U.S. patent application number 15/696093 was filed with the patent office on 2017-12-21 for optimizing layout of irregular structures in regular layout context.
The applicant listed for this patent is Tela Innovations, Inc.. Invention is credited to Scott T. Becker, Stephen Kornachuk, Carole Lambert, James Mali, Brian Reed.
Application Number | 20170365548 15/696093 |
Document ID | / |
Family ID | 41381434 |
Filed Date | 2017-12-21 |
United States Patent
Application |
20170365548 |
Kind Code |
A1 |
Kornachuk; Stephen ; et
al. |
December 21, 2017 |
Optimizing Layout of Irregular Structures in Regular Layout
Context
Abstract
A plurality of regular wires are formed within a given chip
level, each having a linear-shape with a length extending in a
first direction and a width extending in a second direction
perpendicular to the first direction. The plurality of regular
wires are positioned according to a fixed pitch such that a
distance as measured in the second direction between lengthwise
centerlines of any two regular wires is an integer multiple of the
fixed pitch. At least one irregular wire is formed within the given
chip level and within a region bounded by the plurality of regular
wires. Each irregular wire has a linear-shape with a length
extending in the first direction and a width extending in the
second direction. A distance as measured in the second direction
between lengthwise centerlines of any irregular wire and any
regular wire is not equal to an integer multiple of the fixed
pitch.
Inventors: |
Kornachuk; Stephen;
(Campbell, CA) ; Mali; James; (Morgan Hill,
CA) ; Lambert; Carole; (Campbell, CA) ;
Becker; Scott T.; (Scotts Valley, CA) ; Reed;
Brian; (San Jose, CA) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Tela Innovations, Inc. |
Los Gatos |
CA |
US |
|
|
Family ID: |
41381434 |
Appl. No.: |
15/696093 |
Filed: |
September 5, 2017 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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13898155 |
May 20, 2013 |
9754878 |
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15696093 |
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12481445 |
Jun 9, 2009 |
8448102 |
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13898155 |
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12013342 |
Jan 11, 2008 |
7917879 |
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12481445 |
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12212562 |
Sep 17, 2008 |
7842975 |
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12481445 |
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11683402 |
Mar 7, 2007 |
7446352 |
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12212562 |
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61060090 |
Jun 9, 2008 |
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60963364 |
Aug 2, 2007 |
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60972394 |
Sep 14, 2007 |
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60781288 |
Mar 9, 2006 |
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
G06F 30/392 20200101;
H01L 23/528 20130101; H01L 2924/0002 20130101; G06F 2119/18
20200101; Y02P 90/02 20151101; G06F 30/39 20200101; Y02P 90/265
20151101; H01L 2924/0002 20130101; H01L 2924/00 20130101 |
International
Class: |
H01L 23/528 20060101
H01L023/528; G06F 17/50 20060101 G06F017/50 |
Claims
1. An integrated circuit, comprising: a first conductive structure
having a first length as measured in a first direction and a first
width as measured in a second direction perpendicular to the first
direction, the first conductive structure having a lengthwise
centerline positioned on a first virtual line of a virtual grate,
the virtual grate including a plurality of lines spaced at a
uniform pitch; a second conductive structure having a second length
as measured in the first direction and a second width as measured
in the second direction, the second width substantially equal to
the first width, the second conductive structure having a
lengthwise centerline positioned on a second virtual line of the
virtual grate, the virtual grate including at least two virtual
lines interposed between the first virtual line and the second
virtual line; a third conductive structure having a third length as
measured in the first direction and a third width as measured in
the second direction, the third width less than the second width,
the third conductive structure positioned beside the second
conductive structure and between the first conductive structure and
the second conductive structure, the third conductive structure
separated from the second conductive structure by a first spacing
as measured in the second direction; and a fourth conductive
structure having a fourth length as measured in the first direction
and a fourth width as measured in the second direction, the fourth
width substantially equal to the third width, the fourth conductive
structure positioned beside the first conductive structure and
between the first conductive structure and the second conductive
structure, the fourth conductive structure separated from the first
conductive structure by the first spacing as measured in the second
direction.
2. The integrated circuit as recited in claim 1, wherein a
lengthwise centerline of the third conductive structure is not
positioned on a virtual line of the virtual grate.
3. The integrated circuit as recited in claim 3, wherein a
lengthwise centerline of the fourth conductive structure is not
positioned on a virtual line of the virtual grate.
4. The integrated circuit as recited in claim 1, wherein the first
length is substantially equal to the second length.
5. The integrated circuit as recited in claim 4, wherein the third
length is substantially equal to the fourth length.
6. The integrated circuit as recited in claim 1, wherein the third
length is substantially equal to the fourth length.
7. The integrated circuit as recited in claim 1, wherein the first
width is at least two times the third width.
8. The integrated circuit as recited in claim 1, wherein the first
conductive structure has a first end and a second end, wherein the
second conductive structure has a first end and a second end, and
wherein the first end of the first conductive structure and the
first end of the second conductive structure are substantially
aligned to a same location in the first direction.
9. The integrated circuit as recited in claim 8, wherein the third
conductive structure has a first end and a second end, wherein the
fourth conductive structure has a first end and a second end, and
wherein the first end of the third conductive structure and the
first end of the fourth conductive structure are substantially
aligned to a same location in the first direction.
10. The integrated circuit as recited in claim 1, wherein the third
conductive structure has a first end and a second end, wherein the
fourth conductive structure has a first end and a second end, and
wherein the first end of the third conductive structure and the
first end of the fourth conductive structure are substantially
aligned to a same location in the first direction.
11. The integrated circuit as recited in claim 1, further
comprising: a fifth conductive structure having a fifth length as
measured in the first direction and a fifth width as measured in
the second direction, the fifth width substantially equal to the
third width, the fifth conductive structure positioned between the
third conductive structure and the fourth conductive structure.
12. The integrated circuit as recited in claim 11, wherein the
fifth conductive structure is separated from the third conductive
structure by the first spacing as measured in the second
direction.
13. The integrated circuit as recited in claim 11, wherein the
fifth conductive structure is separated from the fourth conductive
structure by the first spacing as measured in the second
direction.
14. The integrated circuit as recited in claim 11, further
comprising: a sixth conductive structure having a sixth length as
measured in the first direction and a sixth width as measured in
the second direction, the sixth width substantially equal to the
third width, the sixth conductive structure positioned between the
third conductive structure and the fourth conductive structure.
15. The integrated circuit as recited in claim 14, wherein the
fifth conductive structure is separated from the third conductive
structure by the first spacing as measured in the second direction,
and wherein the sixth conductive structure is separated from the
fourth conductive structure by the first spacing as measured in the
second direction.
16. The integrated circuit as recited in claim 15, wherein the
first conductive structure has a first end and a second end,
wherein the second conductive structure has a first end and a
second end, and wherein the first end of the first conductive
structure and the first end of the second conductive structure are
substantially aligned to a same location in the first
direction.
17. The integrated circuit as recited in claim 16, wherein the
third conductive structure has a first end and a second end,
wherein the fourth conductive structure has a first end and a
second end, and wherein the first end of the third conductive
structure and the first end of the fourth conductive structure are
substantially aligned to a same location in the first
direction.
18. The integrated circuit as recited in claim 17, wherein the
fifth conductive structure has a first end and a second end,
wherein the sixth conductive structure has a first end and a second
end, and wherein the first end of the fifth conductive structure
and the first end of the sixth conductive structure are
substantially aligned to a same location in the first
direction.
19. The integrated circuit as recited in claim 15, further
comprising: a seventh conductive structure having a seventh length
as measured in the first direction and a seventh width as measured
in the second direction, the seventh width substantially equal to
the third width, the seventh conductive structure positioned
between the fifth conductive structure and the sixth conductive
structure.
20. The integrated circuit as recited in claim 19, wherein the
seventh conductive structure is separated from the fifth conductive
structure by the first spacing as measured in the second direction,
or the seventh conductive structure is separated from the sixth
conductive structure by the first spacing as measured in the second
direction.
21. A method for manufacturing an integrated circuit, comprising:
forming a first conductive structure having a first length as
measured in a first direction and a first width as measured in a
second direction perpendicular to the first direction, the first
conductive structure having a lengthwise centerline positioned on a
first virtual line of a virtual grate, the virtual grate including
a plurality of lines spaced at a uniform pitch; forming a second
conductive structure having a second length as measured in the
first direction and a second width as measured in the second
direction, the second width substantially equal to the first width,
the second conductive structure having a lengthwise centerline
positioned on a second virtual line of the virtual grate, the
virtual grate including at least two virtual lines interposed
between the first virtual line and the second virtual line; forming
a third conductive structure having a third length as measured in
the first direction and a third width as measured in the second
direction, the third width less than the second width, the third
conductive structure positioned beside the second conductive
structure and between the first conductive structure and the second
conductive structure, the third conductive structure separated from
the second conductive structure by a first spacing as measured in
the second direction; and forming a fourth conductive structure
having a fourth length as measured in the first direction and a
fourth width as measured in the second direction, the fourth width
substantially equal to the third width, the fourth conductive
structure positioned beside the first conductive structure and
between the first conductive structure and the second conductive
structure, the fourth conductive structure separated from the first
conductive structure by the first spacing as measured in the second
direction.
Description
CLAIM OF PRIORITY
[0001] This application is a continuation application under 35
U.S.C. 120 of prior U.S. application Ser. No. 13/898,155, filed May
20, 2013, issued as U.S. Pat. No. 9,754,878, on Sep. 5, 2017, which
is a continuation application under 35 U.S.C. 120 of prior U.S.
application Ser. No. 12/481,445, filed Jun. 9, 2009, issued as U.S.
Pat. No. 8,448,102, on May 21, 2013, which:
[0002] 1) claims priority under 35 U.S.C. 119(e) to U.S.
Provisional Patent Application No. 61/060,090, filed Jun. 9, 2008,
and
[0003] 2) is a continuation-in-part application under 35 U.S.C. 120
of U.S. application Ser. No. 12/013,342, filed Jan. 11, 2008,
issued as U.S. Pat. No. 7,917,879, on Mar. 29, 2011, which claims
priority under 35 U.S.C. 119(e) to both U.S. Provisional Patent
Application No. 60/963,364, filed Aug. 2, 2007, and U.S.
Provisional Patent Application No. 60/972,394, filed Sep. 14, 2007,
and
[0004] 3) is a continuation-in-part application under 35 U.S.C. 120
of prior U.S. application Ser. No. 12/212,562, filed Sep. 17, 2008,
issued as U.S. Pat. No. 7,842,975, on Nov. 30, 2010, which is a
continuation application under 35 U.S.C. 120 of U.S. application
Ser. No. 11/683,402, filed Mar. 7, 2007, issued as U.S. Pat. No.
7,446,352, on Nov. 4, 2008, which claims priority under 35 U.S.C.
119(e) to U.S. Provisional Patent Application No. 60/781,288, filed
Mar. 9, 2006.
[0005] The disclosure of each above-identified patent application
is incorporated herein by reference in its entirety.
