| Patent | Date |
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Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
Grant 11,453,943 - Fukazawa , et al. September 27, 2 | 2022-09-27 |
Methods for forming doped silicon oxide thin films
Grant 11,302,527 - Takamure , et al. April 12, 2 | 2022-04-12 |
Method And Apparatus For Filling A Gap
App 20210313167 - PORE; Viljami ; et al. | 2021-10-07 |
Method of topology-selective film formation of silicon oxide
Grant 11,127,589 - Zaitsu , et al. September 21, 2 | 2021-09-21 |
Si precursors for deposition of SiN at low temperatures
Grant 11,069,522 - Niskanen , et al. July 20, 2 | 2021-07-20 |
Method for manufacturing semiconductor device
Grant 11,056,345 - Fukazawa July 6, 2 | 2021-07-06 |
Method Of Depositing Carbon-containing Material On A Surface Of A Substrate, Structure Formed Using The Method, And System For Forming The Structure
App 20210151348 - Utsuno; Mitsuya ; et al. | 2021-05-20 |
Method Of Topology-selective Film Formation Of Silicon Oxide
App 20210118667 - Fukazawa; Atsuki ; et al. | 2021-04-22 |
Methods For Forming A Topographically Selective Silicon Oxide Film By A Cyclical Plasma-enhanced Deposition Process
App 20210104399 - Kuroda; Aurelie ; et al. | 2021-04-08 |
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
App 20210082684 - Niskanen; Antti J. ; et al. | 2021-03-18 |
Methods For Forming Doped Silicon Oxide Thin Films
App 20200388487 - Takamure; Noboru ; et al. | 2020-12-10 |
Method of forming conformal silicon carbide film by cyclic CVD
Grant 10,847,365 - Fukazawa , et al. November 24, 2 | 2020-11-24 |
Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition
App 20200365391 - Blanquart; Timothee Julien Vincent ; et al. | 2020-11-19 |
Methods For Forming A Boron Nitride Film By A Plasma Enhanced Atomic Layer Deposition Process
App 20200318237 - Fukazawa; Atsuki | 2020-10-08 |
Method For Forming Silicon Nitride Film Selectively On Top/bottom Portions
App 20200321209 - Ishikawa; Dai ; et al. | 2020-10-08 |
Methods for forming doped silicon oxide thin films
Grant 10,784,105 - Takamure , et al. Sept | 2020-09-22 |
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
Grant 10,755,922 - Blanquart , et al. A | 2020-08-25 |
Method Of Topology-selective Film Formation Of Silicon Oxide
App 20200251328 - Kind Code | 2020-08-06 |
Method for forming silicon nitride film selectively on top surface
Grant 10,720,322 - Ishikawa , et al. | 2020-07-21 |
Methods For Forming Doped Silicon Oxide Thin Films
App 20200185218 - Takamure; Noboru ; et al. | 2020-06-11 |
Method for depositing oxide film by thermal ALD and PEALD
Grant 10,655,221 - Fukazawa , et al. | 2020-05-19 |
Method Of Forming Conformal Silicon Carbide Film By Cyclic Cvd
App 20200118815 - Fukazawa; Atsuki ; et al. | 2020-04-16 |
Method For Depositing Oxide Film By Peald Using Nitrogen
App 20200111669 - Zaitsu; Masaru ; et al. | 2020-04-09 |
Method For Depositing Silicon-free Carbon-containing Film As Gap-fill Layer By Pulse Plasma-assisted Deposition
App 20200013612 - Blanquart; Timothee Julien Vincent ; et al. | 2020-01-09 |
Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
Grant 10,529,554 - Ishikawa , et al. January 7, 2 | 2020-01-07 |
Methods for forming doped silicon oxide thin films
Grant 10,510,530 - Takamure , et al. Dec | 2019-12-17 |
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
App 20190371594 - Niskanen; Antti J. ; et al. | 2019-12-05 |
Method for forming spacers using silicon nitride film for spacer-defined multiple patterning
Grant 10,468,251 - Ishikawa , et al. No | 2019-11-05 |
Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap
Grant 10,435,790 - Fukazawa , et al. O | 2019-10-08 |
Si precursors for deposition of SiN at low temperatures
