U.S. patent application number 14/842316 was filed with the patent office on 2016-07-21 for brushless rotary plasma electrode structure and film coating system.
This patent application is currently assigned to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE. The applicant listed for this patent is INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE. Invention is credited to Chia-Hao CHANG, Kuang-Yu LIN, Shih-Chin LIN.
Application Number | 20160208403 14/842316 |
Document ID | / |
Family ID | 56361495 |
Filed Date | 2016-07-21 |
United States Patent
Application |
20160208403 |
Kind Code |
A1 |
LIN; Shih-Chin ; et
al. |
July 21, 2016 |
BRUSHLESS ROTARY PLASMA ELECTRODE STRUCTURE AND FILM COATING
SYSTEM
Abstract
A brushless rotary plasma electrode structure is disclosed. The
brushless rotary plasma electrode structure includes a main body, a
plurality of guided portions, and a plurality of conducting-through
members. The main body further includes a plurality of electrode
portions that have a first salient portion furnished at the
periphery thereof. The guided portion is penetrated through the
electrode portion. Each of the conducting-through members further
includes a second salient portion. There is an internal in both the
first salient portion and the second salient portion. In addition,
a film coating system is also provided.
Inventors: |
LIN; Shih-Chin; (New Taipei
City, TW) ; CHANG; Chia-Hao; (Hsinchu County, TW)
; LIN; Kuang-Yu; (Taoyuan City, TW) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
Hsin-Chu |
|
TW |
|
|
Assignee: |
INDUSTRIAL TECHNOLOGY RESEARCH
INSTITUTE
Hsin-Chu
TW
|
Family ID: |
56361495 |
Appl. No.: |
14/842316 |
Filed: |
September 1, 2015 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01J 37/32532 20130101;
H01J 37/32577 20130101; H01J 37/32568 20130101; H01J 37/32082
20130101 |
International
Class: |
C25D 17/10 20060101
C25D017/10 |
Foreign Application Data
Date |
Code |
Application Number |
Jan 16, 2015 |
TW |
104101506 |
Claims
1. A brushless rotary plasma electrode structure, comprising: A
main body being rotating with respect to an axis further comprising
a plurality of electrode portions that are disposed at intervals,
and the electrode portions have a first salient portion furnished
at the periphery thereof; A plurality of guided portions
penetrating through those electrode portions; and A plurality of
conducting-through members, each of them further comprising a
second salient portion having a first interval between thereof and
its corresponding the first salient portion.
2. The brushless rotary plasma electrode structure in claim 1,
further comprising a RF generator coupling with the corresponding
conducting-through member.
3. The brushless rotary plasma electrode structure in claim 1,
further comprising an isolation portion positioned between the
electrode portions.
4. The brushless rotary plasma electrode structure in claim 1,
wherein one end of each of the conducting-through members appears
in fin shape, and the periphery of each of the electrode portions
also appears in fin shape; the second salient portion is positioned
between the two corresponding first salient portions.
5. The brushless rotary plasma electrode structure in claim 1,
wherein one end of each of the conducting-through members appears
in fin shape, and the periphery of each of the electrode portions
also appears in fin shape; the first salient portion is positioned
between the two corresponding second salient portions.
6. The brushless rotary plasma electrode structure in claim 1,
wherein each of the conducting-through members is positioned
between the two corresponding first salient portions, and each of
the first salient portion covers a portion of the
conducting-through member; the first salient portion does not
contact with the conducting-through member.
7. The brushless rotary plasma electrode structure in claim 1,
wherein one end of each of the conducting-through member being
appearing in shape has its second salient portion cover a portion
of the first salient portion, and the second salient portion does
not contact the first salient portion.
8. The brushless rotary plasma electrode structure in claim 1,
wherein one end of each of the conducting-through member being
appearing in shape, the electrode portion is positioned between the
two corresponding second salient portions; each of the second
salient portion covers a portion of the electrode portion, and the
second salient portion does not contact with the electrode
portion.
9. The brushless rotary plasma electrode structure in claim 1,
wherein there is a second interval between each of the
conducting-through member and the corresponding electrode portion,
and the dimension of the second interval is greater than 2 mm.
10. The brushless rotary plasma electrode structure in claim 1,
wherein the first salient portion is formed by putting a
ring-shaped plate on the electrode portion.
11. The brushless rotary plasma electrode structure in claim 1,
wherein the first salient portion is formed by mechanically working
by channel milling.
12. The brushless rotary plasma electrode structure in claim 1,
wherein the dimension of the first interval is less than 2 mm.
