Gas-separating plate for reactor for manufacturing semiconductor

Description

FIG. 1 is front perspective view of a gas-separating plate for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof; and,

FIG. 8 is a sectional view taken along line 8-8 of FIG. 2.

Claims

CLAIM The ornamental design for gas-separating plate for reactor for manufacturing semiconductor, as shown and described.

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Inventors:	Honma; Manabu (Oshu, JP), Hishiya; Katsuyuki (Oshu, JP)
Assignee:	Tokyo Electron Limited (Minato-Ku, JP)
Appl. No.:	D/389,555
Filed:	April 13, 2011

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Foreign Application Priority Data

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Oct 21, 2010 [JP]			2010-025236

Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/182 ;D23/413,414 ;118/724,725 ;432/241,253,260

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References Cited [Referenced By]

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U.S. Patent Documents

3618921	November 1971	Corbett, Jr.
5709543	January 1998	Shimazu
6379466	April 2002	Sahin et al.
D600220	September 2009	Sato
7625205	December 2009	Sasajima et al.
D615937	May 2010	Sato
D616392	May 2010	Sato
7798811	September 2010	Nitadori et al.
2005/0056218	March 2005	Sun et al.
2005/0252447	November 2005	Zhao et al.
2007/0131168	June 2007	Gomi et al.
2009/0159002	June 2009	Bera et al.

Primary Examiner: Sikder; Selina
Attorney, Agent or Firm: Burr & Brown