Mask Blank, Transfer Mask, And Method For Manufacturing Semiconductor Device

HASHIMOTO; Masahiro ;   et al.

Patent Application Summary

U.S. patent application number 17/331955 was filed with the patent office on 2021-09-16 for mask blank, transfer mask, and method for manufacturing semiconductor device. This patent application is currently assigned to HOYA CORPORATION. The applicant listed for this patent is HOYA CORPORATION. Invention is credited to Masahiro HASHIMOTO, Hiroaki SHISHIDO.

Application Number20210286254 17/331955
Document ID /
Family ID1000005613645
Filed Date2021-09-16

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