U.S. patent application number 15/860193 was filed with the patent office on 2019-07-04 for methods of patterning dielectric layers for metallization and related structures.
The applicant listed for this patent is GLOBALFOUNDRIES Inc.. Invention is credited to Guillaume Bouche.
Application Number | 20190206795 15/860193 |
Document ID | / |
Family ID | 66817060 |
Filed Date | 2019-07-04 |
![](/patent/app/20190206795/US20190206795A1-20190704-D00000.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00001.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00002.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00003.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00004.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00005.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00006.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00007.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00008.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00009.png)
![](/patent/app/20190206795/US20190206795A1-20190704-D00010.png)
View All Diagrams
United States Patent
Application |
20190206795 |
Kind Code |
A1 |
Bouche; Guillaume |
July 4, 2019 |
METHODS OF PATTERNING DIELECTRIC LAYERS FOR METALLIZATION AND
RELATED STRUCTURES
Abstract
Structures including metallization layers and metal lines, and
methods of forming thereof. A patterning stack, a masking layer,
and a spacer patterning layer are formed over a dielectric layer,
and an opening is formed in the spacer patterning layer. First and
second spacers are formed on a portion of the masking layer at
sidewalls of an opening in the spacer patterning layer. The first
spacer and the second spacer overlie and traverse first portions of
the dummy line. After removing the spacer patterning layer and
masking layer, second portions of the dummy line are removed to
form a feature in the patterning stack that includes a first gap
beneath the first spacer and a second gap beneath the second
spacer. A metal line is formed in the dielectric layer using the
feature, and includes cuts at the first gap and the second gap in
the feature.
Inventors: |
Bouche; Guillaume; (Albany,
NY) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
GLOBALFOUNDRIES Inc. |
Grand Cayman |
|
KY |
|
|
Family ID: |
66817060 |
Appl. No.: |
15/860193 |
Filed: |
January 2, 2018 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 23/5384 20130101;
H01L 23/53209 20130101; H01L 23/5226 20130101; H01L 21/76897
20130101; H01L 23/5386 20130101; H01L 21/76816 20130101 |
International
Class: |
H01L 23/538 20060101
H01L023/538; H01L 23/522 20060101 H01L023/522; H01L 21/768 20060101
H01L021/768 |
Claims
1. A method comprising: forming a patterning stack over a
dielectric layer, wherein the patterning stack includes a dummy
line; forming a masking layer over the patterning stack and a
spacer patterning layer over the masking layer; etching an opening
in the spacer patterning layer to expose a portion of the masking
layer overlying the dummy line; forming a first spacer and a second
spacer on the exposed portion of the masking layer at sidewalls of
the opening, wherein the first spacer and the second spacer overlie
and traverse respective first portions of the dummy line; removing
the spacer patterning layer and the masking layer selective to the
patterning stack, the first spacer, and the second spacer to expose
second portions of the dummy line; removing the second portions of
the dummy line selective to the first spacer and the second spacer
to form a feature in the patterning stack that includes a first gap
beneath the first spacer and a second gap beneath the second
spacer; and forming a first metal line in the dielectric layer
using the feature in the patterning stack, wherein the first metal
line includes respective cuts at the first gap and the second gap
in the feature in the patterning stack.
2. The method of claim 1 wherein forming the first spacer and the
second spacer on the exposed portion of the masking layer at the
sidewalls of the opening comprises: depositing a conformal layer on
the spacer patterning layer and on the sidewalls of the opening,
the conformal layer on the sidewalls of the opening defining the
first spacer and the second spacer; and etching the conformal layer
to expose the spacer patterning layer, wherein the etching is
controlled to remove the conformal layer from over the spacer
patterning layer without removing the first spacer and the second
spacer.
3. The method of claim 2 wherein the conformal layer and the
masking layer are composed of the same material.
4. The method of claim 2 wherein the conformal layer and the
masking layer are composed of a nitride-based dielectric
material.
