U.S. patent application number 14/960712 was filed with the patent office on 2016-10-20 for high density resistive random access memory (rram).
This patent application is currently assigned to STMicroelectronics, Inc.. The applicant listed for this patent is STMicroelectronics, Inc.. Invention is credited to Qing Liu, John Hongguang Zhang.
Application Number | 20160308128 14/960712 |
Document ID | / |
Family ID | 55589091 |
Filed Date | 2016-10-20 |
United States Patent
Application |
20160308128 |
Kind Code |
A1 |
Liu; Qing ; et al. |
October 20, 2016 |
HIGH DENSITY RESISTIVE RANDOM ACCESS MEMORY (RRAM)
Abstract
A resistive random access memory (RRAM) structure is formed on a
supporting substrate and includes a first electrode and a second
electrode. The first electrode is made of a silicided fin on the
supporting substrate and a first metal liner layer covering the
silicided fin. A layer of dielectric material having a configurable
resistive property covers at least a portion of the first metal
liner. The second electrode is made of a second metal liner layer
covering the layer of dielectric material and a metal fill in
contact with the second metal liner layer. A non-volatile memory
cell includes the RRAM structure electrically connected between an
access transistor and a bit line.
Inventors: |
Liu; Qing; (Irvine, CA)
; Zhang; John Hongguang; (Fishkill, NY) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
STMicroelectronics, Inc. |
Coppell |
TX |
US |
|
|
Assignee: |
STMicroelectronics, Inc.
Coppell
TX
|
Family ID: |
55589091 |
Appl. No.: |
14/960712 |
Filed: |
December 7, 2015 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
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14688597 |
Apr 16, 2015 |
9305974 |
|
|
14960712 |
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Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 45/1253 20130101;
H01L 45/08 20130101; H01L 45/16 20130101; H01L 27/2463 20130101;
H01L 27/2436 20130101; H01L 45/1233 20130101; H01L 45/1691
20130101; H01L 45/145 20130101; H01L 45/1633 20130101; H01L 45/1616
20130101; H01L 45/146 20130101; H01L 23/528 20130101 |
International
Class: |
H01L 45/00 20060101
H01L045/00; H01L 27/24 20060101 H01L027/24 |
Claims
1. A method, comprising: patterning a bulk semiconductor substrate
to form a semiconductor fin supported by a substrate; siliciding
the semiconductor fin to produce a silicided semiconductor fin;
depositing a first metal liner layer covering said silicided
semiconductor fin; depositing a layer of dielectric material having
a configurable resistive property covering said first metal liner;
depositing a second metal liner layer covering said layer of
dielectric material; depositing a metal fill on each side of the
silicided semiconductor fin in contact with the second metal liner
layer; making electrical contact to the first metal liner layer and
silicided semiconductor fin to provide a first electrode of a
resistive random access memory (RRAM) structure; and making
electrical contact to the metal fill and second metal liner layer
to provide a second electrode of the RRAM structure.
2. The method of claim 1, further comprising: recessing the layer
of dielectric material, second metal liner layer and metal fill to
a height below a top surface of the silicided semiconductor fin;
and forming sidewall spacers on each side of an upper portion the
silicided semiconductor fin in contact with the first metal liner
layer.
3. The method of claim 1, further comprising: depositing a
premetallization dielectric; forming a first contact extending
through the premetallization dielectric layer to electrically
connect to the first metal liner layer at a top surface of the
silicided semiconductor fin; and forming a second contact extending
through the premetallization dielectric layer to electrically
connect to the metal fill and second metal liner layer.
4. The method of claim 1, wherein the layer of dielectric material
is made of hafnium oxide.
5. The method of claim 1, further comprising: fabricating an
integrated circuit transistor supported by said substrate; and
electrically connecting the integrated circuit transistor to one of
the first or second electrodes.
6. A method, comprising: patterning a bulk semiconductor substrate
to form a semiconductor fin supported by a substrate; siliciding
the semiconductor fin to produce a fully-silicided semiconductor
fin; depositing a first metal liner layer covering said
fully-silicided semiconductor fin; depositing a layer of dielectric
material having a configurable resistive property covering said
first metal liner; depositing a second metal liner layer covering
said layer of dielectric material; depositing a metal fill on each
side of the fully-silicided semiconductor fin in contact with the
second metal liner layer; making electrical contact to the first
metal liner layer and fully-silicided semiconductor fin to provide
a first electrode of a resistive random access memory (RRAM)
structure; and making electrical contact to the metal fill and
second metal liner layer to provide a second electrode of the RRAM
structure.