BACKGROUND
[0006] A push for higher performance and smaller die size drives
the semiconductor industry to reduce circuit chip area by
approximately 50% every two years. The chip area reduction provides
an economic benefit for migrating to newer technologies. The 50%
chip area reduction is achieved by reducing the feature sizes
between 25% and 30%. The reduction in feature size is enabled by
improvements in manufacturing equipment and materials. For example,
improvement in the lithographic process has enabled smaller feature
sizes to be achieved, while improvement in chemical mechanical
polishing (CMP) has in-part enabled a higher number of interconnect
layers.
[0007] In the evolution of lithography, as the minimum feature size
approached the wavelength of the light source used to expose the
feature shapes, unintended interactions occurred between
neighboring features. Today minimum feature sizes are being reduced
below 45 nm (nanometers), while the wavelength of the light source
used in the photolithography process remains at 193 nm. The
difference between the minimum feature size and the wavelength of
light used in the photolithography process is defined as the
lithographic gap. As the lithographic gap grows, the resolution
capability of the lithographic process decreases.
[0008] An interference pattern occurs as each shape on the mask
interacts with the light. The interference patterns from
neighboring shapes can create constructive or destructive
interference. In the case of constructive interference, unwanted
shapes may be inadvertently created. In the case of destructive
interference, desired shapes may be inadvertently removed. In
either case, a particular shape is printed in a different manner
than intended, possibly causing a device failure. Correction
methodologies, such as optical proximity correction (OPC), attempt
to predict the impact from neighboring shapes and modify the mask
such that the printed shape is fabricated as desired. However, the
quality of the light interaction prediction is declining as process
geometries shrink and as the light interactions become more
complex.
[0009] In view of the foregoing, solutions are sought for
improvements in circuit design and layout that can improve
management of lithographic gap issues as technology continues to
progress toward smaller semiconductor device features sizes.
SUMMARY
[0010] In one embodiment, a method is disclosed for placing
irregular layout shapes in a dynamic array architecture. The method
includes bracketing an irregular wire layout region within a
portion of a chip level layout. The bracketing is done by placing a
first regular wire layout shape on a first side of the irregular
wire layout region, and by placing a second regular wire layout
shape on a second side of the irregular wire layout region. The
method also includes placing one or more irregular wire layout
shapes within the irregular wire layout region. A first edge
spacing is maintained between the first regular wire layout shape
and an outer irregular wire layout shape within the irregular wire
layout region nearest to the first regular wire layout shape. A
second edge spacing is maintained between the second regular wire
layout shape and an outer irregular wire layout shape within the
irregular wire layout region nearest to the second regular wire
layout shape. The first and second edge spacings are defined to
optimize lithography of the first and second regular wire layout
shapes and of the irregular wire layout shapes within the irregular
wire layout region.
[0011] In one embodiment, a computer readable storage medium is
disclosed to include a semiconductor chip layout recorded in a
digital format. The semiconductor chip layout includes irregular
layout shapes placed in a dynamic array architecture. Also in the
semiconductor chip layout, an irregular wire layout region within a
portion of a chip level layout is bracketed by a first regular wire
layout shape on a first side of the irregular wire layout region
and by a second regular wire layout shape on a second side of the
irregular wire layout region. The semiconductor chip layout further
includes one or more irregular wire layout shapes placed within the
irregular wire layout region. A first edge spacing is maintained
between the first regular wire layout shape and an outer irregular
wire layout shape within the irregular wire layout region nearest
to the first regular wire layout shape. A second edge spacing is
maintained between the second regular wire layout shape and an
outer irregular wire layout shape within the irregular wire layout
region nearest to the second regular wire layout shape. The first
and second edge spacings are defined to optimize lithography of the
first and second regular wire layout shapes and of the irregular
wire layout shapes within the irregular wire layout region.
[0012] In one embodiment, a method is disclosed for defining a
virtual grate for a layout of a portion of a semiconductor chip
level. The method includes an operation for identifying a preferred
routing direction for a portion of a given chip level. The method
also includes an operation for identifying each contact level
related to the portion of the given chip level. Each identified
contact level is defined by a respective related virtual grate
defined by a respective set of parallel virtual lines extending in
the preferred routing direction. Layout shapes within a given
contact level are placed in accordance with the respective related
virtual grate of the given contact level. The method further
includes an operation for defining a trial virtual grate for the
portion of the given chip level as a set of parallel virtual lines
extending in the preferred routing direction. The set of parallel
virtual lines of the trial virtual grate is defined to enable
required connections between layout shapes placed in accordance
with the trial virtual grate within the portion of the given chip
level and layout shapes within each identified contact level. The
method continues with an operation for determining whether a
perpendicular spacing between adjacent virtual lines of the trial
virtual grate provides for adequate lithographic reinforcement of
layout shapes to be placed in accordance with the trial virtual
grate. If the perpendicular spacing between adjacent virtual lines
of the trial virtual grate is determined adequate, the method
proceeds with recording the trial virtual grate as a final virtual
grate of the portion of the given chip level. However, if the
perpendicular spacing between adjacent virtual lines of the trial
virtual grate is determined inadequate, the method proceeds by
adjusting at least one related virtual grate of any identified
contact level and by repeating the method operations beginning with
the operation for defining a trial virtual grate for the portion of
the given chip level.
[0013] Other aspects and advantages of the invention will become
more apparent from the following detailed description, taken in
conjunction with the accompanying drawings, illustrating by way of
example the present invention.
BRIEF DESCRIPTION OF THE DRAWINGS
[0014] FIG. 1 shows an exemplary CMOS transistor configuration, in
accordance with one embodiment of the present invention;
[0015] FIG. 2A shows a flowchart of a method for defining a virtual
grate for a given chip level, or portion thereof, in accordance
with one embodiment of the present invention;
[0016] FIG. 2B shows virtual lines of a contact level virtual grate
which indicate preferred placement locations in one dimension for
contact level shapes, in accordance with one embodiment of the
present invention;
[0017] FIG. 3A shows a flowchart of a method for placement of
shapes such that the impact of using irregular wires in conjunction
with the dynamic array architecture may be minimized, and
re-alignment to a virtual grate occurs for regular shapes outside
of a layout region where there are irregular wires, in accordance
with one embodiment of the present invention;
[0018] FIG. 3B shows an exemplary layout defined in accordance with
the method of FIG. 3A in which one irregular wire is placed such
that a standard long edge-to-long edge spacing is used between one
long edge of the irregular wire and a facing edge thereto of an
adjacent and parallel regular wire, in accordance with one
embodiment of the present invention;
[0019] FIG. 3C shows an exemplary layout defined in accordance with
the method of FIG. 3A in which multiple irregular wires are placed
such that a standard long edge-to-long edge spacing is used between
one long edge of each of the irregular wires and a facing edge
thereto of an adjacent and parallel regular wire, in accordance
with one embodiment of the present invention;
[0020] FIG. 3D shows an exemplary layout defined in accordance with
the method of FIG. 3A in which optimal spacing between facing long
edges of adjacent regular and irregular wires and between facing
long edges of adjacent irregular wires within an irregular wire
layout region is based on minimization of differences between these
long edge-to-long edge spacings within the irregular wire layout
region, in accordance with one embodiment of the present
invention;
[0021] FIG. 3E shows an exemplary layout that demonstrates how
spacing variation can be reduced by increasing the number of
irregular wires within an irregular wire layout region, in
accordance with one embodiment of the present invention;
[0022] FIG. 3F shows a variant of the exemplary layout of FIG. 3B,
defined in accordance with the method of FIG. 3A, in which one
irregular wire is placed in conjunction with a sub-res wire within
the irregular wire layout region, in accordance with one embodiment
of the present invention;
[0023] FIG. 3G is an illustration showing a variant of the
exemplary layout of FIG. 3C, defined in accordance with the method
of FIG. 3A, in which two irregular wires are placed in conjunction
with a sub-res wire within the irregular wire layout region, in
accordance with one embodiment of the present invention;
[0024] FIG. 4 shows an exemplary layout for a diffusion level,
defined in accordance with the method of FIG. 3A, in accordance
with one embodiment of the present invention;
[0025] FIG. 5A shows an exemplary layout in which irregular wires
have non-standard widths, which may or may not be equal to each
other and which are smaller than a standard width for regular
wires, in accordance with one embodiment of the present
invention;
[0026] FIG. 5B shows an exemplary layout similar to that of FIG. 5A
except that irregular wires, having widths that are less than
standard width, are placed such that long edge-to-long edge spaces
associated with irregular wires are defined to be similar to each
other, but not necessarily equal to the standard spacing, in
accordance with one embodiment of the present invention;
[0027] FIG. 5C shows an exemplary layout with irregular wires
having widths that are less than a standard width, in accordance
with one embodiment of the present invention;
[0028] FIG. 6 shows an exemplary layout implementing a method to
reduce negative electrical or manufacturing influences between
layout shapes or layout regions by interposing other layout shapes
between them, in accordance with one embodiment of the present
invention;
[0029] FIG. 7 shows a variation of the exemplary layout of FIG. 6
in which protective sub-res shapes are placed in lieu of protective
regular wires, in accordance with one embodiment of the present
invention;
[0030] FIG. 8A shows an exemplary layout within which end gaps are
varied to improve manufacturability, in accordance with one
embodiment of the present invention;
[0031] FIG. 8B shows an exemplary layout in which long regular
wires are used to bound an irregular wire layout region, thereby
serving as protective layout shapes between the irregular wire
layout region and a surrounding layout area, in accordance with one
embodiment of the present invention;
[0032] FIG. 8C shows a variation of the exemplary layout of FIG.
8B, in which sub-res shapes are used in lieu of long regular wires,
in accordance with one embodiment of the present invention;
[0033] FIG. 8D shows a layout region immediately adjacent to a long
edge of a linear layout shape, in accordance with one embodiment of
the present invention;
[0034] FIG. 8E shows an exemplary layout in which regular wires of
standard width are defined within a layout region, in accordance
with one embodiment of the present invention;
[0035] FIG. 8F shows an exemplary layout that includes a
symmetrical arrangement of irregular wires, in accordance with one
embodiment of the present invention;
[0036] FIG. 8G shows a variation of the exemplary layout of FIG. 8F
in which a layout shape is inserted between symmetrically arranged
irregular wires, in accordance with one embodiment of the present
invention;
[0037] FIG. 8H shows an exemplary layout in which irregular wires
are arranged in an array defined by four layout shape columns and
one layout shape row, in accordance with one embodiment of the
present invention;
[0038] FIG. 9A shows an exemplary layout illustrating a method to
reduce spacing variation by modifying one or more irregular wire
widths such that long edge-to-long edge spacing after placement is
satisfactory, in accordance with one embodiment of the present
invention;
[0039] FIG. 9B shows an exemplary layout in which two irregular
wires are successively placed between regular wires, in accordance
with one embodiment of the present invention;
[0040] FIG. 9C shows an exemplary layout in which irregular shapes
are placed between regular wires, in accordance with one embodiment
of the present invention;
[0041] FIG. 10A shows an exemplary layout in which an irregular
wire is placed such that its centerline is coincident with a
virtual grate line, in accordance with one embodiment of the
present invention;
[0042] FIG. 10B shows a variation of the exemplary layout of FIG.