Grant 10,395,917 - Niskanen , et al. A | 2019-08-27 |
Method and apparatus for filling a gap
Grant 10,395,919 - Masaru , et al. A | 2019-08-27 |
Chemical Precursors And Methods For Depositing A Silicon Oxide Film On A Substrate Utilizing Chemical Precursors
App 20190249303 - Kuroda; Aurelie ; et al. | 2019-08-15 |
Method For Manufacturing Semiconductor Device
App 20190189454 - Fukazawa; Atsuki | 2019-06-20 |
Methods For Forming Doped Silicon Oxide Thin Films
App 20190172708 - Takamure; Noboru ; et al. | 2019-06-06 |
Methods for manufacturing semiconductor devices
Grant 10,262,865 - Fukazawa , et al. | 2019-04-16 |
Method For Forming Silicon Nitride Film Selectively On Sidewalls Of Trenches
App 20190057857 - Ishikawa; Dai ; et al. | 2019-02-21 |
Formation of silicon-containing thin films
Grant 10,186,420 - Fukazawa Ja | 2019-01-22 |
Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition
Grant 10,179,947 - Fukazawa Ja | 2019-01-15 |
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
App 20180366314 - Niskanen; Antti J. ; et al. | 2018-12-20 |
Methods for forming doped silicon oxide thin films
Grant 10,147,600 - Takamure , et al. De | 2018-12-04 |
Methods For Manufacturing Semiconductor Devices
App 20180301342 - Fukazawa; Atsuki ; et al. | 2018-10-18 |
Method For Depositing Oxide Film By Thermal Ald And Peald
App 20180223429 - Fukazawa; Atsuki ; et al. | 2018-08-09 |
Methods For Forming Doped Silicon Oxide Thin Films
App 20180211834 - Takamure; Noboru ; et al. | 2018-07-26 |
Formation Of Silicon-containing Thin Films
App 20180151355 - Fukazawa; Atsuki | 2018-05-31 |
Method Of Subatmospheric Plasma-enhanced Ald Using Capacitively Coupled Electrodes With Narrow Gap
App 20180119283 - Fukazawa; Atsuki ; et al. | 2018-05-03 |
Si precursors for deposition of SiN at low temperatures
Grant 9,905,416 - Niskanen , et al. February 27, 2 | 2018-02-27 |
Method And Apparatus For Filling A Gap
App 20180033616 - Masaru; Zaitsu ; et al. | 2018-02-01 |
Methods for forming doped silicon oxide thin films
Grant 9,875,893 - Takamure , et al. January 23, 2 | 2018-01-23 |
Method For Forming Carbon-containing Silicon/metal Oxide Or Nitride Film By Ald Using Silicon Precursor And Hydrocarbon Precursor
App 20170342559 - Fukazawa; Atsuki ; et al. | 2017-11-30 |
Methods For Forming Doped Silicon Oxide Thin Films
App 20170338111 - Takamure; Noboru ; et al. | 2017-11-23 |
Substrate processing apparatus and method of processing substrate
Grant 9,818,601 - Tokunaga , et al. November 14, 2 | 2017-11-14 |
Method for forming film filled in trench without seam or void
Grant 9,812,319 - Fukazawa , et al. November 7, 2 | 2017-11-07 |
Method For Forming Spacers Using Silicon Nitride Film For Spacer-defined Multiple Patterning
App 20170316940 - Ishikawa; Dai ; et al. | 2017-11-02 |
Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches
Grant 9,754,779 - Ishikawa , et al. September 5, 2 | 2017-09-05 |
Method For Forming Silicon Nitride Film Selectively On Sidewalls Or Flat Surfaces Of Trenches
App 20170250068 - Ishikawa; Dai ; et al. | 2017-08-31 |
Method For Forming Silicon Nitride Film Selectively On Sidewalls Or Flat Surfaces Of Trenches
App 20170243734 - Ishikawa; Dai ; et al. | 2017-08-24 |
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
App 20170133216 - Niskanen; Antti J. ; et al. | 2017-05-11 |
Continuous process incorporating atomic layer etching
Grant 9,627,221 - Zaitsu , et al. April 18, 2 | 2017-04-18 |
Method For Forming Sin Or Sicn Film In Trenches By Peald
App 20170051405 - Fukazawa; Atsuki ; et al. | 2017-02-23 |
Si precursors for deposition of SiN at low temperatures
Grant 9,564,309 - Niskanen , et al. February 7, 2 | 2017-02-07 |
Methods for forming doped silicon oxide thin films
Grant 9,564,314 - Takamure , et al. February 7, 2 | 2017-02-07 |
