U.S. patent application number 16/247777 was filed with the patent office on 2019-07-18 for system and method for fluid dispense and coverage control.
The applicant listed for this patent is Tokyo Electron Limited. Invention is credited to Anton J. deVilliers.
Application Number | 20190217327 16/247777 |
Document ID | / |
Family ID | 67212581 |
Filed Date | 2019-07-18 |
United States Patent
Application |
20190217327 |
Kind Code |
A1 |
deVilliers; Anton J. |
July 18, 2019 |
System and Method for Fluid Dispense and Coverage Control
Abstract
Techniques herein include systems and methods for dispensing
liquids on a substrate with real-time coverage control and removal
control. Techniques also encompass quality control of dispense
systems. Systems and methods enable visual examination of liquids
progressing on a surface of a substrate. This includes capturing
and/or examining stroboscopic images of movement of a given liquid
on a working surface of a substrate, and then generating feedback
data for modifying a corresponding dispense. Dispenses can be
modified by increasing/decreasing a dispense rate and
increasing/decreasing a rotational velocity of a substrate.
Feedback can be generated by automated and/or manual analysis of
real time progression as well as post-process analysis of
collections of images.
Inventors: |
deVilliers; Anton J.;
(Clifton Park, NY) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Tokyo Electron Limited |
Tokyo |
|
JP |
|
|
Family ID: |
67212581 |
Appl. No.: |
16/247777 |
Filed: |
January 15, 2019 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
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62617345 |
Jan 15, 2018 |
|
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
B05B 12/084 20130101;
B05C 13/025 20130101; B05C 11/1005 20130101; B05C 11/1007 20130101;
B05C 13/02 20130101; H04N 5/2256 20130101; H01L 22/26 20130101;
H01L 22/12 20130101; B05B 12/087 20130101; H04N 5/23229
20130101 |
International
Class: |
B05C 11/10 20060101
B05C011/10; B05C 13/02 20060101 B05C013/02; B05B 12/08 20060101
B05B012/08; H01L 21/66 20060101 H01L021/66 |
Claims
1. A method for dispensing liquid on a substrate, the method
comprising: rotating a substrate on a substrate holder about an
axis; dispensing a first liquid on a working surface of the
substrate; capturing images of the working surface of the substrate
while the first liquid is on the working surface of the substrate;
examining stroboscopic images of movement of the first liquid on
the working surface of the substrate using an image processor;
generating feedback data based on examination of the stroboscopic
images while the substrate is being rotated; and adjusting a
dispense operation of the first liquid on the working surface of
the substrate based on the feedback data, the dispense operation
corresponding to examined stroboscopic images.
2. The method of claim 1, wherein adjusting the dispense operation
includes selectively modifying a volume of first liquid dispensed
on the working surface of the substrate.
3. The method of claim 2, wherein adjusting the dispense operation
includes selectively modifying a rotational velocity of the
substrate holder.
4. The method of claim 1, wherein examining stroboscopic images
includes identifying coverage progression of photoresist across a
semiconductor wafer; and wherein adjusting the dispense operation
of the first liquid on the working surface of the substrate
includes dispensing an additional volume that is minimized to an
amount sufficient to complete full coating coverage of the working
surface of the substrate.
5. The method of claim 4, wherein identifying coverage progression
of the photoresist across the semiconductor wafer includes
calculating a surface area of uncoated regions of the working
surface of the substrate, and wherein generating the feedback data
includes indicating the additional volume of the first liquid to be
dispensed to complete coating coverage of the working surface of
the substrate.
6. The method of claim 1, wherein examining stroboscopic images
includes identifying coverage progression of photoresist across a
semiconductor wafer; and wherein adjusting the dispense operation
of the first liquid on the working surface of the substrate
includes increasing a rotation velocity of the substrate sufficient
to complete full coating coverage of the working surface of the
substrate.
7. The method of claim 1, wherein examining stroboscopic images
includes identifying coverage progression of photoresist across a
semiconductor wafer; and wherein adjusting the dispense operation
of the first liquid on the working surface of the substrate
includes reducing a rotation velocity of the substrate sufficient
to complete full coating coverage of the working surface of the
substrate.
8. The method of claim 1, wherein examining stroboscopic images
includes identifying coverage progression of photoresist across a
semiconductor wafer; and wherein adjusting the dispense operation
of the first liquid on the working surface of the substrate
includes dispensing an additional volume sufficient to complete
full coating coverage of the working surface of the substrate with
an overage volume of photoresist dispensed being less than four
percent of a given volume required to fully coat the working
surface of the substrate.
9. The method of claim 1, wherein examining stroboscopic images
includes identifying coverage progression rate of photoresist
across a semiconductor wafer, and wherein adjusting the dispense
operation of the first liquid on the working surface of the
substrate includes reducing a dispensed volume of the first liquid
to a minimum volume sufficient to complete full coating coverage of
the working surface of the substrate.
10. The method of claim 1, wherein examining stroboscopic images
includes examining real time progression of the first liquid across
the working surface of the substrate; and wherein adjusting the
given dispense operation occurs in real-time.
11. The method of claim 1, wherein examining stroboscopic images of
movement of the first liquid and generating the feedback data occur
in real time relative to the given dispense operation.
12. The method of claim 1, wherein adjusting the dispense operation
of the first liquid on the working surface of the substrate
includes stopping the given dispense operation in response to
receiving the feedback data indicating that the working surface of
the substrate is fully covered with the first liquid.
13. The method of claim 1, wherein examining stroboscopic images
includes identifying coverage progression rate of photoresist
across a semiconductor wafer, and wherein adjusting the dispense
operation of the first liquid on the working surface of the
substrate includes reducing a dispensed volume of the first liquid
relative to an initial volume set to provide full coverage.
14. The method of claim 1, wherein examining stroboscopic images
includes examining progression of a developer across the working
surface of the substrate and identifying a completion point of a
development operation; and wherein adjusting the given dispense
operation of the first liquid on the working surface of the
substrate includes stopping the given dispense operation in
response to receiving the feedback data indicating that material on
the working surface of the substrate is fully developed.
15. The method of claim 1, wherein examining stroboscopic images
includes monitoring fluid progression of the first liquid on the
working surface of the substrate and, in response to identifying a
turbulent flow condition, generating the feedback data identifying
the turbulent flow condition.
16. The method of claim 15, wherein adjusting the given dispense
operation includes slowing a rotational velocity of the substrate
to reduce the turbulent flow condition.
17. The method of claim 1, wherein examining stroboscopic images
includes monitoring a rinse operation that uses the first liquid on
the working surface of the substrate; and wherein the dispense
operation is stopped after receiving the feedback data indicating
completion of a rinse condition.
18. The method of claim 1, wherein capturing images of the working
surface of the substrate includes capturing stroboscopic images of
the working surface of the substrate as a stroboscope illuminates
the working surface of the substrate in phase with substrate
rotation.
Description
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] The present application claims the benefit of U.S.
