U.S. patent application number 16/268874 was filed with the patent office on 2020-02-13 for fan-out semiconductor package.
This patent application is currently assigned to SAMSUNG ELECTRONICS CO., LTD.. The applicant listed for this patent is SAMSUNG ELECTRONICS CO., LTD.. Invention is credited to Sung Hawn Bae, Won Choi, Jung Soo Kim, Sung Hoan Kim.
Application Number | 20200051918 16/268874 |
Document ID | / |
Family ID | 69406402 |
Filed Date | 2020-02-13 |
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United States Patent
Application |
20200051918 |
Kind Code |
A1 |
Bae; Sung Hawn ; et
al. |
February 13, 2020 |
FAN-OUT SEMICONDUCTOR PACKAGE
Abstract
A fan-out semiconductor package includes: a frame, including a
wiring layer, and having a through-hole; a semiconductor chip
disposed in the through-hole, and including a connection pad; an
encapsulant covering at least a portion of each of the frame and an
inactive surface of the semiconductor chip, and having a first
opening exposing at least a portion of the wiring layer; an
insulating layer disposed on the encapsulant, and having a second
opening formed in the first opening to expose at least a portion of
the wiring layer; a conductive pattern layer disposed on the
insulating layer; a conductive via disposed in the second opening;
and a connection structure disposed on the frame and an active
surface of the semiconductor chip, and including one or more
redistribution layers. The conductive pattern layer and the
redistribution layer are electrically connected to the connection
pad.
Inventors: |
Bae; Sung Hawn; (Suwon-si,
KR) ; Kim; Jung Soo; (Suwon-si, KR) ; Choi;
Won; (Suwon-si, KR) ; Kim; Sung Hoan;
(Suwon-si, KR) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
SAMSUNG ELECTRONICS CO., LTD. |
Suwon-si |
|
KR |
|
|
Assignee: |
SAMSUNG ELECTRONICS CO.,
LTD.
Suwon-si
KR
|
Family ID: |
69406402 |
Appl. No.: |
16/268874 |
Filed: |
February 6, 2019 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 2225/1035 20130101;
H01L 2924/3025 20130101; H01L 2924/18162 20130101; H01L 24/19
20130101; H01L 25/105 20130101; H01L 24/09 20130101; H01L 23/49816
20130101; H01L 2224/0401 20130101; H01L 2224/18 20130101; H01L
23/562 20130101; H01L 2924/3511 20130101; H01L 24/17 20130101; H01L
2224/12105 20130101; H01L 2225/1058 20130101; H01L 23/5226
20130101; H01L 23/3128 20130101; H01L 23/5386 20130101; H01L
2224/02379 20130101; H01L 23/5383 20130101; H01L 23/5389 20130101;
H01L 2924/19105 20130101; H01L 24/20 20130101; H01L 2224/04105
20130101; H01L 25/18 20130101; H01L 2225/1041 20130101; H01L
2224/18 20130101; H01L 2924/0001 20130101 |
International
Class: |
H01L 23/538 20060101
H01L023/538; H01L 23/00 20060101 H01L023/00; H01L 23/522 20060101
H01L023/522; H01L 23/31 20060101 H01L023/31; H01L 25/18 20060101
H01L025/18 |
Foreign Application Data
Date |
Code |
Application Number |
Aug 7, 2018 |
KR |
10-2018-0091938 |
Claims
1. A fan-out semiconductor package, comprising: a frame, including
a wiring layer, and having a through-hole; a semiconductor chip
disposed in the through-hole, and having an active surface on which
a connection pad is disposed and an inactive surface opposite to
the active surface; an encapsulant covering at least a portion of
each of the frame and the inactive surface of the semiconductor
chip, and having a first opening exposing at least a portion of the
wiring layer; an insulating layer disposed on the encapsulant, and
having a second opening formed in the first opening to expose at
least a portion of the wiring layer; a conductive pattern layer
disposed on the insulating layer; a conductive via disposed in the
second opening, and electrically connecting the wiring layer to the
conductive pattern layer; and a connection structure disposed on
the frame and the active surface of the semiconductor chip, and
including one or more redistribution layers, wherein the conductive
pattern layer and the redistribution layer are electrically
connected to the connection pad.
2. The fan-out semiconductor package of claim 1, wherein the
insulating layer fills at least a portion between the first opening
and the second opening.
3. The fan-out semiconductor package of claim 2, wherein the
conductive via is spaced apart from the encapsulant by the
insulating layer filling the portion of the first opening.
4. The fan-out semiconductor package of claim 1, wherein the
encapsulant and the insulating layer have different physical
properties.
5. The fan-out semiconductor package of claim 4, wherein the
encapsulant includes a non-photosensitive insulating material, and
the insulating layer includes a photosensitive insulating
material.
6. The fan-out semiconductor package of claim 4, wherein the
encapsulant and the insulating layer are non-photosensitive
insulating layers having different physical properties.
7. The fan-out semiconductor package of claim 1, further
comprising: a reinforcing layer disposed between the encapsulant
and the insulating layer, wherein the first opening passes through
the reinforcing layer, and the reinforcing layer has an elastic
modulus greater than an elastic modulus of each of the encapsulant
and the insulating layer.
8. The fan-out semiconductor package of claim 7, wherein the
conductive via is spaced apart from the reinforcing layer by the
insulating layer filling the portion of the first opening.
9. The fan-out semiconductor package of claim 7, wherein the
reinforcing layer includes a glass fiber, an inorganic filler, and
an insulating resin.
10. The fan-out semiconductor package of claim 7, further
comprising: a resin layer disposed between the reinforcing layer
and the insulating layer, wherein the first opening passes through
the resin layer, and the reinforcing layer has an elastic modulus
greater than an elastic modulus of the resin layer.
11. The fan-out semiconductor package of claim 10, wherein the
conductive via is spaced apart from the resin layer by the
insulating layer filling the portion of the first opening.
12. The fan-out semiconductor package of claim 1, further
comprising: a cover layer disposed on the insulating layer, and
having a third opening exposing at least a portion of the
conductive pattern layer.
13. The fan-out semiconductor package of claim 12, wherein a
surface treatment layer is disposed on a surface of the conductive
pattern layer exposed by the third opening of the cover layer.
14. The fan-out semiconductor package of claim 1, wherein the frame
includes a first insulating layer in contact with the connection
structure, a first wiring layer in contact with the connection
structure and embedded in the first insulating layer, a second
wiring layer disposed on a side of the first insulating layer
opposite to a side of the first insulating layer in which the first
wiring layer is embedded, a second insulating layer disposed on a
side of the first insulating layer opposite to a side of the first
insulating layer in which the first wiring layer is embedded and
covering at least a portion of the second wiring layer, a third
wiring layer disposed on a side of the second insulating layer
opposite to a side of the second insulating layer in which the
second wiring layer is embedded, a first wiring via passing through
the first insulating layer and electrically connecting the first
wiring layer to the second wiring layer, and a second wiring via
passing through the second insulating layer and electrically
connecting the second wiring layer to the third wiring layer.
15. The fan-out semiconductor package of claim 14, wherein the
wiring layer exposed by the first opening and the second opening is
a portion of the third wiring layer.
16. The fan-out semiconductor package of claim 1, wherein the frame
includes a first insulating layer, a first wiring layer disposed on
one side of the first insulating layer, a second wiring layer
disposed on the other side of the first insulating layer, a second
insulating layer disposed on one side of the first insulating layer
and covering at least a portion of the first wiring layer, a third
wiring layer disposed on a side of the second insulating layer
opposite to a side of the second insulating layer in which the
first wiring layer is embedded, a third insulating layer disposed
on the other side of the first insulating layer and covering at
least a portion of the second wiring layer, a fourth wiring layer
disposed on a side of the third insulating layer opposite to a side
of the third insulating layer in which the second wiring layer is
embedded, a first wiring via passing through the first insulating
layer and electrically connecting the first wiring layer to the
second wiring layer, a second wiring via passing through the second
insulating layer and electrically connecting the first wiring layer
to the third wiring layer, and a third wiring via passing through
the third insulating layer and electrically connecting the second
wiring layer to the fourth wiring layer.