7. The method of claim 6, further comprising: recessing the layer
of dielectric material, second metal liner layer and metal fill to
a height below a top surface of the fully-silicided semiconductor
fin; and forming sidewall spacers on each side of an upper portion
the fully-silicided semiconductor fin in contact with the first
metal liner layer.
8. The method of claim 6, further comprising: depositing a
premetallization dielectric; forming a first contact extending
through the premetallization dielectric layer to electrically
connect to the first metal liner layer at a top surface of the
fully-silicided semiconductor fin; and forming a second contact
extending through the premetallization dielectric layer to
electrically connect to the metal fill and second metal liner
layer.
9. The method of claim 6, wherein the layer of dielectric material
is made of hafnium oxide.
10. The method of claim 6, wherein said supporting substrate is of
a silicon on insulator (SOI) type.
11. The method of claim 6, further comprising: fabricating an
integrated circuit transistor supported by said substrate; and
electrically connecting the integrated circuit transistor to one of
the first or second electrodes.
12. A method, comprising: patterning a bulk semiconductor substrate
to form a semiconductor fin supported by a substrate; siliciding
the semiconductor fin to produce a silicided semiconductor fin;
depositing a layer of dielectric material having a configurable
resistive property over the silicided semiconductor fin; depositing
a metal material over the layer of dielectric material; making
electrical contact to the silicided semiconductor fin to provide a
first electrode of a resistive random access memory (RRAM)
structure; and making electrical contact to the metal material to
provide a second electrode of the RRAM structure.
13. The method of claim 12, further comprising: recessing the layer
of dielectric material and metal material to a height below a top
surface of the silicided semiconductor fin; and forming sidewall
spacers on each side of an upper portion the silicided
semiconductor fin.
14. The method of claim 12, further comprising: depositing a
premetallization dielectric; forming a first contact extending
through the premetallization dielectric layer to electrically
connect to the silicided semiconductor fin; and forming a second
contact extending through the premetallization dielectric layer to
electrically connect to the metal material.
15. The method of claim 14, further comprising: fabricating an
integrated circuit transistor supported by said substrate; and
electrically connecting the integrated circuit transistor to one of
the first or second electrodes.
16. The method of claim 12, wherein the layer of dielectric
material is made of hafnium oxide.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a divisional application from U.S.
patent application Ser. No. 14/688,597 filed Apr. 16, 2015, the
disclosure of which is incorporated by reference.
TECHNICAL FIELD
[0002] The present invention relates to integrated circuits and, in
particular, to a semiconductor non-volatile memory of the resistive
random access memory (RRAM) type.
BACKGROUND
[0003] With respect to non-volatile integrated circuit memory
devices, resistive random access memory (RRAM) is an emerging
technology. An RRAM device is a memory structure which stores a bit
of data using resistance values (rather than electronic charge).
Each RRAM cell includes a layer of resistive material whose
resistance value can be changed to represent the storage of a logic
"0" or a logic "1" bit of data. The resistive material, typically
in the form of a dielectric layer, can be made to conduct through a
filament or conduction path formed by the application of a first
programming voltage across the dielectric layer. In the conductive
state, the cell is programmed to store one of the logic "0" or
logic "1" data values. The filament or conduction path may be
reset, rendering the dielectric layer non-conductive, by the
application of a second programming voltage across the dielectric
layer. In the non-conductive state, the cell is programmed to store
the other of the logic "0" or logic "1" data values.
[0004] There is a need in the art to provide an RRAM cell structure
suitable to high density applications.
SUMMARY
[0005] In an embodiment, a non-volatile integrated circuit memory
cell comprises: a supporting substrate; a resistive random access
memory structure comprising: a first electrode, comprising: a
silicided semiconductor fin on said supporting substrate; and a
first metal liner layer covering said silicided semiconductor fin;
a layer of dielectric material having a configurable resistive
property and covering at least a portion of said first metal liner;
and a second electrode, comprising: a second metal liner layer
covering said layer of dielectric material; and a metal fill in
contact with the second metal liner layer; a transistor having a
first source-drain terminal connected to one of the first and
second electrodes; a source line connected to a second source-drain
terminal of the transistor; a word line connected to a gate
terminal of the transistor; and a bit line connected to another of
the first and second electrodes.
