U.S. patent application number 17/398980 was filed with the patent office on 2022-03-31 for debris cleaning device and electroplating system.
The applicant listed for this patent is BOE Technology Group Co., Ltd.. Invention is credited to Pengcheng DONG, Shihao DONG, Qi QI, Shaodong SUN, Chengfei WANG, Junwei YAN, Guangcai YUAN, Guocai ZHANG.
Application Number | 20220098752 17/398980 |
Document ID | / |
Family ID | 1000005827027 |
Filed Date | 2022-03-31 |
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United States Patent
Application |
20220098752 |
Kind Code |
A1 |
YUAN; Guangcai ; et
al. |
March 31, 2022 |
DEBRIS CLEANING DEVICE AND ELECTROPLATING SYSTEM
Abstract
A debris cleaning device includes: a process treatment tank for
containing a liquid medicine and a substrate to be treated, wherein
the bottom of the tank body of the process treatment tank is
provided with a liquid medicine discharge port, and the side wall
of the tank body of the process treatment tank is provided with a
liquid medicine inlet port; and a self-circulation debris removal
system, the self-circulation debris removal system comprising a
circulation pipeline communicating between the liquid medicine
discharge port and the liquid medicine inlet port, the circulation
pipeline being provided with a control valve for controlling the
on-off state of the circulation pipeline, a debris filtering and
collecting device for filtering the debris in the circulation
pipeline, and a power pump for providing circulation driving force
for the liquid medicine in the circulation pipeline.
Inventors: |
YUAN; Guangcai; (Beijing,
CN) ; YAN; Junwei; (Beijing, CN) ; SUN;
Shaodong; (Beijing, CN) ; ZHANG; Guocai;
(Beijing, CN) ; DONG; Shihao; (Beijing, CN)
; WANG; Chengfei; (Beijing, CN) ; DONG;
Pengcheng; (Beijing, CN) ; QI; Qi; (Beijing,
CN) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
BOE Technology Group Co., Ltd. |
Beijing |
|
CN |
|
|
Family ID: |
1000005827027 |
Appl. No.: |
17/398980 |
Filed: |
August 10, 2021 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
C25D 21/06 20130101 |
International
Class: |
C25D 21/06 20060101
C25D021/06 |
Foreign Application Data
Date |
Code |
Application Number |
Sep 30, 2020 |
CN |
202022216543.0 |
Claims
1. A debris cleaning device for cleaning debris generated within
process equipment, the debris cleaning device comprising: a process
treatment tank for containing a liquid medicine and a substrate to
be treated, wherein a bottom of a tank body of the process
treatment tank is provided with a liquid medicine discharge port,
and a side wall of the tank body of the process treatment tank is
provided with a liquid medicine inlet port; and a self-circulation
debris removal system, the self-circulation debris removal system
comprising a circulation pipeline communicating between the liquid
medicine discharge port and the liquid medicine inlet port, wherein
the circulation pipeline is provided with a control valve for
controlling an on-off state of the circulation pipeline, a debris
filtering and collecting device for filtering debris in the
circulation pipeline, and a power pump for providing a circulation
driving force for the liquid medicine in the circulation
pipeline.
2. The debris cleaning device according to claim 1, wherein the
bottom of the tank body of the process treatment tank is a first
inverted conical cavity for guiding the liquid medicine in the
process treatment tank to the liquid medicine discharge port, and a
bottom of the first inverted conical cavity is in communication
with the liquid medicine discharge port.
3. The debris cleaning device according to claim 2, wherein the
control valve includes at least one of a manual valve and a
solenoid valve.
4. The debris cleaning device according to claim 1, wherein the
debris filtering and collecting device comprises: a debris
collector and a filter arranged in sequence from the liquid
medicine discharge port to the liquid medicine inlet port.
5. The debris cleaning device according to claim 4, wherein the
debris collector comprises: a collection box, wherein the
collection box is in a shape of a box body, a liquid inlet and a
liquid outlet are provided at an upper part of the box body of the
collection box, a debris collection cavity for collecting debris is
provided at a lower part of the box body of the collection box, the
debris collection cavity is a second inverted conical cavity, a
debris discharge port for discharging debris is provided at a
bottom of the debris collection cavity, and a cover plate capable
of opening or closing the debris discharge port is provided at the
debris discharge port.