10A in which the irregular wire is moved up to a virtual grate
line, and a regular wire is moved up to another virtual grate line,
in accordance with one embodiment of the present invention; and
[0043] FIG. 10C shows a variation of the exemplary layout of FIG.
10A in which layout shapes are inserted in long edge spaces on each
side of the irregular wire, in accordance with one embodiment of
the present invention.
DETAILED DESCRIPTION
[0044] In the following description, numerous specific details are
set forth in order to provide a thorough understanding of the
present invention. It will be apparent, however, to one skilled in
the art that the present invention may be practiced without some or
all of these specific details. In other instances, well known
process operations have not been described in detail in order not
to unnecessarily obscure the present invention.
Dynamic Array Architecture
[0045] The dynamic array architecture represents a semiconductor
device design paradigm in which linear-shaped layout features are
defined along a regular-spaced virtual grate (or regular-spaced
virtual grid) in a number of levels of a cell, i.e., in a number of
levels of a semiconductor chip. The virtual grate is defined by a
set of equally spaced, parallel virtual lines extending across a
given level in a given chip area. The virtual grid is defined by a
first set of equally spaced, parallel virtual lines extending
across a given level in a given chip area in a first direction, and
by a second set of equally spaced, parallel virtual lines extending
across the given level in the given chip area in a second
direction, where the second direction is perpendicular to the first
direction. In one embodiment, the virtual grate of a given level is
oriented to be substantially perpendicular to the virtual grate of
an adjacent level. However, in other embodiments, the virtual grate
of a given level is oriented to be either perpendicular or parallel
to the virtual grate of an adjacent level.
[0046] In one embodiment, each linear-shaped layout feature of a
given level is substantially centered upon one of the virtual lines
of the virtual grate associated with the given level. A
linear-shaped layout feature is considered to be substantially
centered upon a particular line of a virtual grate when a deviation
in alignment between of the centerline of the linear-shaped layout
feature and the particular line of the virtual grate is
sufficiently small so as to not reduce a manufacturing process
window from what would be achievable with a true alignment between
of the centerline of the linear-shaped layout feature and the line
of the virtual grate.
[0047] In one embodiment, the above-mentioned manufacturing process
window is defined by a lithographic domain of focus and exposure
that yields an acceptable fidelity of the layout feature. In one
embodiment, the fidelity of a layout feature is defined by a
characteristic dimension of the layout feature. Also, it should be
understood that the centerline of a given linear-shaped layout
feature is defined as a virtual line that passes through the
cross-sectional centroid of the linear-shaped layout feature at all
points along its length, wherein the cross-sectional centroid of
the linear-shaped layout feature at any given point along its
length is the centroid of its vertical cross-section area at the
given point.
[0048] In another embodiment, some linear-shaped layout features in
a given level may not be centered upon a virtual line of the
virtual grate associated with the given level. However, in this
embodiment, the linear-shaped layout features remain parallel to
the virtual lines of the virtual grate, and hence parallel to the
other linear-shaped layout features in the given level. Therefore,
it should be understood that the various linear-shaped layout
features defined in a layout of a given level are oriented to
extend across the given level in a parallel manner.
[0049] Also, in the dynamic array architecture, in one embodiment,
each linear-shaped layout feature is defined to be devoid of a
substantial change in direction along its length. The lack of
substantial change in direction of a linear-shaped layout feature
is considered relative to the line of the virtual grate along which
the linear-shaped layout feature is defined. In one embodiment, a
substantial change in direction of a linear-shaped layout feature
exists when the width of the linear-shaped layout feature at any
point thereon changes by more than 50% of the nominal width of the
linear-shaped layout feature along its entire length. In another
embodiment, a substantial change in direction of a linear-shaped
layout feature exists when the width of the linear-shaped layout
feature changes from any first location on the linear-shaped layout
feature to any second location on the linear-shaped layout feature
by more that 50% of the linear-shaped layout feature width at the
first location. Therefore, it should be appreciated that the
dynamic array architecture specifically avoids the use of
non-linear-shaped layout features, wherein a non-linear-shaped
layout feature includes one or more bends within a plane of the
associated level.
[0050] In the dynamic array architecture, variations in a vertical
cross-section shape of an as-fabricated linear-shaped layout
feature can be tolerated to an extent, so long as the variation in
the vertical cross-section shape is predictable from a
manufacturing perspective and does not adversely impact the
manufacture of the given linear-shaped layout feature or its
neighboring layout features. In this regard, the vertical
cross-section shape corresponds to a cut of the as-fabricated
linear-shaped layout feature in a plane perpendicular to the
centerline of the linear-shaped layout feature. It should be
appreciated that variation in the vertical cross-section of an
as-fabricated linear-shaped layout feature along its length can
correspond to a variation in width along its length. Therefore, the
dynamic array architecture also accommodates variation in the width
of an as-fabricated linear-shaped layout feature along its length,
so long as the width variation is predictable from a manufacturing
perspective and does not adversely impact the manufacture of the
linear-shaped layout feature or its neighboring layout
features.
[0051] Additionally, different linear-shaped layout features within
a given level can be designed to have the same width or different
widths. Also, the widths of a number of linear-shaped layout
features defined along adjacent lines of a given virtual grate can
be designed such that the number of linear-shaped layout features
contact each other so as to form a single linear-shaped layout
feature having a width equal to the sum of the widths of the number
of linear-shaped layout features.
[0052] Within a given level defined according to the dynamic array
architecture, proximate ends of adjacent, co-aligned linear-shaped
layout features may be separated from each other by a substantially
uniform gap. More specifically, adjacent ends of linear-shaped
layout features defined along a common line of a virtual grate are
separated by an end gap, and such end gaps within the level
associated with the virtual grate may be defined to span a
substantially uniform distance. Additionally, in one embodiment, a
size of the end gaps is minimized within a manufacturing process
capability so as to optimize filling of a given level with
linear-shaped layout features.
[0053] Also, in the dynamic array architecture, a level can be
defined to have any number of virtual grate lines occupied by any
number of linear-shaped layout features. In one example, a given
level can be defined such that all lines of its virtual grate are
occupied by at least one linear-shaped layout feature. In another
example, a given level can be defined such that some lines of its
virtual grate are occupied by at least one linear-shaped layout
feature, and other lines of its virtual grate are vacant, i.e., not
occupied by any linear-shaped layout features. Furthermore, in a
given level, any number of successively adjacent virtual grate
lines can be left vacant. Also, the occupancy versus vacancy of
virtual grate lines by linear-shaped layout features in a given
level may be defined according to a pattern or repeating pattern
across the given level.
[0054] Additionally, within the dynamic array architecture, vias
and contacts are defined to interconnect a number of the
linear-shaped layout features in various levels so as to form a
number of functional electronic devices, e.g., transistors, and
electronic circuits. Layout features for the vias and contacts can
be aligned to a virtual grid, wherein a specification of this
virtual grid is a function of the specifications of the virtual
grates associated with the various levels to which the vias and
contacts will connect. Thus, a number of the linear-shaped layout
features in various levels form functional components of an
electronic circuit. Additionally, some of the linear-shaped layout
features within various levels may be non-functional with respect
to an electronic circuit, but are manufactured nonetheless so as to
reinforce manufacturing of neighboring linear-shaped layout
features. It should be understood that the dynamic array
architecture is defined to enable accurate prediction of
semiconductor device manufacturability with a high probability.
[0055] In view of the foregoing, it should be understood that the
dynamic array architecture is defined by placement of linear-shaped
layout features on a regular-spaced grate (or regular-spaced grid)
in a number of levels of a cell, such that linear-shaped layout
features in a given level of the cell are oriented to be
substantially parallel with each other in their traversal direction
across the cell. Also, in one embodiment of the dynamic array
architecture, prior to process compensation technique (PCT)
processing, each linear-shaped layout feature is defined to be
devoid of a substantial change in direction relative to its
traversal direction.
Nomenclature
[0056] In the figures and text herein, certain naming conventions
are applied as follows: [0057] VG: virtual grate; [0058] VG lines:
virtual lines of a virtual grate; [0059] Wire: a linear shaped
layout feature on a given level with a centerline parallel to a VG
line of the given level and region thereof under consideration;
[0060] Conductive layout feature: a layout shape on a level such as
active, gate electrode, local interconnect, metal (interconnect)
level, or other level that may be conductive and is not a contact
or via level; [0061] Long edge: a linear shaped layout feature's
edge that is oriented parallel to VG lines of the level in which
the linear shaped layout feature is defined, regardless of the
aspect ratio of the linear shaped layout feature; [0062] Line end:
a linear shaped layout feature edge that is oriented orthogonal
(perpendicular) to VG lines for the level in which the linear
shaped layout feature is defined; [0063] End gap: a space between
line ends of linear shaped layout features placed line end-to-line
end; [0064] Parallel wires: wires having parallel long edges and
offset centerlines; [0065] Width: a wire dimension orthogonal to
the VG line upon which the wire is placed; [0066] Regular wires: a
number of wires of common width placed according to a VG of a given
level; [0067] Standard gap (standard spacing): a distance measured
perpendicularly between facing long edges of adjacent and parallel
regular wires; [0068] Irregular wire: a wire in a given level that
does not have the common width of other regular wires in the given
level or that is not centered on a VG line of the given level;
[0069] Irregular spacing: a distance measured perpendicularly
between long edges of wires that is not equal to the standard gap
(standard spacing); [0070] Spacing variation: a difference between
irregular spacing and standard gap (standard spacing). In one
embodiment, spacing variation may be defined as a maximum spacing
variation within an area of a given level. In another embodiment,
spacing variation may be defined as an average value within an area
of a given level. In another embodiment, spacing variation may be
defined based on a single instance of irregular spacing; [0071]
Sub-resolution (sub-res) shape: a shape that is drawn but
intentionally not manufactured due to having one or more dimensions
below the resolution capability of a manufacturing system. For
example, at least one dimension (length or width, etc.) of the
sub-res shape may be small enough to guarantee that the sub-res
shape will not be resolved as a manufactured feature, even when the
sub-res shape is placed in compliance with normal edge spacing
constraints relative to other layout shapes; [0072] Gate: a gate
electrode feature defined as part of a transistor; [0073] Irregular
wire layout region: a layout region bounded by regular wires within
which one or more irregular wires are placed.
Exemplary Embodiments
[0074] In one embodiment, a layout defined in accordance with the
dynamic array architecture may include the following attributes: 1)
shapes are rectangular, i.e., linear-shaped, 2) wire and contact
pitch is substantially constant in a direction orthogonal to
routing, 3) wire width is substantially constant, 4) side-to-side
and end-of-line wire spacings are substantially constant, 5)
overall shape density is as uniform as possible, and 6) the
proximity of gaps in wires to other wire shapes is managed to avoid
lithographic disturbance. It should be understood, however, that in
some embodiments, a layout defined in accordance with the dynamic
array architecture may not include all of the attributes associated
with the above-mentioned embodiment. Methods and techniques are
disclosed herein for enhancing layout in situations where
particular layout areas or layout shapes do not strictly follow the
dynamic array architecture but are contained within a layout that
substantially follows the dynamic array architecture.
