U.S. patent application number 14/508005 was filed with the patent office on 2015-04-09 for chemical liquid container replacement device, container mounting module, chemical liquid container replacement method, and substrate processing apparatus.
The applicant listed for this patent is Tokyo Electron Limited. Invention is credited to Tsunenaga Nakashima.
Application Number | 20150096682 14/508005 |
Document ID | / |
Family ID | 52776008 |
Filed Date | 2015-04-09 |
United States Patent
Application |
20150096682 |
Kind Code |
A1 |
Nakashima; Tsunenaga |
April 9, 2015 |
CHEMICAL LIQUID CONTAINER REPLACEMENT DEVICE, CONTAINER MOUNTING
MODULE, CHEMICAL LIQUID CONTAINER REPLACEMENT METHOD, AND SUBSTRATE
PROCESSING APPARATUS
Abstract
In a chemical liquid container replacement device D2 configured
to replace a chemical liquid container 50, multiple chemical liquid
containers 50 respectively connected to base end sides of chemical
liquid supply paths configured to supply chemical liquids, and a
nozzle attachment/detachment device 61 is configured to
attach/detach the base end side of the chemical liquid supply path
with respect to the chemical liquid container 50 of a container
arrangement section 60. A loading/unloading port 62 loads a new
chemical liquid container 50 for performing a liquid process on a
substrate W and unloads a completely used chemical liquid container
50. A container transfer device 7 unloads the completely used
chemical liquid container 50 from the container arrangement section
60 toward the loading/unloading port 62 and loads the new chemical
liquid containers 50 from the loading/unloading port 62 toward the
container arrangement section 60.
Inventors: |
Nakashima; Tsunenaga; (Koshi
City, JP) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Tokyo Electron Limited |
Tokyo |
|
JP |
|
|
Family ID: |
52776008 |
Appl. No.: |
14/508005 |
Filed: |
October 7, 2014 |
Current U.S.
Class: |
156/345.11 ;
414/217; 414/267; 414/273; 414/807 |
Current CPC
Class: |
G03F 7/3021 20130101;
G03F 7/162 20130101; G03F 7/30 20130101 |
Class at
Publication: |
156/345.11 ;
414/267; 414/217; 414/273; 414/807 |
International
Class: |
B25J 11/00 20060101
B25J011/00; G03F 7/30 20060101 G03F007/30; G03F 7/16 20060101
G03F007/16 |
Foreign Application Data
Date |
Code |
Application Number |
Oct 8, 2013 |
JP |
2013-211066 |
Oct 8, 2013 |
JP |
2013-211079 |
Claims
1. A chemical liquid container replacement device comprising: a
container arrangement section in which multiple chemical liquid
containers respectively connected with base end sides of chemical
liquid supply paths are arranged; an attachment/detachment device
configured to attach and detach the base end side of the chemical
liquid supply path with respect to the chemical liquid container
arranged in the container arrangement section; a loading/unloading
port through which a new chemical liquid container storing therein
a chemical liquid to perform a liquid process on a substrate is
loaded and a completely used chemical liquid container is unloaded;
and a container transfer device configured to unloaded the
completely used chemical liquid container from the container
arrangement section through the loading/unloading port and load the
new chemical liquid container into the container arrangement
section through the loading/unloading port.
2. The chemical liquid container replacement device of claim 1,
further comprising: a cover opening/closing device configured to
close a chemical liquid suction opening of the completely used
chemical liquid container, from which the chemical liquid supply
path is separated, with a cover, and configured to open a chemical
liquid suction opening of the new chemical liquid container by
separating a cover of the new chemical liquid container.
3. The chemical liquid container replacement device of claim 2,
wherein the cover opening/closing device is provided to open and
close a cover of a chemical liquid container arranged in the
container arrangement section.
4. The chemical liquid container replacement device of claim 1,
wherein a transfer region of the container transfer device and the
container arrangement section are provided within a space
partitioned from an external atmosphere.
5. The chemical liquid container replacement device of claim 4,
further comprising: a gas supply device configured to supply a
clean gas into the space partitioned from the external
atmosphere.
6. The chemical liquid container replacement device of claim 4,
further comprising: an inert gas supply device configured to supply
an inert gas into the space partitioned from the external
atmosphere.
7. The chemical liquid container replacement device of claim 1,
wherein the container arrangement section is formed of a container
rack in which multiple plates for horizontally arranging the
multiple chemical liquid containers are vertically stacked.
8. The chemical liquid container replacement device of claim 1,
wherein multiple arrangement regions where the chemical liquid
containers are respectively provided are horizontally arranged in
the container arrangement section, and the container arrangement
section and processing blocks including a liquid processing module
configured to perform the liquid process on the substrate by
supplying the chemical liquid through the chemical liquid supply
path are stacked.