17. The fan-out semiconductor package of claim 16, wherein the
wiring layer exposed by the first opening and the second opening is
a portion of the fourth wiring layer.
18. A fan-out semiconductor package, comprising: a first connection
structure including one or more redistribution layers; a second
connection structure disposed on the first connection structure,
and having an electrical connection member electrically connected
to the redistribution layer; a semiconductor chip disposed on the
first connection structure, and having a connection pad
electrically connected to the one or more redistribution layers; an
encapsulant disposed on the first connection structure, covering at
least a portion of each of the second connection structure and the
semiconductor chip, and having a first opening exposing at least a
portion of the electrical connection member; and an insulating
layer disposed on the encapsulant, and having a second opening
formed in the first opening to expose at least a portion of the
electrical connection member, wherein the encapsulant and the
insulating layer include different materials.
19. The fan-out semiconductor package of claim 18, wherein the
insulating layer covers a wall surface of the first opening.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application claims the benefit of priority to Korean
Patent Application No. 10-2018-0091938, filed on Aug. 7, 2018 with
the Korean Intellectual Property Office, the entirety of which is
incorporated herein by reference.
TECHNICAL FIELD
[0002] The present disclosure relates to a semiconductor package,
for example, to a fan-out semiconductor package.
BACKGROUND
[0003] A significant recent trend in the development of technology
related to semiconductor chips has been reductions in the sizes of
semiconductor chips. Therefore, in the field of package technology,
in accordance with a rapid increase in demand for small-sized
semiconductor chips, or the like, the implementation of a
semiconductor package, having a compact size, while including a
plurality of pins, has been demanded. One type of package
technology suggested to satisfy the technical demand, described
above, is a fan-out package. Such a fan-out package has a compact
size and may allow a plurality of pins to be implemented by
redistributing connection terminals outwardly of a region in which
a semiconductor chip is disposed.
[0004] Meanwhile, in recent years, it has been necessary to form a
backside circuit in a semiconductor package structure in order to
improve electrical characteristics of a premium smartphone product
and to efficiently utilize space. Moreover, requirements for lines
and spaces of a backside circuit are increased in accordance with a
demand for enhancement of characteristics of a chip and reduction
in an area.
SUMMARY
[0005] An aspect of the present disclosure provides a fan-out
semiconductor package structure capable of easily forming a
conductive pattern layer and a conductive via on an encapsulant
regardless of material of an encapsulant, and having excellent
reliability of a conductive via.
[0006] According to an aspect of the present disclosure, an opening
of an encapsulant is filled with an insulating layer, and an
opening is reformed in the opening of the encapsulant, filled with
the insulating layer. In the method described above, a via hole of
a conductive via is implemented on an encapsulant.
[0007] According to an aspect of the present disclosure, a fan-out
semiconductor package includes: a frame, including a wiring layer,
and having a through-hole; a semiconductor chip disposed in the
through-hole, and having an active surface on which a connection
pad is disposed and an inactive surface opposite to the active
surface; an encapsulant covering at least a portion of each of the
frame and the inactive surface of the semiconductor chip, and
having a first opening exposing at least a portion of the wiring
layer; an insulating layer disposed on the encapsulant, and having
a second opening formed in the first opening to expose at least a
portion of the wiring layer; a conductive pattern layer disposed on
the insulating layer; a conductive via disposed in the second
opening, and electrically connecting the wiring layer to the
conductive pattern layer; and a connection structure disposed on
the frame and the active surface of the semiconductor chip, and
including one or more redistribution layers. The conductive pattern
layer and the redistribution layer are electrically connected to
the connection pad.
[0008] According to an aspect of the present disclosure, a fan-out
semiconductor package includes: a first connection structure
including one or more redistribution layers; a second connection
structure disposed on the first connection structure, and having an
electrical connection member electrically connected to the one or
more redistribution layers; a semiconductor chip disposed on the
first connection structure, and having a connection pad
electrically connected to the redistribution layer; an encapsulant
disposed on the first connection structure, covering at least a
portion of each of the second connection structure and the
semiconductor chip, and having a first opening exposing at least a
portion of the electrical connection member; and an insulating
layer disposed on the encapsulant, and having a second opening
formed in the first opening to expose at least a portion of the
electrical connection member. The encapsulant and the insulating
layer include different materials.
BRIEF DESCRIPTION OF DRAWINGS
[0009] The above and other aspects, features, and advantages of the
present disclosure will be more clearly understood from the
following detailed description taken in conjunction with the
accompanying drawings, in which:
[0010] FIG. 1 is a block diagram schematically illustrating an
example of an electronic device system;
[0011] FIG. 2 is a schematic perspective view illustrating an
example of an electronic device;
[0012] FIGS. 3A and 3B are schematic cross-sectional views
illustrating states of a fan-in semiconductor package before and
after being packaged;
[0013] FIG. 4 is schematic cross-sectional views illustrating a
packaging process of a fan-in semiconductor package;
[0014] FIG. 5 is a schematic cross-sectional view illustrating a
case in which a fan-in semiconductor package is mounted on a
printed circuit board and is ultimately mounted on a mainboard of
an electronic device;
[0015] FIG. 6 is a schematic cross-sectional view illustrating a
case in which a fan-in semiconductor package is embedded in a
printed circuit board and is ultimately mounted on a mainboard of
an electronic device;
[0016] FIG. 7 is a schematic cross-sectional view illustrating a
fan-out semiconductor package;
[0017] FIG. 8 is a schematic cross-sectional view illustrating a
case in which a fan-out semiconductor package is mounted on a
mainboard of an electronic device;
[0018] FIG. 9 is a schematic cross-sectional view illustrating an
example of a fan-out semiconductor package;
[0019] FIG. 10 is a schematic plan view taken along line I-I' of
the semiconductor package of FIG. 9;
[0020] FIGS. 11A and 11B are schematic process drawings
illustrating a process for forming a first opening and a second
opening for a conductive via of the fan-out semiconductor package
of FIG. 9;
[0021] FIG. 12 illustrates another example of a fan-out
semiconductor package;
[0022] FIG. 13 illustrates another example of a fan-out
semiconductor package;
[0023] FIG. 14 illustrates another example of a fan-out
semiconductor package;
[0024] FIG. 15 illustrates another example of a fan-out
semiconductor package; and
[0025] FIG. 16 illustrates another example of a fan-out
semiconductor package.
DETAILED DESCRIPTION
[0026] Hereinafter, embodiments of the present disclosure will be
described as follows with reference to the attached drawings.
[0027] The present disclosure may, however, be exemplified in many
different forms and should not be construed as being limited to the
specific embodiments set forth herein. Rather, these embodiments
are provided so that this disclosure will be thorough and complete,
and will fully convey the scope of the disclosure to those skilled
in the art.
[0028] Throughout the specification, it will be understood that
when an element, such as a layer, region or wafer (substrate), is
referred to as being `on,` `connected to,` or `coupled to` another
element, it can be directly `on,` `connected to,` or `coupled to`
the other element or other elements intervening therebetween may be
present. In contrast, when an element is referred to as being
`directly on,` `directly connected to,` or `directly coupled to`
another element, there may be no other elements or layers
intervening therebetween. Like numerals refer to like elements
throughout. As used herein, the term `and/or` includes any and all
combinations of one or more of the associated listed items.
[0029] It will be apparent that although the terms first, second,
third, etc. may be used herein to describe various members,
components, regions, layers and/or sections, any such members,
components, regions, layers and/or sections should not be limited
by these terms. These terms are only used to distinguish one
member, component, region, layer or section from another region,
layer or section. Thus, a first member, component, region, layer or
section discussed below could be termed a second member, component,
region, layer or section without departing from the teachings of
the exemplary embodiments.
[0030] Spatially relative terms, such as `above,` `upper,` `below,`
and `lower` and the like, may be used herein for ease of
description to describe one element's relationship relative to
another element(s) as shown in the figures. It will be understood
that spatially relative terms are intended to encompass different
orientations of the device in use or operation, in addition to the
orientation depicted in the figures. For example, if the device in
the figures is turned over, elements described as `above,` or
`upper` relative to other elements would then be oriented `below,`
or `lower` relative to the other elements or features. Thus, the
term `above` can encompass both the above and below orientations
depending on a particular direction of the figures. The device may
be otherwise oriented (rotated 90 degrees or at other orientations)
and the spatially relative descriptors used herein may be
interpreted accordingly.
