| Patent | Date |
|---|
Transistor comprising an air gap positioned adjacent a gate electrode
Grant 11,456,382 - Economikos , et al. September 27, 2 | 2022-09-27 |
Electrical fuse formation during a multiple patterning process
Grant 11,348,870 - Shu , et al. May 31, 2 | 2022-05-31 |
Large-scale axle intelligent cross wedge rolling mill for rail transit
App 20220136558 - Chu; Zhibing ; et al. | 2022-05-05 |
Miniature Step Motor With Shoeless Stator And Prewound Bobbins
App 20220069687 - Lin; Ted T. ; et al. | 2022-03-03 |
FinFET device comprising a single diffusion break with an upper surface that is substantially coplanar with an upper surface of a fin
Grant 11,121,023 - Shu , et al. September 14, 2 | 2021-09-14 |
Systems And Methods For Intelligent Application Instantiation
App 20210103447 - Wei; Daowen ; et al. | 2021-04-08 |
Multi-step insulator formation in trenches to avoid seams in insulators
Grant 10,964,599 - Sirman , et al. March 30, 2 | 2021-03-30 |
Device with large EPI in FinFETs and method of manufacturing
Grant 10,910,471 - Peng , et al. February 2, 2 | 2021-02-02 |
Device And Method For Forming Shaft Part By Two-roller Flexible Skew Rolling
App 20200346262 - WANG; Baoyu ; et al. | 2020-11-05 |
Electrical Fuse Formation During A Multiple Patterning Process
App 20200335435 - Shu; Jiehui ; et al. | 2020-10-22 |
Electrical fuse formation during a multiple patterning process
Grant 10,784,195 - Shu , et al. Sept | 2020-09-22 |
Method of forming semiconductor material in trenches having different widths, and related structures
Grant 10,714,376 - Chang , et al. | 2020-07-14 |
Method, apparatus and system for improved performance using tall fins in finFET devices
Grant 10,622,463 - Zang , et al. | 2020-04-14 |
Methods Of Forming Stress Liners Using Atomic Layer Deposition To Form Gapfill Seams
App 20200111704 - Kozarksy; Eric S. ; et al. | 2020-04-09 |
Method of manufacturing finfet devices using narrow and wide gate cut openings in conjunction with a replacement metal gate process
Grant 10,586,860 - Shu , et al. | 2020-03-10 |
Transistor Comprising An Air Gap Positioned Adjacent A Gate Electrode
App 20200066899 - Economikos; Laertis ; et al. | 2020-02-27 |
Multiple patterning with variable space mandrel cuts
Grant 10,566,195 - Shu , et al. Feb | 2020-02-18 |
Capping structure
Grant 10,559,470 - Huang , et al. Feb | 2020-02-11 |
Device With Large Epi In Finfets And Method Of Manufacturing
App 20200020769 - PENG; Jianwei ; et al. | 2020-01-16 |
Method for forming replacement air gap
Grant 10,535,771 - Economikos , et al. Ja | 2020-01-14 |
Isolated Deposition Zones For Atomic Layer Deposition
App 20200002813 - Shu; Jiehui ; et al. | 2020-01-02 |
Method Of Forming Semiconductor Material In Trenches Having Different Widths, And Related Structures
App 20190393077 - Chang; Chih-Chiang ; et al. | 2019-12-26 |
Method For Forming Replacement Air Gap
App 20190393335 - Economikos; Laertis ; et al. | 2019-12-26 |
Finfet Device Comprising A Single Diffusion Break With An Upper Surface That Is Substantially Coplanar With An Upper Surface Of
App 20190378751 - Shu; Jiehui ; et al. | 2019-12-12 |
Ic Product Comprising An Insulating Gate Separation Structure Positioned Between End Surfaces Of Adjacent Gate Structures
App 20190355832 - Shu; Jiehui ; et al. | 2019-11-21 |
Multi-step Insulator Formation In Trenches To Avoid Seams In Insulators
App 20190355624 - Sirman; Asli ; et al. | 2019-11-21 |
Methods, Apparatus, And System For A Semiconductor Device Comprising Gates With Short Heights