Provisional Patent Application No. 62/617,345, filed on Jan. 15,
2018, entitled "System and Method for Fluid Dispense and Coverage
Control," which is incorporated herein by reference in its
entirety.
BACKGROUND OF THE INVENTION
[0002] The present disclosure relates to semiconductor
manufacturing and particularly to dispensing materials on a
substrate.
[0003] Semiconductor manufacturing includes several processing
steps that involve depositing liquid or fluid on a substrate. These
processing steps include, among others, coating a wafer, developing
a latent pattern, etching material on a wafer, and cleaning/rinsing
a wafer.
[0004] In a routine microfabrication process, a thin layer of
light-sensitive material, such as photoresist, is coated on a
working surface (upper surface) of a substrate. The light-sensitive
material is subsequently patterned via photolithography to define a
mask pattern for transferring to an underlying layer by etching by
using the patterned resist as an etch mask. Patterning of the
light-sensitive material generally involves steps of coating,
exposure, and development. A working surface of the substrate is
coated with a thin film of light-sensitive material. The thin film
of light-sensitive material is exposed to a radiation source
through a reticle (and associated optics) using, for example, a
micro-lithography system. Patterned exposure is followed by a
development process during which the removal of soluble regions of
the light-sensitive material occurs using a developing solvent.
Soluble regions could be irradiated or non-irradiated regions
depending on a tone of photoresist and developer used.
[0005] During the coating process, a substrate is positioned on a
substrate holder and is rotated at high speed while resist solution
is dispensed on an upper surface of the substrate. High rotation
speeds can be several thousand or tens of thousands of revolutions
per minute (rpm). When, for example, the resist solution is
dispensed at the center of the substrate, the resist solution
spreads radially across the substrate due to centrifugal forces
imposed by the substrate rotation. Wet etch and cleaning processes
can be similarly executed. In a development process, a solvent
developer is deposited on a substrate that is rotated at a high
speed. The solvent developer dissolves soluble portions of the
photoresist, and then the developer and dissolved photoresist are
removed radially across the substrate due to centrifugal forces.
Wet etch processes, cleaning process, and rinsing processes are
executed similarly to a development process in that a liquid is
deposited on a rotating wafer and removed by centrifugal forces to
clear or clean off a particular material or residue.
SUMMARY
[0006] During a given dispense process (such as coating,
developing, etching, cleaning, et cetera) it is typical for more
material to be dispensed than what is needed to complete the given
process. In other words, instead of dispensing a minimum amount of
liquid for a given process, and excess of material is dispensed.
For example, in the context of coating a substrate with
photoresist, an excess of photoresist is typically deposited to
make sure that an entire surface of the substrate is fully coated
or covered. There are various factors that affect how much
photoresist is needed to achieve full coverage. To account for the
variables affecting full coverage, an additional volume (known as
"safety stock") is deposited just to make sure there is full
coverage. This safety stock can be anywhere from 2-10 times more
than a minimum volume needed for full coverage.
[0007] As can be appreciated, the extra safety stock used
represents wasted material. This extra material dispensed can have
an environmental impact as various chemicals need to be properly
handled and disposed of after leaving the edge of the substrate.
Reducing liquid used to a minimum necessary for full coverage (or
full development, cleaning, et cetera) can result in reduced
environmental impact and thus can be desirable to manufacturers.
Certain spin-deposited chemicals can also be economically expensive
and so reducing an amount of material dispensed for each operation
can reduce cost of materials, which can also have some beneficial
utility.
[0008] Techniques herein include systems and methods for dispensing
liquids on a substrate with real-time coverage and progression
control. Systems herein include a substrate holder configured to
hold a substrate and rotate the substrate about an axis. A dispense
unit is configured to dispense liquid on a working surface of the
substrate while the substrate is being rotated on the substrate
holder. A camera is positioned to capture images of the working
surface of the substrate while the substrate is being rotated. A
processor is configured to present or examine stroboscopic images
received from the camera of a liquid on the working surface of the
substrate. The processor is configured to generate feedback data
while the substrate is rotating with the liquid thereon. A system
controller is included that is connected to the substrate holder
and connected to the dispense unit. The system controller is
configured to adjust a volume of the liquid dispensed onto the
working surface of the substrate based on feedback data while the
substrate is rotating with the liquid thereon. The system
controller can optionally execute other adjustments such as
increasing or decreasing substrate rotation speed.
[0009] Processes herein include methods for dispensing liquid on a
substrate. Example embodiments include rotating a substrate on a
substrate holder about an axis. Dispensing a liquid on a working
surface of the substrate. Capturing images of the working surface
of the substrate while the liquid is on the working surface of the
substrate. Examining stroboscopic images of movement of the liquid
on the working surface of the substrate using an image processor.
Generating feedback data based on examination of the stroboscopic
images while the substrate is being rotated. And adjusting a
dispense operation of the liquid on the working surface of the
substrate based on the feedback data. The dispense operation
corresponds to examined stroboscopic images. Such adjustments can
include increasing/decreasing a volume of fluid dispensed, and/or
increasing or decreasing a rotational velocity of the substrate
holder. Accordingly, a given liquid on a rotating substrate can be
optically/graphically evaluated in real-time with modifications to
a corresponding dispense operation made in real-time as well. This
can improve coating or removal processes, reduce material
consumption, and increase yield and throughput.
[0010] Of course, the order of discussion of the different steps as
described herein has been presented for clarity sake. In general,
these steps can be performed in any suitable order. Additionally,
although each of the different features, techniques,
configurations, etc. herein may be discussed in different places of
this disclosure, it is intended that each of the concepts can be
executed independently of each other or in combination with each
other. Accordingly, the present invention can be embodied and
viewed in many different ways.
[0011] Note that this summary section does not specify every
embodiment and/or incrementally novel aspect of the present
disclosure or claimed invention. Instead, this summary only
provides a preliminary discussion of different embodiments and
corresponding points of novelty over conventional techniques. For
additional details and/or possible perspectives of the invention
and embodiments, the reader is directed to the Detailed Description
section and corresponding figures of the present disclosure as
further discussed below.
BRIEF DESCRIPTION OF THE DRAWINGS
[0012] A more complete appreciation of various embodiments of the
invention and many of the attendant advantages thereof will become
readily apparent with reference to the following detailed
description considered in conjunction with the accompanying
drawings. The drawings are not necessarily to scale, with emphasis
instead being placed upon illustrating the features, principles and
concepts.
[0013] FIG. 1 is a cross-sectional schematic view of an example
dispense system according to embodiments disclosed herein.
[0014] FIG. 2 is a top view of an example substrate segment showing
flow of an example coating process according to embodiments
disclosed herein.
[0015] FIG. 3 is a top view of an example substrate segment showing
flow of an example coating process according to embodiments
disclosed herein.
[0016] FIG. 4 is a top view of an example substrate segment showing
flow of an example coating process according to embodiments
disclosed herein.
[0017] FIG. 5 is a top view of an example substrate segment showing
flow of an example coating process according to embodiments
disclosed herein.
