U.S. patent number 6,088,103 [Application Number 09/150,426] was granted by the patent office on 2000-07-11 for optical interference alignment and gapping apparatus.
This patent grant is currently assigned to Massachusetts Institute of Technology. Invention is credited to Patrick N. Everett, Euclid E. Moon, Henry I. Smith.
United States Patent |
6,088,103 |
Everett , et al. |
July 11, 2000 |
Optical interference alignment and gapping apparatus
Abstract
Alignment marks on first and second plates include a plurality
of periodic gratings. A grating on a first plate has a period or
pitch p.sub.1 paired up with a grating on the second plate that has
a slightly different period p.sub.2. A grating on the first plate
having a period p.sub.3 is paired up with a grating on the second
plate having a slightly different period p.sub.4. Illuminating the
gratings produces a first interference pattern characterized by a
first interference phase where beams diffracted from the first and
second gratings overlap and a second interference pattern
characterized by a second interference phase where beams diffracted
from the third and fourth gratings overlap. The plates are moved
until the difference between the first and second interference
phases correspond to a predetermined interference phase difference.
Further invention uses an interrupted-grating pattern on the second
plate with certain advantages. Further advantages are obtained
using a checkerboard pattern on the second plate. In addition two
inventions are made for measuring gap. One method uses the same
marks on the second plate as used in aligning, and the second uses
no marks on the second plate, which is an advantage in some
cases.
Inventors: |
Everett; Patrick N. (Concord,
MA), Moon; Euclid E. (Boston, MA), Smith; Henry I.
(Sudbury, MA) |
Assignee: |
Massachusetts Institute of
Technology (Cambridge, MA)
|
Family
ID: |
24624227 |
Appl.
No.: |
09/150,426 |
Filed: |
September 9, 1998 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
Issue Date |
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654287 |
May 28, 1996 |
5808742 |
|
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455325 |
May 19, 1995 |
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Current U.S.
Class: |
356/503; 356/498;
356/508 |
Current CPC
Class: |
G03F
9/70 (20130101); G01B 9/0209 (20130101); G01B
9/02072 (20130401); G01B 9/02078 (20130101); G01B
9/02043 (20130101); G01B 2290/30 (20130101) |
Current International
Class: |
G01B
9/02 (20060101); G03F 9/00 (20060101); G01B
009/02 () |
Field of
Search: |
;356/355,356,357,363,349,351 ;250/237G,548 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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151032 |
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Aug 1985 |
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EP |
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323242 |
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Jul 1989 |
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EP |
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7-208923 |
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Aug 1995 |
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JP |
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Other References
Moon et al., Journal of Vacuum Science and Technology, "Immunity to
Single Degradation by Overlayers Using a Novel
Spatial-Phase-Matching Alignment System," vol. 13, No. 6, pp.
2648-2652, Nov./Dec., 1995. .
Moel et al., Journal of Vacuum Science and Technology, "Novel
On-Axis Interferometric Alignment Method With Sub-10 nm Precision,"
vol. 11, No. 6, pp. 2191-2194, Nov./Dec., 1993..
|
Primary Examiner: Turner; Samuel A.
Attorney, Agent or Firm: Samuels, Gauthier & Stevens,
LLP
Parent Case Text
This application is a divisional application of Ser. No. 08/654,287
filed May 28, 1996, now U.S. Pat. No. 5,808,742, which is
continuation-in-part of Ser. No. 08/455,325 filed May 19, 1995, now
abandoned.
Claims
What is claimed is:
1. A method of measuring the gap between first and second
relatively movable plates at least one having diffraction grating
patterns thereon, comprising:
illuminating the plates to produce an interference pattern
characteristic of the width of said gap, and
imaging said interference pattern upon an imaging sensor to provide
an interference pattern image representative of said width.
2. A method of measuring the gap width between first and second
relatively movable plates, at least one of said plates having a
diffraction grating pattern thereon, comprising:
illuminating the diffraction grating to produce a first beam that
traverses the gap and a second beam that does not traverse the
gap,
combining said first and second beams to produce an interference
pattern characteristic of said gap width, and
imaging said interference pattern upon an imaging sensor to provide
an interference pattern image representative of said gap width.
3. The method of claim 2 further comprising imaging said
interference pattern upon a photodiode array.
4. The method of claim 2 further comprising varying the width of
the gap to cause changes in the intensity pattern recorded by said
imaging sensor; and determining the width of the gap.
5. A method of measuring the gap width between first and second
relatively movable plates, said first plate having a diffraction
grating pattern on its surface facing said second plate,
comprising:
illuminating said diffraction grating with an illuminating source
through said first plate such that a portion of the illumination is
diffracted into a first beam that traverses the gap and reflects
back to be re-diffracted toward the illumination source by said
diffraction grating, a portion of the illumination is diffracted
into a second beam that returns into said first plate, which it
traverses internally and reflects off the other surface back toward
said diffraction grating and then diffracts back toward said
illuminating source;
combining said first and second beams to produce an interference
pattern characteristic of the optical path difference between the
gap and the thickness of said first plate;
imaging said interference pattern upon an imaging sensor to provide
an interference pattern image representative of said optical path
difference, leading to a measurement of the gap from the known
thickness of said first plate;
varying the width of the gap to cause changes in the intensity
pattern recorded by said imaging sensor; and
determining the variation in width of the gap.
6. An alignment and gapping apparatus for aligning and measuring
the gap between first and second relatively movable plates,
comprising:
on a face of each of said first and second plates, first and second
alignment/gapping marks, respectively, each including a first set
of linear gratings of parallel lines of uniform spatial period, the
spatial periods of selected linear gratings on each plate being
different from each other to form first and second pairs of linear
grating patterns, respectively;
on said face of each said first and second plates, each of said
first and second alignment/gapping marks including at least a
second set of linear gratings of parallel lines of uniform spatial
period, selected spatial periods being different from each other to
form third and fourth pairs of linear grating patterns,
respectively, said third and fourth pairs of linear grating
patterns being disposed parallel to said first and second pairs of
linear grating patterns;
a light source for illuminating said pairs of linear gratings to
produce at least first and second interference patterns having
first and second spatial phases, respectively;
a detector configured to detect when at least said first and second
spatial phases assume a predetermined difference in phase values;
and
a position adjuster for adjusting the relative position of said
first and second plates until said detector detects the
predetermined difference in phase values, wherein
said detector comprises at least one spatial filter that can be
selectively blocked to prevent diffractive components from reaching
said detector thus altering said phases and phase differences by
amounts corresponding to the gap between said plates, and being
configured to measure changes in said phases and phase differences
resulting from said selective blocking and to determine the
relative gap between said plates.
7. The alignment and gapping apparatus of claim 6 and further
comprising,
indicia on one of said first and second plates forming a periodic
reference pattern having a reference spatial phase,
said detector configured to detect when the spatial phase of said
first interference pattern and the spatial phase of said second
interference pattern differ from said reference spatial phase by a
predetermined value.
8. The alignment and gapping apparatus of claim 6 and further
comprising,
indicia on one of said first and second plates forming a periodic
reference linear grating pattern,
wherein said first linear grating pattern has a spatial period
p.sub.1, said second linear grating pattern has a spatial period
p.sub.2, and
said reference linear grating pattern lies adjacent to one of said
first and second linear grating patterns and comprises a grating
pattern of spatial period p.sub.3 being equal to p.sub.1
.times.p.sub.2 /.vertline.p.sub.1 -p.sub.2 .vertline..