[0075] An exemplary CMOS transistor configuration is shown in FIG.
1. Gate electrode (gate) wires 160-162 each have a different width
W2 in comparison to a standard width W1 of gate wires 110-118. Gate
wires 110-117 and 160-162 form gate electrodes of transistors where
they overlap with active shapes 120-122. Gate level wire 118 is an
example of a wire on a gate electrode level that does not traverse
an active level and is not used to form a gate electrode. Source or
drain contact shapes such as 140-142 and gate contacts such as 143
and 144 are indicated as examples of shapes on the contact (CON)
level.
[0076] Each gate electrode is defined to extend beyond the edges of
its underlying active region. Each portion of a gate electrode that
extends beyond an edge of its underlying active region is referred
to as an overlap portion of the gate electrode. A traversal
direction of a gate electrode relative to its underlying active
region is defined as a direction that extends between the overlap
portions of the gate electrode and that is perpendicular to the
edges of the underlying active region beyond which the overlap
portions of the gate electrode extend. For example, considering
gate electrode feature 114, overlapping portions 114A and 114B
extend beyond active region edges 121A and 121B, respectively.
Therefore, arrow 170 represents the traversal direction of gate
electrode 114, as arrow 170 extends between the overlap portions
114A and 114B of the gate electrode 114 and is perpendicular to the
edges 121A and 121B of the underlying active region 121 beyond
which the overlap portions 114A and 114B of the gate electrode 114
extend.
[0077] Gate dimensions which run perpendicular to the traversal
direction of the gate over its underlying active region, such as W1
and W2, are referred to as gate channel lengths. Use of multiple
gate channel lengths in a given level represents one of many cases
in which multiple values for a given type of dimension, e.g.,
width, can be applied to different layout shapes on a given level.
This invention applies to any level in which non-standard shape
dimensions may occur, wherein a given shape dimension is considered
non-standard in a given level when a value of the given shape
dimension varies among layout features in the given level. For ease
of discussion, the principles of the present invention are
described herein with respect to a gate level in various exemplary
embodiments. However, it should be understood that the principles
of the present invention as referenced to a gate level in the
exemplary embodiments herein can be equally applied to any chip
level. For example, the principles of the present invention can be
equally applied to an active level, a local interconnect level, a
metal (interconnect) level, a contact level, a via level, or
essentially any other chip level.
[0078] Also shown in FIG. 1 are lines 100-103 of a virtual grate
(VG) for the gate level. The virtual lines 100-103 are spaced apart
from each other by a constant line-to-line pitch P1. FIG. 2A is an
illustration showing a flowchart of one method for defining a VG
for a given chip level, or portion thereof, referred to as the
given level hereafter. The method includes an operation 201 for
identifying a preferred routing direction for the given level. The
method also includes an operation 203 for identifying each related
contact level, wherein a related contact level includes at least
one shape that is to make contact with a shape in the given level.
Virtual lines of a contact level VG indicate preferred placement
locations in one dimension for contact level shapes, even if
contact level shapes are not present on every virtual line of the
contact level VG in a layout under consideration. An example of
this may be seen in FIG. 2B, where a VG for gate CON shapes
includes virtual lines 181, 183, 185, and 187. The example of FIG.
2B shows gate CON shapes 142 and 143 present on VG lines 183 and
187, and no gate CON shapes present on the other VG lines 181 and
185 for the gate CON level.
[0079] The method described in FIG. 2A also includes an operation
207 for defining the VG for the given level as a set of evenly
spaced virtual lines that represent centerline locations of wires
to be placed on the given level. The VG for the given level is
defined such that a number of its virtual lines coincide with
virtual lines of the contact level VG, such that wires placed in
the given level according to the VG of the given level can provide
sufficient coverage of contacts placed according to the contact
level VG lines, wherein the contact level VG lines are commonly
oriented with the VG lines of the given level and hence with the
routing direction of wire placed in the given level. In FIG. 2B, a
VG for source/drain CON shapes 140, 141, and 144 includes virtual
lines 180, 182, 184, 186, and 188. It should be appreciated that
source/drain CON shapes 140, 141, and 144 are electrically
connected to active region 120. A VG for MET1 level shapes 170-178
includes VG lines 180-188. Because the MET1 level shapes are
related (i.e., connect) to the source/drain CON shapes (140, 141,
144) and/or to the gate CON shapes (142, 143), the VG for the MET1
level includes both the virtual lines (181, 183, 185, 187) of the
gate CON VG, and the virtual lines (180, 182, 184, 186, 188) of the
source/drain CON VG. A VG for gate level shapes 200-203 includes VG
lines 181, 183. 185, and 187. Because the gate level shapes
(200-203) are related (i.e., connect) to the gate CON shapes (142,
143), the VG for the gate level includes the virtual lines (181,
183, 185, 187) of the gate CON VG. As shown in FIG. 2B, the VG for
the gate level is defined by parallel virtual lines (181, 183, 185,
187) spaced at a line-to-line pitch P1.
[0080] The method of FIG. 2A further includes an operation 209 for
determining whether or not the line-to-line spacing of the VG for
the given level allows for enforcement of the dynamic array
architecture within the given level so as to ensure optimal
manufacturability of shapes in the given level. Examples of
sub-optimal VG pitches include, but are not limited to: 1) a VG
pitch that may be too large for shapes placed in accordance
therewith to provide sufficient lithographic reinforcing benefits
to each other, or 2) a VG pitch that may be too small to identify
shape placements in accordance therewith, such that shapes are
sufficiently regularly spaced and/or such that shapes are
positioned for optimal lithography or manufacturing. If the VG
pitch for the given level is acceptable, the method proceeds with
an operation 214 in which the VG is recorded on a data storage
device 216. However, if the VG pitch for the given level is NOT
acceptable, the method proceeds with an operation 213. In operation
213, an adjustment is made to the VG of one or more of the related
contact levels as previously identified in operation 203. Following
operation 213, the method reverts back to operation 207.
[0081] With reference back to the exemplary embodiment of FIG. 1,
each space SS between the long edges of neighboring gate wires
110-118 and 160-162 is substantially equivalent. Such consistency
in long edge-to-long edge spacing may be beneficial to
manufacturing results. However, since the widths W1 and W2 of the
gate wires are not equal, use of the substantially equivalent long
edge-to-long edge spacing SS causes some gate wire centerlines to
be placed off of the virtual lines 100-103 of the gate level VG.
For example, centerlines of shape 160 (having the non-standard
width W2) and shapes 115 and 116 therebelow are not aligned with
the VG lines 101-103, respectively. Similarly, in this example,
centerlines of shape 161 (having the non-standard width W2) and
shapes 102 and 103 therebelow are not aligned with the VG lines
101-103, respectively. Therefore, in this embodiment, gate wire
shapes below VG line 100 are not placed so as to have their
respective centerlines align with a VG, and consequently do not
comply with the dynamic array architecture attribute regarding
placement of linear features according to a VG within a given
layout area, wherein the VG is defined by a set of parallel virtual
lines spaced according to a substantially constant line-to-line
pitch. Additionally, because the gate wire shapes below VG line 100
do not comply with the dynamic array architecture attribute
regarding placement of linear features according to a VG within a
given layout area, definition of the gate wire shapes below VG line
100 may not be optimal for manufacturing or layout efficiency.
[0082] FIG. 3A is an illustration showing a flowchart of a method
for placement of shapes such that the impact of using irregular
wires in conjunction with the dynamic array architecture may be
minimized, and re-alignment to a VG occurs for regular shapes
outside of a layout region where there are irregular wires. The
method includes an operation 3A01 in which a first irregular wire
is placed next to a first regular wire. It should be understood
that numerical designations used for particular wires, e.g.,
"first" irregular wire, "first" regular wire, etc., do not denote
absolute wire position within a layout, but rather are used to
differentiate between wires. Determination of the distance between
facing long edges of the first irregular wire and the first regular
wire may be based on one or more of the following considerations:
1) making such a distance substantially equivalent to a standard
distance between adjacent facing long edges of regular wires, 2)
providing sufficient room for a dummy shape or a sub-res shape to
be inserted between the first irregular wire and the first regular
wire, 3) using a distance that enables even spacing between
centerlines of irregular wires within the irregular wire layout
region, 4) using a distance that enables even spacing between
facing long edges of adjacently placed irregular wires within the
irregular wire layout region, 5) forcing irregular wires to be
centered on a VG line, or 6) enabling some other desired spacing
pattern for layout shapes within the irregular wire layout region,
among others. The first irregular wire may belong to a group of N
irregular wires that are parallel and adjacent, or it may be a
solitary irregular wire with regular wires placed parallel and
adjacent to both long edges of the solitary irregular wire. It
should be understood that in the case of a solitary wire placed
within the irregular wire layout region (N=1), the first and last
irregular wire mentioned in the method of FIG. 3A refer to the same
irregular wire.
[0083] The method also includes an operation 3A02 in which a
calculation is made of a number of VG routing lines within the
distance required to fit all remaining irregular wires parallel to
the first irregular wire. In one embodiment, the calculation of
operation 3A02 takes into account the space required to allow a
regular wire to be placed on a VG line beyond the area with
irregular wires. The method also includes an operation 3A03 in
which a second regular wire is placed with it's centerline
co-linear with a first available VG line beyond the VG line
required to place the N-th irregular shape, as calculated in
operation 3A02. In the decision operation 3A05, if the number of
parallel irregular wires is greater than one (N>1), the method
continues with an operation 3A07.
[0084] In the operation 3A07, a last irregular wire is placed
adjacent (albeit spaced apart from) and parallel to the second
regular wire. Determination of the distance between facing long
edges of last irregular wire and second regular wire may be based
on placement considerations for the irregular wire such as those
considerations described for operation 3A01. The method continues
with an operation 3A09 in which all other irregular wires between
the first and last irregular wires are placed. Operation 3A09 may
involve placement considerations similar to those described for
operation 3A01.
[0085] From the operation 3A09, the method proceeds with an
operation 3A11. Also, with reference back to the decision operation
3A05, if the number of parallel irregular wires is one (N=1), the
method proceeds to operation 3A11. In the operation 3A11, an
evaluation is made regarding the use of sub-res shapes, which may
provide lithographic reinforcement to shapes in their vicinity,
thereby resulting in improved manufacturing results. If the
evaluation of operation 3A11 determines that sub-res shapes are not
to be used, the method proceeds with an operation 3A14 for
recording the layout on the data storage device 216. If the
evaluation of operation 3A11 determines that sub-res shapes are to
be used, the method proceeds to an operation 3A13, in which sub-res
shapes are formed and placed. Sub-res shape formation is the
determination of the polygonal outline of a sub-res shape. Sub-res
shape placement may be in spaces adjacent to long edges of
irregular or regular wires and may be influenced by considerations
for optimal spacing, as described in conjunction with operation
3A01. Following the completion of operation 3A13, the method
proceeds with the operation 3A14 for recording the layout on the
data storage device 216.