[0018] FIG. 6 is a top view of an example substrate segment showing
flow of an example removal process according to embodiments
disclosed herein.
[0019] FIG. 7 is a top view of an example substrate segment showing
flow of an example removal process according to embodiments
disclosed herein.
[0020] FIG. 8 is a top view of an example substrate segment showing
flow of an example removal process according to embodiments
disclosed herein.
[0021] FIG. 9 is a top view of an example substrate segment showing
flow of an example removal process according to embodiments
disclosed herein.
[0022] FIGS. 10A-10I are top views of sample images across multiple
substrates at a particular point in processing.
DETAILED DESCRIPTION
[0023] Techniques herein include systems and methods for dispensing
liquids on a substrate with real-time coverage and removal control.
Techniques herein are applicable to various manufacturing
operations including coating of substrates (such as semiconductor
wafers), development of films, wet etching of materials, and
cleaning and rinsing of substrates. Various embodiments visually
examine stroboscopic images of movement of a given liquid on a
working surface of a substrate, and then generate feedback data for
modifying a corresponding dispense operation in real-time, such as
by increasing or decreasing a dispensed volume of fluid, and/or
increasing or decreasing a rotation velocity of the substrate.
Visual or graphically examination can be manual or automated.
[0024] Although there are various manufacturing operations that
involve liquid material dispensed on a rotating substrate,
description of example embodiments will primarily focus on coating
a substrate for convenience in describing techniques herein.
Routine, conventional microfabrication techniques involve
photolithography in which a film (photoresist) is coated on a
substrate, exposed to a pattern of actinic radiation, and then
developed to remove soluble material.
[0025] Conventionally, more photoresist is dispensed than what is
needed to fully cover a substrate. The extra or overage of resist
is dispensed to ensure that the entire substrate is evenly coated.
A substrate (typically a semiconductor wafer) is spun at relatively
high speed (rotational velocity) while liquid resist is dispensed
on to a working surface of the wafer. The spinning wafer then uses
centrifugal force to push the resist to the edge of the substrate
(typically a circular wafer). A given resist, developer, or other
fluid has a line of progression that does not always have a uniform
edge. That is, a photoresist does not have an outer edge or outer
meniscus that evenly spreads radially, such as a perfect circle
evenly expanding. Instead, the outer edge of the photoresist is not
uniform and certain areas of the photoresist can reach the edge of
the substrate prior to other areas. The result can appear as jagged
edges of photoresist at the edge of a substrate. This incomplete
coverage is not visible to the human eye while the substrate is
rotating. Instead, a rotating substrate can appear to be fully
coated when rotated due to blurring of the liquid. When stopped,
however, the substrate can be seen to have incomplete coverage.
[0026] For many applications a uniform and full coating of
photoresist on the working surface of the substrate is required. To
meet this requirement, extra resist is dispensed so that the
spinning substrate can become fully coated. The extra resist falls
off the edge of the wafer and is wasted resist. Conventionally,
manufactures may deposit as much as 400% or more extra of
photoresist and other liquid chemistry as a factor of safety to
account for several different variables that can affect full
coverage. One factor is a dispense capability of a dispense system
itself. For example, some photoresist compositions can coat a
substrate with approximately 0.2 cc of resist. Due to dispense
variables, it is common for approximately 0.8 cc of resist to be
dispensed.
[0027] There are various factors or variables that contribute to
the excess fluid that is dispensed. Some factors relate to the
capability of the dispense system itself. This includes variability
in valve response, conduits, measurement means, et cetera. Another
factor is performance of a given photoresist or liquid chemistry.
With slight variations in photoresist composition--even within a
same chemical formula--a given amount of liquid dispensed can have
more or less viscosity at any given dispense. A variation in
viscosity needs to be addressed and usually contributes to
increasing an amount of safety stock by dispensing more chemistry.
Another factor affecting coverage is physical properties of the
substrate surface itself. During the fabrication of semiconductor
devices on wafers, there are different materials used at different
stages of fabrication. Moreover, the surface topography can differ
depending on stage of fabrication as well as type of devices being
fabricated (for example, memory versus logic). A given material
and/or topography can increase viscosity of a photoresist spreading
across this surface. Wettability of a substrate is a significant
factor because there can be substantial variations in the
interaction of a liquid with the substrate. This interaction
routinely causes deviation of liquid flow across the substrate.
When these factors of safety are compounded, manufactures may then
use substantially more chemistry then what is actually needed for
full coverage. Some manufacturers can run four times or more extra
volume as compared to what is actually needed.
[0028] Note that because a given photoresist coating a substrate
reaches a substrate edge at different rates, there is typically an
amount of safety stock required for complete coverage. This minimum
extra photoresist is usually around 2-20% extra. Thus, a given
substrate can--by calculation--be fully coated with 102-120% of
resist actually needed to be deposited for full coverage. Because
of the various performance factors, however, manufacturers
routinely deposit 300% to 500% more of photoresist (or developer)
than what is actually needed. The extra is just safety stock. It is
an amount not required to coat/rinse the substrate, but simply
included to make sure a substrate never results in a partial
coating.
[0029] Techniques herein, however, provide highly accurate control
of liquid coverage and progression across a substrate. Each
substrate can be characterized by a stroboscopic images, and then
the system can use a feedback control loop (such as Advanced
Process Control (APC)) to make sure that an exact amount of volume
is dispensed, which significantly reduces a volume of safety stock
dispensed. Thus, instead of having a safety stock that is 300% or
400% or 500% more than what is needed, the system and methods
herein can deposit a photoresist, developer or other liquid with an
overage less than 50%, 20% or even 2% extra. Each substrate being
processed by liquid deposition can be monitored in real-time with a
stroboscope and can map points in time along an edge of a liquid
moving across the substrate. This edge can be an outer edge of a
liquid coating the substrate, and/or an inner edge of liquid
clearing off of the substrate.
[0030] Based on analysis of liquid progression or behavior, some
actions or modifications to the dispense system can be made. For
example, in some dispenses it can be observed that the photoresist
progresses relatively quickly and moves over the edge of the
substrate for an early coating. With the system optically observing
a coating progression and identifying when a coating is complete
(or will be complete by identifying rate of progression), the
system can indicate (provide feedback) when or at what point a full
coat is achieved or will be achieved to cease dispensing a liquid.
If the system observes or determines that the edge of the resist is
slowing down and moving slowly, then action can be taken to
accelerate rotation of the substrate holder and/or dispense
additional resist onto the substrate to achieve full coating or
wetting.