9. The alignment and gapping apparatus of claim 6 wherein said
first and second plates comprise a semiconductor substrate and
lithography mask, respectively.
10. The alignment and gapping apparatus of claim 6 wherein said
detector includes an imaging sensor and controlled spatial
filtering for inhibiting the transmission of unwanted light energy
to said imaging sensor.
11. The alignment and gapping apparatus of claim 6, wherein said
gratings are formed with spaces in their lines to form a secondary
grating with period p.sub.5 to cause a secondary diffraction in a
plane perpendicular to the primary diffraction to define light
paths between the light source and detector at angles different
from the normal to said plates so that the exposure area adjacent
to the surfaces of said plates is free of optics.
12. The alignment and gapping apparatus of claim 6 and further
comprising,
on said face of each said second plates a checkerboard pattern,
said light source illuminating said checkerboard pattern.
13. The alignment and gapping apparatus of claim 6 further
comprising a gap adjuster for adjusting the relative gap between
said first and second plates until said detector measures
predetermined changes in phase values when selected spatial filters
are blocked.
14. The alignment and gapping apparatus of claim 6 further
comprising a spectral filter that can be chosen with bandwidth and
center for maximizing the accuracy of gap and for increasing
capture-range of the measurement.
15. A method of measuring and adjusting the relative gap between
first and second relatively movable plates to a predetermined
value, the first plate including a first gapping mark comprising a
first pair of linear grating patterns having a first set of spatial
periods and a second pair of linear grating patterns having a
second set of spatial periods, and the second plate including a
second gapping mark comprising a third pair of linear grating
patterns having a third set of spatial periods different from said
first set of spatial periods and a fourth pair of linear grating
patterns having a fourth set of spatial periods different from said
second set of spatial periods, said method comprising:
illuminating the first and third pairs of grating patterns to form
at least a first interference pattern having a first set of spatial
phases; and
illuminating the second and fourth pairs of grating patterns to
form at least a second interference pattern having a second set of
spatial phases; and
measuring the changes in the first and second sets of spatial
phases with a detector when associated spatial filters are
selectively blocked, to measure the relative gap between the two
relatively movable plates.
16. The method of claim 15 further comprising adjusting the
relative gap between said first and second plates until selective
blocking of spatial filters causes predetermined changes in the
observed spatial phases.
17. The method of claim 15, wherein one of said plates includes a
checkerboard grating pattern and further including, illuminating
said checkerboard pattern to form an interference pattern over
interfering paths following diffraction that is free of the
components from a single diffraction that would return directly to
the detector.
18. An alignment and gapping apparatus for aligning and gapping
first and second relatively movable plates, comprising:
on a face of each of said first and second plates, first and second
alignment marks, respectively, each including a first set of linear
gratings of parallel lines of uniform spatial period, the spatial
periods of selected linear gratings on each plate being different
from each other to form first and second pairs of linear grating
patterns, respectively;
on said face of each said first and second plates, each of said
first and second alignment marks including at least a second set of
linear gratings of parallel lines of uniform spatial period,
selected spatial periods being different from each other to form
third and fourth pairs of linear grating patterns, respectively,
said third and fourth pairs of linear grating patterns being
disposed parallel to said first and second pairs of linear grating
patterns;
a light source for illuminating said first, second, third and
fourth pairs of linear gratings to produce first, second, third and
fourth interference patterns, respectively, having first, second,
third and fourth spatial phases, respectively;
a detector configured to detect when said first and second spatial
phases assume a first predetermined difference in phase values, and
to detect when said third and fourth spatial phases assume a second
predetermined difference in phase values; and
a position adjuster for adjusting the relative position of said
first and second plates until said detector detects the first and
second predetermined differences in phase values, wherein
said detector comprises at least one spatial filter that can be
selectively blocked to prevent diffractive components from reaching
said detector thus altering said phases and phase differences by
amounts corresponding to the gap between said plates, and being
configured to measure changes in said phases and phase differences
resulting from said selective blocking and to determine the
relative gap between said plates.
19. The alignment and gapping apparatus of claim 18 further
comprising a gap adjuster for adjusting the relative gap between
said first and second plates until said detector measures
predetermined changes in phase values when selected spatial filters
are blocked.
20. The alignment and gapping apparatus of claim 18, wherein said
first and second plates comprise a semiconductor substrate and
lithography mask.
21. The alignment and gapping apparatus of claim 18, wherein said
detector comprises an imaging sensor including spatial filtering
for inhibiting the transmission of unwanted light energy to said
imaging sensor.
22. The alignment and gapping apparatus of claim 18 further
comprising a spectral filter that can be chosen with bandwidth and
center for maximizing the accuracy of gap and for increasing
capture-range of the measurement.
23. An alignment and gapping apparatus for aligning and gapping
first and second relatively movable plates, comprising:
on a face of each of said first and second plates, first and second
alignment/gapping marks, respectively, each including a linear
grating of
parallel lines of uniform spatial period, the spatial periods being
different from each other to form first and second linear grating
patterns, respectively;
on said face of each said first and second plates, at least third
and fourth linear gratings of parallel lines of uniform spatial
period associated with said first and second alignment/gapping
marks, respectively, the spatial periods of said third and fourth
linear gratings being different from each other to form third and
fourth linear grating patterns, respectively;
indicia on one of said first and second plates forming a periodic
reference pattern having a reference spatial phase;
a light source for illuminating said linear gratings to produce at
least first and second interference patterns having first and
second spatial phases, respectively;
a detector configured to detect when said first and second spatial
phases assume a predetermined difference in phase values, said
detector configured to detect when the spatial phase of said first
interference pattern and the spatial phase of said second
interference pattern differ from said reference spatial phase by a
predetermined value; and
a position adjuster for adjusting the relative position of said
first and second plates until said detector detects the
predetermined difference in phase values, wherein
said detector comprises at least one spatial filter that can be
selectively blocked to prevent diffractive components from reaching
said detector thus altering said phases and phase differences by
amounts corresponding to the gap between said plates, and being
configured to measure changes in said phases and phase differences
resulting from said selective blocking and to determine the
relative gap between said plates.
24. The alignment and gapping apparatus of claim 23 further
comprising a gap adjuster for adjusting the relative gap between
said first and second plates until said detector measures
predetermined changes in phase values when selected spatial filters
are blocked.
25. The alignment and gapping apparatus of claim 23, wherein said
first and second plates comprise a semiconductor substrate and
lithography mask.
26. The alignment and gapping apparatus of claim 23, wherein said
detector comprises an imaging sensor including spatial filtering
for inhibiting the transmission of unwanted light energy to said
imaging sensor.
27. The alignment and gapping apparatus of claim 23 further
comprising a spectral filter that can be chosen with bandwidth and
center for maximizing the accuracy of gap and for increasing
capture-range of the measurement.