5. The method of claim 2 wherein the conformal layer has a
thickness selected to define a thickness of the first spacer and
the second spacer, and the thickness of the first spacer and the
second spacer defines a dimension of the first gap and the second
gap in the feature in the patterning stack.
6. The method of claim 5 wherein the thickness of each of the first
spacer and the second spacer is less than or equal to 5 nm.
7. The method of claim 1 wherein etching the opening in the spacer
patterning layer comprises: forming a lithography stack over the
spacer patterning layer; patterning an opening in the lithography
stack that exposes a portion of the spacer patterning layer; and
etching the exposed portion of the spacer patterning layer
selective to the masking layer to form the opening in the spacer
patterning layer.
8. The method of claim 1 wherein the spacer patterning layer is
composed of an oxide-based dielectric material, and the masking
layer is composed of a nitride-based dielectric material.
9. The method of claim 1 wherein the first spacer and the second
spacer are separated by a length less than or equal to 15 nm.
10. The method of claim 1 wherein the patterning stack includes a
hardmask arranged between the dummy line and the dielectric layer,
and the feature is a trench in the hardmask that extends to the
dielectric layer.
11. The method of claim 10 wherein forming the first metal line in
the dielectric layer using the feature in the patterning stack
comprises: etching portions of the dielectric layer exposed by the
trench in the hardmask to form a trench in the dielectric layer;
and depositing a metal in the trench in the dielectric layer.
12. The method of claim 11 wherein the metal is composed of cobalt
or ruthenium.
13. The method of claim 11 wherein the cuts in the first metal line
define a metal island as a section of the first metal line, and the
cuts are filled by portions of the dielectric layer.
14. The method of claim 13 wherein the metal island has a length of
less than or equal to 15 nm.
15. The method of claim 13 wherein the dielectric layer, the metal
island, and the first metal line collectively form a first
metallization layer, and further comprising: forming a second
metallization layer disposed below the first metallization layer,
the second metallization layer including a second metal line;
forming a first conductive via aligned with and contacting the
second metal line, the first conductive via contacting the metal
island; forming a second conductive via contacting the metal
island; forming a third metallization layer disposed above the
first metallization layer, the third metallization layer including
a third metal line, the third metal line aligned with and
contacting the second conductive via.
16. The method of claim 15 wherein the metal island, the first
conductive via, and the second conductive via are composed of the
same material.
17. A structure comprising: a first metallization layer comprising
a plurality of first metal lines and a metal island, the metal
island electrically isolated from the plurality of first metal
lines; a second metallization layer disposed below the first
metallization layer, the second metallization layer including a
second metal line; a third metallization layer disposed above the
first metallization layer, the third metallization layer including
a third metal line; a first conductive via connecting the metal
island to the second metal line; and a second conductive via
connecting the metal island to the third metal line, wherein the
first conductive via, the second conductive via, and the metal
island provide electrical connectivity between the second metal
line and the third metal line.
18. The structure of claim 17 wherein the metal island has a length
of less than or equal to 15 nm.
19. The structure of claim 17 wherein the metal island is composed
of cobalt or ruthenium.
20. The structure of claim 17 wherein the metal island, the first
conductive via, and the second conductive via are composed of the
same material.
Description
BACKGROUND
[0001] The present invention relates to semiconductor device
fabrication and integrated circuits and, more specifically, to
methods of patterning dielectric layers for metal line formation
and fabrication of metallization layers integrated circuits.
[0002] Metallization layers in integrated circuits allow for
electrical connection between layers of integrated circuits and
external devices. As circuit sizes have continued to shrink, new
methods for patterning metallization layers and forming
metallization lines continue to be developed to overcome
limitations of existing fabrication equipment in meeting design
requirements for newer and even smaller metal line features.
