U.S. patent application number 14/573654 was filed with the patent office on 2015-04-16 for substrate processing apparatus.
This patent application is currently assigned to Hitachi Kokusai Electric Inc.. The applicant listed for this patent is Hitachi Kokusai Electric Inc.. Invention is credited to Yoshiro HIROSE, Tsukasa KAMAKURA, Yoshinobu NAKAMURA, Ryota SASAJIMA, Yushin TAKASAWA.
Application Number | 20150101755 14/573654 |
Document ID | / |
Family ID | 44788516 |
Filed Date | 2015-04-16 |
United States Patent
Application |
20150101755 |
Kind Code |
A1 |
HIROSE; Yoshiro ; et
al. |
April 16, 2015 |
SUBSTRATE PROCESSING APPARATUS
Abstract
An insulating film having features such as a low dielectric
constant, a low etching rate and a high insulating property is
formed. An oxycarbonitride film is formed on a substrate by
performing a cycle a predetermined number of times, the cycle
including: (a) supplying a gas containing an element to the
substrate; (b) supplying a carbon-containing gas to the substrate;
(c) supplying a nitrogen-containing gas to the substrate; and (d)
supplying an oxygen-containing gas to the substrate.
Inventors: |
HIROSE; Yoshiro; (Toyama,
JP) ; TAKASAWA; Yushin; (Toyama, JP) ;
KAMAKURA; Tsukasa; (Toyama, JP) ; NAKAMURA;
Yoshinobu; (Toyama, JP) ; SASAJIMA; Ryota;
(Toyama, JP) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Hitachi Kokusai Electric Inc. |
Tokyo |
|
JP |
|
|
Assignee: |
Hitachi Kokusai Electric
Inc.
Tokyo
JP
|
Family ID: |
44788516 |
Appl. No.: |
14/573654 |
Filed: |
December 17, 2014 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
14036568 |
Sep 25, 2013 |
8946092 |
|
|
14573654 |
|
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|
13083022 |
Apr 8, 2011 |
8546272 |
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14036568 |
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Current U.S.
Class: |
156/345.52 ;
118/725 |
Current CPC
Class: |
C23C 16/30 20130101;
H01L 21/02181 20130101; H01L 21/02126 20130101; H01L 21/02189
20130101; H01L 21/02186 20130101; H01L 21/0223 20130101; C23C
16/45546 20130101; H01L 21/02104 20130101; H01L 21/0228 20130101;
H01L 21/02178 20130101; C23C 16/45531 20130101; H01L 21/67011
20130101; H01L 21/02247 20130101; H01L 21/67069 20130101; H01L
21/67017 20130101 |
Class at
Publication: |
156/345.52 ;
118/725 |
International
Class: |
H01L 21/67 20060101
H01L021/67 |
Foreign Application Data
Date |
Code |
Application Number |
Apr 12, 2010 |
JP |
2010-091327 |
Dec 16, 2010 |
JP |
2010-280421 |
Claims
1. A substrate processing apparatus comprising: a process vessel
configured to accommodate a substrate; an element-containing gas
supply system configured to supply a gas containing an element into
the process vessel; a carbon-containing gas supply system
configured to supply a carbon-containing gas into the process
vessel; a nitrogen-containing gas supply system configured to
supply a nitrogen-containing gas into the process vessel; an
oxygen-containing gas supply system configured to supply an
oxygen-containing gas into the process vessel; a heater configured
to heat the substrate in the process vessel; and a control unit
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to form an oxycarbonitride film on the substrate by
performing a cycle a predetermined number of times, the cycle
including: (a) performing a set a predetermined number of times,
the set including: (a-1) supplying the gas containing the element
to the substrate; (a-2) supplying the carbon-containing gas to the
substrate; and (a-3) supplying the nitrogen-containing gas to the
substrate; and (b) supplying the oxygen-containing gas to the
substrate, wherein the processes (a-1) through (a-3) are
non-simultaneously performed, and the processes (a) and (b) are
non-simultaneously performed.
2. The apparatus of claim 1, wherein the control unit is configured
to control the element-containing gas supply system and the heater
to form a layer containing the element having a thickness ranging
from less than one atomic layer to several atomic layers in the
process (a-1).
3. The apparatus of claim 1, wherein the control unit is configured
to control the element-containing gas supply system and the heater
to form a continuous layer containing the element, a discontinuous
layer containing the element or a layer formed by overlaying the
continuous layer and the discontinuous layer in the process
(a-1).
4. The apparatus of claim 1, wherein the control unit is configured
to control the element-containing gas supply system and the heater
to form a deposition layer by depositing the element in the process
(a-1), and the deposition layer comprises a continuous deposition
layer containing the element, a discontinuous deposition layer
containing the element or a layer formed by overlaying the
continuous deposition layer and the discontinuous deposition
layer.
5. The apparatus of claim 1, wherein the control unit is configured
to control the element-containing gas supply system and the heater
to form a continuous chemical adsorption layer of the gas
containing the element or a discontinuous chemical adsorption layer
of the gas containing the element in the process (a-1).
6. The apparatus of claim 1, wherein the control unit is configured
to control the carbon-containing gas supply system and the heater
to form a discontinuous chemical adsorption layer of the
carbon-containing gas in the process (a-2).
7. The apparatus of claim 1, wherein the control unit is configured
to control the nitrogen-containing gas supply system and the heater
to thermally nitride a layer formed on the substrate under a
condition where a nitridation reaction of the layer by the
nitrogen-containing gas is unsaturated in the process (a-3).
8. The apparatus of claim 1, wherein the control unit is configured
to control the oxygen-containing gas supply system and the heater
to thermally oxidize a layer formed on the substrate under a
condition where an oxidation reaction of the layer by the
oxygen-containing gas is unsaturated in the process (b).
9. The apparatus of claim 1, wherein the control unit is configured
to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to perform the cycle including the set and the process (b)
one or more times wherein the set is performed one or more
times.
10. The apparatus of claim 1, wherein the control unit is
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to alternately perform the set and the process (b) one or
more times, wherein the set is performed one or more times.
11. The apparatus of claim 1, wherein the control unit is
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to perform each of the processes (a-1), (a-2), (a-3) and (b)
under non-plasma atmosphere.
12. The apparatus of claim 1, wherein the control unit is
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to supply each gas in thermally activated state to the
substrate in the processes (a-1), (a-2), (a-3) and (b).
13. The apparatus of claim 1, further comprising a pressure
regulating unit configured to regulate a pressure in the process
vessel, and the control unit is configured to control the
element-containing gas supply system, the carbon-containing gas
supply system, the nitrogen-containing gas supply system, the
oxygen-containing gas supply system, the heater and the pressure
regulating unit to adjust a composition of the oxycarbonitride film
by controlling an inner pressure of the process vessel, or by
controlling the inner pressure and a gas supply time in at least
one of the processes (a-1), (a-2), (a-3) and (b).
14. The apparatus of claim 1, further comprising a pressure
regulating unit configured to regulate a pressure in the process
vessel, and the control unit is configured to control the
element-containing gas supply system, the carbon-containing gas
supply system, the nitrogen-containing gas supply system, the
oxygen-containing gas supply system, the heater and the pressure
regulating unit to adjust concentration of at least one of the
element, carbon, nitrogen and oxygen in the oxycarbonitride film by
controlling an inner pressure of the process vessel, or by
controlling the inner pressure and a gas supply time in at least
one of the processes (a-1), (a-2), (a-3) and (b).
15. The apparatus of claim 1, wherein the control unit is
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to perform the processes (a-1) through (a-3) and (b)
separately.
16. The apparatus of claim 1, wherein the control unit is
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to perform the processes (a-1) through (a-3) and (b) without
mixing the gas containing the element, the carbon-containing gas,
the nitrogen-containing gas and the oxygen-containing gas with one
another.
17. The apparatus of claim 1, wherein the control unit is
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to perform the processes (a-1) through (a-3) and (b)
separately by performing gas substitution processes between the
processes (a-1) and (a-2), the processes (a-2) and (a-3), the
processes (a-3) and (b) and the processes (b) and (a-1)
18. A substrate processing apparatus comprising: a process vessel
configured to accommodate a substrate; an element-containing gas
supply system configured to supply a gas containing an element into
the process vessel; a carbon-containing gas supply system
configured to supply a carbon-containing gas into the process
vessel; a nitrogen-containing gas supply system configured to
supply a nitrogen-containing gas into the process vessel; an
oxygen-containing gas supply system configured to supply an
oxygen-containing gas into the process vessel; a heater configured
to heat the substrate in the process vessel; and a control unit
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to form an oxycarbonitride film on the substrate by
performing a cycle a predetermined number of times, the cycle
including: (a) performing a set a predetermined number of times,
the set including: (a-1) supplying the gas containing the element
to the substrate; (a-2) supplying the carbon-containing gas to the
substrate; (a-3) supplying the gas containing the element to the
substrate; and (a-4) supplying the nitrogen-containing gas to the
substrate; and (b) supplying the oxygen-containing gas to the
substrate, wherein the processes (a-1) through (a-4) are
non-simultaneously performed in order, and the processes (a) and
(b) are non-simultaneously performed.
Description
CROSS-REFERENCE TO RELATED PATENT APPLICATION
[0001] This application is a divisional application of U.S. patent
application Ser. No. 14/036,568 filed on Sep. 25, 2013, which is a
divisional application of U.S. patent application Ser. No.
13/083,022, filed Apr. 8, 2011, which issued as U.S. Pat. No.
8,546,272 on Oct. 1, 2013, which claims priority under 35 U.S.C.
.sctn.119 to Japanese Patent Application Nos. 2010-280421, filed
Dec. 16, 2010, and 2010-091327, filed Apr. 12, 2010, in the
Japanese Patent Office, the entire contents of which are hereby
incorporated by reference.
FIELD OF THE INVENTION
[0002] The present invention relates to a method of manufacturing a
semiconductor device including a process of forming a thin film on
a substrate, a method of processing a substrate, and a substrate
processing apparatus.
DESCRIPTION OF THE RELATED ART
[0003] Processes of manufacturing a semiconductor device includes a
process of forming an insulating film such as a silicon oxide
(SiO.sub.2) film or a silicon nitride (Si.sub.3N.sub.4) film on a
wafer such as a silicon wafer. The SiO.sub.2 film is widely used as
an insulating film or an interlayer film due to its excellent
insulating property and low dielectric property. Also, the
Si.sub.3N.sub.4 film is widely used as an insulating film, a mask
film, a charge accumulating film, or a stress control film due to
its excellent insulating property, corrosion-resistant property,
dielectric property, and film stress controlling property, etc.
Technology of adding carbon (C) to these insulating films is also
well known in the art (for example, see Patent Document 1). The
etching-resistant property of the insulating films may be enhanced
by such technology.
PRIOR-ART DOCUMENTS
Patent Documents
[0004] 1. Japanese Patent Laid-Open Publication No. 2005-268699
[0005] However, when C is added to an insulating film, an
etching-resistant property of the insulating film is enhanced, but
a dielectric constant is increased and a leak-resistant property is
deteriorated. That is, since each conventional insulating film has
both advantages and disadvantages, there has been no film having
all features of a low dielectric constant, a low etching rate and a
high insulating property.
SUMMARY OF THE INVENTION
[0006] Therefore, it is an object of the present invention to
provide a method of manufacturing a semiconductor device, a method
of processing a substrate, and a substrate processing apparatus
that are capable of forming an insulating film having features such
as a low dielectric constant, a low etching rate, and a high
insulating property.
[0007] According to one aspect of the present invention, there is
provided a substrate processing apparatus comprising: a process
vessel configured to accommodate a substrate; an element-containing
gas supply system configured to supply a gas containing an element
into the process vessel; a carbon-containing gas supply system
configured to supply a carbon-containing gas into the process
vessel; a nitrogen-containing gas supply system configured to
supply a nitrogen-containing gas into the process vessel; an
oxygen-containing gas supply system configured to supply an
oxygen-containing gas into the process vessel; a heater configured
to heat the substrate in the process vessel; and a control unit
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to form an oxycarbonitride film on the substrate by
performing a cycle a predetermined number of times, the cycle
including: (a) performing a set a predetermined number of times,
the set including: (a-1) supplying the gas containing the element
to the substrate; (a-2) supplying the carbon-containing gas to the
substrate; and (a-3) supplying the nitrogen-containing gas to the
substrate; and (b) supplying the oxygen-containing gas to the
substrate, wherein the steps (a-1) through (a-3) are
non-simultaneously performed, and the steps (a) and (b) are
non-simultaneously performed.
[0008] According to another aspect of the present invention, there
is provided a substrate processing apparatus comprising: a process
vessel configured to accommodate a substrate; an element-containing
gas supply system configured to supply a gas containing an element
into the process vessel; a carbon-containing gas supply system
configured to supply a carbon-containing gas into the process
vessel; a nitrogen-containing gas supply system configured to
supply a nitrogen-containing gas into the process vessel; an
oxygen-containing gas supply system configured to supply an
oxygen-containing gas into the process vessel; a heater configured
to heat the substrate in the process vessel; and a control unit
configured to control the element-containing gas supply system, the
carbon-containing gas supply system, the nitrogen-containing gas
supply system, the oxygen-containing gas supply system and the
heater to form an oxycarbonitride film on the substrate by
performing a cycle a predetermined number of times, the cycle
including: (a) performing a set a predetermined number of times,
the set including: (a-1) supplying the gas containing the element
to the substrate; (a-2) supplying the carbon-containing gas to the
substrate; (a-3) supplying the gas containing the element to the
substrate; and (a-4) supplying the nitrogen-containing gas to the
substrate; and (b) supplying the oxygen-containing gas to the
substrate, wherein the steps (a-1) through (a-4) are
non-simultaneously performed in order, and the steps (a) and (b)
are non-simultaneously performed.
BRIEF DESCRIPTION OF THE DRAWINGS
[0009] FIG. 1 is a configuration diagram schematically illustrating
a vertical process furnace of a substrate processing apparatus
preferably used in an exemplary embodiment of the present
invention, illustrating a longitudinal cross section of the process
furnace;
[0010] FIG. 2 is a configuration diagram schematically illustrating
the vertical process furnace of the substrate processing apparatus
preferably used in the exemplary embodiment of the present
invention, illustrating a cross section of the process furnace
taken along line A-A of FIG. 1;
[0011] FIG. 3 is a diagram illustrating gas supply timings in a
first sequence according to an embodiment of the present
invention;
[0012] FIG. 4 is a diagram illustrating gas supply timings in a
modified example of the first sequence according to the embodiment
of the present invention;
[0013] FIG. 5 is a diagram illustrating gas supply timings in a
second sequence according to the embodiment of the present
invention; and
[0014] FIG. 6 is a diagram illustrating gas supply timings in a
modified example of the second sequence according to the embodiment
of the present invention;
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0015] Hereinafter, exemplary embodiments of the present invention
will be described with reference to the accompanying drawings.