Method for forming dielectric film in trenches by PEALD using H-containing gas
Grant 9,455,138 - Fukazawa , et al. September 27, 2 | 2016-09-27 |
Method Of Plasma-enhanced Atomic Layer Etching
App 20160211147 - Fukazawa; Atsuki | 2016-07-21 |
Method of plasma-enhanced atomic layer etching
Grant 9,396,956 - Fukazawa July 19, 2 | 2016-07-19 |
Methods For Forming Doped Silicon Oxide Thin Films
App 20160196970 - Takamure; Noboru ; et al. | 2016-07-07 |
Method For Depositing Metal-containing Film Using Particle-reduction Step
App 20160168699 - Fukazawa; Atsuki ; et al. | 2016-06-16 |
Methods for forming doped silicon oxide thin films
Grant 9,368,352 - Takamure , et al. June 14, 2 | 2016-06-14 |
Method for forming multi-element thin film constituted by at least five elements by PEALD
Grant 9,343,297 - Fukazawa , et al. May 17, 2 | 2016-05-17 |
Methods for forming doped silicon oxide thin films
Grant 9,153,441 - Takamure , et al. October 6, 2 | 2015-10-06 |
Method for cleaning reaction chamber using pre-cleaning process
Grant 9,142,393 - Okabe , et al. September 22, 2 | 2015-09-22 |
Methods For Forming Doped Silicon Oxide Thin Films
App 20150147875 - Takamure; Noboru ; et al. | 2015-05-28 |
Method for Forming Conformal Nitrided, Oxidized, or Carbonized Dielectric Film by Atomic Layer Deposition
App 20150147483 - Fukazawa; Atsuki | 2015-05-28 |
Method for forming conformal, homogeneous dielectric film by cyclic deposition and heat treatment
Grant 9,023,737 - Beynet , et al. May 5, 2 | 2015-05-05 |
Methods For Forming Doped Silicon Oxide Thin Films
App 20150017794 - Takamure; Noboru ; et al. | 2015-01-15 |
Method for forming Si-containing film using two precursors by ALD
Grant 8,912,101 - Tsuji , et al. December 16, 2 | 2014-12-16 |
Method For Cleaning Reaction Chamber Using Pre-cleaning Process
App 20140345644 - Okabe; Tatsuhiro ; et al. | 2014-11-27 |
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
App 20140273477 - Niskanen; Antti J. ; et al. | 2014-09-18 |
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
App 20140273531 - Niskanen; Antti J. ; et al. | 2014-09-18 |
Method for forming aluminum oxide film using Al compound containing alkyl group and alkoxy or alkylamine group
Grant 8,784,950 - Fukazawa , et al. July 22, 2 | 2014-07-22 |
Method for forming insulation film using non-halide precursor having four or more silicons
Grant 8,784,951 - Fukazawa , et al. July 22, 2 | 2014-07-22 |
Method for forming low-carbon CVD film for filling trenches
Grant 8,765,233 - Fukazawa , et al. July 1, 2 | 2014-07-01 |
Method for Forming Insulation Film Using Non-Halide Precursor Having Four or More Silicons
App 20140141625 - Fukazawa; Atsuki ; et al. | 2014-05-22 |
Method for forming silicon-containing dielectric film by cyclic deposition with side wall coverage control
Grant 8,722,546 - Fukazawa , et al. May 13, 2 | 2014-05-13 |
Methods for forming doped silicon oxide thin films
Grant 8,679,958 - Takamure , et al. March 25, 2 | 2014-03-25 |
Method of forming insulation film using plasma treatment cycles
Grant 8,647,722 - Kobayashi , et al. February 11, 2 | 2014-02-11 |
Method for Forming Conformal, Homogeneous Dielectric Film by Cyclic Deposition and Heat Treatment
App 20140017908 - Beynet; Julien ; et al. | 2014-01-16 |
Method for Forming Aluminum Oxide Film Using Al Compound Containing Alkyl Group and Alkoxy or Alkylamine Group
App 20140017414 - Fukazawa; Atsuki ; et al. | 2014-01-16 |
Method for Forming Silicon-Containing Dielectric Film by Cyclic Deposition with Side Wall Coverage Control
App 20130330933 - Fukazawa; Atsuki ; et al. | 2013-12-12 |
Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen
Grant 8,563,443 - Fukazawa October 22, 2 | 2013-10-22 |
Method for Forming Si-Containing Film Using Two Precursors by ALD
