U.S. patent application number 14/995193 was filed with the patent office on 2016-05-12 for replacement conductive hard mask for multi-step magnetic tunnel junction (mtj) etch.
The applicant listed for this patent is QUALCOMM INCORPORATED. Invention is credited to Wei-Chuan CHEN, Yu LU, Chando PARK.
Application Number | 20160133833 14/995193 |
Document ID | / |
Family ID | 52706314 |
Filed Date | 2016-05-12 |
United States Patent
Application |
20160133833 |
Kind Code |
A1 |
LU; Yu ; et al. |
May 12, 2016 |
REPLACEMENT CONDUCTIVE HARD MASK FOR MULTI-STEP MAGNETIC TUNNEL
JUNCTION (MTJ) ETCH
Abstract
A multi-step etch technique for fabricating a magnetic tunnel
junction (MTJ) apparatus includes forming a first conductive hard
mask on a first electrode of the MTJ apparatus for etching the
first electrode during a first etching step. The method also
includes forming a second conductive hard mask on the first
conductive hard mask for etching magnetic layers of the MTJ
apparatus during a second etching step. A spacer layer is
conformally deposited on sidewalls of the first conductive hard
mask. The second conductive hard mask is deposited on the first
conductive hard mask and aligned with the spacer layer on the
sidewalls of the first conductive hard mask.
Inventors: |
LU; Yu; (San Diego, CA)
; PARK; Chando; (San Diego, CA) ; CHEN;
Wei-Chuan; (Taipei, TW) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
QUALCOMM INCORPORATED |
San Diego |
CA |
US |
|
|
Family ID: |
52706314 |
Appl. No.: |
14/995193 |
Filed: |
January 13, 2016 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
14243324 |
Apr 2, 2014 |
9269893 |
|
|
14995193 |
|
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Current U.S.
Class: |
438/3 |
Current CPC
Class: |
H01L 43/02 20130101;
H01L 43/12 20130101; H01L 43/08 20130101 |
International
Class: |
H01L 43/12 20060101
H01L043/12; H01L 43/02 20060101 H01L043/02; H01L 43/08 20060101
H01L043/08 |
Claims
1. A method of fabricating a magnetic tunnel junction (MTJ)
apparatus, comprising: conformally depositing a first spacer layer
on a first conductive hard mask, on a first electrode layer, and on
magnetic layers of the MTJ, a first portion of the first spacer
layer being deposited on sidewalls of the first conductive hard
mask and a second portion of the spacer layer being deposited on a
surface of the first conductive hard mask; selectively removing the
second portion of the first spacer layer to create a recess within
a dielectric layer, the recess being aligned with the first portion
of the first spacer layer; and filling the recess with a conductive
material to form a second conductive hard mask on the first portion
of the first spacer layer and on the first conductive hard
mask.
2. The method of claim 1, comprising depositing the first portion
of the first spacer layer with a thickness less than the second
portion of the first spacer layer.
3. The method of claim 1, further comprising etching the magnetic
layers of the MTJ in a pattern defined by the second conductive
hard mask.
4. The method of claim 1, further comprising depositing a first
dielectric layer on the first spacer layer.
5. The method of claim 4, further comprising planarizing the first
dielectric layer to expose the second portion of first spacer
layer.
6. The method of claim 5, further comprising removing remaining
portions of the first dielectric layer after filling the recess
with the conductive material.
7. The method of claim 6, further comprising removing third
portions of the first spacer layer, the third portions of the first
spacer layer abutting the magnetic layers of the MTJ where the
magnetic layers are not overlapped by the second conductive hard
mask.
8. The method of claim 7, further comprising etching the magnetic
layers of the MTJ in a pattern defined by the second conductive
hard mask after removing the third portions of the first spacer
layer.
9. The method of claim 1, further comprising conformally depositing
a second spacer layer over the second conductive hard mask, the
second portion of the first spacer layer, the magnetic layers and
the a second electrode layer.
10. The method of claim 9, further comprising: depositing a second
dielectric layer over the second spacer layer; planarizing the
second dielectric layer; and forming a conductive interconnect in
the second dielectric layer, the conductive interconnect forming a
conductive path to the second conductive hard mask.
11. The method of claim 1, further comprising integrating the MTJ
apparatus into a mobile phone, a set top box, a music player, a
video player, an entertainment unit, a navigation device, a
computer, a hand-held personal communication systems (PCS) unit, a
portable data unit, and/or a fixed location data unit.
12. A method of fabricating a magnetic tunnel junction (MTJ)
apparatus, comprising steps for: conformally depositing a first
spacer layer on a first conductive hard mask, on a first electrode
layer, and on magnetic layers of the MTJ, a first portion of the
first spacer layer being deposited on sidewalls of the first
conductive hard mask and a second portion of the spacer layer being
deposited on a surface of the first conductive hard mask;
selectively removing the second portion of the first spacer layer
to create a recess within a dielectric layer, the recess being
aligned with the first portion of the first spacer layer; and
filling the recess with a conductive material to form a second
conductive hard mask on the first portion of the first spacer layer
and on the first conductive hard mask.