[0016] (1) Configuration of Substrate Processing Apparatus
[0017] FIG. 1 is a configuration diagram schematically illustrating
a vertical process furnace of a substrate processing apparatus
preferably used in an exemplary embodiment of the present
invention, illustrating a longitudinal cross section of the process
furnace 202. FIG. 2 is a configuration diagram schematically
illustrating the vertical process furnace of the substrate
processing apparatus preferably used in the exemplary embodiment of
the present invention, illustrating a cross section of the process
furnace 202 taken along line A-A of FIG. 1.
[0018] As shown in FIG. 1, the process furnace 202 includes a
heater 207 serving as a heating means (a heating device). The
heater 207 has a cylindrical shape and is supported by a heater
base (not shown) serving as a holding plate to be installed
vertically. As will be described below, the heater 207 also
functions as an activation device configured to activate gas by
heat.
[0019] A reaction tube 203 having a shape concentric with the
heater 207 and constituting a reaction vessel (a process vessel) is
installed inside the heater 207. The reaction tube 203 is, for
example, made of a heat-resistant material such as quartz
(SiO.sub.2) or silicon carbide (SiC). The reaction tube 203 has a
cylindrical shape with its upper end closed and lower end open. A
process chamber 201 is formed in a hollow cylindrical portion of
the reaction tube 203. The process chamber 201 is configured to
accommodate wafers 200 serving as substrates in a horizontal
posture in a state where the wafers 200 are vertically arranged in
multiple stages by a boat 217 to be described below.
[0020] A first nozzle 249a, a second nozzle 249b, a third nozzle
249c, and a fourth nozzle 249d are installed inside the process
chamber 201 so as to pass through a lower portion of the reaction
tube 203. A first gas supply pipe 232a, a second gas supply pipe
232b, a third gas supply pipe 232c, and a fourth gas supply pipe
232d are connected to the first nozzle 249a, the second nozzle
249b, the third nozzle 249c, and the fourth nozzle 249d,
respectively. In this way, the four nozzles 249a, 249b, 249c, and
249d and the four gas supply pipes 232a. 232b, 232c, and 232d are
installed in the reaction tube 203 so that many kinds of gases, for
example, four kinds of gases here, may be supplied into the process
chamber 201.
[0021] A mass flow controller (MFC) 241a, which is a flow rate
controller (a flow rate control unit), and a valve 243a, which is
an opening/closing valve, are installed in the first gas supply
pipe 232a in order from an upstream side thereof. A first inert gas
supply pipe 232e is connected to a downstream side of the valve
243a of the first gas supply pipe 232a. An MFC 241e, which is a
flow rate controller (a flow rate control unit), and a valve 243e,
which is an opening/closing valve, are installed in the first inert
gas supply pipe 232e in order from an upstream side thereof. The
above-described first nozzle 249a is connected to a tip end portion
of the first gas supply pipe 232a. The first nozzle 249a is
vertically installed in an arc-shaped space between an inner wall
of the reaction tube 203 and the wafers 200 in a stacking direction
of the wafers 200 along an upper portion from a lower portion of
the inner wall of the reaction tube 203. The first nozzle 249a is
formed as an L-shaped long nozzle. A gas supply hole 250a
configured to supply a gas is installed on a side surface of the
first nozzle 249a. The gas supply hole 250a is opened toward the
center of the reaction tube 203. A plurality of gas supply holes
250a are installed from a lower portion to an upper portion of the
reaction tube 203 to have the same opening area and the same
opening pitch. A first gas supply system mainly includes the first
gas supply pipe 232a, the MFC 241a, the valve 243a, and the first
nozzle 249a. A first inert gas supply system mainly includes the
first inert gas supply pipe 232e, the MFC 241e, and the valve
243e.
[0022] An MFC 241b, which is a flow rate controller (a flow rate
control unit), and a valve 243b, which is an opening/closing valve,
are installed in the second gas supply pipe 232b in order from an
upstream side thereof. A second inert gas supply pipe 232f is
connected to a downstream side of the valve 243b of the second gas
supply pipe 232b. An MFC 241f, which is a flow rate controller (a
flow rate control unit), and a valve 243f, which is an
opening/closing valve, are installed in the second inert gas supply
pipe 232f in order from an upstream side thereof. The
above-described second nozzle 249b is connected to a tip end
portion of the second gas supply pipe 232b. The second nozzle 249b
is vertically installed in an arc-shaped space between an inner
wall of the reaction tube 203 and the wafers 200 in a stacking
direction of the wafers 200 along an upper portion from a lower
portion of the inner wall of the reaction tube 203. The second
nozzle 249b is formed as an L-shaped long nozzle. A gas supply hole
250b configured to supply a gas is installed on a side surface of
the second nozzle 249b. The gas supply hole 250b is opened toward
the center of the reaction tube 203. A plurality of gas supply
holes 250b are installed from a lower portion to an upper portion
of the reaction tube 203 to have the same opening area and the same
opening pitch. A second gas supply system mainly includes the
second gas supply pipe 232b, the MFC 241b, the valve 243b, and the
second nozzle 249b. Also, a second inert gas supply system mainly
includes the second inert gas supply pipe 232f, the MFC 241f, and
the valve 243f.
[0023] An MFC 241c, which is a flow rate controller (a flow rate
control unit), and a valve 243c, which is an opening/closing valve,
are installed in the third gas supply pipe 232c in order from an
upstream side thereof. A third inert gas supply pipe 232g is
connected to a downstream side of the valve 243c of the third gas
supply pipe 232c. An MFC 241g, which is a flow rate controller (a
flow rate control unit), and a valve 243g, which is an
opening/closing valve, are installed in the third inert gas supply
pipe 232g in order from an upstream side thereof. The
above-described third nozzle 249c is connected to a tip end portion
of the third gas supply pipe 232c. The third nozzle 249c is
vertically installed in an arc-shaped space between an inner wall
of the reaction tube 203 and the wafers 200 in a stacking direction
of the wafers 200 along an upper portion from a lower portion of
the inner wall of the reaction tube 203. The third nozzle 249c is
formed as an L-shaped long nozzle. A gas supply hole 250c
configured to supply a gas is installed on a side surface of the
third nozzle 249c. The gas supply hole 250c is opened toward the
center of the reaction tube 203. A plurality of gas supply holes
250c are installed from a lower portion to an upper portion of the
reaction tube 203 to have the same opening area and the same
opening pitch. A third gas supply system mainly includes the third
gas supply pipe 232c, the MFC 241c, the valve 243c, and the third
nozzle 249c. Also, a third inert gas supply system mainly includes
the third inert gas supply pipe 232g, the MFC 241g, and the valve
243g.
[0024] An MFC 241d, which is a flow rate controller (a flow rate
control unit), and a valve 243d, which is an opening/closing valve,
are installed in the fourth gas supply pipe 232d in order from an
upstream side thereof. A fourth inert gas supply pipe 232h is
connected to a downstream side of the valve 243d of the fourth gas
supply pipe 232d. An MFC 241h, which is a flow rate controller (a
flow rate control unit), and a valve 243h, which is an
opening/closing valve, are installed in the fourth inert gas supply
pipe 232h in order from an upstream side thereof. The
above-described fourth nozzle 249d is connected to a tip end
portion of the fourth gas supply pipe 232d. The fourth nozzle 249d
is installed inside a buffer chamber 237, which is a gas dispersing
space.
[0025] The buffer chamber 237 is installed in an arc-shaped space
between an inner wall of the reaction tube 203 and the wafers 200
in a stacking direction of the wafers 200 from a lower portion to
an upper portion of the inner wall of the reaction tube 203. A gas
supply hole 250e configured to supply a gas is installed on an end
portion of a wall of the buffer chamber 237, which is adjacent to
the wafers 200. The gas supply hole 250e is opened toward the
center of the reaction tube 203. A plurality of gas supply holes
250e are installed from a lower portion to an upper portion of the
reaction tube 203 to have the same opening area and the same
opening pitch.
[0026] The fourth nozzle 249d is vertically installed at an end
portion opposite to another end portion of the buffer chamber 237
in which the gas supply holes 250e are installed, in a stacking
direction of the wafers 200 along an upper portion from a lower
portion of the inner wall of the reaction tube 203. The fourth
nozzle 249d is formed as an L-shaped long nozzle. A gas supply hole
250d configured to supply a gas is installed on a side surface of
the fourth nozzle 249d. The gas supply hole 250d is opened toward
the center of the buffer chamber 237. Like the gas supply holes
250e of the buffer chamber 237, a plurality of gas supply holes
250d are installed from a lower portion to an upper portion of the
reaction tube 203. When a difference in pressure between the
interior of the buffer chamber 237 and the interior of the process
chamber 201 is small, the plurality of gas supply holes 250d may
have the same opening area and the same opening pitch from an
upstream side (a lower portion) to a downstream side (an upper
portion). However, when the difference in pressure is large, each
opening area may become larger or each opening pitch may become
smaller as the opening area or the opening pitch span from an
upstream side toward a downstream side.
[0027] In the embodiment of the present invention, gases are
injected at different flow velocities but at substantially the same
flow rate through the gas supply holes 250d of the fourth nozzle
249d by adjusting the opening areas or opening pitches of the gas
supply holes 250d from an upstream side to a downstream side of the
fourth nozzle 249d as described above. Then, the gas injected
through each of the gas supply holes 250d is first introduced into
the buffer chamber 237, and the difference in the flow velocities
of the gas in the buffer chamber 237 is uniformly adjusted.
[0028] That is, after the particle velocity of the gas injected
into the buffer chamber 237 through the gas supply holes 250d of
the fourth nozzle 249d is lowered in the buffer chamber 237, the
gas is injected into the process chamber 201 through the gas supply
holes 250e of the buffer chamber 237. Accordingly, the gas that has
been injected into the buffer chamber 237 through each of the gas
supply holes 250d of the fourth nozzle 249d has uniform flow rate
and flow velocity when the gas is injected into the process chamber
201 through each of the gas supply holes 250e of the buffer chamber
237.
[0029] A fourth gas supply system mainly includes the fourth gas
supply pipe 232d, the MFC 241d, the valve 243d, the fourth nozzle
249d, and the buffer chamber 237. Also, in the fourth gas supply
system, the buffer chamber 237 functions as a nozzle configured to
supply a gas toward the wafers 200. A fourth inert gas supply
system mainly includes the fourth inert gas supply pipe 232h, the
MFC 241h, and the valve 243h.
[0030] For example, a silicon (Si) source gas, i.e., a gas
containing silicon (a silicon-containing gas), is supplied into the
process chamber 201 through the first gas supply pipe 232a via the
MFC 241a, the valve 243a, and the first nozzle 249a.
Hexachlorodisilane (Si.sub.2C.sub.6, HCD) gas, for example, may be
used as the silicon-containing gas. When a liquid material, such as
HCD, which is in a liquid state at a normal temperature and under a
normal pressure is used, the liquid material is vaporized by a
vaporizing system such as a vaporizer or a bubbler to be supplied
as a source gas.
[0031] For example, a gas containing carbon (C) (a
carbon-containing gas) is supplied into the process chamber 201
through the second gas supply pipe 232b via the MFC 241b, the valve
243b, and the second nozzle 249b. Propylene (C.sub.3H.sub.6) gas,
for example, may be used as the carbon-containing gas. Also, a gas
containing hydrogen (H) (a hydrogen-containing gas) may be supplied
into the process chamber 201 through the second gas supply pipe
232b via the MFC 241b, the valve 243b, and the second nozzle 249b.
Hydrogen (H.sub.2) gas, for example, may be used as the
hydrogen-containing gas.
[0032] For example, a gas containing nitrogen (N) (a
nitrogen-containing gas) is supplied into the process chamber 201
through the third gas supply pipe 232c via the MFC 241c, the valve
243c, and the third nozzle 249c. Ammonia (NH.sub.3) gas, for
example, may be used as the nitrogen-containing gas.
[0033] For example, a gas containing oxygen (O) (an
oxygen-containing gas) is supplied into the process chamber 201
through the fourth gas supply pipe 232d via the MFC 241d, the valve
243d, the fourth nozzle 249d, and the buffer chamber 237. Oxygen
(O.sub.2) gas, for example, may be used as the oxygen-containing
gas.
[0034] For example, N.sub.2 gas is supplied into the process
chamber 201 through the inert gas supply pipes 232e, 232f, 232g,
and 232h via the MFCs 241e, 241f, 241g, and 241h, the valves 243e,
243f, 243g, and 243h, the gas supply pipes 232a, 232b, 232c, and
232d, the gas nozzles 249a, 249b, 249c, and 249d, and the buffer
chamber 237.
[0035] For example, when the above-described gases flow through the
gas supply pipes, the first gas supply system constitutes a source
gas supply system, i.e., a silicon-containing gas supply system (a
silane-based gas supply system). Also, the second gas supply system
constitutes a carbon-containing gas supply system or a
hydrogen-containing gas supply system. Also, the third gas supply
system constitutes a nitrogen-containing gas supply system. In
addition, the fourth gas supply system constitutes an
oxygen-containing gas supply system. The source gas supply system
is also simply referred to as a source supply system. When the
carbon-containing gas, the hydrogen-containing gas, the
nitrogen-containing gas, and the oxygen-containing gas are
generally called reaction gases, the carbon-containing gas supply
system, the hydrogen-containing gas supply system, the
nitrogen-containing gas supply system, and the oxygen-containing
gas supply system constitute a reaction gas supply system.
[0036] As shown in FIG. 2, a first rod-shaped electrode 269, i.e.,
a first electrode, and a second rod-shaped electrode 270, i.e., a
second electrode, each of which has a thin and long structure, are
installed inside the buffer chamber 237 along a stacking direction
of the wafers 200 from a lower portion to an upper portion of the
reaction tube 203. Each of the first rod-shaped electrode 269 and
the second rod-shaped electrode 270 is installed in parallel to the
fourth nozzle 249d. Each of the first rod-shaped electrode 269 and
the second rod-shaped electrode 270 is covered and protected by an
electrode protecting tube 275, which is a protection tube
configured to protect the electrodes from upper portions to lower
portions thereof. One of the first rod-shaped electrode 269 and the
second rod-shaped electrode 270 is connected to a high-frequency
power source 273 via a matching transformer 272, and the other is
connected to a ground, which is a reference potential. As a result,
plasma is produced in a plasma producing region 224 between the
first rod-shaped electrode 269 and the second rod-shaped electrode
270. A plasma source serving as a plasma generator (a plasma
generating unit) mainly includes the first rod-shaped electrode
269, the second rod-shaped electrode 270, the electrode protecting
tubes 275, the matching transformer 272, and the high-frequency
power source 273. As described below, the plasma source also
functions as an activation device configured to activate gas by
plasma.