App 20130244446 - Tsuji; Naoto ; et al. | 2013-09-19 |
Method for Forming Dielectric Film Containing Si-C bonds by Atomic Layer Deposition Using Precursor Containing Si-C-Si bond
App 20130224964 - Fukazawa; Atsuki ; et al. | 2013-08-29 |
Methods For Forming Doped Silicon Oxide Thin Films
App 20130115763 - Takamure; Noboru ; et al. | 2013-05-09 |
Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen
Grant 8,329,599 - Fukazawa , et al. December 11, 2 | 2012-12-11 |
Method of Depositing Dielectric Film by ALD Using Precursor Containing Silicon, Hydrocarbon, and Halogen
App 20120295449 - Fukazawa; Atsuki | 2012-11-22 |
Method of Depositing Dielectric Film by ALD Using Precursor Containing Silicon, Hydrocarbon, and Halogen
App 20120214318 - Fukazawa; Atsuki ; et al. | 2012-08-23 |
Method for forming interconnect structure having airgap
Grant 8,241,991 - Hsieh , et al. August 14, 2 | 2012-08-14 |
Method for forming silicon carbide film containing oxygen
Grant 8,080,282 - Fukazawa , et al. December 20, 2 | 2011-12-20 |
Method For Forming Interconnect Structure Having Airgap
App 20110217838 - Hsieh; Julian J. ; et al. | 2011-09-08 |
Method for forming dielectric film using siloxane-silazane mixture
Grant 8,003,174 - Fukazawa , et al. August 23, 2 | 2011-08-23 |
Method of forming conformal dielectric film having Si-N bonds by PECVD
Grant 7,919,416 - Lee , et al. April 5, 2 | 2011-04-05 |
Method of forming highly conformal amorphous carbon layer
Grant 7,842,622 - Lee , et al. November 30, 2 | 2010-11-30 |
Method Of Forming Highly Conformal Amorphous Carbon Layer
App 20100291713 - Lee; Woo-Jin ; et al. | 2010-11-18 |
Method for depositing flowable material using alkoxysilane or aminosilane precursor
Grant 7,825,040 - Fukazawa , et al. November 2, 2 | 2010-11-02 |
Method for forming inorganic silazane-based dielectric film
Grant 7,781,352 - Fukazawa , et al. August 24, 2 | 2010-08-24 |
Method of Forming Conformal Dielectric Film Having Si-N Bonds by PECVD
App 20100184302 - LEE; Woo Jin ; et al. | 2010-07-22 |
Method For Forming Low-carbon Cvd Film For Filling Trenches
App 20100143609 - Fukazawa; Atsuki ; et al. | 2010-06-10 |
Method of Forming Insulation Film Using Plasma Treatment Cycles
App 20100124618 - Kobayashi; Akiko ; et al. | 2010-05-20 |
Method for forming insulation film having high density
Grant 7,718,553 - Fukazawa , et al. May 18, 2 | 2010-05-18 |
Method of forming silicon-containing insulation film having low dielectric constant and low film stress
Grant 7,655,577 - Hyodo , et al. February 2, 2 | 2010-02-02 |
Method for forming silazane-based dielectric film
Grant 7,651,959 - Fukazawa , et al. January 26, 2 | 2010-01-26 |
Device Isolation Technology On Semiconductor Substrate
App 20090298257 - Lee; Woo Jin ; et al. | 2009-12-03 |
Device isolation technology on semiconductor substrate
Grant 7,622,369 - Lee , et al. November 24, 2 | 2009-11-24 |
Method for forming insulation film
Grant 7,582,575 - Fukazawa , et al. September 1, 2 | 2009-09-01 |
Method of stabilizing film quality of low-dielectric constant film
Grant 7,560,144 - Fukazawa , et al. July 14, 2 | 2009-07-14 |
Method For Forming Dielectric Film Using Siloxane-silazane Mixture
App 20090156017 - FUKAZAWA; Atsuki ; et al. | 2009-06-18 |
Method For Forming Inorganic Silazane-based Dielectric Film
App 20080305648 - FUKAZAWA; Atsuki ; et al. | 2008-12-11 |
Plasma Cvd Apparatus Having Non-metal Susceptor
App 20080299326 - Fukazawa; Atsuki ; et al. | 2008-12-04 |
Method for forming insulation film
Grant 7,354,873 - Fukazawa , et al. April 8, 2 | 2008-04-08 |
Method for forming insulation film having high density
App 20080076266 - Fukazawa; Atsuki ; et al. | 2008-03-27 |
Method For Forming Silicon Carbide Film Containing Oxygen
