Polishing pad for substrate polishing apparatus

Description

FIG. 1 is a top plan view of a first embodiment of a polishing pad for substrate polishing apparatus, showing our new design;

FIG. 2 is a bottom plan view thereof;

FIG. 3 is a front view thereof, the rear view being identical;

FIG. 4 is a right side view thereof, the left side view being identical;

FIG. 5 is an enlarged, top plan view thereof, taken along lines 5-5 of FIG. 1;

FIG. 6 is an enlarged, cross-sectional view thereof, taken along lines 6-6 of FIG. 5;

FIG. 7 is a top plan view of a second embodiment of a polishing pad for substrate polishing apparatus, showing our new design;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a front view thereof, the rear view being identical;

FIG. 10 is a right side view thereof, the left view being identical;

FIG. 11 is an enlarged, partial top plan view thereof, taken along lines 11-11 of FIG. 7; and,

FIG. 12 is an enlarged, cross-sectional view thereof, taken along lines 12-12 of FIG. 11.

The dashed-dot-dashed lines represent the boundary lines of the claimed design. The even dashed broken lines depict environment subject matter only and form no part of the claimed design.

Claims

CLAIM The ornamental design for a polishing pad for substrate polishing apparatus, as shown and described.

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Inventors:	Kinoshita; Masaki (Tokyo, JP), Kimba; Toshifumi (Tokyo, JP)
Applicant:	Name City State Country Type EBARA CORPORATION Tokyo N/A JP
Assignee:	EBARA CORPORATION (Tokyo, JP)
Appl. No.:	D/489,180
Filed:	April 28, 2014

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Foreign Application Priority Data

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Oct 29, 2013 [JP]			2013-025148
Oct 29, 2013 [JP]			2013-025149

Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/182 ;257/E21.001,E21.002,E21.21,E21.23 ;361/230,233,234 ;451/64,65,66,67,72,259,278,285,286,287,288,290

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References Cited [Referenced By]

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U.S. Patent Documents

5284659	February 1994	Cherukuri et al.
5431918	July 1995	Ferrero et al.
7109068	September 2006	Akram et al.
D560810	January 2008	Hennessy
7572173	August 2009	Huang et al.
7799618	September 2010	Kawase et al.
D649126	November 2011	Takahashi
D684551	June 2013	Nguyen
D702655	April 2014	Kimura
2002/0160693	October 2002	Nihonmatsu et al.
2005/0095963	May 2005	Stark et al.
2006/0079160	April 2006	Balagani et al.
2012/0164917	June 2012	Kobata et al.

Foreign Patent Documents

	1334824		May 2008		JP
	1396602		May 2013		TW

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Pearne & Gordon LLP