Ingle; Nitin K.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Ingle; Nitin K..The latest application filed is for "low-k boron carbonitride films".
Company Profile
33.177.200
- Ingle; Nitin K. - San Jose CA
- Ingle; Nitin K. - Santa Clara CA
- - San Jose CA US
- Ingle; Nitin K. - Campbell CA
Patent Activity
| Patent | Date |
|---|---|
| Low-k Boron Carbonitride Films App 20220223409 - Shen; Zeqing ; et al. | 2022-07-14 |
| Low Temperature Graphene Growth App 20220216058 - Wang; Jialiang ; et al. | 2022-07-07 |
| Thermal deposition of doped silicon oxide Grant 11,355,354 - Shen , et al. June 7, 2 | 2022-06-07 |
| Multi Color Stack For Self Aligned Dual Pattern Formation For Multi Purpose Device Structures App 20220130722 - PARIKH; Suketu Arun ; et al. | 2022-04-28 |
| Airgap Formation Processes App 20220115263 - Pal; Ashish ; et al. | 2022-04-14 |
| Diffusion Barriers For Germanium App 20220068640 - Wang; Huiyuan ; et al. | 2022-03-03 |
| Airgap formation processes Grant 11,211,286 - Pal , et al. December 28, 2 | 2021-12-28 |
| 3d Pitch Multiplication App 20210351183 - Ingle; Nitin K. ; et al. | 2021-11-11 |
| Process window widening using coated parts in plasma etch processes Grant 11,101,136 - Yang , et al. August 24, 2 | 2021-08-24 |
| Hydrogen Free Silicon Dioxide App 20210254210 - Shen; Zeqing ; et al. | 2021-08-19 |
| 3-d Dram Structures And Methods Of Manufacture App 20210249415 - KANG; CHANG SEOK ; et al. | 2021-08-12 |
| Thermal silicon etch Grant 11,004,689 - Li , et al. May 11, 2 | 2021-05-11 |
| Selective nitride removal Grant 10,886,137 - Goradia , et al. January 5, 2 | 2021-01-05 |
| Systems and methods for internal surface conditioning assessment in plasma processing equipment Grant 10,796,922 - Park , et al. October 6, 2 | 2020-10-06 |
| Tantalum-containing material removal Grant 10,727,080 - Wang , et al. | 2020-07-28 |
| Systems and methods for internal surface conditioning in plasma processing equipment Grant 10,707,061 - Park , et al. | 2020-07-07 |
| Method for creating a fully self-aligned via Grant 10,699,953 - Mullick , et al. | 2020-06-30 |
| 3D NAND high aspect ratio structure etch Grant 10,692,880 - Cui , et al. | 2020-06-23 |
| Fully Self-aligned Via App 20200098633 - Zhang; Ying ; et al. | 2020-03-26 |
| Methods of producing self-aligned vias Grant 10,600,688 - Zhang , et al. | 2020-03-24 |
| Systems and methods for internal surface conditioning in plasma processing equipment Grant 10,593,523 - Park , et al. | 2020-03-17 |
| Methods of producing self-aligned grown via Grant 10,573,555 - Zhang , et al. Feb | 2020-02-25 |
| Systems And Methods For Internal Surface Conditioning Assessment In Plasma Processing Equipment App 20200058516 - Park; Soonam ; et al. | 2020-02-20 |
| Systems And Methods For Material Breakthrough App 20200043734 - Pandit; Mandar B. ; et al. | 2020-02-06 |
| Methods of producing fully self-aligned vias and contacts Grant 10,553,485 - Zhang , et al. Fe | 2020-02-04 |
| Fully self-aligned via Grant 10,522,404 - Zhang , et al. Dec | 2019-12-31 |
| Method For Creating A Fully Self-Aligned Via App 20190378756 - Mullick; Amrita B. ; et al. | 2019-12-12 |
| Systems and methods for internal surface conditioning assessment in plasma processing equipment Grant 10,490,418 - Park , et al. Nov | 2019-11-26 |
| Systems and methods for material breakthrough Grant 10,490,406 - Pandit , et al. Nov | 2019-11-26 |
| Fully Self-Aligned Via App 20190348323 - Zhang; Ying ; et al. | 2019-11-14 |
| Oxide and metal removal Grant 10,465,294 - Wang , et al. No | 2019-11-05 |
| Charge-trap layer separation and word-line isolation in a 3-D NAND structure Grant 10,468,259 - Purayath , et al. No | 2019-11-05 |
