Nasal respiration mask

Hecker , et al. March 20, 2

Patent Grant D439326

U.S. patent number D439,326 [Application Number D/114,614] was granted by the patent office on 2001-03-20 for nasal respiration mask. This patent grant is currently assigned to MPV-Truma Gesellschaft Fuer Medizintechnische Produkte mbH. Invention is credited to Karl-Heinz Hecker, Rudolf Schinagl.


United States Patent D439,326
Hecker ,   et al. March 20, 2001

Nasal respiration mask

Claims

The ornamental design for a nasal respiration mask, as shown and described.
Inventors: Hecker; Karl-Heinz (Chiemgau, DE), Schinagl; Rudolf (Unterhaching, DE)
Assignee: MPV-Truma Gesellschaft Fuer Medizintechnische Produkte mbH (Munich, DE)
Appl. No.: D/114,614
Filed: November 29, 1999

Foreign Application Priority Data

May 31, 1999 [DE] 4 99 05 622
Current U.S. Class: D24/110.5; D24/110.1
Current International Class: 2902
Field of Search: ;D24/110.5,110.4,110.1 ;128/207.11,206.27,202.27,204.11,205.25,207.18

References Cited [Referenced By]

U.S. Patent Documents
D402755 December 1998 Kwok
5042478 August 1991 Kopala et al.
5542128 August 1996 Lomas
5560354 October 1996 Berthon-Jones et al.
5687715 November 1997 Landis et al.
6044844 April 2000 Kwok et al.
Primary Examiner: Simmons; Ian
Attorney, Agent or Firm: Jordan and Hamburg LLP

Description



FIG. 1 is a top and right side perspective view of a nasal respiration mask showing my new design;

FIG. 2 is a bottom and right side perspective view thereof;

FIG. 3 is a bottom and right side perspective view thereof more fully showing the bottom;

FIG. 4 is a top plan view thereof;

FIG. 5 is a right side elevation view thereof, the left side elevation view (not shown) being a mirror image of the right side elevation view;

FIG. 6 is a bottom plan view thereof; and,

FIG. 7 is an upper end elevation view thereof.

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