[0031] Conventionally, analysis of coating performance occurs after
a coating process. Basically a substrate is stopped from rotation
or removed from a processing chamber to inspect coat coverage. To
the unaided eye, coating progress may look uniform as
non-uniformities are blurred with high-speed rotation. Techniques
herein, however, provide a real-time look at a substrate coat's
future, as well as the capability of that coat by looking at data
from the stroboscope and applying that data as real-time feedback,
such as to identify a dispense and/or rotation stopping point. An
image processor can be connected to a high speed camera and
stroboscope. The image processor can analyze stroboscopic images
(video) of a coating application to make adjustments to spin speed
and dispense speed/amount. Such controls can adjust to variable
process conditions in real-time. Thus, instead of estimating a
substrate's wettability and a photoresist's viscosity to calculate
a safe dispense amount and spin time, photoresist can be deposited
on a rotating substrate without initially knowing a stopping point.
As the photoresist spreads across the substrate, the processor
viewing this progression--as if the substrate background were
motionless--can identify a progression rate as a function of time
and then can accurately indicate a stopping point. Accordingly,
knowing substrate wettability and photoresist viscosity is not
required because the system can stop a given coating operation when
a substrate is fully coated. In other words, instead of estimating
a stop time and estimating a volume of liquid to be dispensed, a
precise dispense volume and stop time can be calculated in
real-time based on visual observation of liquid progression. In
some embodiments, an initial substrate can have a fluid dispensed
thereon, and then stroboscopic images are used to identify a spin
and dispense time needed for a full coat. This dispense time and
volume data can then be used for subsequent dispenses.
[0032] Techniques herein will now be described with respect to the
accompanying drawings. Referring to FIG. 1, system 100 is a system
for dispensing liquid on a substrate 105. Substrate holder 122 is
configured to hold substrate 105 and rotate substrate 105 about an
axis. Motor 123 can be used to rotate the substrate holder 122 at a
selectable rotational velocity. A dispense unit 118 is configured
to dispense liquid on a working surface of the substrate 105 while
the substrate 105 is being rotated by the substrate holder 122.
Dispense unit 118 can be positioned directly over a substrate
holder, or can be positioned at another location. If positioned
away from the substrate holder, than a conduit 112 can be used to
deliver fluid to the substrate. The fluid can exit through nozzle
111. FIG. 1 illustrates liquid 117 being dispensed onto a working
surface of substrate 105. Collection system 127 can then be used to
catch or collect excess liquid 117 that spins off substrate 105
during a given dispense operation.
[0033] Dispense components can include nozzle arm 113 as well as
support member 115, which can be used to move a position of nozzle
111 across the substrate 105, or to be moved away from the
substrate holder 122 to a resting location, such as for rest upon
completion of dispense operations. The dispense unit 118 can
alternatively be embodied as a nozzle itself. Such a nozzle can
have one or more valves in communication with system controller
160. The dispense unit 118 can have various embodiments configured
to control dispense of a selectable volume of fluid on a
substrate.
[0034] System 100 includes stroboscope 140 configured to illuminate
the working surface of the substrate in phase with substrate
rotation. Stroboscope 140 can be used to optically slow down a
spinning substrate to evaluate fluid characteristics such as
coverage, removal, laminar/turbulent flow, et cetera. Stroboscope
140 can be used to make the substrate appear slow moving or
stationary. By activating stroboscope 140 on a rotating substrate,
images (video) can be captured to evaluated a dispense operation.
When illuminated in phase with substrate rotation, the substrate
can appear to be stopped, but liquid 117 can be seen progressing
across the substrate surface.
[0035] Image capturing device 130 is positioned to capture images
of the working surface of the substrate while the substrate is
being rotated and illuminated. Image capturing device 130 can be a
camera that is pointed at the substrate surface to take pictures.
Captured images (a sequence of images/video) can then be used for
image-based analysis of fluid progression and behavior. Note that
image capturing device 130 can include a single camera or multiple
cameras. Cameras can be positioned at various angles relative to
the working surface of the substrate, as well as positioned to
capture images of a whole of a substrate or be focused on a
particular section of the substrate. For example, given cameras can
be positioned at different regions of the substrate. A single
camera can be positioned to capture images at an edge of the
substrate at one location. Multiple cameras can be positioned to
capture an entire periphery of the substrate and or central
regions. Cameras can be positioned on nozzle arm 113 or other
moveable components. As can be appreciated, there are many
variations of camera number and positioning depending on evaluation
objectives.
[0036] Accordingly, video can be captured of an edge of a liquid
moving across a spinning substrate while the substrate appears to
be stationary. Captured images can be transmitted to, or collected
by, processor 150. Processor 150 is configured to examine
stroboscopic images received from the image capturing device of a
first liquid on the working surface of the substrate. The processor
is configured to generate feedback data while the substrate is
rotating with the first liquid thereon. With the substrate made to
appear stationary, an edge of a liquid can be seen very clearly
progressing across the substrate surface. By analyzing the video,
the processor can determine how complete edge propagation of fluid
is, or determine de-wetting conditions among other things. This
edge progression data can then be fed to system controller 160.
System controller 160 is connected to the substrate holder 122 and
connected to the dispense unit 118. The system controller 160 is
configured to adjust a volume of the liquid dispensed onto the
working surface of the substrate based on the feedback data while
the substrate is rotating with the first liquid thereon. For
example, a purpose-built or an APC control loop or feedback control
loop connected to the system controller 160 is arranged to control
a corresponding dispense system and/or substrate spinning
mechanism.
[0037] The dispense unit 118 can be embodied using various
technologies. Various valves, flow controllers, filters, nozzles,
et cetera can be used. The various dispense technology selected for
use can provide various levels of volume control and delay.
Techniques here can benefit from precise volume control by using a
bladder-based dispense unit such what is described in US Patent
Application Publication No. 2018/0046082 (U.S. Ser. No. 15/675,376)
entitled "High-Purity Dispense Unit." Such a precise dispense
system, however, is not required. Accordingly, techniques can be
practiced herein with conventional dispense systems.
[0038] With a high degree of accuracy, edges of liquid can be
tracked. This can help identify areas of insufficient coverage
(sometimes termed "mouse bite" occurrences) or other non-uniform
edge progression to make sure a substrate is fully covered. For
example, with respect to photoresist deposition to cover a
substrate, a non-covered formation can occur at the edge of the
photoresist progression. This non-covered area and its formation
can then be tracked as a function of time prior to formation. Such
tracking can help ensure a complete coat and minimize excess liquid
material. By tracking the leading edge of photoresist propagation
as it is moving over the edge of the substrate, this progression
can be tracked as a function of time during photoresist spinning.
The processor can then calculate a location of that function of
time and then determine where the photoresist edge is and how close
a given edge is to actually having a mouse bite occur. Identifying
uncoated portions can then automatically trigger a response such as
depositing incrementally more photoresist or accelerating a
rotational velocity to achieve full coverage. Such edge tracking
can also be used to calculate a rate of progression in real time.
The rate of progression can be used to identify or calculate when
the photoresist fully covers (or will fully cover) the substrate
and thus this coverage rate can be used to indicate when to stop
dispensing photoresist on the substrate.
[0039] Because of non-uniform propagation of liquid chemistry, a
certain amount of liquid overage is needed to fully cover a given
substrate. With accurate control, however, this overage can be as
low as 2-50% extra material dispensed.