13. A film coating system, comprising: A brushless rotary plasma
electrode structure, further comprising: A main body being rotating
with respect to an axis further comprising a plurality of electrode
portions that are disposed at intervals, and the electrode portions
have a first salient portion furnished at the periphery thereof; A
plurality of guided portions penetrating through those electrode
portions; and A plurality of conducting-through members, each of
them further comprising a second salient portion having a first
interval between thereof and its corresponding first salient
portion.
14. The brushless rotary plasma electrode structure in claim 13,
further comprising a RF generator coupling with the corresponding
conducting-through member.
15. The brushless rotary plasma electrode structure in claim 13,
further comprising an isolation portion positioned between the
electrode portions.
16. The brushless rotary plasma electrode structure in claim 13,
wherein one end of each of the conducting-through members appears
in fin shape, and the periphery of each of the electrode portions
also appears in fin shape; the second salient portion is positioned
between the two corresponding first salient portions.
17. The brushless rotary plasma electrode structure in claim 13,
wherein one end of each of the conducting-through members appears
in fin shape, and the periphery of each of the electrode portions
also appears in fin shape; the first salient portion is positioned
between the two corresponding second salient portions.
18. The brushless rotary plasma electrode structure in claim 13,
wherein each of the conducting-through members is positioned
between the two corresponding first salient portions, and each of
the first salient portion covers a portion of the
conducting-through member; the first salient portion does not
contact with the conducting-through member.
19. The brushless rotary plasma electrode structure in claim 1,
wherein one end of each of the conducting-through member being
appearing in shape has its second salient portion cover a portion
of the first salient portion, and the second salient portion does
not contact the first salient portion.
20. The brushless rotary plasma electrode structure in claim 13,
wherein one end of each of the conducting-through member being
appearing in shape, the electrode portion is positioned between the
two corresponding second salient portions; each of the second
salient portion covers a portion of the electrode portion, and the
second salient portion does not contact with the electrode
portion.
21. The brushless rotary plasma electrode structure in claim 13,
wherein there is a second interval between each of the
conducting-through member and the corresponding electrode portion,
and the dimension of the second interval is greater than 2 mm.
22. The brushless rotary plasma electrode structure in claim 13,
wherein the first salient portion is formed by putting a
ring-shaped plate on the electrode portion.
23. The brushless rotary plasma electrode structure in claim 13,
wherein the first salient portion is formed by mechanically working
by channel milling.
24. The brushless rotary plasma electrode structure in claim 13,
wherein the dimension of the first interval is less than 2 mm.
Description
CROSS REFERENCE TO RELATED APPLICATION
[0001] This application also claims priority to Taiwan Patent
Application No. 104101506 filed in the Taiwan Patent Office on Jan.
16, 2015, the entire content of which is incorporated herein by
reference.
TECHNICAL FIELD
[0002] The disclosure relates to an electrode structure and film
coating system, and more particularly, to a brushless rotary plasma
electrode structure and film coating system containing brushless
rotary plasma electrode structure.
BACKGROUND
[0003] FIG. 1 is a schematic drawing of the brush-type rotary
plasma electrode structure of the prior art. Please refer to FIG.
1.
[0004] As shown in FIG. 1, the brush-type rotary plasma electrode
structure (10) of the prior art includes two electrode portions
(11), two guided portions (12), an isolation portion (13), a carbon
brush (14) made of graphite, a RF generator (15), and an earthed
electrode. The isolation portion (13) is positioned between two
electrode portions (11). The guided portion (12) is penetrated
through the two electrode portions (11). The carbon brush (14) is
furnished at the periphery of the electrode portions (11). The RF
generator (15) and the earthed electrode (16) are coupling to an
end of the corresponding carbon brush (14) while the other end of
the carbon brush (14) contacts the electrode portions (11).
[0005] Under this disposition, the electrode portions (11) rotates
with respect to an axis A1. By the use of the carbon brush (14),
the radio frequency power (RF power) generated by the RF generator
(15) is transmitted to the electrode portions (11), it further
generates plasma from the guided portion (12) to have the work
piece perform surface treatment. However, since it is quite
possible that the rotating electrode portions (11) will rub against
the carbon brush (14) that results in generating heat causing high
temperature which might cause fire under the long-time
operation.
[0006] Furthermore, through the rubbing, the carbon brush (14) may
also generate dust particles that may fall down to the work pieces
and cause contamination, and which will eventually causes low NPL
ratio after the plasma treatment.
SUMMARY
[0007] In light of the disadvantages of the prior arts, the
disclosure provides a brushless rotary plasma electrode structure
and film coating system that aims to ameliorate at least some of
the disadvantages of the prior art or to provide a useful
alternative.