[0006] In an embodiment, a resistive random access memory (RRAM)
structure comprises: a supporting substrate; a first electrode,
comprising: a silicided semiconductor fin on said supporting
substrate; and a first metal liner layer covering said silicided
semiconductor fin; a layer of dielectric material having a
configurable resistive property and covering at least a portion of
said first metal liner; and a second electrode, comprising: a
second metal liner layer covering said layer of dielectric
material; and a metal fill in contact with the second metal liner
layer.
[0007] In an embodiment, a method comprises: patterning a bulk
semiconductor substrate to form a semiconductor fin supported by a
substrate; siliciding the semiconductor fin to produce a silicided
semiconductor fin; depositing a first metal liner layer covering
said silicided semiconductor fin; depositing a layer of dielectric
material having a configurable resistive property covering said
first metal liner; depositing a second metal liner layer covering
said layer of dielectric material; depositing a metal fill on each
side of the silicided semiconductor fin in contact with the second
metal liner layer; making electrical contact to the first metal
liner layer and silicided semiconductor fin to provide a first
electrode of a resistive random access memory (RRAM) structure; and
making electrical contact to the metal fill and second metal liner
layer to provide a second electrode of the RRAM structure.
[0008] In an embodiment, a method comprises: patterning a bulk
semiconductor substrate to form a semiconductor fin supported by a
substrate; siliciding the semiconductor fin to produce a
fully-silicided semiconductor fin; depositing a first metal liner
layer covering said fully-silicided semiconductor fin; depositing a
layer of dielectric material having a configurable resistive
property covering said first metal liner; depositing a second metal
liner layer covering said layer of dielectric material; depositing
a metal fill on each side of the fully-silicided semiconductor fin
in contact with the second metal liner layer; making electrical
contact to the first metal liner layer and fully-silicided
semiconductor fin to provide a first electrode of a resistive
random access memory (RRAM) structure; and making electrical
contact to the metal fill and second metal liner layer to provide a
second electrode of the RRAM structure.
[0009] In an embodiment, a method comprises: patterning a bulk
semiconductor substrate to form a semiconductor fin supported by a
substrate; siliciding the semiconductor fin to produce a silicided
semiconductor fin; depositing a layer of dielectric material having
a configurable resistive property over the silicided semiconductor
fin; depositing a metal material over the layer of dielectric
material; making electrical contact to the silicided semiconductor
fin to provide a first electrode of a resistive random access
memory (RRAM) structure; and making electrical contact to the metal
material to provide a second electrode of the RRAM structure.
BRIEF DESCRIPTION OF THE DRAWINGS
[0010] For a better understanding of the embodiments, reference
will now be made by way of example only to the accompanying figures
in which:
[0011] FIGS. 1-11 illustrate process steps in the formation of a
resistive random access memory (RRAM) structure for use in a
non-volatile memory cell;
[0012] FIG. 12 is a schematic diagram of a non-volatile memory cell
incorporating the RRAM structure; and
[0013] FIGS. 13-23 illustrate process steps in the formation of an
RRAM structure for use in a non-volatile memory cell.
DETAILED DESCRIPTION OF THE DRAWINGS
[0014] Reference is now made to FIGS. 1-11 which illustrate the
process steps in the formation of a resistive random access memory
(RRAM) structure for use in a non-volatile memory cell. It will be
understood that the drawings do not necessarily show features drawn
to scale.
[0015] FIG. 1 shows a silicon on insulator (SOI) semiconductor
substrate 10 comprising a semiconductor substrate 12, an insulating
layer 14 and a semiconductor layer 16 in a stack. The semiconductor
layer 16 may be doped in accordance with the application, or
alternatively may be un-doped in which case the SOI substrate 10 is
of the "fully-depleted" type. The semiconductor layer 16 may, for
example, have a thickness of 35-50 nm. The insulating layer 14 is
commonly referred to in the art as a buried oxide (BOX) layer.