App 20190355615 - Shu; Jiehui ; et al. | 2019-11-21 |
Method for forming single diffusion breaks between finFET devices and the resulting devices
Grant 10,475,693 - Shu , et al. Nov | 2019-11-12 |
A Method Of Manufacturing Finfet Devices Using Narrow And Wide Gate Cut Openings In Conjuction With A Replacement Metal Gate Pro
App 20190341475 - Shu; Jiehui ; et al. | 2019-11-07 |
Electrical Fuse Formation During A Multiple Patterning Process
App 20190326209 - Shu; Jiehui ; et al. | 2019-10-24 |
Methods of forming replacement gate structures on transistor devices
Grant 10,453,936 - Shu , et al. Oc | 2019-10-22 |
Self-aligned Multiple Patterning Processes With Layered Mandrels
App 20190318931 - Shu; Jiehui ; et al. | 2019-10-17 |
Self-aligned multiple patterning processes with layered mandrels
Grant 10,446,395 - Shu , et al. Oc | 2019-10-15 |
Gate Skirt Oxidation For Improved Finfet Performance And Method For Producing The Same
App 20190305105 - GAO; Qun ; et al. | 2019-10-03 |
Multi-step Insulator Formation In Trenches To Avoid Seams In Insulators
App 20190304843 - Sirman; Asli ; et al. | 2019-10-03 |
Multi-step insulator formation in trenches to avoid seams in insulators
Grant 10,431,500 - Sirman , et al. O | 2019-10-01 |
Multiple-layer spacers for field-effect transistors
Grant 10,431,665 - Han , et al. O | 2019-10-01 |
Methods, apparatus, and system for a semiconductor device comprising gates with short heights
Grant 10,418,272 - Shu , et al. Sept | 2019-09-17 |
Field-effect Transistors With Fins Formed By A Damascene-like Process
App 20190273148 - Zhao; Wei ; et al. | 2019-09-05 |
Field-effect transistors with fins formed by a damascene-like process
Grant 10,403,742 - Zhao , et al. Sep | 2019-09-03 |
Capping Structure
App 20190228976 - HUANG; Haigou ; et al. | 2019-07-25 |
Method, Apparatus, And Server For Rendering A Cell Page, And Readable Storage Medium
App 20190228062 - Wu; Qinglin ; et al. | 2019-07-25 |
Gate oxide formation through hybrid methods of thermal and deposition processes and method for producing the same
Grant 10,361,289 - Zhao , et al. | 2019-07-23 |
Active gate contacts and method of fabrication thereof
Grant 10,347,541 - Shu , et al. July 9, 2 | 2019-07-09 |
Methods, apparatus and system for self-aligned metal hard masks
Grant 10,340,142 - Gao , et al. | 2019-07-02 |
Protected trench isolation for fin-type field-effect transistors
Grant 10,312,150 - Al-Amoody , et al. | 2019-06-04 |
Precision forming method of high-efficiency and near-net hollow valve blank of engine
Grant 10,279,440 - Liu , et al. | 2019-05-07 |
Methods Of Forming Replacement Gate Structures On Transistor Devices
App 20190131429 - Shu; Jiehui ; et al. | 2019-05-02 |
Methods for forming fins
Grant 10,276,374 - Shu , et al. | 2019-04-30 |
Common metal contact regions having different Schottky barrier heights and methods of manufacturing same
Grant 10,276,683 - Lee , et al. | 2019-04-30 |
Field-effect Transistors With Fins Formed By A Damascene-like Process
App 20190097019 - Zhao; Wei ; et al. | 2019-03-28 |
Methods For Forming Fins
App 20190088478 - Shu; Jiehui ; et al. | 2019-03-21 |
Multiple Patterning With Variable Space Mandrel Cuts
App 20190067010 - Shu; Jiehui ; et al. | 2019-02-28 |
Method, Apparatus And System For Improved Performance Using Tall Fins In Finfet Devices
App 20190043965 - Zang; Hui ; et al. | 2019-02-07 |
Variable space mandrel cut for self aligned double patterning
Grant 10,199,265 - Shu , et al. Fe | 2019-02-05 |