[0008] The disclosure provides a brushless rotary plasma electrode
structure which being a non-contact type power coupling structure
is capable of improving the efficiency of power coupling and is
capable of avoiding the generation of the contamination of dust
particles and high temperature, thereby is capable of lowering the
impedance.
[0009] The disclosure provides a film coating system which being
including a brushless rotary plasma electrode structure is capable
of improving the efficiency of power coupling to generate higher RF
energy, and is capable of enhancing the generation of plasma.
[0010] In an embodiment, the disclosure provides a brushless rotary
plasma electrode structure which includes a main body, a plurality
of guided portions, a plurality of conducting-through members where
the main body being rotating with respect to an axis further
includes a plurality of electrode portions that are disposed at
intervals, and the electrode portions have a first salient portion
furnished at the periphery thereof; the guided portions penetrates
through those electrode portions; and each of the
conducting-through members includes a second salient portion, and
there is a first interval furnished between the second salient
portion and its corresponding first salient portion.
[0011] In an embodiment, the disclosure provides a film coating
system which includes the above-mentioned brushless rotary plasma
electrode structure.
[0012] Based on the above-mentioned statements, the brushless
rotary plasma electrode structure of the disclosure is capable of
improving the efficiency of power coupling through the
above-mentioned design for conducting-through member to make the
conducting-through member form a high power RF power coupling
structure without contacting the electrode portions. Furthermore,
it is capable of enhancing the generation of plasma to have a work
piece apply in film coating system.
BRIEF DESCRIPTION OF THE DRAWINGS
[0013] FIG. 1 is a schematic drawing of the brush-type rotary
plasma electrode structure of the prior art;
[0014] FIG. 2 is a schematic drawing of the brushless rotary plasma
electrode structure of the disclosure;
[0015] FIG. 3 through FIG. 7 are schematic drawings of the
brushless rotary plasma electrode structure of the different
embodiments of the disclosure;
[0016] FIG. 8 is a schematic drawing of the brushless rotary plasma
electrode structure of another embodiment of the disclosure;
[0017] FIG. 9 is a schematic drawing of the film coating system of
the disclosure.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
[0018] The accomplishment of this and other objects of the
disclosure will become apparent from the following description and
its accompanying drawings, but it can not limit the protection
range of the disclosure.
[0019] FIG. 2 is a schematic drawing of the brushless rotary plasma
electrode structure of the disclosure. As shown in FIG. 2, in the
present embodiment, the brushless rotary plasma electrode structure
(100) includes a main body (110), a plurality of guided portions
(120), an isolation portion (130), a plurality of
conducting-through members (140), a RF generator (150), and an
earthed electrode (160).
[0020] The main body (110) being rotating with respect to an axis
A1 includes a plurality of (two shown in the FIG. 2) electrode
portions (112), (114) disposed at intervals with the isolation
portion (130) positioned between the two electrode portions
(112).
[0021] The guided portion (120) being a hollow pipe member and
penetrated through the electrode portion (112) is made by, for
instance, dielectric material for guiding, for instance, ionized
gas to pass through the above-mentioned electrode portions (112),
(114) to form plasma.
[0022] In the present embodiment, the conducting-through member
(140) are positioned at the periphery of the electrode portions
(112), (114) respectively. The number of the conducting-through
member (140) is 4 in the present embodiment where two of them are
positioned at both ends of the electrode portion (112) at the top
side while the other two of them are positioned at both ends of the
electrode portion (114) at the bottom side. What is needed to
explain here is that the conducting-through member (140) does not
contact with the electrode portions (112), (114).
[0023] In the present embodiment, the periphery of the electrode
portions (112), (114) appears in fin shape and a first salient
portion (112a) is furnished at their periphery.
[0024] In the present embodiment, one end of the conducting-through
member (140) appears in fin shape. Each of the conducting-through
member (140) includes a second salient portion (142) and the number
of which is 3. Each of the second salient portion (142) is
positioned between the two corresponding first salient portions
(112a). There is a first interval d1 between the first salient
portion (112a) and its corresponding second salient portion (142).
The dimension of the first interval d1 is less than 2 mm so as to
generate sufficient amount of capacitance. What is needed to
explain here is that the number of the first salient portion (112a)
and the second salient portion (142) are not limited in the present
embodiment.
[0025] In the present embodiment, there is a second interval d2
between the second salient portion (142) and its corresponding
electrode portions (112), (114) in the conducting-through member
(140) thereof. The dimension of the second interval d2 is greater
than 2 mm so as to avoid generating spark.