13. The method of claim 12, further comprising steps for
integrating the MTJ apparatus into a mobile phone, a set top box, a
music player, a video player, an entertainment unit, a navigation
device, a computer, a hand-held personal communication systems
(PCS) unit, a portable data unit, and/or a fixed location data
unit.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a divisional of U.S. patent application
Ser. No. 14/243,324, entitled "REPLACEMENT CONDUCTIVE HARD MASK FOR
MULTI-STEP MAGNETIC TUNNEL JUNCTION (MTJ) ETCH," filed on Apr. 2,
2014, the disclosure of which is expressly incorporated by
reference herein in its entirety.
TECHNICAL FIELD
[0002] The present disclosure generally relates to magnetic tunnel
junction (MTJ) devices. More specifically, the present disclosure
relates to fabricating high density arrays of magnetic random
access memory (MRAM) devices.
BACKGROUND
[0003] Unlike conventional random access memory (RAM) chip
technologies, in magnetic RAM (MRAM) data is stored by
magnetization of storage elements. The basic structure of the
storage elements consists of metallic ferromagnetic layers
separated by a thin tunneling barrier. Typically, the ferromagnetic
layers underneath the barrier (e.g., the pinned layer) have a
magnetization that is fixed in a particular direction. The
ferromagnetic magnetic layers above the tunneling barrier (e.g.,
the free layer) have a magnetization direction that may be altered
to represent either a "1" or a "0." For example, a "1" may be
represented when the free layer magnetization is anti-parallel to
the fixed layer magnetization. In addition, a "0" may be
represented when the free layer magnetization is parallel to the
fixed layer magnetization or vice versa. One such device having a
fixed layer, a tunneling layer, and a free layer is a magnetic
tunnel junction (MTJ). The electrical resistance of an MTJ depends
on whether the free layer magnetization and fixed layer
magnetization are parallel or anti-parallel to each other. A memory
device such as MRAM is built from an array of individually
addressable MTJs.
[0004] To write data in a conventional MRAM, a write current, which
exceeds a critical switching current, is applied through an MTJ.
Application of a write current that exceeds the critical switching
current changes the magnetization direction of the free layer. When
the write current flows in a first direction, the MTJ may be placed
into or remain in a first state in which its free layer
magnetization direction and fixed layer magnetization direction are
aligned in a parallel orientation. When the write current flows in
a second direction, opposite to the first direction, the MTJ may be
placed into or remain in a second state in which its free layer
magnetization and fixed layer magnetization are in an anti-parallel
orientation.
[0005] To read data in a conventional MRAM, a read current may flow
through the MTJ via the same current path used to write data in the
MTJ. If the magnetizations of the MTJ's free layer and fixed layer
are oriented parallel to each other, the MTJ presents a parallel
resistance. The parallel resistance is different than a resistance
(anti-parallel) the MTJ would present if the magnetizations of the
free layer and the fixed layer were in an anti-parallel
orientation. In a conventional MRAM, two distinct states are
defined by these two different resistances of an MTJ in a bitcell
of the MRAM. The two different resistances indicate whether a logic
"0" or a logic "1" value is stored by the MTJ.
[0006] MRAM is a non-volatile memory technology that uses magnetic
elements. For example, spin transfer torque magnetoresistive random
access memory (STT-MRAM) uses electrons that become spin-polarized
as the electrons pass through a thin film (spin filter). STT-MRAM
is also known as spin transfer torque RAM (STT-RAM), spin torque
transfer magnetization switching RAM (Spin-RAM), and spin momentum
transfer (SMT-RAM).
[0007] Bitcells of a magnetic random access memory may be arranged
in one or more arrays including a pattern of memory elements (e.g.,
MTJs in case of MRAM). Spin-transfer-torque magnetic random access
memory (STT-MRAM) is an emerging nonvolatile memory that has
advantages of non-volatility. In particular, STT-MRAM operates at a
higher speed than off chip dynamic random access memory (DRAM). In
addition, STT-MRAM has a smaller chip size than embedded static
random access memory (eSRAM), unlimited read/write endurance, and a
low array leakage current.
SUMMARY
[0008] A method of fabricating a magnetic tunnel junction (MTJ)
apparatus according to an aspect of the present disclosure includes
conformally depositing a first spacer layer on a first conductive
hard mask, on a first electrode layer, and on magnetic layers of
the MTJ. A first portion of the first spacer layer is deposited on
sidewalls of the first conductive hard mask and a second portion of
the spacer layer is deposited on a surface of the first conductive
hard mask. The method also includes selectively removing the second
portion of the first spacer layer to create a recess within a
dielectric layer, which is aligned with the first portion of the
first spacer layer. According to this aspect of the present
disclosure, the method also includes filling the recess with a
conductive material to form a second conductive hard mask on the
first portion of the first spacer layer and on the first conductive
hard mask.
[0009] An MTJ apparatus according to an aspect of the present
disclosure includes a first conductive hard mask on a second
electrode layer. The second electrode layer is on a stack of MTJ
layers and is electrically coupled to the stack of MTJ layers. The
MTJ apparatus includes a first spacer on sidewalls of the first
conductive hard mask, sidewalls of the second electrode layer, and
a surface of the stack of MTJ layers. According to this aspect of
the present disclosure, the MTJ apparatus also includes a second
conductive hard mask aligned with sidewalls of the first spacer.
The second conductive hard mask is on the first conductive hard
mask and on the first spacer.