Self-aligned multiple patterning processes using bi-layer mandrels and cuts formed with block masks
Grant 10,192,780 - Wang , et al. Ja | 2019-01-29 |
Semiconductor devices with robust low-k sidewall spacers and method for producing the same
Grant 10,192,791 - Gu , et al. Ja | 2019-01-29 |
Process for variable fin pitch and critical dimension
Grant 10,192,786 - Zang , et al. Ja | 2019-01-29 |
Shallow Trench Isolation (sti) Gap Fill
App 20190027556 - Shu; Jiehui ; et al. | 2019-01-24 |
Semiconductor Structure
App 20180350607 - SHU; Jiehui ; et al. | 2018-12-06 |
Process For Variable Fin Pitch And Critical Dimension
App 20180330994 - ZANG; Hui ; et al. | 2018-11-15 |
Method, apparatus and system for improved performance using tall fins in finFET devices
Grant 10,115,807 - Zang , et al. October 30, 2 | 2018-10-30 |
Field Effect Transistors With Reduced Parasitic Resistances And Method
App 20180247936 - RAY; SHISHIR K. ; et al. | 2018-08-30 |
Field effect transistors with reduced parasitic resistances and method
Grant 10,062,692 - Ray , et al. August 28, 2 | 2018-08-28 |
Siloxane and organic-based MOL contact patterning
Grant 10,056,458 - Maeng , et al. August 21, 2 | 2018-08-21 |
Variable Space Mandrel Cut For Self Aligned Double Patterning
App 20180233404 - SHU; Jiehui ; et al. | 2018-08-16 |
Fabrication of multi threshold-voltage devices
Grant 10,020,202 - Kang , et al. July 10, 2 | 2018-07-10 |
Laminated spacers for field-effect transistors
Grant 10,008,456 - Han , et al. June 26, 2 | 2018-06-26 |
Sub-fin doping method
Grant 10,002,793 - Shu , et al. June 19, 2 | 2018-06-19 |
Contact etch stop layer with sacrificial polysilicon layer
Grant 9,991,363 - Huang , et al. June 5, 2 | 2018-06-05 |
Multiple-layer Spacers For Field-effect Transistors
App 20180151690 - Han; Tao ; et al. | 2018-05-31 |
Silicon liner for STI CMP stop in FinFET
Grant 9,984,933 - Xu , et al. May 29, 2 | 2018-05-29 |
Preparation method for revaprazan hydrochloride
Grant 9,981,917 - Liu , et al. May 29, 2 | 2018-05-29 |
Formation Of Band-edge Contacts
App 20180138177 - LEE; Tek Po Rinus ; et al. | 2018-05-17 |
FORMING DEFECT-FREE RELAXED SiGe FINS
App 20180130656 - Holt; Judson Robert ; et al. | 2018-05-10 |
Methods for nitride planarization using dielectric
Grant 9,966,272 - Sheng , et al. May 8, 2 | 2018-05-08 |
Notched Fin Structures And Methods Of Manufacture
App 20180108732 - Shu; Jiehui ; et al. | 2018-04-19 |
Precision Forming Method Of High-efficiency And Near-net Hollow Valve Blank Of Engine
App 20180104776 - LIU; JINPING ; et al. | 2018-04-19 |
Multiple-layer spacers for field-effect transistors
Grant 9,947,769 - Han , et al. April 17, 2 | 2018-04-17 |
Silicon nitride CESL removal without gate cap height loss and resulting device
Grant 9,905,472 - Shu , et al. February 27, 2 | 2018-02-27 |
Forming defect-free relaxed SiGe fins
Grant 9,882,052 - Holt , et al. January 30, 2 | 2018-01-30 |
Common Metal Contact Regions Having Different Schottky Barrier Heights And Methods Of Manufacturing Same
App 20180019313 - LEE; Tek Po Rinus ; et al. | 2018-01-18 |
Devices And Methods Of Forming Sadp On Sram And Saqp On Logic
App 20180012760 - SHU; Jiehui ; et al. | 2018-01-11 |
Forming Defect-free Relaxed Sige Fins
App 20180006155 - HOLT; Robert Judson ; et al. | 2018-01-04 |
Controlling Within-die Uniformity Using Doped Polishing Material
App 20170338226 - Huang; Haigou ; et al. | 2017-11-23 |
Apparatus And Method Of Adjusting Work-function Metal Thickness To Provide Variable Threshold Voltages In Finfets
