U.S. patent number 3,899,711 [Application Number 05/358,735] was granted by the patent office on 1975-08-12 for laminated multi-apertured electrode.
This patent grant is currently assigned to General Electric Company. Invention is credited to Charles Q. Lemmond.
United States Patent |
3,899,711 |
Lemmond |
August 12, 1975 |
Laminated multi-apertured electrode
Abstract
Electron optical lenses having an array of lenslets with each
lenslet of substantially identical size and shape with precise
spacing and alignment are described. Methods for making these
lenses include forming lenslets in lens plates having a thickness
substantially less than the diameter of the lenslets and then
forming a laminated structure with a support plate bonded between
two lens plates to provide mechanical rigidity to the electron
optical lens.
Inventors: |
Lemmond; Charles Q. (Scotia,
NY) |
Assignee: |
General Electric Company
(Schenectady, NY)
|
Family
ID: |
23410820 |
Appl.
No.: |
05/358,735 |
Filed: |
May 9, 1973 |
Current U.S.
Class: |
313/458; 313/402;
313/414 |
Current CPC
Class: |
H01J
29/806 (20130101); H01J 29/06 (20130101); H01J
29/803 (20130101) |
Current International
Class: |
H01J
29/06 (20060101); H01J 29/80 (20060101); H01J
29/46 (20060101); H01J 029/07 (); H01J 029/02 ();
H01J 029/62 () |
Field of
Search: |
;313/69R,402,411,417,444,458,460 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Segal; Robert
Attorney, Agent or Firm: Levinson; Daniel R. Cohen; Joseph
T. Squillaro; Jerome C.
Government Interests
The invention herein described was made in the course of or under a
contract or subcontract thereunder with the Department of Army.
Claims
What I claim as new and desire to secure by Letters Patent of the
U.S. is:
1. An electron optical lens comprising:
a conductive support plate having an array of apertures
therein;
a pair of lens plates, each having the same number of apertures
therein as said support plate and in the same pattern;
said support plate positioned between said lens plates and bonded
thereto with said apertures in substantial alignment;
the apertures in said support plate being larger than the apertures
in said lens plates whereby the electron optical characteristics of
said lens are determined solely by the size and shape of the
apertures in said lens plates;
said apertures characterized by a generally circular shape, the
apertures of said lens plates having a diameter of up to 30 mils
and a center to center spacing of up to 60 mils.
2. The electron optical lens of claim 1 wherein the diameter of the
apertures in one lens plate is greater than that in the other lens
plate.
3. The electron optical lens as set forth in claim 2 wherein the
lens plate having smaller apertures has apertures of up to 10
mils.
4. The electron optical lens of claim 1 wherein said lens plates
have a thickness of between approximately 1 and 25 percent of the
diameter of the apertures in said lens plates.
5. The electron optical lens of claim 4 wherein the thickness of
said support plate is greater than that of said lens plates but
less than one-half the diameter of said apertures.
Description
The present invention relates to electron optical lenses and more
particularly to improved methods of making electron optical lenses
having an array of lenslets of substantially identical size and
shape.
Recent advances in storage density of electron beam addressable
memory systems have improved very stringent requirements on the
electron optical system. One optical system which has been very
useful in high density electron beam addressable memory systems is
described in U.S. Pat. No. 3,534,219 to S. P. Newberry. This patent
describes an electron optical system referred to generally as a
fly's eye lens because it is superficially similar in appearance to
the compound eye of an ordinary housefly. In the fly's eye lens
system, an electron beam is directed to a receiving surface by
first coarsely deflecting the beam in the general direction of a
desired point of impingement on the receiving surface and then
finally deflecting the beam toward the desired point of impingement
so as to correct the path of the beam and then further deflecting
the beam to the precise point of impingement. Apparatus utilized
for this purpose includes a deflection system and a matrix of
electron lenses for directing the electron beam to the desired
point of impingement. The foregoing patent to Newberry describes a
matrix electron lens comprising three substantially parallel
apertured plates. These apertured plates are biased so that the
electron beam passing therethrough is focussed prior to passing
through a fine deflection apparatus.
An improved electron lens comprising two substantially parallel
plates having a plurality of aligned apertures with the spacing
between the plates and the diameters of the apertures determining
the electron optical characteristics of the lens is described in
co-pending application Ser. No. 294,021, filed Oct 2, 1972, by H.
G. Parks et al, and of common assignee as the instant application,
the entire disclosure of which is incorporated herein by reference
thereto. As described in the Parks et al application, the use of a
two-aperture lens system provides a substantial improvement in the
spherical aberration characteristics over the three-element Einzel
lens described in the Newberry patent.