| Selective Nitride Removal App 20190333776 - Goradia; Prerna Sonthalia ; et al. | 2019-10-31 |
| Thermal Silicon Etch App 20190326123 - Li; Zihui ; et al. | 2019-10-24 |
| Systems And Methods For Material Breakthrough App 20190311900 - Pandit; Mandar B. ; et al. | 2019-10-10 |
| Fully self-aligned via Grant 10,424,507 - Zhang , et al. Sept | 2019-09-24 |
| Enhanced etching processes using remote plasma sources Grant 10,424,485 - Ingle , et al. Sept | 2019-09-24 |
| Fully self-aligned via Grant 10,410,921 - Zhang , et al. Sept | 2019-09-10 |
| Process Window Widening Using Coated Parts In Plasma Etch Processes App 20190272998 - Yang; Dongqing ; et al. | 2019-09-05 |
| Airgap Formation Processes App 20190252239 - Pal; Ashish ; et al. | 2019-08-15 |
| Non-halogen etching of silicon-containing materials Grant 10,354,889 - Choi , et al. July 16, 2 | 2019-07-16 |
| Fully Self-Aligned Via App 20190189512 - Zhang; Ying ; et al. | 2019-06-20 |
| Thermal silicon etch Grant 10,319,600 - Li , et al. | 2019-06-11 |
| Process window widening using coated parts in plasma etch processes Grant 10,297,458 - Yang , et al. | 2019-05-21 |
| Methods for selective etching of a silicon material Grant 10,249,507 - Li , et al. | 2019-04-02 |
| Methods of etching films with reduced surface roughness Grant 10,233,547 - Schmiege , et al. | 2019-03-19 |
| Methods Of Producing Self-Aligned Vias App 20190074219 - Zhang; Ying ; et al. | 2019-03-07 |
| Methods Of Producing Self-aligned Grown Via App 20190067103 - Zhang; Ying ; et al. | 2019-02-28 |
| Methods for selective etching of a silicon material using HF gas without nitrogen etchants Grant 10,204,796 - Ingle , et al. Feb | 2019-02-12 |
| Process Window Widening Using Coated Parts In Plasma Etch Processes App 20190043726 - Yang; Dongqing ; et al. | 2019-02-07 |
| Non-halogen Etching Of Silicon-containing Materials App 20190019690 - Choi; Tom ; et al. | 2019-01-17 |
| Tantalum-containing Material Removal App 20190013211 - Wang; Xikun ; et al. | 2019-01-10 |
| Methods for anisotropic control of selective silicon removal Grant 10,170,336 - Li , et al. J | 2019-01-01 |
| Methods Of Producing Fully Self-Aligned Vias And Contacts App 20180374750 - Zhang; Ying ; et al. | 2018-12-27 |
| Fully Self-Aligned Via App 20180286749 - Zhang; Ying ; et al. | 2018-10-04 |
| Charge-trap Layer Separation And Word-line Isolation In A 3-d Nand Structure App 20180254187 - PURAYATH; Vinod Robert ; et al. | 2018-09-06 |
| Methods for etch of metal and metal-oxide films Grant 10,062,578 - Zhang , et al. August 28, 2 | 2018-08-28 |
| Systems And Methods For Internal Surface Conditioning Assessment In Plasma Processing Equipment App 20180240654 - Park; Soonam ; et al. | 2018-08-23 |
| Hydrogen plasma based cleaning process for etch hardware Grant 10,026,597 - Rodrigo , et al. July 17, 2 | 2018-07-17 |
| Methods of Etching Films with Reduced Surface Roughness App 20180195179 - Schmiege; Benjamin ; et al. | 2018-07-12 |
| 3d Nand High Aspect Ratio Structure Etch App 20180182777 - CUI; Zhenjiang ; et al. | 2018-06-28 |
| Processing systems and methods for halide scavenging Grant 9,991,134 - Wang , et al. June 5, 2 | 2018-06-05 |
| Systems and methods for internal surface conditioning assessment in plasma processing equipment Grant 9,966,240 - Park , et al. May 8, 2 | 2018-05-08 |
| Charge-trap layer separation and word-line isolation for enhanced 3-D NAND structure Grant 9,960,045 - Purayath , et al. May 1, 2 | 2018-05-01 |
| Cobalt-containing material removal Grant 9,947,549 - Wang , et al. April 17, 2 | 2018-04-17 |
| Cobalt-containing Material Removal App 20180102259 - Wang; Xikun ; et al. | 2018-04-12 |
