U.S. patent application number 15/344575 was filed with the patent office on 2018-02-15 for source driving device with 3 types of gate oxide layer.
The applicant listed for this patent is NOVATEK Microelectronics Corp.. Invention is credited to Yu-Hao Hsu, Ming-Han Lee, Jui-Chang Lin, Wei-Cheng Lin.
Application Number | 20180047355 15/344575 |
Document ID | / |
Family ID | 61159268 |
Filed Date | 2018-02-15 |
United States Patent
Application |
20180047355 |
Kind Code |
A1 |
Hsu; Yu-Hao ; et
al. |
February 15, 2018 |
Source Driving Device with 3 Types of Gate Oxide Layer
Abstract
A source driving device for a display system includes a
receiving module, for receiving display data; a register module,
for sorting pixel data included in the display data to generate
sorted pixel data; a latch module, for outputting sequenced display
data to the level shifting module; a level shifting module, for
adjusting the sequenced display data from a low voltage range to a
medium voltage range; a converting module; for converting the
sequenced display data to analog display voltages; a buffer module,
for generating a plurality source driving signals according to the
analog display voltages; and an output switching module, for
outputting the plurality source driving signals to a display device
of the display system operating in a high voltage range; wherein
circuit components in the source driving device operating in
different voltage ranges have different gate oxide thicknesses.
Inventors: |
Hsu; Yu-Hao; (Hsinchu
County, TW) ; Lin; Jui-Chang; (Hsinchu City, TW)
; Lee; Ming-Han; (Hsinchu City, TW) ; Lin;
Wei-Cheng; (Hsinchu County, TW) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
NOVATEK Microelectronics Corp. |
Hsin-Chu |
|
TW |
|
|
Family ID: |
61159268 |
Appl. No.: |
15/344575 |
Filed: |
November 6, 2016 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
62372760 |
Aug 9, 2016 |
|
|
|
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 27/088 20130101;
H01L 21/823462 20130101; H01L 27/1259 20130101; G09G 3/3688
20130101; H01L 27/1237 20130101; G09G 3/3696 20130101 |
International
Class: |
G09G 3/36 20060101
G09G003/36 |
Claims
1. A source driving device for a display system, comprising: a
receiving module, for receiving display data; a register module,
for sorting pixel data included in the display data to generate
sorted pixel data; a latch module, for outputting sequenced display
data to the level shifting module; a level shifting module, for
adjusting the sequenced display data from a low voltage range to a
medium voltage range; a converting module, for converting the
sequenced display data to analog display voltages; a buffer module,
for generating a plurality source driving signals according to the
analog display voltages; and an output switching module, for
outputting the plurality source driving signals to a display device
of the display system operating in a high voltage range; wherein
the receiving module, the register module, and the latch module are
realized by low voltage circuit components equipping with a first
gate oxide thickness; wherein the converting module and the buffer
module are realized by the low voltage circuit components and
medium voltage circuit components equipping with a second gate
oxide thickness; wherein the output switch module is realized by
high voltage circuit components equipping with a third gate oxide
thickness; wherein the first gate oxide thickness is smaller than
the second gate oxide thickness and the second gate oxide thickness
is smaller than the third gate oxide thickness.
2. The source driving device of claim 1, wherein the level shifting
module is realized by the low voltage circuit components and medium
voltage circuit components equipping with the second gate oxide
thickness.
3. The source driving device of claim 1, wherein the maximum
voltage of the low voltage range is one of 3.3 volts, 1.8 volts,
and 1.2 volts, the maximum voltage of the medium voltage range is
between 5-11 volts, and the maximum voltage of the high voltage
range is between 15-21 volts.
4. The source driving device of claim 1, wherein the first gate
oxide thickness is between 58-75 angstroms when the maximum voltage
of the low voltage range is 3.3 volts, the first gate oxide
thickness is between 30-45 angstroms when the maximum voltage of
the low voltage range is 1.8 volts, the first gate oxide thickness
is between 16-22 angstroms when the maximum voltage of the low
voltage range is 1.2 volts, the second gate oxide thickness is
between 170-230 angstroms, and the third gate oxide thickness is
between 340-480 angstroms.