[0040] FIG. 2 illustrates a top view of a substrate segment showing
a working surface of the substrate 105. The substrate 105 is being
rotated at a relatively high speed, such as tens of thousands of
revolutions per minute. It is common for semiconductor wafers to
have a notch 126 or straight edge, at one location of the
substrate. Sometimes this notch 126 is V-shaped, while other times
it is a short, flat edge of an otherwise circular wafer. Using
notch 126 is one example technique of how to phase lock a
stroboscope for generation of stroboscopic images.
[0041] Note that using a stroboscope is an optional embodiment for
generating stroboscopic images. In other embodiments, a high-speed
camera can be used that is configured to only capture images in
phase with substrate rotation, such as when notch 126 appears at a
same location. An alternative technique is software processing of
recorded video. In this technique, the processor first analyzes a
sequence of images and identifies images in which the substrate is
at a particular position. For example, the software can look for
images in which the notch is at a specific coordinate location.
Then images matching this criteria are selected (copied or
extracted) and sequenced so that video generated by specific image
selection generates video of the substrate appearing to be
stationary while liquid thereon appears to be moving. Thus, there
are several techniques available for generating stroboscopic
images.
[0042] In FIG. 2, liquid 117 is shown on a working surface of
substrate 105. This can be, for example, a photoresist that is
deposited at or near a center point of the substrate 105. As
substrate 105 is rotated at high-speed, liquid 117 spreads
radially. FIG. 3 illustrates continued radial progression of liquid
117. Note that outer meniscus 129 has a non-uniform edge. In other
words, when viewed as stroboscopic images it can be seen that
liquid 117 does not spread evenly or perfectly evenly. FIG. 4 shows
progression of liquid 117 after portions of liquid 117 have reached
an outer edge of the substrate. Note that there are several regions
of slivers (mouse bites) that are not yet covered with liquid 117.
If a coating operation were stopped at this point then there would
be insufficient coverage. By examining the stroboscopic images,
however, it can be determined how to complete coating coverage.
This can include merely continuing to spin the substrate if resist
is still spreading out. Other actions can include increasing a
rotational velocity of the substrate, or deposing more liquid on
the substrate. Because an aggregate surface area of non-covered
regions can be accurately calculated or estimated based on
evaluation of stroboscopic images, an additional volume to be
dispensed can be accurately determined. The system controller can
then receive this feedback or instructions from the processor and
then control the dispense unit to dispense an additional
incremental volume sufficient to complete full coating coverage
with a minimum additional volume dispensed. A result is illustrated
in FIG. 5. Accordingly, a given substrate can be fully coated with
a minimum amount of extra resist dispensed.
[0043] As can be appreciated, embodiments herein are not limited to
coating a photoresist on a wafer, but can apply to many additional
microfabrication techniques using liquid deposited on a rotating
substrate. For example, stroboscopic analysis herein can benefit
developer dispenses. After a layer of photoresist has been exposed
to patterned actinic radiation, soluble portions need to be
developed. For film development, the objective is not merely to
coat a substrate, but to dissolve and fully remove soluble
material. With development, a greater volume of fluid is typically
dispensed as compared to photoresist. The substrate can be visually
monitored by analyzing stroboscopic images. Visual changes can
indicate a completed dissolution of soluble material, flow
dynamics, and so forth.
[0044] Techniques herein can benefit development with different
developers including negative-tone developers. In practice it is
common for approximately 6-8 ccs of negative-tone developer is
dispensed, while around 30-50 ccs of other developers may be
dispensed. Regardless of the developer used, de-wetting can be an
issue during development, especially on the edge of the wafer.
Development is slower than photoresist deposition. During
development, solute can be picked up resulting in a weak
photoresist solution. This solution can move along scribe lanes
faster than across other areas. If the solution becomes saturated
then photoresist can be deposited on the substrate again causing
defects. Also, if the developer solution dries in one area before
dissolved photoresist is carried off the substrate, then that
photoresist can be re-deposited on the substrate. Thus, techniques
herein can monitor clearing off of the developer from the
substrate. Both the leading edge and trailing etch can be
monitored. If gas is also used in clearing a wafer than an air jet
interaction of the trailing edge (nitrogen puff) can be monitored
in real time.
[0045] These techniques and monitoring can similarly apply to wet
etching. Optical or image monitoring of fluids of the substrate can
be used to make sure the dispense and constants of a developer are
not changing due to a condition of surfactants changing. Etch rates
and developer consumptions can be identified via pattern
recognition of stroboscopic images. By using image analysis to
identify particular conditions (completed, turbulent), the dispense
system can take corresponding actions such as to stop dispensing
developer/etchant, or to slow rotational velocity in response to
turbulent conditions. Minimizing an amount of developer or etchant
used can reduce overall waste to benefit green processing
initiatives. Certain developers can be expensive and so minimizing
a volume dispensed is economically beneficial as well.
[0046] Embodiments herein similarly apply to cleans and rinses.
Various rinse or clean operations can use piranha, SC1, SC2,
deionized water, et cetera. Knowing a rinse or cleaning progression
can have benefits including yield and throughput. Some rinsing
liquids, such as deionized water, are relatively economical
compared to resists and developers, and thus using substantially
more than is needed may not have a large environmental or materials
cost. But yield and throughput can benefit from real-time feedback.
By knowing a precise completion point, rinses and etches can be
stopped earlier compared to conventional techniques that need to
run a safety stock or spin time to make sure a given substrate is
fully cleaned or etched. Regarding defect reduction, some
structures being micro-fabricated can be relatively delicate at
certain stages. If a rinse liquid goes from laminar flow to
turbulent flow, then this turbulent flow has the potential to
damage or destroy structures being created. Thus monitoring for
turbulent conditions can improve yield. Throughput can be increased
by knowing exactly when a rinse or clean is completed. If a given
rinse or clean process is completed and then immediately stopped
based on analysis of stroboscopic feedback, then a number of wafers
processed per hour can be increased. For some rinse operations, the
system can be embodied to have an array of nozzles such as to spray
liquid on the substrate.
[0047] FIGS. 6-9 illustrate an example development, etch, or rinse
operation. In FIG. 6, liquid 117 has been stopped from being
dispensed. As a rinse or developer, this fluid continues moving
radially to the edge of the substrate 105. This can result in an
inner meniscus 121 moving outwardly (FIG. 7). This inner meniscus
121 can be monitored such as to look for an undesirable flow
condition that might damage devices thereon. If such a condition is
identified, then the controller can reduce a rotational velocity.
In FIG. 8 it can be identified that almost all liquid 117 has been
spun off. The processor can calculate or identify when liquid 117
is indeed all off of the substrate (FIG. 9), and in response stop
the corresponding dispense operation. Other operations can be
executed. For example, if stroboscopic image analysis shows
re-deposition of material, then more liquid can be dispensed to
dissolve/remove such material.
[0048] Accordingly, real-time control can be provided for accurate
coating, development, etching, rinsing, and cleaning.