App 20170338156 - ZANG; Hui ; et al. | 2017-11-23 |
Common metal contact regions having different Schottky barrier heights and methods of manufacturing same
Grant 9,812,543 - Lee , et al. November 7, 2 | 2017-11-07 |
Apparatus and method of adjusting work-function metal thickness to provide variable threshold voltages in finFETs
Grant 9,805,982 - Zang , et al. October 31, 2 | 2017-10-31 |
Fabrication Of Multi Threshold-voltage Devices
App 20170301551 - KANG; Donghun ; et al. | 2017-10-19 |
Advanced method for scaled SRAM with flexible active pitch
Grant 9,773,680 - Zang , et al. September 26, 2 | 2017-09-26 |
Preparation Method For Revaprazan Hydrochloride
App 20170267646 - Liu; Wenzheng ; et al. | 2017-09-21 |
Devices and methods of forming SADP on SRAM and SAQP on logic
Grant 9,761,452 - Shu , et al. September 12, 2 | 2017-09-12 |
Common Metal Contact Regions Having Different Schottky Barrier Heights And Methods Of Manufacturing Same
App 20170256624 - LEE; Tek Po Rinus ; et al. | 2017-09-07 |
Controlling within-die uniformity using doped polishing material
Grant 9,754,837 - Huang , et al. September 5, 2 | 2017-09-05 |
Self-aligned lithographic patterning with variable spacings
Grant 9,711,447 - Shu , et al. July 18, 2 | 2017-07-18 |
Siloxane And Organic-based Mol Contact Patterning
App 20170200792 - MAENG; Chang Ho ; et al. | 2017-07-13 |
Advanced self-aligned patterning process with sit spacer as a final dielectric etch hardmask
Grant 9,704,746 - Shu , et al. July 11, 2 | 2017-07-11 |
Introducing self-aligned dopants in semiconductor fins
Grant 9,698,018 - Dai , et al. July 4, 2 | 2017-07-04 |
Methods of forming spacers on FinFET devices
Grant 9,673,301 - Al-Amoody , et al. June 6, 2 | 2017-06-06 |
Method, Apparatus And System For Improved Performance Using Tall Fins In Finfet Devices
App 20170141214 - Zang; Hui ; et al. | 2017-05-18 |
Integrated circuits and methods for their fabrication
Grant 9,640,423 - Krishnan , et al. May 2, 2 | 2017-05-02 |
Methods of forming self-aligned contacts on FinFET devices
Grant 9,627,274 - Sheng , et al. April 18, 2 | 2017-04-18 |
Method of adjusting spacer thickness to provide variable threshold voltages in FinFETs
Grant 9,620,425 - Zang , et al. April 11, 2 | 2017-04-11 |
Method for eliminating interlayer dielectric dishing and controlling gate height uniformity
Grant 9,589,807 - Huang , et al. March 7, 2 | 2017-03-07 |
Methods of forming fins with different fin heights
Grant 9,577,066 - Al-Amoody , et al. February 21, 2 | 2017-02-21 |
Forming symmetrical stress liners for strained CMOS vertical nanowire field-effect transistors
Grant 9,570,552 - Lee , et al. February 14, 2 | 2017-02-14 |
Integrated Circuits And Methods For Their Fabrication
App 20170033178 - Krishnan; Bharat ; et al. | 2017-02-02 |
Method For Improved Fin Profile
App 20170033224 - LICAUSI; Nicholas Vincent ; et al. | 2017-02-02 |
Method for improved fin profile
Grant 9,553,194 - Licausi , et al. January 24, 2 | 2017-01-24 |
Wrap-around contact for finFET
Grant 9,478,622 - Yu , et al. October 25, 2 | 2016-10-25 |
10 nm alternative N/P doped fin for SSRW scheme
Grant 9,455,204 - Cao , et al. September 27, 2 | 2016-09-27 |
Gate structures for transistor devices for CMOS applications and products
Grant 9,362,283 - Hong , et al. June 7, 2 | 2016-06-07 |
Semiconductor device with diffusion barrier film and method of manufacturing the same
Grant 9,330,982 - Cao , et al. May 3, 2 | 2016-05-03 |
Integrated circuits having finFETs with improved doped channel regions and methods for fabricating same