5. A manufacture method of a source driving device in a display
system, the manufacture method comprising: forming a first oxide
layer of a first thickness on a substrate; removing the first oxide
layer outside a high voltage area; forming a second oxide layer of
a second thickness on the substrate; removing the second oxide
layer outside the high voltage area and a medium voltage area; and
forming a third oxide layer of a third thickness on a low voltage
area on the substrate; wherein the high voltage area comprises a
plurality of high voltage circuit components operating in a high
voltage range, the medium voltage area comprises a plurality of
medium voltage circuit components operating in a medium voltage
range, the low-voltage area comprises a plurality of low voltage
circuit components operating in a low voltage range.
6. The manufacture method of claim 5, wherein the maximum voltage
of the low voltage range is one of 3.3 volts, 1.8 volts, and 1.2
volts, the maximum voltage of the medium voltage range is between
5-11 volts, and the maximum voltage of the high voltage range is
between 15-21 volts.
7. The manufacture method of claim 5, wherein the first thickness
is between 170-230 angstroms, the second thickness is between
170-230 angstroms, the third thickness is between 58-75 angstroms
when the maximum voltage the low voltage range is 3.3 volts, the
third thickness is between 30-45 angstroms when the maximum voltage
the low voltage range is 1.8 volts, and the third thickness is
between 16-22 angstroms when the maximum voltage the low voltage
range is 1.2 volts.
Description
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application claims the benefit of U.S. Provisional
Application No. 62/372,760 filed on 2016 Aug. 2009, the contents of
which are incorporated herein in their entirety.
BACKGROUND OF THE INVENTION
1. Field of the Invention
[0002] The present invention relates to a source driving device,
and more particularly, to a source driving device with 3 types of
gate oxide layer.
2. Description of the Prior Art
[0003] The integrated circuit (IC), also called the mother of
information technology (IT) industry, is the most basic and the
most important components in the IT products. The IC is realized by
configuring circuit components such as transistors, diodes,
resistors and capacitors on a silicon chip, to form a complete
logic circuit, so as to achieve functions of controlling,
calculating and memorizing and to handle various affairs for
people.
[0004] According to different applications, the integrated circuits
may comprise circuit components operating in different voltage
ranges. In a display device (e.g. a liquid crystal display (LCD)),
a source driver integrated circuit (IC) is generally implemented by
high voltage circuit components and low voltage circuit components.
When circuits in the source driver IC are required to operate
within a medium voltage range, whose maximum voltage is greater
than that of the low voltage range and smaller than that of the
high voltage range, the circuits operating within the medium
voltage range are implemented by the circuit components designed
for the high voltage range adopting different layout rules. Because
the component structure of the circuit components of the high
voltage range is not designed for operating within the medium
voltage range, the performances of the circuits operating within
the medium voltage range in the conventional source driver IC are
inherently limited. Thus, how to improve the performances of the
circuits operating within the medium voltage in the conventional
source driver IC becomes a topic to be discussed.
SUMMARY OF THE INVENTION
[0005] In order to solve the above issue, the present invention
provides a source driving device with 3 types of gate oxide
layer.
[0006] In an aspect, a source driving device for a display system
is disclosed. The source driving device comprises a receiving
module, a register module, a latch module, a level shifting module,
a converting module, a buffer module, and an output switch module.
The receiving module is utilized for receiving display data. The
register module is utilized for sorting pixel data included in the
display data to generate sorted pixel data. The latch module is
utilized for outputting sequenced display data to the level
shifting module. The level shifting module is utilized adjusting
the sequenced display data from a low voltage range to a medium
voltage range. The converting module is utilized for converting the
sequenced display data to analog display voltages. The buffer
module is utilized for buffering the analog display voltages; and
an output switching module, for outputting the buffered analog
display voltages to a display device of the display system
operating in a high voltage range; wherein circuit components in
the source driving device operating indifferent voltage ranges have
different gate oxide thicknesses.
[0007] In the present disclosure, the circuit components operating
within different voltage ranges equip with different gate oxide
thicknesses. Instead of utilizing the circuit components designed
for the high voltage range to realize the circuit components
operating within the medium voltage range, the present disclosure
makes the circuit components operating within the medium voltage
range equip with unique gate oxide thickness. The performance of
the circuits operating within the medium voltage range can be
largely improved.