28. An alignment and gapping apparatus for aligning and gapping
first and second relatively movable plates, comprising:
on a face of each of said first and second plates, first and second
alignment marks, respectively, each including a linear grating of
parallel lines of uniform spatial period, the spatial periods being
different from each other to form first and second linear grating
patterns, respectively;
on said face of each said first and second plates, at least third
and fourth linear gratings of parallel lines of uniform spatial
period associated with said first and second alignment marks,
respectively, the spatial periods of said third and fourth linear
gratings being different from each other to form third and fourth
linear grating patterns, respectively;
indicia on one of said first and second plates forming a periodic
reference linear grating pattern;
a light source for illuminating said linear gratings to produce at
least first and second interference patterns having first and
second spatial phases, respectively;
a detector configured to detect when said first and second spatial
phases assume a predetermined difference in phase values; and
a position adjuster for adjusting the relative position of said
first and second plates until said detector detects the
predetermined difference in phase values, wherein
said first linear grating pattern has a spatial period p.sub.1,
said second linear grating pattern has a spatial period p.sub.2,
and said reference linear grating pattern lies adjacent to one of
said first and second linear grating patterns and comprises a
grating pattern of spatial period p.sub.3 being equal to p.sub.1
.times.p.sub.2 /.vertline.p.sub.1 -p.sub.2 .vertline., and
wherein
said detector comprises at least one spatial filter that can be
selectively blocked to prevent diffractive components from reaching
said detector thus altering said phases and phase differences by
amounts corresponding to the gap between said plates, and being
configured to measure changes in said phases and phase differences
resulting from said selective blocking and to determine the
relative gap between said plates.
29. The alignment and gapping apparatus of claim 28 further
comprising a gap adjuster for adjusting the relative gap between
said first and second plates until said detector measures
predetermined changes in phase values when selected spatial filters
are blocked.
30. The alignment and gapping apparatus of claim 28, wherein said
first and second plates comprise a semiconductor substrate and
lithography mask.
31. The alignment and gapping apparatus of claim 28, wherein said
detector comprises an imaging sensor including spatial filtering
for inhibiting the transmission of unwanted light energy to said
imaging sensor.
32. The alignment and gapping apparatus of claim 28 further
comprising a spectral filter that can be chosen with bandwidth and
center for maximizing the accuracy of gap and for increasing
capture-range of the measurement.
33. An alignment and gapping apparatus for aligning and gapping
first and second relatively movable plates, comprising:
on a face of each of said first and second plates, first and second
alignment marks, respectively, each including a linear grating of
parallel lines of uniform spatial period, the spatial periods being
different from each other to form at least first and second linear
grating patterns, respectively;
a light source for illuminating said linear gratings to produce at
least first and second interference patterns having first and
second spatial phases, respectively;
a detector configured to detect when said first and second spatial
phases assume a predetermined difference in phase values, said
detector including an imaging sensor and controlled spatial
filtering for inhibiting the transmission of unwanted light energy
to said imaging sensor; and
a position adjuster for adjusting the relative position of said
first and second plates until said detector detects the
predetermined difference in phase values, wherein
said detector comprises at least one spatial filter that can be
selectively blocked to prevent diffractive components from reaching
said detector thus altering said phases and phase differences by
amounts corresponding to the gap between said plates, and being
configured to measure changes in said phases and phase differences
resulting from said selective blocking and to determine the
relative gap between said plates.
34. The alignment and gapping apparatus of claim 33 further
comprising a gap adjuster for adjusting the relative gap between
said first and second plates until said detector measures
predetermined changes in phase values when selected spatial filters
are blocked.
35. The alignment and gapping apparatus of claim 33, wherein said
first and second plates comprise a semiconductor substrate and
lithography mask.
36. The alignment and gapping apparatus of claim 33, wherein said
detector comprises an imaging sensor including spatial filtering
for inhibiting the transmission of unwanted light energy to said
imaging sensor.
37. The alignment and gapping apparatus of claim 33 further
comprising a spectral filter that can be chosen with bandwidth and
center for maximizing the accuracy of gap and for increasing
capture-range of the measurement.
38. An alignment and gapping apparatus for aligning and gapping
first and second relatively movable plates, comprising:
on a face of each of said first and second plates, first and second
alignment marks, respectively, each including first and second
linear gratings of parallel lines of uniform spatial period, the
spatial periods being different from each other to form first and
second linear grating patterns, respectively;
a light source for illuminating said linear gratings to produce at
least first and second interference patterns having first and
second spatial phases, respectively;
a detector configured to detect when said first and second spatial
phases assume a predetermined difference in phase values; and
a position adjuster for adjusting the relative position of said
first and second plates until said detector detects the
predetermined difference in phase values, wherein
selected gratings are formed with spaces in their lines to form a
secondary grating with period p.sub.s to cause a secondary
diffraction in a plane perpendicular to the primary diffraction to
define light paths between the light source and detector at angles
different from the normal to said plates so that the exposure area
between said plates is free of optics, and wherein
said detector comprises at least one spatial filter that can be
selectively blocked to prevent diffractive components from reaching
said detector thus altering said phases and phase differences by
amounts corresponding to the gap between said plates, and being
configured to measure changes in said phases and phase differences
resulting from said selective blocking and to determine the
relative gap between said plates.
39. The alignment and gapping apparatus of claim 38 further
comprising a gap adjuster for adjusting the relative gap between
said first and second plates until said detector measures
predetermined changes in phase values when selected spatial filters
are blocked.
40. The alignment and gapping apparatus of claim 38, wherein said
first and second plates comprise a semiconductor substrate and
lithography mask.
41. The alignment and gapping apparatus of claim 38, wherein said
detector comprises an imaging sensor including spatial filtering
for inhibiting the transmission of unwanted light energy to said
imaging sensor.
42. The alignment and gapping apparatus of claim 38 further
comprising a spectral filter that can be chosen with bandwidth and
center for maximizing the accuracy of gap and for increasing
capture-range of the measurement.
43. A set of alignment and gapping marks used for aligning and
measuring the gap between first and second relatively movable
plates, comprising:
first and second alignment/gapping marks respectively disposed on a
face of each of said first and second plates, each of said first
and second alignment/gapping marks including a first set of linear
gratings of parallel lines of uniform spatial period, the spatial
periods of selected linear grating being different from each other
to form first and second pairs of linear grating patterns,
respectively, and
each of said first and second alignment/gapping marks including at
least a second set of linear gratings of parallel lines of uniform
spatial period, the spatial periods of selected gratings being
different from each other to form third and fourth pairs of linear
grating patterns, respectively, said third and fourth pairs of
linear grating patterns being disposed parallel to said first and
second pairs of linear grating patterns, wherein
said pairs of linear gratings are illuminated to produce at least
first and second interference patterns having first and second
spatial phases, respectively, so that the occurrence of
predetermined first and second phase values or a predetermined
difference in phase values between said first and second spatial
phases can be detected.
44. An alignment and gapping apparatus for aligning and gapping
first and second relatively movable plates, comprising:
on the face of each of said first and second plates, first and
second alignment marks respectively, each being a linear grating of
parallel lines of uniform spatial period, the spatial periods being
different from each other to form first and second linear grating
patterns respectively;
a light source for illuminating the second linear grating on said
second plate through the first linear grating on said first to
produce an interference pattern having a spatial phase;
indicia on one of said first and second plates forming a periodic
reference pattern having a spatial phase;
a detector configured to detect when the spatial phase of said
interference pattern and the spatial phase of said reference
pattern differ by a predetermined value; and
a position adjustor for adjusting the relative position of said
first and second plates until said detector detects a spatial phase
difference of said predetermine value, wherein
said detector comprises at least one spatial filter that can be
selectively blocked to prevent diffractive components from reaching
said detector thus altering said phases and phase differences by
amounts corresponding to the gap between said plates, and being
configured to measure changes in said phases and phase differences
resulting from said selective blocking and to determine the
relative gap between said plates.
45. The alignment and gapping apparatus of claim 44, wherein said
indicia forming said periodic reference pattern comprise a
reference linear granting on one of said plates.