SUMMARY
[0003] In an embodiment of the invention, a method includes forming
a patterning stack over a dielectric layer, forming a masking layer
over the patterning stack and a spacer patterning layer over the
masking layer, and etching an opening in the spacer patterning
layer to expose a portion of the masking layer overlying a dummy
line of the patterning stack. The method further includes forming a
first spacer and a second spacer on the exposed portion of the
masking layer at sidewalls of the opening. The first spacer and the
second spacer overlie and traverse respective first portions of the
dummy line. The method further includes removing the spacer
patterning layer and the masking layer selective to the patterning
stack, the first spacer, and the second spacer to expose second
portions of the dummy line, and removing the second portions of the
dummy line selective to the first spacer and the second spacer to
form a feature in the patterning stack that includes a first gap
beneath the first spacer and a second gap beneath the second
spacer. A metal line is formed in the dielectric layer using the
feature in the patterning stack. The metal line includes respective
cuts at the first gap and the second gap in the feature in the
patterning stack.
[0004] In another embodiment of the invention, a structure includes
a first metallization layer including a plurality of first metal
lines and a metal island, a second metallization layer including a
second metal line arranged or disposed below the first
metallization layer, and a third metallization layer including a
third metal line arranged or disposed above the first metallization
layer. A first conductive via connects the metal island to the
second metal line and a second conductive via connects the metal
island to the third metal line. The first conductive via, second
conductive via, and metal island provide electrical connectivity
between the second metal line and third metal line.
BRIEF DESCRIPTION OF THE DRAWINGS
[0005] The accompanying drawings, which are incorporated in and
constitute a part of this specification, illustrate various
embodiments of the invention and, together with a general
description of the invention given above and the detailed
description of the embodiments given below, serve to explain the
embodiments of the invention.
[0006] FIGS. 1-10 are cross-sectional views of a structure at
successive fabrication stages of a processing method in accordance
with embodiments of the invention.
[0007] FIG. 1A is a top view of the structure in which FIG. 1 is
taken generally along line 1-1.
[0008] FIG. 3A is a top view of the structure in which FIG. 3 is
taken generally along line 3-3.
[0009] FIG. 6A is a top view of the structure in which FIG. 6 is
taken generally along line 6-6.
[0010] FIG. 7A is a top view of the structure in which FIG. 7 is
taken generally along line 7-7.
[0011] FIG. 8A is a top view of the structure in which FIG. 8 is
taken generally along line 8-8.
[0012] FIG. 9A is a top view of the structure in which FIG. 9 is
taken generally along line 9-9.
[0013] FIG. 10A is a top view of the structure in which FIG. 10 is
taken generally along line 10-10.
[0014] FIG. 11 is a cross-sectional view of a structure at an
alternative fabrication stage following FIG. 6 of a processing
method in accordance with embodiments of the invention.
[0015] FIG. 11A is a top view of the structure in which FIG. 11 is
taken generally along line 11-11.
[0016] FIGS. 12 and 13 are cross-sectional views of the structure
of FIGS. 1-10 at further fabrication stages of a processing method
in accordance with embodiments of the invention.
DETAILED DESCRIPTION
[0017] With reference to FIGS. 1 and 1A and in accordance with
embodiments of the invention, a structure 100 includes one or more
lower circuit structure layers 105, a dielectric layer 110, and a
patterning stack 120 that includes a hardmask layer 122, a
dielectric layer 124, and dummy lines 125, 126. Dummy lines 125,
126 may be formed by a lithography and etch process from a
deposited layer of its material. Dummy lines 125, 126, which may be
composed of a sacrificial material, such as amorphous silicon
(a-Si), are embedded in the dielectric layer 124. Dummy lines 126
are patterned with large tip-to-tip spacings.
[0018] Dielectric layer 124 may be composed of, for example,
silicon dioxide deposited by plasma-enhanced chemical vapor
deposition (PECVD) on the hardmask layer 122 and over the dummy
lines 125, 126, and then polished to exposed the dummy lines 125,
126 at the top surface of the dielectric layer 124. Hardmask layer
122 may be composed, for example, of titanium nitride, titanium
oxide, or other hardmask material. Dielectric layer 110 may be
composed of a dielectric material, such as an oxide of silicon or a
nitride of silicon, in which metallization lines are to be
patterned using patterning stack 120, as described in part
below.