[0008] These and other objectives of the present invention will no
doubt become obvious to those of ordinary skill in the art after
reading the following detailed description of the preferred
embodiment that is illustrated in the various figures and
drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0009] FIG. 1 is a schematic diagram of a source driving device
according to an example of the present invention.
[0010] FIGS. 2A-2D are cross-section views of the source driving
device shown in FIG. 1 during the manufacturing process.
[0011] FIG. 3 is a flowchart of a process according to an example
of the present invention.
DETAILED DESCRIPTION
[0012] Please refer to FIG. 1, which is a schematic diagram of a
source driving device 10 according to an example of the present
invention. The source driving device 10 maybe a source driver in a
display system, such as a liquid crystal display (LCD), a smart
phone, a tablet or an electronic product with a liquid crystal
display panel. As shown in FIG. 1, the source driving device 10
comprises a receiving module 100, a register module 102, a latch
module 104, a level shifting module 106, a converting module 108, a
buffer module 110, and an output switch module 112. The source
driving device 10 is utilized to receive digital display data DD_D
and accordingly generate source driving signals SD1-SDn of driving
pixels in a display device (e.g. a display panel) of the display
system. In this example, the source driving device 10 consists of
circuit components (e.g. metal-oxide-semiconductor field-effect
transistors (MOSFETs)) equipping with 3 different gate oxide
thicknesses and different gate oxide thicknesses are corresponding
to the circuit components operating in different voltage ranges.
Via adopting the circuit components equipping with 3 different gate
oxide thicknesses, the performance of the source driving device 10
can be greatly improved.
[0013] In details, the receiving module 100 is utilized to receive
the digital display data DD within a low voltage range LV, whose
maximum voltage may be 3.3 volts, 1.8 volts or 1.2 volts. For
example, the receiving module 100 may comprises a receiver for
receiving the digital display data DD and a clock data recovery
(CDR) circuit for adjusting a clock signal of receiving the digital
display data DD. Next, the register module 102 sorts pixel data
included in the digital display data DD_D according to the pixel
locations corresponding to the pixel data and transmits the sorted
pixel data to the latch module. When the pixel data corresponding
to the pixels located on a row is ready, the latch module 104
outputs the pixel data corresponding to the pixels located on the
same row to the level shifting module 106 and the level shifting
module 106 shifting the voltage range of the pixel data from the
low voltage range LV to a medium voltage range MV, whose maximum
voltage may be between 5-11 volts. The converting module 106, such
as a digital-to-analog converter (DAC), converts the pixel data
within the medium voltage range MV to corresponded pixel voltages
and outputs the pixel voltages to the buffer module 110. Then, the
buffer module 110 generates the source driving signals SD1-SDN
according to the pixel voltages, to drive the pixels of the display
device (not shown in FIG. 1). The output switch module 112 is
utilized to control timings of outputting the source driving
signals SD1-SDn to the display device and to switch the source
driving signals corresponding to the same pixel according to an
inversion type (e.g. a dot inversion, a frame inversion, or a line
inversion) of the display device. Note that, the output switch
module 112 operates within a high voltage range HV that is the
operational voltage range of the display device, to prevent the
circuit components from being damaged. In an example, the maximum
voltage of the high voltage range HV is between 15-21 volts.
[0014] In FIG. 1, the receiving module 100, the register module
102, the latch module 104 and parts of level shifting module 106
are realized by low voltage circuit components designed for the low
voltage range LV; remaining parts of the level shifting module 106,
the converting module 108, and the buffer module 110 are realized
by medium voltage circuit components designed for the medium
voltage range MV; and the switch module 110 is realized by high
voltage circuit components designed for the high voltage range HV.
In the convention art, the medium circuit components are realized
by the high voltage circuit components whose layout rules are
appropriately altered. For example, the MOSFETs operating within
the medium voltage range MV can be realized by the MOSFETs designed
for the high voltage range HV whose layout rules of source and
drain are adjusted in the conventional art. In an example, the
MOSFETs operating within the medium voltage range MV are realized
by Middle-High-Middle (MHM) transistors and/or Low-High-Low (LHL)
transistors. Note that, MHM and LHL represent withstand voltage
levels of drain, gate, and source of the transistor. That is, the
drain, gate and source of the MHM transistor equip with middle,
high, and middle withstand voltage levels, respectively, and the
drain, gate and source of the LHL transistor equip with low, high,
and low withstand voltage levels, respectively. Under such a
condition, the gate oxide thickness of the medium voltage circuit
elements remains the same with the high voltage circuit elements.