6. The debris cleaning device according to claim 5, wherein the
debris collector further comprises: a filter, the filter being
arranged at the liquid outlet and comprising at least two layers of
filter meshes capable of filtering particles of different
sizes.
7. The debris cleaning device according to claim 6, wherein the
side wall of the second inverted conical cavity at a side where the
liquid inlet is located is an inclined side wall forming an
inclined included angle relative to a horizontal plane, and the
side wall of the second inverted conical cavity at a side where the
liquid outlet is located is a vertical side wall perpendicular to
the horizontal plane.
8. The debris cleaning device according to claim 1, wherein at
least one side wall of the process treatment tank is a liquid
return wall, a plurality of liquid return ports are distributed on
the liquid return wall, and a filtering protection device is
further provided on the liquid return wall for preventing debris in
the process treatment tank from entering the liquid return
port.
9. The debris cleaning device according to claim 8, wherein the
filtering protection device comprises: a frame fixed on the liquid
return wall, and a filter mesh fixed on the frame.
10. The debris cleaning device according to claim 5, wherein a
material of the process treatment tank is transparent; and a
material of the collection box is transparent.
11. An electroplating system comprising: a debris cleaning device
for cleaning debris generated within process equipment, the debris
cleaning device comprising: a process treatment tank for containing
a liquid medicine and a substrate to be treated, wherein a bottom
of a tank body of the process treatment tank is provided with a
liquid medicine discharge port, and a side wall of the tank body of
the process treatment tank is provided with a liquid medicine inlet
port; and a self-circulation debris removal system, the
self-circulation debris removal system comprising a circulation
pipeline communicating between the liquid medicine discharge port
and the liquid medicine inlet port, wherein the circulation
pipeline is provided with a control valve for controlling an on-off
state of the circulation pipeline, a debris filtering and
collecting device for filtering debris in the circulation pipeline,
and a power pump for providing a circulation driving force for the
liquid medicine in the circulation pipeline, wherein the process
treatment tank is an electroplating tank of the electroplating
system.
12. The electroplating system of claim 11, wherein the bottom of
the tank body of the process treatment tank is a first inverted
conical cavity for guiding the liquid medicine in the process
treatment tank to the liquid medicine discharge port, and a bottom
of the first inverted conical cavity is in communication with the
liquid medicine discharge port.
13. The electroplating system of claim 12, wherein the control
valve includes at least one of a manual valve and a solenoid
valve.
14. The electroplating system of claim 11, wherein the debris
filtering and collecting device comprises: a debris collector and a
filter arranged in sequence from the liquid medicine discharge port
to the liquid medicine inlet port.
15. The electroplating system of claim 14, wherein the debris
collector comprises: a collection box, wherein the collection box
is in a shape of a box body, a liquid inlet and a liquid outlet are
provided at an upper part of the box body of the collection box, a
debris collection cavity for collecting debris is provided at a
lower part of the box body of the collection box, the debris
collection cavity is a second inverted conical cavity, a debris
discharge port for discharging debris is provided at a bottom of
the debris collection cavity, and a cover plate capable of opening
or closing the debris discharge port is provided at the debris
discharge port.
16. The electroplating system of claim 15, wherein the debris
collector further comprises: a filter, the filter being arranged at
the liquid outlet and comprising at least two layers of filter
meshes capable of filtering particles of different sizes.
17. The electroplating system of claim 16, wherein the side wall of
the second inverted conical cavity at a side where the liquid inlet
is located is an inclined side wall forming an inclined included
angle relative to a horizontal plane, and the side wall of the
second inverted conical cavity at a side where the liquid outlet is
located is a vertical side wall perpendicular to the horizontal
plane.
18. The electroplating system of claim 11, wherein at least one
side wall of the process treatment tank is a liquid return wall, a
plurality of liquid return ports are distributed on the liquid
return wall, and a filtering protection device is further provided
on the liquid return wall for preventing debris in the process
treatment tank from entering the liquid return port.
19. The electroplating system of claim 18, wherein the filtering
protection device comprises: a frame fixed on the liquid return
wall, and a filter mesh fixed on the frame.