[0037] The electrode protecting tube 275 is configured such that
each of the first rod-shaped electrode 269 and the second
rod-shaped electrode 270 can be inserted into the buffer chamber
237 in a state where first rod-shaped electrode 269 and the second
rod-shaped electrode 270 are separated from an atmosphere of the
buffer chamber 237. Here, when an interior of the electrode
protecting tube 275 has the same atmosphere as an exterior air
(atmosphere), the first rod-shaped electrode 269 and the second
rod-shaped electrode 270 inserted respectively into the electrode
protecting tubes 275 are oxidized by heat of the heater 207.
Therefore, an inert gas purge mechanism charged or purged with an
inert gas such as nitrogen, restrained to a sufficiently low oxygen
concentration, and configured to prevent oxidation of the first
rod-shaped electrode 269 or the second rod-shaped electrode 270 is
installed in the interior of the electrode protecting tube 275.
[0038] An exhaust pipe 231 configured to exhaust an atmosphere in
the process chamber 201 is installed in the reaction tube 203. A
vacuum pump 246 serving as a vacuum exhaust unit is connected to
the exhaust pipe 231 via a pressure sensor 245 serving as a
pressure detector (a pressure detecting unit) configured to detect
a pressure in the process chamber 201, and an auto pressure
controller (APC) valve 244 serving as a pressure regulator (a
pressure regulating unit). The vacuum pump 246 may vacuum-exhaust
the process chamber 201 so that a pressure in the process chamber
201 becomes a predetermined pressure (vacuum degree). Also, the APC
valve 244 is an opening/closing valve that may vacuum-exhaust an
interior of the process chamber 201 or stop the vacuum-exhausting
of an interior of the process chamber 201 as it is opened and
closed and may regulate a pressure in the process chamber 201
according to an opening degree of the valve 244. An exhaust system
mainly includes the exhaust pipe 231, the APC valve 244, the vacuum
pump 246, and the pressure sensor 245.
[0039] A seal cap 219 serving as a furnace port cover configured to
hermetically seal a lower end opening of the reaction tube 203 is
installed on a lower portion of the reaction tube 203. The seal cap
219 is installed to vertically contact a lower end of the reaction
tube 203 on the lower side of the reaction tube 203. For example,
the seal cap 219 is made of a metal such as stainless steel and has
a disk shape. An O-ring 220 serving as a seal member configured to
contact the lower end of the reaction tube 203 is installed on an
upper surface of the seal cap 219. A boat rotating mechanism 267
configured to rotate the boat 217 is installed at an opposite side
of the process chamber 201 with respect to a center of the seal cap
219. A rotary shaft 255 of the boat rotating mechanism 267 passes
through the seal cap 219 to be connected to the boat 217 to be
described below. The wafers 200 are rotated by rotating the boat
217. The seal cap 219 is configured to be vertically elevated by a
boat elevator 115 serving as an elevation mechanism vertically
installed outside the reaction tube 203 so that the boat 217 can be
loaded into the process chamber 201 or unloaded from the process
chamber 201.
[0040] The boat 217 serving as a substrate supporting tool is made
of a heat-resistant material, for example, SiO.sub.2 or SiC. The
boat 217 is configured to concentrically align a plurality of
wafers 200 in a horizontal posture and support the plurality of
wafers 200 in multiple stages. Also, an insulating member 218 made
of a heat-resistant material such as SiO.sub.2 or SiC is configured
to be installed at a lower portion of the boat 217 so that heat
from the heater 207 cannot be easily transferred to the seal cap
219. Also, the insulating member 218 may include a plurality of
insulating plates made of a heat-resistant material such as
SiO.sub.2 or SiC, and an insulating plate holder configured to
support the insulating plates in a horizontal posture in multiple
stages.
[0041] A temperature sensor 263 serving as a temperature detector
is installed inside the reaction tube 203. The process chamber 201
is configured to have a desired temperature distribution by
regulating power supplied to the heater 207 based on temperature
information detected by the temperature sensor 263. The temperature
sensor 263 is L-shaped similar to the nozzles 249a, 249b, 249c, and
249c and is installed along the inner wall of the reaction tube
203.
[0042] A controller 121, which is a control unit (a control means),
is connected to the MFCs 241a, 241b, 241c, 241d, 241e, 241f, 241g,
and 241h, the valves 243a, 243b, 243c, 243d, 243e, 243f, 243g, and
243h, the pressure sensor 245, the APC valve 244, the vacuum pump
246, the heater 207, the temperature sensor 263, the boat rotating
mechanism 267, the boat elevator 115, the high-frequency power
source 273, the matching transformer 272, etc. The controller 121
controls flow rate regulating operations for various gases by the
MFCs 241a, 241b, 241c, 241d, 241e, 241f, 241g, and 241h,
opening/closing operations of the valves 243a, 243b, 243c, 243d,
243e, 243f, 243g, and 243h, opening/closing operations of the APC
valve 244, a pressure regulating operation of the APC valve 244
based on the pressure sensor 245, a temperature regulating
operation of the heater 207 based on the temperature sensor 263,
starting and stopping of the vacuum pump 246, a rotating speed
regulating operation of the boat rotating mechanism 267, an
elevating operation of the boat elevator 115, etc., or controls
power supply of the high-frequency power source 273 and an
impedance of the matching transformer 272.
[0043] (2) Substrate Processing Process
[0044] Next, a sequence example of forming a silicon
oxycarbonitride film (a SiOCN film) serving as an insulating film
on a substrate will be described as a process of the processes of
manufacturing a semiconductor device using the process furnace of
the above-described substrate processing apparatus. In the
following description, the operations of the units constituting the
substrate processing apparatus are also controlled by the
controller 121.
[0045] According to a conventional chemical vapor deposition (CVD)
method, a plurality of gases containing a plurality of elements
constituting a film to be formed are supplied together at the same
time. According to a conventional atomic layer deposition (ALD)
method, a plurality of gases containing a plurality of elements
constituting a film to be formed are alternately supplied. Then, a
SiO.sub.2 film or a Si.sub.3N.sub.4 film is formed by controlling
supply conditions such as a flow rate of a supplied gas, a gas
supplying time, and a plasma power during the gas supply. For
example, the supply conditions are controlled so that, in the case
of forming the SiO.sub.2 film by the technology, a composition
ratio of the SiO.sub.2 film becomes a stoichiometric composition
ratio of O/Si.apprxeq.2, and in the case of forming the
Si.sub.3N.sub.4 film, a composition ratio of the Si.sub.3N.sub.4
film becomes a stoichiometric composition ratio of
N/Si.apprxeq.1.33.
[0046] According to the embodiment of the present invention, a
supply condition is controlled so that a composition ratio of a
film to be formed becomes a stoichiometric composition ratio or a
predetermined composition ratio different from the stoichiometric
composition ratio. For example, a supply condition is controlled
such that at least one of a plurality of elements constituting a
film to be formed becomes a more excessive than the other elements
in terms of the stoichiometric composition ratio. Hereinafter, a
sequence example of forming a film while controlling a ratio of the
plurality of elements constituting a film to be formed, i.e., the
composition ratio of the film to be formed, will be described.
[0047] (First Sequence)
[0048] First, a first sequence according to an embodiment of the
present invention will be described. FIG. 3 is a diagram
illustrating gas supply timing in a first sequence according to the
embodiment of the present invention.
[0049] In the first sequence according to the embodiment of the
present invention, a SiOCN film having a predetermined thickness is
formed on a wafer 200 by performing, a predetermined number of
times (n times), a cycle including the steps of:
[0050] (a) supplying a silicon-containing gas into a process vessel
accommodating the wafer 200 under a condition where a CVD reaction
is caused to form a silicon-containing layer on the wafer 200;
[0051] (b) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the silicon-containing
layer, thereby forming a layer including Si and C;
[0052] (c) supplying a nitrogen-containing gas into the process
vessel to nitride the layer including Si and C, thereby forming a
SiCN layer; and
[0053] (d) supplying an oxygen-containing gas into the process
vessel to oxidize the SiCN layer, thereby forming a SiOCN
layer.
[0054] When starting the study, the inventors thought that SiO
would be obtained instead of SiOCN by oxidizing SiCN. This is
because the inventors thought that since a binding force of a Si--O
bond is stronger than that of a Si--N bond or a Si--C bond of SiCN,
the Si--N bond and the Si--C bond of SiCN would be broken and C and
N from which Si is broken would be separated from the SiCN while a
Si--O bond was formed in an oxidation process.
[0055] Accordingly, when starting the study, the inventors were
planning to form SiOCN by alternately repeating deposition of SiCN
onto a wafer and deposition of SiO onto SiCN and alternately
stacking SiCN and SiO. However, the inventors have made much
research and found that SiOCN may be properly formed as C and N
separated by oxidation may be left by controlling an oxidizing
force (in particular, a dilution rate, a supply time, and a partial
pressure of an oxygen-containing gas) during oxidation of SiCN. The
present invention is based on these facts acquired by the
inventors.
[0056] Hereinafter, the first sequence according to the embodiment
of the present invention will be described in detail. Here, an
example where a SiOCN film serving as an insulating film is formed
on a substrate through the sequence of FIG. 3 using HCD gas as a
silicon-containing gas, C.sub.3H.sub.6 gas as a carbon-containing
gas, NH.sub.3 gas as a nitrogen-containing gas, and O.sub.2 gas as
an oxygen-containing gas will be described.
[0057] As shown in FIG. 1, when a plurality of wafers 200 are
charged onto the boat 217 (wafer charging), the boat 217 supporting
the plurality of wafers 200 is lifted by the boat elevator 115 and
loaded into the process chamber 201 (boat loading). In this state,
the seal cap 219 seals a lower end of the reaction tube 203 via the
O-ring 220.
[0058] An interior of the process chamber 201 is vacuum-exhausted
by the vacuum pump 246 such that a pressure in the process chamber
201 becomes a desired pressure (vacuum degree). In this case, the
pressure in the process chamber 201 is measured by the pressure
sensor 245 and the APC valve 244 is feedback-controlled based on
measured pressure information (pressure regulation). Also, an
interior of the process chamber 201 is heated by the heater 207 so
that an temperature in the process chamber 201 becomes a desired
temperature. In this case, power supplied to the heater 207 is
feedback-controlled based on temperature information detected by
the temperature sensor 263 so that the interior of the process
chamber 201 has a desired temperature distribution (temperature
regulation). Subsequently, the wafers 200 are rotated when the boat
217 is rotated by the boat rotating mechanism 267 (wafer rotation).
Thereafter, four steps to be described below are sequentially
performed.
[0059] [First Step]
[0060] The valve 243a of the first gas supply pipe 232a is opened
to flow HCD gas into the first gas supply pipe 232a. A flow rate of
the HCD gas that flows in the first gas supply pipe 232a is
regulated by the MFC 241a. The HCD gas whose flow rate has been
regulated is supplied into the process chamber 201 through the gas
supply hole 250a of the first nozzle 249a and is exhausted through
the exhaust pipe 231. In this case, the valve 243e is opened to
flow an inert gas such as N.sub.2 gas into the inert gas supply
pipe 232e. A flow rate of the N.sub.2 gas that flows in the inert
gas supply pipe 232e is regulated by the MFC 241e. The N.sub.2 gas
whose flow rate has been regulated is supplied into the process
chamber 201 together with the HCD gas and exhausted through the
exhaust pipe 231.
[0061] In this case, a pressure in the process chamber 201 is set,
for example, to a range of 10 to 1,000 Pa by properly regulating
the APC valve 244. A flow rate of supplied HCD gas controlled by
the MFC 241 la is set, for example, to a range of 10 to 1,000 sccm.
A flow rate of supplied N.sub.2 gas controlled by the MFC 241e is
set, for example, to a range of 200 to 2,000 sccm. A time taken to
expose the wafer 200 to the HCD gas, i.e., a gas supply time
(irradiation time), is set, for example, to a range of 1 to 120
seconds. In this case, a temperature of the heater 207 is set, for
example, to a temperature at which a CVD reaction may be caused in
the process chamber 201, i.e., a temperature at which the wafer 200
has a temperature range of, for example, 300 to 650.degree. C. When
the temperature of the wafer 200 is less than 300.degree. C.,
adsorption of HCD onto the wafer 200 is difficult. Also, when the
temperature of the wafer 200 exceeds 650.degree. C., uniformity is
deteriorated due to a strong CVD reaction. Thus, the temperature of
the wafer 200 is preferably set to a range of 300 to 650.degree.
C.
[0062] A first layer including Si is formed on an underlayer film
on a surface of the wafer 200 by supplying HCD gas. That is, a Si
layer serving as a silicon-containing layer of less than one atomic
layer to several atomic layers is formed on the wafer 200 (on the
underlayer film). The silicon-containing layer may be a chemical
adsorption layer of HCD. Si is an element that becomes solid by
itself. Here, in addition to a continuous layer composed of Si, the
Si layer includes a discontinuous layer or a thin film formed by
overlaying the continuous layer and the discontinuous layer. Also,
the continuous layer composed of Si is often referred to as a thin
film. The chemical adsorption layer of HCD includes, in addition to
a continuous chemical adsorption layer of HCD molecules, a
discontinuous chemical adsorption layer of HCD molecules. Also, a
layer of less than one atomic layer means a discontinuously formed
atomic layer. When a thickness of the silicon-containing layer
formed on the wafer 200 exceeds that of several atomic layers, a
nitriding operation in a third step to be described below does not
affect the entire silicon-containing layer. Also, a minimum value
of a silicon-containing layer, which may be formed on the wafer
200, is less than one atomic layer. Thus, a thickness of the
silicon-containing layer is preferably set to less than one atomic
layer to several atomic layers. Also, Si is deposited on the wafer
200 to form a Si layer under a condition where HCD gas is
self-decomposed, whereas HCD is chemically adsorbed on the wafer
200 to form a chemical adsorption layer of HCD under a condition
where HCD gas is not self-decomposed. It is more preferable to form
a Si layer on the wafer 200 than to form a chemical adsorption
layer of HCD on the wafer 200 in order to increase a film-forming
rate.
[0063] After the silicon-containing layer is formed, the valve 243a
is closed to stop supply of the HCD gas. In this case, the APC
valve 244 of the exhaust pipe 231 is kept open to vacuum-exhaust
the interior of the process chamber 201 using the vacuum pump 246,
and the residual HCD gas in the process chamber 201 which has not
reacted or has contributed to formation of the silicon-containing
layer is removed from the process chamber 201. In this case, the
valve 243e is kept open to maintain supply of the N.sub.2 gas into
the process chamber 201. Accordingly, the residual HCD gas in the
process chamber 201 which has not reacted or has contributed to
formation of the silicon-containing layer may be effectively
removed from the process chamber 201.
