U.S. patent application number 15/202250 was filed with the patent office on 2017-05-04 for methods of forming a layer and methods of manufacturing magnetic memory devices using the same.
The applicant listed for this patent is Juhyun KIM, Ki Woong KIM, Joonmyoung LEE, Sechung OH, Yong Sung PARK. Invention is credited to Juhyun KIM, Ki Woong KIM, Joonmyoung LEE, Sechung OH, Yong Sung PARK.
Application Number | 20170125669 15/202250 |
Document ID | / |
Family ID | 58635649 |
Filed Date | 2017-05-04 |
United States Patent
Application |
20170125669 |
Kind Code |
A1 |
PARK; Yong Sung ; et
al. |
May 4, 2017 |
Methods of Forming a Layer and Methods of Manufacturing Magnetic
Memory Devices Using the Same
Abstract
A method of forming a layer includes providing a first insulator
and a second insulator over a lower structure, generating a first
ion source and a second ion source from the first insulator and the
second insulator, respectively, and forming an insulating layer on
the lower structure using the first ion source and the second ion
source. The first and second insulators are vertically spaced apart
from the lower structure and are laterally spaced apart from each
other. The first insulator and the second insulator include the
same material.
Inventors: |
PARK; Yong Sung; (Suwon-si,
KR) ; LEE; Joonmyoung; (Anyang-si, KR) ; KIM;
Ki Woong; (Hwaseong-si, KR) ; KIM; Juhyun;
(Hwaseong-si, KR) ; OH; Sechung; (Yongin-si,
KR) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
PARK; Yong Sung
LEE; Joonmyoung
KIM; Ki Woong
KIM; Juhyun
OH; Sechung |
Suwon-si
Anyang-si
Hwaseong-si
Hwaseong-si
Yongin-si |
|
KR
KR
KR
KR
KR |
|
|
Family ID: |
58635649 |
Appl. No.: |
15/202250 |
Filed: |
July 5, 2016 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
C23C 14/08 20130101;
C23C 14/081 20130101; C23C 14/3464 20130101; H01F 41/307 20130101;
H01L 43/08 20130101; H01L 43/12 20130101 |
International
Class: |
H01L 43/12 20060101
H01L043/12; H01L 43/08 20060101 H01L043/08 |
Foreign Application Data
Date |
Code |
Application Number |
Oct 29, 2015 |
KR |
10-2015-0151223 |
Claims
1. A method of forming a layer, the method comprising: providing a
first insulator and a second insulator over a lower structure, the
first and second insulators vertically spaced apart from the lower
structure, and the first and second insulators laterally spaced
apart from each other, wherein an uppermost portion of the lower
structure is a conductive layer having a crystal structure;
generating a first ion source and a second ion source from the
first insulator and the second insulator, respectively; forming an
insulating layer on the lower structure using the first ion source
and the second ion source, wherein at least a portion of the
insulating layer is in an amorphous gate; and performing a thermal
treatment process on the insulating layer, wherein the thermal
treatment processor crystallizes the portion of insulating layer in
the amorphous state to match a lattice of the crystal structure of
the conductive layer, and wherein the first insulator and the
second insulator comprise the same material as each other.
2. The method of claim 1, wherein the first and second insulators
comprise a metal oxide.
3. The method of claim 1, wherein the insulating layer comprises
the same material as the first and second insulators.
4. (canceled)
5. The method of claim 1, wherein generating the first and second
ion sources and forming the insulating layer are performed by a
radio-frequency (RF) sputtering process using the first and second
insulators as targets.
6-7. (canceled)
8. The method of claim 1, wherein a lattice of the insulating layer
matches a lattice of the conductive layer at an interface between
the conductive layer and the insulating layer.
9. A method of manufacturing a magnetic memory device, the method
comprising: sequentially forming a first magnetic layer having a
crystal structure, a non-magnetic layer, and a second magnetic
layer on a substrate, wherein forming the non-magnetic layer
comprises performing a sputtering process using a plurality of
insulators as targets and performing a thermal treatment process
after performing the sputtering precess and before forming the
second magnetic layer, and wherein the plurality of insulators
comprise the same material as each other.
10. (canceled)
11. The method of claim 9, wherein the non-magnetic layer comprises
the same material as the plurality of insulators.
12. The method of claim 11, wherein the non-magnetic layer and the
insulators comprise a metal oxide.
13. The method of claim 9, wherein the sputtering process is
performed after forming the first magnetic layer and before forming
the second magnetic layer.
14. The method of claim 13, wherein a lattice of the non-magnetic
layer matches a lattice of the first magnetic layer at an interface
between the non-magnetic layer and the first magnetic layer.
15. (canceled)
16. The method of claim 9, wherein one of the first and second
magnetic layers is a free layer and the other of the first and
second magnetic layers is a pinned layer.
17. The method of claim 16, wherein the first and second magnetic
layers have a magnetization direction substantially parallel to an
interface between the non-magnetic layer and the second magnetic
layer.
18. The method of claim 16, wherein the first and second magnetic
layers have a magnetization direction substantially perpendicular
to an interface between the non-magnetic layer and the second
magnetic layer.
19. (canceled)
20. The method of claim 9, wherein performing the sputtering
process using the plurality of insulators comprises applying
voltages that are equal to each other to the plurality of
insulators.
21. A method of forming a magnetic tunnel junction, the method
comprising: forming a first magnetic layer having a crystal
structure on a substrate; positioning a first insulator a first
distance above a surface of the first magnetic layer; positioning a
second insulator a second distance above the surface of the first
magnetic layer and spaced laterally apart from the first insulator;
applying a first voltage to the first insulator and a second
voltage to the second insulator; performing a sputtering process
using the first insulator and the second insulator as targets to
form a non-magnetic layer on the first magnetic layer having the
crystal structure; and forming a second magnetic layer on the
non-magnetic layer, wherein the non-magnetic layer formed by the
sputtering process comprises a portion in an amorphous state, and
wherein the method further comprises performing a heat treatment
after performing the sputtering process and before forming the
second magnetic layer, wherein the heat treatment crystallizes the
amorphous portion of the non-magnetic layer and forms a
crystallized portion of the non-magnetic layer having a first
lattice that matches a second lattice of the first magnetic layer
at an interface between the non-magnetic layer and the first
magnetic layer.