[0031] The terminology used herein describes particular embodiments
only, and the present disclosure is not limited thereby. As used
herein, the singular forms `a,` `an,` and `the` are intended to
include the plural forms as well, unless the context clearly
indicates otherwise. It will be further understood that the terms
`comprises,` and/or `comprising` when used in this specification,
specify the presence of stated features, integers, steps,
operations, members, elements, and/or groups thereof, but do not
preclude the presence or addition of one or more other features,
integers, steps, operations, members, elements, and/or groups
thereof.
[0032] Hereinafter, embodiments of the present disclosure will be
described with reference to schematic views illustrating
embodiments of the present disclosure. In the drawings, for
example, due to manufacturing techniques and/or tolerances,
modifications of the shape shown may be estimated. Thus,
embodiments of the present disclosure should not be construed as
being limited to the particular shapes of regions shown herein, for
example, to include a change in shape results in manufacturing. The
following embodiments may also be constituted alone, in combination
or in partial combination.
[0033] The contents of the present disclosure described below may
have a variety of configurations and propose only a required
configuration herein, but are not limited thereto.
Electronic Device
[0034] FIG. 1 is a schematic block diagram illustrating an example
of an electronic device system.
[0035] Referring to FIG. 1, an electronic device 1000 may receive a
motherboard 1010. The mother board 1010 may include chip related
components 1020, network related components 1030, other components
1040, or the like, physically or electrically connected thereto.
These components may be connected to others to be described below
to form various signal lines 1090.
[0036] The chip associated components 1020 may include a memory
chip such as a volatile memory (for example, a dynamic random
access memory (DRAM)), a non-volatile memory (for example, a read
only memory (ROM)), a flash memory, or the like; an application
processor chip such as a central processor (for example, a central
processing unit (CPU)), a graphics processor (for example, a
graphics processing unit (GPU)), a digital signal processor, a
cryptographic processor, a microprocessor, a microcontroller, or
the like; and a logic chip such as an analog-to-digital converter,
an application-specific integrated circuit (ASIC), or the like, or
the like. However, the chip associated components 1020 are not
limited thereto, and may include other types of chip associated
components. In addition, the chip-associated components 1020 may be
combined with each other.
[0037] The network associated components 1030 may include protocols
such as wireless fidelity (Wi-Fi) (Institute of Electrical And
Electronics Engineers (IEEE) 802.11 family, or the like), worldwide
interoperability for microwave access (WiMAX) (IEEE 802.16 family,
or the like), IEEE 802.20, long term evolution (LTE), evolution
data only (Ev-DO), high speed access+(HSPA+), high speed downlink
packet access+(HSDPA+), high speed uplink packet access+(HSUPA+),
enhanced data GSM environment (EDGE), global system for mobile
communications (GSM), global positioning system (GPS), general
packet radio service (GPRS), code division multiple access (CDMA),
time division multiple access (TDMA), digital enhanced cordless
telecommunications (DECT), Bluetooth.RTM., 3G, 4G, and 5G
protocols, and any other wireless and wired protocols, designated
after the abovementioned protocols. However, the network associated
components 1030 are not limited thereto, but may also include a
variety of other wireless or wired standards or protocols. In
addition, the network associated components 1030 may be combined
with each other, together with the chip associated components 1020
described above.
[0038] Other components 1040 may include a high frequency inductor,
a ferrite inductor, a power inductor, ferrite beads, a low
temperature co-fired ceramic (LTCC), an electromagnetic
interference (EMI) filter, a multilayer ceramic capacitor (MLCC),
or the like. However, other components 1040 are not limited
thereto, but may also include passive components used for various
other purposes, or the like. In addition, other components 1040 may
be combined with each other, together with the chip related
components 1020 or the network related components 1030 described
above.
[0039] Depending on a type of the electronic device 1000, the
electronic device 1000 includes other components that may or may
not be physically or electrically connected to the mainboard 1010.
These other components may include, for example, a camera 1050, an
antenna 1060, a display 1070, a battery 1080, an audio codec (not
illustrated), a video codec (not illustrated), a power amplifier
(not illustrated), a compass (not illustrated), an accelerometer
(not illustrated), a gyroscope (not illustrated), a speaker (not
illustrated), a mass storage unit (for example, a hard disk drive)
(not illustrated), a compact disk (CD) drive (not illustrated), a
digital versatile disk (DVD) drive (not illustrated), or the like.
However, these other components are not limited thereto, but may
also include other components used for various purposes depending
on a type of electronic device 1000, or the like.
[0040] The electronic device 1000 may be a smartphone, a personal
digital assistant (PDA), a digital video camera, a digital still
camera, a network system, a computer, a monitor, a tablet PC, a
laptop PC, a netbook PC, a television, a video game machine, a
smartwatch, an automotive component, or the like. However, the
electronic device 1000 is not limited thereto, and may be any other
electronic device able to process data.
[0041] FIG. 2 is a schematic perspective view illustrating an
example of an electronic device.
[0042] Referring to FIG. 2, a semiconductor package may be used for
various purposes in the various electronic devices 1000 as
described above. For example, a printed circuit board 1110 such as
a main board may be accommodated in a body 1101 of a smartphone
1100, and various electronic components 1120 may be physically or
electrically connected to the printed circuit board 1110. In
addition, other components that may or may not be physically or
electrically connected to the printed circuit board 1110, such as a
camera module 1130, may be accommodated in the body 1101. Some of
the electronic components 1120 may be the chip related components,
for example, a semiconductor package 1121, but are not limited
thereto. The electronic device is not necessarily limited to the
smartphone 1100, but may be other electronic devices as described
above.
Semiconductor Package
[0043] Generally, numerous fine electrical circuits are integrated
in a semiconductor chip. However, the semiconductor chip may not
serve as a finished semiconductor product in itself, and may be
damaged due to external physical or chemical impacts. Therefore,
the semiconductor chip itself may not be used, but may be packaged
and used in an electronic device, or the like, in a packaged
state.
[0044] Here, semiconductor packaging is required due to the
existence of a difference in a circuit width between the
semiconductor chip and a mainboard of the electronic device in
terms of electrical connections. In detail, a size of connection
pads of the semiconductor chip and an interval between the
connection pads of the semiconductor chip are very fine, but a size
of component mounting pads of the mainboard used in the electronic
device and an interval between the component mounting pads of the
mainboard are significantly larger than those of the semiconductor
chip. Therefore, it may be difficult to directly mount the
semiconductor chip on the mainboard, and packaging technology for
buffering a difference in a circuit width between the semiconductor
chip and the mainboard is required.
[0045] A semiconductor package manufactured by the packaging
technology may be classified as a fan-in semiconductor package or a
fan-out semiconductor package depending on a structure and a
purpose thereof.
[0046] The fan-in semiconductor package and the fan-out
semiconductor package will hereinafter be described in more detail
with reference to the drawings.
Fan-In Semiconductor Package
[0047] FIGS. 3A and 3B are schematic cross-sectional views
illustrating states of a fan-in semiconductor package before and
after being packaged.
[0048] FIG. 4 is schematic cross-sectional views illustrating a
packaging process of a fan-in semiconductor package.
[0049] Referring to FIGS. 3A to 4, a semiconductor chip 2220 may
be, for example, an integrated circuit (IC) in a bare state,
including a body 2221 including silicon (Si), germanium (Ge),
gallium arsenide (GaAs), or the like, connection pads 2222 formed
on one surface of the body 2221 and including a conductive material
such as aluminum (Al), or the like, and a passivation layer 2223
such as an oxide layer, a nitride layer, or the like, formed on one
surface of the body 2221 and covering at least portions of the
connection pads 2222. In this case, since the connection pads 2222
may be significantly small, it may be difficult to mount the
integrated circuit (IC) on an intermediate level printed circuit
board (PCB) as well as on the mainboard of the electronic device,
or the like.