Electron beam addressable memories, such as those described by
Newberry and Parks et al generally employ an electron optical lens
system comprising a plurality of lenslets or apertures for
focussing an electron beam on a target structure. To achieve
uniform beam characteristics on the target, it is necessary to
provide a lens system in which each lenslet is substantially
identical in size and shape with each other lenslet in the array.
This problem becomes paramount when an array of 256 or more
lenslets of 0.030 inch diameter, for example, are required to
exhibit substantially identical operating performance
characteristics. In order to achieve this degree of performance,
dimensional tolerances on lenslet size, shape, spacing and hole
alignment must be in the order of .+-. 0.0001 inch, or
approximately 21/2 microns. This tolerance is placed not only on
the individual lenslet, but also on the lenslet to lenslet spacing
and as a cumulative error across the array of lenslets. These
requirements are extremely difficult to achieve in accord with
prior art techniques.
It is therefore an object of this invention to provide electron
optical lenses which exhibit the aforementioned characteristics and
methods for making the same.
It is another object of this invention to provide methods of making
electron optical lenses having an array of lenslets with each
lenslet having substantially identical size and shape.
It is still a further object of this invention to provide methods
of making electron optical lenses in which dimensional tolerances
on lenslet size, shape, spacing and hole alignment are within
approximately a 0.0001 inch.
Briefly, these and other objects are achieved in accord with one
embodiment of my invention wherein an array of lenslets is etched
in a lens plate having a thickness substantially less than the
diameter of the lenslets and then forming a laminated structure
with a support plate bonded between two lens plates to provide the
necessary mechanical rigidity required. The support plate also
comprises a plurality of apertures equal to the number of lenslets
but having a larger diameter so that the electron optical
characteristics of each lenslet is determined by the diameter of
the lenslet formed in the lens plate rather than by the diameter of
the aperture in the support plate.
In accord with another embodiment of my invention, an electron
optical lens plate is made in a laminated structure including a
support plate sandwiched between two lens plates by
photolithographically etching an array of optically aligned
lenslets in the lens plates and then etching a similar array of
lenslets in the support plate by using the lens plates as an etch
resistant mask for etching the apertures in the support plate.
A better understanding of my invention, as well as other objects
and advantages thereof, will become more apparent to those skilled
in the art from the following detailed description, taken in
connection with the accompanying drawings in which:
FIG. 1 illustrates a partial perspective view of a lens plate made
in accord with prior art techniques;
FIG. 2 is a partial perspective view of an electron optical lens
constructed in accord with one embodiment of my invention; and
FIG. 3 is a partial perspective view of an electron optical lens
constructed in accord with another embodiment of my invention.
Various methods of fabricating electron optical lenses have been
employed to produce lenslets or apertures in a lens plate. For
example, in addition to photolithographic masking and etching
techniques, methods such as electro-chemical machining, precision
drilling, ultrasonic drilling and even laser drilling have been
proposed. While some of these methods can produce an aperture in a
lens plate of the proper diameter with a high degree of
circularity, these methods are unsuitable for producing a large
array of substantially identical apertures having the same size,
shape, spacing and alignment in the order of 0.0001 inch.
One of the requirements which an electron optical lens must satisfy
is a high degree of tolerance to deformation of the lens plate,
such as buckling or bending, which results from electrostatic
forces created by a potential difference between adjacent electron
optical elements. Accordingly, the electron optical lens plates
must be relatively thick to meet this requirement. However, this
requirement makes the formation of an array of apertures of uniform
size, shape, spacing and alignment exceedingly difficult, if not
impossible, with the prior art methods.
FIG. 1 illustrates, by way of example, the results of
photolithographically masking and etching a lenslet 11 in a lens
plate 12. The lens plate 12, for example, may be molybdenum,
titanium, tungsten, or other suitable materials, having a thickness
of approximately 15 to 20 mils. If the lenslet 11 is to have a
diameter of approximately 30 mils, the results of
photolithographically masking and etching simultaneously from both
sides of the lens plate produces a profile substantially similar to
that illustrated in FIG. 1. This lenslet includes necked-down cusps
of metal 13 which vary in size and shape from lenslet to lenslet,
thereby producing lenslets of different sizes and shapes. These
differences in lenslet size and shape undesirably affect the
electron beam characteristics, such as altering the focus thereof
and introducing variable spherical aberration effects.
In accord with one embodiment of my invention, an electron optical
lens having an array of lenslets of substantially identical size,
shape, spacing and alignment is fabricated in a laminated structure
comprising a thick support plate sandwiched between two thin lens
plates. Precision lenslets are formed in the thin lens plates to
the size, shape, spacing and dimensional tolerances required by
selecting a lens plate thickness of less than approximately 25
percent of the lenslet diameter. Also, larger apertures are formed
in the support plate than in the lens plates so that the electron
lens fields are established by the edges of the apertures in the
thin lens plates and not the support plate.