[0064] The silicon-containing gas may be, in addition to the HCD
gas, an organic source such as amino silane-based
tetrakisdimethylaminosilane (Si[N(CH.sub.3).sub.2].sub.4, 4DMAS)
gas, trisdimethylaminosilane (Si[N(CH.sub.3).sub.2].sub.3H, 3DMAS)
gas, bisdiethylaminosilane
(Si[N(C.sub.2H.sub.5).sub.2].sub.2H.sub.2, 2DEAS) gas, and
bistertiarybutylaminosilane (SiH.sub.2[NH(C.sub.4H.sub.9)].sub.2,
BTBAS), as well as an inorganic source such as tetrachlorosilane
(SiCl.sub.4, STC) gas, trichlorosilane (SiHCl.sub.3, TCS) gas,
dichlorosilane (SiH.sub.2Cl.sub.2, DCS) gas, monochlorosilane
(SiH.sub.3Cl, MCS) gas, and monosilane (SiH.sub.4) gas. The inert
gas may include a noble gas such as Ar gas, He gas, Ne gas, and Xe
gas, in addition to N.sub.2 gas.
[0065] [Second Step]
[0066] After the first step is completed and the residual gas in
the process chamber 201 is removed, the valve 243b of the second
gas supply pipe 232b is opened to flow C.sub.3H.sub.6 gas into the
second gas supply pipe 232b. A flow rate of the C.sub.3H.sub.6 gas
that flows in the second gas supply pipe 232b is regulated by the
MFC 241b. The C.sub.3H.sub.6 gas whose flow rate has been regulated
is supplied into the process chamber 201 through a gas supply hole
250b of the second nozzle 249b and is exhausted through the exhaust
pipe 231. Also, the C.sub.3H.sub.6 gas supplied into the process
chamber 201 is thermally activated. In this case, the valve 243f is
opened to flow N.sub.2 gas into the inert gas supply pipe 232f at
the same time. The N.sub.2 gas is supplied into the process chamber
201 together with C.sub.3H.sub.6 gas and is exhausted through the
exhaust pipe 231.
[0067] In this case, a pressure in the process chamber 201 is set,
for example, to a range of 50 to 3,000 Pa by properly controlling
the APC valve 244. A flow rate of supplied C.sub.3H.sub.6 gas
controlled by the MFC 241b is set, for example, to a range of 100
to 10,000 sccm. A flow rate of supplied N.sub.2 gas controlled by
the MFC 241f is set, for example, to a range of 200 to 2,000 sccm.
In this case, a partial pressure of the C.sub.3H.sub.6 gas in the
process chamber 201 is regulated to a range of 6 to 2,940 Pa. An
exposure time of the C.sub.3H.sub.6 gas to the wafer 200, i.e., a
gas supply time (irradiation time), is set, for example, to a range
of 1 to 120 seconds. In this case, a temperature of the heater 207
is set such that the temperature of the wafer 200 becomes
300.degree. C. to 650.degree. C. as in the first step. Since a soft
reaction may be caused by thermally activating and supplying the
C.sub.3H.sub.6 gas, a carbon-containing layer to be described below
may be easily formed.
[0068] In this case, the gas flowing into the process chamber 201
is thermally activated C.sub.3H.sub.6 gas, and HCD gas does not
flow into the process chamber 201. Thus, the C.sub.3H.sub.6 gas
does not cause a vapor phase reaction and is activated and supplied
to the wafer 200. In this case, a carbon-containing layer of less
than one atomic layer, i.e., a discontinuous carbon-containing
layer, is formed on the silicon-containing layer formed on the
wafer 200 in the first step. Accordingly, the second layer
including Si and C is formed. The second layer including Si and C
may be formed by reacting a portion of the silicon-containing layer
with the C.sub.3H.sub.6 gas and modifying (carbonizing) the
silicon-containing layer depending on conditions.
[0069] The carbon-containing layer formed on the silicon-containing
layer may be a C layer or may be a chemical adsorption layer of a
carbon-containing gas (C.sub.3H.sub.6), that is, a chemical
adsorption layer of a material (C.sub.xH.sub.y) produced by
decomposing C.sub.3H.sub.6. Here, the carbon layer needs to be a
discontinuous layer composed of C. In addition, the chemical
adsorption layer of C.sub.xH.sub.y needs to be a discontinuous
chemical adsorption layer of C.sub.xH.sub.y molecules. When the
carbon-containing layer formed on the silicon-containing layer is a
continuous layer, for example, when a continuous chemical
adsorption layer of C.sub.xH.sub.y is formed on a
silicon-containing layer with adsorption of C.sub.xH.sub.y onto the
silicon-containing layer being in a saturated state, a surface of
the silicon-containing layer is entirely covered with the chemical
adsorption layer of C.sub.xH.sub.y. In this case, since silicon is
not present on a surface of the second layer, nitriding the second
layer in the third step to be described below is difficult. This is
because N binds to Si but does not bind to C. In order to cause a
desired nitridation reaction in the third step to be described
below, adsorption of C.sub.xH.sub.y onto the silicon-containing
layer is in an unsaturated state, and thus a surface of the second
layer needs to be a state where silicon is exposed.
[0070] In order to make the adsorption of C.sub.xH.sub.y onto the
silicon-containing layer in an unsaturated state, the processing
conditions in the second step may preferably be set to the
above-described processing conditions. Furthermore, when the
processing conditions in the second step are set to the following
processing conditions, it becomes easy to make an adsorption state
of C.sub.xH.sub.y onto a silicon-containing layer an unsaturated
state.
[0071] Temperature of wafer: 500 to 630.degree. C.
[0072] Pressure in process chamber: 133 to 2,666 Pa
[0073] Partial pressure of C.sub.3H.sub.6 gas: 67 to 2,820 Pa
[0074] Flow rate of supplied C.sub.3H.sub.6 gas: 1,000 to 5,000
sccm
[0075] Flow rate of supplied N.sub.2 gas: 300 to 1,000 sccm
[0076] Supply time of C.sub.3H.sub.6 gas: 6 to 100 seconds
[0077] Thereafter, the valve 243b of the second gas supply pipe
232b is closed to stop supply of the C.sub.3H.sub.6 gas. In this
case, the APC valve 244 of the exhaust pipe 231 is kept open to
vacuum-exhaust the interior of the process chamber 201 using the
vacuum pump 246, and the residual C.sub.3H.sub.6 gas in the process
chamber 201 which has not reacted or has contributed to formation
of the carbon-containing layer is removed from the process chamber
201. In this case, the valve 243f is also kept open to maintain
supply of the N.sub.2 gas into the process chamber 201.
Accordingly, the residual C.sub.3H.sub.6 gas in the process chamber
201 which has not reacted or has contributed to formation of the
carbon-containing layer can be effectively removed from the process
chamber 201.
[0078] The carbon-containing gas may be acetylene (C.sub.2H.sub.2)
gas or ethylene (C.sub.2H.sub.4) gas in addition to C.sub.3H.sub.6
gas.
[0079] [Third Step]
[0080] After the residual gas in the process chamber 201 is
removed, the valve 243c of the third gas supply pipe 232c is opened
to flow NH.sub.3 gas into the third gas supply pipe 232c. A flow
rate of the NH.sub.3 gas that flows in the third gas supply pipe
232c is regulated by the MFC 241c. The NH.sub.3 gas whose flow rate
has been regulated is supplied into the process chamber 201 through
a gas supply hole 250c of the third nozzle 249c and is exhausted
through the exhaust pipe 231. The NH.sub.3 gas supplied into the
process chamber 201 is thermally activated. In this case, the valve
243g is opened to flow the N.sub.2 gas into the inert gas supply
pipe 232g at the same time. The N.sub.2 gas is supplied into the
process chamber 201 together with the NH.sub.3 gas and is exhausted
through the exhaust pipe 231.
[0081] In this case, when the NH.sub.3 gas is thermally activated
and allowed to flow, a pressure in the process chamber 201 is
regulated, for example, to a range of 50 to 3,000 Pa by properly
controlling the APC valve 244. A flow rate of supplied NH.sub.3 gas
controlled by the MFC 241c is set, for example, to a range of 100
to 10,000 sccm. A flow rate of supplied N.sub.2 gas controlled by
the MFC 241g is set, for example, to a range of 200 to 2,000 sccm.
In this case, a partial pressure of the NH.sub.3 gas in the process
chamber 201 is set to a range of 6 to 2,940 Pa. An exposure time of
the NH.sub.3 gas to the wafer 200, i.e., a gas supply time
(irradiation time), is set, for example, to a range of 1 to 120
seconds. In this case, a temperature of the heater 207 is set such
that a temperature of the wafer 200 becomes, for example,
300.degree. C. to 650.degree. C. as in the first step. Since the
NH.sub.3 gas has a high reaction temperature and is difficult to
react at the above-described wafer temperature, the NH.sub.3 gas
may be thermally activated when the pressure in the process chamber
201 is relatively high as described above. Since a soft reaction
may be caused by thermally activating and supplying the NH.sub.3
gas, a nitridation reaction to be described below may be softly
performed.
[0082] In this case, the gas flowing in the process chamber 201 is
thermally activated NH.sub.3 gas, and neither HCD gas nor
C.sub.3H.sub.6 gas flows in the process chamber 201. Thus, the
NH.sub.3 gas does not cause a vapor phase reaction, and the
activated NH.sub.3 gas reacts with a portion of a layer including
Si and C which is the second layer formed on the wafer 200 in the
second step. Accordingly, the second layer is thermally nitrided in
a non-plasma environment so that the second layer is changed into
the third layer including Si, C, and N, i.e., a silicon
carbonitride layer (a SiCN layer).
[0083] In this case, the nitridation reaction of the second layer
is not allowed to be saturated. For example, when a Si layer of
several atomic layers is formed in the first step and a
carbon-containing layer of less than one atomic layer is formed in
the second step, a portion of the surface layer (one atomic layer
of the surface) thereof is nitrided. That is, some or all portion
of an area (an area where silicon is exposed) where nitridation may
be caused of the surface layer thereof is nitrided. In this case,
nitridation is performed under a condition where a nitridation
reaction of the second layer is unsaturated so that the entire
second layer cannot be nitrided. Although several layers below the
surface layer of the second layer may be nitrided depending on
conditions, only the surface layer is preferably nitrided to
enhance the controllability of the composition ratio of the SiOCN
film. For example, when a Si layer of one atomic layer or less than
one atomic layer is formed in the first step and a
carbon-containing layer of less than one atomic layer is formed in
the second step, a portion of the surface layer thereof is nitrided
likewise. Even in this case, nitridation is also performed under a
condition where a nitridation reaction of the second layer is
unsaturated so that the second layer cannot be entirely
nitrided.
[0084] In order to make the nitridation reaction of the second
layer in an unsaturated state, the processing conditions in the
third step preferably may be set to the above-described processing
conditions. Furthermore, when processing conditions in the third
step are set to the following processing conditions, it becomes
easy to make a nitridation reaction of the second layer in an
unsaturated state.
[0085] Temperature of wafer: 500 to 630.degree. C.
[0086] Pressure in process chamber: 133 to 2,666 Pa
[0087] Partial pressure of NH.sub.3 gas: 67 to 2,820 Pa
[0088] Flow rate of supplied NH.sub.3 gas: 1,000 to 5,000 sccm
[0089] Flow rate of supplied N.sub.2 gas: 300 to 1,000 sccm
[0090] Supply time of NH.sub.3 gas: 6 to 100 seconds
[0091] Thereafter, the valve 243c of the third gas supply pipe 232c
is closed to stop supply of the NH.sub.3 gas. In this case, the APC
valve 244 of the exhaust pipe 231 is kept open to vacuum-exhaust
the interior of the process chamber using the vacuum pump 246, and
the residual NH.sub.3 gas in the process chamber 201 which has not
reacted or has contributed to the nitridation is removed from the
process chamber 201. In this case, the valve 243g is also kept open
to maintain supply of the N.sub.2 gas into the process chamber 201.
Accordingly, the residual NH.sub.3 gas in the process chamber 201
which has not reacted or has contributed to the nitridation may be
effectively removed from the process chamber 201.
[0092] The nitrogen-containing gas may be diazine (N.sub.2H.sub.2)
gas, hydrazine (N.sub.2H.sub.4) gas or N.sub.3H.sub.8 gas in
addition to NH.sub.3 gas.
[0093] [Fourth Step]
[0094] After the residual gas in the process chamber 201 is
removed, the valve 243d of the fourth gas supply pipe 232d and the
valve 243h of the fourth inert gas supply pipe 232h are opened to
flow the O.sub.2 gas into the fourth gas supply pipe 232d and flow
the N.sub.2 gas into the fourth inert gas supply pipe 232h. A flow
rate of the N.sub.2 gas that flows in the fourth inert gas supply
pipe 232h is regulated by the MFC 241h. A flow rate of the O.sub.2
gas that flows in the fourth gas supply gas pipe 232d is regulated
by the MFC 241d. In the fourth gas supply pipe 232d, the O.sub.2
gas whose flow rate has been regulated is mixed with the N.sub.2
gas whose flow rate has been regulated and is supplied into the
buffer chamber 237 through the gas supply hole 250d of the fourth
nozzle 249d. In this case, a high-frequency power is not applied
between the first rod-shaped electrode 269 and the second
rod-shaped electrode 270. Accordingly, after the O.sub.2 gas
supplied into the buffer chamber 237 is thermally activated, the
O.sub.2 gas is directed toward the wafer 200 and supplied into the
process chamber 201 through the gas supply hole 250e, and is
exhausted through the exhaust chamber 231. In this case, the
O.sub.2 gas supplied into the buffer chamber 237 may be activated
using plasma by applying high-frequency power between the first
rod-shaped electrode 269 and the second rod-shaped electrode
270.
[0095] When the O.sub.2 gas is thermally activated and allowed to
flow, a pressure in the process chamber 201 is set, for example, to
a range of 1 to 3,000 Pa by properly regulating the APC valve 244.
A flow rate of supplied O.sub.2 gas controlled by the MFC 241d is
set, for example, to a range of 100 to 5,000 sccm (0.1 to 5 slm). A
flow rate of supplied N.sub.2 gas controlled by the MFC 241h is
set, for example, to a range of 200 to 2,000 sccm (0.2 to 2 slm).
In this case, a partial pressure of the O.sub.2 gas in the process
chamber 201 is set to a range of 6 to 2,940 Pa. An exposure time of
the wafer 200 to the O.sub.2 gas, i.e., a gas supply time
(irradiation time), is set, for example, to a range of 1 to 120
seconds. In this case, a temperature of the heater 207 is set such
that a temperature of the wafer 200 falls within a range of 300 to
650.degree. C. as in the first through third steps. The O.sub.2 gas
is thermally activated under the above-described conditions. Since
a soft reaction may be caused by thermally activating and supplying
the O.sub.2 gas, an oxidation reaction to be described below may be
softly performed.
[0096] In this case, the gas flowing into the process chamber 201
is thermally activated O.sub.2 gas, and none of the HCD gas, the
C.sub.3H.sub.6 gas, and the NH.sub.3 gas flows in the process
chamber 201. Thus, the O.sub.2 gas does not cause a vapor phase
reaction, and the activated O.sub.2 gas reacts with a portion of a
SiCN layer serving as the third layer formed on the wafer 200 in
the third step. Accordingly, the SiCN layer is thermally oxidized
in a non-plasma environment so that the SiCN layer is changed into
the fourth layer including Si, C, N, and O, i.e., a SiOCN
layer.