[0050] Therefore, a connection structure 2240 may be formed
depending on a size of the semiconductor chip 2220 on the
semiconductor chip 2220 in order to redistribute the connection
pads 2222. The connection structure 2240 may be formed by forming
an insulating layer 2241 on the semiconductor chip 2220 using an
insulating material such as a photoimageable dielectric (PID)
resin, forming via holes 2243h opening the connection pads 2222,
and then forming wiring patterns 2242 and vias 2243. Then, a
passivation layer 2250 protecting the connection structure 2240 may
be formed, an opening 2251 may be formed, and an underbump metal
2260, or the like, may be formed. That is, a fan-in semiconductor
package 2200 including, for example, the semiconductor chip 2220,
the connection structure 2240, the passivation layer 2250, and the
underbump metal 2260 may be manufactured through a series of
processes.
[0051] As described above, the fan-in semiconductor package may
have a package form in which all of the connection pads, for
example, input/output (I/O) terminals, of the semiconductor chip
are disposed inside the semiconductor chip, and may have excellent
electrical characteristics and be produced at a low cost.
Therefore, many elements mounted in smartphones have been
manufactured in a fan-in semiconductor package form. In detail,
many elements mounted in smartphones have been developed to
implement a rapid signal transfer while having a compact size.
[0052] However, since all I/O terminals need to be disposed inside
the semiconductor chip in the fan-in semiconductor package, the
fan-in semiconductor package has significant spatial limitations.
Therefore, it is difficult to apply this structure to a
semiconductor chip having a large number of I/O terminals or a
semiconductor chip having a compact size. In addition, due to the
disadvantage described above, the fan-in semiconductor package may
not be directly mounted and used on the mainboard of the electronic
device. The reason is that even in a case in which a size of the
I/O terminals of the semiconductor chip and an interval between the
I/O terminals of the semiconductor chip are increased by a
redistribution process, the size of the I/O terminals of the
semiconductor chip and the interval between the I/O terminals of
the semiconductor chip may not be sufficient to directly mount the
fan-in electronic component package on the mainboard of the
electronic device.
[0053] FIG. 5 is a schematic cross-sectional view illustrating a
case in which a fan-in semiconductor package is mounted on a
printed circuit board and is ultimately mounted on a mainboard of
an electronic device.
[0054] FIG. 6 is a schematic cross-sectional view illustrating a
case in which a fan-in semiconductor package is embedded in a
printed circuit board and is ultimately mounted on a mainboard of
an electronic device.
[0055] Referring to FIGS. 5 and 6, in a fan-in semiconductor
package 2200, connection pads 2222, that is, I/O terminals, of a
semiconductor chip 2220 may be redistributed through a printed
circuit board 2301, and the fan-in semiconductor package 2200 may
be ultimately mounted on a mainboard 2500 of an electronic device
in a state in which it is mounted on the printed circuit board
2301. In this case, solder balls 2270, and the like, may be fixed
by an underfill resin 2280, or the like, and an outer side of the
semiconductor chip 2220 may be covered with a molding material
2290, or the like. Alternatively, a fan-in semiconductor package
2200 may be embedded in a separate printed circuit board 2302,
connection pads 2222, that is, I/O terminals, of the semiconductor
chip 2220 may be redistributed by the printed circuit board 2302 in
a state in which the fan-in semiconductor package 2200 is embedded
in the printed circuit board 2302, and the fan-in semiconductor
package 2200 may ultimately be mounted on a mainboard 2500 of an
electronic device.
[0056] As described above, it may be difficult to directly mount
and use the fan-in semiconductor package on the mainboard of the
electronic device. Therefore, the fan-in semiconductor package may
be mounted on the separate printed circuit board and be then
mounted on the mainboard of the electronic device through a
packaging process or may be mounted and used on the mainboard of
the electronic device in a state in which it is embedded in the
printed circuit board.
Fan-Out Semiconductor Package
[0057] FIG. 7 is a schematic cross-sectional view illustrating a
fan-out semiconductor package.
[0058] Referring to FIG. 7, in a fan-out semiconductor package
2100, for example, an outer side of a semiconductor chip 2120 may
be protected by an encapsulant 2130, and connection pads 2122 of
the semiconductor chip 2120 may be redistributed outwardly of the
semiconductor chip 2120 by a connection structure 2140. In this
case, a passivation layer 2150 may further be formed on the
connection structure 2140, and an underbump metal 2160 may further
be formed in openings of the passivation layer 2150. Solder balls
2170 may further be formed on the underbump metal 2160. The
semiconductor chip 2120 may be an integrated circuit (IC) including
a body 2121, the connection pads 2122, and the like. The connection
structure 2140 may include an insulating layer 2141, wiring layers
2142 formed on the insulating layer 2141, and vias 2143
electrically connecting the connection pads 2122 and the wiring
layers 2142 to each other.
[0059] As described above, the fan-out semiconductor package may
have a form in which I/O terminals of the semiconductor chip are
redistributed and disposed outwardly of the semiconductor chip
through the connection structure formed on the semiconductor chip.
As described above, in the fan-in semiconductor package, all I/O
terminals of the semiconductor chip need to be disposed inside the
semiconductor chip. Therefore, when a size of the semiconductor
chip is decreased, a size and a pitch of balls need to be
decreased, such that a standardized ball layout may not be used in
the fan-in semiconductor package. On the other hand, the fan-out
semiconductor package has the form in which the I/O terminals of
the semiconductor chip are redistributed and disposed outwardly of
the semiconductor chip through the connection structure formed on
the semiconductor chip as described above. Therefore, even in a
case that a size of the semiconductor chip is decreased, a
standardized ball layout may be used in the fan-out semiconductor
package as it is, such that the fan-out semiconductor package may
be mounted on the mainboard of the electronic device without using
a separate printed circuit board, as described below.
[0060] FIG. 8 is a schematic cross-sectional view illustrating a
case in which a fan-out semiconductor package is mounted on a
mainboard of an electronic device.
[0061] Referring to FIG. 8, a fan-out semiconductor package 2100
may be mounted on a mainboard 2500 of an electronic device through
solder balls 2170, or the like. That is, as described above, the
fan-out semiconductor package 2100 includes the connection
structure 2140 formed on the semiconductor chip 2120 and capable of
redistributing the connection pads 2122 to a fan-out region that is
outside of a size of the semiconductor chip 2120, such that the
standardized ball layout may be used in the fan-out semiconductor
package 2100 as it is. As a result, the fan-out semiconductor
package 2100 may be mounted on the mainboard 2500 of the electronic
device without using a separate printed circuit board, or the
like.
[0062] As described above, since the fan-out semiconductor package
may be mounted on the mainboard of the electronic device without
using the separate printed circuit board, the fan-out semiconductor
package may be implemented at a thickness lower than that of the
fan-in semiconductor package using the printed circuit board.
Therefore, the fan-out semiconductor package may be miniaturized
and thinned. In addition, the fan-out semiconductor package has
excellent thermal characteristics and electrical characteristics,
such that it is particularly appropriate for a mobile product.
Therefore, the fan-out electronic component package may be
implemented in a form more compact than that of a general
package-on-package (POP) type using a printed circuit board (PCB),
and may solve a problem due to the occurrence of a warpage
phenomenon.
[0063] Meanwhile, the fan-out semiconductor package refers to
package technology for mounting the semiconductor chip on the
mainboard of the electronic device, or the like, as described
above, and protecting the semiconductor chip from external impacts,
and is a concept different from that of a printed circuit board
(PCB) such as a printed circuit board, or the like, having a scale,
a purpose, and the like, different from those of the fan-out
semiconductor package, and having the fan-in semiconductor package
embedded therein.
[0064] Hereinafter, a fan-out semiconductor package, in which
selection of a material of the encapsulant is wide and reliability
of a conductive via may be improved, will be described with
reference to the drawings.
[0065] FIG. 9 is a schematic cross-sectional view illustrating an
example of a semiconductor package.
[0066] FIG. 10 is a schematic plan view taken along line I-I' of
the semiconductor package of FIG. 9.