| Methods For Selective Etching Of A Silicon Material Using Hf Gas Without Nitrogen Etchants App 20180082849 - INGLE; Nitin K. ; et al. | 2018-03-22 |
| Methods of etching films with reduced surface roughness Grant 9,896,770 - Schmiege , et al. February 20, 2 | 2018-02-20 |
| Differential silicon oxide etch Grant 9,887,096 - Park , et al. February 6, 2 | 2018-02-06 |
| Self-aligned shielding of silicon oxide Grant 9,875,907 - Wang , et al. January 23, 2 | 2018-01-23 |
| Self-aligned shielding of silicon oxide Grant 9,859,128 - Wang , et al. January 2, 2 | 2018-01-02 |
| Oxide etch selectivity enhancement Grant 9,837,284 - Chen , et al. December 5, 2 | 2017-12-05 |
| Methods for selective etching of a silicon material using HF gas without nitrogen etchants Grant 9,831,097 - Ingle , et al. November 28, 2 | 2017-11-28 |
| Fluorine Reduction With Scope With Controlled Oxidation App 20170291199 - ZHONG; Xing ; et al. | 2017-10-12 |
| Integrated bit-line airgap formation and gate stack post clean Grant 9,773,695 - Purayath , et al. September 26, 2 | 2017-09-26 |
| Selective etch for silicon films Grant 9,754,800 - Zhang , et al. September 5, 2 | 2017-09-05 |
| Systems And Methods For Internal Surface Conditioning In Plasma Processing Equipment App 20170229293 - Park; Soonam ; et al. | 2017-08-10 |
| Methods For Selective Etching Of A Silicon Material App 20170229313 - LI; Zihui ; et al. | 2017-08-10 |
| Saving ion-damaged spacers Grant 9,721,789 - Yang , et al. August 1, 2 | 2017-08-01 |
| Selective etch for metal-containing materials Grant 9,711,366 - Ingle , et al. July 18, 2 | 2017-07-18 |
| Hydrogen Plasma Based Cleaning Process For Etch Hardware App 20170200590 - RODRIGO; Chirantha ; et al. | 2017-07-13 |
| Processing systems and methods for halide scavenging Grant 9,704,723 - Wang , et al. July 11, 2 | 2017-07-11 |
| Methods For Selective Etching Of A Silicon Material Using Hf Gas Without Nitrogen Etchants App 20170178915 - INGLE; Nitin K. ; et al. | 2017-06-22 |
| Oxide Etch Selectivity Enhancement App 20170178924 - Chen; Zhijun ; et al. | 2017-06-22 |
| Self-aligned Shielding Of Silicon Oxide App 20170148640 - Wang; Fei ; et al. | 2017-05-25 |
| Self-aligned Shielding Of Silicon Oxide App 20170148642 - Wang; Fei ; et al. | 2017-05-25 |
| Metal removal with reduced surface roughness Grant 9,659,791 - Wang , et al. May 23, 2 | 2017-05-23 |
| Processing systems and methods for halide scavenging Grant 9,659,792 - Wang , et al. May 23, 2 | 2017-05-23 |
| Methods for selective etching of a silicon material Grant 9,653,310 - Li , et al. May 16, 2 | 2017-05-16 |
| Methods For Selective Etching Of A Silicon Material App 20170133232 - LI; Zihui ; et al. | 2017-05-11 |
| High Aspect Ratio 3-d Flash Memory Device App 20170110475 - Liu; Jie ; et al. | 2017-04-20 |
| Methods Of Etching Films With Reduced Surface Roughness App 20170096740 - Schmiege; Benjamin ; et al. | 2017-04-06 |
| Oxide etch selectivity enhancement Grant 9,613,822 - Chen , et al. April 4, 2 | 2017-04-04 |
| Selective titanium nitride removal Grant 9,607,856 - Wang , et al. March 28, 2 | 2017-03-28 |
| Low temperature silicon nitride films using remote plasma CVD technology Grant 9,583,333 - Chatterjee , et al. February 28, 2 | 2017-02-28 |
| Etch suppression with germanium Grant 9,576,809 - Korolik , et al. February 21, 2 | 2017-02-21 |
| Gas-phase silicon nitride selective etch Grant 9,576,815 - Xu , et al. February 21, 2 | 2017-02-21 |
| Cleaning high aspect ratio vias Grant 9,576,788 - Liu , et al. February 21, 2 | 2017-02-21 |
| Integrated Bit-line Airgap Formation And Gate Stack Post Clean App 20170040207 - Purayath; Vinod R. ; et al. | 2017-02-09 |
| Gas-phase Silicon Oxide Selective Etch App 20170040180 - Xu; Jingjing ; et al. | 2017-02-09 |