[0097] In this case, the oxidation reaction of the SiCN layer is
not allowed to be saturated. For example, when a SiCN layer of
several atomic layers is formed in the first through third steps,
at least a portion of the surface layer (one atomic layer of the
surface) thereof is oxidized. In this case, oxidation is performed
under a condition where the oxidation reaction of the SiCN layer is
unsaturated such that the SiCN layer cannot be entirely oxidized.
Although several layers below the surface layer of the SiCN layer
may be oxidized depending on conditions, only the surface layer is
preferably oxidized to enhance controllability of the composition
ratio of the SiOCN film. For example, when a SiCN layer of one
atomic layer or less than one atomic layer is formed in the first
through third steps, a portion of the surface layer thereof is
oxidized likewise. Even in this case, oxidation is also performed
under a condition where an oxidation reaction of the SiCN layer is
unsaturated so that the SiCN layer cannot be entirely oxidized.
[0098] In order to make the oxidation reaction of the SiCN layer
(third layer) in an unsaturated state, the processing conditions in
the fourth step preferably may be set to the above-described
processing conditions. Furthermore, when processing conditions in
the fourth step are set to the following processing conditions, it
becomes easy to make an oxidation reaction of the second layer in
an unsaturated state.
[0099] Temperature of wafer: 500 to 630.degree. C.
[0100] Pressure in process chamber: 133 to 2,666 Pa
[0101] Partial pressure of O.sub.2 gas: 67 to 2,820 Pa
[0102] Flow rate of supplied O.sub.2 gas: 1,000 to 5,000 sccm
[0103] Flow rate of supplied N.sub.2 gas: 300 to 1,000 sccm
[0104] Supply time of O.sub.2 gas: 6 to 100 seconds
[0105] Thereafter, the valve 243d of the fourth gas supply pipe
232d is closed to stop supply of the O.sub.2 gas. In this case, the
APC valve 244 of the exhaust pipe 231 is kept open to
vacuum-exhaust the interior of the process chamber 201 using the
vacuum pump 246, and the residual O.sub.2 gas in the process
chamber 201 which has not reacted or has contributed to oxidation
is removed from the process chamber 201. In this case, the valve
243h is kept open to maintain supply of the N.sub.2 gas into the
process chamber 201. Accordingly, the residual O.sub.2 gas in the
process chamber 201 which has not reacted or has contributed to
oxidation may be effectively removed from the process chamber
201
[0106] The oxygen-containing gas may include, vapor (H.sub.2O) gas,
nitrogen monoxide (NO) gas, nitrous oxide (N.sub.2O) gas, nitrogen
dioxide (NO.sub.2) gas, carbon monoxide (CO) gas, carbon dioxide
(CO.sub.2) gas, ozone (0.3) gas, a mixture of H.sub.2 gas and
O.sub.2 gas, a mixture of H.sub.2 gas and O.sub.3 gas, etc., in
addition to O.sub.2 gas.
[0107] A thin film including Si, C, N, and O, i.e., a SiOCN film,
having a predetermined thickness may be formed on the wafer 200 by
performing a cycle including the above-described first through
fourth steps once or more. The above-described cycle is preferably
repeatedly performed a plurality of times.
[0108] In this case, ratios of each of the element components in
the SiOCN layer, i.e., a Si component, an O component, a C
component and a N component, that is, a Si concentration, an O
concentration, a C concentration and a N concentration may be
regulated by controlling process conditions such as a pressure in
the process chamber 201 or a gas supply time in the respective
steps so that a composition ratio of the SiOCN film may be
controlled.
[0109] A SiOCN film having a predetermined thickness may be formed
on the wafer 200 by performing, once or more, a cycle including a
process of carrying out a set of steps including the
above-described first through third steps once or more, and a
process of carrying out the fourth step afterwards
[0110] That is, a SiOCN film having a predetermined thickness may
be formed on a wafer 200 by performing, a predetermined number of
times (n times), a cycle including steps of:
[0111] (a) performing a set of steps including (a-1) supplying a
silicon-containing gas (HCD gas) into a process vessel
accommodating the wafer 200 under a condition where a CVD reaction
is caused to form a silicon-containing layer on the wafer 200
(first step), (a-2) supplying a carbon-containing gas
(C.sub.3H.sub.6 gas) into the process vessel to form a
carbon-containing layer on the silicon-containing layer, thereby
forming a layer containing Si and C (second step), and (a-3)
supplying a nitrogen-containing gas into the process vessel to
nitride the layer including Si and C, thereby forming a SiCN layer
(third step), the set of steps being performed a predetermined
number of times (m times) to form the SiCN layer having a
predetermined thickness; and
[0112] (b) supplying an oxygen-containing gas (O.sub.2 gas) into
the process vessel to oxidize the SiCN layer having the
predetermined thickness, thereby forming a SiOCN layer (fourth
step). In this case as well, the above-described cycle is
preferably repeated a plurality of times.
[0113] FIG. 4 exemplifies formation of a SiOCN film having a
predetermined thickness on the wafer 200 by performing, n times, a
cycle which includes a process of carrying out a set of the first
through third steps twice, and a process of carrying out the fourth
step afterwards.
[0114] In this way, the ratio of a Si component, a C component, and
a N component to an O component of a SiOCN film may be controlled
properly (in a rich direction) by performing, a predetermined
number of times, a cycle including a process of carrying out a set
of the first through third steps a predetermined number of times,
and a process of carrying out the fourth step afterwards, and
thereby the controllability of a composition ratio of the SiOCN
film can be enhanced more. The number of SiCN layers formed per
cycle may be increased as the set of steps is increased in number,
making it possible to enhance a cycle rate. Accordingly, a
film-forming rate may be enhanced.
[0115] When a SiOCN film having a predetermined thickness is formed
so as to have a predetermined composition, an inert gas such as
N.sub.2 gas is supplied into the process chamber 201 and then is
exhausted such that the interior of the process chamber 201 is
purged by the inert gas (gas purging). Thereafter, an atmosphere in
the process chamber 201 is substituted with the inert gas (inert
gas substitution), and a pressure in the process chamber 201 is
returned to a normal pressure (returning to atmospheric
pressure).
[0116] Thereafter, as the seal cap 219 is lowered by the boat
elevator 115 and the lower end of the reaction tube 203 is opened,
the processed wafer 200 is unloaded (boat unloading) out of the
reaction tube 203 from a lower end of the reaction tube 203 in a
state where the processed wafer 200 is supported by the boat 217.
Thereafter, the processed wafer 200 is discharged from the boat 217
(wafer discharging).
[0117] (Second Sequence)
[0118] Next, a second sequence according to the embodiment of the
present invention will be described. FIG. 5 is a timing diagram
illustrating gas supply timing in a second sequence according to
the embodiment of the present invention.
[0119] In the second sequence according to the embodiment of the
present invention, a SiOCN film having a predetermined thickness is
formed on the wafer 200 by performing, a predetermined number of
times (n times), a cycle including the steps of: (a) supplying a
silicon-containing gas into a process vessel accommodating the
wafer 200 under a condition where a CVD reaction is caused to form
a silicon-containing layer on the wafer 200;
[0120] (b) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the silicon-containing
layer, thereby forming a first layer including Si and C;
[0121] (c) supplying a silicon-containing gas into the process
vessel under a condition where a CVD reaction is caused to form a
silicon-containing layer on the first layer including Si and C
additionally, thereby forming a second layer including Si and C
additionally;
[0122] (d) supplying a nitrogen-containing gas into the process
vessel to nitride the second layer including Si and C, thereby
forming a SiCN layer; and
[0123] (e) supplying an oxygen-containing gas into the process
vessel to oxidize the SiCN layer, thereby forming a SiOCN
layer.
[0124] Hereinafter, the second sequence according to the embodiment
of the present invention will be described in detail. Here, an
example where a SiOCN film serving as an insulating film is formed
on a substrate through the sequence of FIG. 5, using HCD gas as a
silicon-containing gas, C.sub.3H.sub.6 gas as a carbon-containing
gas, NH.sub.3 gas as a nitrogen-containing gas, and O.sub.2 gas as
an oxygen-containing gas will be described.
[0125] The second sequence is performed in the same manner as in
the first second sequence until the wafer charging, the boat
loading, the pressure regulation, the temperature regulation and
the wafer rotation are performed. Thereafter, five steps to be
described below are sequentially performed.
[0126] [First Step]
[0127] The first step is performed in the same manner as in the
first step of the first sequence. That is, processing conditions, a
reaction to be caused, a layer to be formed, etc. of the first step
are the same as those of the first step of the first sequence. That
is, in this step, a silicon-containing layer is formed on a wafer
200 by supplying HCD gas into the process chamber 201.
[0128] [Second Step]
[0129] The second step is performed in the same manner as in the
second step of the first sequence. That is, processing conditions,
a reaction to be caused, a layer to be formed, etc. of the second
step are the same as those of the second step of the first
sequence. That is, in this step, a first layer including Si and C
is formed by supplying C.sub.3H.sub.6 gas into the process chamber
201 and forming a carbon-containing layer on a silicon-containing
layer.
[0130] [Third Step]
[0131] The third step is performed in the same manner as in the
first step of the first sequence. That is, processing conditions, a
reaction to be caused, a layer to be formed, etc. of the third step
are the same as those of the first step of the first sequence. That
is, in this step, a second layer including Si and C is formed by
supplying HCD gas into the process chamber 201 and forming a
silicon-containing layer on the first layer including Si and C.
[0132] [Fourth Step]
[0133] The fourth step is performed in the same manner as in the
third step of the first sequence. That is, processing conditions, a
reaction to be caused, a layer to be formed, etc. of the fourth
step are the same as those of the third step of the first sequence.
That is, in this step, a SiCN layer is formed by supplying NH.sub.3
gas into the process chamber 201 and nitriding the second layer
including Si and C to form a SiCN layer.
[0134] [Fifth Step]
[0135] The fifth step is performed in the same manner as in the
fourth step of the first sequence. That is, processing conditions,
a reaction to be caused, a layer to be formed, etc. of the fifth
step are the same as those of the fourth step of the first
sequence. That is, in this step, a SiOCN layer is formed by
supplying O.sub.2 gas into the process chamber 201 and oxidizing
the SiCN layer.
[0136] A SiOCN film having a predetermined thickness may be formed
on the wafer 200 by performing a cycle including the
above-described first through fifth steps once or more. The
above-described cycle is preferably repeated a plurality of
times.
[0137] In this case, ratios of each of the element components in
the SiOCN layer, i.e., a Si component, an O component, a C
component and a N component, that is, a Si concentration, an O
concentration, a C concentration and a N concentration, may be
regulated by controlling process conditions such as a pressure in
the process chamber 201 or a gas supply time in the respective
steps so that a composition ratio of the SiOCN film can be
controlled.
[0138] A SiOCN film having a predetermined thickness may be formed
on the wafer 200 by performing, once or more, a cycle including a
process of carrying out a set of steps including the
above-described first through fourth steps once or more, and a
process of carrying out the fifth step afterwards.
[0139] That is, a SiOCN film having a predetermined thickness may
be formed on the wafer 200 by performing, a predetermined number of
times (n times), a cycle including steps of:
[0140] (a) performing a set of steps including (a-1) supplying a
silicon-containing gas (HCD gas) into a process vessel
accommodating the wafer 200 under a condition where a CVD reaction
is caused to form a silicon-containing layer on the wafer 200
(first step), (a-2) supplying a carbon-containing gas
(C.sub.3H.sub.6 gas) into the process vessel to form a
carbon-containing layer on the silicon-containing layer, thereby
forming a first layer including Si and C (second step), (a-3)
supplying a silicon-containing gas (HCD gas) into the process
vessel under a condition where a CVD reaction is caused to form a
silicon-containing layer on the first layer including Si and C
additionally, thereby forming a second layer including Si and C
(third step), (a-4) supplying a nitrogen-containing gas into the
process vessel to nitride the second layer including Si and C,
thereby forming a SiCN layer (fourth step), the set of steps being
performed a predetermined number of times (m times) to form a SiCN
layer having a predetermined thickness; and
[0141] (b) supplying an oxygen-containing gas (O.sub.2 gas) into
the process vessel to oxidize the SiCN layer having the
predetermined thickness, thereby forming a SiOCN layer (fifth
step). In this case as well, the above-described cycle is
preferably repeated a plurality of times.
[0142] FIG. 6 exemplifies formation of a SiOCN film having a
predetermined thickness on the wafer 200 by performing, n times, a
cycle which includes a process of carrying out a set of the first
through fourth steps twice, and a process of carrying out the fifth
step afterwards.
[0143] In this way, the ratio of a Si component, a C component, and
a N component to an O component of a SiOCN film may be controlled
properly (in a rich direction) by performing, a predetermined
number of times, a cycle including a process of carrying out a set
of the first through fourth steps a predetermined number of times,
and a process of carrying out the fifth step afterwards, and
thereby the controllability of a composition ratio of the SiOCN
film can be enhanced more. The number of SiCN layers formed per
cycle may be increased as the set of steps is increased in number,
making it possible to enhance a cycle rate. Accordingly, a
film-forming rate may be enhanced.
[0144] In the first sequence, HCD gas is supplied at least once per
cycle (first step) to form at least one silicon layer per
cycle.
[0145] In this regard, in the second sequence, HCD gas may be
supplied at least twice per cycle (first step and third step) to
form at least two silicon layers per cycle. That is, according to
the second sequence, an amount of Si adsorbed and deposited per
cycle may be increased as compared with the first sequence (more
than two times), making it possible to enhance a cycle rate.
[0146] In the first sequence, when C, i.e., C.sub.xH.sub.y is
adsorbed onto a Si layer by supplying C.sub.3H.sub.6 gas in the
second step, a Si--C bond is created. Thereafter, when N, i.e.,
NH.sub.3 gas, is supplied in the third step, since C and N are apt
to competitively gain Si, a portion of the Si--C bond is
substituted with Si--N bond. Thus, C may be separated. As a result,
an amount of C introduced into a SiCN film, i.e. a C concentration
in the SiCN film, may be reduced in the first sequence.
[0147] In this regard, according to the second sequence, C, i.e.,
C.sub.xH.sub.y, is adsorbed onto a Si layer by supplying
C.sub.3H.sub.6 gas in the second step and Si is adsorbed and
deposited in the third step, resulting in increased probability of
forming a Si--C--Si bond. Thereafter, even when N, i.e. NH.sub.3
gas, is supplied in the fourth step, an attack of N is blocked by
Si forming the Si--C--Si bond, and thus separation of C may be
difficult and C may easily remain. As a result, an amount of C
introduced to the SiCN, i.e. a C concentration in the SiCN film, is
enhanced.