20. The electroplating system according to claim 15, wherein a
material of the process treatment tank is transparent; and a
material of the collection box is transparent.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] The present application claims priority to Chinese Patent
Application No. 202022216543.0 filed in China on Sep. 30, 2020,
which is incorporated herein by reference in its entirety.
TECHNICAL FIELD
[0002] The present disclosure relates to the technical field of
electroplating processes, and more particularly, to a debris
cleaning device and electroplating system.
BACKGROUND
[0003] In the process of electroplating and other processes, the
glass debris accident is inevitable, and the debris should be
cleaned after the debris accident, so as to prevent the debris from
affecting the quality of subsequent processes. At present, after
the debris occurs in the electroplating process, it is necessary to
arrange downtime for liquid drainage, manually enter the
electroplating tank body for operation, and perform electroplating
liquid extraction operation, which increases the operation downtime
and the risk of manual operation as well as the introduction risk
of particles.
SUMMARY
[0004] In a first aspect, embodiments of the present disclosure
provide a debris cleaning device for cleaning debris generated
within process equipment, the debris cleaning device including: a
process treatment tank for containing a liquid medicine and a
substrate to be treated, wherein a bottom of a tank body of the
process treatment tank is provided with a liquid medicine discharge
port, and a side wall of the tank body of the process treatment
tank is provided with a liquid medicine inlet port; and a
self-circulation debris removal system, the self-circulation debris
removal system including a circulation pipeline communicating
between the liquid medicine discharge port and the liquid medicine
inlet port, wherein the circulation pipeline is provided with a
control valve for controlling an on-off state of the circulation
pipeline, a debris filtering and collecting device for filtering
debris in the circulation pipeline, and a power pump for providing
a circulation driving force for the liquid medicine in the
circulation pipeline.
[0005] According to one possible embodiment of the present
disclosure, the bottom of the tank body of the process treatment
tank is a first inverted conical cavity for guiding the liquid
medicine in the process treatment tank to the liquid medicine
discharge port, and a bottom of the first inverted conical cavity
is in communication with the liquid medicine discharge port.
[0006] According to one possible embodiment of the present
disclosure, the control valve includes at least one of a manual
valve and a solenoid valve.
[0007] According to one possible embodiment of the present
disclosure, the debris filtering and collecting device includes: a
debris collector and a filter arranged in sequence from the liquid
medicine discharge port to the liquid medicine inlet port.
[0008] According to one possible embodiment of the present
disclosure, the debris collector includes: a collection box,
wherein the collection box is in a shape of a box body, a liquid
inlet and a liquid outlet are provided at an upper part of the box
body of the collection box, a debris collection cavity for
collecting debris is provided at a lower part of the box body of
the collection box, the debris collection cavity is a second
inverted conical cavity, a debris discharge port for discharging
debris is provided at a bottom of the debris collection cavity, and
a cover plate capable of opening or closing the debris discharge
port is provided at the debris discharge port.
[0009] According to one possible embodiment of the present
disclosure, the debris collector further includes: a filter, the
filter being arranged at the liquid outlet and including at least
two layers of filter meshes capable of filtering particles of
different sizes.
[0010] According to one possible embodiment of the present
disclosure, the side wall of the second inverted conical cavity at
a side where the liquid inlet is located is an inclined side wall
forming an inclined included angle relative to a horizontal plane,
and the side wall of the second inverted conical cavity at a side
where the liquid outlet is located is a vertical side wall
perpendicular to the horizontal plane.
[0011] According to one possible embodiment of the present
disclosure, at least one side wall of the process treatment tank is
a liquid return wall, a plurality of liquid return ports are
distributed on the liquid return wall, and a filtering protection
device is further provided on the liquid return wall for preventing
debris in the process treatment tank from entering the liquid
return port.
[0012] According to one possible embodiment of the present
disclosure, the filtering protection device includes: a frame fixed
on the liquid return wall, and a filter mesh fixed on the
frame.
[0013] According to one possible embodiment of the present
disclosure, a material of the process treatment tank is
transparent; and a material of the collection box is
transparent.