[0016] A hard mask 30 comprising a layer of silicon dioxide
(SiO.sub.2) 32 and a layer of silicon nitride (SiN) 34 is then
deposited on the semiconductor layer 16. The silicon dioxide layer
32 may, for example, be deposited using a chemical vapor deposition
(CVD) process with a thickness of, for example, approximately 3-10
nm. The silicon nitride layer 34 may, for example, be deposited
using a chemical vapor deposition (CVD) process with a thickness
of, for example, approximately 20-40 nm. The result is shown in
FIG. 2.
[0017] A lithographic process as known in the art is then used to
define a plurality of fins 100 from the semiconductor layer 16. The
hard mask 30 is patterned to leave mask material 36 at the desired
locations of the fins 100. An etching operation is then performed
through the mask to open apertures 102 on each side of each fin
100. In a preferred embodiment, the etch which defines the fins 100
extends to a depth which reaches the insulating layer 14. The fins
100 may have a width (w) of 6-12 nm and a pitch (p) of 25-45 nm
(with a spacing between adjacent fins of 15-35 nm). The result of
the etching process is shown in FIG. 3.
[0018] Outside of an area 18 where the fins 100 are located, the
insulation such as for the shallow trench isolation (STI) is
elevated as shown at reference 20. This may, for example, be
accomplished by depositing a flowable oxide on the substrate
followed by patterning and removal of the oxide deposit in the area
18 of the fins 100. The mask material 36 is also removed. The
result is shown in FIG. 4.
[0019] A layer 110 of nickel-platinum (NiPt) is then deposited to
cover the fins 100 as shown in FIG. 5. The layer 110 may, for
example, have a thickness of 3-10 nm. An anneal is then performed
(for example, at 400.degree. C. with an optional laser anneal at
800.degree. C.). The anneal converts at least a portion of the
silicon material of the fins 100 to a metal silicide (for example,
NiSi.sub.x) so as to convert the silicon fin material to form
silicided fins 112. The unreacted portion of the layer 110
following the anneal is removed. In an embodiment, the dimensions
of the fin 100, the thickness of the layer 110, the materials used
and the characteristics of the anneal performed are selected so
that the silicided fins 112 are fully-silicided structures (in such
a case, all of the semiconductor material of fin 100 is converted
to silicide). The result is shown in FIG. 6. The silicided fin 112
provides one electrode of the RRAM structure.
[0020] Using a chemical vapor deposition (CVD) process, a liner
layer 120 of a metal material (such as, for example, titanium
nitride TiN) is deposited to cover the silicided fins 112 and the
insulating layer 14. The layer 120 may, for example, have a
thickness of 5-10 nm. Using an atomic layer deposition (ALD)
process, a layer 122 of a dielectric material (such as, for
example, hafnium oxide HfO.sub.2) is deposited to cover the metal
layer 120. A patterning operation is performed to provide for
removal of the layers 120 and 122 outside of the area 18. The
result is shown in FIG. 7 which now focuses on the area 18. The
layer 120 assists in the formation of a low resistivity state
across the dielectric layer 122 for the RRAM operation.
[0021] Using a chemical vapor deposition (CVD) process, a liner
layer 124 of a metal material (such as, for example, titanium
nitride TiN) is deposited to cover the layer 122. The layer 124
may, for example, have a thickness of 5-10 nm. The area 18 is then
filled with a metal material (such as, for example, tungsten) to
provide a metal fill 126. A chemical-mechanical polishing (CMP)
operation is performed to planarize the top surface of the fill 126
at a level which is coplanar with the layer 124. The result is
shown in FIG. 8. The layer 124 assists in the formation of a low
resistivity state across the dielectric layer 122 for the RRAM
operation. The metal fill 126 provides another electrode of the
RRAM structure.
[0022] A wet etch process is then used to recess the top surface of
the metal fill 126 to a level below the top surface of the
silicided fins 112. The depth d of this recess operation may, for
example, be 10-20 nm. The portion of the layer 124 located above
the top surface of the recessed metal fill 126' is also removed
(for example, using a wet stripping process). The portion of the
layer 122 located above the top surface of the recessed metal fill
126' is also removed (for example, using a wet stripping process).
The result is shown in FIG. 9.
[0023] A conformal insulating material deposit is then made with a
subsequent directional etch performed to define sidewall spacers
130 on the side surfaces of the layer 120 on each side of the
silicided fins 112. The result is shown in FIG. 10.