Grant 9,287,180 - Liu , et al. March 15, 2 | 2016-03-15 |
Semiconductor device including graded gate stack, related method and design structure
Grant 9,257,519 - Chudzik , et al. February 9, 2 | 2016-02-09 |
Semiconductor Structure With Increased Space And Volume Between Shaped Epitaxial Structures
App 20160005657 - KRISHNAN; Bharat ; et al. | 2016-01-07 |
Method To Form Wrap-around Contact For Finfet
App 20150380502 - Yu; Hong ; et al. | 2015-12-31 |
Methods Of Forming Gate Structures For Transistor Devices For Cmos Applications And The Resulting Products
App 20150311206 - Hong; Zhendong ; et al. | 2015-10-29 |
Self-aligned Contact Openings Over Fins Of A Semiconductor Device
App 20150303295 - Wan; Jing ; et al. | 2015-10-22 |
Semiconductor structure with increased space and volume between shaped epitaxial structures
Grant 9,165,767 - Krishnan , et al. October 20, 2 | 2015-10-20 |
Integrated Circuits Having Finfets With Improved Doped Channel Regions And Methods For Fabricating Same
App 20150294915 - Liu; Jinping ; et al. | 2015-10-15 |
Method to form wrap-around contact for finFET
Grant 9,159,794 - Yu , et al. October 13, 2 | 2015-10-13 |
Forming Source/drain Regions With Single Reticle And Resulting Device
App 20150255353 - WAN; Jing ; et al. | 2015-09-10 |
Methods of forming gate structures for transistor devices for CMOS applications
Grant 9,105,497 - Hong , et al. August 11, 2 | 2015-08-11 |
Method of manufacturing scaled equivalent oxide thickness gate stacks in semiconductor devices and related design structure
Grant 9,099,461 - Chudzik , et al. August 4, 2 | 2015-08-04 |
Dopant Diffusion Barrier To Form Isolated Source/drains In A Semiconductor Device
App 20150214345 - Wan; Jing ; et al. | 2015-07-30 |
Methods Of Forming Epitaxial Semiconductor Material On Source/drain Regions Of A Finfet Semiconductor Device And The Resulting Devices
App 20150214369 - Fronheiser; Jody A. ; et al. | 2015-07-30 |
Integrated circuits having FinFETs with improved doped channel regions and methods for fabricating same
Grant 9,093,476 - Liu , et al. July 28, 2 | 2015-07-28 |
Method To Form Wrap-around Contact For Finfet
App 20150200260 - Yu; Hong ; et al. | 2015-07-16 |
Reducing gate expansion after source and drain implant in gate last process
Grant 9,059,218 - Krishnan , et al. June 16, 2 | 2015-06-16 |
Concurrently forming nFET and pFET gate dielectric layers
Grant 9,059,315 - Ando , et al. June 16, 2 | 2015-06-16 |
Method for forming fully relaxed silicon germanium on silicon
Grant 9,048,129 - Liu June 2, 2 | 2015-06-02 |
Composite high-k gate dielectric stack for reducing gate leakage
Grant 9,029,959 - Brodsky , et al. May 12, 2 | 2015-05-12 |
Increased Space Between Epitaxy On Adjacent Fins Of Finfet
App 20150123146 - KRISHNAN; Bharat ; et al. | 2015-05-07 |
Reducing Gate Expansion After Source And Drain Implant In Gate Last Process
App 20150076622 - Krishnan; Bharat ; et al. | 2015-03-19 |
Methods Of Forming Gate Structures For Transistor Devices For Cmos Applications And The Resulting Products
App 20150061027 - Hong; Zhendong ; et al. | 2015-03-05 |
Integrated Circuits Having Finfets With Improved Doped Channel Regions And Methods For Fabricating Same
App 20150035062 - LIU; Jinping ; et al. | 2015-02-05 |
Method and apparatus for adjusting threshold voltage in a replacement metal gate integration
Grant 8,912,085 - Lee , et al. December 16, 2 | 2014-12-16 |
Method of manufacturing semiconductor devices including replacement metal gate process incorporating a conductive dummy gate layer