[0010] An MTJ apparatus according to another aspect of the present
disclosure includes first means for masking a first electrode layer
that is coupled to a stack of MTJ layers and for providing a
conductive path to the first electrode layer. The first masking
means abuts the first electrode layer. The MTJ apparatus also
includes means for protecting sidewalls of the first means. The
protecting means abuts the sidewalls of the first means, sidewalls
of the first electrode layer, and a surface of the stack of MTJ
layers. According to this aspect of the present disclosure, the MTJ
apparatus also includes second means for masking the stack of MTJ
magnetic layers and for electrically coupling to the first
conductive path. The second means are aligned with sidewalls of the
first means and abuts a surface of the first means.
[0011] This has outlined, rather broadly, the features and
technical advantages of the present disclosure in order that the
detailed description that follows may be better understood.
Additional features and advantages of the disclosure will be
described below. It should be appreciated by those skilled in the
art that this disclosure may be readily utilized as a basis for
modifying or designing other structures for carrying out the same
purposes of the present disclosure. It should also be realized by
those skilled in the art that such equivalent constructions do not
depart from the teachings of the disclosure as set forth in the
appended claims. The novel features, which are believed to be
characteristic of the disclosure, both as to its organization and
method of operation, together with further objects and advantages,
will be better understood from the following description when
considered in connection with the accompanying figures. It is to be
expressly understood, however, that each of the figures is provided
for the purpose of illustration and description only and is not
intended as a definition of the limits of the present
disclosure.
BRIEF DESCRIPTION OF THE DRAWINGS
[0012] For a more complete understanding of the present disclosure,
reference is now made to the following description taken in
conjunction with the accompanying drawings.
[0013] FIG. 1 is a diagram of a magnetic tunnel junction (MTJ)
device connected to an access transistor.
[0014] FIG. 2 is a conceptual diagram of a conventional magnetic
random access memory (MRAM) cell including an MTJ.
[0015] FIG. 3 is a schematic cross-sectional view of a conventional
MTJ stack, illustrating portions of the MTJ stack susceptible to
process related damage.
[0016] FIGS. 4A-4B are schematic cross-sectional views of a
partially fabricated MTJ structure illustrating a currently known
two-step etching technique for protecting the MTJ stack from
process related damage.
[0017] FIGS. 5A-5J are schematic cross-sectional views of an MTJ
structure during fabrication according to aspects of the present
disclosure.
[0018] FIG. 6 is a process flow diagram illustrating an exemplary
method of constructing an MTJ structure according to aspects of the
present disclosure.
[0019] FIG. 7 is a block diagram showing an exemplary wireless
communication system in which a configuration of the disclosure may
be advantageously employed.
[0020] FIG. 8 is a block diagram illustrating a design workstation
used for circuit, layout, and logic design of a semiconductor
component according to one configuration.
DETAILED DESCRIPTION
[0021] The detailed description set forth below, in connection with
the appended drawings, is intended as a description of various
configurations and is not intended to represent the only
configurations in which the concepts described herein may be
practiced. The detailed description includes specific details for
the purpose of providing a thorough understanding of the various
concepts. It will be apparent, however, to those skilled in the art
that these concepts may be practiced without these specific
details. In some instances, well-known structures and components
are shown in block diagram form in order to avoid obscuring such
concepts. As described herein, the use of the term "and/or" is
intended to represent an "inclusive OR", and the use of the term
"or" is intended to represent an "exclusive OR".
[0022] A memory device such as MRAM is built from an array of
individually addressable magnetic tunnel junction (MTJs). An MTJ
stack may include a free layer, a fixed layer and a tunnel barrier
layer there between as well as one or more ferromagnetic layers.
The MTJ stack is susceptible to damage during the etching process
due to re-deposition of etching byproducts. For example, removal of
photoresist may include processes such as oxygen ashing. Oxygen
ashing can cause damage to the hard mask layer (e.g., an electrode
layer) during the photoresist removal process. Oxygen ashing can
also cause damage to upper portions of the sidewalls of the free
layer of the MTJ stack. An etching process proceeds from etching
the hard mask layer of the MTJ stack 300 to etching the fixed
layers (e.g., pinned) of the stack. As the etching process
progresses through the MTJ stack, damage can be caused to the
sidewalls 322 of the free layer 314. As the etching process
proceeds further, upper portions and lower portions of the
sidewalls of the tunneling barrier layer may also be damaged.
[0023] Non-volatile byproducts of the etching process may also
settle as re-deposited films around the sidewalls of the MTJs of a
memory device. The re-deposited films may act as leakage paths
along the sidewalls, thereby reducing the magnetic resistance (MR)
ratio of the MTJ. Such process related damages may result in
significantly lower yields. Existing techniques do not provide an
effective solution for protecting MTJs from at least all these
process related damages.
[0024] A method of implementing a two-step MTJ etching process
according to an aspect of the present disclosure is described. In
this aspect of the disclosure, a spacer is protected during a
second etching step.
[0025] FIG. 1 illustrates a memory cell 100 including a magnetic
tunnel junction (MTJ) 102 coupled to an access transistor 104. A
free layer 110 of the MTJ 102 is coupled to a bit line 112. The
access transistor 104 is coupled between a fixed layer 106 of the
MTJ 102 and a fixed potential node 122. A tunnel barrier layer 114
is coupled between the fixed layer 106 and the free layer 110. The
access transistor 104 includes a gate 116 coupled to a word line
118.