| Gas-phase silicon oxide selective etch Grant 9,564,341 - Xu , et al. February 7, 2 | 2017-02-07 |
| Tungsten separation Grant 9,553,102 - Wang , et al. January 24, 2 | 2017-01-24 |
| Metal Removal With Reduced Surface Roughness App 20170018439 - Wang; Xikun ; et al. | 2017-01-19 |
| Methods of etching films with reduced surface roughness Grant 9,540,736 - Schmiege , et al. January 10, 2 | 2017-01-10 |
| Aluminum selective etch Grant 9,520,303 - Wang , et al. December 13, 2 | 2016-12-13 |
| Flowable carbon for semiconductor processing Grant 9,514,932 - Mallick , et al. December 6, 2 | 2016-12-06 |
| Anisotropic gap etch Grant 9,502,258 - Xue , et al. November 22, 2 | 2016-11-22 |
| Integrated bit-line airgap formation and gate stack post clean Grant 9,496,167 - Purayath , et al. November 15, 2 | 2016-11-15 |
| Cleaning High Aspect Ratio Vias App 20160314961 - Liu; Jie ; et al. | 2016-10-27 |
| Chlorine-based hardmask removal Grant 9,478,434 - Wang , et al. October 25, 2 | 2016-10-25 |
| Silicon oxide selective removal Grant 9,478,432 - Chen , et al. October 25, 2 | 2016-10-25 |
| Gas-phase Silicon Nitride Selective Etch App 20160307771 - Xu; Jingjing ; et al. | 2016-10-20 |
| Plasma-free metal etch Grant 9,472,417 - Ingle , et al. October 18, 2 | 2016-10-18 |
| Enhanced Etching Processes Using Remote Plasma Sources App 20160284556 - Ingle; Nitin K. ; et al. | 2016-09-29 |
| Selective titanium nitride etching Grant 9,449,845 - Liu , et al. September 20, 2 | 2016-09-20 |
| Selectively etching metals and metal nitrides conformally Grant 9,449,843 - Korolik , et al. September 20, 2 | 2016-09-20 |
| Vertical gate separation Grant 9,449,846 - Liu , et al. September 20, 2 | 2016-09-20 |
| Processing systems and methods for halide scavenging Grant 9,449,850 - Wang , et al. September 20, 2 | 2016-09-20 |
| Radical-component oxide etch Grant 9,437,451 - Chen , et al. September 6, 2 | 2016-09-06 |
| Systems And Methods For Internal Surface Conditioning In Plasma Processing Equipment App 20160240402 - Park; Soonam ; et al. | 2016-08-18 |
| Selective Etch For Silicon Films App 20160240389 - Zhang; Jingchun ; et al. | 2016-08-18 |
| Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor Grant 9,417,515 - Barman , et al. August 16, 2 | 2016-08-16 |
| Selective etch of silicon by way of metastable hydrogen termination Grant 9,418,858 - Wang , et al. August 16, 2 | 2016-08-16 |
| Dry-etch for selective tungsten removal Grant 9,412,608 - Wang , et al. August 9, 2 | 2016-08-09 |
| Oxide And Metal Removal App 20160222522 - Wang; Xikun ; et al. | 2016-08-04 |
| Highly selective doped oxide removal method Grant 9,406,523 - Chen , et al. August 2, 2 | 2016-08-02 |
| Surface treatment and deposition for reduced outgassing Grant 9,404,178 - Liang , et al. August 2, 2 | 2016-08-02 |
| Vertical Gate Separation App 20160218018 - Liu; Jie ; et al. | 2016-07-28 |
| Air gaps between copper lines Grant 9,396,989 - Purayath , et al. July 19, 2 | 2016-07-19 |
| Silicon-carbon-nitride selective etch Grant 9,390,937 - Chen , et al. July 12, 2 | 2016-07-12 |
| Wet oxidation process performed on a dielectric material formed from a flowable CVD process Grant 9,390,914 - Wang , et al. July 12, 2 | 2016-07-12 |
| Dry-etch selectivity Grant 9,384,997 - Ren , et al. July 5, 2 | 2016-07-05 |
| Integrated oxide recess and floating gate fin trimming Grant 9,378,978 - Purayath , et al. June 28, 2 | 2016-06-28 |
| Low temperature gas-phase carbon removal Grant 9,378,969 - Hsu , et al. June 28, 2 | 2016-06-28 |
| Anisotropic Gap Etch App 20160181112 - Xue; Jun ; et al. | 2016-06-23 |
| Titanium nitride removal Grant 9,373,522 - Wang , et al. June 21, 2 | 2016-06-21 |