46. The alignment and gapping apparatus of claim 45, wherein:
said first linear granting pattern has a spatial period p.sub.1
;
said second linear granting pattern has a spatial period p.sub.2
;
said reference linear granting lies adjacent to one of said first
or second linear granting patterns, and comprises a granting
pattern of spatial period p.sub.3 being equal to p.sub.1
.times.p.sub.2 /.vertline.p.sub.1 -p.sub.2 .vertline..
47. The alignment and gapping apparatus of claim 45, wherein said
first and second plates comprise a semiconductor substrate and a
lithography mask.
48. The alignment and gapping apparatus of claim 44 wherein:
said first and second alignment marks each comprise first and
second portions, the first portions of said first and second
alignment marks cooperating to form a first interference pattern
that moves in a first direction as said first plate is moved over
said second plate, and the second portions cooperating to form said
reference pattern, the reference pattern being a second
interference pattern that simultaneously moves in a
second direction opposite said first direction; and
said position adjustor is for adjusting the relative position of
said first and second plates to achieve a predetermined spatial
phase relationship of said first and second interference
patterns.
49. The alignment and gapping apparatus of claim 48, wherein:
said first portion of said first alignment mark and said second
portion of said second alignment mark comprise linear gratings
having spatial period p1; and
said second portion of said first alignment mark and said first
portion of said second alignment mark comprise a linear grating
having spatial period p2 different than p1.
50. The alignment and gapping apparatus of claim 44, wherein said
first and second plates comprise a semiconductor wafer and a
lithography mask.
51. The alignment and gapping apparatus of claim 44 further
comprising a gap adjuster for adjusting the relative gap between
said first and second plates until said detector measures
predetermined changes in phase values when selected spatial filters
are blocked.
52. The alignment and gapping apparatus of claim 44, wherein said
detector comprises an imaging sensor including spatial filtering
for inhibiting the transmission of unwanted light energy to said
imaging sensor.
53. The alignment and gapping apparatus of claim 44 further
comprising a spectral filter that can be chosen with bandwidth and
center for maximizing the accuracy of gap and for increasing
capture-range of the measurement.
54. A method of aligning and gapping first and second relatively
movable plates, the first plate having a first alignment/gapping
mark comprising a first linear grating pattern having a first
spatial period, and the second plate having a second
alignment/gapping mark comprising a second linear grating pattern
having a second spatial period different from said first spatial
period, one of said first and second plates having indicia forming
a periodic reference pattern having a phase which method
includes,
illuminating the first and second grating patterns to form an
interference pattern therebetween having a phase; and
measuring the change phase with a detector when associated spatial
filters are selectively blocked, to measure the relative gap
between the two relatively movable plates.
55. The method of claim 54 further comprising adjusting the
relative gap between said first and second plates until selective
blocking of spatial filters causes predetermined changes in the
observed spatial phases.
56. The method of claim 54, wherein one of said plates includes a
checkerboard grating pattern and further including, illuminating
said checkerboard pattern to form an interference pattern over
interfering paths following diffraction that is free of the
components from a single diffraction that would return directly to
the detector.
57. The method of claim 54, wherein said reference pattern is
related to a reference linear grating on one of said plates.
58. The method of claim 57, wherein
said first linear grating pattern has a spatial period p.sub.1
;
said second linear grating pattern has a spatial period p.sub.2 ;
and
said reference linear grating lies adjacent to one of the first or
second linear grating patterns, and comprises a grating pattern of
spatial period p.sub.3 being equal to p.sub.1 .times.p.sub.2
/.vertline.p.sub.1 -p.sub.2 .vertline..
59. The method of claim 54, wherein said first and second plates
comprise a semiconductor substrate and a lithography mask.
60. The method of claim 54, wherein:
said first and second alignment/gapping marks each comprise first
and second portions, the first portions of said first and second
alignment marks cooperating to form a first interference pattern
that moves in a direction as said first plate is moved over said
second plate, and the second portions cooperating to form said
reference pattern, the reference pattern being a second
interference pattern that simultaneously moves in the opposite
direction; and
said adjusting step comprises adjusting the relative positions of
said two plates to achieve a predetermined phase relationship of
said first and second interference patterns.
61. The method of claim 60, wherein:
said first portion of said first alignment/gapping mark and said
second portion of said second alignment/gapping mark comprise
linear gratings having spatial period p1; and
said second portion of said first alignment/gapping mark and said
first portion of said second alignment/gapping mark comprise a
linear grating having spatial period p2 different than p1.
62. The method of claim 54, wherein said first and second plates
comprise a semiconductor wafer and a lithography mask.
Description
This invention was made with government support under research
grant numbers 9407078-ECS awarded by the National Science
Foundation and under contract number DAAH04-95-1-0038 awarded by
the Army Research Office. The government has certain rights in the
invention.
This invention relates to a means for aligning, by optical means,
one substantially planar object, such as a mask, with respect to a
second planar object, such as a substrate. The invention achieves a
high degree of sensitivity, accuracy capture range, and reliability
through a novel design of alignment marks located on both the mask
and the substrate. Further advantages are gained by adding
controlled spatial filtering. Two means of measuring the gap (i.e.
"gapping") between mask and substrate are also provided. The first
uses the alignment marks on both mask and substrate and controlled
spatial filtering; The second uses marks on only one of the
objects.
For background reference is made to U.S. Pat. Nos. 4,200,395,
4,340,305 and 5,414,514. The present invention represents an
improvement of the invention in U.S. Pat. No. 5,414,514
incorporated herein by reference.
It is an important object of the invention to provide improved
optical alignment and gap measuring.
According to the invention, alignment marks on a first plate, such
as a mask, and a second plate, such as a substrate, comprise one or
more simple periodic gratings. A grating on the first plate, having
a period or pitch P.sub.1, is paired up with the grating on the
second plate that has a slightly different period, P.sub.2. A light
source is constructed and arranged to illuminate the gratings to
produce overlapping diffracted beams that create discernible
interference patterns (sometimes called moire patterns)
characterized by a phase brought into a predetermined relationship
with the phase of a reference pattern by relatively displacing the
two plates. Additional grating pairs with differing periods on the
respective plates increase the range of freedom from measurement
ambiguity.
According to another aspect of the invention, observing optics
responsive to the diffracted beams includes controlled spatial
filtering. Controlling the spatial filtering and simultaneously
observing details of the resulting pattern permits measuring of the
gap between the plates. The spatial filtering also reduces unwanted
light illuminating the imaging sensor, such as light from
uncontrolled scattering and reflection from the surfaces of the
plates.
According to another feature of the invention, the gratings and any
reference pattern on either plate are interrupted by spaces in
their lines to form a secondary grating with period `P.sub.s `.
This interruption results in secondary diffraction in a plane
perpendicular to the primary diffraction and allows the light used
for illumination and observation to arrive and leave at angles
other than normal to the plates, thereby allowing the area
immediately above the critical exposure area of the plates to be
free of optics associated with the aligning and gapping operation.
An advantage is there is no need to remove aligning optics during
lithographic exposure through a plate, and aligning and gapping may
be verified and optimized during exposure. Another advantage is
that the signal-to-noise ratio is improved because the specular
reflections from the plates are no longer reflected back into the
observing optics.
According to another feature of the invention, the second plate
includes a checkerboard pattern instead of or in addition to the
interrupted-grating
patterns. It is advantageous to use one or more checkerboard
patterns on the second plate in combination with the grating
patterns on the first plate. Each checkerboard pattern may be
formed by squares, rectangles or other shapes in a rectilinear or
nonrectilinear pattern. The spatial period may be the same or
different in different directions.
