Ion shield plate base for semiconductor manufacturing apparatus

Description

FIG. 1 is a front, top and right side perspective view of an ion shield plate base for semiconductor manufacturing apparatus, showing our new design;

FIG. 2 is a rear, bottom and left side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 7;

FIG. 10 is an enlarged view of the portion shown in box, labeled, "FIG. 10," in FIG. 9; and,

FIG. 11 is an enlarged view of the portion shown in box, labeled, "FIG. 11," in FIG. 9.

The broken line boxes shown in FIG. 9 define the enlarged portion views shown in FIGS. 10 and 11 and form no part of the claimed design.

Claims

CLAIM The ornamental design for an ion shield plate base for semiconductor manufacturing apparatus, as shown and described.

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Inventors:	Kouzuma; Yutaka (Tokyo, JP), Hirozane; Kazuyuki (Tokyo, JP), Kobayashi; Michiaki (Tokyo, JP), Ogawa; Yoshifumi (Tokyo, JP)
Applicant:	Name City State Country Type Hitachi High-Tech Corporation Tokyo N/A JP
Assignee:	Hitachi High-Tech Corporation (Tokyo, JP)
Appl. No.:	D/677,728
Filed:	January 23, 2019

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Foreign Application Priority Data

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Jul 24, 2018 [JP]			2018-016189

Current U.S. Class:	D13/184; D26/138; D13/182
Current International Class:	1303
Field of Search:	;D13/182,184,199 ;D26/72,74,36 ;D9/435,445,454 ;D15/126,144.1 ;250/496.1,489,492.1,492.2,492.21,506.1,515.1,423R,424

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Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Crowell & Moring LLP