[0086] It should be understood that for parallel and adjacent
placement of more than one successive irregular wire, the method
described in FIG. 3A has an operational order that provides for
regular wire bracketing of the region of irregular wires, prior to
placement of multiple irregular wires. This operational order
facilitates calculation of where to place the last irregular wire
(operation 3A07), and other irregular wires between the first and
last irregular wires. In addition to the foregoing, however, it
should be understood that the various operations of the method of
FIG. 3A may be performed in a non-sequential order in some
embodiments. Additionally, it should be understood that the method
of FIG. 3A represents one exemplary method for achieving the layout
features and principles illustrated in the figures herein. It
should be appreciated that other methods, including variants of the
method of FIG. 3A, may be utilized to achieve the layout features
and principles illustrated in the figures herein. Moreover, it
should be understood that the methods described herein and the
layouts defined in accordance with those methods are not restricted
to a particular VG or to a particular wire routing direction.
Specifically, the methods described herein can be applied to a
layout region of any chip level and can be implemented using either
a vertically oriented VG or a horizontally oriented VG.
[0087] In one embodiment, an optimal spacing between facing long
edges of a regular wire and an irregular wire, or between facing
long edges of two adjacent irregular wires, is determined by
maximizing the number of times that these long edge-to-long edge
spacings are equal to a standard spacing. In this embodiment, the
standard spacing is defined as a distance measured perpendicularly
between facing long edges of adjacent and parallel regular
wires.
[0088] FIG. 3B is an illustration showing an exemplary layout
defined in accordance with the method of FIG. 3A in which one
irregular wire 360 is placed (N=1) such that a standard long
edge-to-long edge spacing SS is used between one long edge of the
irregular wire and a facing edge thereto of an adjacent and
parallel regular wire 320. In the exemplary layout of FIG. 3B, each
of regular wires 310-314, 320, 323, and 324 having width W1 is
placed in a centered manner on a respective virtual line 300-304 of
a VG. Adjacent virtual lines 300-304 of the VG are spaced at a
substantially constant pitch P1. The single irregular wire 360 has
a width W2 and is placed such that the spacing from a first of its
long edges to the facing long edge of the parallel and adjacent
regular wire 320 is set to the standard spacing SS. As a result,
the distance between a second long edge of the irregular wire 360
(opposite to the first long edge) and a facing long edge thereto of
the adjacent and parallel regular wire 323 may be non-standard, as
illustrated by non-standard spacing S3B1 in FIG. 3B. A spacing
variation (SV3B) in this example is defined as a difference between
the non-standard spacing S3B1 and the standard spacing SS, i.e.,
SV3B=S3B1-SS.
[0089] In FIG. 3B, regular wire 323 and regular wires below it,
such as regular wire 324, are centered on a VG virtual line. In
other words, regular wires can be re-aligned to the VG beyond the
irregular wire layout region within which the irregular wires are
placed. Also, re-alignment of regular wires to the VG may commence
at a first virtual line instance of the VG that is a sufficient
distance away from an outer irregular wire, wherein the outer
irregular wire is peripherally placed within the irregular wire
layout region. If the irregular wire layout region contains one
irregular wire, then the one irregular wire is considered a
peripherally placed irregular wire, and hence an outer irregular
wire. If the irregular wire layout region contains two irregular
wires, then each of the two irregular wires is considered a
peripherally placed irregular wire, and hence an outer irregular
wire. Additionally, if the irregular wire layout region includes
three or more irregular wires, numbered in an adjacent sequential
manner as irregular wire one through irregular wire N, then each of
irregular wire one and irregular wire N is considered a
peripherally placed irregular wire, and hence an outer irregular
wire. Moreover, a sufficiency of the distance away from the outer
irregular wire at which re-alignment of regular wires to the VG may
commence can be evaluated based on whether both the outer irregular
wire and the regular wire adjacent thereto are within an applicable
manufacturing process window as defined by a lithographic domain of
focus and exposure that yields an acceptable fidelity of both the
outer irregular wire and the regular wire adjacent thereto. Based
on the example of FIG. 3B, and other examples described hereafter,
is should be appreciated that the method of FIG. 3A provides a
beneficial effect of limiting a size of the irregular wire layout
region within a given level.
[0090] As shown in FIG. 3B, line ends of shapes on different VG
lines may or may not be aligned. For example, line ends of wires
311 and 312 are not aligned, but line ends of wires 313 and 314 are
aligned. Furthermore, a distance between facing line ends of wires
which overlie a common virtual line of the VG, i.e., end gap, may
or may not be constant. For example, an end gap LE3B1 between
facing line ends of wires 310 and 320 is different than an end gap
LE3B2 between facing line ends of wires 311 and 360. It should be
understood that unless otherwise specified, end gaps and alignments
between line ends of adjacent parallel wires, as illustrated in the
embodiments herein, are provided by way of example and do not imply
a restriction on end gaps or line end alignments. Also, it should
be understood that unless otherwise specified, irregular wire
widths as illustrated in the exemplary embodiments herein do not
imply a restriction or requirement with regard to irregular wire
widths or relationships therebetween.
[0091] FIG. 3C is an illustration showing an exemplary layout
defined in accordance with the method of FIG. 3A in which multiple
irregular wires 360 and 362 (N>1) are placed such that a
standard long edge-to-long edge spacing SS is used between one long
edge of each of the irregular wires 360 and 362 and a facing edge
thereto of an adjacent and parallel regular wire 320 and 324,
respectively. Thus, the exemplary layout of FIG. 3C has a standard
gap SS between long edges of first and last irregular wires 360 and
362 and facing long edges of regular wires 320 and 324,
respectively. In FIG. 3C, the two irregular wires 360 and 362 (N=2)
have irregular widths W2 and W3, respectively. Use of the standard
gap SS outboard of both the first and last irregular wires 360 and
362 with N=2 results in only one irregular spacing S3F1 and a
spacing variation SV3F=S3F1-SS.
[0092] In one embodiment, optimal spacing between facing long edges
of adjacent regular and irregular wires and/or between facing long
edges of adjacent irregular wires within an irregular wire layout
region is based on minimization of differences between these long
edge-to-long edge spacings within the irregular wire layout region.
FIG. 3D is an illustration showing an exemplary layout defined in
accordance with the method of FIG. 3A in which optimal spacing
between facing long edges of adjacent regular and irregular wires
and between facing long edges of adjacent irregular wires within an
irregular wire layout region is based on minimization of
differences between these long edge-to-long edge spacings within
the irregular wire layout region. In the exemplary layout of FIG.
3D, the long edges of wires 360 and 362 are separated from facing
long edges of regular wires 320 and 324, respectively, by spacings
S3G1 and S3G3, which is not equal to the standard spacing SS. This
forces a reduction in a space S3G2 between irregular wires 360 and
362, as compared to the corresponding spacing S3F1 between
irregular wires 360 and 362 in FIG. 3C. It is possible to make each
of long edge-to-long edge spacings S3G1, S3G2, and S3G3 more
similar to the standard spacing SS than long edge-to-long edge
spacing S3F1 from FIG. 3C.
[0093] FIG. 3D illustrates how a maximum spacing variation SV3G for
the irregular wire layout region may be reduced by minimizing
differences between the long edge-to-long edge spacings within the
irregular wire layout region, wherein SV3G=MAX(S3G1,S3G2,S3G3)-SS.
Generally speaking, maximum spacing variation within an irregular
wire layout region is minimized when long edge-to-long edge
spacings within the irregular wire layout region are equalized. For
example, in the embodiment of FIG. 3D, the maximum spacing
variation SV3G within the irregular wire layout region is minimized
when long edge-to-long edge spacings within the irregular wire
layout region are equal, i.e., when S3G1=S3G2=S3G3. It should be
appreciated that reduction of maximum or average spacing variation
in an irregular wire layout region may be beneficial to
manufacturing.
[0094] In another embodiment, optimal definition and placement of
irregular wires within an irregular wire layout region may require
that a spacing between facing long edges of adjacent regular and
irregular wires and/or between facing long edges of adjacent
irregular wires within the irregular wire layout region be based on
criteria other than minimization of differences between the long
edge-to-long edge spacings within the irregular wire layout region.
Consequently, optimal definition and placement of irregular wires
within an irregular wire layout region may require that a number of
long edge-to-long edge spacings within the irregular wire layout
region be intentionally defined different from a standard long
edge-to-long edge spacing. For example, due to non-standard widths
of irregular wires or other considerations, the optimum spacing
between a long edge of an irregular wire and a facing long edge of
an adjacent wire (regular or irregular) may not be the same as the
standard spacing between facing long edges of two adjacent regular
wires. For example, in the embodiment of FIG. 3D, the optimum long
edge-to-long edge spacings S3G1, S3G2, S3G3 within the irregular
wire layout region may be set according to irregular wire spacing
optimization criteria other than minimization of the maximum
spacing variation SV3G within the irregular wire layout region.
[0095] In one embodiment, spacing variation may be reduced by
increasing the number N of parallel and adjacently placed irregular
wires within the irregular wire layout region. Increasing the
number N of irregular wires may reduce spacing variation for
certain values of irregular wire width and long edge-to-long edge
wire spacing within the irregular wire layout region, including
spacings between facing long edges of adjacent regular and
irregular wires and between facing long edges of adjacent irregular
wires within the irregular wire layout region. A long edge-to-long
edge spacing adjustment to be applied across an irregular wire
layout region, to enable centering of two regular wires on
respective virtual lines of the VG bordering the irregular wire
layout region, can be shared among more long edge-to-long edge wire
spaces within the irregular wire layout region when the number N of
irregular wires is increased. Therefore, increasing the number N of
irregular wires within the irregular wire layout region may reduce
a magnitude of individual wire spacing adjustment within the
irregular wire layout region that is necessary to minimize spacing
variation.
[0096] FIG. 3E is an illustration showing an exemplary layout that
demonstrates how spacing variation can be reduced by increasing the
number N of irregular wires within an irregular wire layout region.
Irregular wires 360-362 are placed in a first irregular wire layout
region within which an equal long edge-to-long edge wire spacing
S3J1 is utilized. Irregular wires 370-371 are placed in a second
irregular wire layout region within with an equal long edge-to-long
edge wire spacing S3J2 is utilized. In the exemplary layout of FIG.
3E, each of irregular wires 360-362 and 370-371 has a width W2.
Equal irregular wire spacings (S3J1 and S3J2, respectively) and
equal irregular wire width (W2) are utilized in the exemplary
layout of FIG. 3E for ease of description. However, it should be
understood that use of an equal irregular wire spacing and use of
an equal irregular wire width is not a pre-requisite for
implementing the embodiment in which spacing variation is reduced
by increasing the number N of irregular wires within an irregular
wire layout region.