[0026] Synthetic anti-ferromagnetic materials may be used to form
the fixed layer 106 and the free layer 110. For example, the fixed
layer 106 may comprise multiple material layers including a
cobalt-iron-boron (CoFeB) layer, a ruthenium (Ru) layer and a
cobalt-iron (CoFe) layer. In addition, the free layer 110 may be an
anti-ferromagnetic material, such as CoFeB, and the tunnel barrier
layer 114 may be magnesium oxide (MgO).
[0027] FIG. 2 illustrates a conventional STT-MRAM bit cell 200. The
STT-MRAM bit cell 200 includes a magnetic tunnel junction (MTJ)
storage element 205, a transistor 201, a bit line 202 and a word
line 203. The MTJ storage element is formed, for example, from at
least two ferromagnetic layers (a pinned layer and a free layer),
each of which can hold a magnetic field or polarization, separated
by a thin non-magnetic insulating layer (tunneling barrier).
Electrons from the two ferromagnetic layers can penetrate through
the tunneling barrier due to a tunneling effect under a bias
voltage applied to the ferromagnetic layers. The magnetic
polarization of the free layer can be reversed so that the polarity
of the pinned layer and the free layer are either substantially
aligned or opposite. The resistance of the electrical path through
the MTJ varies depending on the alignment of the polarizations of
the pinned and free layers. This variance in resistance may be used
to program and read the bit cell 200. The STT-MRAM bit cell 200
also includes a source line 204, a sense amplifier 208, read/write
circuitry 206 and a bit line reference 207.
[0028] As shown in FIG. 3, conventional MTJ storage elements
generally are formed on an electrode 302 (e.g., a bottom electrode)
such as a semiconductor substrate (e.g., of Si). One or more seed
layers (not shown) may be formed on the electrode 302. Generally,
an antiferromagnetic (AFM) layer 304 is first formed on the
electrode 302, and then a first ferromagnetic layer is formed on of
the AFM layer 304. The first ferromagnetic layer is "pinned" with a
fixed magnetization to form a pinned layer. The pinned layer may
include one or more layers, such as a first pinned layer 306 (e.g.,
a bottom pinned layer), a coupling layer 308 typically formed of a
non-magnetic metal such as ruthenium (Ru), and a second pinned
layer 310 (e.g., a top pinned layer). A tunneling barrier layer
312, including an insulator (e.g., a metal oxide), is formed on the
second pinned layer 310. A free layer 314 of a second ferromagnetic
layer is formed directly on the tunneling barrier layer 312. A hard
mask layer 316 (e.g., a top electrode of tantalum) is formed on the
free layer 314.
[0029] In this process, the MTJ stack 300 is subjected to a
magnetic annealing process in a vacuum. A pattern is then applied
to the MTJ stack using a lithography technique. A photoresist (not
shown in FIG. 3) is formed on the hard mask layer 316. The
patterned cell size may be larger than the final size. Each of the
aforementioned layers may include one or more layers or films.
[0030] Next, the MTJ stack 300 is etched using an etching process
such as reactive ion etching. The etching process includes trimming
the size of the photoresist, patterning the hard mask layer 316,
removing the photoresist, etching the free layer 314, etching the
tunneling barrier layer 312, etching the first pinned layer 306,
the coupling layer 308 and the second pinned layer 310, and etching
the AFM layer 304. Next, a passivation layer is deposited to
protect the MTJ storage element and the interlayer dielectric (ILD)
insulator layer 318. A combination stack may be specified, along
with a low deposition temperature to protect the MTJ and promote
adhesion between the MTJ and the ILD. Finally, planarization and
metallization is performed.
[0031] The MTJ stack 300 is susceptible to damage during the
etching process due to redeposition of etching byproducts. For
example, removal of photoresist may include processes such as
oxygen ashing. Oxygen ashing can cause damage to the hard mask
layer 316 during the photoresist removal process. Oxygen ashing can
also cause damage to upper portions 320 of sidewalls of the free
layer 314. As described above, the etching process proceeds from
etching the hard mask layer 316 at the top of the MTJ stack 300
towards etching the pinned layers at the bottom of the stack. As
the etching process progresses deeper down the MTJ stack, damage
can be caused to sidewalls 322 of the free layer 314. As the
etching process proceeds further down the stack, the upper portions
324 and lower portions 326 of the sidewalls of the tunneling
barrier layer 312 may also be damaged.
[0032] Non-volatile byproducts of the etching process may settle as
re-deposited films around the sidewalls of MTJ devices. The
re-deposited films may act as leakage paths along the sidewalls,
thereby reducing the magnetic resistance (MR) ratio of the MTJ.
Such process related damages may result in significantly lower
yields. Existing techniques do not provide an effective solution
for protecting MTJs from at least all the process related damages
described above.
[0033] One technique for reducing the detrimental effects of
re-deposited films is ion beam etching at shallow angles, with
multiple steps at different ion incident angles. The shallow angle
step cleans the sidewall re-deposition. Unfortunately, the use of
such directional etching techniques becomes increasingly difficult
as height to space ratios of MTJs increase along with MTJ density
in current high density of MTJ arrays.
[0034] A second technique for reducing the detrimental effects of
re-deposited films is single step etching, which relies on etch
optimization to reduce sidewall re-deposition. The etch
optimization is sensitive to MTJ material, size, and spacing. The
final etch profile is generally tapered to reduce sidewall
re-deposition. The tapered etch profile may result in reduced
density of MTJs in a high density MTJ array.