Grant 8,835,292 - Chudzik , et al. September 16, 2 | 2014-09-16 |
Transistor with reduced parasitic capacitance
Grant 8,809,962 - Liu , et al. August 19, 2 | 2014-08-19 |
Concurrently Forming nFET and pFET Gate Dielectric Layers
App 20140187028 - Ando; Takashi ; et al. | 2014-07-03 |
Method And Structure For Transistor With Reduced Drain-induced Barrier Lowering And On Resistance
App 20140159052 - Liu; Jinping ; et al. | 2014-06-12 |
Method for fabricating a semiconductor device having an epitaxial channel and transistor having same
Grant 8,716,076 - Liu , et al. May 6, 2 | 2014-05-06 |
Method Of Manufacturing Semiconductor Devices Including Replacement Metal Gate Process Incorporating A Conductive Dummy Gate Layer
App 20140120708 - Chudzik; Michael P. ; et al. | 2014-05-01 |
Semiconductor Device Including Graded Gate Stack, Related Method And Design Structure
App 20140070334 - Chudzik; Michael P. ; et al. | 2014-03-13 |
Method for forming N-shaped bottom stress liner
Grant 8,669,616 - Yang , et al. March 11, 2 | 2014-03-11 |
Methods for fabricating a FINFET integrated circuit on a bulk silicon substrate
Grant 8,637,372 - Liu , et al. January 28, 2 | 2014-01-28 |
Method For Forming N-shaped Bottom Stress Liner
App 20140015020 - YANG; Xiaodong ; et al. | 2014-01-16 |
Composite High-k Gate Dielectric Stack For Reducing Gate Leakage
App 20140001570 - Brodsky; MaryJane ; et al. | 2014-01-02 |
Method Of Manufacturing Scaled Equivalent Oxide Thickness Gate Stacks In Semiconductor Devices And Related Design Structure
App 20130330843 - Chudzik; Michael P. ; et al. | 2013-12-12 |
Semiconductor Device Including Graded Gate Stack, Related Method And Design Structure
App 20130277765 - Chudzik; Michael P. ; et al. | 2013-10-24 |
Method for forming N-shaped bottom stress liner
Grant 8,557,668 - Yang , et al. October 15, 2 | 2013-10-15 |
Integrated circuit and method of fabrication thereof
Grant 8,546,873 - Liu , et al. October 1, 2 | 2013-10-01 |
Fabrication of silicon oxide and oxynitride having sub-nanometer thickness
Grant 8,492,290 - Chudzik , et al. July 23, 2 | 2013-07-23 |
Method For Forming N-shaped Bottom Stress Liner
App 20130181260 - Yang; Xiaodong ; et al. | 2013-07-18 |
Hybrid Nanostructure, A Method For Forming The Hybrid Nanostructure, And An Electrode Including A Plurality Of The Hybrid Nanostructures
App 20130115453 - Fan; Hongjin ; et al. | 2013-05-09 |
Methods for reducing loading effects during film formation
Grant 8,415,236 - Chew , et al. April 9, 2 | 2013-04-09 |
Method For Forming N-type And P-type Metal-oxide-semiconductor Gates Separately
App 20130082332 - Liu; Jinping ; et al. | 2013-04-04 |
Transistor With Reduced Parasitic Capacitance
App 20130049142 - Liu; Yanxiang ; et al. | 2013-02-28 |
Methods For Fabricating A Finfet Integrated Circuit On A Bulk Silicon Substrate
App 20130005103 - Liu; Yanxiang ; et al. | 2013-01-03 |
Fabrication Of Silicon Oxide And Oxynitride Having Sub-nanometer Thickness
App 20120329230 - Chudzik; Michael P. ; et al. | 2012-12-27 |
Method For Forming Fully Relaxed Silicon Germanium On Silicon
App 20120299155 - Liu; Jinping | 2012-11-29 |
Integrated Circuit And Method Of Fabrication Thereof
App 20120012940 - LIU; Jinping ; et al. | 2012-01-19 |
Low-power numerically controlled contactor and control system made of the contactors
Grant 8,093,969 - Liu , et al. January 10, 2 | 2012-01-10 |
Method For Fabricating A Semiconductor Device Having An Epitaxial Channel And Transistor Having Same