[0097] A term NVG is defined as a number of virtual lines of the VG
that are located between the two regular wires which bound the
irregular wire layout region. For the first irregular wire region
including irregular wires 360-362, NVG equals 4 and includes
virtual lines 301-304. For the second irregular wire region
including irregular wires 370-371, NVG equals 3 and includes
virtual lines 301-303. In the example of FIG. 3E, a standard
spacing SS between regular wires is defined as SS=P1-W1, wherein P1
is the VG pitch and W1 is a width of the regular wires (310-315,
320, 325, 330, 334). For each irregular wire layout region,
irregular spacing S3Jn=((NVGn+1)*P1-W1-Nn*W2)/(Nn+1), wherein (n)
identifies the irregular wire layout region. For the first
irregular wire layout region (n=1) including irregular wires
360-362, N1=3 and NVG1=4, thereby yielding irregular spacing
S3J1=(5P1-W1-3*W2)/4. For the second irregular wire layout region
(n=2) including wires 370-371, N2=2 and NVG2=3, thereby yielding
irregular spacing S3J2=(3P1-W1-2*W2)/3. For discussion purposes
consider that W2=2*W1 and P1=3*W1. Then, SS=2*W1, S3J1=2*W1, and
S3J2, (4/3)*W1. For the first irregular wire layout region, spacing
variation SVR1=SS-S3J1=0. For the second irregular wire layout
region, spacing variation SVR2=SS-S3J2, (2/3)*W1. Therefore, the
exemplary layout of FIG. 3E demonstrates how an increase in the
number N of irregular wires within an irregular wire layout region
serves to reduce spacing variation.
[0098] FIG. 3F is an illustration showing a variant of the
exemplary layout of FIG. 3B, defined in accordance with the method
of FIG. 3A, in which one irregular wire 360 is placed (N=1) in
conjunction with a sub-res wire 390 within the irregular wire
layout region. The sub-res wire 390 is defined to have a width SRW,
and is placed between irregular wire 360 and regular wire 323. Use
of the sub-res wire 390 eliminates the large wire spacing S3B1, as
shown in FIG. 3B, and introduces smaller wire spacings S3D1 and
S3D2. It should be noted that as compared to wire spacing S3B1,
both of wire spacings S3D1 and S3D2 are closer to the standard
spacing SS. Therefore, use of the sub-res wire 390 improves on the
embodiment described in FIG. 3B in that spacing variation is
reduced, which may be beneficial to manufacturing.
[0099] FIG. 3G is an illustration showing a variant of the
exemplary layout of FIG. 3C, defined in accordance with the method
of FIG. 3A, in which two irregular wires 360 and 362 are placed
(N=2) in conjunction with a sub-res wire 391 within the irregular
wire layout region. The sub-res wire 391 is defined to have a width
SRW, and is placed between irregular wire 360 and irregular wire
362. Use of the sub-res wire 391 eliminates the large wire spacing
S3F1, as shown in FIG. 3C, and introduces smaller wire spacings
S3E2 and S3E3. It should be noted that as compared to wire spacing
S3F1, both of wire spacings S3E2 and S3E3 are closer to the
standard spacing SS. Therefore, use of the sub-res wire 391
improves on the embodiment described in FIG. 3C in that spacing
variation is reduced, which may be beneficial to manufacturing.
[0100] It should be understood that the methods and layout
techniques disclosed herein can be applied to any chip level. FIG.
4 shows an exemplary layout for a diffusion level, defined in
accordance with the method of FIG. 3A. In one embodiment, layout
shapes shown in FIG. 4 correspond to doped silicon regions, and may
be referred to as active shapes or diffusion shapes. A VG for the
diffusion level is defined by virtual lines 400-404. A number of
regular diffusion shapes 410-414, 420, 424, 430, and 434 are
defined to have standard width W41, and are placed with a standard
spacing S40. Irregular diffusion shape 460 of width W42 is placed
such that the standard spacing S40 exists between its outboard long
edge and a facing long edge of adjacent regular diffusion shape
420. In one embodiment, a vacant irregular spacing S44 exists
between facing long edge of irregular diffusion shape 460 and
regular diffusion shape 424. In another embodiment, a sub-res shape
430 is inserted between irregular diffusion shape 460 and regular
diffusion shape 424, resulting in irregular spacings S41 and S42.
As compared to irregular spacing S44, irregular spacings S41 and
S42 may be more similar to standard spacing SS, thereby providing a
reduced spacing variation as compared to the embodiment without the
sub-res shape 430. In another embodiment, multiple irregular
diffusion shapes 461 and 462 are placed between parallel regular
diffusion shapes 430 and 434. In this embodiment, spacings
extending perpendicularly away from long edges of irregular
diffusion shapes 461 and 462 are shown as S43, S44, and S45. In one
embodiment, spacings S43-S45 are made similar or equal to each
other to reduce the maximum spacing variation between standard
spacing S40 and spacings S43-S45.
[0101] In some embodiments an irregular wire width may be smaller
than a standard wire width. FIG. 5A shows an exemplary layout in
which irregular wires 660-664 have non-standard widths W60-W64,
which may or may not be equal to each other and which are smaller
than a standard width W6 for regular wires 610-615, 620, and 625. A
standard spacing SS6 is defined between facing long edges of
adjacent regular wires 610-615. In FIG. 5A, irregular wires 660-664
are placed to maximize the occurrence of standard spacing SS6
within the irregular wire layout region. Generally speaking, the
number N of irregular wires in an irregular wire layout region, and
the respective widths thereof, may be defined such that for a given
VG pitch it is not possible to place each irregular wire to have
long edge-to-long edge spacings equivalent to the standard spacing.
For example, the number N=5 of irregular wires 660-664 in the
irregular wire layout region of FIG. 5A, and the respective widths
thereof W60-W64, may be defined such that for a given VG (virtual
lines 600-605) of pitch P6 it is not possible to place each
irregular wire 660-664 to have long edge-to-long edge spacings
equivalent to the standard spacing SS6. Spacing of irregular wires
660-664 to maximize the occurrence of standard spacing SS6 results
in a single non-standard spacing S6A1 between facing long edges of
adjacently placed irregular wires 662 and 663. A spacing variation
SV6A1 for the dimension S6A1 is expressed as: SV6A1=S6A1-SS6.
[0102] FIG. 5B shows an exemplary layout similar to that of FIG. 5A
except that irregular wires 660-664, having widths W60-W64 that are
less than standard width W6, are placed such that long edge-to-long
edge spaces S6B1-S6B6 associated with irregular wires 660-664 are
defined to be similar to each other, but not necessarily equal to
the standard spacing SS6. Maximum spacing variation
(SV6B=|MAX(S6B1,S6B2,S6B3,S6B4,S6B5,S6B6)-SS6|) may be minimized
for this exemplary layout when irregular spacings S6B1 through S6B6
are equalized. With equal irregular spacings S6B1 through S6B6, the
maximum spacing variation SV6B can be expressed as:
SV6B=|S6B1-SS6|. This spacing variation SV6B may be less than the
maximum spacing variation SV6A for the layout of FIG. 5A, because
the extra space required to re-synchronize regular wires to the VG
at the boundary of the irregular wire layout region is spread among
all irregular spacings S6B1-S6B6 in the irregular wire layout
region of FIG. 5B, whereas the extra space required to
re-synchronize regular wires to the VG at the boundary of the
irregular wire layout region is focused in the irregular spacing
S6A1 between the two irregular wires 662 and 663 in the irregular
wire layout region of FIG. 5A. It should be understood that an
irregular spacing may be less than a standard spacing. For example,
the irregular spacing S6B1 may be less than the standard spacing
SS6 in FIG. 5B.
[0103] FIG. 5C shows an exemplary layout with irregular wires
660-661 having widths W61-W62, respectively, that are less than a
standard width SS6. A sub-res wire 690 of width SRW6 is placed
between irregular wires 660 and 661. A spacing S6C1 exists between
facing long edges of irregular wire 660 and regular wire 620. A
spacing S6C2 exists between facing long edges of irregular wire 660
and sub-res wire 690. A spacing S6C3 exists between facing long
edges of sub-res wire 690 and irregular wire 661. A spacing S6C4
exists between facing long edges of irregular wire 661 and regular
wire 623. Use of the sub-res wire 690 avoids having a large
irregular spacing between irregular wires 660 and 661, and thereby
enables reduction in spacing variation, which may be beneficial to
manufacturing. Also, the width SRW6 of sub-res wire 690 is somewhat
adjustable so long as the sub-res wire 690 does not resolve during
a manufacturing process. Therefore, in one embodiment, the
irregular spacings S6C1-S6C4 may be set equal to the regular
spacing SS6, if the width SRW6 of sub-res wire 690 can be
correspondingly adjusted without causing resolution of the sub-res
wire 690.
[0104] A method to reduce negative electrical or manufacturing
influences between layout shapes or layout regions is to interpose
other layout shapes between them. These interposing layout shapes
may have characteristics of regular wires, irregular wires, or
sub-res wires and may provide protection between regions of
irregular wires and regions of regular wires. FIG. 6 shows an
exemplary layout implementing the above-mentioned method. FIG. 6
shows irregular wires 760 and 761 and regular wires 710-715, 721,
722, 724, 725, 730-725. An irregular wire layout region is defined
between regular wires 722 and 724. Irregular spacings S7A1-S7A3 are
utilized within the irregular wire layout region. The regular wire
722 is placed adjacent to irregular wire 760. Because the regular
wire 722 may shield regular wire 721 from lithographic and/or
electrical influences (such as adverse light wave interference
and/or capacitive coupling) of irregular wire 760, the regular wire
722 is considered a protective shape. The long regular wire 724 is
placed adjacent to irregular wire 761. Similarly, because the long
regular wire 724 may shield regular wire 725 from the lithographic
and/or electrical influences of irregular wire 761, the long
regular wire 724 is considered a protective shape. Linear layout
shapes may also by defined to perform an isolating or protecting
function for other layout shapes in a direction of extent of the
VG. For example, regular wires such as 712-713 may prevent unwanted
lithographic or electrical interactions between layout shapes or
layout regions adjacent to their left edges, i.e., to their left
wire ends, and irregular wires 760 and 761, which are adjacent to
the right wire ends of regular wires 712-713.
[0105] Another method to increase the effectiveness of placing a
protective layout shape between layout shapes or layout regions
includes ensuring that the protective layout shape is unbroken
(does not have gaps) and/or that it extends beyond a boundary of a
layout shape/region to be protected and in the direction parallel
to VG lines. For example, in the exemplary layout of FIG. 6, the
protective long regular wire 724 extends beyond the line end of
irregular wire 761 by a distance of DWEXT. In this manner,
undesired interactions, such as adverse lithographic and/or
electrical influences, between irregular wire 761 and regular wires
715 and 725 are further reduced.
[0106] Another method to reduce negative manufacturing influences
between layout shapes or layout regions is to interpose sub-res
shapes between them, such that the interposing sub-res shapes act
as protective shapes. FIG. 7 shows a variation of the exemplary
layout of FIG. 6 in which protective sub-res shapes 790 and 791 are
placed in lieu of protective regular wires 722 and 724,
respectively. In the exemplary layout of FIG. 7, an irregular wire
layout region is defined between regular wires 721 and 725, to
include irregular wires 760-761 and sub-res shapes 790-791. Each of
sub-res shapes 790 and 791 is defined to have a width of SRW.