[0049] Another embodiment includes a quality control system and
quality control method for spin-on dispense systems. This quality
control method can be used in all spin-on dispense applications
(coating, deposition, development, rinsing, etching, et cetera). In
such a method, stroboscopic images across multiple wafers can be
concatenated for analysis and identification of any defects or
problems. Basically, several images can be stitched together for
viewing and analysis. With such a technique, instead of creating a
video of a single wafer showing liquid movement, other types of
video can be created including static images. For example, images
from multiple wafers that have been processed can be collected.
These sample images can all be from a same process time or point of
liquid progression. The result can be an essentially static video
with movement only seen when deviations occur.
[0050] Referring to FIGS. 10A-10I, an example of such static
analysis is illustrated. Each drawing of FIGS. 10A-10I represents a
different substrate at a particular point in time of processing.
This can be for a given recipe, resist, or for different recipes
and different resists, et cetera. Note that all of FIGS. 10A, 10B,
10C, 10D, 10E, 10F, 10H, and 10I appear identical, while FIG. 10G
is different in that the particular substrate of FIG. 10G is not
fully coated. Viewing a video of all these images sequenced
together can show a difference when FIG. 10G is displayed. The
difference in FIG. 10G can represent various different conditions.
It could be that a same resist flows more slowly over the substrate
of FIG. 10G as compared to other substrates suggesting higher
viscosity for that particular substrate. Another conclusion could
be that different resists were used and a particular resist of FIG.
10G flowed slower than other resists. Such information can be
valuable for quality control of recipes, fluid compositions, and
lot-to-lot variations of substrate processing.
[0051] With compiled sample images across many wafers, it becomes
possible to quickly zero in on or identify differences between
hundreds of recipes or hundreds of wafers. Moreover, as substrates
are continually processed, more images can be added to a given
sequence to increase a density of images. Sample images can show
all, edge, or interior portions of sampled wafers. Other image
sequences can be created by adjusting opacity of sampled images,
overlaying those images on each other, and creating a video
sequence to see motion of different dispenses or resists during
liquid progression. Instead of overlaying partially-transparent
images across substrates, images from multiple different wafers can
be combined side-by-side so that progression of different resists
and/or progression across different wafers can be simultaneously
viewed. Side-by-side comparison can also be realized by combining
pie slice-shaped images next to each other to appear as a single
substrate with angular sections showing progression of different
liquids.
[0052] For example, in one embodiment, stroboscopic images of a
plurality of substrates can be obtained. The stroboscopic images
show fluid on a working surface of each substrate. The fluid has
been dispensed onto each substrate during rotation of the
substrate. A first set of sample images is identified that includes
a sample image for each substrate of the plurality of substrates.
The first set of sample images is combined into a video (image
sequence). The video is then displayed or otherwise graphically
analyzed. The video shows stroboscopic images across the plurality
of substrates.
[0053] Note that with any of the techniques herein, analysis of
images can be executed by human eye and/or with automated graphical
image analysis programs. Speed of image sequences can be adjusted
depending on who or what is performing a given analysis. Image
sequences captured or compiled are not limited to a phase lock of a
flash, but can instead be out-of-phase. Out-of-phase image
sequences can be configured to make liquid appear to be going
backwards or provide a slow-motion effect. Such variations can be
useful for different types of analyses. Image sequences can be
created at any frame rate for post processing. For real time
processing a capture frame rate can be used. In other embodiments,
for out-of-phase image capturing, images can be captured at
different rotational angles such as 90 degrees and zero degrees.
Images can be incrementally captured from degree to degree also.
Thus sequences of incrementally moving substrates can be created at
different angles instead of at a same point on the wafer.
[0054] One embodiment includes a system for dispensing liquid on a
substrate. The system includes a substrate holder configured to
hold a substrate and rotate the substrate about an axis. A dispense
unit is configured to dispense liquid on a working surface of the
substrate while the substrate is being rotated on the substrate
holder. A stroboscope is positioned and configured to illuminate
the working surface of the substrate by repeatedly flashing light.
The stroboscope can be configured to illuminate the working surface
of the substrate in phase with substrate rotation.
[0055] A camera is positioned to capture images of the working
surface of the substrate while the substrate is being rotated and
illuminated. A processor is connected to, or accessible by, the
system and is configured to examine stroboscopic images received
from the camera of a first liquid on the working surface of the
substrate. The processor is configured to generate feedback data
while the substrate is rotating with the first liquid thereon.
Feedback data can also be generated and provided after dispense
operations. The processor, based on examination of stroboscopic
images of movement of the first liquid, can also be configured to
monitor a coating progression of photoresist across the working
surface of the substrate and generate the feedback data indicating
when sufficient photoresist has been dispensed for full coverage of
the working surface of the substrate. This indication can be
anticipatory based on a progression rate.
[0056] A system controller is connected to the substrate holder and
connected to the dispense unit. The system controller is configured
to adjust a volume of the first liquid dispensed onto the working
surface of the substrate based on the feedback data while the
substrate is rotating with the first liquid thereon. The system
controller can be further configured to adjust a rotational
velocity of the substrate holder based on the feedback data.
[0057] The system controller is configured to dispense an initial
volume of the first liquid on the working surface of the substrate,
and then dispense an additional volume of the first liquid on the
working surface of the substrate. The additional volume of the
first liquid being sufficient to complete full coverage of the
first liquid on the working surface of the substrate. In other
words, more fluid can be dispensed when it is determined that more
is needed to fully cover a wafer.
[0058] The system controller is configured to increase a rotational
velocity of the substrate holder based on the feedback data
indicating insufficient coverage of the first liquid on the working
surface of the substrate. Such an increase in rotational velocity
can help to spread a film across the substrate. The system
controller can alternatively decrease a rotational velocity of the
substrate holder based on the feedback data that indicates, for
example, a turbulent condition of the first liquid on the working
surface of the substrate or excess resist being flung from the
substrate. The system controller can increase the volume of the
first liquid dispensed on the working surface of the substrate
based on the feedback data indicating insufficient coverage of the
first liquid on the working surface of the substrate.
[0059] Another embodiment includes a system with a substrate holder
configured to hold a substrate and rotate the substrate (such as a
semiconductor wafer) about an axis. A dispense unit is configured
to dispense liquid on a working surface of the substrate. The
dispense unit can include a dispense nozzle removably positioned
above the working surface of the substrate. A camera is positioned
to capture images of the working surface of the substrate. In some
embodiments, the camera can have a shutter speed sufficient to
capture at least 69 frames per second. A processor is configured to
examine stroboscopic images of movement of a first liquid on the
working surface of the substrate and generate feedback data. A
system controller is connected to the substrate holder and
connected to the dispense unit. The system controller is configured
to adjust a given dispense operation of the first liquid on the
working surface of the substrate based on the feedback data
corresponding to the given dispense operation. The system can
include a stroboscopic image generation system configured to
generate stroboscopic images of the working surface of the
substrate during substrate rotation. Also, multiple cameras can be
positioned to capture images of different regions of the working
surface of the substrate.
