U.S. patent number D572,816 [Application Number D/239,063] was granted by the patent office on 2008-07-08 for cushion for breathing mask.
This patent grant is currently assigned to MAP Medizin-Technologie GmbH. Invention is credited to Achim Biener, Bernd Christoph Lang.
United States Patent |
D572,816 |
Lang , et al. |
July 8, 2008 |
**Please see images for:
( Certificate of Correction ) ** |
Cushion for breathing mask
Claims
CLAIM The ornamental design for a cushion for a breathing mask, as
shown.
Inventors: |
Lang; Bernd Christoph
(Grafelfing, DE), Biener; Achim (Munich,
DE) |
Assignee: |
MAP Medizin-Technologie GmbH
(Martinsried, DE)
|
Appl.
No.: |
D/239,063 |
Filed: |
September 27, 2005 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
Issue Date |
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29219617 |
Dec 21, 2004 |
D515698 |
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29190511 |
Sep 23, 2003 |
D502260 |
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29163978 |
Jul 17, 2002 |
D484237 |
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Foreign Application Priority Data
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Jan 17, 2002 [DE] |
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40200458 |
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Current U.S.
Class: |
D24/110.1;
D24/110.4 |
Current International
Class: |
2902 |
Field of
Search: |
;D24/110.1,110.4,110.5,164
;128/207.11,207.17,206.26,206.24,205.25,204.11,207.13 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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100 45 183 |
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May 2002 |
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DE |
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WO 99/58181 |
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Nov 1999 |
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WO |
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WO 01/97892 |
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Dec 2001 |
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WO |
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Other References
US. Appl. No. 29/204,104, filed Apr. 2004, Guney et al. cited by
other .
U.S. Appl. No. 29/207,546, filed Jun. 2004, Fu et al. cited by
other .
U.S. Appl. No. 29/219,617, filed Dec. 2004, Lang et al. cited by
other.
|
Primary Examiner: Simmons; Ian
Assistant Examiner: Lee; Christopher
Attorney, Agent or Firm: Nixon & Vanderhye P.C.
Description
FIG. 1 is a perspective view of a cushion according to an
embodiment of the present invention;
FIG. 2 is a rear view thereof;
FIG. 3 is a front view thereof;
FIG. 4 is a right view thereof;
FIG. 5 is a left view thereof;
FIG. 6 is a top view thereof; and,
FIG. 7 is a bottom view thereof.
Throughout the various figures of the drawings, certain views may
not be provided. The omission of a particular view is intended to
convey that the element(s) depicted is/are plain and/or
unornamented in that view.
* * * * *