22. (canceled)
23. The method of claim 21, wherein the first voltage and the
second voltage are AC voltages, respectively, and wherein the first
and second voltages have a same phase.
24. The method of claim 21, wherein the first distance and the
second distance are equal to one another.
25. The method of claim 21, wherein the first insulator is inclined
with respect to a top surface of the substrate at a first angle,
and wherein the second insulator is inclined with respect to the
top surface of the substrate at a second angle having a magnitude
that is equal to the first angle.
26. The method of claim 1, wherein the thermal treatment process is
performed at a temperature of about 100 degrees Celsius to about
600 degrees Celsius.
27. The method of claim 1, wherein the conductive layer having the
crystal structure is a first magnetic layer, and further
comprising: forming a second magnetic layer on the insulating layer
after performing the thermal treatment process.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This U.S. non-provisional patent application claims priority
under 35 U.S.C. .sctn.119 to Korean Patent Application No.
10-2015-0151223, filed on Oct. 29, 2015, in the Korean Intellectual
Property Office, the entire content of which is incorporated herein
by reference in its entirety.
BACKGROUND
[0002] The inventive concepts relate to methods of forming a layer
using a sputtering method and methods of manufacturing magnetic
memory devices using the same.
[0003] High-speed and/or low power consumption electronic devices
may be provided by including semiconductor memory devices therein
with a high-speed characteristic and/or a low operating voltage.
Accordingly, magnetic memory devices have been developed. The
magnetic memory devices may have high-speed and/or non-volatile
characteristics.
[0004] In general, a magnetic memory device may include a magnetic
tunnel junction (MTJ) pattern. The magnetic tunnel junction pattern
may include two magnetic layers and an insulating layer disposed
between the two magnetic layers. A resistance value of the magnetic
tunnel junction pattern may be changed depending on magnetization
directions of the two magnetic layers. For example, when the
magnetization directions of the two magnetic layers are
anti-parallel to each other, the magnetic tunnel junction pattern
may have a relatively large resistance value. When the
magnetization directions of the two magnetic layers are parallel to
each other, the magnetic tunnel junction pattern may have a
relatively small resistance value. The magnetic memory device may
read/write data using a difference between the resistance values of
the magnetic tunnel junction pattern.
SUMMARY
[0005] Embodiments of the inventive concepts may provide methods of
forming a layer which are capable of matching a lattice of a layer
with a lattice of an underlying layer and of increasing a
deposition rate of a layer.
[0006] Embodiments of the inventive concepts may also provide
methods of manufacturing magnetic memory devices which are capable
of being easily applied to the mass production.
[0007] Embodiments of the inventive concepts may also provide
methods of manufacturing magnetic memory devices with excellent
reliability.
[0008] In an aspect of the inventive concepts, a method of forming
a layer may include providing a first insulator and a second
insulator over a lower structure, the first and second insulators
vertically spaced apart from the lower structure, the first and
second insulators laterally spaced apart from each other,
generating a first ion source and a second ion source from the
first insulator and the second insulator, respectively, and forming
an insulating layer on the lower structure using the first ion
source and the second ion source. The first insulator and the
second insulator may include a same material.
[0009] In some embodiments, the first and second insulators may
include a metal oxide.
[0010] In some embodiments, the insulating layer may include the
same material as the first and second insulators.
[0011] In some embodiments, the first insulator, the second
insulator, and the insulating layer may include a metal oxide.
[0012] In some embodiments, generating the first and second ion
sources and forming the insulating layer may be performed by a
radio-frequency (RF) sputtering process using the first and second
insulators as targets.
[0013] In some embodiments, the method may further include
performing a thermal treatment process on the insulating layer.
[0014] In some embodiments, an uppermost portion of the lower
structure may be a conductive layer having a crystal structure.
[0015] In some embodiments, a lattice of the insulating layer may
match a lattice of the conductive layer at an interface between the
conductive layer and the insulating layer.
[0016] In an aspect of the inventive concepts, a method of
manufacturing a magnetic memory device may include sequentially
forming a first magnetic layer, a non-magnetic layer, and a second
magnetic layer on a substrate. Forming the non-magnetic layer may
include performing a sputtering process using a plurality of
insulators as targets. The plurality of insulators may include a
same material.
[0017] In some embodiments, the plurality of insulators may include
a metal oxide.
[0018] In some embodiments, the non-magnetic layer may include the
same material as the plurality of insulators.
[0019] In some embodiments, the non-magnetic layer and the
insulators may include a metal oxide.
[0020] In some embodiments, the sputtering process may be performed
after forming the first magnetic layer and before forming the
second magnetic layer. Forming the non-magnetic layer may further
may include performing a thermal treatment process after performing
the sputtering process and before forming the second magnetic
layer.
[0021] In some embodiments, a lattice of the non-magnetic layer may
match a lattice of the first magnetic layer at an interface between
the non-magnetic layer and the first magnetic layer.
[0022] In some embodiments, the non-magnetic layer may be a tunnel
barrier layer.
[0023] In some embodiments, one of the first and second magnetic
layers may be a free layer and the other of the first and second
magnetic layers may be a pinned layer.
[0024] In some embodiments, the first and second magnetic layers
may have a magnetization direction substantially parallel to an
interface between the non-magnetic layer and the second magnetic
layer.
[0025] In some embodiments, the first and second magnetic layers
may have a magnetization direction substantially perpendicular to
an interface between the non-magnetic layer and the second magnetic
layer.