Sub-res shape 790 is separated from adjacent regular wire 721 by
the standard spacing SS. Irregular wire 760 is separated from
sub-res shape 790 by irregular spacing S7B1. Irregular wire 761 is
separated from irregular wire 760 by irregular spacing S7B2.
Sub-res shape 791 is separated from irregular wire 761 by irregular
spacing S7B3. Sub-res shape 791 is also separated from regular wire
725 by standard spacing SS. Sub-res shape 790 may reduce
lithographic influences between layout shapes 721 and 760.
Similarly, sub-res shape 791 may reduce lithographic influences
between layout shapes 725 and 761.
[0107] Another method to improve the manufacturability of a layout
that includes irregular wires is to optimize end gaps associated
with specific wire widths, wherein the optimized end gaps may vary
in size within the layout. FIG. 8A shows an exemplary layout within
which end gaps are varied to improve manufacturability. FIG. 8A
shows irregular wires 860-863, surrounded by regular wires 810-815,
820, 821, 824, 825, 830, 831, 834, 835, 841-845. In the example
embodiment of FIG. 8A, regular wires placed end-to-end that are not
adjacent to the irregular wire layout region, such as regular wires
810 and 820, have a standard end gap LS1 between their facing line
ends. Regular wires placed end-to-end with irregular wires of the
irregular wire layout region, such as regular wires 812 and 813
respectively placed end-to-end with irregular wires 860 and 861,
may have a non-standard end gap LS2 between their facing line ends.
Similarly, regular wires 842 and 843 placed end-to-end with
irregular wires 862 and 863, respectively, have a non-standard end
gap LS5 between their facing line ends. Also, irregular wires
placed end-to-end within the irregular wire layout region, such as
irregular wires 860 and 862, may have a another non-standard end
gap LS3 between their facing line ends. Also, regular wires that
bound the irregular wire layout region, such as regular wires 821
and 831, may have another non-standard end gap LS4 between their
facing line ends. It should be understood that non-standard end
gaps, such as LS2-LS5, may be defined to provide lithographic
compensation or optimization necessitated by definition and
placement of irregular wires within the irregular wire layout
region. More specifically, particular irregular wire dimensions
(width and length) and irregular wire spacings (end gap and long
edge-to-long edge) within the irregular wire layout region may
steer definition of non-standard end gaps within and/or around the
irregular wire layout region.
[0108] For circuits that need to be matched in terms of
manufactured shape characteristics and in terms of electrical
influences due to neighboring elements, such as balanced circuits,
use of protective layout shapes around such circuits may be
combined with use of irregular wires and/or irregular spaces within
such circuits to provide the necessary matching therebetween.
Layout shapes within circuits to be matched may also be arranged
symmetrically in X rows and Y columns. Such a symmetric arrangement
may be done for structures such as common centroid structures or
other circuits that require close matching between shape dimensions
such as gate length and width. Also, it should be appreciated that
use of protective layout shapes within and/or around a circuit
layout may serve to reduce unwanted electrical coupling effects
and/or unwanted lithographic interactions between layout shapes on
either side of the protective layout shapes in any given
direction.
[0109] In the exemplary embodiment of FIG. 8A, irregular wires
860-863 are arranged symmetrically both vertically and
horizontally, i.e., in both x- and y-directions. In one embodiment,
wire placement symmetry, such as that demonstrated by irregular
wires 860-863, enables matching between pairs of layout shapes. For
example, the combined characteristics of irregular wires 860 and
863 are matched to the combined characteristics of irregular wires
861 and 862. In one embodiment, electrically connected circuit
features, such as irregular wires 860 and 863 by way of example,
are placed diagonally with respect to each other. Also, a matched
pair of electrically connected circuit features, such as irregular
wires 861 and 862 by way of example, are placed diagonally.
Furthermore, features in the matched circuit, such as irregular
wires 860-863, are placed evenly around a common point in space X,
also referred to a common centroid. To this end, pairs of wires in
a matched circuit that are placed end-to-end, such as irregular
wires 860 and 862, and irregular wires 861 and 863, are separated
by the same end gap LS3. Also, pairs of wires in a matched circuit
that are placed adjacent and parallel to each other, such as
irregular wires 860 and 861, and irregular wires 862 and 863, are
separated by the same long edge-to-long edge spacing S8A2.
[0110] Regular wires which bound a symmetrically defined irregular
wire layout region may be placed such that edges of the regular
wires that face toward a given side of the irregular wire layout
region are positioned at a constant distance from the outward
facing edges of the layout shapes within and along the given side
of the irregular wire layout region. For example, regular wires
812, 813, 824, 834, 843, 842, 831, and 821 which bound the
irregular wire layout region shown in FIG. 8A, may be placed such
that their edges which face toward the irregular wire layout region
are a constant distance from respective facing edges of irregular
wires 860-863 along a given side of the irregular wire layout
region. For instance, edges of regular wires 812 and 813 which face
toward the irregular wire layout region are a constant distance LS2
from respective facing edges of irregular wires 860 and 861. Edges
of regular wires 824 and 834 which face toward the irregular wire
layout region are a constant distance S8A3 from respective facing
edges of irregular wires 861 and 863. Edges of regular wires 843
and 842 which face toward the irregular wire layout region are a
constant distance LS5 from respective facing edges of irregular
wires 863 and 862. Edges of regular wires 831 and 821 which face
toward the irregular wire layout region are a constant distance
S8A1 from respective facing edges of irregular wires 862 and 860.
Additionally, further regularity may be achieved in the
symmetrically defined irregular wire layout region if some of the
peripheral spacings (LS2, S8A3, LS5, S8A1) are made equal, e.g.,
LS2=LS5 and/or S8A1=S8A3. It should be understood that the regular
wires which bound an irregular wire layout region, (such as regular
wires 811-814, 821, 824, 831, 834, 841-844) may be used as
protective layout shapes and/or may be used to perform a circuit
function.
[0111] FIG. 8B shows an exemplary layout in which long regular
wires are used to bound an irregular wire layout region, thereby
serving as protective layout shapes between the irregular wire
layout region and a surrounding layout area. Long regular wires
811P and 814P are each placed to bound a respective side of an
irregular wire layout region within which irregular wires 860-863
are symmetrically arranged in a common centroid fashion around
point X. Each of the long regular wires 811P and 814P is defined to
extend beyond outer edges of outermost irregular wires. For
example, long regular wire 814P is defined to extend beyond an
outer edge of irregular wire 863 by a distance DWEXT. The unbroken
nature of the long regular wires 811P and 814P and their extension
beyond the outer edges of the outermost irregular wires may provide
protection against adverse manufacturing or electrical influences
between irregular shapes 860-863 and regular shapes 810, 820, 830,
815, 825, 835, and 845 placed on an opposing side of long regular
wires 811P and 814P. Regular wires 812, 813, 842, and 843 which are
respectively placed end-to-end with irregular wires 860-863 may
reduce unwanted interactions between irregular wires 860-863 and
other layout shapes, such as layout shapes placed to the left of
regular wires 812 and 813 or layout shapes placed to the right of
regular wires 842 and 843.
[0112] Another method to reduce unwanted lithographic interactions
between two layout shapes is to interpose a sub-res wire between
the two layout shapes, as an alternative to the previously
described method of interposing regular wires. Because the sub-res
shape is not manufactured, one advantage of using a sub-res shape
is that capacitive coupling between manufactured shapes that are
separated by the sub-res shape is reduced. Therefore, a
conductor-to-conductor separation distance associated with facing
edges of two manufactured shapes is increased when a sub-res shape
is used as an interposed protective layout shape, relative to when
a regular wire is used as the interposed protective layout shape.
FIG. 8C shows a variation of the exemplary layout of FIG. 8B, in
which sub-res shapes 890 and 891 are used in lieu of long regular
wires 811P and 814P, respectively. Each of sub-res shapes 890 and
891 is defined to have a width SRW, such that the sub-res shape
will not resolve during manufacturing. The sub-res shape 890
reduces lithographic interaction between the irregular wires
860-863 and the regular wires 810, 820, 830 that are placed
opposite the sub-res shape 890 from the irregular wire layout
region. The sub-res shape 891 reduces lithographic interaction
between the irregular wires 860-863 and the regular wires 815, 825,
835, 845 that are placed opposite the sub-res shape 891 from the
irregular wire layout region. In the portion of the as-manufactured
chip level associated with the layout of FIG. 8C, a large space
SMANUF is present between the facing long edges of regular wire 820
and irregular wire 860, and between the facing long edges of
regular wire 830 and irregular wire 862. It should be appreciated
that the space SMANUF is larger that a long edge-to-long edge
spacing S8B1 between the regular wire 811P and the irregular wires
860 and 862 in the layout of FIG. 8B. Therefore, the capacitive
coupling experienced by irregular wires 860 and 862 may be reduced
by the larger conductor-to-conductor spacing SMANUF, relative to
the spacing S8B1.
[0113] The use of protective layout shapes may also be helpful in
preventing unwanted interactions between an area of higher layout
shape density and an area of lower layout shape density, as
variations in layout shape density may adversely affect
lithographic results. FIG. 8D shows a layout region 1199
immediately adjacent to a long edge 1114A of a linear layout shape
1114. Layout shape 1114 may protect layout shapes placed opposite
the layout shape 1114 from the layout region 1199, such as layout
shapes 1160-1163, from adverse lithographic effects related to
layout shapes within layout region 1199. In one embodiment, layout
region 1199 may have a lower layout shape density relative to the
layout region defined opposite the linear layout shape 1114. For
example, a long edge-to-long edge spacing S114, between linear
layout shape 1114 and adjacently placed layout shape 1170 within
the layout region 1199, may be significantly larger than long
edge-to-long edge spacings S113 and S112 within the layout region
defined opposite the linear layout shape 1114. The lithographic
influence of region 1199 on wires 1161 and 1163 may be reduced by
the presence of linear layout shape 1114 acting as a protective
layout shape.
[0114] The use of regular wires and sub-res shapes as protective
layout shapes, such as described with regard to FIGS. 8B and 8C,
can be applied to protect either regular wires or irregular wires.
FIG. 8E shows an exemplary layout in which regular wires 880-883 of
standard width W1 are defined within a layout region R8D.
Protective layout shapes 890, 891, 812, 813, 842, and 843 serve to
protect regular wires 880-883 from adverse lithographic and/or
electrical influence by layout shapes/regions defined outside of
the layout region R8D. It should be appreciated that some or all of
protective layout shapes 890, 891, 812, 813, 842, and 843 may be
sub-res shapes.