[0019] With reference to FIG. 2 in which like reference numerals
refer to like features in FIGS. 1 and 1A and at a subsequent
fabrication stage of the processing method, a masking layer 130 and
a spacer patterning layer 135 are formed over the patterning stack
120. Masking layer 130 may be composed of a dielectric material,
such as a nitride-based dielectric material, and spacer patterning
layer 135 may be composed of a different dielectric material from
masking layer 130, such as an oxide-based dielectric material, so
that masking layer 130 and spacer patterning layer 135 have
differing etch selectivity properties. For example, masking layer
130 may be composed of silicon nitride and spacer patterning layer
135 may be composed of silicon dioxide. Spacer patterning layer 135
may be formed to a selected thickness T.sub.1 that may, in part,
facilitate formation of spacers as described further below. Masking
layer 130 may have a thickness T.sub.2 that is less than the
thickness T.sub.1 of spacer patterning layer 135. The thickness
T.sub.1 of spacer patterning layer 135 may, as described below,
partially define a height of spacers 151 and 152 formed on
sidewalls of an opening 137 (FIG. 4) patterned in the spacer
patterning layer 135.
[0020] With reference to FIGS. 3 and 3A and in which like reference
numerals refer to like features in FIG. 2 and at a subsequent
fabrication stage of the processing method, a lithography stack 140
and a resist layer 144 are formed over spacer patterning layer 135.
Lithography stack 140 may include an organic spin-on hardmask (SOH)
layer, a silicon oxynitride (SiON) hardmask layer, and an
anti-reflective coating layer. The resist layer 144 is patterned to
form an opening 145, or multiple openings as described below,
aligned over portions of dummy line 125 that is designated to be
cut to provide small tip-to-tip spacings. The opening 145 exposes a
portion of spacer patterning layer 135 to be etched and removed as
described below.
[0021] With reference to FIG. 4 in which like reference numerals
refer to like features in FIGS. 3 and 3A and at a subsequent
fabrication stage of the processing method, an opening 137 is
etched in spacer patterning layer 135. Opening 137 may be formed,
for example, by a reactive ion etch (ME) process. The opening 137
may have a width dimension W that is about equal to twice a
selected thickness T.sub.3 of a conformal layer 150 to be formed
over spacer patterning layer 135 plus a length L separating a
spacer 151 from a spacer 152 (which are formed from conformal layer
150) as shown in FIG. 5. For example, selected thickness T.sub.3 of
conformal layer 150 may be about 5 nm, and length L separating
spacers 151 and 152 may be about 15 nm, so that width W of opening
137 may be about 25 nm. The etching may be a selective etch process
that is controlled to remove the exposed portion of spacer
patterning layer 135 and to terminate on the material of the
masking layer 130. The opening 137 exposes a portion of masking
layer 130 overlying a portion of dummy line 125. As used herein,
the term "selective" in reference to a material removal process
(e.g., etching) denotes that, with an appropriate etchant choice,
the material removal rate (i.e., etch rate) for the targeted
material is greater than the removal rate for at least another
material exposed to the material removal process.
[0022] The opening 137, which is a single opening of relatively
large dimensions in the spacer patterning layer 135, may be used to
form multiple closely-spaced cuts, as subsequently described, in
contrast with conventional techniques that require multiple
"colors" or stages of patterning to form closely-spaced cuts of
small relative dimensions. In addition, the spacing between
adjacent conventional cuts may be limited due to lithography
resolution limits, which is mitigated through the use of spacers as
described below.