| Enhanced etching processes using remote plasma sources Grant 9,362,130 - Ingle , et al. June 7, 2 | 2016-06-07 |
| V trench dry etch Grant 9,355,856 - Wang , et al. May 31, 2 | 2016-05-31 |
| Fluorine-based hardmask removal Grant 9,355,862 - Pandit , et al. May 31, 2 | 2016-05-31 |
| Systems and methods for internal surface conditioning in plasma processing equipment Grant 9,355,922 - Park , et al. May 31, 2 | 2016-05-31 |
| Non-local plasma oxide etch Grant 9,355,863 - Chen , et al. May 31, 2 | 2016-05-31 |
| Self-aligned process Grant 9,343,272 - Pandit , et al. May 17, 2 | 2016-05-17 |
| Flowable silicon--carbon--oxygen layers for semiconductor processing Grant 9,343,293 - Underwood , et al. May 17, 2 | 2016-05-17 |
| Selective Etch For Metal-containing Materials App 20160118268 - Ingle; Nitin K. ; et al. | 2016-04-28 |
| Selective etch for silicon films Grant 9,324,576 - Zhang , et al. April 26, 2 | 2016-04-26 |
| Systems And Methods For Internal Surface Conditioning Assessment In Plasma Processing Equipment App 20160104606 - Park; Soonam ; et al. | 2016-04-14 |
| Systems And Methods For Internal Surface Conditioning In Plasma Processing Equipment App 20160104648 - Park; Soonam ; et al. | 2016-04-14 |
| Oxide and metal removal Grant 9,309,598 - Wang , et al. April 12, 2 | 2016-04-12 |
| Oxide Etch Selectivity Enhancement App 20160093505 - Chen; Zhijun ; et al. | 2016-03-31 |
| Silicon Oxide Selective Removal App 20160093506 - Chen; Zhijun ; et al. | 2016-03-31 |
| Aluminum oxide selective etch Grant 9,299,583 - Wang , et al. March 29, 2 | 2016-03-29 |
| Selective etch for metal-containing materials Grant 9,299,582 - Ingle , et al. March 29, 2 | 2016-03-29 |
| Fluorine-based Hardmask Removal App 20160086815 - Pandit; Mandar ; et al. | 2016-03-24 |
| Chlorine-based Hardmask Removal App 20160086816 - Wang; Xikun ; et al. | 2016-03-24 |
| V Trench Dry Etch App 20160079072 - Wang; Xikun ; et al. | 2016-03-17 |
| Titanium oxide etch Grant 9,287,134 - Wang , et al. March 15, 2 | 2016-03-15 |
| Integrated Processing For Microcontamination Prevention App 20160068969 - Cui; Zhenjiang ; et al. | 2016-03-10 |
| Processing Systems And Methods For Halide Scavenging App 20160064233 - Wang; Anchuan ; et al. | 2016-03-03 |
| Selective titanium nitride etch Grant 9,275,834 - Park , et al. March 1, 2 | 2016-03-01 |
| Tungsten Separation App 20160056167 - Wang; Xikun ; et al. | 2016-02-25 |
| Dopant etch selectivity control Grant 9,263,278 - Purayath , et al. February 16, 2 | 2016-02-16 |
| Integrated Oxide And Si Etch For 3d Cell Channel Mobility Improvements App 20160042968 - Purayath; Vinod R. ; et al. | 2016-02-11 |
| Wordline 3d Flash Memory Air Gap App 20160043099 - Purayath; Vinod R. ; et al. | 2016-02-11 |
| Integrated Oxide Recess And Floating Gate Fin Trimming App 20160035586 - Purayath; Vinod R. ; et al. | 2016-02-04 |
| Integrated Bit-line Airgap Formation And Gate Stack Post Clean App 20160035614 - Purayath; Vinod R. ; et al. | 2016-02-04 |
| Methods Of Etching Films With Reduced Surface Roughness App 20160032460 - Schmiege; Benjamin ; et al. | 2016-02-04 |
| Processing Systems And Methods For Halide Scavenging App 20160027673 - Wang; Anchuan ; et al. | 2016-01-28 |
| Dry-etch for silicon-and-carbon-containing films Grant 9,236,266 - Zhang , et al. January 12, 2 | 2016-01-12 |
| Silicon germanium processing Grant 9,236,265 - Korolik , et al. January 12, 2 | 2016-01-12 |
| High Selectivity Gas Phase Silicon Nitride Removal App 20150371865 - Chen; Zhijun ; et al. | 2015-12-24 |
| Low Temperature Gas-phase Carbon Removal App 20150371864 - Hsu; Ching-Mei ; et al. | 2015-12-24 |
