Plasma chamber liner

Description

FIG. 1 is a top isometric view of a plasma chamber liner showing my new design;

FIG. 2 is a bottom isometric view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a side elevational view thereof;

FIG. 6 is an opposite side elevational view thereof; and,

FIG. 7 is a front elevational view thereof, a rear elevational view being identical.

Claims

CLAIM The ornamental design for a plasma chamber liner, as shown and described.

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Inventors:	Shono; Eric Kihara (San Mateo, CA)
Applicant:	Name City State Country Type Applied Materials, Inc. Santa Clara CA US
Assignee:	Applied Materials, Inc. (Santa Clara, CA)
Appl. No.:	D/602,211
Filed:	April 28, 2017

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Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/182 ;D7/550.1,587 ;D15/138 ;118/715,728,50,500,501,428,722,504,505,506,719,733,309,723R ;156/345.51,916

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References Cited [Referenced By]

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U.S. Patent Documents

5964947	October 1999	Zhao
6277237	August 2001	Schoepp
6374871	April 2002	Donohoe
7011039	March 2006	Mohn
D583838	December 2008	Schmitz
D658691	May 2012	Suzuki
D658692	May 2012	Suzuki
D658693	May 2012	Suzuki
D678228	March 2013	Suzuki
D699692	February 2014	Yousif
D716239	October 2014	Lau
D716240	October 2014	Lau
8858754	October 2014	Horiguchi
D717746	November 2014	Lau
8980005	March 2015	Carlson et al.
D802545	November 2017	Tauchi
D804436	December 2017	Tauchi
D812578	March 2018	Uemura
2014/0116366	May 2014	Harman
2014/0322897	October 2014	Samir et al.

Other References

Taiwan Search Report for Application No. 106306300 dated May 7, 2018. cited by applicant . Japanese Office Action for Application No. JP 2017-024106 dated Apr. 10, 2018. cited by applicant . Japanese Office Action for Application No. JP 2017-024107 dated Apr. 10, 2018. cited by applicant.

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Patterson + Sheridan, LLP

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