[0026] In some embodiments, the sputtering process may be a
radio-frequency (RF) sputtering process.
[0027] In some embodiments, performing the sputtering process using
the plurality of insulators may include applying voltages that are
equal to each other to the plurality of insulators.
[0028] In an aspect of the inventive concepts, a method of forming
a magnetic tunnel junction may include forming a first magnetic
layer on a substrate, positioning a first insulator a first
distance above a surface of the first magnetic layer, positioning a
second insulator a second distance above the surface of the first
magnetic layer and spaced laterally apart from the first insulator,
applying a first voltage to the first insulator and a second
voltage to the second insulator, performing a sputtering process
using the first insulator and the second insulator as targets to
form a non-magnetic layer on the first magnetic layer, and forming
a second magnetic layer on the non-magnetic layer.
[0029] In some embodiments, the non-magnetic layer formed by the
sputtering process may include a portion in an amorphous state. The
method may further include performing a heat treatment after
performing the sputtering process and before forming the second
magnetic layer. The heat treatment may crystallize the amorphous
portion of the non-magnetic layer and may form a crystallized
portion of the non-magnetic layer having a first lattice. The first
lattice of the crystallized portion of the non-magnetic layer may
match a second lattice of the first magnetic layer at an interface
between the non-magnetic layer and the first magnetic layer.
[0030] In some embodiments, the first voltage and the second
voltage may be AC voltages, respectively. The first and second
voltages may have a same phase.
[0031] In some embodiments, the first distance and the second
distance may be equal to one another.
[0032] In some embodiments, the first insulator may be inclined
with respect to a top surface of the substrate at a first angle.
The second insulator may be inclined with respect to the top
surface of the substrate at a second angle having a magnitude that
is equal to the first angle.
BRIEF DESCRIPTION OF THE DRAWINGS
[0033] The inventive concepts will become more apparent in view of
the attached drawings and accompanying detailed description.
[0034] FIG. 1 is a flow chart illustrating a method of forming a
layer, according to some embodiments of the inventive concepts.
[0035] FIGS. 2 to 4 are cross-sectional views illustrating a method
of forming a layer, according to some embodiments of the inventive
concepts.
[0036] FIG. 5 is a flow chart illustrating a method of
manufacturing magnetic memory devices, according to some
embodiments of the inventive concepts.
[0037] FIG. 6 is a flow chart illustrating an operation S110 of
FIG. 5.
[0038] FIGS. 7 to 12 are cross-sectional views illustrating methods
of manufacturing magnetic memory devices, according to some
embodiments of the inventive concepts.
[0039] FIG. 13 is a cross-sectional view illustrating a magnetic
tunnel junction pattern according to some embodiments of the
inventive concepts.
[0040] FIG. 14 is a cross-sectional view illustrating a magnetic
tunnel junction pattern according to some embodiments of the
inventive concepts.
DETAILED DESCRIPTION
[0041] The inventive concepts will now be described more fully
hereinafter with reference to the accompanying drawings, in which
example embodiments of the inventive concepts are shown. The
inventive concepts and methods of achieving them will be apparent
from the following example embodiments that will be described in
more detail with reference to the accompanying drawings. The
embodiments of the inventive concepts may, however, be embodied in
different forms and should not be constructed as limited to the
embodiments set forth herein. Rather, these embodiments are
provided so that this disclosure will be thorough and complete, and
will fully convey the scope of the inventive concept to those
skilled in the art.
[0042] As used herein, the singular terms "a," "an," and "the" are
intended to include the plural forms as well, unless the context
clearly indicates otherwise. As used herein, the term "and/or"
includes any and all combinations of one or more of the associated
listed items. It will be understood that when an element is
referred to as being "connected" or "coupled" to another element,
it may be directly connected or coupled to the other element or
intervening elements may be present. It will be further understood
that the terms "comprises," "comprising," "includes," and/or
"including", when used herein, specify the presence of stated
features, integers, steps, operations, elements, and/or components,
but do not preclude the presence or addition of one or more other
features, integers, steps, operations, elements, components, and/or
groups thereof.
[0043] Similarly, it will be understood that when an element such
as a layer, region or substrate is referred to as being "on"
another element, it can be directly on the other element or
intervening elements may be present. In contrast, the term
"directly" means that there are no intervening elements.
Additionally, the embodiment in the detailed description will be
described with sectional views as ideal example views of the
inventive concepts. Accordingly, shapes of the example views may be
modified according to manufacturing techniques and/or allowable
errors. Therefore, the embodiments of the inventive concepts are
not limited to the specific shape illustrated in the example views,
but may include other shapes that may be created according to
manufacturing processes.
[0044] Example embodiments of aspects of the present inventive
concepts explained and illustrated herein include their
complementary counterparts. The same reference numerals or the same
reference designators denote the same elements throughout the
specification.
[0045] While such terms as "first," "second," etc., may be used to
describe various components, such components must not be limited to
the above terms. The above terms are used only to distinguish one
component from another. For example, a first component discussed
below could be termed a second component, and similarly, a second
component may be termed a first component without departing from
the teachings of this disclosure.
[0046] Spatially relative terms, such as "beneath," "below,"
"lower," "above," "upper," and the like, may be used herein for
ease of description to describe one element or feature's
relationship to another element(s) or feature(s) as illustrated in
the figures. It will be understood that the spatially relative
terms are intended to encompass different orientations of the
device in use or operation in addition to the orientation depicted
in the figures. For example, if the device in the figures is turned
over, elements described as "below" or "beneath" other elements or
features would then be oriented "above" the other elements or
features. Thus, the exemplary term "below" can encompass both an
orientation of above and below. The device may be otherwise
oriented (rotated 90 degrees or at other orientations) and the
spatially relative descriptors used herein interpreted
accordingly.