| Highly Selective Doped Oxide Removal Method App 20150371866 - Chen; Zhijun ; et al. | 2015-12-24 |
| Non-local Plasma Oxide Etch App 20150357201 - Chen; Zhijun ; et al. | 2015-12-10 |
| Selective Titanium Nitride Removal App 20150357205 - Wang; Xikun ; et al. | 2015-12-10 |
| Selective etch of silicon nitride Grant 9,209,012 - Chen , et al. December 8, 2 | 2015-12-08 |
| Metal Removal App 20150345029 - Wang; Xikun ; et al. | 2015-12-03 |
| Oxide And Metal Removal App 20150345028 - Wang; Xikun ; et al. | 2015-12-03 |
| Doped silicon oxide etch Grant 9,202,708 - Chen , et al. December 1, 2 | 2015-12-01 |
| Processing Systems And Methods For Halide Scavenging App 20150332930 - Wang; Anchuan ; et al. | 2015-11-19 |
| Even tungsten etch for high aspect ratio trenches Grant 9,190,293 - Wang , et al. November 17, 2 | 2015-11-17 |
| Processing systems and methods for halide scavenging Grant 9,184,055 - Wang , et al. November 10, 2 | 2015-11-10 |
| Methods For Etch Of Metal And Metal-oxide Films App 20150318186 - Zhang; Jingchun ; et al. | 2015-11-05 |
| Dry-etch For Selective Oxidation Removal App 20150311089 - Kim; Sang Hyuk ; et al. | 2015-10-29 |
| Integrated oxide and nitride recess for better channel contact in 3D architectures Grant 9,165,786 - Purayath , et al. October 20, 2 | 2015-10-20 |
| Metal air gap Grant 9,159,606 - Purayath , et al. October 13, 2 | 2015-10-13 |
| Processing systems and methods for halide scavenging Grant 9,153,442 - Wang , et al. October 6, 2 | 2015-10-06 |
| Flash Gate Air Gap App 20150270366 - Purayath; Vinod R. ; et al. | 2015-09-24 |
| Flash gate air gap Grant 9,136,273 - Purayath , et al. September 15, 2 | 2015-09-15 |
| Differential Silicon Oxide Etch App 20150249018 - Park; Seung H. ; et al. | 2015-09-03 |
| Processing Systems And Methods For Halide Scavenging App 20150235865 - Wang; Anchuan ; et al. | 2015-08-20 |
| Radical-component Oxide Etch App 20150235863 - Chen; Zhijun ; et al. | 2015-08-20 |
| Non-local plasma oxide etch Grant 9,111,877 - Chen , et al. August 18, 2 | 2015-08-18 |
| Air Gaps Between Copper Lines App 20150214092 - Purayath; Vinod R. ; et al. | 2015-07-30 |
| Conformal oxide dry etch Grant 9,093,390 - Wang , et al. July 28, 2 | 2015-07-28 |
| Processing systems and methods for halide scavenging Grant 9,093,371 - Wang , et al. July 28, 2 | 2015-07-28 |
| Titanium Oxide Etch App 20150206764 - WANG; Xikun ; et al. | 2015-07-23 |
| Dry-etch For Selective Tungsten Removal App 20150179464 - Wang; Xikun ; et al. | 2015-06-25 |
| Dry-etch for selective oxidation removal Grant 9,064,816 - Kim , et al. June 23, 2 | 2015-06-23 |
| Dopant Etch Selectivity Control App 20150170920 - Purayath; Vinod R. ; et al. | 2015-06-18 |
| Even Tungsten Etch For High Aspect Ratio Trenches App 20150170935 - Wang; Xikun ; et al. | 2015-06-18 |
| Selective titanium nitride removal Grant 9,040,422 - Wang , et al. May 26, 2 | 2015-05-26 |
| Differential silicon oxide etch Grant 9,034,770 - Park , et al. May 19, 2 | 2015-05-19 |
| Plasma-free Metal Etch App 20150129546 - Ingle; Nitin K. ; et al. | 2015-05-14 |
| Dry-etch Selectivity App 20150132968 - Ren; He ; et al. | 2015-05-14 |
| Selective Etch For Metal-containing Materials App 20150129545 - Ingle; Nitin K. ; et al. | 2015-05-14 |
| Aluminum Selective Etch App 20150129541 - Wang; Xikun ; et al. | 2015-05-14 |
| Silicon Germanium Processing App 20150126040 - Korolik; Mikhail ; et al. | 2015-05-07 |
| Etch Suppression With Germanium App 20150126039 - Korolik; Mikhail ; et al. | 2015-05-07 |
| Low Temperature Silicon Nitride Films Using Remote Plasma Cvd Technology App 20150126045 - CHATTERJEE; Amit ; et al. | 2015-05-07 |
| Processing systems and methods for halide scavenging Grant 9,023,732 - Wang , et al. May 5, 2 | 2015-05-05 |