[0023] With reference to FIG. 5 in which like reference numerals
refer to like features in FIG. 4 and at a subsequent fabrication
stage of the processing method, a conformal layer 150 is deposited
on the spacer patterning layer 135 and over the sidewalls and base
of the opening 137 in spacer patterning layer 135. The sections of
conformal layer 150 deposited on sidewalls of opening 137 define a
spacer 151 and a spacer 152. As depicted and described below in
FIG. 6A, spacer 151 and spacer 152 may be included among a
plurality of spacers that are arranged to form a "spacer ring" 155
on the sidewalls of the opening 137. As also described and depicted
below in FIG. 6A, spacer 151 and spacer 152 overlie and traverse
dummy line 125. The thickness T.sub.1 of spacer patterning layer
135 may define, at least in part, a height of spacers 151 and 152
formed on sidewalls of the opening 137 of spacer patterning layer
135. The thickness T.sub.3 of the conformal layer 150 may be
selected to determine a thickness T.sub.4 of spacers 151 and 152
and may further define, at least partially, a length L separating
spacer 151 and spacer 152. The thickness T.sub.4 of spacer 151 and
of spacer 152 may also define a size of gaps separating ends of
metal lines formed in dielectric layer 110, as described further
below. For example, a conformal layer 150 having a thickness
T.sub.3 of 5 nm may form spacers 151, 152 having thickness T.sub.4
of 5 nm, so that gaps formed between the ends of metal lines in
dielectric layer 110 are also 5 nm. The length L separating spacer
151 and spacer 152 may be 15 nm or less, so that a resulting metal
island 165 formed in dielectric layer 110, as described further
below, may have a length L.sub.m of 15 nm or less. The conformal
layer 150, and by extension, the spacers 151 and 152, and masking
layer 130 may be composed of the same material, for example a
nitride-based dielectric material such as silicon nitride.
[0024] With reference to FIGS. 6 and 6A in which like reference
numerals refer to like features in FIG. 5 and at a subsequent
fabrication stage of the processing method, conformal layer 150 is
removed from over spacer patterning layer 135, leaving spacer ring
155, including spacer 151 and spacer 152, disposed over the exposed
portion of masking layer 130. The conformal layer 150 may be
removed, for example, by a selective anisotropic etch process, such
as a reactive-ion etch (RIE) process, controlled to terminate when
spacer patterning layer 135 is exposed by the etch. A controlled
anisotropic etch process allows for removal of the conformal layer
150 with minimal etching of spacers 151, 152. As FIG. 6A
illustrates, the conformal layer 150 deposited on sidewalls of the
opening 137 in spacer patterning layer 135 may form the spacer ring
155 or ring-like spacer formation, including the spacer 151 and
spacer 152 that overlie and traverse dummy line 125.
[0025] With reference to FIGS. 7 and 7A in which like reference
numerals refer to like features in FIGS. 6 and 6A and at a
subsequent fabrication stage of the processing method, spacer
patterning layer 135 and masking layer 130 are removed, which
leaves spacers 151 and 152 disposed over different sections of the
dummy line 125. As FIGS. 7 and 7A show, spacer 151 and spacer 152
overly and traverse dummy line 125 in a spaced apart fashion.
Spacer patterning layer 135 may be removed by a selective etch
process that selectively removes the material of spacer patterning
layer 135 without etching either the masking layer 130 or spacers
151, 152. Masking layer 130 may be etched by a selective etch
process controlled to remove masking layer 130 without fully
etching or removing spacer 151 and spacer 152, such as a reactive
ion etching (RIE) process controlled to terminate when the
dielectric layer 124 of patterning stack 120 is exposed by the etch
process.
[0026] With reference to FIGS. 8 and 8A in which like reference
numerals refer to like features in FIGS. 7 and 7A and at a
subsequent fabrication stage of the processing method, dummy lines
125 and 126 are removed to expose underlying portions of hardmask
layer 122. Spacer 151 and spacer 152 protect underlying portions
127, 128 of dummy line 125 from removal, so that in subsequent
fabrication stages, as described below, the portions of hardmask
layer 122 underlying the remaining portions 127, 128 of dummy line
125 will remain unetched and form "cuts" or gaps in a final
metallization line to be formed in dielectric layer 110.