[0035] A third technique for reducing the detrimental effects of
re-deposited films and the detrimental effects of plasma damage is
two-step etching, in which a first step etches down to the tunnel
barrier only. The sidewall of the MTJ is then encapsulated in
dielectric material. Through either a second lithography level or a
spacer masking process, an etch mask overlapping the MTJ is formed
after the first etching step. This etch mask is then used to etch
the remaining MTJ stack materials. This technique physically
separates the re-deposition material and the plasma for a second
part of the etch from the active magnetic layer and the tunnel
barrier region.
[0036] An example of a currently known two-step technique for
etching an MTJ, which attempts to reduce detrimental effects of
re-deposited films and plasma damage, is described with reference
to FIGS. 4A and 4B. FIG. 4A, illustrates layers of an MTJ structure
400 after a first etching step. The MTJ structure 400 includes a
substrate 402, a bottom electrode layer 404, magnetic layers 406, a
top electrode 408, a spacer 410 and a conductive hard mask 412. In
this example, a first etching step stops on the magnetic layers 406
of the MTJ and forms the spacer 410 around sides of the top
electrode 408 and the conductive hard mask 412 of the MTJ.
[0037] A second etching step stops on the substrate 402 and defines
the lateral dimensions of the magnetic layers 406 and the bottom
electrode layer 404 of the MTJ. Unfortunately, lithographic etching
techniques for performing the second etching step in high-density
MTJ arrays are difficult to implement. Moreover, the use of
lithographic etching techniques for the second etching step can add
an additional mask level and associated costs to the fabrication
process.
[0038] A spacer defined etching process using SiNx (silicon
nitride) or SiOx (silicon oxide) as the spacer material has been
performed in the semiconductor industry. Unfortunately, SiNx and
SiOx are not strongly resistant to the etchants and processes that
are used to etch the magnetic layers 406 and the bottom electrode
layer 404 of the MTJ. Thus, as shown in FIG. 4B, a spacer 410 made
from SiNx or SiOx is significantly eroded during a spacer defined
second etching step. The erosion of the spacer 410 results in a
tapered etch profile and permits re-deposition films 414 to come
into close proximity with the bottom electrode layer 404, the
magnetic layers 406 and/or the conductive hard mask 412 of the MTJ.
Thus, the re-deposition films 414 may still facilitate shunting
between these layers and detrimentally affect the electrical
resistance characteristics of the MTJ.
[0039] A method of implementing a multi-step MTJ etching process,
in which the spacer is protected during a second etching step
according to an aspect of the present disclosure, is described in
FIGS. 5A-5J. FIG. 5A illustrates layers of an MTJ structure 500
after a first etching step and deposition of the spacer film
according to an aspect of the present disclosure. The MTJ structure
500 includes a substrate 502, a first electrode layer 504 deposited
on the substrate 502 of the MTJ. The MTJ structure 500 also
includes a magnetic layer 506 deposited on the first electrode
layer 504, a second electrode layer 508 deposited on the magnetic
layers 506, a first conductive hard mask 512 layer deposited on the
second electrode layer 508 and an first spacer layer 510 deposited
over the first conductive hard mask 512.
[0040] The first etching step defines the lateral dimensions of the
second electrode layer 508 and the first conductive hard mask. The
first spacer layer 510 is deposited after the first etching step.
The first spacer layer 510 is deposited on the first conductive
hard mask 512, on the second electrode layer 508, and on the
magnetic layers 506 of the MTJ. In one configuration, a first
portion 520 of the first spacer layer 510, which abuts sidewalls of
the first conductive hard mask 512, is thinner than a second
portion 522 of the first spacer layer 510, which abuts a top
surface of the first conductive hard mask 512. This can be achieved
by reducing the level of conformality during deposition of the
first spacer layer 510, for example, by changing the chamber
pressure or the bias power. The first spacer layer 510 may be SiNx.
The thickness of the first portion 520 of the first spacer layer
510 may be about 10-50 nanometers and the thickness of the second
portion 522 of the first spacer layer 510 may be greater than 50
nanometers. The greater thickness of second portion 522 of the
first spacer layer 510 may provide increased process margins for
subsequent planarization processes, for example.
[0041] FIG. 5B shows a schematic cross-sectional view further
illustrating the MTJ structure 500 during fabrication according to
an aspect of the present disclosure. In this configuration, a first
dielectric layer 514 is deposited on the first spacer layer 510. In
this example, first dielectric layer 514 is deposited on the first
spacer layer 510 after the first spacer layer 510 is conformally
deposited on the first conductive hard mask 512, on the second
electrode layer 508 and on the magnetic layers 506 of the MTJ.
[0042] FIG. 5C shows a schematic cross-sectional view further
illustrating the MTJ structure 500 during fabrication according to
an aspect of the present disclosure. In this configuration, the
first dielectric layer 514 is planarized using well known methods
such as a chemical mechanical planarization process. Planarization
of the first dielectric layer 514 stops on the first spacer layer
510 and forms a surface of the first dielectric layer 514 that is
substantially co-planar with the surface of the second portion 522
of the first spacer layer 510.
