OGAWA; Yoshifumi
Patent Applications and Registrations
Patent applications and USPTO patent grants for OGAWA; Yoshifumi.The latest application filed is for "detecting method and detecting device of gas components and processing apparatus using detecting device of gas components".
- OGAWA; Yoshifumi - Tokyo JP
- Ogawa; Yoshifumi - Hikari JP
- Ogawa; Yoshifumi - Kudamatsu JP
- Ogawa, Yoshifumi - Kudamatsu-shi JP
- Ogawa; Yoshifumi - Kawasaki JP
- Ogawa; Yoshifumi - Ootawara JP
| Patent | Date |
|---|---|
| Detecting Method And Detecting Device Of Gas Components And Processing Apparatus Using Detecting Device Of Gas Components App 20210231571 - OGAWA; Yoshifumi ; et al. | 2021-07-29 |
| Ion shield plate base for semiconductor manufacturing apparatus Grant D924,824 - Kouzuma , et al. July 13, 2 | 2021-07-13 |
| Facility Device App 20190085544 - KUTSUZAWA; Hiroto ; et al. | 2019-03-21 |
| Vacuum processing apparatus Grant 10,121,686 - Ogawa , et al. November 6, 2 | 2018-11-06 |
| Vacuum Processing Apparatus App 20160379857 - OGAWA; Yoshifumi ; et al. | 2016-12-29 |
| Plasma processing apparatus and diagnosis method thereof Grant 9,273,394 - Nagatani , et al. March 1, 2 | 2016-03-01 |
| Vacuum processing apparatus and operating method of the same Grant 9,245,780 - Shimomura , et al. January 26, 2 | 2016-01-26 |
| Plasma Processing Apparatus And Diagnosis Method Thereof App 20140041804 - NAGATANI; Masahiro ; et al. | 2014-02-13 |
| Vacuum Processing Apparatus And Operating Method Of The Same App 20130142595 - SHIMOMURA; Takahiro ; et al. | 2013-06-06 |
| Method of holding substrate and substrate holding system Grant 6,899,789 - Tamura , et al. May 31, 2 | 2005-05-31 |
| Method of holding substrate and substrate holding system Grant 6,676,805 - Tamura , et al. January 13, 2 | 2004-01-13 |
| Method of holding substrate and substrate holding system Grant 6,645,871 - Tamura , et al. November 11, 2 | 2003-11-11 |
| Method of holding substrate and substrate holding system App 20030192647 - Tamura, Naoyuki ; et al. | 2003-10-16 |
| Method of holding substrate and substrate holding system Grant 6,610,170 - Tamura , et al. August 26, 2 | 2003-08-26 |
| Method of holding substrate and substrate holding system Grant 6,610,171 - Tamura , et al. August 26, 2 | 2003-08-26 |
| Method of holding substrate and substrate holding system Grant 6,524,428 - Tamura , et al. February 25, 2 | 2003-02-25 |
| Method of holding substrate and substrate holding system App 20020108574 - Tamura, Naoyuki ; et al. | 2002-08-15 |
| Method of holding substrate and substrate holding system App 20020104618 - Tamura, Naoyuki ; et al. | 2002-08-08 |
| Method of holding substrate and substrate holding system App 20020096116 - Tamura, Naoyuki ; et al. | 2002-07-25 |
| Method of holding substrate and substrate holding system App 20020046706 - Tamura, Naoyuki ; et al. | 2002-04-25 |
| Method of holding substrate and substrate holding system App 20010025608 - Tamura, Naoyuki ; et al. | 2001-10-04 |
| Method of holding substrate and substrate holding system App 20010009178 - Tamura, Naoyuki ; et al. | 2001-07-26 |
| Substrate holding system including an electrostatic chuck Grant 6,048,434 - Tamura , et al. April 11, 2 | 2000-04-11 |
| Method of holding substrate and substrate holding system Grant 5,906,684 - Tamura , et al. May 25, 1 | 1999-05-25 |
| Liquid crystal display device Grant 5,821,622 - Tsuji , et al. October 13, 1 | 1998-10-13 |
| Method of holding substrate and substrate holding system Grant 5,792,304 - Tamura , et al. August 11, 1 | 1998-08-11 |
| Electrode-wiring material and electrode-wiring substrate using the same Grant 5,738,948 - Ikeda , et al. April 14, 1 | 1998-04-14 |
| Vacuum processing system Grant 5,685,684 - Kato , et al. November 11, 1 | 1997-11-11 |
| Plasma generator with mode restricting means Grant 5,646,489 - Kakehi , et al. July 8, 1 | 1997-07-08 |
| Methods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwaves Grant 5,433,789 - Kakehi , et al. July 18, 1 | 1995-07-18 |
| Device having a multi-layered conductor structure Grant 5,296,653 - Kiyota , et al. March 22, 1 | 1994-03-22 |
| Automatic chemical analyzer Grant 5,212,094 - Ogawa May 18, 1 | 1993-05-18 |
| Plasma treating method and apparatus therefor Grant 4,664,767 - Kudo , et al. May 12, 1 | 1987-05-12 |
| Method and apparatus for monitoring etching Grant 4,609,426 - Ogawa , et al. September 2, 1 | 1986-09-02 |
| Microwave plasma etching apparatus Grant 4,559,100 - Ninomiya , et al. December 17, 1 | 1985-12-17 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 