[0060] The processor can have many functions. The processor can be
configured to generate the feedback data while the substrate is
rotating with the first liquid thereon, and a given dispense
operation can be adjusted while the substrate is rotating with the
first liquid thereon. Based on examination of the stroboscopic
images of movement of the first liquid, the processor can monitor
progression of an outer meniscus of the first liquid as the first
liquid coats the working surface of the substrate. The processor
can also monitor progression of an inner meniscus of the first
liquid as the first liquid is spun off the working surface of the
substrate. Coating progression of the first liquid can be monitored
to generate the feedback data indicating more or less volume of the
first liquid to be dispensed to result in a minimum volume
dispensed that results in the working surface of the substrate
being fully coated and/or identify when the working surface of the
substrate is fully covered.
[0061] The system controller can be configured to take various
actions. For example, the system controller can adjust a volume of
the first liquid dispensed onto the working surface of the
substrate based on the feedback data while the substrate is
rotating. A rotational velocity of the substrate holder can be
adjusted based on the feedback data. Based on examination of the
stroboscopic images of movement of the first liquid, a volume of
the first liquid dispensed can be less than 150 percent of a
coverage volume needed to fully cover the working surface of the
substrate. The controller can decrease a rotational velocity of the
substrate holder based on the feedback data indicating a turbulent
conditional of the first liquid on the working surface of the
substrate, which can prevent substrate damage. The controller can
also stop dispensing fluid in response to receiving the feedback
data indicating that the working surface of the substrate is fully
covered.
[0062] In yet another embodiment, a system for dispensing liquid on
a substrate has several features. A substrate holder is configured
to hold a substrate and rotate the substrate about an axis. A
dispense unit is configured to dispense liquid on a working surface
of the substrate while the substrate is being rotated on the
substrate holder. A stroboscope is configured to illuminate the
working surface of the substrate with repeated flashes of light. An
image capturing device is positioned to capture images of liquid
progression across the working surface of the substrate. A
processor is configured to examine stroboscopic images of movement
of a first liquid on the working surface of the substrate and
generate feedback data while the substrate is rotating with the
first liquid thereon. A system controller is connected to the
substrate holder and connected to the dispense unit. The system
controller is configured to adjust a given dispense operation of
the first liquid on the working surface of the substrate in
real-time based on the feedback data corresponding to the given
dispense operation.
[0063] The system controller can adjust a volume of the first
liquid dispensed onto the working surface of the substrate based on
the feedback data while the substrate is rotating. An additional
volume of the first liquid can be dispensed on the working surface
of the substrate, and this additional volume of the first liquid is
sufficient to complete full coverage of the first liquid on the
substrate. A rotational velocity of the substrate holder can be
adjusted based on the feedback data. Increasing rotational velocity
of the substrate holder can be based on the feedback data
indicating insufficient coverage of the first liquid on the working
surface of the substrate. Decreasing the rotational velocity of the
substrate holder can be based on the feedback data indicating a
turbulent condition of the first liquid on the working surface of
the substrate. The system controller can adjust both volume of
fluid being dispensed and rotational velocity of the substrate
holder based on the feedback data.
[0064] The stroboscope can be configured to illuminate the working
surface of the substrate in phase with substrate rotation and/or
illuminate the working surface of the substrate at a predetermined
frequency. The dispense unit can be configured to dispense
selective amounts of photoresist, negative tone developer, or other
liquid on the substrate based on input from the system controller.
The dispense unit can include a dispense nozzle positioned above
the working surface of the substrate.
[0065] A coating progression of an initial volume of the first
liquid on the working surface of the substrate can be monitored by
the processor, and the generate the feedback data indicating
insufficient coverage of the working surface of the substrate.
Based on examination of the stroboscopic images of movement of the
first liquid, the processor can calculate a total volume of the
first liquid dispensed on the substrate to cover the substrate with
less than fifty percent excess volume. The processor can also
monitor and generate the feedback data indicating a de-wetting
condition, and when sufficient photoresist has been dispensed for
full coverage of the substrate. In response to receiving the
feedback data indicating when sufficient photoresist has been
dispensed for full coverage of the substrate, the controller can
stop a dispense operation. Stroboscopic images of movement of the
first liquid can also be analyzed to monitor progression of an
outer meniscus of the first liquid as the first liquid coats the
substrate, or an inner meniscus of the first liquid as the first
liquid is spun off the substrate.
[0066] Another embodiment herein is a method for dispensing liquid
on a substrate. A substrate is rotated on a substrate holder about
an axis. A first liquid is dispensed on a working surface of the
substrate. Images are captured of the working surface of the
substrate while the first liquid is on the working surface of the
substrate. Stroboscopic images of movement of the first liquid on
the working surface of the substrate are examined using an image
processor or manually. Feedback data is generated based on
examination of the stroboscopic images while the substrate is being
rotated. A dispense operation of the first liquid on the working
surface of the substrate is adjusted based on the feedback data.
The dispense operation corresponds to examined stroboscopic
images.
[0067] Adjusting the dispense operation can include selectively
modifying a volume of first liquid dispensed on the working surface
of the substrate. Adjusting the dispense operation can include
selectively modifying a rotational velocity of the substrate
holder. Examining stroboscopic images can include identifying
coverage progression of photoresist across a semiconductor wafer.
Adjusting the dispense operation of the first liquid on the working
surface of the substrate can include dispensing an additional
volume that is minimized to an amount sufficient to complete full
coating coverage of the working surface of the substrate.
[0068] Identifying coverage progression of the photoresist across
the semiconductor wafer can include calculating a surface area of
uncoated regions of the working surface of the substrate.
Generating the feedback data can include indicating the additional
volume of the first liquid to be dispensed to complete coating
coverage of the working surface of the substrate.
[0069] Examining stroboscopic images can include identifying
coverage progression of photoresist across a semiconductor wafer,
and adjusting the dispense operation of the first liquid on the
working surface of the substrate can include increasing a rotation
velocity of the substrate sufficient to complete full coating
coverage of the working surface of the substrate. Alternatively,
adjusting the dispense operation of the first liquid on the working
surface of the substrate can include reducing a rotation velocity
of the substrate sufficient to complete full coating coverage of
the working surface of the substrate.
[0070] Examining stroboscopic images can include identifying
coverage progression of photoresist across a semiconductor wafer.
Adjusting the dispense operation of the first liquid on the working
surface of the substrate can include dispensing an additional
volume sufficient to complete full coating coverage of the working
surface of the substrate with an overage volume of photoresist
dispensed being less than four percent of a given volume required
to fully coat the working surface of the substrate.
[0071] Examining stroboscopic images can include identifying
coverage progression rate of photoresist across a semiconductor
wafer. Adjusting the dispense operation of the first liquid on the
working surface of the substrate can include reducing a dispensed
volume of the first liquid to a minimum volume sufficient to
complete full coating coverage of the working surface of the
substrate. Examining stroboscopic images can include examining real
time progression of the first liquid across the working surface of
the substrate. Adjusting the given dispense operation can occur in
real-time.