[0047] Unless otherwise defined, all terms (including technical and
scientific terms) used herein have the same meaning as commonly
understood by one of ordinary skill in the art to which these
inventive concepts belong. It will be further understood that
terms, such as those defined in commonly used dictionaries, should
be interpreted as having a meaning that is consistent with their
meaning in the context of the relevant art and will not be
interpreted in an idealized or overly formal sense unless expressly
so defined herein.
[0048] The operations of all methods described herein can be
performed in any suitable order unless otherwise indicated herein
or otherwise clearly contradicted by context. The inventive
concepts are not limited to the described order of the operations.
For example, two consecutively described processes may be performed
substantially at the same time or performed in an order opposite to
the described order.
[0049] FIG. 1 is a flow chart illustrating a method of forming a
layer, according to some embodiments of the inventive concepts.
FIGS. 2 to 4 are cross-sectional views illustrating a method of
forming a layer, according to some embodiments of the inventive
concepts.
[0050] Referring to FIGS. 1 and 2, a plurality of insulators may be
provided over a lower structure 30 (S10). The lower structure 30
may include a substrate 10 and a conductive layer 20 disposed on
the substrate 10. The conductive layer 20 may correspond to the
uppermost portion of the lower structure 30. The substrate 10 may
include a selection component such as a transistor or a diode. The
conductive layer 20 may include a conductive material having a
crystal structure.
[0051] The plurality of insulators may include a first insulator 40
and a second insulator 42 which are laterally spaced apart from
each other. In some embodiments, the first insulator 40 and the
second insulator 42 may be spaced apart from each other in a
direction that is parallel to the top surface of the lower
structure 30. Hereinafter, the two insulators 40, 42 will be used
within the description as an example for ease and convenience in
explaining the inventive concepts. However, embodiments of the
inventive concepts are not limited thereto. In certain embodiments,
the number of the insulators may be three or more.
[0052] In some embodiments, the first insulator 40 and the second
insulator 42 may be spaced apart from a top surface of the lower
structure 30 by a first distance d1 and a second distance d2,
respectively. The first distance d1 may be the shortest distance
from the top surface of the lower structure 30 to a central point
of a bottom surface 40a of the first insulator 40, and the second
distance d2 may be the shortest distance from the top surface of
the lower structure 30 to a central point of a bottom surface 42a
of the second insulator 42. In other words, the first distance d1
may be a first perpendicular distance from the top surface of the
lower structure 30 to a midpoint of the bottom surface 40a of the
first insulator 40, and the second distance d2 may be a second
perpendicular distance from the top surface of the lower structure
30 to a midpoint of the bottom surface 42a of the second insulator
42. In some embodiments, each of the first and second distances d1
and d2 may range from about 100 mm to about 300 mm. The first
distance d1 and the second distance d2 may be substantially equal
to each other.
[0053] The bottom surfaces 40a, 42a of the first and second
insulators 40 and 42 may be parallel to a top surface of the
substrate 10 or may be inclined with respect to the top surface of
the substrate 10. In some embodiments, a normal line `a`
perpendicular to the bottom surface 40a of the first insulator 40
may form a first angle .theta.1 with a normal line `c`
perpendicular to the top surface of the substrate 10, and a normal
line `b` perpendicular to the bottom surface 42a of the second
insulator 42 may form a second angle .theta.2 with the normal line
`c` perpendicular to the top surface of the substrate 10. In some
embodiments, each of the first and second angles .theta.1 and
.theta.2 may range from about 0 degrees to about 70 degrees. The
first and second angles .theta.1 and .theta.2 may be substantially
equal to each other. In some embodiments, the first and second
angles .theta.1 and .theta.2 may have magnitudes substantially
equal to each other while one of the angles (e.g. the first angle
.theta.1) may be a positive angle with respect to the normal line
`c` perpendicular to the top surface of the substrate 10 and the
other one of the angles (e.g. the second angle .theta.2) may be a
negative angle with respect to the normal line `c` perpendicular to
the top surface of the substrate 10.
[0054] The first insulator 40 and the second insulator 42 may face
each other over the lower structure 30. However, when the plurality
of insulators includes an odd number of insulators, the insulators
may not face each other.
[0055] The first insulator 40 and the second insulator 42 may
include the same material. Each of the first and second insulators
40 and 42 may include a metal oxide.
[0056] Referring to FIGS. 1 and 3, an insulating layer 50 may be
formed on the lower structure 30 by means of the plurality of
insulators. Forming the insulating layer 50 may include performing
a radio-frequency (RF) sputtering process using the plurality of
insulators as targets.
[0057] In some embodiments, during the sputtering process, ion
sources may be generated from the plurality of insulators (S20).
The ion sources may include a first ion source 44 generated from
the first insulator 40 and a second ion source 46 generated from
the second insulator 42. The first ion source 44 and the second ion
source 46 may include the same or similar elements. For example,
the first ion source 44 and the second ion source 46 may include
the same or similar metal element. Each of the first and second ion
sources 44 and 46 may further include oxygen.
[0058] The first ion source 44 and the second ion source 46 may be
generated by applying a first voltage V1 and a second voltage V2 to
the first insulator 40 and the second insulator 42, respectively.
Each of the first and second voltages V1 and V2 may be an
alternating current (AC) voltage. The first and second voltages V1
and V2 may have the same or similar wave and the same or similar
phase.
[0059] The insulating layer 50 may be formed on the lower structure
30 using the ion sources (S30). Ions from the first ion source 44
and the second ion source 46 may be deposited on the lower
structure 30 to form the insulating layer 50.
[0060] The insulating layer 50 may include the same or similar
material as the first and second insulators 40 and 42. The
insulating layer 50 may include a metal oxide. After the sputtering
process, at least a portion of the insulating layer 50 may be in an
amorphous state.
