Exhaust ring for manufacturing semiconductors

Description

FIG. 1 is a front/top/right-side perspective view of an exhaust ring for manufacturing semiconductors showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right-side elevational view thereof, the left-side elevational view being a mirror image and, therefore, not shown;

FIG. 6 is a rear elevational view thereof;

FIG. 7 is a reference front elevational view;

FIG. 8 is a cross-sectional view taken along line 8--8 in FIG. 7;

FIG. 9 is an enlarged, partial, cross-sectional view taken along line 9--9 in FIG. 8; and,

FIG. 10 is an enlarged, partial, cross-sectional view taken along line 10--10 in FIG. 8.

The exhaust ring for manufacturing semiconductors is used in a vacuum vessel for manufacturing semiconductors.

Claims

We claim the ornamental design for exhaust ring for manufacturing semiconductors, as shown and described.

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Inventors:	Tezuka; Kazuyuki (Nirasaki, JP), Kitazawa; Takashi (Nirasaki, JP), Amikura; Norihiko (Nirasaki, JP), Koizumi; Hiroshi (Nirasaki, JP)
Assignee:	Tokyo Electron Limited (Tokyo, JP)
Appl. No.:	D/183,537
Filed:	June 12, 2003

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Foreign Application Priority Data

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Dec 12, 2002 [JP]			2002-034492
Dec 12, 2002 [JP]			2002-034497

Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/182 ;D8/399 ;D15/144 ;118/666,715,733 ;219/444.1 ;414/147,217,247,935-941 ;438/482,706,716,758 ;451/285

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References Cited [Referenced By]

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U.S. Patent Documents

5310453	May 1994	Fukasawa et al.
D404370	January 1999	Kimura
D404372	January 1999	Ishii
6068441	May 2000	Raaijmakers et al.
6155915	December 2000	Raeder
2003/0017714	January 2003	Taniyama et al.
2003/0124820	July 2003	Johnsgard et al.
2004/0025788	February 2004	Ogasawara et al.
2004/0056017	March 2004	Renken

Primary Examiner: Deshmukh; Prabhakar
Assistant Examiner: Sikder; Selina
Attorney, Agent or Firm: Ladas & Parry