[0026] In the present embodiment, the RF generator (150) is coupled
to the corresponding conducting-through member (140). That is, as
to FIG. 2, the RF generator (150) is connected to the
conducting-through member (140) positioned at the top thereof. The
frequency of the RF generator (150) is greater than 13.56 MHZ,
while the earthed electrode (160) is coupled to the
conducting-through member (140) positioned at the bottom thereof
for earthing purpose.
[0027] What is described below is to explain that the brushless
rotary plasma electrode structure (100) of the present embodiment
is capable of forming a high-power RF power coupling structure
through the electrical impedance and its related formulas:
Z = 1 j.omega. c ( 1 ) c = Q V = A d ( 2 ) ##EQU00001##
[0028] In formula (1), Z, j, .omega., and c indicate impedance,
imaginary number, angular frequency, and capacitance
respectively.
[0029] In formula (2), c, V, and Q indicate capacitance, voltage,
and electric charge respectively. The capacitance c is to measure
the electric charge Q stored in the electrodes of the capacitor
when the voltage between the two ends of the capacitor is an unit
value. What is more, as for the capacitance in a parallel-plate
capacitor, .di-elect cons., A, and d indicate dielectric constant,
plate area, and the distance between the two parallel plates
respectively.
[0030] It is known from formula (1) that the magnitude of the
impedance Z varies with respect to the magnitude of the
capacitance, i.e. the higher the magnitude of the capacitance, the
lower the magnitude of the impedance Z it is. In this way, a higher
RF energy can be generated. What is more, it is known from formula
(2) that the magnitude of the capacitance is proportional to the
magnitude of the plate area and inverse proportional to the
distance d between the plates.
[0031] Corresponding to the above-mentioned formulas (1), and (2),
it is known that, in the present embodiment, there is a first
interval d1 between the first salient portion (112a) and its
corresponding second salient portion (142), and there is a
corresponding capacitance between each of the first salient portion
(112a) and its corresponding second salient portion (142). What is
more, the larger the areas of the first salient portion (112a) and
the corresponding second salient portion (142), the higher the
capacitance it is. Furthermore, the way that a parallel arrangement
is formed between the first salient portion (112a) and the second
salient portion (142) making the add-up of the capacitance to
acquire a relatively larger capacitance. Under this disposition,
while the main body (110) rotates with respect to the axis A1,
through the design of the conducting-through member (140), it makes
the conducting-through member (140) do not contact with the
electrode portions (112) so as to form a higher power RF power
coupling and lower impedance. In this way, the impedance can be
lower, the power coupling efficiency can be improved and a higher
RF energy can be generated.
[0032] FIG. 3 through FIG. 7 are schematic drawings of the
brushless rotary plasma electrode structure of the different
embodiments of the disclosure. What is needed to explained here is
that the brushless rotary plasma electrode structures 200, 300,
400, 500, 600 in FIG. 3 through FIG. 7 are similar to that of the
brushless rotary plasma electrode structure 100 in FIG. 2, and the
same label numbers are used for the same elements to indicate that
they are having same function, thereby, they are not going to be
repeated in explanation, and only minor difference will be
explained.
[0033] The difference between FIG. 3 and FIG. 2 lies in that the
number of first salient portion (242) of each of the
conducting-through member (240) is 4, and the first salient portion
(212a) of each of the electrode portions (212) is positioned
between the two corresponding second salient portions (242).
[0034] The difference between FIG. 4 and FIG. 3 lies in the fact
that there are no fin shapes at one end of the conducting-through
members (140), (240) as shown in FIG. 2 through FIG. 3. The
conducting-through member (340) being the second salient portion
itself is positioned between the two corresponding first salient
portions (312a) of the electrode portions (312) so as to form that
the first salient portion (312a) of the electrode portions (312)
covers a portion of the conducting-through member (340), and the
first salient portion (312a) does not contact the
conducting-through member (340).
[0035] The difference between FIG. 5 and FIG. 4 lies in the fact
that the conducting-through member (440) being appeared in -shape
includes two second salient portions (442), and the first salient
portion (312a) of the electrode portions (312) is positioned the
two corresponding second salient portions (442) to form that the
second salient portion (442) of the conducting-through member (440)
covers a portion of the first salient portion (312a), and the
second salient portion (442) does not contact the first salient
portion (312a).
[0036] The difference between FIG. 6 and FIG. 5 lies in the fact
that there are no fin shapes at the periphery of the electrode
portions (112), (212), (312) as shown in FIG. 2 through FIG. 5. The
electrode portions (412) being the first salient portion itself is
positioned between the two corresponding second salient portions
(442) of the electrode portions (312) so as to form that the second
salient portion (442) covers a portion of the electrode portions
(412), and the second salient portion (442) does not contact the
electrode portions (412).