[0027] With reference to FIGS. 9 and 9A in which like reference
numerals refer to like features in FIGS. 8 and 8A and at a
subsequent fabrication stage of the processing method, the exposed
portions of hardmask layer 122 are etched to form trenches in the
hardmask layer 122 and expose portions of the dielectric layer 110
to be etched. Remaining portions of spacers 151 and 152 are also
removed. The material of spacers 151 and 152, as well as other
spacers of spacer ring 155, may be removed by, for example, a
selective etch process. Dielectric layer 124 may be removed via a
separate selective etch process, as illustrated in FIG. 9.
Alternatively, dielectric layer 124 may remain to be etched during
a subsequent etch of dielectric 110, illustrated in FIG. 10 and
further described below. Remaining portions 127, 128 of dummy line
125 protect the underlying portions 122a, 122b of hardmask layer
122 and define gaps in the trenches formed in hardmask layer 122.
Dummy lines 125, 126 may be removed, for example, by a selective
anisotropic etch process such as a reactive ion etching (RIE)
process.
[0028] With reference to FIGS. 10 and 10A in which like reference
numerals refer to like features in FIGS. 9 and 9A and at a
subsequent fabrication stage of the processing method,
metallization trenches are formed in dielectric layer 110 using the
trenches etched in hardmask layer 122, and the trenches are filled
with a conductive material to form metal lines 160, 161. Remaining
portions of the hardmask layer 122 are removed, exposing the
dielectric layer 110. Metal line 165, resulting from the cuts or
gaps defined by the spacers 151 and 152 as described above, may be
considered a "metal island" as it is electrically isolated from
surrounding metal lines 160. The metal island 165 may have a length
L.sub.m of 15 nm or less. The conductive material may be any
conductive material, such as cobalt or ruthenium or copper or other
conductive material used to form metal lines in a circuit
structure. Cobalt may be a preferred conductive material for
forming metal lines 160, 161 and metal island 165 because cobalt
may be used to form very short metal lines, such as metal islands
of 15 nm or less, whereas copper metal lines generally must have a
minimum length that is greater than 15 nm due to the material
properties of copper and due to reliability issues during service
and use of an integrated circuit structure.
[0029] With reference to FIGS. 11 and 11A in which like reference
numerals refer to like features in FIGS. 7 and 7A in a further
embodiment of the processing method, multiple sets of spacers 156,
157, 158 may be formed over dummy line 125 to define multiple sets
of cuts or gaps in the dummy line 125, and subsequently in metal
lines formed in dielectric layer 110. Multiple sets of spacers 156,
157, 158 may be formed via a lithographic etch process, as
described in part above, in which multiple openings are etched in
spacer patterning layer 135 and the conformal layer 150
subsequently deposited over spacer patterning layer 135 forms
multiple spacers 156, 157, 158. In embodiments in which an even
number of cuts or gaps are needed in dummy line 125, multiple wider
openings, similar to opening 137 in spacer patterning layer 135
depicted in FIGS. 4-5, may be formed in spacer patterning layer 135
that result in the formation of multiple spacer rings or ring-like
spacers similar to the single spacer ring illustrated in FIGS.
5-6A. In embodiments in which an odd number of cuts or gaps in
dummy line 125 are needed, multiple wider openings, similar to
opening 137 in spacer patterning layer 135 depicted in FIGS. 4-5,
may be formed in spacer patterning layer 135 that result in the
formation of multiple spacer rings, and an additional narrow
opening may be formed in spacer patterning layer 135 that results
in spacers 158. The additional narrow opening in spacer patterning
layer 135 may have a width dimension W.sub.N that is less than
twice the thickness T.sub.3 of the conformal layer 150 formed over
the spacer patterning layer 135, resulting in spacers 158 that
merge into a single spacer block disposed over dummy line 125. The
single spacer block formed by spacers 158 then forms a single cut
or gap in dummy line 125.