[0148] In the first sequence, both adsorption of C.sub.xH.sub.y
onto the Si layer in the second step and nitridation of the second
layer by NH.sub.3 gas in the third step need to be stopped when the
adsorption and the nitridation are in an unsaturated state. When
nitridation of the second layer by NH.sub.3 gas in the third step
is saturated, a large amount of C is separated and a C
concentration in the SiCN film is severely lowered.
[0149] In this regard, as described above, according to the second
sequence, C.sub.xH.sub.y is adsorbed onto a Si layer in the second
step and Si is adsorbed and deposited in the third step, causing a
probability of forming a Si--C--Si bond to be increased so that the
Si forming the Si--C--Si bond functions as a block layer of C
against an attack of N in the fourth step. Accordingly, saturating
nitridation of the third layer by NH.sub.3 gas in the fourth step
is possible. That is, a nitriding force may be increased and more
uniform nitridation becomes possible while separation of C is being
restrained. As a result, uniformity in a film thickness on a wafer
surface of a SiCN film may be enhanced.
[0150] When a SiOCN film having a predetermined composition ratio
and a predetermined thickness is formed, the gas purging, the inert
gas substitution, the returning to the atmospheric pressure, the
boat unloading, and the wafer discharging are performed in the same
manner as in the first sequence.
[0151] (3) Effects of the Embodiment of the Present Invention
[0152] The embodiment of the present invention has one or plural
effects as follows.
[0153] According to the embodiment of the present invention, in the
first sequence, the first through fourth steps are sequentially
performed in order, or after a set of steps, i.e., the first
through third steps, is performed once or more, the fourth step is
performed. Thus, a SiOCN film having a predetermined composition
ratio and a predetermined thickness may be formed. Further, in the
second sequence, the first through fifth steps are sequentially
performed in order, or after a set of steps, i.e., the first
through fourth steps, is performed once or more, the fifth step is
performed. Thus, a SiOCN film having a predetermined composition
ratio and a predetermined thickness may be formed.
[0154] It was confirmed that when the order of the steps in the
sequences was changed, for example, the first sequence was
performed in the order of the first step, the second step, the
fourth step, and the third step, a SiOCN film could not be
obtained. It was also confirmed that when the first step, the
second step, the third step, the fifth step, and the fourth step
were sequentially performed in the second sequence, a SiOCN film
could not be obtained. This is because since a binding force of a
Si--O bond is stronger than that of a Si--N bond, a layer including
Si and C may be oxidized after the layer is nitrided, but the layer
including Si and C may not be nitrided after the layer is oxidized.
This is because, since a Si--O bond is formed after the layer is
oxidized, even when NH.sub.3 flows in the state, the Si--O bond may
not be broken, and thus a Si--N bond may not be formed. It was also
confirmed that after oxidation of the layer including Si and C, the
layer may not nitrided even when NH.sub.3 gas was activated in a
plasma environment by a plasma source in the buffer chamber, and a
SiOCN film may not be obtained. Accordingly, it was proved that
even when the layer including Si and C is nitrided after the layer
is oxidized, a SiOCN film may not be obtained, and the layer
including Si and C needs to be oxidized after being nitrided to
obtain a SiOCN film.
[0155] According to the embodiment of the present invention, a
SiOCN film having an excellent uniformity in film thickness in a
wafer surface may be formed in any one of the first sequence and
the second sequence. When a SiOCN film formed through the first
sequence or the second sequence of the embodiment of the present
invention is used as an insulating film, it is possible to provide
a uniform performance in a surface of the SiOCN film and to
contribute to enhancing a performance of a semiconductor device or
enhancing a production rate.
[0156] According to the embodiment of the present invention, ratios
of each of the element components in the SiOCN layer, i.e., a Si
component, an O component, a C component and a N component, that
is, a Si concentration, an O concentration, a C concentration and a
N concentration, may be regulated by controlling process conditions
such as a pressure in the process chamber or a gas supply time in
the respective steps so that a composition ratio of the SiOCN film
can be controlled.
[0157] Then, in a conventional CVD method, a plurality of kinds of
gases including a plurality of elements constituting a thin film to
be formed are simultaneously supplied. In this case, in order to
control a composition ratio of a formed thin film, controlling the
ratio of flow rates of supplied gases during supply of the gases
can be considered for example. In this case, a composition ratio of
a thin film cannot be controlled even by controlling supply
conditions such as a temperature of a substrate, a pressure in the
process chamber, and gas supply times during supply of gases.
[0158] Also, in a conventional ALD method, a plurality of kinds of
gases containing a plurality of elements constituting a thin film
to be formed are alternately supplied. In this case, for example,
controlling flow rates of supplied gases and gas supply times
during supply of gases may be considered in order to control a
composition ratio of a thin film to be formed. In the ALD method,
since a source gas is supplied to be adsorbed and saturated onto a
surface of a substrate, there is no need to control a pressure in
the process chamber. That is, since adsorption and saturation of a
source gas occur at a predetermined pressure or less to which the
source gas is adsorbed at a reaction temperature, when a pressure
in the process chamber is set to the predetermined pressure or
less, the adsorption and saturation of the source gas may be
achieved at any pressure. Accordingly, when a film is generally
formed through the ALD method, the pressure in the process chamber
is set to a pressure according to capability of exhausting a
substrate processing apparatus with respect to an amount of
supplied gas. When the pressure in the process chamber is varied,
chemical adsorption of a source gas onto a surface of a substrate
may be hampered or a reaction may be close to the CVD reaction, and
thus film formation using the ALD method may not be properly
performed. Further, since an ALD reaction (saturated adsorption,
and surface reaction) is repeatedly performed in order to form a
thin film having a predetermined thickness through the ALD method,
unless the ALD reactions are sufficiently performed until the ALD
reactions are saturated, deposition may become insufficient and
deposition rate may not be sufficient. Thus, in the ALD method, it
is difficult to control a composition ratio of a thin film by
controlling a pressure in the process chamber.
[0159] In this regard, in the embodiment of the present invention,
a composition ratio of a thin film is controlled by controlling a
pressure in the process chamber or a gas supply time in respective
steps in any of the sequences. Preferably, a composition ratio of a
thin film may also be controlled by controlling a pressure in the
process chamber or the pressure and a gas supply time.
[0160] When a composition ratio of a thin film is controlled by
controlling a pressure in the process chamber in respective steps,
effects caused by a difference between other substrate processing
apparatuses may be reduced. That is, a composition ratio of a thin
film may be controlled under the same control conditions and in the
same manner even in the other substrate processing apparatuses. In
this case, when a gas supply time is controlled in respective
steps, a composition ratio of a thin film may be minutely regulated
and a controllability of a composition ratio of the thin film may
be enhanced. Also by controlling a pressure in the process chamber
in respective steps, a composition ratio of a thin film may be
controlled while raising a film-forming rate. That is, a
composition ratio of a thin film may be controlled by controlling a
pressure in the process chamber, for example, while raising a
growth rate of a silicon-containing layer formed in the first steps
of the respective sequences. In this way, according to the
embodiment of the present invention, the composition ratio of the
thin film may be controlled under the same control conditions and
in the same manner even in the other substrate processing
apparatuses, controllability of the composition ratio of the thin
film may be enhanced, and the film formation rate, i.e.
productivity may also be enhanced.
[0161] Meanwhile, for example, in forming a film through the ALD
method, when a composition ratio of a thin film is controlled by
controlling a flow rate of supplied gas and a gas supply time in
respective steps, effects caused by a difference between other
substrate processing apparatuses is increased. That is, the same
control is performed to the other substrate processing apparatuses,
a composition ratio of a thin film cannot be controlled in the same
manner. For example, even when the flow rates of supplied gases and
gas supply times in the other substrate processing apparatuses are
set to the same flow rates and gas supply times, the pressures in
the process chambers do not become the same value due to the
difference between the other substrate processing apparatuses.
Thus, in this case, as the pressures in the process chambers are
changed in the other substrate processing apparatuses, composition
ratios in the substrate processing apparatuses cannot be controlled
in a desired manner. When the pressures in the process chambers of
the substrate processing apparatuses are varied, chemical
adsorption of a source gas onto a surface of a substrate may be
hampered or reactions may be close to the CVD reactions, and thus a
film cannot be properly formed using the ALD method.
[0162] However, since a SiOCN film of a predetermined composition
ratio may be formed according to the embodiment of the present
invention, an etching-resistant property, a dielectric constant,
and an insulation-resistant property may be controlled. Therefore,
a silicon insulating film having a low dielectric constant, an
excellent etching-resistant property and a excellent
insulation-resistant property may be formed, compared to those of
the SiN film.
[0163] The C.sub.3H.sub.6 gas, the NH.sub.3 gas, and the O.sub.2
gas supplied into the process chamber 201 are thermally activated
respectively and are supplied to a surface of the wafer 200 in the
second through fourth steps of the first sequence of this
embodiment and in the second, fourth, and fifth steps of the second
sequence. Accordingly, since each of the above-described reactions
may be softly caused, formation of the carbon-containing layer,
nitridation and oxidation can be easily performed with excellent
controllability.
[0164] The silicon insulating film formed through the technique of
the embodiment of the present invention may be used as a side wall
spacer, providing a device forming technology with small leak
current and excellent processing.
[0165] Also, the silicon insulating film formed through the
technique of the embodiment of the present invention may be used as
an etch stopper, providing a device forming technology with
excellent processing.
[0166] According to the embodiment of the present invention, a
silicon insulating film of an ideal stoichiometric ratio can be
formed. Further, since a Si insulating film is formed without using
plasma, the silicon insulating film may be applied to a process
where plasma damage is concerned, for example, on an SADP film of
DPT.
[0167] <Another Embodiment of the Present Invention>
[0168] Although the embodiment of the present invention has been
described in detail, the present invention is not limited thereto,
but may be often modified without departing from the scope of the
invention.
[0169] For example, the buffer chamber 237 may not be installed
inside the process chamber 201, but O.sub.2 gas may be directly
supplied into the process chamber 201 through the fourth nozzle
249d. In this case, the O.sub.2 gas may be directly supplied toward
the wafer 200 through the fourth nozzle 249d with the gas supply
hole 250d of the fourth nozzle 249d facing the center of the
reaction tube 203. Also, the fourth nozzle 249d may not be
installed, but only the buffer chamber 237 may be installed.
[0170] For example, the C.sub.3H.sub.6 gas, NH.sub.3 gas, and
O.sub.2 gas supplied into the process chamber 201 are not limited
to be thermally activated, but, for example, may be activated using
plasma. In this case, for example, the gases may be plasma-excited
using the plasma source serving as the above-described plasma
generator.
[0171] For example, a hydrogen-containing gas may be supplied
together with an oxygen-containing gas in the fourth step of the
first sequence and the fifth step of the second sequence. When an
oxygen-containing gas and a hydrogen-containing gas are supplied
into the process chamber under an atmosphere less than the
atmospheric pressure (reduced pressure), the oxygen-containing gas
and the hydrogen-containing gas react with each other in the
process vessel to produce an oxidant (atomic oxygen etc.) including
oxygen, and then the layers may be oxidized by the oxidant. In this
case, oxidation can be performed with a higher oxidizing force than
with that of a single oxygen-containing gas. The oxidation is
performed in the absence of plasma under a reduced pressure
atmosphere. For example, H.sub.2 gas may be used as the
hydrogen-containing gas. In this case, the above-described
hydrogen-containing gas supply system may be used.
[0172] For example, in the above-described embodiment of the
present invention, an example of forming a SiOCN film (a
semiconductor insulating film) including Si serving as a
semiconductor element as an insulating film has been explained.
However, the present invention may also be applied to a case of
forming a metal oxycarbonitride film (a metal insulating film)
including a metal element such as titanium (Ti), zirconium (Zr),
hafnium (Hf), tantalum (Ta), aluminum (Al), molybdenum (Mo),
gallium (Ga), or germanium (Ge).
[0173] For example, the present invention may also be applied to a
titanium oxycarbonitride film (a TiOCN film), a zirconium
oxycarbonitride film (a ZrOCN film), a hafnium oxycarbonitride film
(a HfOCN film), a tantalum oxycarbonitride film (a TaOCN film), an
aluminum oxycarbonitride film (an AlOCN film), a molybdenum
oxycarbonitride film (a MoOCN film), a gallium oxycarbonitride film
(a GaOCN film), or a germanium oxycarbonitride film (a GeOCN film),
or a metal oxycarbonitride film obtained by combination or mixture
thereof.
[0174] In this case, a film may be formed though the same sequences
(first sequence and second sequence) as in the above-described
embodiments using Ti source gas, Zr source gas, Hf source gas. Ta
source gas, Al source gas, Mo source gas, Ga source gas, or Ge
source gas instead of the Si source gas.
[0175] That is, in this case, a metal oxycarbonitride film having a
predetermined thickness is, for example, formed on a wafer in the
first sequence by performing, a predetermined number of times (n
times), a cycle including the steps of:
[0176] (a) supplying a source gas including a metal element into a
process vessel accommodating the wafer under a condition where a
CVD reaction is caused to form a layer containing the metal element
on the wafer (first step),
[0177] (b) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the layer containing
the metal element, thereby forming a layer including the metal
element and the carbon (second step),
[0178] (c) supplying a nitrogen-containing gas into the process
vessel to nitride the layer including the metal element and the
carbon, thereby forming a metal carbonitride layer (third step);
and
[0179] (d) supplying an oxygen-containing gas into the process
vessel to oxidize the metal carbonitride layer, thereby forming a
metal oxycarbonitride layer (fourth step).
[0180] In this case as well, as in the above-described embodiment
of the present invention, the metal oxycarbonitride film having a
predetermined thickness may be formed on the wafer by performing,
once or more, a cycle which includes a process of carrying out a
set of the first through third steps once or more, and a process of
carrying out the fourth step afterwards.
[0181] That is, a metal oxycarbonitride film having a predetermined
thickness may be formed on a wafer by performing, a predetermined
number of times (n times), a cycle including steps of:
[0182] (a) performing a set of steps including (a-1) supplying a
source gas including a metal element into a process vessel
accommodating the wafer under a condition where a CVD reaction is
caused to form a layer containing the metal element on the wafer
(first step), (a-2) supplying a carbon-containing gas into the
process vessel to form a carbon-containing layer on the layer
containing the metal element, thereby forming a layer including the
metal element and the carbon (second step), and (a-3) supplying a
nitrogen-containing gas into the process vessel to nitride the
layer including the metal element and the carbon, thereby forming a
metal carbonitride layer (third step), the set of steps being
performed a predetermined number of times (m times) to form the
metal carbonitride layer having a predetermined thickness; and
[0183] (b) supplying an oxygen-containing gas into the process
vessel to oxidize the metal carbonitride layer having the
predetermined thickness, thereby forming a metal oxycarbonitride
layer (fourth step).