| Radical-component oxide etch Grant 9,023,734 - Chen , et al. May 5, 2 | 2015-05-05 |
| Selective Titanium Nitride Etching App 20150118857 - Liu; Jie ; et al. | 2015-04-30 |
| Low shrinkage dielectric films Grant 9,018,108 - Hong , et al. April 28, 2 | 2015-04-28 |
| Selective Etch Of Silicon Nitride App 20150079797 - Chen; Zhijun ; et al. | 2015-03-19 |
| Dry-etch for selective tungsten removal Grant 8,980,763 - Wang , et al. March 17, 2 | 2015-03-17 |
| Dry-etch selectivity Grant 8,969,212 - Ren , et al. March 3, 2 | 2015-03-03 |
| Selective etch of silicon nitride Grant 8,956,980 - Chen , et al. February 17, 2 | 2015-02-17 |
| Tungsten oxide processing Grant 8,951,429 - Liu , et al. February 10, 2 | 2015-02-10 |
| Selective titanium nitride etching Grant 8,921,234 - Liu , et al. December 30, 2 | 2014-12-30 |
| Controlled air gap formation Grant 8,921,235 - Thadani , et al. December 30, 2 | 2014-12-30 |
| Selective titanium nitride etching Grant 08921234 - | 2014-12-30 |
| Low cost flowable dielectric films Grant 8,889,566 - Chatterjee , et al. November 18, 2 | 2014-11-18 |
| Low Temperature Flowable Curing For Stress Accommodation App 20140329027 - Liang; Jingmei ; et al. | 2014-11-06 |
| Flowable films using alternative silicon precursors Grant 8,871,656 - Mallick , et al. October 28, 2 | 2014-10-28 |
| Conformal Oxide Dry Etch App 20140308818 - Wang; Anchuan ; et al. | 2014-10-16 |
| Selective Etch Of Silicon By Way Of Metastable Hydrogen Termination App 20140308816 - Wang; Anchuan ; et al. | 2014-10-16 |
| Flowable Silicon-carbon-oxygen Layers For Semiconductor Processing App 20140302688 - Underwood; Brian Saxton ; et al. | 2014-10-09 |
| Chemical Linkers To Impart Improved Mechanical Strength To Flowable Films App 20140302690 - Underwood; Brian S. ; et al. | 2014-10-09 |
| Processing Systems And Methods For Halide Scavenging App 20140273406 - Wang; Anchuan ; et al. | 2014-09-18 |
| Processing Systems And Methods For Halide Scavenging App 20140271097 - WANG; Anchuan ; et al. | 2014-09-18 |
| Ultra-smooth Layer Ultraviolet Lithography Mirrors And Blanks, And Manufacturing And Lithography Systems Therefor App 20140268083 - Barman; Soumendra N. ; et al. | 2014-09-18 |
| Processing Systems And Methods For Halide Scavenging App 20140262038 - Wang; Anchuan ; et al. | 2014-09-18 |
| Dry-etch For Silicon-and-carbon-containing Films App 20140273491 - Zhang; Jingchun ; et al. | 2014-09-18 |
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| Selective etch of silicon by way of metastable hydrogen termination Grant 8,808,563 - Wang , et al. August 19, 2 | 2014-08-19 |
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| Low temperature silicon oxide conversion Grant 8,445,078 - Liang , et al. May 21, 2 | 2013-05-21 |
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| Conformal Layers By Radical-component Cvd App 20110217851 - Liang; Jingmei ; et al. | 2011-09-08 |
| Precursor addition to silicon oxide CVD for improved low temperature gapfill Grant 8,012,887 - Venkataraman , et al. September 6, 2 | 2011-09-06 |
| Post-planarization Densification App 20110212620 - Liang; Jingmei ; et al. | 2011-09-01 |
| Flowable Dielectric Using Oxide Liner App 20110165781 - Liang; Jingmei ; et al. | 2011-07-07 |
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| Methods of thin film process Grant 7,939,422 - Ingle , et al. May 10, 2 | 2011-05-10 |
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| Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen Grant 7,825,038 - Ingle , et al. November 2, 2 | 2010-11-02 |
| Precursor Addition To Silicon Oxide Cvd For Improved Low Temperature Gapfill App 20100159711 - Venkataraman; Shankar ; et al. | 2010-06-24 |