This checkerboard pattern, like the interruptedgrating pattern,
causes secondary diffraction in a plane perpendicular, or at some
other angle, to the primary diffraction and allows the light used
for illumination and observation to arrive and leave at angles
offset from perpendicular to the plates, thereby allowing the area
immediately above the critical exposure area of the plates to be
free of optics associated with aligning and gapping with the same
advantages of the system described above. The spatial period of the
checkerboard pattern in the secondary plane, in combination with
the wavelength of the illumination, determines the offset angle
from the normal to the plates.
An advantage of the checkerboard pattern feature is that the
diffracted light arrives at the viewing optics from fewer
directions. This advantage improves the contrast of the observed
moire-interference patterns, and the contrast changes less with
changes in the gap between the plates.
With the checkerboard pattern, when optimally adjusted, no light
arrives at the viewing optics in the pure zero-order direction
leading to the advantages just described. In particular, the
checkerboard pattern feature eliminates the fundamental
interferences that occurred between the zero-order path and each of
the other paths, leaving only harmonic interference between the
remaining paths. The resulting moire-interference pattern thus has
generally higher contrast, the contrast fluctuates less with
changing gap between the two plates, and the sensitivity improves
because the phase of the harmonic changes twice as fast as that of
the fundamental when the plates move laterally relative to each
other.
Spatial filtering still improves the signal-to-noise ratio when
using the checkerboard pattern. The same spatial filters can serve
simultaneously both for checkerboard and for interrupted-grating
marks beside each other on the second plate. When using only the
checkerboard grating on the second plate, the on-axis (i.e.
central) spatial filter may advantageously be blocked to further
enhance the signal-to-noise ratio.
The previously described method for measuring gap, using marks on
both plates, requires some pure zero-order light. An advantageous
arrangement is to include both a checkerboard pattern and an
interrupted-grating pattern on the second plate, working with
suitable grating, as described, on the first plate, to achieve
optimal aligning and optimal gapping simultaneously.
According to another feature of the invention, the gap between the
plates may be measured without using any marks on the second plate
(i.e. the substrate in x-ray lithography, for example). This
feature is particularly advantageous during the initial
lithographic step in x-ray lithography because generally there are
no marks on the substrate. By using a grating on the first plate
with period and illumination angles such that a portion of the
illuminating light striking this grating is diffracted
perpendicular to the surface toward the second plate (or
substrate), and another portion diffracted in the opposite
direction toward the other surface[s] of the first plate. Both
portions then reflect back upon themselves to meet again at this
grating. Some portion of each of these reflected portions, on
striking the grating a second time, is diffracted approximately
back toward the source and the observing optics. These two
returning beams interfere, and the image of the resulting fringes
provides a representation of the difference between the two optical
paths that were traversed. In a case where the first plate (or
mask), has a uniform and well-characterized thickness (such as in
x-ray lithography), this characteristic furnishes an accurate
measure of the gap between the two plates. The measuring system may
be regarded as a quasi-Michelson interferometer, with the grating
on the mask corresponding to the beam-splitter in a conventional
Michelson interferometer. An important additional feature is that
the grating is a spectrally dispersive beam-splitter so that
different wavelengths are separated in angle on the return path
toward the observing optics.
The grating on the first plate or mask for this gapping measurement
has its grating lines oriented perpendicular to those on the same
plate used for the aligning. However, the observing optics may be
identical or very similar, and the same optics and camera can be
constructed and arranged to serve both measuring functions. For
some applications, the optics may be identical; in others, a small
adjustment of the focusing may be desirable when changing between
the alignment and gap-measuring functions. Alternatively, there may
be more than one optical path, separated by a beam-splitter for the
two types of measurement.
When the illumination contains more than one narrow spectral band,
then each diffraction will cause the light to diffract in a
slightly different direction depending upon its wavelength.
Consequently, not all the light then travels exactly perpendicular
to the plates after the first diffraction, and the exiting light
will be dispersed twice as much. The angle generally has little or
no effect on the length of the path that is traversed. In cases
where this effect is significant, the error can be compensated.
The dependence of emerging angle upon wavelength is a useful
property of the invention. This property permits independent
observation of the interference at different wavelengths, and
relaxes any requirement for spectral coherence in the incoming
light. In fact, it is advantageous to have a few spectral lines in
the illumination, or even better to have white light because white
light illumination allows simultaneous measurements at as many
different wavelengths as can be discerned. If the observing optics
are regarded as a spectrometer, then a camera may record the
interference-intensity as a function of angle. Angle then
translates to wavelength via the dispersive relationship of the
grating in double-pass.
If a single spectral line is used in the illumination, it is
advantageous to scan the gap to obtain a reliable measurement, and
there will be ambiguity in measurement of the gap. The ambiguity
may be removed by providing at least two spectral lines, and
preferably more than two, for illumination. It is even more
advantageous to provide a continuous spectrum for. illumination
over a suitable band. Then the dispersed pattern, imaged on a
photosensitive area of a camera, facilitates measuring the gap
without scanning.
Numerous other features, objects and advantages of the invention
will become apparent from the following detailed description when
read in connection with the accompanying drawings in which:
FIGS. 1-3 and 5 correspond to FIGS. 1-3 and 5 in U.S. Pat. No.
5,414,514;
FIG. 1 is a cross-sectional view of a mask and substrate;
FIG. 2 is a plan view of the mask showing alignment marks;
FIG. 3 is a plan view of the substrate showing multiple identical
regions to be exposed;
FIG. 4 illustrates one form of complementary alignment marks
according to the invention;
FIG. 5 schematically illustrates viewing alignment marks with a
microscope;
FIG. 6 illustrates the image when the alignment marks of FIG. 4,
according to the invention, are superimposed;
FIG. 7 illustrates the image of FIG. 6 when mask and substrate are
misaligned;
FIG. 8 illustrates an especially advantageous arrangement of
alignment marks, according to the invention;
FIG. 9 illustrates the image when the alignment marks of FIG. 8,
are correctly superimposed, i.e. aligned;
FIG. 10 illustrates how the image of FIG. 9 changes when mask and
substrate are misaligned, according to the invention;
FIG. 11 illustrates spatial filtering to enable gap measurement,
according to the invention;
FIG. 12 illustrates the image corresponding to FIG. 9 for the cases
of three different blockings of spatial-filters, when mask and
substrate are aligned, according to the invention;
FIG. 13 is as FIG. 12, except that it shows the interference
fringes with mask and substrate misaligned according to the
invention;
FIG. 14 illustrates how one of the marks is periodically
interrupted to cause secondary diffraction, to enable off-normal
illumination and observation, according to the invention;
FIG. 15 illustrates three geometries that achieve the off-normal
illumination and observation of interference fringe patterns,
according to the invention;
FIGS. 16A and 16B show checkerboard and interrupted grating
patterns, respectively;
FIGS. 17A and 17B show two-dimensional Fourier Transforms of the
checkerboard and interrupted-grating patterns, respectively, of
FIGS. 16A and 16B.
FIGS. 18A and 18B are diagrammatic representations of the light
diffracted paths entering the viewing optics with an interrupted
grating and checkerboard pattern, respectively, on the
substrate;
FIG. 19 is a diagram illustrating the dispersive quasi-Michelson
interferometer formed by a grating on a mask with reflections from
a substrate surface and from an opposite surface of the mask;
FIG. 20 is a graphical representation of intensity of the fan of
emerging light as a function of gap and angle; and
FIGS. 21A and 21B show perpendicular cuts through the graphical
representation of FIG. 20 at constant gap and constant wavelengths,
respectively.