[0024] Conventional back end of line (BEOL) processes are then
performed to deposit and planarize the premetallization dielectric
(PMD) layer 140 and form metal contacts 150 and 152. The result is
shown in FIG. 11. One or more metallization layers may then be
provided above the PMD layer 140 to assist with making circuit
interconnections to the contacts 150 and 152.
[0025] A resistive random access memory structure 200 is
accordingly formed to include a first metal plate or electrode
(layer 120 on silicided fin 112), a dielectric layer 122, and a
second metal plate (layer 124 and recessed fill 126'). It will be
noted that the structure 200 is comprised of two fins 112, but this
is by example only, it being understood that each structure 200 may
be formed from the patterning and siliciding of any suitable number
of fins 112. The structure 200 may be included in a non-volatile
memory cell 202 as schematically shown in FIG. 12. The cell 202
includes a transistor 204 having a first source-drain region
connected to the first metal plate of structure 200 through contact
152 and a second source-drain region connected to a source line SL.
The transistor 204 may be supported by and integrated within the
substrate 10, with the transistor fabricated prior to or
contemporaneously with the fabrication of the structure 200 using
well-known transistor fabrication techniques. A word line (WL) for
the cell 202 is connected to a gate terminal of the transistor 204.
A bit line (BL) for the cell 202 is connected to the second metal
plate of structure 200 through contact 150. The source line, word
line and bit line may be provided using (and/or coupled to) the
metallization layers.
[0026] The structure formed supports high density RRAM fabrication
because of the use of fins.
[0027] Operation of the RRAM structure in a memory cell is as
follows: when the word line is set to logic high, the transistor
204 is turned on. The source line is pre-set to logic high. If the
bit line voltage is set to >0.85V, a conduction filament is
formed in the hafnium oxide dielectric layer. Current rises and the
cell enters the low resistive state. The source line is then
discharged and the voltage reduces. When the bit line voltage is
set lower than -1.25V (which is the reset voltage), and when the
word line is set to logic high, the conduction filament dissolves
and the cell returns to the high resistive state.
[0028] Reference is now made to FIGS. 13-23 which illustrate the
process steps in the formation of an RRAM structure for use in a
non-volatile memory cell. It will be understood that the drawings
do not necessarily show features drawn to scale.
[0029] FIG. 13 shows a bulk semiconductor substrate 10' comprising
a semiconductor layer 16'. The semiconductor layer 16' may be doped
in accordance with the application, or alternatively may be
un-doped. The semiconductor layer 16' may, for example, have a
thickness of 30-80 nm.
[0030] A hard mask 30 comprising a layer of silicon dioxide
(SiO.sub.2) 32 and a layer of silicon nitride (SiN) 34 is then
deposited on the semiconductor layer 16'. The silicon dioxide layer
32 may, for example, be deposited using a chemical vapor deposition
(CVD) process with a thickness of, for example, approximately 3-10
nm. The silicon nitride layer 34 may, for example, be deposited
using a chemical vapor deposition (CVD) process with a thickness
of, for example, approximately 20-40 nm. The result is shown in
FIG. 14.
[0031] A lithographic process as known in the art is then used to
define a plurality of fins 100' from an upper portion of the
semiconductor layer 16'. The hard mask 30 is patterned to leave
mask material 36 at the desired locations of the fins 100'. An
etching operation is then performed through the mask to open
apertures 102' on each side of each fin 100'. In a preferred
embodiment, the etch which defines the fins 100' extends to a depth
of 35-50 nm from the top surface of the semiconductor layer 16'.
The fins 100 may have a width (w) of 6-12 nm and a pitch (p) of
25-45 nm (with a spacing between adjacent fins of 15-35 nm). The
result of the etching process is shown in FIG. 15.
[0032] A deposit of a flowable oxide material is made and then
planarized using a chemical-mechanical polishing (CMP) process.
Within an area 18 where the fins 100 are located, the flowable
oxide material deposit is recessed using a dry etch process to
leave an insulating layer 22 surrounding a bottom portion 114 of
the fins 100'. Outside of the area 18, the insulation is elevated
as shown at reference 20. The mask material 36 is also removed. The
result is shown in FIG. 16.