| Deposition methods for releasing stress buildup Grant 7,674,684 - Tang , et al. March 9, 2 | 2010-03-09 |
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| Multi-step anneal of thin films for film densification and improved gap-fill Grant 7,642,171 - Ingle , et al. January 5, 2 | 2010-01-05 |
| Method of inducing stresses in the channel region of a transistor Grant 7,528,051 - Arghavani , et al. May 5, 2 | 2009-05-05 |
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| Low Temperature Sacvd Processes For Pattern Loading Applications App 20080311754 - CHANDRASEKARAN; BALAJI ; et al. | 2008-12-18 |
| Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill Grant 7,459,405 - Ingle , et al. December 2, 2 | 2008-12-02 |
| Gap-fill depositions in the formation of silicon containing dielectric materials Grant 7,456,116 - Ingle , et al. November 25, 2 | 2008-11-25 |
| Limited thermal budget formation of PMD layers Grant 7,431,967 - Yuan , et al. October 7, 2 | 2008-10-07 |
| Methods Of Thin Film Process App 20080182382 - Ingle; Nitin K. ; et al. | 2008-07-31 |
| Gap-fill Depositions Introducing Hydroxyl-containing Precursors In The Formation Of Silicon Containing Dielectric Materials App 20080115726 - Ingle; Nitin K. ; et al. | 2008-05-22 |
| Gap-fill depositions introducing hydroxyl-containing precursors in the formation of silicon containing dielectric materials Grant 7,335,609 - Ingle , et al. February 26, 2 | 2008-02-26 |
| Chemical Vapor Deposition Of High Quality Flow-like Silicon Dioxide Using A Silicon Containing Precursor And Atomic Oxygen App 20070281496 - Ingle; Nitin K. ; et al. | 2007-12-06 |
| Multi-step Anneal Of Thin Films For Film Densification And Improved Gap-fill App 20070212847 - Ingle; Nitin K. ; et al. | 2007-09-13 |
| Gap-fill Depositions In The Formation Of Silicon Containing Dielectric Materials App 20070212850 - Ingle; Nitin K. ; et al. | 2007-09-13 |
| Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill Grant 7,208,425 - Ingle , et al. April 24, 2 | 2007-04-24 |
| Multi-step Anneal Of Thin Films For Film Densification And Improved Gap-fill App 20070000897 - Ingle; Nitin K. ; et al. | 2007-01-04 |
| Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill App 20060264062 - Ingle; Nitin K. ; et al. | 2006-11-23 |
| Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill App 20060148273 - Ingle; Nitin K. ; et al. | 2006-07-06 |
| Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill Grant 7,037,859 - Ingle , et al. May 2, 2 | 2006-05-02 |
| Gap-fill depositions introducing hydroxyl-containing precursors in the formation of silicon containing dielectric materials App 20060046427 - Ingle; Nitin K. ; et al. | 2006-03-02 |
| Multi-step anneal of thin films for film densification and improved gap-fill App 20060030165 - Ingle; Nitin K. ; et al. | 2006-02-09 |
| Method of inducing stresses in the channel region of a transistor App 20050255667 - Arghavani, Reza ; et al. | 2005-11-17 |
| Gap-fill depositions in the formation of silicon containing dielectric materials App 20050142895 - Ingle, Nitin K. ; et al. | 2005-06-30 |
| Gap-fill techniques App 20050136684 - Mukai, Kevin Mikio ; et al. | 2005-06-23 |
| Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill Grant 6,905,940 - Ingle , et al. June 14, 2 | 2005-06-14 |
| Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill App 20050064730 - Ingle, Nitin K. ; et al. | 2005-03-24 |
| Method and system for in-situ cleaning of semiconductor manufacturing equipment using combination chemistries Grant 6,544,345 - Mayer , et al. April 8, 2 | 2003-04-08 |
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