[0072] Examining stroboscopic images of movement of the first
liquid and generating the feedback data can occur in real time
relative to the given dispense operation. Adjusting the dispense
operation of the first liquid on the working surface of the
substrate can include stopping the given dispense operation in
response to receiving the feedback data indicating that the working
surface of the substrate is fully covered with the first liquid.
Examining stroboscopic images can include identifying coverage
progression rate of photoresist across a semiconductor wafer.
Adjusting the dispense operation of the first liquid on the working
surface of the substrate can include reducing a dispensed volume of
the first liquid relative to an initial volume set to provide full
coverage.
[0073] Examining stroboscopic images can include examining
progression of a developer across the working surface of the
substrate and identifying a completion point of a development
operation. Adjusting the given dispense operation of the first
liquid on the working surface of the substrate can include stopping
the given dispense operation in response to receiving the feedback
data indicating that material on the working surface of the
substrate is fully developed. Examining stroboscopic images can
include monitoring fluid progression of the first liquid on the
working surface of the substrate and, in response to identifying a
turbulent flow condition, generating the feedback data identifying
the turbulent flow condition.
[0074] Adjusting the given dispense operation can include slowing a
rotational velocity of the substrate to reduce the turbulent flow
condition. Examining stroboscopic images can include monitoring a
rinse operation that uses the first liquid on the working surface
of the substrate. The dispense operation can be stopped after
receiving the feedback data indicating completion of a rinse
condition. Capturing images of the working surface of the substrate
can include capturing stroboscopic images of the working surface of
the substrate as a stroboscope illuminates the working surface of
the substrate in phase with substrate rotation.
[0075] In another embodiment, a method for dispensing liquid on a
substrate includes multiple steps. A substrate is rotated on a
substrate holder about an axis. A first liquid is dispensed on a
working surface of the substrate while the substrate is being
rotated on the substrate holder. The working surface of the
substrate is illuminated in phase with substrate rotation.
Stroboscopic images of the working surface of the substrate are
captured while the first liquid is on the working surface of the
substrate. Stroboscopic images of movement of the first liquid on
the working surface of the substrate are examined using an image
processor. Feedback data is generated based on examination of the
stroboscopic images while the substrate is being rotated. A
dispense operation of the first liquid on the working surface of
the substrate is adjusted in real-time based on the feedback data.
The dispense operation corresponds to examined stroboscopic
images.
[0076] An amount of the first liquid dispensed onto the working
surface of the substrate can be increased based on progression of
the first liquid across the working surface of the substrate as
indicated by the feedback data. An amount of the first liquid
dispensed onto the working surface of the substrate can be adjusted
based on progression of the first liquid across the working surface
of the substrate as indicated by the feedback data. A rotational
speed of the substrate can be increased or decreased based on
progression of the first liquid across the working surface of the
substrate as indicated by the feedback data. An outer meniscus or
inner meniscus of the first liquid can be tracked and monitored
across the working surface of the substrate to identify a
predetermined condition.
[0077] Examining the stroboscopic images can include identifying a
coating progression of the first liquid across the working surface
of the substrate. Generating the feedback data can include
generating the feedback data indicating insufficient coverage of
the working surface of the substrate.
[0078] In yet another embodiment, a method of quality control is
disclosed. Stroboscopic images are obtained of a plurality of
substrates. The stroboscopic images show a first liquid on a
working surface of each substrate. The first liquid has been
dispensed onto the working surface of each substrate during
rotation of each substrate. A first set of sample stroboscopic
images is identified that includes a given stroboscopic image for
substrates of the plurality of substrates. Sample stroboscopic
images are compiled from the first set of sample stroboscopic
images into a video. The video is displayed, which shows
stroboscopic images across the plurality of substrates.
[0079] The given stroboscopic image for substrates of the plurality
of substrates can represent a same point in time in processing of
respective substrates. Deviations in process can be identified by
visually identifying image changes in the video. Additional sample
stroboscopic images can be added to the video after obtaining the
additional sample stroboscopic images. The sample stroboscopic
images can show photoresist near an edge of respective substrates.
The substrates can include semiconductor wafers and wherein the
first liquid is photoresist.
[0080] Another embodiment includes a method of quality control. The
method
[0081] Includes obtaining stroboscopic images of a plurality of
substrates. The stroboscopic images show a first liquid on a
working surface of each substrate. The first liquid has been
dispensed onto respective substrates during rotation of the
substrates. The method includes identifying a first set of sample
stroboscopic images that include a sample stroboscopic image for
substrates of the plurality of substrates. Sample stroboscopic
images are compiled from the first set of sample stroboscopic
images into a collection of stroboscopic images. The collection of
stroboscopic images is analyzed by comparing stroboscopic images in
the collection of stroboscopic images to each other. Analyzing the
collection of stroboscopic images can include identifying
deviations in performance by identifying differences in the
stroboscopic images that indicate differences in coverage of the
first liquid.
[0082] In the preceding description, specific details have been set
forth, such as a particular geometry of a processing system and
descriptions of various components and processes used therein. It
should be understood, however, that techniques herein may be
practiced in other embodiments that depart from these specific
details, and that such details are for purposes of explanation and
not limitation. Embodiments disclosed herein have been described
with reference to the accompanying drawings. Similarly, for
purposes of explanation, specific numbers, materials, and
configurations have been set forth in order to provide a thorough
understanding. Nevertheless, embodiments may be practiced without
such specific details. Components having substantially the same
functional constructions are denoted by like reference characters,
and thus any redundant descriptions may be omitted.
[0083] Various techniques have been described as multiple discrete
operations to assist in understanding the various embodiments. The
order of description should not be construed as to imply that these
operations are necessarily order dependent. Indeed, these
operations need not be performed in the order of presentation.
Operations described may be performed in a different order than the
described embodiment. Various additional operations may be
performed and/or described operations may be omitted in additional
embodiments.
[0084] "Substrate" or "target substrate" as used herein generically
refers to an object being processed in accordance with the
invention. The substrate may include any material portion or
structure of a device, particularly a semiconductor or other
electronics device, and may, for example, be a base substrate
structure, such as a semiconductor wafer, reticle, or a layer on or
overlying a base substrate structure such as a thin film. Thus,
substrate is not limited to any particular base structure,
underlying layer or overlying layer, patterned or un-patterned, but
rather, is contemplated to include any such layer or base
structure, and any combination of layers and/or base structures.
The description may reference particular types of substrates, but
this is for illustrative purposes only.
[0085] Those skilled in the art will also understand that there can
be many variations made to the operations of the techniques
explained above while still achieving the same objectives of the
invention. Such variations are intended to be covered by the scope
of this disclosure. As such, the foregoing descriptions of
embodiments of the invention are not intended to be limiting.
Rather, any limitations to embodiments of the invention are
presented in the following claims.
* * * * *