[0014] In a second aspect, embodiments of the present disclosure
also provide an electroplating system including: a debris cleaning
device for cleaning debris generated within process equipment, the
debris cleaning device including: a process treatment tank for
containing a liquid medicine and a substrate to be treated, wherein
a bottom of a tank body of the process treatment tank is provided
with a liquid medicine discharge port, and a side wall of the tank
body of the process treatment tank is provided with a liquid
medicine inlet port; and a self-circulation debris removal system,
the self-circulation debris removal system including a circulation
pipeline communicating between the liquid medicine discharge port
and the liquid medicine inlet port, wherein the circulation
pipeline is provided with a control valve for controlling an on-off
state of the circulation pipeline, a debris filtering and
collecting device for filtering debris in the circulation pipeline,
and a power pump for providing a circulation driving force for the
liquid medicine in the circulation pipeline. Specifically the
process treatment tank is an electroplating tank of the
electroplating system.
[0015] According to one possible embodiment of the present
disclosure, the bottom of the tank body of the process treatment
tank is a first inverted conical cavity for guiding the liquid
medicine in the process treatment tank to the liquid medicine
discharge port, and a bottom of the first inverted conical cavity
is in communication with the liquid medicine discharge port.
[0016] According to one possible embodiment of the present
disclosure, the control valve includes at least one of a manual
valve and a solenoid valve.
[0017] According to one possible embodiment of the present
disclosure, the debris filtering and collecting device includes: a
debris collector and a filter arranged in sequence from the liquid
medicine discharge port to the liquid medicine inlet port.
[0018] According to one possible embodiment of the present
disclosure, the debris collector includes: a collection box,
wherein the collection box is in a shape of a box body, a liquid
inlet and a liquid outlet are provided at an upper part of the box
body of the collection box, a debris collection cavity for
collecting debris is provided at a lower part of the box body of
the collection box, the debris collection cavity is a second
inverted conical cavity, a debris discharge port for discharging
debris is provided at a bottom of the debris collection cavity, and
a cover plate capable of opening or closing the debris discharge
port is provided at the debris discharge port.
[0019] According to one possible embodiment of the present
disclosure, the debris collector further includes: a filter, the
filter being arranged at the liquid outlet and including at least
two layers of filter meshes capable of filtering particles of
different sizes.
[0020] According to one possible embodiment of the present
disclosure, the side wall of the second inverted conical cavity at
a side where the liquid inlet is located is an inclined side wall
forming an inclined included angle relative to a horizontal plane,
and the side wall of the second inverted conical cavity at a side
where the liquid outlet is located is a vertical side wall
perpendicular to the horizontal plane.
[0021] According to one possible embodiment of the present
disclosure, at least one side wall of the process treatment tank is
a liquid return wall, a plurality of liquid return ports are
distributed on the liquid return wall, and a filtering protection
device is further provided on the liquid return wall for preventing
debris in the process treatment tank from entering the liquid
return port.
[0022] According to one possible embodiment of the present
disclosure, the filtering protection device includes: a frame fixed
on the liquid return wall, and a filter mesh fixed on the
frame.
[0023] According to one possible embodiment of the present
disclosure, a material of the process treatment tank is
transparent; and a material of the collection box is
transparent.
BRIEF DESCRIPTION OF THE DRAWINGS
[0024] In order to more clearly explain the embodiments of the
present disclosure or the technical solutions in the related art, a
brief description will be given below with reference to the
accompanying drawings to be used in the description of the
embodiments, and it is obvious that the drawings in the description
below are only some embodiments of the present disclosure, and
other drawings can be obtained from these drawings by a person
skilled in the art without involving any inventive effort.
[0025] FIG. 1 illustrates a schematic view of a debris cleaning
device according to an embodiment of the present disclosure;
[0026] FIG. 2 illustrates a perspective cross-sectional view of a
process treatment tank in a debris cleaning device according to an
embodiment of the present disclosure;
[0027] FIG. 3 illustrates a cross-sectional front view of a process
treatment tank in a debris cleaning device according to an
embodiment of the present disclosure; and
[0028] FIG. 4 illustrates a schematic view of a debris filtering
and collecting device in a debris cleaning device according to an
embodiment of the present disclosure.
DETAILED DESCRIPTION
[0029] To further clarify the objects, technical solutions and
advantages of the embodiments of the present disclosure, a more
particular description of the technical solutions of the present
disclosure will be rendered by reference to the appended drawings.
Obviously, the embodiments described in the present disclosure are
part of the all embodiments, in which some, but not all embodiments
of the disclosure are shown. Based on the embodiments in the
present disclosure, all other embodiments obtained by a person
skilled in the art are within the protection scope of this
disclosure.