[0061] Referring to FIGS. 1 and 4, a thermal treatment process 60
may be performed on the insulating layer 50 (S40). For example, the
thermal treatment process 60 may be performed at a temperature of
about 100 degrees Celsius to about 600 degrees Celsius. At least a
portion of the amorphous portions of the insulating layer 50 may be
crystallized by the thermal treatment process 60. Thus, a lattice
of the insulating layer 50 may be matched with a lattice of the
conductive layer 20 having the crystal structure at an interface
between the insulating layer 50 and the conductive layer 20.
[0062] According to some embodiments of the inventive concepts, the
insulating layer 50 may be formed by performing the sputtering
process using as targets the plurality of insulators including the
same or similar material. Thus, a deposition rate of the insulating
layer 50 may be increased during the sputtering process. In some
embodiments, at least a portion of the insulating layer 50 may be
formed in an amorphous state. The amorphous portions in the
insulating layer 50 may be crystallized by the thermal treatment
process 60, and thus the lattice of the insulating layer 50 may be
matched with the lattice of the conductive layer 20 at the
interface between the insulating layer 50 and the conductive layer
20.
[0063] FIG. 5 is a flow chart illustrating a method of
manufacturing magnetic memory devices, according to some
embodiments of the inventive concepts. FIG. 6 is a flow chart
illustrating an operation S110 of FIG. 5. FIGS. 7 to 12 are
cross-sectional views illustrating methods of manufacturing
magnetic memory devices, according to some embodiments of the
inventive concepts. FIG. 13 is a cross-sectional view illustrating
a magnetic tunnel junction pattern according to some embodiments of
the inventive concepts. FIG. 14 is a cross-sectional view
illustrating a magnetic tunnel junction pattern according to some
embodiments of the inventive concepts.
[0064] Referring to FIGS. 5 and 7, a lower interlayer insulating
layer 102 may be formed on a substrate 100. The substrate 100 may
include a semiconductor substrate. For example, the substrate 100
may include a silicon substrate, a germanium substrate, and/or a
silicon-germanium substrate. In some embodiments, selection
components (not shown) may be formed on the substrate 100, and the
lower interlayer insulating layer 102 may be formed to cover the
selection components. In some embodiments, the selection components
may be field effect transistors. In some embodiments, the selection
components may be diodes. The lower interlayer insulating layer 102
may be formed of a single layer or multi-layer including at least
one of an oxide (e.g., silicon oxide), a nitride (e.g., silicon
nitride), and/or an oxynitride (e.g., silicon oxynitride).
[0065] Lower contact plugs 104 may be formed in the lower
interlayer insulating layer 102. Each of the lower contact plugs
104 may penetrate the lower interlayer insulating layer 102 so as
to be connected to one terminal of a corresponding one of the
selection components. The lower contact plugs 104 may include at
least one of a doped semiconductor material (e.g., doped silicon),
a metal (e.g., tungsten, titanium, and/or tantalum), a conductive
metal nitride (e.g., titanium nitride, tantalum nitride, and/or
tungsten nitride), and/or a metal-semiconductor compound (e.g., a
metal silicide).
[0066] A lower electrode layer 106 may be formed on the lower
interlayer insulating layer 102. In some embodiments, the lower
electrode layer 106 may include a conductive metal nitride such as
titanium nitride and/or tantalum nitride. In some embodiments, the
lower electrode layer 106 may include a material (e.g., ruthenium
(Ru)) capable of assisting crystal growth of magnetic layers to be
described later. The lower electrode layer 106 may be formed by a
sputtering process, a chemical vapor deposition (CVD) process, or
an atomic layer deposition (ALD) process.
[0067] A first magnetic layer 110 may be formed on the lower
electrode layer 106 (S100). The first magnetic layer 110 may be a
pinned layer having a magnetization direction fixed in one
direction or may be a free layer having a changeable magnetization
direction.
[0068] In some embodiments, the magnetization direction of the
first magnetic layer 110 may be substantially perpendicular to an
interface between the first magnetic layer 110 and a non-magnetic
layer to be formed on the first magnetic layer 110. In these
embodiments, the first magnetic layer 110 may include at least one
of a perpendicular magnetic material (e.g., CoFeTb, CoFeGd, and/or
CoFeDy), a perpendicular magnetic material having a L1.sub.0
structure, a CoPt alloy having a hexagonal close packed (HCP)
lattice structure, and/or a perpendicular magnetic structure. The
perpendicular magnetic material having the L1.sub.0 structure may
include at least one of FePt having the L1.sub.0 structure, FePd
having the L1.sub.0 structure, CoPd having the L1.sub.0 structure,
and/or CoPt having the L1.sub.0 structure. The perpendicular
magnetic structure may include magnetic layers and non-magnetic
layers that are alternately and repeatedly stacked. For example,
the perpendicular magnetic structure may include at least one of
(Co/Pt)n, (CoFe/Pt)n, (CoFe/Pd)n, (Co/Pd)n, (Co/Ni)n, (CoNi/Pt)n,
(CoCr/Pt)n, and/or (CoCr/Pd)n, where "n" denotes a number of
bilayers.
[0069] In some embodiments, the magnetization direction of the
first magnetic layer 110 may be substantially parallel to the
interface between the first magnetic layer 110 and the non-magnetic
layer to be formed on the first magnetic layer 110. In these
embodiments, the first magnetic layer 110 may include a
ferromagnetic material. When the first magnetic layer 110 is the
pinned layer, the first magnetic layer 110 may further include an
anti-ferromagnetic material for fixing a magnetization direction of
the ferromagnetic material.
[0070] The first magnetic layer 110 may be formed by performing a
physical vapor deposition (PVD) process or a CVD process.
[0071] Referring to FIGS. 5 and 10, a non-magnetic layer 120 may be
formed on the first magnetic layer 110 (S110). The non-magnetic
layer 120 may be a tunnel barrier layer.