[0067] Referring to FIG. 9, a fan-out semiconductor package 100A
according to an example may include a frame 110 including one or
more wiring layers 122a, 112b, and 112c and having a through-hole
110H, a semiconductor chip 120 disposed in the through-hole 110H
and having an active surface on which the connection pad 122 is
disposed and an inactive surface opposite to the active surface, an
encapsulant 130 covering at least a portion of each of the frame
110 and the inactive surface of the semiconductor chip 120 and
having a first opening 130h exposing at least a portion of an
uppermost wiring layer 112c, an insulating layer 180 disposed on
the encapsulant 130 and having a second opening 180h disposed in
the first opening 130h and exposing at least a portion of the
uppermost wiring layer 112c, a conductive pattern layer 132
disposed on the insulating layer 180, a conductive via 133 disposed
in the second opening 180h and electrically connecting the
uppermost wiring layer 112c to the conductive pattern layer 132,
and a connection structure 140 disposed on the frame 110 and the
active surface of the semiconductor chip 120 and including one or
more redistribution layers 142. The conductive pattern layer 132,
the wiring layers 112a, 112b, and 112c, as well as the
redistribution layer 142 are electrically connected to the
connection pad 122. If necessary, a passivation layer 150 having a
third opening 150h exposing at least a portion of a lowermost
redistribution layer 142 may be disposed on the connection
structure 140, an underbump metal 160 may be disposed in the third
opening 150h, and the underbump metal 160 and an electrical
connection structure 170 may be connected to each other.
[0068] Recently, it is required to form a backside circuit in a
semiconductor package structure to improve electrical
characteristics of a premium smartphone product and to efficiently
use a space. Moreover, requirements for lines and spaces of the
backside circuit are increased in accordance with the demand for
the enhancement of characteristics of a chip and reduction in an
area. Thus, a technique for forming a backside circuit by plating
on a molding material sealing a semiconductor chip has been
proposed. However, in a process in which a backside circuit is
formed after a semiconductor chip is sealed, a molding material,
having been heated, is continuously hardened, and thus original
physical properties may be lost. Thus, when a backside circuit is
formed, it is difficult to secure adhesion between a backside
circuit and a molding material. Moreover, when a microcircuit is
implemented, it is difficult to form surface roughness. To solve
the problems described above, it may be considered that an
insulating layer is additionally stacked on a molding material, and
a backside circuit is formed on the insulating layer, additionally
stacked. In this case, a thickness may be thickened. Moreover, if
different materials having a thin thickness to reduce a thickness,
due to a difference in physical properties between materials, there
may be a limitation in clearing or a method for forming a via hole
for a backside circuit.
[0069] On the other hand, in the fan-out semiconductor package 100A
according to an example, an insulating layer 180 is additionally
stacked on an encapsulant 130, a conductive pattern layer 132 and a
conductive via 133 are formed on the insulating layer 180, and a
plurality of openings 130h and 180h are used for a via hole for
formation of the conductive via 133. For example, a first opening
130h and a second opening 180h are formed in the encapsulant 130
and the insulating layer 180 to form a double via hole. In other
words, a via hole in which the conductive via 133 is formed is the
second opening 180h, and the second opening 180h does not pass
through the encapsulant 130, but passes through the insulating
layer 180, filling the first opening 130h. Thus, as described
above, even when an insulating layer 180 having a thin thickness,
formed of a material different from that of the encapsulant 130, a
limitation in formation of a via hole due to a difference in
physical properties between different materials may not occur. For
example, even when the encapsulant 130 is a non-photosensitive
insulating layer and the insulating layer 180 is a photosensitive
insulating layer, the first opening 130h is formed using a laser in
the encapsulant 130, and the second opening 180h is formed using a
photolithography process in the insulating layer 180 thereafter. In
other words, the first opening 130h and the second opening 180h are
independently formed, so the limitation due to a difference in
physical properties between different materials is not significant.
Thus, a freedom degree of material selection of the encapsulant 130
and/or the insulating layer 180 is high. Moreover, since the
insulating layer 180, an insulating material, is disposed between
the first opening 130h and the second opening 180h, effects of
moisture absorption or chemicals are reduced, so reliability may be
secured.
[0070] The respective components included in the fan-out
semiconductor package 100A according to the exemplary embodiment
will hereinafter be described in more detail.
[0071] The frame 110 may improve rigidity of the fan-out
semiconductor package 100A depending on certain materials of the
insulating layers 111a and 111b, and serve to secure uniformity of
a thickness of the encapsulant 130. The frame 110 may have a
through-hole 110H, passing through the insulating layers 111a and
111b. In the through-hole 110H, the semiconductor chip 120 is
disposed, and a passive component (not shown) may be disposed
together as required. The through-hole 110H may have a form with a
wall surface surrounding the semiconductor chip 120, but is not
limited thereto. The frame 110 may include wiring layers 112a,
112b, and 112c as well as wiring vias 113a and 113b, in addition to
the insulating layers 111a and 111b, and may thus function as a
connection structure. In this case, the wiring layers 112a, 112b,
and 112c, as well as the wiring vias 113a and 113b may function as
an electrical connection member. If necessary, a connection
structure having an electrical connection member capable of
providing an upper/lower electrical connection path in a different
form may be disposed rather than the frame 110.
[0072] The frame 110 may include a first insulating layer 111a in
contact with the connection structure 140, a first wiring layer
112a in contact with the connection structure 140 and embedded in
the first insulating layer 111a, a second wiring layer 112b
disposed on a side of the first insulating layer 111a opposite to a
side of the first insulating layer 111a in which the first wiring
layer 112a is embedded, a second insulating layer 111b disposed on
a side of the first insulating layer 111a opposite to a side of the
first insulating layer 111a in which the first wiring layer 112a is
embedded and covering at least a portion of the second wiring layer
112b, and a third wiring layer 112c disposed on a side of the
second insulating layer 111b opposite to a side of the second
insulating layer 111b in which the second wiring layer 112b is
embedded. The first wiring layer 112a and the second wiring layer
112b, as well as the second wiring layer 112b and the third wiring
layer 112c may be electrically connected to each other through the
first wiring via 113a and the second wiring via 113b, passing
through the first insulating layer 111a and the second insulating
layer 111b, respectively. The first to third wiring layers 112a,
112b, and 112c may be electrically connected to the connection pad
122 through the redistribution layer 142 of the connection
structure 140.
[0073] A material of each of the first and second insulating layers
111a and 111b is not particularly limited. For example, an
insulating material may be used as the material of each of the
first and second insulating layers 111a and 111b. In this case, the
insulating material may be a thermosetting resin such as an epoxy
resin, a thermoplastic resin such as a polyimid resin, or a resin
in which the thermosetting resin or the thermoplastic resin is
mixed with an inorganic filler, for example, an Ajinomoto build-up
film (ABF), or the like. Alternatively, the insulating material may
be a material in which the thermosetting resin or the thermoplastic
resin is impregnated together with an inorganic filler in a core
material such as a glass fiber (or a glass cloth or a glass
fabric), for example, a prepreg. Alternatively, a PID resin may
also be used as the insulating material.
[0074] The wiring layers 112a, 112b, and 112c may provide an
upper/lower electrical connection path of a package with the wiring
vias 113a and 113b, and may serve to redistribute the connection
pad 122. A material of each of the wiring layers 112a, 112b, and
112c may be a conductive material such as copper (Cu), aluminum
(Al), silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb),
titanium (Ti), or alloys thereof. The wiring layers 112a, 112b, and
112c may perform various functions depending on designs of
corresponding layers. For example, the wiring layer may include
ground (GND) patterns, power (PWR) patterns, signal (S) patterns,
and the like. Here, the signal (S) patterns may include various
signals except for the ground (GND) patterns, the power (PWR)
patterns, and the like, such as data signals, and the like. In
addition, the wiring layers may include via pads, wire pads,
electrical connection structure pads, and the like. The wiring
layers 112a, 112b, and 112c may be formed using a known plating
process, and each may be formed of a seed layer and a conductor
layer. A thickness of each of the wiring layers 112a, 112b, and
112c may be greater than that of each of the redistribution layers
142.