[0037] The difference between FIG. 7 and FIG. 6 lies in the fact
that the conducting-through member (340) itself is the second
salient portion, and the electrode portions (412) itself is the
first salient portion. The conducting-through member (340) does not
contact the electrode portions (412). What is needed to explain
here is that the above-mentioned FIG. 2 through FIG. 7 are only
demonstrating examples, and they are not limited to the
above-mentioned embodiments. The conducting-through members and
electrode portions in various embodiments in FIG. 2 through FIG. 7
can be mutually collocated.
[0038] What is needed to explain here is that the first salient
portion (112a) shown in the above-mentioned FIG. 2 is formed by
putting a ring-shaped plate on the electrode portions (112), while
the first salient portion (212a) shown in FIG. 3 and the first
salient portion (312a) shown in FIG. 4 and FIG. 5 are also formed
by putting the ring-shaped plate on the electrode portions (212),
(312). The following examples shown in FIG. 8 explain that there is
no limitation on the forming methods of the first salient
portion.
[0039] FIG. 8 is a schematic drawing of the brushless rotary plasma
electrode structure of another embodiment of the disclosure. What
is needed to explain here is that the brushless rotary plasma
electrode structures 100, 200, 300, 400, 500, 600 in FIG. 2 through
FIG. 7 are similar to that of the brushless rotary plasma electrode
structure 700 in FIG. 8, and the same label numbers are used for
the same elements to indicate that they are having same function,
thereby, they are not going to be repeated here in explanation.
What is the difference between that in FIG. 8 and those in FIG. 2
through FIG. 7 is, in the present embodiment, the first salient
portion (512a) is formed by having the electrode portions (512)
mechanically work by channel milling, i.e. have the periphery of
the electrode portions (512) to be mechanically worked to form a
multiplicity of channels to make the periphery of the electrode
portions (512) form a multiplicity of first salient portions (512a)
and appearing in fin shapes while the second salient portion (142)
is also positioned between the two corresponding first salient
portions (512a). In this way, a high power RF power coupling
structure can be formed to acquire higher capacitance, and further
more, to lower impedance value in order to improve the efficiency
of power coupling to generate higher RF energy. In addition, the
conducting-through member (140) in FIG. 8 is only an exemplary
demonstration, and is not limited to the above-mentioned
embodiments. One can have the conducting-through members in various
embodiments shown in FIG. 2 through FIG. 7 collocate mutually with
the electrode portions (512) shown in FIG. 8. Similarly, the
disclosure is not limited to the type of the first salient portion
(512a) of the electrode portions (512) shown in FIG. 8, one can
have the periphery of the electrode portion (512) to be
mechanically worked to form the first salient portion shown in FIG.
2 through FIG. 5.
[0040] FIG. 9 is a schematic drawing of the film coating system of
the disclosure. The film coating system is used to have a work
piece (60) to be performed film coating treatment or film
deposition. The above-mentioned work piece, for example, is a wafer
or a substrate that can be coated. The film coating system (50)
includes brushless rotary plasma electrode structure (100). The
description of structures of the embodiments of the brushless
rotary plasma electrode structure (100) with the accompanied FIG. 2
is not going to be repeated here. Besides, In other embodiments,
same efficacy can be achieved by applying the brushless rotary
plasma electrode structures (200), (300), (400), (500), (600) in
film coating system (50).
[0041] As the film coating system (50) operates, the brushless
rotary plasma electrode structure (100) is capable of enhancing the
generation of plasma to have a work piece (60) to be performed film
coating treatment or film deposition since the brushless rotary
plasma electrode structure (100) itself is formed a high power RF
power coupling structure to generate higher RF energy.
[0042] To summarize the above-mentioned statements, the brushless
rotary plasma electrode structure (100) of the disclosure is
capable of improving the efficiency of power coupling through the
above-mentioned design for conducting-through member to make the
conducting-through member form a high power RF power coupling
structure without contacting the electrode portions. What is more,
it is capable of avoiding the generation of contamination of dust
particle and high temperature since the conducting-through member
does not contact the electrode portions. Furthermore, it is capable
of enhancing the generation of plasma to have a work piece apply in
film coating system.
[0043] It will become apparent to those people skilled in the art
that various modifications and variations can be made to the
structure of the disclosure without departing from the scope or
spirit of the disclosure.
[0044] In view of the foregoing description, it is intended that
all the modifications and variation fall within the scope of the
following appended claims and their equivalents.
* * * * *