[0072] In detail, referring to FIG. 8, a plurality of insulators
may be provided over the substrate 100 having the first magnetic
layer 110. The plurality of insulators may include a first
insulator 40 and a second insulator 42 laterally spaced apart from
each other. In some embodiments, the first insulator 40 and the
second insulator 42 may be spaced apart from each other in a
direction that is parallel to the top surface of the first magnetic
layer 110. The first insulator 40 and the second insulator 42 may
be spaced apart from a top surface of the first magnetic layer 110
by a first distance d1 and a second distance d2, respectively. The
first distance d1 may be the shortest distance from the top surface
of the first magnetic layer 110 to a central point of a bottom
surface 40a of the first insulator 40, and the second distance d2
may be the shortest distance from the top surface of the first
magnetic layer 110 to a central point of a bottom surface 42a of
the second insulator 42. In other words, the first distance d1 may
be a first perpendicular distance from the top surface of the first
magnetic layer 110 to a midpoint of the bottom surface 40a of the
first insulator 40, and the second distance d2 may be a second
perpendicular distance from the top surface of the first magnetic
layer 110 to a midpoint of the bottom surface 42a of the second
insulator 42. In some embodiments, each of the first and second
distances d1 and d2 may range from about 100 mm to about 300 mm.
The first distance d1 and the second distance d2 may be
substantially equal to each other.
[0073] The bottom surfaces 40a, 42a of the first and second
insulators 40 and 42 may be parallel to a top surface of the
substrate 100 or may be inclined with respect to the top surface of
the substrate 100. In some embodiments, a normal line `a`
perpendicular to the bottom surface 40a of the first insulator 40
may form a first angle .theta.1 with a normal line `c`
perpendicular to the top surface of the substrate 100, and a normal
line `b` perpendicular to the bottom surface 42a of the second
insulator 42 may form a second angle .theta.2 with the normal line
`c` perpendicular to the top surface of the substrate 100. In some
embodiments, each of the first and second angles .theta.1 and
.theta.2 may range from about 0 degrees to about 70 degrees. The
first and second angles .theta.1 and .theta.2 may be substantially
equal to each other.
[0074] The first insulator 40 and the second insulator 42 may face
each other over the substrate 100 having the first magnetic layer
110. However, when the plurality of insulators includes an odd
number of insulators, the insulators may not face each other.
[0075] The first insulator 40 and the second insulator 42 may
include the same or similar material. Each of the first and second
insulators 40 and 42 may include a metal oxide. For example, each
of the first and second insulators 40 and 42 may include at least
one of magnesium oxide (MgO), titanium oxide (TiO), aluminum oxide
(AlO), magnesium-zinc oxide (MgZnO), and/or magnesium-boron oxide
(MgBO).
[0076] Referring to FIGS. 6 and 9, a sputtering process using the
plurality of insulators as targets may be performed on the first
magnetic layer 110 (S200). The sputtering process of the operation
5200 may be a radio-frequency (RF) sputtering process.
[0077] Ion sources may be generated from the plurality of
insulators during the sputtering process. The ion sources may
include a first ion source 44 generated from the first insulator 40
and a second ion source 46 generated from the second insulator 42.
The first ion source 44 and the second ion source 46 may include
the same or similar elements. For example, the first ion source 44
and the second ion source 46 may include the same or similar metal
element, and each of the first and second ion sources 44 and 46 may
further include oxygen.
[0078] The first ion source 44 and the second ion source 46 may be
generated by applying a first voltage V1 and a second voltage V2 to
the first insulator 40 and the second insulator 42, respectively.
Each of the first and second voltages V1 and V2 may be an AC
voltage. The first and second voltages V1 and V2 may have the same
or similar wave and the same or similar phase.
[0079] Ions from the first ion source 44 and the second ion source
46 may be deposited on the first magnetic layer 110 to form the
non-magnetic layer 120.
[0080] The non-magnetic layer 120 may include the same or similar
material as the first and second insulators 40 and 42. The
non-magnetic layer 120 may include a metal oxide. For example, the
non-magnetic layer 120 may include at least one of magnesium oxide
(MgO), titanium oxide (TiO), aluminum oxide (AlO), magnesium-zinc
oxide (MgZnO), and/or magnesium-boron oxide (MgBO). After the
sputtering process, at least a portion of the non-magnetic layer
120 may be in an amorphous state.
[0081] Referring to FIGS. 6 and 10, a thermal treatment process 60
may be performed on the deposited non-magnetic layer 120 (S210).
For example, the thermal treatment process 60 may be performed at a
temperature of about 100 degrees Celsius to about 600 degrees
Celsius. At least a portion of the amorphous portion of the
non-magnetic layer 120 may be crystallized by the thermal treatment
process 60. Thus, a lattice of the non-magnetic layer 120 may be
matched with a lattice of the first magnetic layer 110 at an
interface between the first magnetic layer 110 and the non-magnetic
layer 120.
[0082] In general, a magnetic memory device may include a magnetic
tunnel junction pattern including a free layer, a tunnel barrier,
and a pinned layer sequentially stacked on a substrate. Forming the
magnetic tunnel junction pattern may include sequentially
depositing the free layer, the tunnel barrier, and the pinned layer
on a substrate to form a magnetic tunnel junction layer, and
patterning the magnetic tunnel junction layer. The tunnel barrier
may be formed by a sputtering process having a low deposition rate
such that a lattice of the tunnel barrier is matched with a lattice
of the free layer (or the pinned layer) formed under the tunnel
barrier at an interface between the tunnel barrier and the free
layer (or the pinned layer). When using a sputtering process having
a low deposition rate, a tunneling magnetoresistance ratio (TMR) of
the magnetic tunnel junction pattern may be increased, but
productivity of manufacturing the magnetic memory devices may be
reduced by the sputtering process having the low deposition rate.