[0030] In the description of the present disclosure, it should be
understood that the orientation or positional relationship
indicated by the terms "center", "upper", "lower", "left", "right",
"vertical", "horizontal", "inner", "outer", and the like is based
on the orientation or positional relationship shown in the
drawings, and is merely for convenience of describing the
disclosure and simplifying the description, but not intended or
implied that the referenced device or element must have a
particular orientation, be constructed and operated in a particular
orientation, and thus should not be construed as limiting the
present disclosure. The terms "first", "second" and "third" are
used for descriptive purposes only and are not to be construed as
indicating or implying relative importance.
[0031] Before describing in detail the debris cleaning device
provided by embodiments of the present disclosure, it is necessary
to describe the related art as follows.
[0032] In the related art, the electrochemical deposition process
is a low-cost chemical film-forming method, and can deposit a metal
with a thickness of 2-20 .mu.m, so as to obtain a lower resistance.
Currently, products such as a Mini LED backplate and so on, and the
manufacture of a nano-imprinting template and the manufacture of a
liquid crystal antenna can be realized by the electrochemical
deposition method. The deposition of metal thin film with the
thickness of 2-20 .mu.m on the glass substrate can reduce the
resistance value, reduce the heating phenomenon and significantly
improve the service life. At present, there are three ways to
deposit metal thin film on glass substrate: sputtering,
electroplating and electroless plating. Sputtering thick film costs
long time and the efficiency is low, and the horizontal deposition
mode of the electroless plating has the risk of inclusion of
foreign matter, while electroplating has the advantages of high
efficiency, low stress and low risk. In the electroplating process,
the glass debris accident is inevitable. It is particularly
critical that the debris is cleaned after the debris accident to
prevent the impact of the debris on the quality of the subsequent
process and that the equipment is protected to prevent the debris
from causing downtime or causing damage and impact to pumping of
the system, filtration system and pipeline. At present, after the
debris occurs in the electroplating process, it is necessary to
arrange downtime for liquid drainage, manually enter into the
electroplating tank body for operation, and perform electroplating
liquid extraction operation, which increases the operation downtime
and the risk of manual operation as well as the introduction risk
of particles.
[0033] As shown in FIG. 1, embodiments of the present disclosure
provide a debris cleaning device for cleaning debris generated
within a process equipment, the debris cleaning device
including:
[0034] a process treatment tank 100 for containing a liquid
medicine and a substrate 10 to be treated, wherein a bottom of a
tank body of the process treatment tank 100 is provided with a
liquid medicine discharge port 110, and a side wall of the tank
body of the process treatment tank 100 is provided with a liquid
medicine inlet port 120; and
[0035] a self-circulation debris removal system 200, the
self-circulation debris removal system 200 including a circulation
pipeline 210 communicating between the liquid medicine discharge
port 110 and the liquid medicine inlet port 120, wherein the
circulation pipeline 210 is provided with a control valve for
controlling an on-off state of the circulation pipeline 210, a
debris filtering and collecting device 220 for filtering debris in
the circulation pipeline 210, and a power pump 230 for providing a
circulation driving force for the liquid medicine in the
circulation pipeline 210.
[0036] In the debris cleaning device according to the embodiments
of the present disclosure, a liquid medicine discharge port 110 is
provided at the bottom of a process treatment tank 100, and taking
the process treatment tank 100 as an electroplating tank as an
example, the liquid medicine discharge port 110 is in communication
with a liquid medicine inlet port 120 on the process treatment tank
100 via a pipeline of the self-circulation debris removal system
200. Thus, when substrate debris occurs during electroplating, the
debris is deposited at the bottom of the process treatment tank 100
by its own weight, facilitating the next step of discharging the
debris out of the process treatment tank 100 through the
self-circulation debris removal system 200. The discharged liquid
medicine enters the pipeline of the self-circulation debris removal
system 200, the control valve controls the opening of the pipeline,
and the liquid medicine enters the liquid medicine inlet port 120
of the process treatment tank 100 after passing through the debris
filtering and collecting device 220 on the pipeline of the
self-circulation debris removal system 200 by the driving force
provided by the power pump 230. Specifically, the debris filtering
and collecting device 220 filters debris and other impurities to
ensure the cleanliness of the liquid medicine in the tank body
entering the process treatment tank 100 through the
self-circulation debris removal system 200.