[0030] With reference to FIGS. 12 and 13 in which like reference
numerals refer to like features in FIGS. 1-10A and in a further
embodiment of the processing method, the dielectric layer 110,
including metal lines 160, 161, and metal island 165, may be one
metallization layer in a circuit structure 100a and may be disposed
above a lower metallization layer 170 having a plurality of metal
lines 171 and below an upper metallization layer 175 having a
plurality of metal lines 176. As depicted in FIG. 12, a lower
metallization layer 170 may be formed first and a via 182 formed to
connect to one metal line 171 in lower metallization layer 170. The
dielectric layer 110 may then be formed, as described above, with a
metal island 165 aligned with the via 182 connected to metal line
171. Conductive via 182 may be formed, for example, by etching a
hole through the dielectric material of dielectric layer 110, prior
to formation of metal lines 160, 161, and metal island 165, and
subsequently filling the hole with a conductive material such as
cobalt, ruthenium, or copper. The conductive via 182 may be filled
along with metal lines 160, 161, and metal island 165 in the same
processing step or may be filled prior to forming metal lines 160,
161, and metal island 165 as described above. As depicted in FIG.
13, another conductive via 184 may then be formed that connects to
metal island 165, and the upper metallization layer 175 may then be
formed over dielectric layer 110 with one metal line 176 in upper
metallization layer 175 aligned to and connecting with the other
conductive via 184. Conductive via 184 may be formed by similar
processes as for forming via 182. The circuit structure 100a formed
thus has an interconnection between upper metallization layer 175
and lower metallization layer 170, wherein dielectric layer 110
separates the upper metallization layer 175 and lower metallization
layer 170. Conductive vias 182 and 184, in conjunction with metal
island 165 formed in dielectric layer 110, form an extended via or
"super via" that permits interconnection between metal lines of
non-adjacent metallization levels in circuit structure 100a. The
metal island 165 formed as described herein allows for efficient
conductive connection between conductive vias 182 and 184 as metal
island 165 may be formed to have a size substantially equal to a
size of conductive vias 182 and 184 so as to minimize area
losses.
[0031] The methods as described above are used in the fabrication
of integrated circuit chips. The resulting integrated circuit chips
can be distributed by the fabricator in raw wafer form (e.g., as a
single wafer that has multiple unpackaged chips), as a bare die, or
in a packaged form. In the latter case, the chip is mounted in a
single chip package (e.g., a plastic carrier, with leads that are
affixed to a motherboard or other higher level carrier) or in a
multichip package (e.g., a ceramic carrier that has either or both
surface interconnections or buried interconnections). In any case,
the chip may be integrated with other chips, discrete circuit
elements, and/or other signal processing devices as part of either
an intermediate product or an end product.
[0032] References herein to terms such as "vertical", "horizontal",
"lateral", etc. are made by way of example, and not by way of
limitation, to establish a frame of reference. Terms such as
"horizontal" and "lateral" refer to a direction in a plane parallel
to a top surface of a semiconductor substrate, regardless of its
actual three-dimensional spatial orientation. Terms such as
"vertical" and "normal" refer to a direction perpendicular to the
"horizontal" and "lateral" direction. Terms such as "above" and
"below" indicate positioning of elements or structures relative to
each other and/or to the top surface of the semiconductor substrate
as opposed to relative elevation.
[0033] A feature "connected" or "coupled" to or with another
element may be directly connected or coupled to the other element
or, instead, one or more intervening elements may be present. A
feature may be "directly connected" or "directly coupled" to
another element if intervening elements are absent. A feature may
be "indirectly connected" or "indirectly coupled" to another
element if at least one intervening element is present.
[0034] The descriptions of the various embodiments of the present
invention have been presented for purposes of illustration, but are
not intended to be exhaustive or limited to the embodiments
disclosed. Many modifications and variations will be apparent to
those of ordinary skill in the art without departing from the scope
and spirit of the described embodiments. The terminology used
herein was chosen to best explain the principles of the
embodiments, the practical application or technical improvement
over technologies found in the marketplace, or to enable others of
ordinary skill in the art to understand the embodiments disclosed
herein.
* * * * *