Ion shield plate for semiconductor manufacturing apparatus

Description

FIG. 1 is a front, bottom and right side perspective view of an ion shield plate for semiconductor manufacturing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2.

Claims

CLAIM The ornamental design for an ion shield plate for semiconductor manufacturing apparatus, as shown and described.

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Inventors:	Kouzuma; Yutaka (Tokyo, JP), Kobayashi; Michiaki (Tokyo, JP), Hirozane; Kazuyuki (Tokyo, JP), Kawamura; Kohei (Tokyo, JP), Miyoshi; Nobuya (Tokyo, JP), Kobayashi; Hiroyuki (Tokyo, JP)
Applicant:	Name City State Country Type Hitachi High-Technologies Corporation Tokyo N/A JP
Assignee:	Hitachi High-Tech Corporation (Tokyo, JP)
Appl. No.:	D/677,753
Filed:	January 23, 2019

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Foreign Application Priority Data

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Jul 24, 2018 [JP]			2018-016190

Current U.S. Class:	D13/184; D15/126; D23/261; D26/138
Current International Class:	1303
Field of Search:	;D13/184 ;D26/1,24,74,72,36,59,118,133,134,261 ;D15/126

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References Cited [Referenced By]

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Other References

US. Appl. No. 29/677,728, filed Jan. 23, 2019. cited by applicant . U.S. Appl. No. 29/677,764, filed Jan. 23, 2019. cited by applicant . Notice of Allowance issued in related U.S. Appl. No. 29/677,764, dated Jun. 26, 2020. cited by applicant.

Primary Examiner: Hallmark; Janice
Assistant Examiner: Blackwell, II; Harold E
Attorney, Agent or Firm: Crowell & Moring LLP

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