[0075] The first wiring layer 112a may be recessed inwardly of the
first insulating layer 111a. As described above, when the first
wiring layer 112a is recessed inwardly of the first insulating
layer 111a and a step is provided between a lower surface of the
first insulating layer 111a and a lower surface of the first wiring
layer 112a, the first wiring layer 112a may be prevented from being
contaminated by bleeding of a formation material of the first
encapsulant 131.
[0076] The wiring vias 113a and 113b may electrically connect the
wiring layers 112a, 112b, and 112c formed on different layers to
each other, resulting in an electrical path in the frame 110. A
material of each of the wiring vias 113a and 113b may be a
conductive material such as copper (Cu), aluminum (Al), silver
(Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti),
or alloys thereof. Each of the wiring vias 113a and 113b may be a
via in a filled type, filled with a conductive material, or may be
a via in a conformal type, in which a conductive material is formed
along a wall surface of a via hole. Moreover, a tapered shape may
be applied thereto. The wiring vias 113a and 113b may also be
formed using a plating process, and each may be formed of a seed
layer and a conductor layer.
[0077] When a hole for the first wiring via 113a is formed, some
pads of the first wiring layer 112a may serve as a stopper. In this
regard, it may be advantageous in a process in that the first
wiring via 113a has a tapered shape in which a width of an upper
surface is greater than a width of a lower surface. In this case,
the first wiring via 113a may be integrated with a pad pattern of
the second wiring layer 112b. When a hole for the second wiring via
113b is formed, some pads of the second wiring layer 112b may serve
as a stopper. In this regard, it may be advantageous in a process
in that the second wiring via 113b has a tapered shape in which a
width of an upper surface is greater than a width of a lower
surface. In this case, the second wiring via 113b may be integrated
with a pad pattern of the third wiring layer 112c.
[0078] Meanwhile, although not illustrated in the drawings, if
necessary, for the purpose of electromagnetic shielding or for heat
dissipation, a metal layer (not shown) may be disposed on a wall
surface of the through-hole 110H of the frame 110, and the metal
layer (not shown) may surround the semiconductor chip 120.
[0079] The semiconductor chip 120 may be an integrated circuit (IC)
provided in an amount of several hundred to several million or more
elements integrated in a single chip. In this case, the IC may be,
for example, an application processor chip such as a central
processor (for example, a CPU), a graphics processor (for example,
a GPU), a digital signal processor, a cryptographic processor, a
microprocessor, a microcontroller, or the like, but is not limited
thereto. Here, the IC may be a Power Management IC (PMIC), a memory
chip such as a volatile memory (e.g., DRAM), a non-volatile memory
(e.g., ROM), a flash memory, or an analog-to-digital converter, or
a logic chip such as an application-specific IC (ASIC).
[0080] The semiconductor chip 120 may be an integrated circuit in a
bare state in which a separate bump or a wiring layer is not
provided. However, it is not limited thereto, and the semiconductor
chip 120 may be a package-type integrated circuit, if necessary.
The integrated circuit may be provided based on an active wafer. In
this case, a base material of a body 121 of the semiconductor chip
120 may be silicon (Si), germanium (Ge), gallium arsenide (GaAs),
or the like. Various circuits may be formed on the body 121. The
connection pads 122 may electrically connect the semiconductor chip
120 to other components. A material of each of the connection pads
122 may be a conductive material such as aluminum (Al), or the
like. A passivation layer 123 exposing the connection pads 122 may
be formed on the body 121, and may be an oxide layer, a nitride
layer, or the like, or a double layer of an oxide layer and a
nitride layer. An insulating layer (not illustrated), and the like,
may also be further disposed in other required positions.
Meanwhile, in the semiconductor chip 120, a side, on which
connection pad 122 is disposed, is an active surface, and the
opposite side is an inactive surface. In this case, when the
passivation film 123 is formed on the active surface of the
semiconductor chip 120, the positional relationship of the active
surface of the semiconductor chip 120 is determined based on a
lowermost surface of the passivation film 123.
[0081] The encapsulant 130 may encapsulate the frame 110 and the
semiconductor chip 120. Moreover, the encapsulant may fill at least
a portion of the through-hole 110H. The encapsulant 130 may include
an insulating material. The insulating material may be a material
containing an inorganic filler and an insulating resin, for
example, a thermosetting resin such as an epoxy resin, a
thermoplastic resin such as a polyimid, or a resin in which a
reinforcement such as an inorganic filler is contained in the
thermosetting resin or the thermoplastic resin, in detail, an
Ajinomoto build-up film (ABF), an FR-4 resin, a bismaleimide
triazine (BT) resin, a resin, or the like. Moreover, a molding
material such as EMC may be used, or a photosensitive material,
that is, a photo imageable encapsulant (PIE) may be used, as
needed. As needed, a material in which an insulating resin such as
the thermosetting resin or the thermoplastic resin is impregnated
in a core material such as an inorganic filler and/or a glass fiber
(or a glass cloth or a glass fabric), may be used.
[0082] The insulating layer 180 is disposed on the encapsulant 130,
and may cover the encapsulant 130. The insulating layer 180 may
include a material different from that of the encapsulant 130. For
example, the insulating layer 180 may include a material having
physical properties such as an elastic modulus or a thermal
expansion coefficient, different from that of the encapsulant 130.
The insulating layer 180 may include an insulating material. In
this case, the insulating material may be a photosensitive
insulating material, that is, a PID. In this case, the insulating
layer 180 having a thin thickness may be formed. Moreover, when the
second opening 180h is formed, a fine pitch may be provided. In
addition, a microcircuit is also easily formed, and an overall
thickness of a package is further reduced. However, a material is
not limited to a PID, and there is no limitation in material
selection.
[0083] The first opening 130h passes through at least a portion of
the encapsulant 130, and exposes at least a portion of a third
wiring layer 112c located in an uppermost portion of the frame 110.
At least a portion of the first opening 130h is filled with an
insulating layer 180. A second opening 180h is formed in the first
opening 130h, filled with the insulating layer 180. In other words,
the second opening 180h passes through the insulating layer 180,
filling the first opening 130h, and exposes at least a portion of a
third wiring layer 112c located in an uppermost portion of the
frame 110. An insulating layer 180 is disposed between the first
opening 130h and the second opening 180h. In other words, the first
opening 130h and the second opening 180h are independently formed
in the encapsulant 130 and the insulating layer 180, respectively,
so different materials may be selected to form the first opening
and the second opening.
[0084] The conductive pattern layer 132 may be disposed on the
insulating layer 180. The conductive pattern layer 132 may also
include a conductive material such as copper (Cu), aluminum (Al),
silver (Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium
(Ti), or alloys thereof. The conductive pattern layer 132 may
perform various functions depending on designs. For example, the
conductive pattern layer may include ground (GND) patterns, power
(PWR) patterns, signal (S) patterns, and the like. Here, the signal
(S) patterns may include various signals except for the ground
(GND) patterns, the power (PWR) patterns, and the like, such as
data signals, and the like. In addition, the conductive pattern
layer may include via pads, wire pads, electrical connection
structure pads, and the like. The conductive pattern layer 132 may
be formed using a known plating process, and each may be formed of
a seed layer and a conductor layer.
[0085] The conductive via 133 is formed in the second opening 180h
to electrically connect the conductive pattern layer 132 to the
third wiring layer 112c. The conductive via 133 may also include a
conductive material such as copper (Cu), aluminum (Al), silver
(Ag), tin (Sn), gold (Au), nickel (Ni), lead (Pb), titanium (Ti),
or alloys thereof. The conductive via 133 may be a via in a filled
type, filled with a conductive material, or may be a via in a
conformal type, in which a conductive material is formed along a
wall surface of a via hole. Moreover, a tapered shape may be
applied thereto. The conductive via 133 may be formed using a
plating process, and each may be formed of a seed layer and a
conductor layer.
[0086] The connection structure 140 may redistribute the connection
pads 122 of the semiconductor chip 120. Each of several tens to
several hundreds of connection pads 122 of the semiconductor chip
120 having various functions may be redistributed by the connection
structure 140, and may be physically or electrically externally
connected through the electrical connection structures 170
depending on functions. The connection structure 140 may include an
insulating layer 141, provided as one or more layers, a
redistribution layer 142, provided as one or more layers, and a
connection via 143, provided as one or more layers, and those may
be provided in an amount greater or less than those illustrated in
the drawings.