In other words, it may be difficult to apply the sputtering process
having the low deposition rate to the mass production of magnetic
memory devices.
[0083] However, according to some embodiments of the inventive
concepts, the non-magnetic layer 120 may be formed by performing
the sputtering process using as targets the plurality of insulators
including the same or similar material. Thus, a deposition rate of
the non-magnetic layer 120 may be increased during the sputtering
process. In these embodiments, at least a portion of the
non-magnetic layer 120 may be formed in an amorphous state. In some
embodiments, the amorphous portions of the non-magnetic layer 120
may be crystallized by the thermal treatment process 60. Thus, the
lattices of the non-magnetic layer 120 and the first magnetic layer
110 may be matched with each other at the interface between the
non-magnetic layer 120 and the first magnetic layer 110. In other
words, a tunneling magnetoresistance ratio (TMR) of a magnetic
tunnel junction pattern to be described later may be increased by
the lattice matching at the interface between the non-magnetic
layer 120 and the first magnetic layer 110, and productivity of
manufacturing the magnetic memory devices may be improved by the
sputtering process with an increased deposition rate. In other
words, the embodiments of the inventive concepts may be easily
applied to the mass production of the magnetic memory devices.
[0084] Referring to FIGS. 5 and 11, a second magnetic layer 130 may
be formed on the non-magnetic layer 120 (S120). The second magnetic
layer 130 may be a pinned layer having a magnetization direction
fixed in one direction or may be a free layer having a changeable
magnetization direction. In some embodiments, one of the first and
second magnetic layers 110 and 130 may correspond to the pinned
layer having the magnetization direction fixed in one direction,
and the other of the first and second magnetic layers 110 and 130
may correspond to the free layer having the magnetization direction
changeable to be parallel or anti-parallel to the fixed
magnetization direction of the pinned layer.
[0085] In some embodiments, the magnetization direction of the
second magnetic layer 130 may be substantially perpendicular to an
interface between the non-magnetic layer 120 and the second
magnetic layer 130. In these embodiments, the second magnetic layer
130 may include at least one of a perpendicular magnetic material
(e.g., CoFeTb, CoFeGd, and/or CoFeDy), a perpendicular magnetic
material having a L1.sub.0 structure, a CoPt alloy having a
hexagonal close packed (HCP) lattice structure, and/or a
perpendicular magnetic structure. The perpendicular magnetic
material having the L1.sub.0 structure may include at least one of
FePt having the L1.sub.0 structure, FePd having the L1.sub.0
structure, CoPd having the L1.sub.0 structure, and/or CoPt having
the L1.sub.0 structure. The perpendicular magnetic structure may
include magnetic layers and non-magnetic layers that are
alternately and repeatedly stacked. For example, the perpendicular
magnetic structure may include at least one of (Co/Pt)n,
(CoFe/Pt)n, (CoFe/Pd)n, (Co/Pd)n, (Co/Ni)n, (CoNi/Pt)n, (CoCr/Pt)n,
and/or (CoCr/Pd)n, where "n" denotes a number of bilayers.
[0086] In some embodiments, the magnetization direction of the
second magnetic layer 130 may be substantially parallel to the
interface between the non-magnetic layer 120 and the second
magnetic layer 130. In these embodiments, the second magnetic layer
130 may include a ferromagnetic material. When the second magnetic
layer 130 is the pinned layer, the second magnetic layer 130 may
further include an anti-ferromagnetic material for fixing a
magnetization direction of the ferromagnetic material.
[0087] The second magnetic layer 130 may be formed by performing a
PVD process or a CVD process.
[0088] Thereafter, an upper electrode layer 140 may be formed on
the second magnetic layer 130. The upper electrode layer 140 may
include at least one selected from a group consisting of tungsten,
titanium, tantalum, aluminum, and/or metal nitrides (e.g., titanium
nitride and/or tantalum nitride). The upper electrode layer 140 may
be formed by a sputtering process, a CVD process, or an ALD
process.
[0089] Referring to FIGS. 5 and 12, the second magnetic layer 130,
the non-magnetic layer 120, and the first magnetic layer 110 may be
sequentially patterned to form a magnetic tunnel junction pattern
MTJ (S130). In some embodiments, the upper electrode layer 140 may
be patterned to form an upper electrode 140P. The upper electrode
140P may define a region in which the magnetic tunnel junction
pattern MTJ will be formed. The second magnetic layer 130, the
non-magnetic layer 120, the first magnetic layer 110, and the lower
electrode layer 106 may be sequentially etched using the upper
electrode 140P as an etch mask to form a second magnetic pattern
130P, a non-magnetic pattern 120P, a first magnetic pattern 110P,
and a lower electrode 106P. The magnetic tunnel junction pattern
MTJ may include the first magnetic pattern 110P, the non-magnetic
pattern 120P and the second magnetic pattern 130P which are
sequentially stacked on the lower electrode 106P.
[0090] Each of the upper electrode 140P, the magnetic tunnel
junction pattern MTJ and the lower electrode 106P may be formed in
plurality. The plurality of lower electrodes 106P may be
electrically connected to the plurality of lower contact plugs 104
formed in the lower interlayer insulating layer 102, respectively.
The plurality of magnetic tunnel junction patterns MTJ may be
formed on the plurality of lower electrodes 106P, respectively. The
plurality of upper electrodes 140P may be formed on the plurality
of magnetic tunnel junction patterns MTJ, respectively. Each of the
magnetic tunnel junction patterns MTJ may include the first
magnetic pattern 110P, the non-magnetic pattern 120P and the second
magnetic pattern 130P which are sequentially stacked on each of the
lower electrodes 106P.