[0037] It can be seen therefrom that the debris cleaning device
according to the embodiments of the present disclosure can achieve
the effect of automatically cleaning debris out of the process
treatment tank 100 by using the fluid-related principle through the
self-circulation debris removal system 200, and does not need to
perform electroplating liquid extraction and manual entry into the
tank body operation every time when debris occurs, reducing the
operation downtime and the risk of manual operation as well as the
introduction risk of particles, and enabling electroplating liquid
to be recycled, and thus saving costs.
[0038] In some exemplary embodiments, the liquid medicine discharge
port 110 at the bottom of the tank body of the process treatment
tank 100 may have a diameter of 200-500 mm to facilitate the
discharge of liquid medicine and debris. In particular, the liquid
medicine discharge port 110 at the bottom of the tank body of the
process treatment tank 100 may have a diameter of 350 mm to
facilitate the discharge of liquid medicine and debris. It is
understood, of course, that the size of the liquid medicine
discharge port 110 is not limited in practical use.
[0039] Furthermore, in some exemplary embodiments, as shown in
FIGS. 1 to 3, the bottom of the tank body of the process treatment
tank 100 is a first inverted conical cavity 130 for guiding the
liquid medicine in the process treatment tank 100 to the liquid
medicine discharge port 110, and the bottom of the first inverted
conical cavity 130 is in communication with the liquid medicine
discharge port 110.
[0040] With the above-mentioned solution, the bottom of the tank
body of the process treatment tank 100 is a first inverted conical
cavity 130, and the inner side wall of the first inverted conical
cavity 130 is an inclined smooth surface which is inclined with
respect to the horizontal plane, so that it is more advantageous
that the debris deposits on the liquid medicine discharge port 110
at the bottom of the process treatment tank 100 by its own
weight.
[0041] It should be noted that the angle of inclination of the
inner side wall of the first inverted conical cavity 130, i.e. the
angle of inclination of the inner side wall of the first inverted
conical cavity 130 with respect to the horizontal plane, may be
between 45.degree. and 75.degree., so that the first inverted
conical cavity 130 is less likely to accumulate debris at the
corners formed by the first inverted conical cavity 130 and the
channel body of the process treatment tank 100 while facilitating
debris deposition at the bottom of the channel body. In particular,
the angle of inclination of the inner side wall of the first
inverted conical cavity 130 may be set at 60.degree..
[0042] In addition, it should be noted that the process treatment
tank 100 may be made of transparent materials to facilitate
observation of debris within the tank body. For example, the
transparent material selected may be glass, polymethyl methacrylate
(PMMA), polystyrene (PS), polycarbonate (PC), styrene acrylonitrile
(AS and SAN), styrene-methyl methacrylate copolymer (MS), etc.
[0043] Further, as shown in FIGS. 2 and 3, in some embodiments, to
enhance the strength of the process treatment tank 100, a
structural cross beam 140 may be provided on top of the first
inverted conical cavity 130. In addition, the structural cross beam
140 may be integrally formed with the first inverted conical cavity
130. Of course, it is also possible to provide the structural cross
beam 140 and the first inverted conical cavity 130 in a separate
manner and fixedly connect the structural cross beam 140 and the
first inverted conical cavity 130 by a conventional fixing
manner.
[0044] In some exemplary embodiments, as shown in FIG. 1, the
control valve includes a manual valve 240 and a solenoid valve 250
arranged in sequence from the liquid medicine discharge port 110 to
the liquid medicine inlet port 120. The solenoid valve 250 may
enable automatic valve on-off control when debris is present in the
process treatment tank 100 to be cleaned (e.g. the solenoid valve
250 may be controlled to open via a human-machine interface to
automatically clean debris when debris generation is observed by an
operator), thereby controlling the pipeline on-off of the
self-circulation debris removal system 200. Specifically, normal
operation of the solenoid valve 250 is an Always-ON state, i.e. the
pipeline of the self-circulation debris removal system 200 is
controlled to be OFF during normal operation, and the pipeline of
the self-circulation debris removal system 200 is controlled to be
ON only during debris cleaning. The manual valve 240 is in an
Always-OFF state, and in the event of a failure or maintenance of
the solenoid valve 250, the manual valve 240 may be manually turned
ON to turn OFF the pipeline of the self-circulation debris removal
system 200 to manually control the communication of liquid medicine
between the pipeline of the self-circulation debris removal system
200 and the process treatment tank 100.