[0184] Also, in this case, a metal oxycarbonitride film having a
predetermined thickness is, for example, formed on a wafer in the
second sequence by performing, a predetermined number of times (n
times), a cycle including the steps of:
[0185] (a) supplying a source gas including a metal element into a
process vessel accommodating the wafer under a condition where a
CVD reaction is caused to form a layer containing the metal element
on the wafer (first step),
[0186] (b) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the layer containing
the metal element, thereby forming a first layer including the
metal element and the carbon (second step),
[0187] (c) supplying a source gas including the metal element into
the process vessel under a condition where a CVD reaction is caused
to form a layer containing the metal element on the first layer
including the metal element and the carbon additionally, thereby
forming a second layer including the metal element and the carbon
(third step),
[0188] (d) supplying a nitrogen-containing gas into the process
vessel to nitride the second layer including the metal element and
the carbon, thereby forming a metal carbonitride layer (fourth
step), and
[0189] (e) supplying an oxygen-containing gas into the process
vessel to oxidize the metal carbonitride layer, thereby forming a
metal oxycarbonitride layer (fifth step).
[0190] In this case as well, as in the above-described embodiment
of the present invention, a metal oxycarbonitride film having a
predetermined thickness may be formed on a wafer by performing,
once or more, a cycle which includes a process of carrying out a
set of the first through fourth steps once or more, and a process
of carrying out the fifth step afterwards.
[0191] That is, a metal oxycarbonitride film having a predetermined
thickness may be formed on a wafer by performing, a predetermined
number of times (n times), a cycle including steps of:
[0192] (a) performing a set of steps including (a-1) supplying a
source gas including a metal element into a process vessel
accommodating the wafer under a condition where a CVD reaction is
caused to form a layer containing the metal element on the wafer
(first step), (a-2) supplying a carbon-containing gas into the
process vessel to form a carbon-containing layer on the layer
containing the metal element, thereby forming a first layer
including the metal element and the carbon (second step), (a-3)
supplying a source gas including the metal element into the process
vessel under a condition where a CVD reaction is caused to form a
layer containing the metal element on the first layer including the
metal element and the carbon, thereby forming a second layer
including the metal element and the carbon (third step), and (a-4)
supplying a nitrogen-containing gas into the process vessel to
nidtride the second layer including the metal element and the
carbon, thereby forming a metal carbonitride layer (fourth step),
the set of steps being performed a predetermined number of times (m
times) to form a metal carbonitride layer having a predetermined
thickness; and
[0193] (b) supplying an oxygen-containing gas into the process
vessel to oxidize the metal carbonitride layer having the
predetermined thickness, thereby forming a metal oxycarbonitride
layer (fifth step).
[0194] For example, when a TiOCN film is formed as the metal
oxycarbonitride film, a source containing Ti may include an organic
source such as tetrakisethylmethylaminotitanium
(Ti[N(C.sub.2H.sub.5)(CH.sub.3)].sub.4, TEMAT),
tetrakisdimethylaminotitanium (Ti[N(CH.sub.3).sub.2].sub.4, TDMAT),
and tetrakisdiethylaminotitanium
(Ti[N(C.sub.2H.sub.5).sub.2].sub.4, TDEAT), or an inorganic source
such as titanium tetrachloride (TiCl.sub.4). The same gases
described in the embodiment of the present invention may be used as
the carbon-containing gas, the nitrogen-containing gas, or the
oxygen-containing gas. In this case, the processing conditions may
be, for example, set to the same processing conditions as described
in the embodiment of the present invention, but a temperature of
the wafer is more preferably, for example, in a range of 100 to
500.degree. C. and a pressure in the process chamber is more
preferably in a range of 1 to 1,000 Pa.
[0195] Also, for example, when a ZrOCN film is formed as the metal
oxycarbonitride film, a source containing Zr may include an organic
source such as tetrakisethylmethylaminozirconium
(Zr[N(C.sub.2H.sub.5)(CH.sub.3)].sub.4, TEMAZ),
tetrakisdimethylaminozirconium (Zr[N(CH.sub.3).sub.2].sub.4,
TDMAZ), and tetrakisdiethylaminozirconium
(Zr[N(C.sub.2H.sub.5).sub.2].sub.4, TDEAZ), or an inorganic source
such as zirconium tetrachloride (ZrCl.sub.4). The same gases
described in the embodiment of the present invention may be used as
the carbon-containing gas, the nitrogen-containing gas, or the
oxygen-containing gas. Also, the processing conditions may be, for
example, set to the same processing conditions as described in the
embodiment of the present invention, but a temperature of the wafer
is more preferably, for example, in a range of 100 to 400.degree.
C. and a pressure in the process chamber is more preferably in a
range of 1 to 1,000 Pa.
[0196] Also, for example, when a HfOCN film is formed as the metal
oxycarbonitride film, a source containing Hf may include an organic
source such as tetrakisethylmethylaminohafnium
(Hf[N(C.sub.2H.sub.5)CH.sub.3)].sub.4, TEMAH),
tetrakisdimethylaminohafnium (Hf[N(CH.sub.3).sub.2].sub.4, TDMAH),
and tetrakisdiethylaminohafnium (Hf[N(C.sub.2H.sub.5).sub.2].sub.4,
TDEAH), or an inorganic source such as hafnium tetrachloride
(HfCl.sub.4). The same gas described in the embodiment of the
present invention may be used as the carbon-containing gas, the
nitrogen-containing gas, or the oxygen-containing gas. Also in this
case, the processing conditions may be, for example, set to the
same processing conditions as described in the embodiment of the
present invention, but a temperature of the wafer is more
preferably, for example, in a range of 100 to 400.degree. C. and a
pressure in the process chamber is more preferably in a range of 1
to 1,000 Pa.
[0197] Also, for example, when an AlOCN film is formed as the metal
oxycarbonitride film, a source containing Al may include an organic
source such as trimethylaluminum (Al(CH.sub.3).sub.3, TMA), or an
inorganic source such as trichloroaluminum (AlCl.sub.3). The same
gas described in the embodiment of the present invention may be
used as the carbon-containing gas, the nitrogen-containing gas, or
the oxygen-containing gas. Also in this case, the processing
conditions may be, for example, set to the same processing
conditions as described in the embodiment of the present invention,
but a temperature of the wafer is more preferably, for example, in
a range of 100 to 400.degree. C. and a pressure in the process
chamber is more preferably in a range of 1 to 1,000 Pa.
[0198] In this way, the present invention may be applied to
formation of the metal oxycarbonitride film, in which case the same
operations and effects as in the embodiment of the present
invention can be obtained.
[0199] As described above, the present invention may be applied to
the case of forming a oxycarbonitride film containing a certain
element such as a semiconductor element or a metal element.
EXAMPLES
[0200] SiOCN films were formed while controlling composition ratios
through the first sequence according to the above-described
embodiment and the composition ratios of the SiOCN films and
uniformity in film thicknesses in wafer surfaces were measured. HCD
gas was used as the silicon-containing gas, C.sub.3H.sub.6 gas was
used as the carbon-containing gas, NH.sub.3 gas was used as the
nitrogen-containing gas, and O.sub.2 gas was used as the
oxygen-containing gas. The composition ratios were controlled by
regulating factors for controlling the composition ratios, i.e., a
pressure, or a pressure and gas supply time (irradiation time). In
controlling the composition ratios, the higher the pressure is and
the longer the gas supply time is, the higher the reaction is, and
thus layers formed in the corresponding steps become thicker or an
adsorption amount is increased. That is, the number of atoms given
in the corresponding steps becomes larger. In the meantime, when
the adsorption of reaction species or a reaction by the reaction
species is saturated, there is a case that a film thickness may not
become thicker than one atomic layer.
[0201] First, the pressure in the process chamber and the supply
time of C.sub.3H.sub.6 gas in the second step of the first sequence
were regulated, and a SiOCN film having a C concentration of
approximately 8 atoms % was formed on the wafer. The processing
conditions then were set as follows.
[0202] <First Sequence (Reference Processing Condition)>
[0203] (First Step)
[0204] Temperature in process chamber: 630.degree. C.
[0205] Pressure in process chamber: 133 Pa (1 Torr)
[0206] Flow rate of supplied HCD gas: 0.2 slm
[0207] Irradiation time of HCD gas: 6 seconds
[0208] (Second Step)
[0209] Temperature in process chamber: 630.degree. C.
[0210] Pressure in process chamber: 133 Pa (1 Torr)
[0211] Flow rate of supplied C.sub.3H.sub.6 gas: 1 slm
[0212] Irradiation time of C.sub.3H.sub.6 gas: 12 seconds
[0213] (Third Step)
[0214] Temperature in process chamber: 630.degree. C.
[0215] Pressure in process chamber: 866 Pa (6.5 Torr)
[0216] Flow rate of supplied NH.sub.3 gas: 4.5 slm
[0217] Irradiation time of NH.sub.3 gas: 18 seconds
[0218] (Fourth Step)
[0219] Temperature in process chamber: 630.degree. C.
[0220] Pressure in process chamber: 133 Pa (1 Torr)
[0221] Flow rate of supplied O.sub.2 gas: 1 slm
[0222] Irradiation time of O.sub.2 gas: 18 seconds
[0223] An attempt was made to form a SiOCN film having a C
concentration of approximately 16 atoms % by adjusting each
processing condition based on the above-described reference
processing condition.
[0224] As a result, a SiOCN film having a C concentration of
approximately 16 atoms % was obtained by changing a pressure in the
process chamber from 133 Pa (1 Torr) to 2394 Pa (18 Torr) in the
second step. In this case, it was confirmed that a SiOCN film
having a C ratio higher than that of a SiOCN film formed by the
reference processing conditions may be formed. That is, it was
confirmed that a SiOCN film having a high C ratio may be formed by
setting a pressure in the process chamber in the second step to a
higher pressure than a pressure in the process chamber with respect
to the reference processing conditions. It was also confirmed that
as C concentration increases, N concentration decreases. The
processing conditions except for the pressure in the process
chamber in the second step were set to the same conditions as in
the reference processing conditions. That is, the processing
conditions in this case were set as follows.
[0225] <First Sequence (change in pressure during supply of
C.sub.3H, gas)>
[0226] (First Step)
[0227] Temperature in process chamber: 630.degree. C.
[0228] Pressure in process chamber: 133 Pa (1 Torr)
[0229] Flow rate of supplied HCD gas: 0.2 slm
[0230] Irradiation time of HCD gas: 6 seconds
[0231] (Second Step)
[0232] Temperature in process chamber: 630.degree. C.
[0233] Pressure in process chamber: 2,394 Pa (18 Torr)
[0234] Flow rate of supplied C.sub.3H.sub.6 gas: 1 slm
[0235] Irradiation time of C.sub.3H.sub.6 gas: 12 seconds
[0236] (Third Step)
[0237] Temperature in process chamber: 630.degree. C.
[0238] Pressure in process chamber: 866 Pa (6.5 Torr)
[0239] Flow rate of supplied NH.sub.3 gas: 4.5 slm
[0240] Irradiation time of NH.sub.3 gas: 18 seconds
[0241] (Fourth Step)
[0242] Temperature in process chamber: 630.degree. C.
[0243] Pressure in process chamber: 133 Pa (1 Torr)
[0244] Flow rate of supplied O.sub.2 gas: 1 slm
[0245] Irradiation time of O.sub.2 gas: 18 seconds
[0246] It was also confirmed that, even when an irradiation time of
C.sub.3H.sub.6 gas is changed from 12 seconds to 96 seconds in the
second step, a SiOCN film having a C concentration of approximately
16 atoms % is obtained, which indicates that a SiOCN film having a
C ratio higher than that of a SiOCN film formed by the reference
processing conditions may be formed. That is, it was confirmed
that, even when an irradiation time of C.sub.3H.sub.6 gas in the
second step is longer than that of C.sub.3H.sub.6 gas with respect
to the reference processing conditions, a SiOCN film having a high
C ratio may be formed. It was also confirmed that as C
concentration increases, N concentration decreases. The processing
conditions other than the irradiation time of C.sub.3H.sub.6 gas in
the second step were set to the same conditions as in the reference
processing conditions. That is, the processing conditions in this
case were set as follows.
[0247] <First Sequence (change in irradiation time during supply
of C.sub.3H.sub.6 gas)>
[0248] (First Step)
[0249] Temperature in process chamber: 630.degree. C.
[0250] Pressure in process chamber: 133 Pa (1 Torr)
[0251] Flow rate of supplied HCD gas: 0.2 slm
[0252] Irradiation time of HCD gas: 6 seconds
[0253] (Second Step)
[0254] Temperature in process chamber: 630.degree. C.
[0255] Pressure in process chamber: 133 Pa (1 Torr)
[0256] Flow rate of supplied C.sub.3H.sub.6 gas: 1 slm
[0257] Irradiation time of C.sub.3H.sub.6 gas: 96 seconds
[0258] (Third Step)
[0259] Temperature in process chamber: 630.degree. C.
[0260] Pressure in process chamber: 866 Pa (6.5 Torr)
[0261] Flow rate of supplied NH.sub.3 gas: 4.5 slm
[0262] Irradiation time of NH.sub.3 gas: 18 seconds
[0263] (Fourth Step)
[0264] Temperature in process chamber: 630.degree. C.
[0265] Pressure in process chamber: 133 Pa (1 Torr)
[0266] Flow rate of supplied O.sub.2 gas: 1 slm
[0267] Irradiation time of O.sub.2 gas: 18 seconds
[0268] In this case, all the uniformities in film thickness on
wafer surfaces of formed SiOCN films were less than .+-.1.5%, which
is an excellent result. The uniformity in film thickness on the
wafer surface represents a deviation degree of film thickness
distribution on the wafer surface, and as the deviation degree is
smaller, the uniformity in film thickness distribution on the wafer
surface is excellent.
[0269] According to the embodiment of the present invention, it can
be seen that a SiOCN film having an excellent uniformity in film
thickness on the wafer surface may be formed. In addition, it can
be seen that when a SiOCN film according to the embodiment of the
present invention is used as the insulating film, a surface of the
SiOCN film may be endowed with uniform performance, thereby
contributing to enhanced performance of a semiconductor device or
enhanced yield rate
[0270] When the third step and the fourth step of the first
sequence according to the above-described embodiment of the present
invention were performed in a random order to form a film, a SiOCN
film was not formed on the wafer. That is, it was confirmed that
when film formation was performed in the order of the first step,
the second step, the fourth step, and the third step, a SiOCN film
could not be obtained. The processing conditions in each step are
set to the same processing conditions as the processing conditions
(reference processing conditions) in each step of the embodiment.
Accordingly, it was revealed that even when a layer including Si
and C formed in the first and second steps is oxidized and then
nitrided, a SiOCN film cannot be obtained, and a layer containing
Si and C formed in the first and second steps needs to be oxidized
after being nitrided in order to obtain a SiOCN film.