With reference to the drawings, FIG. 1 illustrates a cross
sectional view of x-ray mask 10 separated from substrate 20 by a
small gap, G. The mask 10 includes a support frame 11, membrane 12,
and alignment marks 13. Complementary alignment marks 21 are
located on the substrate and face the mask alignment marks 13.
FIG. 2 is a plan view of mask 10, showing four alignment marks 13.
The central region of mask 10 includes pattern region 14 which
contains the pattern that is to be superimposed over a pattern on
the substrate.
FIG. 3 is a plan view of the substrate containing multiple
identical regions of patterns 22 over which mask pattern 14 is to
be superimposed in a sequence of three steps: (1) move to one of
the multiple sites; (2) align mask alignment marks with respect to
substrate alignments marks; (3) expose mask pattern 14 on top of
substrate pattern 22.
As disclosed in U.S. Pat. No. 5,414,514: visible or near-infrared
light is preferably used as the illuminating source, spanning a
wavelength band from 400 to 900 nm, but other wavelengths may also
be used; the light must be collimated with good spatial coherence;
it is necessary that grating periods exceed wavelengths used in the
illuminating bandwidth, so that first order diffraction is
possible. The first order diffraction angle is
where .THETA. is the diffraction angle, .lambda. is the wavelength,
and g is the period. Hence first-order diffraction with
.lambda./g>1 is not possible; it is desirable that grating
periods exceed twice the value of any wavelengths used in the
illuminating bandwidth, to ensure that first order diffraction
occurs at an angle of no more than 30 degrees. This permits each
diffracted beam to intercept a large fraction of the paired
grating, provided that the width of the mark, W, is larger than the
mask-substrate gap G. Preferably, W should be larger than 2G,
noting that the gap G ranges from a few to 40-micrometers in
current versions of x-ray lithography. Preferably, the alignment
marks should include 10 or more periods of each of the paired
gratings.
Referring to FIG. 4, there is shown an arrangement of pairs of
complementary alignment marks with differing periods according to
the invention to increase the range of freedom from measuring
ambiguity. This feature increases the range of misalignment that
can be measured without ambiguity, or increases the "capture
range."
To facilitate understanding the mode of operation with the larger
number of gratings compared with the number disclosed in the '514
patent, it is convenient to use a slightly different notation for
identifying the gratings and their periods. Any fixed "reference"
grating is identified by a .sub.`r` to denote it as a "reference"
grating and a .sub.`n` (a number) to associate it with the grating
pair, on substrate and mask, with which it is associated. Each
nonreference grating is identified by a .sub.`s` or .sub.`m` to
denote whether it is on the substrate or mask, respectively, and a
.sub.`n` (a number) to connect it with its paired grating and with
an associated "reference" grating (if there is one). Thus, a
grating on the substrate having a period g.sub.sn will always be
paired with a grating on the mask having period g.sub.mn, and any
"reference" grating associated with it will have period g.sub.rn
where `n` is a number denoting pairing and association. When the
substrate and mask are "aligned," then substrate grating g.sub.sn
will be facing its paired grating g.sub.mn. If there is an
associated reference grating g.sub.rn, then it will be adjacent
either on the mask or on the substrate. In every case g.sub.sn will
differ from g.sub.mn, and g.sub.rn will always exceed both g.sub.sn
and g.sub.mn. There will always be either a reference grating
associated with a grating pair, or another grating pair to generate
a countermoving fringe pattern as disclosed in the '514 patent. The
additional grating pairs with differing periods according to the
invention increase the range of freedom from measurement
ambiguity.
In one arrangement the substrate alignment mark 21 includes two
simple linear gratings having different spatial periods g.sub.s1
and g.sub.s2. The mask alignment mark 13 includes two simple linear
gratings having different spatial periods g.sub.m1 and g.sub.m2. In
between the gratings g.sub.s1 and g.sub.s2, or between the gratings
g.sub.m1, and g.sub.m2 (latter is shown in FIG. 4) is an unpaired
reference grating having a period gr which is coarser than any of
g.sub.s1, g.sub.s2, g.sub.m1 and g.sub.m2. The periods g.sub.r,
g.sub.s1, g.sub.s2, g.sub.m1, and g.sub.m2 are chosen so that
This relationship ensures that g.sub.r is also the period of the
two interference fringe patterns formed by the overlap of beams
diffracted by the gratings. One such pattern results from
interference of beams diffracted by gratings g.sub.s1 and g.sub.m1.
The second such pattern results from interference of beams
diffracted by gratings g.sub.s2, and g.sub.m2.
For example, if g.sub.s2, is given a value of 4 micrometers and
g.sub.m1 the value 3.7 micrometers, then a value of g.sub.r =49.33
micrometers satisfies eq.(1). If g.sub.s2 is given a value 33.64
micrometers and g.sub.m2 the value 20 micrometers, then eq. (1) is
still satisfied with the same value of g.sub.r =49.33 micrometers.
Thus eq.(1) can be satisfied with g.sub.s1, g.sub.m1, g.sub.s2 and
g.sub.m2 all having different values. In general, to avoid
ambiguity, the periods g.sub.s1, g.sub.m1, g.sub.s2 and g.sub.m2
should have values that are not simple multiples of one another.
There are some exceptions; for instance the larger of g.sub.s1 and
g.sub.m1 might be equal to the smaller of g.sub.s2 and g.sub.m2.
Such rules will be apparent to those skilled in the art.
More such sets of grating-pairs and corresponding unpaired
reference gratings can be added, and are within the principles of
the invention. Such additional sets further increase the range of
freedom from ambiguity and thus extend the "capture range." They
also afford the opportunity for additional simultaneous
measurements to reduce statistical noise in the alignment.
FIG. 5 is a schematic diagram illustrating the viewing of the pairs
of facing alignment marks 21 and 13 by a microscope. The imaging
and image-processing is disclosed in the '514 patent. The present
invention includes an added fringe pattern resulting from the
overlay of the gratings illustrated in FIG. 4, to increase the
range of freedom from
ambiguity as discussed above. The "frame grabbing," storing, and
signal processing corresponds to that disclosed in the '514 patent,
except the present invention involves more adjacent fringe and/or
reference patterns to have phases compared. Alignment occurs upon
attainment of a predetermined phase difference. For example, this
phase difference could be zero, in which case the microscope image
would appear as in FIG. 6 when alignment occurs. When the relative
mask and substrate positions are slowly changed, the fringe
patterns will translate at higher, and different rates. This
translation not only results in magnification of the relative
motion, but also overcomes the ambiguity problem that would arise
with only one grating pair when the relative motion is a multiple
of a grating period.
FIG. 6 illustrates the interference fringe patterns, and the
reference pattern, observed when the alignment marks of FIG. 4 are
properly superimposed.
FIG. 7 illustrates an example of how the fringe patterns of FIG. 6
are shifted relative to each other when mask and substrate are
relatively displaced perpendicular to the lines of the grating
pairs.
FIG. 8 illustrates an especially advantageous arrangement of
alignment mark pairs on mask and substrate according to the
invention. In this arrangement additional pairs of gratings replace
the fixed reference grating g.sub.r of FIG. 4. This is similar to
the counter-moving fringes depicted in FIGS. 7 to 12 of U.S. Pat.