App 20080038485 - FUKAZAWA; Atsuki ; et al. | 2008-02-14 |
Method of forming a thin film by plasma CVD of a silicon-containing source gas
Grant 7,229,935 - Fukazawa , et al. June 12, 2 | 2007-06-12 |
Method Of Forming Silicon-containing Insulation Film Having Low Dielectric Constant And Low Film Stress
App 20070111540 - HYODO; Yasuyoshi ; et al. | 2007-05-17 |
Method Of Forming Silicon-containing Insulation Film Having Low Dielectric Constant And Low Film Stress
App 20070066086 - HYODO; Yasuyoshi ; et al. | 2007-03-22 |
Method for depositing thin film by controlling effective distance between showerhead and susceptor
App 20070032048 - Tsuji; Naoto ; et al. | 2007-02-08 |
Insulation film and method for manufacturing same
App 20070009673 - Fukazawa; Atsuki ; et al. | 2007-01-11 |
Method For Forming Insulation Film
App 20070004204 - Fukazawa; Atsuki ; et al. | 2007-01-04 |
Method of producing advanced low dielectric constant film by UV light emission
App 20060286306 - Ohara; Naoki ; et al. | 2006-12-21 |
Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation
Grant 7,147,900 - Tsuji , et al. December 12, 2 | 2006-12-12 |
Method of forming silicon-containing insulation film having low dielectric constant and low film stress
Grant 7,148,154 - Hyodo , et al. December 12, 2 | 2006-12-12 |
Formation technology for nanoparticle films having low dielectric constant
App 20060269690 - Watanabe; Yukio ; et al. | 2006-11-30 |
Method for forming insulation film
App 20060258176 - Fukazawa; Atsuki ; et al. | 2006-11-16 |
Method of stabilizing film quality of low-dielectric constant film
App 20060216433 - Fukazawa; Atsuki ; et al. | 2006-09-28 |
Method for forming low-k hard film
Grant 7,064,088 - Hyodo , et al. June 20, 2 | 2006-06-20 |
Method for forming insulation film
App 20060110931 - Fukazawa; Atsuki ; et al. | 2006-05-25 |
Gas-shield electron-beam gun for thin-film curing application
Grant 7,012,268 - Matsuki , et al. March 14, 2 | 2006-03-14 |
Insulation film on semiconductor substrate and method for forming same
Grant 6,881,683 - Matsuki , et al. April 19, 2 | 2005-04-19 |
Method of forming thin film
App 20050048797 - Fukazawa, Atsuki ; et al. | 2005-03-03 |
Method of forming silicon-containing insulation film having low dielectric constant and low film stress
App 20050042884 - Hyodo, Yasuyoshi ; et al. | 2005-02-24 |
Method and apparatus for forming silicon-containing insulation film having low dielectric constant
App 20050034667 - Tsuji, Naoto ; et al. | 2005-02-17 |
Insulation film on semiconductor substrate and method for forming same
Grant 6,852,650 - Matsuki , et al. February 8, 2 | 2005-02-08 |
Gas-shield electron-beam gun for thin-film curing application
App 20040232355 - Matsuki, Nobuo ; et al. | 2004-11-25 |
Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength
Grant 6,818,570 - Tsuji , et al. November 16, 2 | 2004-11-16 |
Method for forming low dielectric constant interlayer insulation film
Grant 6,759,344 - Matsuki , et al. July 6, 2 | 2004-07-06 |
Method for forming low-k hard film
App 20040038514 - Hyodo, Yasuyoshi ; et al. | 2004-02-26 |
Plasma CVD apparatus comprising susceptor with ring
App 20030192478 - Tsuji, Naoto ; et al. | 2003-10-16 |
Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength
App 20030176030 - Tsuji, Naoto ; et al. | 2003-09-18 |
Insulation film on semiconductor substrate and method for forming same
App 20030162408 - Matsuki, Nobuo ; et al. | 2003-08-28 |
Method for forming low dielectric constant interlayer insulation film
App 20030143867 - Matsuki, Nobuo ; et al. | 2003-07-31 |
Insulation film on semiconductor substrate and method for forming same
App 20030119336 - Matsuki, Nobuo ; et al. | 2003-06-26 |
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