[0271] <Preferred Aspects of the Invention>
[0272] Hereinafter, preferred aspects according to the present
invention will be additionally stated.
[0273] According to one aspect to the present invention, there is
provided a method of manufacturing a semiconductor device including
performing a cycle a predetermined number of times to form an
oxycarbonitride film having a predetermined thickness on a
substrate in a process vessel, wherein the cycle includes steps
of:
[0274] (a) performing a set of steps a predetermined number of
times to form a carbonitride layer having a predetermined thickness
on the substrate; and
[0275] (b) supplying an oxygen-containing gas into the process
vessel to oxidize the carbonitride layer having the predetermined
thickness, thereby forming an oxycarbonitride layer,
[0276] wherein the set of steps includes:
[0277] (a-1) supplying a gas containing an element into the process
vessel accommodating the substrate under a condition where a CVD
reaction is caused to form a layer containing the element on the
substrate;
[0278] (a-2) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the layer containing
the element, thereby forming a layer including the element and a
carbon; and
[0279] (a-3) supplying a nitrogen-containing gas into the process
vessel to nitride the layer including the element and the carbon,
thereby forming the carbonitride layer.
[0280] Preferably, in the step (b), the carbonitride layer having
the predetermined thickness is thermally oxidized under a condition
where an oxidation reaction of the carbonitride layer having the
predetermined thickness caused by the oxygen-containing gas is
unsaturated.
[0281] Preferably, in the step (a-2), a discontinuous chemical
adsorption layer is formed as the carbon-containing layer on the
layer containing the element,
[0282] in the step (a-3), the layer including the element and the
carbon is thermally nitrided under a condition where a nitridation
reaction of the layer including the element and the carbon caused
by the nitrogen-containing gas is unsaturated, and
[0283] in the step (b), the carbonitride layer having the
predetermined thickness is thermally oxidized under a condition
where an oxidation reaction of the carbonitride layer having the
predetermined thickness caused by the oxygen-containing gas is
unsaturated.
[0284] Preferably, in the step (a-1), a deposition layer of the
element is formed as the layer containing the element on the
substrate,
[0285] in the step (a-2), a discontinuous chemical adsorption layer
is formed as the carbon-containing layer on the layer containing
the element,
[0286] in the step (a-3), the layer including the element and the
carbon is thermally nitrided under a condition where a nitridation
reaction of the layer including the element and the carbon caused
by the nitrogen-containing gas is unsaturated, and
[0287] in the step (b), the carbonitride layer having the
predetermined thickness is thermally oxidized under a condition
where an oxidation reaction of the carbonitride layer having the
predetermined thickness caused by the oxygen-containing gas is
unsaturated.
[0288] Preferably, a composition of the oxycarbonitride film is
adjusted by controlling a pressure in the process vessel, or the
pressure and a gas supply time in at least one of the steps.
[0289] Preferably, at least one of concentrations of the element,
the carbon, a nitrogen and an oxygen in the oxycarbonitride film is
adjusted by controlling a pressure in the process vessel, or the
pressure and a gas supply time in at least one of the steps.
[0290] Preferably, the element includes a semiconductor element or
a metal element.
[0291] Preferably, the element is a silicon.
[0292] According to another aspect to the present invention, there
is provided a method of manufacturing a semiconductor device
including performing a cycle a predetermined number of times to
form a silicon oxycarbonitride film having a predetermined
thickness on a substrate in a process vessel, wherein the cycle
includes steps of:
[0293] (a) performing a set of steps a predetermined number of
times to form a silicon carbonitride layer having a predetermined
thickness on the substrate; and
[0294] (b) supplying an oxygen-containing gas into the process
vessel to oxidize the silicon carbonitride layer having the
predetermined thickness, thereby forming a silicon oxycarbonitride
layer,
[0295] wherein the set of steps includes:
[0296] (a-1) supplying a silicon-containing gas into the process
vessel accommodating the substrate under a condition where a CVD
reaction is caused to form a silicon-containing layer on the
substrate;
[0297] (a-2) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the silicon-containing
layer, thereby forming a layer including a silicon and a carbon;
and
[0298] (a-3) supplying a nitrogen-containing gas into the process
vessel to nitride the layer including the silicon and the carbon,
thereby forming the silicon carbonitride layer.
[0299] Preferably, in the step (b), the silicon carbonitride layer
having the predetermined thickness is thermally oxidized under a
condition where an oxidation reaction of the silicon carbonitride
layer having the predetermined thickness caused by the
oxygen-containing gas is unsaturated.
[0300] Preferably, in the step (a-2), a discontinuous chemical
adsorption layer is formed as the carbon-containing layer on the
silicon-containing layer,
[0301] in the step (a-3), the layer including the silicon and the
carbon is thermally nitrided under a condition where a nitridation
reaction of the layer including the silicon and the carbon caused
by the nitrogen-containing gas is unsaturated, and
[0302] in the step (b), the silicon carbonitride layer having the
predetermined thickness is thermally oxidized under a condition
where an oxidation reaction of the silicon carbonitride layer
having the predetermined thickness caused by the oxygen-containing
gas is unsaturated.
[0303] Preferably, in the step (a-1), a deposition layer of the
silicon is formed as the silicon-containing layer on the
substrate,
[0304] in the step (a-2), a discontinuous chemical adsorption layer
is formed as the carbon-containing layer on the silicon-containing
layer,
[0305] in the step (a-3), the layer including the silicon and the
carbon is thermally nitrided under a condition where a nitridation
reaction of the layer including the silicon and the carbon caused
by the nitrogen-containing gas is unsaturated, and
[0306] in the step (b), the silicon carbonitride layer having the
predetermined thickness is thermally oxidized under a condition
where an oxidation reaction of the silicon carbonitride layer
having the predetermined thickness caused by the oxygen-containing
gas is unsaturated.
[0307] Preferably, a composition of the silicon oxycarbonitride
film is adjusted by controlling a pressure in the process vessel,
or the pressure and a gas supply time in at least one of the
steps.
[0308] Preferably, at least one of concentrations of the silicon,
the carbon, a nitrogen and an oxygen in the silicon oxycarbonitride
film is adjusted by controlling a pressure in the process vessel,
or the pressure and a gas supply time in at least one of the
steps.
[0309] According to still another aspect of the present invention,
there is provided a method of manufacturing a semiconductor device
including performing a cycle a predetermined number of times to
form an oxycarbonitride film having a predetermined thickness on a
substrate in a process vessel, wherein the cycle includes steps
of:
[0310] (a) supplying a gas containing an element into the process
vessel accommodating the substrate under a condition where a CVD
reaction is caused to form a layer containing the element on the
substrate;
[0311] (b) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the layer containing
the element, thereby forming a layer including the element and a
carbon;
[0312] (c) supplying a nitrogen-containing gas into the process
vessel to nitride the layer including the element and the carbon,
thereby forming a carbonitride layer; and
[0313] (d) supplying an oxygen-containing gas into the process
vessel to oxidize the carbonitride layer having the predetermined
thickness, thereby forming an oxycarbonitride layer.
[0314] According to yet another aspect of the present invention,
there is provided a method of manufacturing a semiconductor device
including performing a cycle a predetermined number of times to
form a silicon oxycarbonitride film having a predetermined
thickness on a substrate in a process vessel, wherein the cycle
includes steps of:
[0315] (a) supplying a silicon-containing gas into the process
vessel accommodating the substrate under a condition where a CVD
reaction is caused to form a silicon-containing layer on the
substrate;
[0316] (b) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the silicon-containing
layer, thereby forming a layer including the silicon and a
carbon;
[0317] (c) supplying a nitrogen-containing gas into the process
vessel to nitride the layer including the silicon and the carbon,
thereby forming a silicon carbonitride layer; and
[0318] (d) supplying an oxygen-containing gas into the process
vessel to oxidize the silicon carbonitride layer having the
predetermined thickness, thereby forming a silicon oxycarbonitride
layer.
[0319] According to yet another aspect of the present invention,
there is provided a method of processing a substrate including
performing a cycle a predetermined number of times to form an
oxycarbonitride film having a predetermined thickness on a
substrate in a process vessel, wherein the cycle includes steps
of:
[0320] (a) performing a set of steps a predetermined number of
times to form a carbonitride layer having a predetermined thickness
on the substrate: and
[0321] (b) supplying an oxygen-containing gas into the process
vessel to oxidize the carbonitride layer having the predetermined
thickness, thereby forming an oxycarbonitride layer,
[0322] wherein the set of steps includes:
[0323] (a-1) supplying a gas containing an element into the process
vessel accommodating the substrate under a condition where a CVD
reaction is caused to form a layer containing the element on the
substrate;
[0324] (a-2) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the layer containing
the element, thereby forming a layer including the element and a
carbon; and
[0325] (a-3) supplying a nitrogen-containing gas into the process
vessel to nitride the layer including the element and the carbon,
thereby forming the carbonitride layer.
[0326] According to yet another aspect of the present invention,
there is provided a substrate processing apparatus including:
[0327] a process vessel configured to accommodate a substrate;
[0328] a heater configured to heat the substrate in the process
vessel;
[0329] an element-containing gas supply system configured to supply
a gas containing an element into the process vessel;
[0330] a carbon-containing gas supply system configured to supply a
carbon-containing gas into the process vessel;
[0331] a nitrogen-containing gas supply system configured to supply
a nitrogen-containing gas into the process vessel;
[0332] an oxygen-containing gas supply system configured to supply
an oxygen-containing gas into the process vessel;
[0333] a pressure regulating unit configured to regulate a pressure
in the process vessel; and
[0334] a control unit configured to control the heater, the
element-containing gas supply system, the carbon-containing gas
supply system, the nitrogen-containing gas supply system, the
oxygen-containing gas supply system and the pressure regulating
unit such that an oxycarbonitride film having a predetermined
thickness is formed on the substrate by performing a cycle a
predetermined number of times wherein the cycle includes processes
of: (a) performing a set of processes a predetermined number of
times to form a carbonitride layer having a predetermined thickness
on the substrate; and (b) supplying an oxygen-containing gas into
the process vessel to oxidize the carbonitride layer having the
predetermined thickness, thereby forming an oxycarbonitride
layer,
[0335] wherein the set of processes includes: (a-1) supplying a gas
containing an element into the process vessel accommodating the
substrate under a condition where a CVD reaction is caused to form
a layer containing the element on the substrate; (a-2) supplying a
carbon-containing gas into the process vessel to form a
carbon-containing layer on the layer containing the element,
thereby forming a layer including the element and a carbon; and
(a-3) supplying a nitrogen-containing gas into the process vessel
to nitride the layer including the element and the carbon, thereby
forming the carbonitride layer.
[0336] According to yet another aspect of the present invention,
there is provided a method of manufacturing a semiconductor device
including performing a cycle a predetermined number of times to
form an oxycarbonitride film having a predetermined thickness on a
substrate in a process vessel, wherein the cycle includes steps
of:
[0337] (a) performing a set of steps a predetermined number of
times to form a carbonitride layer having a predetermined thickness
on the substrate; and
[0338] (b) supplying an oxygen-containing gas into the process
vessel to oxidize the carbonitride layer having the predetermined
thickness, thereby forming an oxycarbonitride layer,
[0339] wherein the set of steps includes:
[0340] (a-1) supplying a gas containing an element into the process
vessel accommodating the substrate under a condition where a CVD
reaction is caused to form a layer containing the element on the
substrate;
[0341] (a-2) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the layer containing
the element, thereby forming a first layer including the element
and a carbon;
[0342] (a-3) supplying the gas containing the element into the
process vessel under a condition where a CVD reaction is caused to
form a layer containing the element on the first layer including
the element and the carbon, thereby forming a second layer
containing the element and the carbon; and
[0343] (a-4) supplying a nitrogen-containing gas into the process
vessel to nitride the second layer including the element and the
carbon, thereby forming the carbonitride layer.
[0344] According to yet another aspect of the present invention,
there is provided a method of manufacturing a semiconductor device
including performing a cycle a predetermined number of times to
form an oxycarbonitride film having a predetermined thickness on a
substrate in a process vessel, wherein the cycle includes steps
of:
[0345] (a) supplying a gas containing an element into the process
vessel accommodating the substrate under a condition where a CVD
reaction is caused to form a layer containing the element on the
substrate;
[0346] (b) supplying a carbon-containing gas into the process
vessel to form a carbon-containing layer on the layer containing
the element, thereby forming a first layer including the element
and a carbon;
[0347] (c) supplying the gas containing the element into the
process vessel under a condition where a CVD reaction is caused to
form a layer containing the element on the first layer including
the element and the carbon, thereby forming a second layer
containing the element and the carbon;
[0348] (d) supplying a nitrogen-containing gas into the process
vessel to nitride the second layer including the element and the
carbon, thereby forming the carbonitride layer, and
[0349] (e) supplying an oxygen-containing gas into the process
vessel to oxidize the carbonitride layer having the predetermined
thickness, thereby forming an oxycarbonitride layer.
[0350] According to yet another aspect of the present invention,
there is provided a substrate processing apparatus including:
[0351] a process vessel configured to accommodate a substrate;
[0352] a heater configured to heat the substrate in the process
vessel;
[0353] an element-containing gas supply system configured to supply
a gas containing an element into the process vessel;
[0354] a carbon-containing gas supply system configured to supply a
carbon-containing gas into the process vessel;
[0355] a nitrogen-containing gas supply system configured to supply
a nitrogen-containing gas into the process vessel;
[0356] an oxygen-containing gas supply system configured to supply
an oxygen-containing gas into the process vessel;
[0357] a pressure regulating unit configured to regulate a pressure
in the process vessel; and
[0358] a control unit configured to control the heater, the
element-containing gas supply system, the carbon-containing gas
supply system, the nitrogen-containing gas supply system, the
oxygen-containing gas supply system and the pressure regulating
unit such that an oxycarbonitride film having a predetermined
thickness is formed on the substrate by performing a cycle a
predetermined number of times wherein the cycle includes processes
of: (a) performing a set of processes a predetermined number of
times to form a carbonitride layer having a predetermined thickness
on the substrate; and (b) supplying an oxygen-containing gas into
the process vessel to oxidize the carbonitride layer having the
predetermined thickness, thereby forming an oxycarbonitride
layer,
[0359] wherein the set of processes includes: (a-1) supplying a gas
containing an element into the process vessel accommodating the
substrate under a condition where a CVD reaction is caused to form
a layer containing the element on the substrate; (a-2) supplying a
carbon-containing gas into the process vessel to form a
carbon-containing layer on the layer containing the element,
thereby forming a first layer including the element and a carbon;
(a-3) supplying the gas containing the element into the process
vessel under a condition where a CVD reaction is caused to form a
layer containing the element on the first layer including the
element and the carbon, thereby forming a second layer containing
the element and the carbon; and (a-4) supplying a
nitrogen-containing gas into the process vessel to nitride the
second layer including the element and the carbon, thereby forming
the carbonitride layer.
* * * * *