[0087] A material of the insulating layer 141 may be an insulating
material. In this case, the insulating material may be a
photoimageable dielectric (PID) material. Here, a fine pitch may be
introduced through a photo via, so several tens to several millions
of connection pads 122 of the semiconductor chip 120 may be
significantly effectively redistributed.
[0088] The redistribution layers 142 may redistribute the
connection pad 122 of the semiconductor chip 120 to be electrically
connected to the electrical connection structure 170. A material of
each of the redistribution layers 142 may also be a conductive
material such as copper (Cu), aluminum (Al), silver (Ag), tin (Sn),
gold (Au), nickel (Ni), lead (Pb), titanium (Ti), or alloys
thereof. The redistribution layer 142 may also perform various
functions depending on a design thereof. For example, the
redistribution layer may include ground (GND) patterns, power (PWR)
patterns, signal (S) patterns, and the like. Here, the signal (S)
patterns may include various signals except for the ground (GND)
patterns, the power (PWR) patterns, and the like, such as data
signals, and the like. In addition, the redistribution layer may
include via pads, electrical connection structure pads, and the
like.
[0089] The connection via 143 electrically connects the
redistribution layers 142, formed in different layers, to each
other, and electrically connects the connection pad 122 of the
semiconductor chip 120 to the redistribution layer 142. The
connection via 143 may be in physical contact with the connection
pad 122 when the semiconductor chip 120 is a bare die. A material
of the connection via 143 may also be a conductive material such as
copper (Cu), aluminum (Al), silver (Ag), tin (Sn), gold (Au),
nickel (Ni), lead (Pb), titanium (Ti), or alloys thereof. Each of
the connection vias 143 may also be completely filled with the
conductive material, or the conductive material may be formed along
a wall of each of via holes. Moreover, a tapered shape may also be
applied to a shape of the connection via 143.
[0090] The passivation layer 150, as an additional component, may
protect the connection structure 140 from external physical or
chemical damage. The passivation layer 150 may include an
insulating resin and an inorganic filler, but may not include a
glass fiber. For example, the passivation layer 150 may be ABF, but
is not limited thereto. The passivation layer 150 may have a third
opening 150h exposing at least a portion of the redistribution
layer 142 in a lowermost portion.
[0091] The underbump metal 160, as an additional component, may
improve connection reliability of the electrical connection
structure 170 to improve board level reliability of the fan-out
semiconductor package 100A. The number of the underbump metal 160
may be several tens to several millions. Each of the underbump
metals 160 may be connected to the redistribution layer 142 through
the third opening 150h passing through the passivation layer 150.
The underbump metal 160 may be formed by any known metallization
method using a metal, but is not limited thereto.
[0092] The electrical connection structure 170 physically and/or
electrically connects the semiconductor package 100A to an external
power source. For example, the semiconductor package 100A may be
mounted on the mainboard of the electronic device through the
electrical connection structure 170. The electrical connection
structure 170 may be formed of a low melting point metal, for
example, tin (Sn) or an alloy including tin (Sn). In more detail,
the electrical connection structure 170 may be formed of a solder,
or the like. However, this is only an example, and a material of
the electrical connection structure 170 is not particularly limited
thereto. Each of the electrical connection structures 170 may be a
land, a ball, a pin, or the like. The electrical connection
structures 170 may be formed as a multilayer or single layer
structure. When the electrical connection structure 170 includes
the plurality of layers, the electrical connection metal includes a
copper pillar and a solder. When the electrical connection
structure 170 includes the single layer, the electrical connection
metal includes a tin-silver solder or copper. However, the
electrical connection structure 170 is only an example, and the
present disclosure is not limited thereto. The number, an interval,
a disposition form, and the like, of electrical connection
structures 170 are not particularly limited, but may be
sufficiently modified depending on design particulars by those
skilled in the art. For example, the electrical connection
structures 170 may be provided in an amount of several tens to
several thousands according to the number of connection pads 122,
or may be provided in an amount of several tens to several
thousands or more or several tens to several thousands or less.
[0093] At least one of the electrical connection structures 170 may
be disposed in a fan-out region. The fan-out region refers to a
region except for a region in which the semiconductor chip 120 is
disposed. The fan-out package may have excellent reliability as
compared to a fan-in package, may allow a plurality of input/output
(I/O) terminals to be implemented, and may facilitate a 3D
interconnection. In addition, as compared to a ball grid array
(BGA) package, a land grid array (LGA) package, or the like, the
fan-out package may be manufactured to have a small thickness, and
may have price competitiveness.
[0094] If necessary, a cover layer 190 having a fourth opening 190h
exposing at least a portion of the conductive pattern layer 132 may
be disposed on the insulating layer 180. The cover layer 190 may
include ABF, or the like, but is not limited thereto. A surface
treatment layer 132P may be disposed on a surface of the conductive
pattern layer 132, having been exposed by the fourth opening 190h
in the cover layer 190. The surface treatment layer 132P are not
particularly limited as long as they are known in the related art,
and may be formed by, for example, electrolytic gold plating,
electroless gold plating, OSP or electroless tin plating,
electroless silver plating, electroless nickel plating/substituted
gold plating, DIG plating, HASL, or the like.
[0095] FIGS. 11A and 11B are schematic process drawings
illustrating a process for forming a first opening and a second
opening for a conductive via of the fan-out semiconductor package
of FIG. 9.
[0096] Referring to FIG. 11A, first, a first opening 130h, exposing
at least a portion of the third wiring layer 112c of the frame 110
is formed in the encapsulant 130. A method for processing the first
opening 130h may be selected according to a material of the
encapsulant 130. For example, when the encapsulant 130 is a
non-photosensitive insulating layer such as ABF, the first opening
may be formed using laser processing in which the third wiring
layer 112c is used as a stopper layer. After the first opening 130h
is formed, clearing may be performed in accordance with a material
of the encapsulant 130. For example, when the encapsulant 130 is a
non-photosensitive insulating layer such as ABF, clearing may be
performed by a desmear treatment.
[0097] Referring to FIG. 11B, then, the insulating layer 180 is
formed on the encapsulant 130. The insulating layer 180 may be
formed to have a thin thickness. The insulating layer 180 may be
formed by applying and hardening a photosensitive insulating
material, or may be formed using a method in which a photosensitive
insulating film is laminated. Then, a second opening 180h, exposing
at least a portion of the third wiring layer 112c of the frame 110,
is formed in a region filling the first opening 130h, of the
insulating layer 180. A method for processing the second opening
180h may be selected according to a material of the insulating
layer 180. For example, when the insulating layer 180 is a
photosensitive insulating layer such as a PID, the second opening
may be formed using a photolithography method, and clearing may
also be performed. Then, using a plating process, on the insulating
layer 180 and in the second opening 180h, a conductive pattern
layer (not shown) and a conductive via (not shown) may be
formed.
[0098] FIG. 12 illustrates another example of a fan-out
semiconductor package.
[0099] Referring to FIG. 12, a fan-out semiconductor package 100B
according to another example may further include a reinforcing
layer 136 disposed between the encapsulant 130 and the insulating
layer 180, and a resin layer 138 disposed between the reinforcing
layer 136 and the insulating layer 180, in comparison with the
fan-out semiconductor package 100A according to an example,
described above. In other words, the fan-out semiconductor package
100B according to another example may have a form in which the
encapsulant 130, the reinforcing layer 136, the resin layer 138,
and the insulating layer 180 are sequentially stacked. The
reinforcing layer 136 may serve to control by introducing rigidity
of a package. Similarly, the reinforcing layer 136 may have an
elastic modulus, greater than that of each of the encapsulant 130,
the insulating layer 180, and the resin layer 138. The first
opening 130h may also pass through not only the encapsulant 130 but
also the reinforcing layer 136 and the resin layer 138. In other
words, the resin layer 138 may be introduced to form the first
opening 130h in the reinforcing layer 136. For example, when the
reinforcing layer 136 is only provided, it is difficult to perform
laser processing. However, since the resin layer 138 is further
provided, laser processing is easily performed. Thus, the first
opening 130h, passing through the reinforcing layer 136 and the
resin layer 138, is easily provided.