[0033] A layer 110 of nickel-platinum (NiPt) is then deposited to
cover the fins 100' as shown in FIG. 17. The layer 110 may, for
example, have a thickness of 3-10 nm. An anneal is then performed
(for example, at 400.degree. C. with an optional laser anneal at
800.degree. C.). The anneal converts at least a portion of the
silicon material in an upper portion 113 of the fins 100' to a
metal silicide (for example, NiSi.sub.x) so as to convert the
silicon fin material to form silicided fins 112'. The unreacted
portion of the layer 110 is removed. In an embodiment, the
dimensions of the fin 100', the thickness of the layer 110',
materials used and characteristics of the anneal performed are
selected so that the silicided fins 112' are fully-silicided
structures (in such a case, all of the semiconductor material of
fin 100' in the upper portion 113 is converted to silicide). The
result is shown in FIG. 18. It will be noted that the bottom
portion 114 of the fin 100' made of non-silicided semiconductor
material remains to support each fin 112'. The silicided fin 112'
provides one electrode of the RRAM structure.
[0034] Using a chemical vapor deposition (CVD) process, a liner
layer 120 of a metal material (such as, for example, titanium
nitride TiN) is deposited to cover the silicided fins 112' and the
insulating layer 22. The layer 120 may, for example, have a
thickness of 5-10 nm. Using an atomic layer deposition (ALD)
process, a layer 122 of a dielectric material (such as, for
example, hafnium oxide HfO.sub.2) is deposited to cover the metal
layer 120. A patterning operation is performed to permit removal of
the layers 120 and 122 outside of the area 18. The result is shown
in FIG. 19 which now focuses on the area 18. The layer 120 assists
in the formation of a low resistivity state across the dielectric
layer 122 for the RRAM operation.
[0035] Using a chemical vapor deposition (CVD) process, a liner
layer 124 of a metal material (such as, for example, titanium
nitride TiN) is deposited to cover the layer 122. The layer 124
may, for example, have a thickness of 5-10 nm. The area 18 is then
filled with a metal material (such as, for example, tungsten) to
provide a metal fill 126. A chemical-mechanical polishing (CMP)
operation is performed to planarize the top surface of the fill 126
at a level which is coplanar with the layer 124. The result is
shown in FIG. 20. The layer 124 assists in the formation of a low
resistivity state across the dielectric layer 122 for the RRAM
operation. The metal fill 126 provides another electrode of the
RRAM structure.
[0036] A wet etch process is then used to recess the top surface of
the metal fill 126 to a level below the top surface of the
silicided fins 112'. The depth d of this recess operation may, for
example, be 10-20 nm. The portion of the layer 124 located above
the top surface of the recessed metal fill 126' is also removed
(for example, using a wet stripping process). The portion of the
layer 122 located above the top surface of the recessed metal fill
126' is also removed (for example, using a wet stripping process).
The result is shown in FIG. 21.
[0037] A conformal insulating material deposit is then made with a
subsequent directional etch performed to define sidewall spacers
130 on the side surfaces of the layer 120 on each side of the
silicided fins 112'. The result is shown in FIG. 22.
[0038] Conventional back end of line (BEOL) processes are then
performed to deposit and planarize the premetallization dielectric
(PMD) layer 140 and form metal contacts 150 and 152. The result is
shown in FIG. 23. One or more metallization layers may then be
provided above the PMD layer 140 to assist with making circuit
interconnections to the contacts 150 and 152.
[0039] A resistive random access memory structure 200 is
accordingly formed to include a first metal plate (layer 120 on
silicided fin 112'), a dielectric layer 122, and a second metal
plate (layer 124 and recessed fill 126'). It will be noted that the
structure 200 is comprised of two fins 112', but this is by example
only, it being understood that each structure 200 may be formed
from the patterning and siliciding of any suitable number of fins
112'. The structure 200 may be included in a non-volatile memory
cell 202 as schematically shown in FIG. 12 (previously
described).
[0040] The foregoing description has provided by way of exemplary
and non-limiting examples a full and informative description of the
exemplary embodiment of this invention. However, various
modifications and adaptations may become apparent to those skilled
in the relevant arts in view of the foregoing description, when
read in conjunction with the accompanying drawings and the appended
claims. However, all such and similar modifications of the
teachings of this invention will still fall within the scope of
this invention as defined in the appended claims.
* * * * *