FIG. 2 illustrates a typical electron optical lens constructed in
accord with one embodiment of my invention wherein a relatively
thick (e.g., 0.015 to 0.020 inch) support plate 21 is sandwiched
between lens plates 22 and 23 of between approximately 2.0 and 5.0
mils thickness, for example. Utilizing standard photomasking and
etching techniques, the desired size and shape apertures are etched
in the lens plates 22 and 23. For example, if 30.0 mil apertures on
60 mil centers are to be formed in the lens plates, then a suitable
mask is made, and by standard photomasking and etching techniques,
the apertures are etched through the lens plates. Due to the high
aperture diameter to lens plate thickness, apertures of the desired
size, shape and spacing are readily achieved with high dimensional
tolerances, e.g., a 0.0001 inch.
The support plate is similarly etched, but due to the increased
thickness of the support plate relative to the diameter of the
apertures, the size and shape of the apertures are not precisely
defined. However, in accord with one of the advantages of my
invention, it is not necessary to provide high precision apertures
in the support plate. In fact, it is preferable to produce
apertures of a slightly larger diameter to insure that the
apertures in the lens plates determine the electron optical
characteristics of the lens.
After forming the apertures in the support plate, the laminated
structure is formed by bonding the lens plates to the support
plate. Typically, this is achieved by evaporating films of nickel
and gold on the mating surfaces of each plate and then after
aligning the apertures in the lens plates with the support plate,
the plates are held together firmly and placed in a vacuum furnace
to form a vacuum brazed, laminated structure.
Another method of making electron optical lenses in accord with my
invention includes the use of a pre-laminated structure, such as a
molybdenum plate having a thickness of between 10 and 20 mils, for
example, plated with a thin film of gold, for example, on both
major surfaces of the molybdenum plate. The thickness of the gold
film is typically between 0.2 and 1.0 mils. In accord with this
method of making electron optical lenses, the surfaces of the thin
gold film are covered with a photoresist and exposed through a mask
having the desired lenslet pattern. The photoresist is then
developed and apertures corresponding to the lenslets are etched in
the gold film with a suitable etchant, such as aqua regia. The
unetched portions of the gold film are then utilized as an
etch-resistant mask for etching apertures in the molybdenum support
plate. Typically, a suitable etching solution for this purpose is a
30 to 40 percent warm solution of nitric acid and water. The
molybdenum is etched for a sufficient period of time so that
undercutting of the molybdenum occurs and the diameter of the
aperture is larger than that in the gold films. The resulting
electron optical lens is substantially similar to that illustrated
in FIG. 2.
Still another method of making electron optical lenses in accord
with my invention includes selecting a suitable support plate, such
as a copper plate having a thickness of between approximately 10
and 30 mils thickness, for example, coating the support plate with
a photoresist and exposing the photoresist to a negative of the
desired lenslet pattern to be formed in the support plate. The
photoresist is then developed and the support plate with the
lenslet pattern, in the form of circular mounds of resist, for
example, is then placed in an electroless nickel phosphate bath.
After approximately 20 minutes in this bath, a 0.3 mil thickness of
nickel is plated on those portions of the copper plate not covered
by the photoresist.
The photoresist is then stripped from the support plate, leaving
precisely defined openings in the thin nickel layer. If for some
reason the openings are larger than desired, additional plating may
be employed to reduce the diameter of the openings uniformly. The
plate is then placed in an etching solution, such as chromic
sulphuric acid which etches the copper support plate but not the
nickel. The copper is etched for a sufficient period of time to
produce undercutting so that the diameter of the apertures in the
copper is larger than that in the nickel.
FIG. 3 illustrates a typical electron optical lens constructed in
accord with the electroless plating method wherein the diameters of
the lenslets formed in the thin nickel lens plates 32 and 33 are
different. The different diameter lenslets provide an electron beam
limiting aperture so that an electron beam exiting from the smaller
aperture side of the lens has a smaller diameter than that entering
the larger diameter side of the lens.
In summary, I have described various methods of fabricating
electron optical lenses in which a large array of lenslets having
substantially identical electron optical characteristics are
required. In accord with the methods described herein, arrays of
lenslets of substantially identical size, shape, spacing and hole
alignment are provided with dimensional tolerances in the order of
a 0.0001 inch.
Those skilled in the art can readily appreciate that many
modifications and variations of my invention are possible. For
example, in addition to the various materials described herein for
use as the support plate and as the lens plates, various other
materials may be employed. It is therefore to be understood that
changes may be made in the particular embodiments of the invention
described which fall within the full intended scope of the
invention as defined by the appended claims.
* * * * *