No. 5,414,514. Under relative mask-substrate motion, the marks
depicted in FIG. 8 produce fringe motion. Preferably the periods
are assigned such that
and
This ensures
and
When these relations are satisfied, with diversity otherwise
maintained in the grating periods, the extent of freedom from
measurement ambiguities is increased, and "capture range" is thus
increased. Additional sets of gratings can be added to further
expand the capture range, as will be evident to those skilled in
the art. It is further advantageous to have P.sub.12 equal, or
approximately equal, to P.sub.34. This greatly simplifies the
alignment and gap-measuring algorithms, while expanding the range
of freedom from measurement ambiguities and increasing capture
range.
FIG. 9 illustrates the fringe interference patterns observed when
the alignment marks of FIG. 8 are correctly superimposed, i.e.
aligned, according to the invention. The fringe patterns 201 form a
partnership of counter-moving fringes. The fringe patterns 202 form
a second partnership of counter-moving fringes. They will exhibit
different rates of separation when the substrate and mask become
misaligned, thereby eliminating ambiguities of 2.pi. in phase.
FIG. 10 illustrates how the fringe interference patterns of FIG. 9
shift relative to each other when mask and substrate are relatively
displaced perpendicular to the lines of the grating pairs according
to the invention. The fringes 201 have counter moved to form fringe
pattern 301. The offset indicates the misalignment. In addition,
independent fringe partnership 202 has countermoved by a different
phase offset to form the fringe pattern 302, yielding an
independent measurement of the misalignment. The two measurements
eliminate ambiguities, at least out to some further capture range
than was possible with only one partnership of fringes, in a way
that will be evident to those skilled in the art. Addition of
further fringe partnerships allows further extension of capture
range.
FIG. 11 illustrates spatial filtering in the viewing optics,
according to the invention. A spatial filter is included in the
back focal plane of the observing optics, or in an equivalent image
plane thereof, to accept only the light emerging in what is termed
the "zero-order-group" of emerging paths. The "zero-order-group"
terminology is explained in the following way. When the
illuminating light first encounters the gratings in the mask
aligning-mark, there is opportunity for diffraction. When it then
encounters the substrate, it is reflected, again with opportunity
for diffraction. There is a third opportunity for diffraction when
emerges through the mask. Light that has experienced no diffraction
emerges in the same direction as that of specular reflection from a
flat surface. Light that has experienced a "+1" diffraction on
first encountering the mask, and then a "-1" diffraction on
emerging through the mask, will also emerge at the angle of
specularly-reflected light. Similarly for "-1" followed by "+1",
both at the mask. All such light emerges at the specular angle
designated "pure-zero-order." Light that has experienced opposing
diffractions at mask and substrate will emerge at a small angle
from the specular reflection, since the periods of those grating
pairs are slightly different. Such light is designated as
"quasi-zero-order." It emerges at a much smaller angle, from the
specular direction, than would any light that emerges after a
single diffraction from any of the gratings. The "zero-order-group"
includes both the "pure-zero-order" and this "quasi-zero-order"
light. The "pure zero-order" light will pass through a central
spatial filter in the back focal plane of the observing optics. The
"quasi-zero-order" light will pass through two spatial filters,
suitably situated, on either side of the central spatial-filter.
Thus, all of the light used in the measurements will pass through
these three spatial filters, as will be evident to those skilled in
the art. Any light other than that emerging in the "zero-order
group" can be considered as noise. Hence the advantage of the
spatial filtering in improving signal/noise ratio is immediately
seen. Additionally, blocking one of the outer spatial-filter holes
destroys the symmetry that normally results in the fringe pattern
being independent of mask-substrate gap and of wavelength.
Consequently, when one of the outer spatial-filter holes is
blocked, the imaged fringe pattern for each fringe partnership
moves en-masse through a phase determined by the gap, the detailed
grating periods, and the wavelength of the light. Additionally, the
adjacent interference-fringe patterns within the partnership will
be displaced relative to each other by a small amount. Blocking the
outer spatial-filter holes in turn will cause equal such shifts but
in opposite directions. These offsets are measured to indicate the
gap between mask and substrate. The en-masse shifts and the
relative shifts will each give a measurement of the misalignment,
to a different scale. Since the component gratings of the different
fringe partnerships have different periods, the shifts for the
different partnerships have differing calibrations. Hence
ambiguities are thus resolved to increase the capture range.
FIG. 12 shows in boundary 80 the fringe interference patterns
observed when the alignment marks of FIG. 8 are correctly
superimposed, with no blocking of the spatial filters. The first
pair of partner fringes is denoted by 81 and the second by 82. In
boundary 90 is shown the fringe interference patterns observed when
the alignment marks of FIG. 8 are correctly superimposed with one
of the outer spatial filters blocked. Again, the same first pair of
partner fringes is denoted by 91 and the second by 92. There are
two motions observed: a relatively coarse en-masse shift of the
fringes as a whole labeled 93 for the first fringe partnership and
94 for the second fringe partnership, and a relative offset of the
fringes, labeled 94 for the first fringe partnership and 96 for the
second fringe partnership. The observed shifts are proportional to
the gap between mask and substrate, as well as having wavelength
dependence and detailed grating-period dependence. In boundary 100
is shown the fringe interference patterns observed when the
alignment marks of FIG. 8 are again correctly superimposed but with
the other one of the outer spatial filters blocked. Equal motions
as in 90 are now observed, but in the opposite direction. Again the
same fringe partnerships are denoted by 101 and 102. The coarse
bodily motions are denoted by 103 and 104, and the finer offsets by
105 and 106. The observed motions will yield the gap, on a coarse
and on a fine scale. The motions may be calibrated using known
gaps, or the algorithms may be readily determined by those skilled
in the art. It should be noted that when one of the spatial filters
is blocked, the broken symmetry also breaks the achromatic
properties of the fringes, and there will be a limit on the
bandwidth for successful measurement because of the fringe
broadening. The limit will depend upon circumstances. It may be
deduced by experiment, or readily calculated by those skilled in
the art.
FIG. 13 is as FIG. 12, except that the mask and substrate are now
misaligned. The pattern in boundary 110 with no blocking of spatial
filters, shows offsets proportional to the misalignment. The first
fringe partnership 111 has phase offset 113, and the second fringe
partnership 112 has phase offset 114. The images in boundaries 120
and 130 correspond to first one of the outer spatial filters
blocked, and then the other. The fringes of each fringe partnership
are again displaced en-masse, by the same amount as when the
substrate and mask were aligned in FIG. 12, and the same relative
shifts also occur. The first fringe partnership moves en-masse a
distance 104, and the second fringe partnership moves bodily a
distance 105. The relative shifts change to 106 and 107,
respectively. Similarly, in the image in boundary 130 the motions
are in the opposite direction as before. If the gap is the same for
both FIGS. 12 and 13, then distance 93=distance 104, distance
94=distance 105. distance 96=distance 104-distance 113. Similar
relationships hold the other side, as will be clear to anyone
skilled in the art, and it will be clear that the measurement of
these fringe motions will yield both the alignment offset and the
gap. The calibration constants for the en-masse and relative shifts
can be modeled from theory or ascertained by calibration. It is
part of the invention that the mask and substrate need not be
aligned prior to the gap measurement. Regardless of alignment, the
images of FIG. 13 will yield a measure of the alignment offset as
well as a measure of the gap. The gap may be deduced, to different
scales, from the en-masse and the relative shifts of the fringes
between the images in boundaries 120 and 130. The alignment
measurement is deduced by averaging the phase offsets of the images
in boundaries 120 and 130. A further check of the alignment is
obtained, if desired, from the relative shift in the image in
boundary 110. However, note that a complete measurement of
alignment and gapping can be obtained from only observing the
images in boundaries 120 and 130. A further advantage of observing
only the images in boundaries 120 and 130 is that it removes the
possibility of error due to unintentional blazing of the alignment
gratings. Such blazing could cause a small error in the phase
offset showing the image in boundary 110, but would not be apparent
in the images in boundaries 120 and 130. Again, this will be clear
to anyone skilled in the art.