[0091] In some embodiments, as illustrated in FIG. 13,
magnetization directions 110a and 130a of the first and second
magnetic patterns 110P and 130P may be substantially parallel to a
contact surface of the non-magnetic pattern 120P and the second
magnetic pattern 130P. FIG. 13 illustrates an embodiment in which
the first magnetic pattern 110P is the pinned layer and the second
magnetic pattern 130P is the free layer. However, embodiments of
the inventive concepts are not limited thereto. Unlike FIG. 13, the
first magnetic pattern 110P may be the free layer and the second
magnetic pattern 130P may be the pinned layer.
[0092] Each of the first and second magnetic patterns 110P and 130P
having the parallel magnetization directions 110a and 130a may
include a ferromagnetic material. The first magnetic pattern 110P
may further include an anti-ferromagnetic material for fixing a
magnetization direction of the ferromagnetic material included in
the first magnetic pattern 110P.
[0093] In some embodiments, as illustrated in FIG. 14,
magnetization directions 110a' and 130a' of the first and second
magnetic patterns 110P and 130P may be substantially perpendicular
to the contact surface between the non-magnetic pattern 120P and
the second magnetic pattern 130P. FIG. 14 illustrates an embodiment
in which the first magnetic pattern 110P is the pinned layer and
the second magnetic pattern 130P is the free layer. However,
embodiments of the inventive concepts are not limited thereto.
Unlike FIG. 14, the first magnetic pattern 110P may be the free
layer and the second magnetic pattern 130P may be the pinned
layer.
[0094] Each of the first and second magnetic patterns 110P and 130P
having the perpendicular magnetization directions 110a' and 130a'
may include at least one of a perpendicular magnetic material
(e.g., CoFeTb, CoFeGd, and/or CoFeDy), a perpendicular magnetic
material having a L1.sub.0 structure, a CoPt alloy having a
hexagonal close packed (HCP) lattice structure, and/or a
perpendicular magnetic structure. The perpendicular magnetic
material having the L1.sub.0 structure may include at least one of
FePt having the L1.sub.0 structure, FePd having the L1.sub.0
structure, CoPd having the L1.sub.0 structure, and/or CoPt having
the L1.sub.0 structure. The perpendicular magnetic structure may
include magnetic layers and non-magnetic layers that are
alternately and repeatedly stacked. For example, the perpendicular
magnetic structure may include at least one of (Co/Pt)n,
(CoFe/Pt)n, (CoFe/Pd)n, (Co/Pd)n, (Co/Ni)n, (CoNi/Pt)n, (CoCr/Pt)n,
and/or (CoCr/Pd)n, where "n" denotes a number of bilayers.
[0095] Referring again to FIG. 12, an upper interlayer insulating
layer 170 may be formed on the lower interlayer insulating layer
102. The upper interlayer insulating layer 170 may cover the lower
electrode 106P, the magnetic tunnel junction pattern MTJ, and the
upper electrode 140P. The upper interlayer insulating layer 170 may
be a single layer or a multi-layer. For example, the upper
interlayer insulating layer 170 may include at least one of an
oxide layer (e.g., a silicon oxide layer), a nitride layer (e.g., a
silicon nitride layer), and/or an oxynitride layer (e.g., silicon
oxynitride layer).
[0096] An upper contact plug 150 may be formed in the upper
interlayer insulating layer 170. The upper contact plug 150 may be
connected to the upper electrode 140P. In some embodiments, forming
the upper contact plug 150 may include forming a contact hole
exposing the upper electrode 140P in the upper interlayer
insulating layer 170, and forming the upper contact plug 150 in the
contact hole.
[0097] An interconnection 160 may be formed on the upper interlayer
insulating layer 170. The interconnection 160 may extend in one
direction and may be electrically connected to a plurality of the
magnetic tunnel junction patterns MTJ arranged in the one
direction. The magnetic tunnel junction patterns MTJ may be
electrically connected to the interconnection 160 through a
corresponding one of the upper electrodes 140P and the upper
contact plug 150 connected to the corresponding upper electrode
140P. In some embodiments, the interconnection 160 may function as
a bit line.
[0098] According to some embodiments of the inventive concepts, the
non-magnetic layer may be formed by performing the sputtering
process using the plurality of insulators including the same or
similar material as the targets. Thus, the deposition rate of the
non-magnetic layer may be increased during the sputtering process.
In some embodiments, at least a portion of the non-magnetic layer
may be formed in an amorphous state. In some embodiments, the
amorphous portions of the non-magnetic layer may be crystallized by
the thermal treatment process. Thus, the lattice of the
non-magnetic layer may be matched with the lattice of the magnetic
layer disposed under the non-magnetic layer at the interface
between the non-magnetic layer and the magnetic layer. In other
words, the TMR of the magnetic tunnel junction pattern including
the non-magnetic layer and the magnetic layer may be increased by
the lattice matching at the interface between the non-magnetic
layer and the magnetic layer, and the productivity of manufacturing
the magnetic memory devices may be improved by the sputtering
process of which the deposition rate is increased. In other words,
the embodiments of the inventive concepts may be easily applied to
the mass production of the magnetic memory devices.
[0099] As a result, the mass production of magnetic memory devices
with excellent reliability may be possible.
[0100] According to some embodiments of the inventive concepts, the
lattice of a layer may be matched with the lattice of the
underlying layer, and the deposition rate of the layer may be
increased.
[0101] When the tunnel barrier layer of the magnetic tunnel
junction pattern is formed by methods of forming layers according
to some embodiments of the inventive concepts, the mass production
of magnetic memory devices with excellent reliability may be
possible.
[0102] While the inventive concepts have been described with
reference to example embodiments, it will be apparent to those
skilled in the art that various changes and modifications may be
made without departing from the spirit and scope of the inventive
concepts. Therefore, it should be understood that the above
embodiments are not limiting, but illustrative. Thus, the scope of
the inventive concepts are to be determined by the broadest
permissible interpretation of the following claims and their
equivalents, and shall not be restricted or limited by the
foregoing description.
* * * * *