[0115] Layout shapes can be arranged in a number of ways to
optimize circuit balancing. FIG. 8F shows an exemplary layout that
includes a symmetrical arrangement of irregular wires 860-863. Top
edges of irregular wires 860 and 862 are substantially aligned
with, or near to aligned with, top edges of neighboring regular
wires 830 and 841, thereby resulting in a long edge-to-long edge
spacing S8E1 between regular wire 810P and each of irregular wires
860 and 862 that is substantially equivalent to standard spacing
SS. Bottom edges of irregular wires 861 and 863 are substantially
aligned with, or near to aligned with, bottom edges of neighboring
regular wires 813 and 843, thereby resulting in a long edge-to-long
edge spacing S8E2 between regular wire 814P and each of irregular
wires 861 and 863 that is substantially equivalent to standard
spacing SS. Spacing S8E5 between facing long edges of irregular
shapes such as 860 and 861 may not be equivalent to or near the
standard spacing SS. Although similar to the exemplary layout of
FIG. 3C, the exemplary layout of FIG. 8F includes a common centroid
style irregular wire layout arrangement.
[0116] FIG. 8G shows a variation of the exemplary layout of FIG. 8F
in which a layout shape 822P is inserted between symmetrically
arranged irregular wires 860-863. Layout shape 822P may be a dummy
shape or may be used for a circuit function. A width W3 of layout
shape 822P may be regular, irregular, or small enough that the
layout shape 822P is a sub-res shape. Facing long edges of
irregular wire 860 and layout shape 822P are separated by spacing
S8F3. Similarly, facing long edges of irregular wire 862 and layout
shape 822P are separated by spacing S8F3. Facing long edges of
irregular wire 861 and layout shape 822P are separated by spacing
S8F4. Similarly, facing long edges of irregular wire 863 and layout
shape 822P are separated by spacing S8F4. The spacings S8F3 and
S8F4 may be closer to standard spacing SS than the spacing S8E5 in
the layout of FIG. 8F, in which the interposing shape 822P is not
present.
[0117] Although the exemplary layouts depicted in FIGS. 8A-8G
include irregular wire layout regions arranged in two rows and two
columns around a common center point (common centroid), it should
be understood that the irregular wires in the irregular wire layout
region can be arranged in essentially any manner. For example, in
various embodiments, the irregular wires in the irregular wire
layout region can be arranged in an array defined by a variable
number of layout shape columns and a variable number of layout
shape rows.
[0118] FIG. 8H shows an exemplary layout in which irregular wires
870-873 are arranged in an array defined by four layout shape
columns and one layout shape row. In one embodiment, matching is
required between interleaved pairs of irregular wires such that the
combined characteristics of irregular wires 870 and 872 are matched
to the combined characteristics of irregular wires 871 and 873. The
exemplary layout of FIG. 8H also includes protective shapes defined
by wires 890, 891, 812 and 842, which reduce lithographic and/or
electrical interactions between irregular wires 870-873 and regular
wires opposite the protective shapes from the irregular wire layout
region, such as regular wires 810, 820, and 813. A respective width
of each protective wire 890, 891, 812 and 842 may be regular,
irregular, or small enough that the protective wire is a sub-res
shape. Spacings S8H1-S8H7 that extend perpendicularly away from
long edges of irregular wires may not be equal to standard spacing
SS.
[0119] Another method to reduce spacing variation is to modify one
or more irregular wire widths such that long edge-to-long edge
spacing after placement is satisfactory. This method may be used in
conjunction with other methods and embodiments shown herein. One
embodiment of this method is shown in FIG. 9A, in which an
irregular wire 960 is placed in an area including regular wires
910-913, 920, and 923. A width W960 of irregular wire 960 is set
such that spacing variations associated with the irregular wire 960
is acceptable, wherein these spacing variations are defined as the
differences between standard spacing SS and each of spacings S9A1
and S9A2. In one embodiment, these spacing variations are
eliminated by setting the width W960 and the placement of irregular
wire 960, such that S9A1=S9A2=SS.
[0120] Another embodiment is shown in FIG. 9B, where two irregular
wires 961 and 962 having widths W961 and W962, respectively, are
successively placed between regular wires 920 and 924. Long
edge-to-long edge spacings associated with irregular shapes 961 and
962 are shown as S9B1, S9B2, and S9B3. In one embodiment, irregular
wire widths W961 and W962 are set such that spacing variations
associated with irregular wires 961 and 962 are reduced to an
acceptable value, wherein these spacing variations are defined as
SV9B1=|S9B1-SS|, SV9B2=|S9B2-SS|, and SV9B3=|S9B3-SS|. In one
embodiment, each of spacing variations SV9B1, SV9B2, and SV9B3 can
be eliminated if W961, W962 and the placement of irregular wires
961 and 962 are defined such that S9B1=S9B2=S9B3=SS.
[0121] Another embodiment is shown in FIG. 9C, where irregular
shapes 971, 972, and 990 having widths W971, W972, and W990,
respectively, are placed between regular wires 920 and 924. Long
edge-to-long edge spacings associated with irregular wires 971,
990, and 972 are shown as S9C1, S9C2, S9C3, and S9C4. Width W990
can be set to a value less than standard width W1 to compensate for
widths W971 and W972 that are greater than standard width W1, so as
to set each of spacings S9C1, S9C2, S9C3, and S9C4 sufficiently
similar to standard spacing SS. In one embodiment, the width W990
may be small enough to make wire 990 a sub-res shape. In one
embodiment, all spacing variation can be eliminated if W971, W972,
W990, and the placement of shapes 971, 972, and 990 are such that
S9C1=S9C2=S9C3=S9C4=SS.
[0122] In the methods and exemplary layouts previously described,
irregular wires and sub-res shapes may or may not be centered on a
VG line, on which regular wires are centered. Another method for
formation and placement of irregular wires includes placement of
irregular wires such that centerlines of the irregular wires are
coincident with VG lines to a maximum extent possible, while
minimizing an impact of non-standard width wires on overall layout
pattern regularity.
[0123] FIG. 10A shows an exemplary layout in which an irregular
wire 1030 is placed such that its centerline is coincident with a
VG line 102. Irregular wire 1030 is placed within an irregular wire
region bounded by regular wires 1010-1014, 1020, and 1024. VG lines
101 and 103 are unpopulated within the irregular wire layout
region. With each layout shape centered on VG line and with no long
edge-to-long edge spacings less than standard spacing SS, placement
of irregular wire 1030 on VG line 102 results in long edge-to-long
edge spacings of S10A1 and S10A2. In this embodiment, spacing
variation (SV10A=|S10A1-SS|) may be significant.
[0124] FIG. 10B shows a variation of the exemplary layout of FIG.
10A in which irregular wire 1030 is moved up to VG line 101, and
regular wire 1024 is moved up to VG line 102. This results in
non-standard spacings S10B1 and S10B2, which are less than standard
spacing SS. Spacing variation may be less in a layout that does not
skip VG lines to accommodate irregular wire placement, as compared
to a layout that does skip VG lines to accommodate irregular wire
placement, such as shown in FIG. 10A. However, where an irregular
wire width is wider than the standard width of regular wires,
placement of the irregular wire may result in irregular spacing
that is too small to pass manufacturing design rule checks.
[0125] FIG. 10C shows a variation of the exemplary layout of FIG.
10A in which layout shapes 1060 and 1061 are inserted in long edge
spaces S10A1 and 510A2 on each side of irregular wire 1030.
Insertion of layout shapes 1060 and 1061 creates long edge-to-long
edge spacings S10C1-S10C4, which may be closer to standard spacing
SS than long edge spaces S10A1 and S10A2. In one embodiment, layout
shapes 1060 and 1061 may be sub-res shapes.
[0126] It should be understood that the methods for defining an
irregular wire layout region within the dynamic array architecture
as disclosed herein can be implemented in a layout that is stored
in a tangible form, such as in a digital format on a computer
readable medium. For example, the layout defined in accordance with
the methods disclosed herein can be stored in a layout data file of
one or more cells, selectable from one or more libraries of cells.
The layout data file can be formatted as a GDS II (Graphic Data
System) database file, an OASIS (Open Artwork System Interchange
Standard) database file, or any other type of data file format
suitable for storing and communicating semiconductor device
layouts. Also, multi-level layouts defined in accordance with the
methods disclosed herein can be included within a multi-level
layout of a larger semiconductor device. The multi-level layout of
the larger semiconductor device can also be stored in the form of a
layout data file, such as those identified above.
[0127] Also, the invention described herein can be embodied as
computer readable code on a computer readable medium. For example,
the computer readable code can include the layout data file within
which one or more layouts defined in accordance with the methods
disclosed herein are stored. The computer readable code can also
include program instructions for selecting one or more layout
libraries and/or cells that include a layout defined in accordance
with the methods disclosed herein. The layout libraries and/or
cells can also be stored in a digital format on a computer readable
medium.
[0128] The computer readable medium mentioned herein is any data
storage device that can store data which can thereafter be read by
a computer system. Examples of the computer readable medium include
hard drives, network attached storage (NAS), read-only memory,
random-access memory, CD-ROMs, CD-Rs, CD-RWs, magnetic tapes, and
other optical and non-optical data storage devices. The computer
readable medium can also be distributed over a network of coupled
computer systems so that the computer readable code is stored and
executed in a distributed fashion.
[0129] Any of the operations described herein that form part of the
invention are useful machine operations. The invention also relates
to a device or an apparatus for performing these operations. The
apparatus may be specially constructed for the required purpose,
such as a special purpose computer. When defined as a special
purpose computer, the computer can also perform other processing,
program execution or routines that are not part of the special
purpose, while still being capable of operating for the special
purpose. Alternatively, the operations may be processed by a
general purpose computer selectively activated or configured by one
or more computer programs stored in the computer memory, cache, or
obtained over a network. When data is obtained over a network the
data maybe processed by other computers on the network, e.g., a
cloud of computing resources.
[0130] The embodiments of the present invention can also be defined
as a machine that transforms data from one state to another state.
The data may represent an article, that can be represented as an
electronic signal and electronically manipulate data. The
transformed data can, in some cases, be visually depicted on a
display, representing the physical object that results from the
transformation of data. The transformed data can be saved to
storage generally, or in particular formats that enable the
construction or depiction of a physical and tangible object. In
some embodiments, the manipulation can be performed by a processor.
In such an example, the processor thus transforms the data from one
thing to another. Still further, the methods can be processed by
one or more machines or processors that can be connected over a
network. Each machine can transform data from one state or thing to
another, and can also process data, save data to storage, transmit
data over a network, display the result, or communicate the result
to another machine.
[0131] It should be further understood that the layouts defined in
accordance with the methods disclosed herein can be manufactured as
part of a semiconductor device or chip. In the fabrication of
semiconductor devices such as integrated circuits, memory cells,
and the like, a series of manufacturing operations are performed to
define features on a semiconductor wafer. The wafer includes
integrated circuit devices in the form of multi-level structures
defined on a silicon substrate. At a substrate level, transistor
devices with diffusion regions are formed. In subsequent levels,
interconnect metallization lines are patterned and electrically
connected to the transistor devices to define a desired integrated
circuit device. Also, patterned conductive layers are insulated
from other conductive layers by dielectric materials.
[0132] While this invention has been described in terms of several
embodiments, it will be appreciated that those skilled in the art
upon reading the preceding specifications and studying the drawings
will realize various alterations, additions, permutations and
equivalents thereof. Therefore, it is intended that the present
invention includes all such alterations, additions, permutations,
and equivalents as fall within the true spirit and scope of the
invention.
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