[0043] A planarization process that stops on a nitride layer, such
as the first spacer layer 510, while reducing or even minimizing
oxide dishing may include the use of a selective slurries, reduced
forces and/or higher speeds to improve planarization performance.
Examples of techniques for improving planarization performance that
may be applied to the step of planarizing the first dielectric
layer 514 to stop at the first spacer layer 510 according to
aspects of the present disclosure are described in Withers et al.,
"Wide margin CMP for STI", Solid State Technology, 0038111X, Jul
98, Vol. 41, Issue 7, the disclosure of which is expressly
incorporated by reference herein in its entirety.
[0044] In FIG. 5D, the second portion 522 of the first spacer layer
510 is selectively removed. This step can be performed using
currently known processes such as the highly selective etching of
SiNx in well-known gate spacer processes, for example. Examples of
highly selective etching of SiNx are described in Sunghoon Lee et
al., JVacSciTEch B 20(1), P131-7, 2010. A recess 516 in the first
dielectric layer 514 is formed by removal of the second portion 522
of the first spacer layer 510. The recess 516 is aligned with the
outside vertical surface of the first portion 520 of the first
spacer layer 510, and overlaps the first conductive hard mask 512
and the second electrode layer 508.
[0045] In this aspect of the present disclosure, the material of
the first dielectric layer 514 is selected for having properties
that allow the selective removal of the first spacer layer 510
material to form the recess 516 within the first dielectric layer
514. In one example, the material of the first dielectric layer 514
is SiOx.
[0046] FIG. 5E further illustrates the MTJ structure 500 during
fabrication according to an aspect of the present disclosure. In
this configuration, the recess 516 is filled with a second
conductive hard mask 518. Filling of the recess 516 with the second
conductive hard mask 518 may be performed after removal of the
second portion 522 of the first spacer layer 510. The second
conductive hard mask may be, for example, tantalum, hafnium, or
platinum. The material selection is based on the etching chemistry
to be used. The material can be treated so that it is further
resistant to the etching chemicals. A common planarization
processes, such as chemical mechanical polishing (CMP), removes
excess materials outside of the recess 516, such that the resulting
second conductive hard mask 518 is also aligned with the outside
extent of the first portion 520 of the first spacer layer 510.
[0047] In FIG. 5F, the first dielectric layer 514 is removed after
the recess 516 is filled with a second conductive hard mask 518.
The first dielectric layer 514 may be removed by plasma etching,
for example. In this configuration, removal of the first dielectric
layer 514 leaves the second conductive hard mask 518 aligned with
the first portion 520 of the first spacer layer 510, and
overlapping the first conductive hard mask 512 and the second
electrode layer 508. At this stage, remaining portions of the first
spacer layer 510 include the first portion 520 that abuts sidewalls
of the first conductive hard mask and the second electrode layer
508. Other portions of the first spacer layer 510 include the third
portions 524 that abut the magnetic layers 506 of the MTJ where the
magnetic layers 506 are not overlapped by the second conductive
hard mask 518.
[0048] In FIG. 5G, the third portions 524 of the first spacer layer
510 are removed after the first dielectric layer 514 is removed
with an anisotropic etch. In one example, the first dielectric
layer is a SiNx material. The third portions 524 of the first
spacer layer 510 may be removed by plasma etching of the SiNx
material. The second conductive hard mask 518 may prevent the
second portion 522 of the first spacer layer 510 from being removed
during this step.
[0049] In FIG. 5H, the magnetic layers 506 of the MTJ are etched
during a second etching step after the third portions 524 of the
first dielectric layer 514 are removed. This step may be performed
by reactive ion etching, or ion beam etching, for example. The
magnetic layers 506 of the MTJ are masked by the second conductive
hard mask 518 during this etching step so the lateral dimensions of
the magnetic layers 506 are substantially aligned with the lateral
dimensions of the second conductive hard mask 518. Thus, the
magnetic layers 506 of the MTJ are etched in a pattern defined by
the second conductive hard mask 518. According to an aspect of the
present disclosure, the top surface of the second conductive hard
mask 518 may be modified to enhance etch resistance to this second
etching step.
[0050] In FIGURE SI, a second spacer layer 526 is conformally
deposited over the second conductive hard mask 518, the second
portions 522 of the first spacer layer 510, the magnetic layer 506
and the first electrode layer 504. The second spacer layer 526 may
be conformally deposited after the magnetic layers 506 of the MTJ
are etched. The second spacer layer 526 may be a SiNx material, for
example. The second spacer layer 526 and the second portion of the
first spacer layer 510 protect the second electrode layer 508, the
magnetic layers 506 and the first electrode layer 504 from
re-deposition films, oxidation, tool contamination, etc.
[0051] FIG. 5J shows a schematic cross-sectional view illustrating
the MTJ structure 500 after fabrication according to an aspect of
the present disclosure. In this configuration, a second dielectric
layer 528 is deposited over the second spacer layer after the
second spacer layer is conformally deposited. The second dielectric
layer 528 may be a SiOx material, for example. The second
dielectric layer 528 may then be planarized using a conventional
chemical mechanical planarization process. A conductive
interconnect 530 may be formed in the second dielectric layer 528
and coupled to the second conductive hard mask 518 to provide a
conductive path to the first conductive hard mask 512 and the
second electrode layer 508. The conductive interconnect may be a
conventionally formed Cu interconnect, for example.