App 20110281410 - LIU; JINPING ; et al. | 2011-11-17 |
Integrated circuit and method of fabrication thereof
Grant 8,058,123 - Liu , et al. November 15, 2 | 2011-11-15 |
Method for fabricating a semiconductor device having an epitaxial channel and transistor having same
Grant 8,012,839 - Liu , et al. September 6, 2 | 2011-09-06 |
Method of fabricating a nitrogenated silicon oxide layer and MOS device having same
Grant 7,928,020 - Liu , et al. April 19, 2 | 2011-04-19 |
Methods For Reducing Loading Effects During Film Formation
App 20100167505 - CHEW; Han Guan ; et al. | 2010-07-01 |
High Stress Film
App 20100096695 - Chew; Han Guan ; et al. | 2010-04-22 |
Implantation for shallow trench isolation (STI) formation and for stress for transistor performance enhancement
App 20090315115 - Zhang; Beichao ; et al. | 2009-12-24 |
Method For Fabricating A Semiconductor Device Having An Epitaxial Channel And Transistor Having Same
App 20090218597 - Liu; Jinping ; et al. | 2009-09-03 |
Integrated Circuit And Method Of Fabrication Thereof
App 20090140292 - LIU; Jinping ; et al. | 2009-06-04 |
Method Of Fabricating A Nitrogenated Silicon Oxide Layer And Mos Device Having Same
App 20090088002 - Liu; Jinping ; et al. | 2009-04-02 |
Method For Fabricating A Semiconductor Structure Having Heterogeneous Crystalline Orientations
App 20090053864 - Liu; Jinping ; et al. | 2009-02-26 |
Pyrazolopyrimidinone Derivatives, Their Preparation And Their Use
App 20080318949 - Tian; Guanghui ; et al. | 2008-12-25 |
Low-Power Numerically Controlled Contactor and Control System Made of the Contactors
App 20080238594 - Liu; Jinping ; et al. | 2008-10-02 |
End of range (EOR) secondary defect engineering using chemical vapor deposition (CVD) substitutional carbon doping
Grant 7,400,018 - Tan , et al. July 15, 2 | 2008-07-15 |
Implantation-less approach to fabricating strained semiconductor on isolation wafers
Grant 7,338,886 - Liu , et al. March 4, 2 | 2008-03-04 |
Method of manufacturing a semiconductor device with a strained channel
Grant 7,238,581 - Chui , et al. July 3, 2 | 2007-07-03 |
Material Architecture For The Fabrication Of Low Temperature Transistor
App 20070117326 - Tan; Chung Foong ; et al. | 2007-05-24 |
Method of forming ultra thin silicon oxynitride for gate dielectric applications
Grant 7,202,164 - Liu , et al. April 10, 2 | 2007-04-10 |
Material architecture for the fabrication of low temperature transistor
Grant 7,169,675 - Tan , et al. January 30, 2 | 2007-01-30 |
End Of Range (eor) Secondary Defect Engineering Using Chemical Vapor Deposition (cvd) Substitutional Carbon Doping
App 20060270168 - Tan; Chung Foong ; et al. | 2006-11-30 |
Implantation-less approach to fabricating strained semiconductor on isolation wafers
App 20060234479 - Liu; Jinping ; et al. | 2006-10-19 |
End of range (EOR) secondary defect engineering using substitutional carbon doping
Grant 7,109,099 - Tan , et al. September 19, 2 | 2006-09-19 |
Method of forming ultra thin silicon oxynitride for gate dielectric applications
App 20060110865 - Liu; Jinping ; et al. | 2006-05-25 |
Method of manufacturing a semiconductor device with a strained channel
App 20060030094 - Chui; King Jien ; et al. | 2006-02-09 |
Material architecture for the fabrication of low temperature transistor
App 20060006427 - Tan; Chung Foong ; et al. | 2006-01-12 |
End of range (EOR) secondary defect engineering using substitutional carbon doping
App 20050085055 - Tan, Chung Foong ; et al. | 2005-04-21 |
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