Wafer polishing pad holder

Nguyen June 18, 2

Patent Grant D684551

U.S. patent number D684,551 [Application Number D/396,846] was granted by the patent office on 2013-06-18 for wafer polishing pad holder. The grantee listed for this patent is Phuong Van Nguyen. Invention is credited to Phuong Van Nguyen.


United States Patent D684,551
Nguyen June 18, 2013

Wafer polishing pad holder

Claims

CLAIM The ornamental design for a wafer polishing pad holder, as shown and described.
Inventors: Nguyen; Phuong Van (San Jose, CA)
Applicant:
Name City State Country Type

Nguyen; Phuong Van

San Jose

CA

US
Appl. No.: D/396,846
Filed: July 7, 2011

Current U.S. Class: D13/182
Current International Class: 1303
Field of Search: ;D13/182 ;257/E21,21,E21.23 ;361/234 ;451/72,285,286,287,288

References Cited [Referenced By]

U.S. Patent Documents
2740237 April 1956 Day et al.
4081928 April 1978 Kinnebrew et al.
4165584 August 1979 Scherrer
4512113 April 1985 Budinger
4780991 November 1988 Gosis
5193316 March 1993 Olmstead
5533924 July 1996 Stroupe et al.
5597346 January 1997 Hempel, Jr.
5647789 July 1997 Kitta et al.
5788560 August 1998 Hashimoto et al.
6402594 June 2002 Kobayashi et al.
6425809 July 2002 Ichimura
6612905 September 2003 Nguyen
6645049 November 2003 Nguyen
6699104 March 2004 Baker et al.
6722949 April 2004 Hu et al.
6887138 May 2005 Bottema et al.
7462094 December 2008 Yoshida et al.
7534162 May 2009 Bottema et al.
7572173 August 2009 Huang et al.
7632170 December 2009 O'Moore et al.
D609652 February 2010 Nagasaka et al.
7731567 June 2010 Sekiya et al.
D633452 March 2011 Namiki et al.
2002/0160693 October 2002 Nihonmatsu et al.
2004/0053566 March 2004 Tolles et al.
2005/0041234 February 2005 Krikhaar et al.
2005/0095963 May 2005 Stark et al.
2005/0170616 August 2005 Murata et al.
2006/0079160 April 2006 Balagani et al.
Foreign Patent Documents
2005033139 Feb 2005 JP
2010105144 May 2010 JP
100928450 Nov 2009 KR
Primary Examiner: Sikder; Selina
Attorney, Agent or Firm: Kroll; Michael I.

Description



FIG. 1 is a top perspective view of the wafer polishing pad holder showing my new design;

FIG. 2 is a top view of the wafer polishing pad holder showing my new design;

FIG. 3 is a front view of the wafer polishing pad holder showing my new design;

FIG. 4 is a rear view of the wafer polishing pad holder showing my new design;

FIG. 5 is a right side view of the wafer polishing pad holder showing my new design;

FIG. 6 is a left side view of the wafer polishing pad holder showing my new design; and

FIG. 7 is a cross sectional view of the wafer polishing pad holder, taken from FIG. 2 as indicated showing my new design; and,

FIG. 8 is a top view of the wafer polishing pad holder without the milled island within the inside pocket showing my new design.

* * * * *


uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed