U.S. patent application number 16/400563 was filed with the patent office on 2019-09-05 for real time software and array control.
The applicant listed for this patent is Applied Materials, Inc.. Invention is credited to Uwe HOLLERBACH, Mark HUNT, Thomas L. LAIDIG, Don STARSES.
Application Number | 20190271916 16/400563 |
Document ID | / |
Family ID | 56975244 |
Filed Date | 2019-09-05 |
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United States Patent
Application |
20190271916 |
Kind Code |
A1 |
HOLLERBACH; Uwe ; et
al. |
September 5, 2019 |
REAL TIME SOFTWARE AND ARRAY CONTROL
Abstract
A real time software and array control software application
platform which maintains the ability to manage the synchronization
between substrate alignments and image projection systems during
maskless lithography patterning in a manufacturing process is
disclosed. The application coordinates and controls the image
projection systems such that discrepancies in and misalignments of
the substrate may be determined and accounted for in real time. The
image projection systems may run in parallel and may be controlled
by a central processor.
Inventors: |
HOLLERBACH; Uwe; (Fremont,
CA) ; LAIDIG; Thomas L.; (Richmond, CA) ;
HUNT; Mark; (Morgan Hill, CA) ; STARSES; Don;
(Cupertino, CA) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Applied Materials, Inc. |
Santa Clara |
CA |
US |
|
|
Family ID: |
56975244 |
Appl. No.: |
16/400563 |
Filed: |
May 1, 2019 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
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15078419 |
Mar 23, 2016 |
10331038 |
|
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16400563 |
|
|
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|
62137775 |
Mar 24, 2015 |
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
G03F 7/70275 20130101;
G03F 7/70291 20130101; G03F 7/70358 20130101; G03F 7/70783
20130101; G03F 7/70508 20130101; G03F 7/70258 20130101; G05B
2219/45028 20130101 |
International
Class: |
G03F 7/20 20060101
G03F007/20 |
Claims
1. A method for real time coordination of image projection systems,
sequentially comprising: positioning a first substrate on a first
stage of one or more stages, each stage moveable between a
processing position located adjacent to a processing unit comprised
of a plurality of image projection systems and a loading position
located away from the processing unit; moving the first stage from
the loading position to the processing position; detecting a
location and an orientation of the first substrate within the
processing unit; activating at least two image projection systems
of the plurality of image projection systems; and patterning the
first substrate in the processing unit, the patterning comprising:
processing a plurality of graphical objects into a plurality of
convex polygons to define a layout pattern to be formed on the
first substrate; modifying the layout pattern based on the detected
location and orientation of the first substrate, wherein the
modifying the layout pattern is selected from the group consisting
of rotating the layout pattern, stretching the layout pattern,
shrinking the layout pattern, applying a non-linear transformation
to the layout pattern, or any combination thereof; and performing a
maskless photolithography process to form the layout pattern on the
first substrate.
2. The method of claim 1, wherein the performing a maskless
photolithography process comprises moving the first substrate with
respect to the at least two image projection systems.
3. The method of claim 1, wherein there are two or more stages.
4. The method of claim 1, further comprising adjusting the at least
two image projection systems, and wherein the detecting reads a
distortion of the first substrate and determines instructions for
the adjustment of the image projection systems.
5. The method of claim 4, wherein the distortion of the first
substrate is a local distortion.
6. The method of claim 1, further comprising activating the at
least two image projection systems.
7. The method of claim 1, wherein the at least two image projection
systems is an array of image projection systems, the array
containing twenty-two image projection systems, wherein the image
projection systems of the array are controlled in parallel.
8. A computer system for performing real time coordination of image
projection systems, comprising: a processor; and a memory storing
instructions that, when executed by the processor, cause the
computer system to sequentially: position a first substrate on a
first stage of one or more stages, each stage moveable between a
processing position located adjacent to a processing unit comprised
of a plurality of image projection systems and a loading position
located away from the processing unit; move the first stage from
the loading position to the processing position; detect a location
and an orientation of the first substrate within the processing
unit; activate at least two image projection systems of the
plurality of image projection systems; and pattern the first
substrate in the processing unit, the patterning comprising:
processing a plurality of graphical objects into a plurality of
convex polygons to define a layout pattern to be formed on the
first substrate; modifying the layout pattern based on the detected
location and orientation of the first substrate, wherein the
modifying the layout pattern is selected from the group consisting
of rotating the layout pattern, stretching the layout pattern,
shrinking the layout pattern, applying a non-linear transformation
to the layout pattern, or any combination thereof; and performing a
maskless photolithography process to form the layout pattern on the
first substrate.
9. The computer system of claim 8, wherein the performing a
maskless photolithography process comprises moving the first
substrate with respect to the at least two image projection
systems.
10. The computer system of claim 8, wherein there are two or more
stages.
11. The computer system of claim 8, further comprising a step of
adjusting the at least two image projection systems, and wherein
the detecting reads a distortion of the first substrate and
determines instructions for the adjustment of the at least two
image projection systems.
12. The computer system of claim 11, wherein the distortion of the
first substrate is a local distortion.
13. The computer system of claim 8, the memory further comprising a
step of activating the at least two image projection systems.
14. The computer system of claim 8, wherein the at least two image
projection systems is an array of image projection systems, the
array containing twenty-two image projection systems, wherein the
image projection systems of the array are controlled in
parallel.
15. A non-transitory computer-readable medium storing instructions
that, when executed by a processor, cause a computer system to
coordinate image projection systems in real time, by sequentially
performing the steps of: positioning a first substrate on a first
stage of one or more stages, each stage moveable between a
processing position located adjacent to a processing unit comprised
of a plurality of image projection systems and a loading position
located away from the processing unit; moving the first stage from
the loading position to the processing position; detecting a
location and an orientation of the first substrate within the
processing unit; activating at least two image projection systems
of the plurality of image projection systems; and patterning the
first substrate in the processing unit, the patterning comprising:
processing a plurality of graphical objects into a plurality of
convex polygons to define a layout pattern to be formed on the
first substrate; modifying the layout pattern based on the detected
location and orientation of the first substrate, wherein the
modifying the layout pattern is selected from the group consisting
of rotating the layout pattern, stretching the layout pattern,
shrinking the layout pattern, applying a non-linear transformation
to the layout pattern, or any combination thereof; and performing a
maskless photolithography process to form the layout pattern on the
first substrate.
16. The non-transitory computer-readable medium of claim 15,
wherein the performing a maskless photolithography process
comprises moving the first substrate with respect to the at least
two image projection systems.
17. The non-transitory computer-readable medium of claim 15,
wherein there are two or more stages.
18. The non-transitory computer-readable medium of claim 15,
further comprising a step of adjusting the at least two image
projection systems, and wherein the detecting reads a distortion of
the first substrate and determines instructions for the adjustment
of the at least two image projection systems.
19. The non-transitory computer-readable medium of claim 18,
wherein the distortion of the first substrate is a local
distortion.
20. The non-transitory computer-readable medium of claim 15,
further comprising a step of activating the at least two image
projection systems.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is a continuation application of U.S.
patent application Ser. No. 15/078,419, filed Mar. 23, 2016, which
itself claims benefit of U.S. Provisional Patent Application Ser.
No. 62/137,775 filed Mar. 24, 2015, each of which are hereby
incorporated by reference in their entireties.
BACKGROUND
Field
[0002] Embodiments of the present disclosure generally relate to
the field of maskless lithography. More specifically, embodiments
provided herein relate to a system and method for performing
maskless digital lithography manufacturing processes.
Description of the Related Art
[0003] Photolithography is widely used in the manufacturing of
semiconductor devices and display devices, such as liquid crystal
displays (LCDs). Large area substrates are often utilized in the
manufacture of LCDs. LCDs, or flat panels, are commonly used for
active matrix displays, such as computers, touch panel devices,
personal digital assistants (PDAs), cell phones, television
monitors, and the like. Generally, flat panels may include a layer
of liquid crystal material forming pixels sandwiched between two
plates. When power from the power supply is applied across the
liquid crystal material, an amount of light passing through the
liquid crystal material may be controlled at pixel locations
enabling images to be generated.
[0004] Microlithography techniques are generally employed to create
electrical features incorporated as part of the liquid crystal
material layer forming the pixels. According to this technique, a
light-sensitive photoresist is typically applied to at least one
surface of the substrate. Then, a pattern generator exposes
selected areas of the light-sensitive photoresist as part of a
pattern with light to cause chemical changes to the photoresist in
the selective areas to prepare these selective areas for subsequent
material removal and/or material addition processes to create the
electrical features.
[0005] In order to continue to provide display devices and other
devices to consumers at the prices demanded by consumers, new
apparatuses, approaches, and systems are needed to precisely and
cost-effectively create patterns on substrates, such as large area
substrates.
[0006] As the foregoing illustrates, there is a need for an
improved technique for the real time management of image projection
systems within digital lithography. More specifically, what is
needed in the art is a real time software and array control
application which detects the location and orientation of a
substrate and manages a synchronization of image projection
systems, all in real time.
SUMMARY
[0007] The present disclosure generally relates to a real time
software and array control software application platform which
maintains the ability to manage the synchronization between
substrates and image projection systems during maskless lithography
patterning in a manufacturing process. In one embodiment, a method
for the real time coordination of image projection systems is
disclosed. The method includes detecting a location and an
orientation of a substrate within a processing unit, and activating
at least two image projection systems. The method further includes
coordinating the at least two image projection systems, controlling
the at least two image projection systems, wherein the controlling
aligns the at least two image projection systems with an alignment
of the substrate, and processing the substrate in the processing
unit.
[0008] In another embodiment, a computer system for performing the
real time coordination of image projection systems is disclosed.
The computer system for performing the real time coordination of
image projection systems includes a processor and a memory storing
instructions that, when executed by the processor, cause the
computer system to detect a location and an orientation of a
substrate within a processing unit, and activate at least two image
projection systems. The memory may also store instructions that,
when executed by the processor, cause the computer system to
coordinate the at least two image projection systems, control the
at least two image projection systems, wherein the controlling
aligns the at least two image projection systems with an alignment
of the substrate, and process the substrate in the processing
unit.
[0009] In yet another embodiment, a non-transitory
computer-readable medium, storing instructions that, when executed
by a processor, cause a computer system to coordinate image
projection systems in real time is disclosed. The processor may
perform the steps of detecting a location and an orientation of a
substrate within a processing unit, and activating at least two
image projection systems. The processor may also perform the steps
of coordinating the at least two image projection systems,
controlling the at least two image projection systems, wherein the
controlling aligns the at least two image projection systems with
an alignment of the substrate, and processing the substrate in the
processing unit.
BRIEF DESCRIPTION OF THE DRAWINGS
[0010] So that the manner in which the above recited features of
the present disclosure can be understood in detail, a more
particular description of the disclosure, briefly summarized above,
may be had by reference to embodiments, some of which are
illustrated in the appended drawings. It is to be noted, however,
that the appended drawings illustrate only exemplary embodiments of
this disclosure and are therefore not to be considered limiting of
its scope, for the disclosure may be applied to other equally
effective embodiments.
[0011] FIG. 1 is a perspective view of a system that may benefit
from embodiments disclosed herein.
[0012] FIG. 2 is a cross-sectional side view of the system of FIG.
1 according to one embodiment.
[0013] FIG. 3 is a perspective schematic view of a plurality of
image projection systems according to one embodiment.
[0014] FIG. 4 is a perspective schematic view of an image
projection system of the plurality of image projection devices of
FIG. 3 according to one embodiment.
[0015] FIG. 5 is an enlarged perspective view of two mirrors of a
DMD according to one embodiment.
[0016] FIG. 6 schematically illustrates a beam being reflected by
the two mirrors of the DMD of FIG. 5 according to one
embodiment.
[0017] FIG. 7 illustrates a computer system for providing a real
time software and array control application for managing the
synchronization between substrates and image projection systems
during maskless lithography according to one embodiment described
herein.
[0018] FIG. 8 illustrates a more detailed view of a server of FIG.
7 according to one embodiment described herein.
[0019] FIG. 9 illustrates a controller computing system used to
access a real time software and array control application for
managing the synchronization between substrates and image
projection systems during maskless lithography according to one
embodiment described herein.
[0020] FIG. 10 schematically illustrates operations of a method for
the real time coordination of image projection systems according to
one embodiment described herein.
[0021] To facilitate understanding, identical reference numerals
have been used, where possible, to designate identical elements
that are common to the figures. It is contemplated that elements
and features of one embodiment may be beneficially incorporated in
other embodiments without further recitation.
DETAILED DESCRIPTION
[0022] Embodiments described herein generally relate to a real time
software and array control software application platform which
maintains the ability to manage the synchronization between
substrates and image projection systems during maskless lithography
patterning in a manufacturing process. The application coordinates
and controls the image projection systems such that discrepancies
in and misalignments of the substrate may be accounted for in real
time. The image projection systems may run in parallel and may be
controlled by a central processor.
[0023] The term "user" as used herein includes, for example, a
person or entity that owns a computing device or wireless device; a
person or entity that operates or utilizes a computing device or a
wireless device; or a person or entity that is otherwise associated
with a computing device or a wireless device. It is contemplated
that the term "user" is not intended to be limiting and may include
various examples beyond those described.
[0024] FIG. 1 is a perspective view of a system 100 that may
benefit from embodiments disclosed herein. The system 100 includes
a base frame 110, a slab 120, two or more stages 130, and a
processing apparatus 160. In certain embodiments, one stage 130 may
be used. The base frame 110 may rest on the floor of a fabrication
facility and may support the slab 120. Passive air isolators 112
may be positioned between the base frame 110 and the slab 120. The
slab 120 may be a monolithic piece of granite, and the two or more
stages 130 may be disposed on the slab 120. A substrate 140 may be
supported by each of the two or more stages 130. A plurality of
holes (not shown) may be formed in the stage 130 for allowing a
plurality of lift pins (not shown) to extend therethrough. The lift
pins may rise to an extended position to receive the substrate 140,
such as from a transfer robot (not shown). The transfer robot may
position the substrate 140 on the lift pins, and the lift pins may
thereafter gently lower the substrate 140 onto the stage 130.
[0025] The substrate 140 may, for example, be made of quartz and be
used as part of a flat panel display. In other embodiments, the
substrate 140 may be made of other materials. In some embodiments,
the substrate 140 may have a photoresist layer formed thereon. A
photoresist is sensitive to radiation and may be a positive
photoresist or a negative photoresist, meaning that portions of the
photoresist exposed to radiation will be respectively soluble or
insoluble to a photoresist developer applied to the photoresist
after the pattern is written into the photoresist. The chemical
composition of the photoresist determines whether the photoresist
will be a positive photoresist or negative photoresist. For
example, the photoresist may include at least one of
diazonaphthoquinone, a phenol formaldehyde resin, poly(methyl
methacrylate), poly(methyl glutarimide), and SU-8. In this manner,
the pattern may be created on a surface of the substrate 140 to
form the electronic circuitry.
[0026] The system 100 may further include a pair of supports 122
and a pair of tracks 124. The pair of supports 122 may be disposed
on the slab 120, and the slab 120 and the pair of supports 122 may
be a single piece of material. The pair of tracks 124 may be
supported by the pair of the supports 122, and the two or more
stages 130 may move along the tracks 124 in the X-direction. In one
embodiment, the pair of tracks 124 is a pair of parallel magnetic
channels. As shown, each track 124 of the pair of tracks 124 is
linear. In other embodiments, the track 124 may have a non-linear
shape. An encoder 126 may be coupled to each stage 130 in order to
provide location information to a controller 702 (See FIG. 9).
[0027] The processing apparatus 160 may include a support 162 and a
processing unit 164. The support 162 may be disposed on the slab
120 and may include an opening 166 for the two or more stages 130
to pass under the processing unit 164. The processing unit 164 may
be supported by the support 162. In one embodiment, the processing
unit 164 is a pattern generator configured to expose a photoresist
in a photolithography process. In some embodiments, the pattern
generator may be configured to perform a maskless lithography
process. The processing unit 164 may include a plurality of image
projection systems (shown in FIG. 3) disposed in a case 165. The
processing apparatus 160 may be utilized to perform maskless direct
patterning. During operation, one of the two or more stages 130
moves in the X-direction from a loading position, as shown in FIG.
1, to a processing position. The processing position may refer to
one or more positions of the stage 130 as the stage 130 passes
under the processing unit 164. During operation, the two or more
stages 130 may be lifted by a plurality of air bearings 202 (shown
in FIG. 2) and may move along the pair of tracks 124 from the
loading position to the processing position. A plurality of
vertical guide air bearings (not shown) may be coupled to each
stage 130 and positioned adjacent an inner wall 128 of each support
122 in order to stabilize the movement of the stage 130. Each of
the two or more stages 130 may also move in the Y-direction by
moving along a track 150 for processing and/or indexing the
substrate 140.
[0028] FIG. 2 is a cross-sectional side view of the system 100 of
FIG. 1 according to one embodiment. As shown, each stage 130
includes a plurality of air bearings 202 for lifting the stage 130.
Each stage 130 may also include a motor coil (not shown) for moving
the stage 130 along the tracks 124. The two or more stages 130 and
the processing apparatus 160 may be enclosed by an enclosure (not
shown) in order to provide temperature and pressure control.
[0029] FIG. 3 is a perspective schematic view of a plurality of
image projection systems 301 according to one embodiment. As shown
in FIG. 3, each image projection system 301 produces a plurality of
write beams 302 onto a surface 304 of the substrate 140. As the
substrate 140 moves in the X-direction and Y-direction, the entire
surface 304 may be patterned by the write beams 302. The number of
the image projection systems 301 may vary based on the size of the
substrate 140 and/or the speed of stage 130. In one embodiment,
there are 22 image projection systems 164 in the processing
apparatus 160.
[0030] FIG. 4 is a perspective schematic view of one image
projection system 301 of the plurality of image projection systems
301 of FIG. 3 according to one embodiment. The image projection
system 301 may include a light source 402, an aperture 404, a lens
406, a mirror 408, a DMD 410, a light dump 412, a camera 414, and a
projection lens 416. The light source 402 may be a light emitting
diode (LED) or a laser, and the light source 402 may be capable of
producing a light having predetermined wavelength. In one
embodiment, the predetermined wavelength is in the blue or near
ultraviolet (UV) range, such as less than about 450 nm. The mirror
408 may be a spherical mirror. The projection lens 416 may be a
10.times. objective lens. The DMD 410 may include a plurality of
mirrors, and the number of mirrors may correspond to the resolution
of the projected image. In one embodiment, the DMD 410 includes
1920.times.1080 mirrors.
[0031] During operation, a beam 403 having a predetermined
wavelength, such as a wavelength in the blue range, is produced by
the light source 402. The beam 403 is reflected to the DMD 410 by
the mirror 408. The DMD 410 includes a plurality of mirrors that
may be controlled individually, and each mirror of the plurality of
mirrors of the DMD 410 may be at "on" position or "off" position,
based on the mask data provided to the DMD 410 by the controller
(not shown). When the beam 403 reaches the mirrors of the DMD 410,
the mirrors that are at "on" position reflect the beam 403, i.e.,
forming the plurality of write beams 302, to the projection lens
416. The projection lens 416 then projects the write beams 302 to
the surface 304 of the substrate 140. The mirrors that are at "off"
position reflect the beam 403 to the light dump 412 instead of the
surface 304 of the substrate 140.
[0032] FIG. 5 is an enlarged perspective view of two mirrors 502,
504 of the DMD 410 according to one embodiment. As shown, each
mirror 502, 504 is disposed on a tilting mechanism 506, which is
disposed on a memory cell 508. The memory cell 508 may be a CMOS
SRAM. During operation, each mirror 502, 504 is controlled by
loading the mask data into the memory cell. The mask data
electrostatically controls the tilting of the mirror 502, 504 in a
binary fashion. When the mirror 502, 504 is in a reset mode or
without power applied, it may be set to a flat position, not
corresponding to any binary number. Zero in binary may correspond
to an "off" position, which means the mirror is tilted at -10
degrees, -12 degrees, or any other feasibly negative tilting
degree. One in binary may correspond to an "on" position, which
means the mirror is tilted at +10 degrees, +12 degrees, or any
other feasibly positive tilting degree. As shown in FIG. 5, the
mirror 502 is at "off" position and the mirror 504 is at "on"
position.
[0033] FIG. 6 schematically illustrates the beam 403 being
reflected by the two mirrors 502, 504 of the DMD 410 of FIG. 5
according to one embodiment. As shown, the mirror 502, which is at
"off" position, reflects the beam 403 generated from the light
source 402 to the light dump 412. The mirror 504, which is at "on"
position, forms the write beam 302 by reflecting the beam 403 to
the projection lens 416.
[0034] FIG. 7 illustrates a computing system 700 configured to
provide a real time software and array control software application
platform in which embodiments of the disclosure may be practiced.
As shown, the computing system 700 may include a plurality of
servers 708, a real time software and array control application
server 712, and a plurality of controllers (i.e., computers,
personal computers, mobile/wireless devices) 702 (only two of which
are shown for clarity), each connected to a communications network
706 (for example, the Internet). The servers 708 may communicate
with the database 714 via a local connection (for example, a
Storage Area Network (SAN) or Network Attached Storage (NAS)) or
over the Internet. The servers 708 are configured to either
directly access data included in the database 714 or to interface
with a database manager that is configured to manage data included
within the database 714.
[0035] Each controller 702 may include conventional components of a
computing device, for example, a processor, system memory, a hard
disk drive, a battery, input devices such as a mouse and a
keyboard, and/or output devices such as a monitor or graphical user
interface, and/or a combination input/output device such as a
touchscreen which not only receives input but also displays output.
Each server 708 and the real time software and array control
application server 712 may include a processor and a system memory
(not shown), and may be configured to manage content stored in
database 714 using, for example, relational database software
and/or a file system. The servers 708 may be programmed to
communicate with one another, the controllers 702, and the real
time software and array control server 712 using a network protocol
such as, for example, the TCP/IP protocol. The real time software
and array control application server 712 may communicate directly
with the controllers 702 through the communications network 706.
The controllers 702 are programmed to execute software 704, such as
programs and/or other software applications, and access
applications managed by servers 708.
[0036] In the embodiments described below, users may respectively
operate the controllers 702 that may be connected to the servers
708 over the communications network 706. Pages, images, data,
documents, and the like may be displayed to a user via the
controllers 702. Information and images may be displayed through a
display device and/or a graphical user interface in communication
with the controller 702.
[0037] It is noted that the controller 702 may be a personal
computer, laptop mobile computing device, smart phone, video game
console, home digital media player, network-connected television,
set top box, and/or other computing devices having components
suitable for communicating with the communications network 706
and/or the applications or software. The controller 702 may also
execute other software applications configured to receive content
and information from the real time software and array control
application 712.
[0038] FIG. 8 illustrates a more detailed view of the real time
software and array control application server 712 of FIG. 7. The
real time software and array control application server 712
includes, without limitation, a central processing unit (CPU) 802,
a network interface 804, memory 820, and storage 830 communicating
via an interconnect 806. The real time software and array control
application server 712 may also include I/O device interfaces 808
connecting I/O devices 810 (for example, keyboard, video, mouse,
audio, touchscreen, etc.). The real time software and array control
application 712 may further include the network interface 804
configured to transmit data via the communications network 706.
[0039] The CPU 802 retrieves and executes programming instructions
stored in the memory 820 and generally controls and coordinates
operations of other system components. Similarly, the CPU 802
stores and retrieves application data residing in the memory 820.
The CPU 802 is included to be representative of a single CPU,
multiple CPU's, a single CPU having multiple processing cores, and
the like. The interconnect 806 is used to transmit programming
instructions and application data between the CPU 802, I/O device
interfaces 808, storage 830, network interfaces 804, and memory
820.
[0040] The memory 820 is generally included to be representative of
a random access memory and, in operation, stores software
applications and data for use by the CPU 802. Although shown as a
single unit, the storage 830 may be a combination of fixed and/or
removable storage devices, such as fixed disk drives, floppy disk
drives, hard disk drives, flash memory storage drives, tape drives,
removable memory cards, CD-ROM, DVD-ROM, Blu-Ray, HD-DVD, optical
storage, network attached storage (NAS), cloud storage, or a
storage area-network (SAN) configured to store non-volatile
data.
[0041] The memory 820 may store instructions and logic for
executing an application platform 826 which may include real time
software and array control software 828. The storage 830 may
include a database 832 configured to store data 834 and associated
application platform content 836. The database 832 may be any type
of storage device.
[0042] Network computers are another type of computer system that
can be used in conjunction with the disclosures provided herein.
Network computers do not usually include a hard disk or other mass
storage, and the executable programs are loaded from a network
connection into the memory 820 for execution by the CPU 802. A
typical computer system will usually include at least a processor,
memory, and an interconnect coupling the memory to the
processor.
[0043] FIG. 9 illustrates a controller 702 used to access the real
time software and array control application 712 and retrieve or
display data associated with the application platform 826. The
controller 702 may include, without limitation, a central
processing unit (CPU) 902, a network interface 904, an interconnect
906, a memory 920, storage 930, and support circuits 940. The
controller 702 may also include an I/O device interface 908
connecting I/O devices 910 (for example, keyboard, display,
touchscreen, and mouse devices) to the controller 702.
[0044] Like CPU 802, CPU 902 is included to be representative of a
single CPU, multiple CPU's, a single CPU having multiple processing
cores, etc., and the memory 920 is generally included to be
representative of a random access memory. The interconnect 906 may
be used to transmit programming instructions and application data
between the CPU 902, I/O device interfaces 908, storage 930,
network interface 904, and memory 920. The network interface 904
may be configured to transmit data via the communications network
706, for example, to transfer content from the real time software
and array control application server 712. Storage 930, such as a
hard disk drive or solid-state storage drive (SSD), may store
non-volatile data. The storage 930 may contain a database 931. The
database 931 may contain data 932 and other content 934.
Illustratively, the memory 920 may include an application interface
922, which itself may display software instructions 924, and/or
store or display data 926. The application interface 922 may
provide one or more software applications which allow the
controller to access data and other content hosted by the real time
software and array control application server 712.
[0045] As shown in FIG. 9, the system 100 includes a controller
702. The controller 702 is generally designed to facilitate the
control and automation of the processing techniques described
herein. The controller 702 may be coupled to or in communication
with one or more of the processing apparatus 160, the stages 130,
and the encoder 126. The processing apparatus 160 and the stages
130 may provide information to the controller 702 regarding the
substrate processing and the substrate aligning. For example, the
processing apparatus 160 may provide information to the controller
702 to alert the controller that substrate processing has been
completed. The encoder 126 may provide location information to the
controller 702, and the location information is then used to
control the stages 130 and the processing apparatus 160.
[0046] The controller 702 may include a central processing unit
(CPU) 902, memory 920, and support circuits 940 (or I/O 908). The
CPU 902 may be one of any form of computer processors that are used
in industrial settings for controlling various processes and
hardware (e.g., pattern generators, motors, and other hardware) and
monitor the processes (e.g., processing time and substrate
position). The memory 920, as shown in FIG. 9, is connected to the
CPU 902, and may be one or more of a readily available memory, such
as random access memory (RAM), read only memory (ROM), floppy disk,
hard disk, or any other form of digital storage, local or remote.
Software instructions and data can be coded and stored within the
memory for instructing the CPU 902. The support circuits 940 are
also connected to the CPU 902 for supporting the processor in a
conventional manner. The support circuits 940 may include
conventional cache 942, power supplies 944, clock circuits 946,
input/output circuitry 948, subsystems 950, and the like. A program
(or computer instructions) readable by the controller 702
determines which tasks are performable on a substrate. The program
may be software readable by the controller 702 and may include code
to monitor and control, for example, the processing time and
substrate position.
[0047] It should be borne in mind, however, that all of these and
similar terms are to be associated with the appropriate physical
quantities and are merely convenient labels applied to these
quantities. Unless specifically stated otherwise as apparent from
the following discussion, it is appreciated that throughout the
description, discussions utilizing terms such as "processing" or
"computing" or "calculating" or "determining" or "displaying" or
the like, refer to the action and processes of a computer system,
or similar electronic computing device, that manipulates and
transforms data represented as physical (electronic) quantities
within the computer system's registers and memories into other data
similarly represented as physical quantities within the computer
system memories or registers or other such information storage,
transmission, or display devices.
[0048] The present example also relates to an apparatus for
performing the operations herein. This apparatus may be specially
constructed for the required purposes, or it may comprise a general
purpose computer selectively activated or reconfigured by a
computer program stored in the computer. Such a computer program
may be stored in a computer readable storage medium, such as, but
is not limited to, read-only memories (ROMs), random access
memories (RAMs), EPROMs, EEPROMs, flash memory, magnetic or optical
cards, any type of disk including floppy disks, optical disks,
CD-ROMs, and magnetic-optical disks, or any type of media suitable
for storing electronic instructions, and each coupled to a computer
system interconnect.
[0049] The algorithms and displays presented herein are not
inherently related to any particular computer or other apparatus.
Various general purpose systems may be used with programs in
accordance with the teachings herein, or it may prove convenient to
construct a more specialized apparatus to perform the method
operations. The structure for a variety of these systems will
appear from the description above. In addition, the present
examples are not described with reference to any particular
programming language, and various examples may thus be implemented
using a variety of programming languages.
[0050] As described in greater detail within, embodiments of the
disclosure provide a software application through which the
synchronization of image projection systems and the alignment of a
substrate can be managed in real time in order to provide
coordination amongst the image projection systems and account for
misalignments within the system during maskless lithography
patterning in a manufacturing process. The application coordinates
and controls the image projection systems such that discrepancies
in and misalignments of the substrate may be accounted for in real
time. The image projection systems may run in parallel and may be
controlled by a central processor.
[0051] In one embodiment, a method for the real time coordination
of image projection systems 301 is disclosed. The method may be
performed by a controller 702, as shown in FIG. 9.
[0052] As discussed with reference to FIG. 3, supra, each image
projection system 301 produces a plurality of write beams 302 onto
a surface 304 of the substrate 140, and, as the substrate 140 moves
in the X-direction and Y-direction, the entire surface 304 may be
patterned by the write beams 302. The image projection systems 301
may expose a substrate 140 and deliver light to the surface of the
substrate 140. However, as the substrate 140 is placed on and
supported by each of the two or more stages 130, the substrate 140
may not be aligned correctly with the process chamber. A
misalignment may be slight, such as for example a misalignment in
the X or Y direction. A misalignment of the substrate 140 may cause
a straight pattern laid on the substrate 140 to be misaligned. If a
straight aligned pattern is laid on a misaligned substrate 140 the
pattern will appear to be misaligned. A misaligned pattern may be a
distortion of the pattern, i.e. a crooked pattern. In some
embodiments, the distortion may be caused by various pieces of the
substrate 140 moving with respect to one another. For example, a
localized heating of the substrate 140 may cause a thermal
expansion of the substrate 140 at a first location, or other
processing steps may cause the substrate 140 to locally stretch,
shrink, or otherwise become strained--all of which create a
distortion. As such, the pattern may be adjusted so that the
pattern in is aligned with the misaligned substrate 140. By
correcting the misalignment of the pattern to be aligned with the
misaligned substrate 140, the pattern is laid correctly on the
substrate 140. Furthermore, the pattern may be adjusted to correct
for the distortions. Each of the image projection systems 301 may
allow for the processing of one or more graphical objects of the
surface 304 of the substrate 140. Processing of the graphical
objects may generate and/or partition the one or more graphical
objects into a plurality of convex polygons. To facilitate parallel
image processing acceleration, the polygons may be tessellated into
convex polygons, such as trapezoids and/or triangles.
[0053] In some embodiments, rotations, stretching, shrinking,
and/or other non-linear transformations of the layout pattern may
be performed to compensate for the misalignment of the substrate
140, a rotation of the substrate 140, and/or a distortion of the
substrate 140. In other embodiments, a tilting of the substrate 140
and/or an adjustment of the tilting mechanism 506 of each mirror
502, 504 may compensate for the misalignment of the layout pattern.
It is further contemplated that the optical system and/or a
component of the optical system, for example, a lens or set of
lenses, may be raised or lowered vertically to correct for a height
distortion of the layout pattern and/or the substrate 140. In some
embodiments, the height distortion may be compensated for on the
fly by vertically adjusting a component of the optical system. In
some embodiments, the optical system may include the DMD 410.
[0054] A location and an orientation of a substrate 140 within a
processing unit may be detected. The detecting may be accomplished
through the use of sensors, lasers, lights, and/or any other
suitable detecting means within the processing unit. The detecting
may read a distortion of the substrate and determine instructions
for the adjustment of the image projection systems 301. The
instructions may be stored as data 938 in an image processing unit
936 of the storage 930 of the controller 702. The instructions,
stored as data 938, may be updated as the substrate 140 is further
processed. The image processing unit 936 may contain control logic
939 configured to apply the instructions for the adjustment of the
image projection systems 301. The control logic 939 may be
configured to synchronize operations of the image projection
systems 301. Any data generated from the image processing unit 936
may be stored in the image processing unit 936 or in another
suitable storage facility.
[0055] The detection of a location of the substrate 140 may allow
for the adjustment of subsequent or concurrent processes. The
detection of an orientation of the substrate 140 may allow for the
forming of operations, based on the instructions, for the
adjustment of other components controlled by the controller 702.
The detecting of a location and an orientation of the substrate 140
may occur in real time. If instructions for the adjustment of the
image projection systems 301 are not determined during the
detecting of the location and the orientation of the substrate
within the processing unit, such instructions may be determined via
the controller 702 after the detecting is complete.
[0056] Furthermore, the at least two image projection systems 301
may be activated. Activation of least two image projection systems
301 may include powering on, testing, focusing, adjusting, and/or
moving of the at least two image projection systems 301. An
adjustment of the image projection systems 301, which may align the
image projection systems 301 with the substrate, may occur after
activating the image projection systems 301.
[0057] The at least two image projection systems 301 may be
coordinated. The coordinating may synchronize the image projection
systems 301 such that the image projection systems 301 position in
sync and as a unit. The coordinating may further adjust the image
projection systems 301 based on the instructions determined via the
detection of a misalignment of the substrate 140. Furthermore, the
at least two image projection systems 301 may be controlled. The
controlling may align the at least two image projection systems 301
with an alignment of the substrate 140. The at least two image
projection systems 301 may be controlled in parallel. The
controlling of the at least two image projection systems 301 may
occur in real time. As previously discussed, the image projection
systems 301 may be aligned with the misalignment of the substrate
140, such that the image projection systems 301 and the substrate
140 are correctly aligned. Additionally, the substrate 140 may be
processed in the processing unit.
[0058] In one embodiment, the at least two image projection systems
301 may be an array of image projection systems 301. The array may
contain twenty-two image projection systems 301, or any other
suitable number of image projection systems 301. The number of
image projection systems 301 necessary as part of an array of image
projection systems 301 may be dependent upon the size of the
substrate 140 being processed. The array of image projection
systems 301 may be controlled in parallel.
[0059] In another embodiment, a computer system for performing the
real time coordination of image projection systems 301 is
disclosed. The computer system may comprise a processor and a
memory. The memory may store instructions that, when executed by
the processor, cause the computer system to detect a location and
an orientation of a substrate 140 within a processing unit. The
detecting may be accomplished through the use of sensors, lasers,
lights, and/or any other suitable detecting means within the
processing unit. The detecting may read a distortion of the
substrate and determine instructions for the adjustment of the
image projection systems 301. The instructions may be stored as
data 938 in an image processing unit 936 of the storage 930 of the
controller 702. The instructions, stored as data 938, may be
updated as the substrate 140 is further processed. The image
processing unit 936 may contain control logic 939 configured to
apply the instructions for the adjustment of the image projection
systems 301. The control logic 939 of the image processing unit 936
may be configured to synchronize operations of the image projection
systems 301. Any data generated from the image processing unit 936
may be stored in the image processing unit 936 or in another
suitable storage facility.
[0060] A detection of a location of the substrate 140 may allow for
the adjustment of subsequent or concurrent processes. The detecting
of an orientation of the substrate 140 may allow for the forming of
operations, based on the instructions, for the adjustment of other
components controlled by the controller 702. The detecting of a
location and an orientation of the substrate 140 may occur in real
time. If instructions for the adjustment of the image projection
systems 301 are not determined during the detecting of the location
and the orientation of the substrate within the processing unit,
such instructions may be determined via the controller 702 after
the detecting is complete.
[0061] During processing at least two image projection systems 301
may be activated. Activation of least two image projection systems
301 may include powering on, testing, focusing, adjusting, and/or
moving of the at least two image projection systems 301. An
adjustment of the image projection systems 301 which may align the
image projection systems 301 with the substrate may occur after
activating the image projection systems 301.
[0062] The computer system may coordinate the at least two image
projection systems 301. The coordinating may synchronize the image
projection systems 301 such that the image projection systems 301
position in sync and as a unit. The coordinating may further adjust
the image projection systems 301 based on the instructions
determined via the detection of a misalignment of the substrate
140. Furthermore, the computer system may control the at least two
image projection systems 301. The controlling may align the at
least two image projection systems 301 with an alignment of the
substrate 140. The at least two image projection systems 301 may be
controlled in parallel. The controlling of the at least two image
projection systems 301 may occur in real time. As previously
discussed, the image projection systems 301 may be aligned to be
with the misalignment of the substrate 140, such that the image
projection systems 301 and the substrate 140 are aligned.
Additionally, the substrate 140 may be processed in the processing
unit.
[0063] In yet another embodiment, a non-transitory
computer-readable medium storing instructions that, when executed
by a processor, cause a computer system to coordinate image
projection systems in real time is disclosed. The non-transitory
computer-readable medium may perform the steps of detecting a
location and an orientation of a substrate 140 within a processing
unit. The detecting may be accomplished through the use of sensors,
lasers, lights, and/or any other suitable detecting means within
the processing unit. The detecting may read a distortion of the
substrate and determine instructions for the adjustment of the
image projection systems 301. The instructions may be stored as
data 938 in an image processing unit 936 of the storage 930 of the
controller 702. The instructions, stored as data 938, may be
updated as the substrate 140 is further processed. The image
processing unit 936 may contain control logic 939 configured to
apply the instructions for the adjustment of the image projection
systems 301. The control logic 939 of the image processing unit 936
may be configured to synchronize operations of the image projection
systems 301. Any data generated from the image processing unit 936
may be stored in the image processing unit 936 or in another
suitable storage facility.
[0064] A detection of a location of the substrate 140 may allow for
the adjustment of subsequent or concurrent processes. The detecting
of an orientation of the substrate 140 may allow for the forming of
operations, based on the instructions, for the adjustment of other
components controlled by the controller 702. The detecting of a
location and an orientation of the substrate 140 may occur in real
time. If instructions for the adjustment of the image projection
systems 301 are not determined during the detecting of the location
and the orientation of the substrate within the processing unit,
such instructions may be determined via the controller 702 after
the detecting is complete.
[0065] The non-transitory computer-readable medium may also perform
the steps of activating the at least two image projection systems
301. Activation of least two image projection systems 301 may
include powering on, testing, focusing, adjusting, and/or moving of
the at least two image projection systems 301. An adjustment of the
image projection systems 301 which may align the image projection
systems 301 with the substrate may occur after activating the image
projection systems 301.
[0066] The non-transitory computer-readable medium may also perform
the steps of coordinating the at least two image projection systems
301, and controlling the at least two image projection systems. The
coordinating may synchronize the image projection systems 301 such
that the image projection systems 301 position in sync and as a
unit. The coordinating may further adjust the image projection
systems 301 based on the instructions determined via the detection
of a misalignment of the substrate 140. The controlling may align
the at least two image projection systems 301 with an alignment of
the substrate 140. The at least two image projection systems 301
may be controlled in parallel. The controlling of the at least two
image projection systems 301 may occur in real time. As previously
discussed, the image projection systems 301 may be aligned to be
with the misalignment of the substrate 140, such that the image
projection systems 301 and the substrate 140 are perfectly aligned.
Additionally, the substrate 140 may be processed in the processing
unit.
[0067] FIG. 10 schematically illustrates operations of a method
1000 for the real time coordination of image projection systems.
The method 1000 generally relates to the use of parallel
computation to provide the real time coordination, synchronization,
and management of any number of image projection systems 301 during
maskless lithography patterning in a manufacturing process. At
operation 1010, a location and an orientation of a substrate within
a processing unit is detected. At operation 1020, at least two
image projection systems are activated. At operation 1030, the at
least two image projection systems are coordinated. At operation
1040, the at least two image projection systems are controlled. The
controlling may align the at least two image projection systems
with an alignment of the substrate. At operation 1050, the
substrate is processed in the processing unit.
[0068] The real time software and array control application allows
the image projection systems 301 to be synchronized, ran in
parallel, and controlled by a central controller. The utilization
of a central controller allows for coordination amongst each of the
image projection systems 301. Furthermore, the real time detection
of a misalignment of a substrate allows for the real time
adjustment of the image projection systems, such that the image
projection systems may align with the substrate.
[0069] While the foregoing is directed to embodiments described
herein, other and further embodiments may be devised without
departing from the basic scope thereof. For example, aspects of the
present disclosure may be implemented in hardware or software or in
a combination of hardware and software. One embodiment described
herein may be implemented as a program product for use with a
computer system. The program(s) of the program product define
functions of the embodiments (including the methods described
herein) and can be contained on a variety of computer-readable
storage media. Illustrative computer-readable storage media
include, but are not limited to: (i) non-writable storage media
(for example, read-only memory devices within a computer such as
CD-ROM disks readable by a CD-ROM drive, flash memory, ROM chips or
any type of solid-state non-volatile semiconductor memory) on which
information is permanently stored; and (ii) writable storage media
(for example, floppy disks within a diskette drive or hard-disk
drive or any type of solid-state random-access semiconductor
memory) on which alterable information is stored. Such
computer-readable storage media, when carrying computer-readable
instructions that direct the functions of the disclosed
embodiments, are embodiments of the present disclosure.
[0070] It will be appreciated to those skilled in the art that the
preceding examples are exemplary and not limiting. It is intended
that all permutations, enhancements, equivalents, and improvements
thereto that are apparent to those skilled in the art upon a
reading of the specification and a study of the drawings are
included within the true spirit and scope of the present
disclosure. It is therefore intended that the following appended
claims include all such modifications, permutations, and
equivalents as fall within the true spirit and scope of these
teachings.
* * * * *