The inherent component structure of the medium voltage circuit
elements realized by the high voltage circuit components would
limit the performance of the circuits operating within the medium
voltage range MV.
[0015] In order to improve the performance of the circuits
operating within the medium voltage range MV, the present invention
makes the circuit elements operating indifferent voltage ranges
have different gate oxide thicknesses. In the example shown in FIG.
1, the thickness of gate oxide of the low voltage circuit
components is a gate oxide thickness GO_LV; the thickness of gate
oxide of the medium voltage circuit components is a gate oxide
thickness GO_MV; and the thickness of gate oxide of the high
voltage circuit components is a gate oxide thickness GO_HV. The
gate oxide thickness GO_LV may be 58-75 angstroms (1
angstrom=1*10.sup.-10 meter), 30-45 angstroms, or 16-22 angstroms
when the maximum voltage of the low voltage range LV is 3.3 volts,
1.8 volts, or 1.2 volts, respectively. The gate oxide thickness
GO_MV may be 170-230 angstroms, and the gate oxide thickness GO_HV
may be 340-480 angstroms. By making the medium voltage circuit
components have the unique gate oxide thickness GO_MV, the
performance of the circuits operating within the medium voltage
range MV can be largely improved. For example, a gain and a slew
rate of an input stage (e.g. an input differential pair) of the
buffer module 110 can be increased, the mismatch problem in the
input stage and a gain/compensation stage of the buffer module 110
can be mitigated, and a power consumption of an output stage of the
buffer module 110 can be decreased when changing the gate oxide
thickness of the medium voltage circuit components to the gate
oxide thickness GO_MV.
[0016] According to different applications and design concepts,
those with ordinary skill in the art may observe appropriate
alternations and modifications. For example, some circuits
operating within the medium voltage range MV may be realized by the
high voltage circuit components designed for the high voltage range
HV. In an example of the present invention, the converting module
108 shown in FIG. 1 is realized by the MHM transistors and/or LHL
transistors (i.e. the high voltage circuit components designed for
the high voltage range HV whose layout rules are altered).
[0017] As to manufacturing the source driving device 10 with
different gate oxides thicknesses, please refer to FIGS. 2A-2D.
Note that, the components not related to the process of
manufacturing the gate oxides of different thicknesses, such as
shallow trench isolations (STIs), are omitted for brevity. Please
refer to FIG. 2A, a first gate oxide layer GO1 is formed on a
substrate SUB by performing a furnace process and/or a chemical
vapor deposition (CVD) process. Note that, the thickness of the
first gate oxide layer GO1 is approximately half of the gate oxide
thickness GO_HV (e.g. 170-230 angstroms). Next, a photo resistor
layer PR1 is formed on the first gate oxide layer GO1 to define a
high voltage area A_HV in FIG. 2B. For example, the photo resistor
layer PR1 may first cover the first gate oxide layer GO1 and the
photo resistor layer PR1 outside the high voltage area A_HV is
removed by using a photo mask PM1. After an etching process is
performed, the first gate oxide layer GO1 outside the high voltage
area A HV is removed. Note that, the high voltage area A HV
represents the area comprising the high voltage circuit components
operating in the high voltage range HV.
[0018] In FIG. 2C, a second gate oxide layer GO2 is formed on the
substrate SUB by performing another furnace process and/or CVD
process. Similar to FIG. 2B, a photo resistor layer PR2 is formed
on the substrate SUB to cover the high voltage area A_HV and a
medium voltage area A_MV, wherein the medium voltage area A_MV
represents the area comprising the medium voltage circuit
components operating in the medium voltage range MV. In an example,
the photo resistor layer PR2 outside the high voltage area A_HV and
the medium voltage area A_MV is removed by using a photo mask PM2.
The thickness of the second gate oxide layer GO2 is approximately
half of the gate oxide thickness GO_HV or the gate oxide thickness
GO_MV (e.g. 170-230 angstroms). Next, the second gate oxide layer
GO2 outside the high voltage area A_HV and the medium voltage range
A_MV is removed by performing an etching process.