[0052] FIG. 6 is a process flow diagram illustrating a method of
fabricating a magnetic tunnel junction (MTJ) apparatus according to
an aspect of the present disclosure. It should be noted that the
following description does not necessarily reflect the actual
sequence of film growth. The method 600 includes conformally
depositing a first spacer layer on a first conductive hard mask, on
a top electrode, and on magnetic layers of the MTJ at block 602. A
first portion of the first spacer layer is deposited on sidewalls
of the first conductive hard mask and a second portion of the
spacer layer is deposited on a top surface of the first conductive
hard mask. At block 604, the method includes depositing a first
dielectric layer over the first spacer layer. At block 606, the
method includes planarizing the first dielectric layer down to the
second portion of first spacer layer. At block 608, the second
portion of the spacer layer is selectively removed to form a recess
within the first dielectric layer. According to an aspect of the
disclosure, the recess is aligned with the first portion of the
first spacer layer. At block 610, the recess is filled with a
conductive material to form a second conductive hard mask on the
first portion of the first spacer layer and on the first conductive
hard mask.
[0053] An MTJ apparatus according to another aspect of the present
disclosure includes a first means for masking a top electrode that
is coupled to a stack of MTJ layers and for providing a conductive
path to the top electrode. The first means for masking the top
electrode and providing a conductive hard mask may include the
first conductive hard mask 512 that is described above with respect
to FIGS. 5A-5J, for example. According to this aspect of the
disclosure, the apparatus also includes a means for protecting
sidewalls of the first means. The protecting means may include the
first spacer layer 510 that is described in FIGS. 5A-5J, for
example. According to this aspect of the disclosure, the apparatus
also includes second means for masking the stack of MTJ magnetic
layers and for electrically coupling to the first conductive path.
The second means for masking the stack of MTJ magnetic layers and
for electrically coupling to the first conductive path may include
the second conductive hard mask 518 that is in FIGS. 5E-5J, for
example.
[0054] In another configuration, the aforementioned means may be
any material or any layer configured to perform the functions
recited by the aforementioned means. Although specific means have
been set forth, it will be appreciated by those skilled in the art
that not all of the disclosed means are required to practice the
disclosed configurations. Moreover, certain well known means have
not been described, to maintain focus on the disclosure.
[0055] FIG. 7 is a block diagram showing an exemplary wireless
communication system 700 in which an aspect of the disclosure may
be advantageously employed. For purposes of illustration, FIG. 7
shows three remote units 720, 730, and 750 and two base stations
740. It will be recognized that wireless communication systems may
have many more remote units and base stations. Remote units 720,
730, and 750 include IC devices 725A, 725C and 725B that include
the disclosed MTJ apparatus. It will be recognized that other
devices may also include the disclosed MTJ apparatus, such as the
base stations, switching devices, and network equipment. FIG. 7
shows forward link signals 780 from the base station 740 to the
remote units 720, 730, and 750 and reverse link signals 790 from
the remote units 720, 730, and 750 to base stations 740.
[0056] In FIG. 7, remote unit 720 is shown as a mobile telephone,
remote unit 730 is shown as a portable computer, and remote unit
750 is shown as a fixed location remote unit in a wireless local
loop system. For example, the remote units may be mobile phones,
hand-held personal communication systems (PCS) units, portable data
units such as personal data assistants, GPS enabled devices,
navigation devices, set top boxes, music players, video players,
entertainment units, fixed location data units such as meter
reading equipment, or other devices that store or retrieve data or
computer instructions, or combinations thereof. Although FIG. 7
illustrates remote units according to the teachings of the
disclosure, the disclosure is not limited to these exemplary
illustrated units. Aspects of the disclosure may be suitably
employed in many devices, which include MTJ apparatus.
[0057] FIG. 8 is a block diagram illustrating a design workstation
used for circuit, layout, and logic design of a semiconductor
component, such as the MTJ apparatus disclosed above. A design
workstation 800 includes a hard disk 801 containing operating
system software, support files, and design software such as Cadence
or OrCAD. The design workstation 800 also includes a display 802 to
facilitate design of a circuit 810 or a semiconductor component 812
such as an MTJ apparatus. A storage medium 804 is provided for
tangibly storing the circuit design 810 or the semiconductor
component 812. The circuit design 810 or the semiconductor
component 812 may be stored on the storage medium 804 in a file
format such as GDSII or GERBER. The storage medium 804 may be a
CD-ROM, DVD, hard disk, flash memory, or other appropriate device.
Furthermore, the design workstation 800 includes a drive apparatus
803 for accepting input from or writing output to the storage
medium 804.
[0058] Data recorded on the storage medium 804 may include specify
logic circuit configurations, pattern data for photolithography
masks, or mask pattern data for serial write tools such as electron
beam lithography. The data may further include logic verification
data such as timing diagrams or net circuits associated with logic
simulations. Providing data on the storage medium 804 facilitates
the design of the circuit design 810 or the semiconductor component
812 by decreasing the number of processes for designing
semiconductor wafers.
[0059] For a firmware and/or software implementation, the
methodologies may be implemented with modules (e.g., procedures,
functions, and so on) that perform the functions described herein.