[0100] A material of the reinforcing layer 136 may be a material
capable of maintaining rigidity. For example, the material may be a
thermosetting resin such as an epoxy resin, a thermoplastic resin
such as a polyimide resin, a resin in which the thermosetting resin
or the thermoplastic resin is impregnated together with an
inorganic filler in a core material such as a glass fiber, in
detail, a prepreg. On the other hand, the resin layer 138 may be a
material not including a thermosetting resin such as an epoxy
resin, a thermoplastic resin such as a polyimide resin, and an
inorganic filler, but including a glass fiber, for example, ABF. In
a process in which the first opening 130h, passing through the
reinforcing layer 136 and the resin layer 138, is formed using the
material described above, a process for cleaning a via hole may be
performed using desmear, and clearing may be performed using an
etching process, if necessary, in a portion of the reinforcing
layer 136, including a glass fiber.
[0101] On the other hand, in the fan-out semiconductor package 100B
according to another example, the encapsulant 130 and the
insulating layer 180 are a non-photosensitive insulating layer. In
other words, the insulating layer 180 may be ABF, including an
insulating resin and an inorganic filler, by way of example.
However, specific compositions of materials of the insulating layer
180 and the encapsulant 130 may be different from each other. In
other words, physical properties such as an elastic modulus or a
thermal expansion coefficient, of the insulating layer 180 and the
encapsulant 130, may be different from each other. When the
insulating layer 180 is a non-photosensitive insulating layer, a
process for cleaning a via hole may be performed using desmear in a
process for forming the second opening 180h. In this case, surface
roughness may be easily formed. Thus, when a plating layer such as
a conductive pattern layer 132 and a conductive via 133 is formed,
a risk of chemical copper non-plating may be reduced. Other
contents overlap those described above with reference to FIGS. 9 to
11B, and a detailed description thereof is thus omitted.
[0102] FIG. 13 illustrates another example of a fan-out
semiconductor package.
[0103] Referring to FIG. 13, a fan-out semiconductor package 100C
according to another example may have a frame 110 having a shape
different from that of the fan-out semiconductor package 100A
according to an example, described above. In detail, in the fan-out
semiconductor package 100C according to another example, a frame
110 may include a first insulating layer 111a, a first wiring layer
112a disposed on one side of the first insulating layer 111a, a
second wiring layer 112b disposed on the other side of the first
insulating layer 111a, a second insulating layer 111b disposed on
one side of the first insulating layer 111a and covering at least a
portion of the first wiring layer 112a, a third wiring layer 112c
disposed on a side of the second insulating layer 111b opposite to
a side of the second insulating layer 111b in which the first
wiring layer 112a is embedded, a third insulating layer 111c
disposed on the other side of the first insulating layer 111a and
covering at least a portion of the second wiring layer 112b, a
fourth wiring layer 112d disposed on a side of the third insulating
layer 111c opposite to a side of the third insulating layer 111c in
which the second wiring layer 112b is embedded, a first wiring via
113a passing through the first insulating layer 111a and
electrically connecting the first wiring layer 112a to the second
wiring layer 112b, a second wiring via 113b passing through the
second insulating layer 111b and electrically connecting the first
wiring layer 112a to the third wiring layer 113c, and a third
wiring via 113c passing through the third insulating layer 111c and
electrically connecting the second wiring layer 112b to the fourth
wiring layer 112d. Each of the first opening 130h and the second
opening 180h may expose at least a portion of the fourth wiring
layer 112d. Since the frame 110 may include a further large number
of wiring layers 112a, 112b, 112c, and 112d, a connection structure
140 may be further simplified.
[0104] The first insulating layer 111a may have a thickness greater
than those of the second insulating layer 111b and the third
insulating layer 111c. The first insulating layer 111a may be
basically relatively thick in order to maintain rigidity, and the
second insulating layer 111b and the third insulating layer 111c
may be introduced in order to form a larger number of wiring layers
112c and 112d. The first insulating layer 111a may include an
insulating material different from those of the second insulating
layer 111b and the third insulating layer 111c. For example, the
first insulating layer 111a may be, for example, prepreg including
a core material such as a glass fiber, an inorganic filler, and an
insulating resin, and the second insulating layer 111b and the
third insulating layer 111c may be ABF or PID including an
inorganic filler and an insulating resin. However, the materials of
the first insulating layer 111a and the second and third insulating
layers 111b and 111c are not limited thereto. Similarly, the first
wiring via 113a passing through the first insulating layer 111a may
have a diameter greater than those of the second and third wiring
vias 113b and 113c passing through the second and third insulating
layers 111b and 111c, respectively. The first wiring via 113a may
have an hourglass shape or a cylindrical shape, while the second
and third connection via layers 113b and 113c may have tapered
shapes of which directions are opposite to each other. A thickness
of each of the wiring layers 112a, 112b, 112c, and 112d may be
greater than that of each of the redistribution layers 142. Other
contents, including a material or a role of the first to fourth
wiring layers 112a, 112b, 112c, and 112d and the first to third
wiring vias 113a, 113b, and 113c, overlap those described above
with reference to FIGS. 9 to 12, and a detailed description thereof
is thus omitted.
[0105] FIG. 14 illustrates another example of a fan-out
semiconductor package.
[0106] Referring to FIG. 12, a fan-out semiconductor package 100D
according to another example may further include a reinforcing
layer 136 disposed between the encapsulant 130 and the insulating
layer 180, and a resin layer 138 disposed between the reinforcing
layer 136 and the insulating layer 180, in comparison with the
fan-out semiconductor package 100C according to an example,
described above. In other words, the fan-out semiconductor package
100D according to another example may have a form in which the
encapsulant 130, the reinforcing layer 136, the resin layer 138,
and the insulating layer 180 are sequentially stacked. Other
contents overlap those described above with reference to FIGS. 9 to
13, and a detailed description thereof is thus omitted.
[0107] FIG. 15 illustrates another example of a fan-out
semiconductor package.
[0108] Referring to FIG. 15, in a fan-out semiconductor package
100E according to another example, in comparison with the fan-out
semiconductor package 100A according to an example, described
above, a frame 110 has a plurality of through-holes 110H1 and
110H2, and a first semiconductor chip 120a and a second
semiconductor chip 120b may be disposed in through-holes 110H1 and
110H2, respectively. The first semiconductor chip 120a and the
second semiconductor chip 120b may be an integrated circuit (IC)
die, including bodies 121a and 121b, connection pads 122a and 122b,
as well as passivation films 123a and 123b, respectively. As an
example without a limitation, the first semiconductor chip 120a may
be an application processor (AP), and the second semiconductor chip
120b may be a power management integrated circuit (PMIC), but is
not limited thereto. The first semiconductor chip 120a and the
second semiconductor chip 120b may be electrically connected to
each other through the redistribution layer 142 of the connection
structure 140. Other contents overlap those described above with
reference to FIGS. 9 to 14, and a detailed description thereof is
thus omitted.
[0109] FIG. 16 illustrates another example of a fan-out
semiconductor package.
[0110] Referring to FIG. 16, in a fan-out semiconductor package
100F according to another example, in comparison with the fan-out
semiconductor package 100B according to an example, described
above, a frame 110 has a plurality of through-holes 110H1 and
110H2, and a first semiconductor chip 120a and a second
semiconductor chip 120b may be disposed in through-holes 110H1 and
110H2, respectively. Other contents overlap those described above
with reference to FIGS. 9 to 15, and a detailed description thereof
is thus omitted.
[0111] As set forth above, according to an exemplary embodiment, a
fan-out semiconductor package, in which selection of a material of
an encapsulant is wide, and effects of moisture absorption or
chemicals are reduced to improve reliability of a conductive via,
may be provided.
[0112] While exemplary embodiments have been shown and described
above, it will be apparent to those skilled in the art that
modifications and variations could be made without departing from
the scope of the present invention as defined by the appended
claims.
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