[0045] It will of course be understood that in other embodiments,
the control valve may also include only a manual valve 240, or only
a solenoid valve 250.
[0046] Further, in some exemplary embodiments, as shown in FIG. 1,
the debris filtering and collecting device 220 includes: a debris
collector 221 and a filter 222 arranged in sequence from the liquid
medicine discharge port 110 to the liquid medicine inlet port 120
(namely, in a counterclockwise direction).
[0047] With the above-mentioned solution, the debris collector 221
is located in front of the filter 222 in the direction from the
liquid medicine discharge port 110 to the liquid medicine inlet
port 120 (namely, in a counterclockwise direction), thereby
facilitating the disassembly between the debris filtering and
collecting device 220.
[0048] Illustratively, as shown in FIGS. 1 and 4, the debris
collector 221 includes: a collection box 2211, wherein the
collection box 2211 is in the shape of a box body, a liquid inlet
2212 and a liquid outlet 2213 are provided at the upper part of the
box body of the collection box 2211, a debris collection cavity
2214 for collecting debris is provided at the lower part of the box
body of the collection box 2211, a debris discharge port (not
shown) for discharging debris is provided at the bottom of the
debris collection cavity 2214, and a cover plate 2215 capable of
opening or closing the debris discharge port is provided at the
debris discharge port.
[0049] With the above-mentioned solution, the collection box 2211
of the debris collector 221 includes a liquid inlet 2212 and a
liquid outlet 2213 at the upper part of the box body, and a debris
collection cavity 2214 at the lower part of the box body, such that
when the liquid medicine enters the collection box 2211 from the
liquid inlet 2212, the liquid medicine sinks to the debris
collection cavity 2214 by its own weight, and then the liquid
medicine is discharged out of the collection box 2211 via the
liquid outlet 2213. A cover plate 2215 capable of opening or
closing the debris discharge port is provided at the debris
discharge port, and when a certain amount of debris is collected,
the cover plate is removed and cleaned.
[0050] In some embodiments, the cover plate 2215 is provided with a
locking mechanism 2216 for opening or closing the cover plate
2215.
[0051] Further, in some exemplary embodiments, as shown in FIG. 4,
the debris collection cavity 2214 is a second inverted conical
cavity. The bottom of the tank body of the debris collection cavity
2214 is a second inverted conical cavity, and the inner side wall
of the second inverted conical cavity is an inclined smooth surface
which is inclined with respect to the horizontal plane, so that it
is more advantageous that debris deposits on the debris collection
cavity 2214 by its own weight.
[0052] It should be noted that the angle of inclination of the
inner side wall of the second inverted conical cavity may be
between 45.degree. and 75.degree., so that the second inverted
conical cavity is less likely to accumulate debris at the corners
formed by the second inverted conical cavity and the debris
collection cavity 2214 while facilitating debris deposition at the
bottom of the debris collection cavity 2214. In particular, the
angle of inclination of the inner side wall of the second inverted
conical cavity may be set at 60.degree..
[0053] Further, in some exemplary embodiments, as shown in FIG. 4,
the debris collector 221 further includes: a filter 222 provided at
the liquid outlet 2213 (in FIG. 4, for the sake of clarity, the
filter 222 is illustrated at a certain interval from the liquid
outlet 2213 with respect to the flow direction of the liquid
medicine, but a person skilled in the art would understand that the
illustrated interval may not exist), the filter 222 including at
least two layers of filter meshes capable of filtering particles of
different sizes. Here, the number of layers of the filter meshes
may be set according to actual needs, and is not limited thereto.
The side wall of the second inverted conical cavity at a side where
the liquid inlet 2212 is located is an inclined side wall 2217
forming an inclined included angle relative to a horizontal plane,
and the side wall of the second inverted conical cavity at a side
where the liquid outlet 2213 is located is a vertical side wall
2218 perpendicular to the horizontal plane.