A machine-readable medium tangibly embodying instructions may be
used in implementing the methodologies described herein. For
example, software codes may be stored in a memory and executed by a
processor unit. Memory may be implemented within the processor unit
or external to the processor unit. As used herein, the term
"memory" refers to types of long term, short term, volatile,
nonvolatile, or other memory and is not to be limited to a
particular type of memory or number of memories, or type of media
upon which memory is stored.
[0060] If implemented in firmware and/or software, the functions
may be stored as one or more instructions or code on a
computer-readable medium. Examples include computer-readable media
encoded with a data structure and computer-readable media encoded
with a computer program. Computer-readable media includes physical
computer storage media. A storage medium may be an available medium
that can be accessed by a computer. By way of example, and not
limitation, such computer-readable media can include RAM, ROM,
EEPROM, CD-ROM or other optical disk storage, magnetic disk storage
or other magnetic storage devices, or other medium that can be used
to store desired program code in the form of instructions or data
structures and that can be accessed by a computer; disk and disc,
as used herein, includes compact disc (CD), laser disc, optical
disc, digital versatile disc (DVD), floppy disk and Blu-ray disc
where disks usually reproduce data magnetically, while discs
reproduce data optically with lasers. Combinations of the above
should also be included within the scope of computer-readable
media.
[0061] In addition to storage on computer readable medium,
instructions and/or data may be provided as signals on transmission
media included in a communication apparatus. For example, a
communication apparatus may include a transceiver having signals
indicative of instructions and data. The instructions and data are
configured to cause one or more processors to implement the
functions outlined in the claims.
[0062] The exemplary aspects discussed herein, beneficially allow
the MTJ stack to be protected from at least the process related
damages described above, thereby generating high yield in the
fabrication of MTJs. It should be appreciated that the various
layers of the MTJ stack are provided merely for illustration and
not for limitation. Additional layers may be added and/or layers
may be removed or combined and may comprise different materials
then illustrated.
[0063] It should be appreciated that memory devices including the
MTJ storage elements described herein may be included within a
mobile phone, portable computer, hand-held personal communication
system (PCS) unit, portable data units such as personal data
assistants (PDAs), GPS enabled devices, navigation devices, set top
boxes, music players, video players, entertainment units, fixed
location data units such as meter reading equipment, or any other
device that stores or retrieves data or computer instructions, or
any combination thereof. Accordingly, aspects of the disclosure may
be suitably employed in any device, which includes active
integrated circuitry including memory having MTJ storage elements
as disclosed herein.
[0064] Further, it should be appreciated that various to memory
devices can include an array of MTJ storage elements as disclosed
herein. Additionally, the MTJ storage elements disclosed herein may
be used in various other applications, such as in logic circuits.
Accordingly, although potions of the foregoing disclosure discuss
the stand alone MTJ storage element, it will be appreciated that
various aspects can include devices into which the MTJ storage
element is integrated.
[0065] Accordingly, aspects can include machine-readable media or
computer-readable media embodying instructions which when executed
by a processor transform the processor and any other cooperating
elements into a machine for performing the functionalities
described herein as provided for by the instructions.
[0066] While the foregoing disclosure shows illustrative aspects,
it should be noted that various changes and modifications could be
made herein without departing from the scope of the disclosure as
defined by the appended claims. The functions, steps and/or actions
of the method claims in accordance with the aspects described
herein need not be performed in any particular order. Furthermore,
although elements of the aspects may be described or claimed in the
singular, the plural is contemplated unless limitation to the
singular is explicitly stated.
[0067] Although the present disclosure and its advantages have been
described in detail, it should be understood that various changes,
substitutions and alterations can be made herein without departing
from the technology of the disclosure as defined by the appended
claims. For example, relational terms, such as "above," "below,"
"top" and "bottom" are used with respect to a substrate or
electronic device. Of course, if the substrate or electronic device
is inverted, above becomes below, top becomes bottom and vice
versa. Additionally, if oriented sideways, the terms "above,"
"below," "top" and "bottom" may refer to sides of a substrate or
electronic device, for example.
[0068] The word "exemplary" is used herein to mean "serving as an
example, instance, or illustration." Any aspect described herein as
"exemplary" is not necessarily to be construed as preferred or
advantageous over other aspects. Likewise, the term "aspects of the
disclosure" does not require that all aspects of the disclosure
include the discussed feature, advantage or mode of operation. The
terminology used herein is for the purpose of describing particular
aspects only and is not intended to be limiting of aspects of the
disclosure.
[0069] As used herein, the singular forms "a," "an" and "the" are
intended to include the plural forms as well, unless the context
clearly indicates otherwise. It will be further understood that the
terms "comprises," "comprising," "includes" and/or "including,"
when used herein, specify the presence of stated features,
integers, steps, operations, elements, and/or components, but do
not preclude the presence or addition of one or more other
features, integers, steps, operations, elements, components, and/or
groups thereof
[0070] Moreover, the scope of the present application is not
intended to be limited to the particular configurations of the
process, machine, manufacture, composition of matter, means,
methods and steps described in the specification. As one of
ordinary skill in the art will readily appreciate from the
disclosure, processes, machines, manufacture, compositions of
matter, means, methods, or steps, presently existing or later to be
developed that perform substantially the same function or achieve
substantially the same result as the corresponding configurations
described herein may be utilized according to the present
disclosure. Accordingly, the appended claims are intended to
include within their scope such processes, machines, manufacture,
compositions of matter, means, methods, or steps.
* * * * *