FIG. 14 illustrates, according to the invention, how all the
alignment gratings on either the mask or substrate are periodically
interrupted. This causes secondary diffraction in a plane
perpendicular to the plane of diffraction that would be caused by
the uninterrupted gratings. This secondary diffraction enables
illumination and observation at an angle, or angles, inclined from
the normal direction to the mask and substrate. The angle .alpha.
between illumination and observation, will generally be zero for
convenience in designing the optics, but need not be zero. The
diffractions in the primary plane (now tilted by virtue of the
secondary diffraction) are unchanged except for a) the
geometrically increased gap because of the inclination of light
paths, and b) a possible lengthening of the fringes in the image,
if the illuminating spectral bandwidth is significant. The latter
will result from the wavelength dependence of the secondary
diffraction, and may cause colored ends for the fringes but will
not adversely effect the measurements. An additional advantage of
the invention is that, if the illumination consists of a series of
relatively narrow spectral bands, with significant spectral
separations, each spectral band will result in a complete separated
image such as that of FIG. 12. Hence there will be as many images
as spectral bands. The fringe motions for each image when the
alternate spatial filters are blocked will then depend upon the
color as well as on the gap, and hence will enable elimination of
ambiguity in the same manner as obtained with the multiple
gratings. This advantage can be used in conjunction with the
multiple gratings for eliminating ambiguity in alignment and in
gapping, or the advantages can be used separately.
FIG. 15 illustrates three geometries that achieve the off-normal
illumination and observation of the fringe patterns. The plane of
the figure is the secondary diffraction plane. All primary
diffractions from the gratings take place in planes perpendicular
to the plane of the paper. In each geometry, the angle a may be
finite, or may reduce to zero. In boundary 140 and in boundary 150
the interrupted alignment mark is on the substrate. In boundary 160
it is on the mask. In boundary 140, the incoming light 141
experiences a single diffraction when it encounters the interrupted
grating on the substrate 143, and returns on itself (Littrow
configuration) or at angle a from its original direction. In
boundary 150, the incoming light diffracts into a normal or
near-normal direction when it encounters the interrupted grating on
the substrate 153. It then reflects down again from the mask to be
diffracted a second time to return along the path on which it came,
or at an angle .alpha.. In boundary 160, the incoming light
diffracts downward from the interrupted grating on the mask 162,
then is reflected upward to again be diffracted at the interrupted
grating on the mask, to return along its arriving path, or at an
angle .alpha.. The arrangement in boundary 140 is preferred because
there is less loss of light because it only experiences one
diffraction in the secondary plane. However, the gratings on the
substrate are liable to lose diffraction efficiency during
lithographic processing. Hence, there may be circumstances in which
the arrangement in boundary 160 is the preferred.
Referring to FIG. 16A, there is shown a checkerboard pattern on the
second plate, typically the substrate, and FIG. 16B shows an
interrupted-grating pattern on the second plate, typically the
substrate. Either an amplitude-modulating or a phase-modulating
pattern may be used for either pattern, or a hybrid modulation that
is both amplitude and phase-modulation. The elements of the
checkerboard pattern are preferably rectangular, but other shapes
may be used with their centers arranged in a similar geometric
pattern, even including a nonrectilinear pattern.
Referring to FIGS. 17A and 17B, there are shown two-dimensional
discrete Amplitude Fourier Transforms of the checkerboard and
interrupted grating patterns, respectively, of FIGS. 16A and 16B.
In taking the transforms, each of the patterns of FIG. 16 is taken
as having a total of 32 pixels horizontally and 16 vertically. In
FIG. 17, only the first quadrant of each corresponding Fourier
Transform is shown. i.e. 16 pixels horizontally and 8 vertically,
with the origin at the upper left corner of each. The Fourier
Transforms are both normalized in the same ratio. Any person
ordinarily skilled in the arts of Fourier Transforms and
Diffraction will recognize that these plots indicate the angles
into which light can be diffracted by each pattern. In particular
they show that under Littrow illumination, the checkerboard will
return no light exactly upon itself, whereas the streets pattern
will do so. The key to understanding this lies in the third row
down of the pixels in each pattern, which correspond to one of the
Littrow diffraction possibilities.
Referring to FIGS. 18A and 18B, there is shown a schematic
representation indicating the paths of rays that interfere when the
pattern on the second plate, or substrate, is the interrupted
grating pattern of FIG. 16B, showing presence of pure zero-order
light, and the checkerboard pattern of FIG. 16A, showing absence of
pure zero-order light, respectively, when using Littrow angle
diffraction at the second plate. The checkerboard pattern results
in moire-interference fringes of consistently higher contrast.
Referring to FIG. 19, there is shown a schematic representation
illustrating the quasi-Michelson interferometer geometry with the
grating on the first plate, or mask, acting as a dispersing
beam-splitter so the light emerges in a fan-shape with angle a
function of wavelength. The grating may be advantageously designed
to eliminate second-order diffraction. One example is an amplitude
grating with 50% filling. Other designs to eliminate second-order
diffraction are evident to those having ordinary skill in the art
of diffraction, including phase modulation patterns. An advantage
of eliminating second-order diffraction is the avoidance of
back-diffraction toward the observing optics at the first encounter
with the grating, which would complicate the resulting
moire-interference fringes and reduce their contrast.
Referring to FIG. 20, there is shown a graphical representation of
contours of equal intensity in the interference pattern as a
function of gap and angle.
Referring to FIGS. 21A and 21B, there are shown perpendicular cuts
through the graphical representation of FIG. 20 showing cuts at
constant wavelength but varying gap and at constant gap but varying
wavelength, respectively. It is advantageous to use white
illuminating light to furnish a continuous spectrum across the band
of interest. The image of the interference pattern then yields a
measure of the gap without any scanning of the gap.
In the case of a discontinuous spectrum, depending upon the extent
of discontinuity, it may be advantageous to scan the gap and
analyze images at more than one value of gap width. In some cases,
it may be advantageous to image the emerging light upon a
photodiode array, or even upon a single photodiode instead of an
imaging camera. In some cases, it may be advantageous to introduce
a beam-splitter in the viewing optics to allow imaging upon both a
diode array or single diode while simultaneously imaging upon an
imaging camera. In some cases, it may be advantageous to use the
beam-splitter to divide the received light between two imaging
cameras. This arrangement may be especially desirable considering
that the same viewing optics may normally be used for both aligning
and gap measurement functions.
Individual shuttering capability of all three spatial filter holes
allows the gapping and aligning to use the same viewing optics.
It is obvious to anyone skilled in the art that the alignment
methods described herein are not restricted to x-ray lithographic
applications but may in fact be used in other forms of lithography,
and also outside the field of lithography, in any applications
where one movable plate is to be aligned with respect to
another.
Other embodiments are within the claims.
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