[0054] With the above-mentioned solution, the inclined side wall
2217 facilitates debris deposition at the bottom of the debris
collection cavity 2214, the filter mesh is provided at the liquid
outlet 2213, so that the debris can be blocked by the filter mesh,
and the vertical side wall 2218 aids the debris blocked by the
filter mesh in smoothly falling to the bottom of the debris
collection cavity 2214 for collection, without easily causing
debris blocked by the filter mesh to accumulate at the liquid
outlet 2213.
[0055] Further, in some embodiments, the collection box 2211 is a
transparent box to facilitate observation of debris accumulation
within the collection box 2211. The collection box 2211 may be made
of a transparent material to facilitate observation of debris
accumulation within the collection box 2211. For example, the
transparent material selected may be glass, polymethyl methacrylate
(PMMA), polystyrene (PS), polycarbonate (PC), styrene acrylonitrile
(AS and SAN), styrene-methyl methacrylate copolymer (MS), etc.
[0056] Furthermore, in the related art, the process treatment tank
usually has a liquid return wall, and liquid return ports are
distributed on the liquid return wall; when debris occurs, the
debris can enter the liquid return system via the liquid return
port, causing damage and impact to pumping of the system, filtering
system and pipeline.
[0057] In addition, in one embodiment of the present disclosure, as
shown in FIG. 3, in some exemplary embodiments of the present
disclosure, at least one side wall of the process treatment tank
100 is a liquid return wall 115, a plurality of liquid return ports
are distributed on the liquid return wall 115, and a filtering
protection device 116 is further provided on the liquid return wall
115 for preventing debris in the process treatment tank 100 from
entering the liquid return port.
[0058] With the above-mentioned solution, the filtering protection
device is mounted on the liquid return wall of the process
treatment tank 100, and can effectively prevent debris from
entering the liquid return port and damaging the pumping, filtering
system and pipeline.
[0059] In some exemplary embodiments, as shown in FIG. 3, the
filter protection device 116 further includes, for example: a frame
117 fixed on the liquid return wall, and a filter mesh 118 fixed on
the frame 117.
[0060] The frame and the filter mesh should be made of an
acid-alkali resistant material, such as PP (polypropylene).
[0061] In addition, the area of the liquid return wall is large,
and in order to ensure the installation stability of the filter
mesh, as shown in FIG. 3, in some embodiments, the frame 117 may
include a hollow main frame 1171, and at least one cross beam 1172
and at least one vertical beam 1173, wherein the cross beam 1172
and the vertical beam 1173 are arranged crosswise, and the hollow
area of the hollow main frame 1171 is divided into a plurality of
fixed areas, and a filter mesh 118 is arranged in each fixed
area.
[0062] It will be understood, of course, that the particular
configuration of the filter protection device 116 is not limited in
practice.
[0063] Furthermore, it should be noted that the debris cleaning
device according to the embodiments of the present disclosure is
applicable to the electrochemical deposition process of a glass
substrate, and can be applied to the field of electrochemical
deposition of glass substrates with different sizes, and can also
be applied to the relevant field of electrochemical deposition of
metals such as Ni and Ag.
[0064] In addition, the debris cleaning device according to the
embodiments of the present disclosure can also be applied to the
field of debris cleaning and protection of other process treatment
equipment such as for cleaning, drying, acid washing, alkaline
washing, etc.
[0065] There are several points needing to be explained as
follows:
[0066] (1) the drawings of the embodiments of the present
disclosure relate only to the structures related to the embodiments
of the present disclosure, and other structures can be generally
designed according to the embodiments and drawings of the present
disclosure.
[0067] (2) for purposes of clarity, the thickness of layers or
areas is exaggerated or reduced in the drawings used to describe
the embodiments of the present disclosure, i.e. the drawings are
not necessarily to drawn as the actual proportions; it can be
understood that when an element such as a layer, film, area or
substrate is referred to as being "upper" or "lower" located on the
other element, it can be "directly upper" or "lower" located on the
other element or intervening elements may be present.
[0068] (3) without conflict, the embodiments of the present
disclosure and features of the embodiments may be combined to yield
new embodiments.
[0069] The above descriptions are only the specific implementation
of this disclosure, and the protection scope of this disclosure is
not limited thereto, and the protection scope of this disclosure
should be subject to the protection scope of the claims.
* * * * *