016-03-29 |
Radial waveguide systems and methods for post-match control of microwaves Grant 9,299,537 - Kobayashi , et al. March 29, 2 | 2016-03-29 |
Radial waveguide systems and methods for post-match control of microwaves Grant 9,299,538 - Kobayashi , et al. March 29, 2 | 2016-03-29 |
Grooved Insulator To Reduce Leakage Current App 20160042920 - CHO; TAE ;   et al. | 2016-02-11 |
Plasma Generation Chamber With Smooth Plasma Resistant Coating App 20160042924 - Kim; Sung Je ;   et al. | 2016-02-11 |
Chemical Control Features In Wafer Process Equipment App 20160005572 - Liang; Qiwei ;   et al. | 2016-01-07 |
Radial Waveguide Systems And Methods For Post-match Control Of Microwaves App 20150270105 - Kobayashi; Satoru ;   et al. | 2015-09-24 |
Radial Waveguide Systems And Methods For Post-match Control Of Microwaves App 20150270106 - Kobayashi; Satoru ;   et al. | 2015-09-24 |
Chemical control features in wafer process equipment Grant 9,132,436 - Liang , et al. September 15, 2 | 2015-09-15 |
Ceramic Ring Test Device App 20150241362 - Kobayashi; Satoru ;   et al. | 2015-08-27 |
Polarity control for remote plasma Grant 9,117,855 - Cho , et al. August 25, 2 | 2015-08-25 |
Polarity Control For Remote Plasma App 20150155189 - Cho; Tae Seung ;   et al. | 2015-06-04 |
Selective Etch For Metal-containing Materials App 20150129545 - Ingle; Nitin K. ;   et al. | 2015-05-14 |
Plasma-free Metal Etch App 20150129546 - Ingle; Nitin K. ;   et al. | 2015-05-14 |
Dry-etch Selectivity App 20150132968 - Ren; He ;   et al. | 2015-05-14 |
Particle Generation Suppresspr By Dc Bias Modulation App 20150123541 - BAEK; Jonghoon ;   et al. | 2015-05-07 |
Rotatable Substrate Support Having Radio Frequency Applicator App 20150083042 - KOBAYASHI; Satoru ;   et al. | 2015-03-26 |
Dual Discharge Modes Operation For Remote Plasma App 20150060265 - Cho; Tae Seung ;   et al. | 2015-03-05 |
Dry-etch selectivity Grant 8,969,212 - Ren , et al. March 3, 2 | 2015-03-03 |
Flow Control Features Of Cvd Chambers App 20150013793 - CHUC; Kien N. ;   et al. | 2015-01-15 |
Flow control features of CVD chambers Grant 8,894,767 - Chuc , et al. November 25, 2 | 2014-11-25 |
Dry-etch Selectivity App 20140141621 - Ren; He ;   et al. | 2014-05-22 |
Chemical Control Features In Wafer Process Equipment App 20140097270 - Liang; Qiwei ;   et al. | 2014-04-10 |
Process Chamber For Dielectric Gapfill App 20140083362 - LUBOMIRSKY; Dmitry ;   et al. | 2014-03-27 |
Semiconductor Processing With Dc Assisted Rf Power For Improved Control App 20140057447 - Yang; Jang-Gyoo ;   et al. | 2014-02-27 |
Precursor Distribution Features For Improved Deposition Uniformity App 20130306758 - Park; Soonam ;   et al. | 2013-11-21 |
Process Chamber For Dielectric Gapfill App 20120073501 - Lubomirsky; Dmitry ;   et al. | 2012-03-29 |
Remote plasma source seasoning Grant 7,989,365 - Park , et al. August 2, 2 | 2011-08-02 |
Remote Plasma Source Seasoning App 20110045676 - Park; Soonam ;   et al. | 2011-02-24 |
Flow Control Features Of Cvd Chambers App 20110011338 - Chuc; Kien N. ;   et al. | 2011-01-20 |
Gas baffle and distributor for semiconductor processing chamber Grant 7,799,704 - Park , et al. September 21, 2 | 2010-09-21 |
Gas baffle and distributor for semiconductor processing chamber Grant 7,740,706 - Park , et al. June 22, 2 | 2010-06-22 |
Gas Baffle and Distributor for Semiconductor Processing Chamber App 20090093129 - Park; Soonam ;   et al. | 2009-04-09 |
Gas Baffle And Distributor For Semiconductor Processing Chamber App 20080124944 - Park; Soonam ;   et al. | 2008-05-29 |
Gas Baffle And Distributor For Semiconductor Processing Chamber App 20080121179 - PARK; SOONAM ;   et al. | 2008-05-29 |
In-situ process state monitoring of chamber App 20080063810 - Park; Soonam ;   et al. | 2008-03-13 |
In-situ process diagnostics of in-film aluminum during plasma deposition App 20080029484 - Park; Soonam ;   et al. | 2008-02-07 |
Process Chamber For Dielectric Gapfill App 20070289534 - Lubomirsky; Dmitry ;   et al. | 2007-12-20 |
Process Chamber For Dielectric Gapfill App 20070277734 - Lubomirsky; Dmitry ;   et al. | 2007-12-06 |
Process Chamber For Dielectric Gapfill App 20070281106 - Lubomirsky; Dmitry ;   et al. | 2007-12-06 |