[0019] Please refer to FIG. 2D, the photo resistor layer PR2 is
removed after removing the second gate oxide layer GO2 outside the
high voltage area A HV and the medium voltage area A_MV. Finally, a
third gate oxide layer GO3 is form on a low voltage area A_LV by a
furnace process, wherein the low voltage area A_LV represents the
area comprising the low voltage circuit components operating in the
low voltage range LV. The thickness of the third gate oxide layer
GO3 is the gate oxide thickness GO_LV. Note that, because the third
gate oxide layer GO3 is formed only by the furnace process, the
third gate oxide layer GO3 is not or slightly formed on the high
voltage area A HV and the medium voltage area A_MV. That is, the
thicknesses of gate oxide layer on the high voltage area A_HV and
the medium voltage area A_MV does not change or slight increases
(increases by smaller than 15 angstroms). As shown in FIG. 2D, the
gate oxide thickness in the high voltage area A HV equals the sum
of the thicknesses of the first gate oxide layer GO1 and the second
gate oxide layer GO2, the gate oxide thickness in the medium
voltage area A_MV equals the thickness of the second gate oxide
layer GO2, and the gate oxide thickness in the low voltage area
A_MV equals the thickness of the third gate oxide layer GO3. The
source driving device comprising the gate oxide layer equipping
with 3 different thicknesses are therefore acquired.
[0020] The process of manufacturing the source driving device 10
with different gate oxides thicknesses can be summarized into a
process 30 shown in FIG. 3. The process 30 is utilized to
manufacture a source driving device for a display system and
comprises the following steps: [0021] Step 300: Start. [0022] Step
302: Form a first oxide layer of a first thickness on a substrate.
[0023] Step 304: Removing the first oxide layer outside a high
voltage area. [0024] Step 306: Form a second oxide layer of a
second thickness on the substrate. [0025] Step 308: Remove the
second oxide layer outside the high voltage area and a medium
voltage area. [0026] Step 310: Form a third oxide layer of a third
thickness on a low voltage area on the substrate. [0027] Step 312:
End.
[0028] According to the process 30, a first oxide layer of a first
thickness is formed on a substrate by a furnace process and/or a
CVD process (step 302). Next, the first oxide layer outside a high
voltage area is removed. For example, a first photo resistor layer
is formed on the substrate and then the first photo resistor layer
outside the high voltage area is removed by using a photo mask. By
performing an etching process, the gate oxide layer not covered by
the photo resistor layer (i.e. the gate oxide layer outside the
high voltage area) is removed (Step 304).
[0029] Similarly to steps 302 and 304, a second gate oxide layer of
a second thickness is formed on the substrate by the furnace
process and/or the CVD process and the second gate oxide layer
outside the high voltage area and a medium voltage area is removed
(steps 306 and 308). Finally, a third oxide layer of a third
thickness is form on a low voltage area by the furnace process.
Because the third gate oxide layer is formed only by the furnace
process, the third gate oxide layer is not or barely formed on the
high voltage area and the medium voltage area. In other words, the
thickness of gate oxide layer on the high voltage area (i.e. sum of
the first thickness and the second thickness) and the thickness of
the medium voltage area (i.e. the second thickness) remain the same
or slight increase. As a result, the gate oxide layer in the high
voltage area becomes the second gate oxide layer stack on the first
gate oxide layer, the gate oxide layer in the medium voltage area
is the second gate oxide layer, and the gate oxide layer in the low
voltage area is the third gate oxide layer. The source driving
device with 3 different gate oxide layers is therefore
acquired.
[0030] In the above examples, the circuit components operating
within different voltage ranges equip with different gate oxide
thicknesses. Instead of utilizing the high voltage circuit
components designed for the high voltage range to realize the
medium voltage circuit components operating within the medium
voltage range, the present invention makes the medium circuit
components equip with unique gate oxide thickness. The performance
of the circuits operating within the medium voltage range is
therefore improved.
[0031] Those skilled in the art will readily observe that numerous
modifications and alterations of the device and method may be made
while retaining the teachings of the invention. Accordingly, the
above disclosure should be construed as limited only by the metes
and bounds of the appended claims.
* * * * *