9. The chemical liquid container replacement device of claim 1,
further comprising: an acquisition device configured to acquire
identification information for identifying a kind of the chemical
liquid stored in the chemical liquid container loaded through the
loading/unloading port; and a transfer controller configured to
control the container transfer device, wherein, in the container
arrangement section, the chemical liquid containers storing
different kinds of chemical liquids therein are respectively
arranged to correspond to preset arrangement positions, when the
kind of the chemical liquid identified by the identification
information acquired in the acquisition device is identical with a
kind of a chemical liquid corresponding to the arrangement position
of a transfer target position of the chemical liquid container
loaded through the loading/unloading port, the transfer controller
transfers the chemical liquid container to the arrangement
position.
10. The chemical liquid container replacement device of claim 1,
wherein the chemical liquid supply paths are connected to a resist
coating module configured to coat a resist on the substrate and a
developing module configured to supply a developing liquid to the
substrate after being exposed, and the chemical liquid containers
storing a resist liquid or a developing liquid therein are arranged
in the container arrangement section.
11. A container mounting module on which a chemical liquid
container connected with a base end side of a chemical liquid
supply path is mounted, the container mounting module comprising:
an attachment/detachment device configured to attach and detach the
base end side of the chemical liquid supply path with respect to
the chemical liquid container which is mounted on the container
mounting module and which stores a chemical liquid for performing a
liquid process on a substrate; and a gas supply device configured
to supply a clean gas into the container mounting module.
12. A chemical liquid container replacement method of replacing a
chemical liquid container that supplies a chemical liquid for
performing a liquid process on a substrate, the chemical liquid
container replacement method comprising: detaching a base end side
of a chemical liquid supply path connected with a completely used
chemical liquid container; and attaching the base end side of the
chemical liquid supply path to a new chemical liquid container,
wherein the detaching of a base end side and the attaching of the
base end side are carried out in a space partitioned from an
external atmosphere.
13. A substrate processing apparatus comprising: a carrier block to
which a carrier accommodating multiple substrates is loaded; a
processing block, horizontally arranged in parallel with the
carrier block, including a liquid processing module configured to
perform a liquid process on a substrate unloaded from the carrier
within the carrier block by supplying a chemical liquid to the
substrate; and a chemical liquid block arranged in a row to be
parallel with the carrier block and the processing block and
configured to accommodate multiple chemical liquid containers each
storing the chemical liquid to be supplied to the liquid processing
module, wherein the chemical liquid block includes: a container
arrangement section in which the multiple chemical liquid
containers are arranged in a direction orthogonal to an arrangement
direction of the carrier block and the processing block; a
loading/unloading port through which the chemical liquid container
is loaded and unloaded; and a device configured to automatically
replace a completely used chemical liquid container with a new
chemical liquid container between the container arrangement section
and the loading/unloading port.
14. The substrate processing apparatus of claim 13, wherein a path
for the substrate is formed in the chemical liquid block.
15. The substrate processing apparatus of claim 14, wherein the
path for the substrate is surrounded by a cylindrical member
extended in a moving direction of the substrate.
16. The substrate processing apparatus of claim 13, wherein the
chemical liquid block is provided between the carrier block and the
processing block.
17. The substrate processing apparatus of claim 13, wherein the
processing block includes a first liquid processing module
configured to perform a liquid process on the substrate with a
chemical liquid in order to form a coating film including a resist
film on the substrate; and a second liquid processing module
configured to perform a developing process on the substrate after
being exposed with a developing liquid serving as the chemical
liquid, an interface block connected to an exposure device and
configured to transfer the substrate between the processing block
and the exposure device is provided at a side opposite to the
carrier block when viewed from the processing block, and the
chemical liquid block is provided between the processing block and
the interface block.
18. The substrate processing apparatus of claim 13, wherein when an
arrangement direction of the carrier block and the processing block
is set to be a forward/backward direction, a loading/unloading
opening for the chemical liquid container is formed at least one of
left and right sides of the chemical liquid block while surrounding
the chemical liquid block.
19. The substrate processing apparatus of claim 13, wherein a
loading/unloading opening for the chemical liquid container is
formed on a ceiling portion surrounding the chemical liquid block.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application claims the benefit of Japanese Patent
Application Nos. 2013-211066 and 2013-211079 filed on Oct. 8, 2013
and Oct. 8, 2013, respectively, the entire disclosures of which are
incorporated herein by reference.
TECHNICAL FIELD
[0002] The embodiments described herein pertain generally to
technology of replacing a chemical liquid container, which stores
therein a chemical liquid, in a substrate processing apparatus
which performs a process on a substrate with the chemical
liquid.
BACKGROUND
[0003] In a photoresist process as one of the semiconductor
manufacturing processes, a resist is coated on a surface of a
semiconductor wafer (hereinafter, referred to as "wafer"), and then
the resist is exposed and developed in a preset pattern to form a
resist pattern. This process is generally performed using a system
in which an exposure apparatus is connected to a coating and
developing apparatus (substrate processing apparatus) for coating
and developing the resist.
[0004] The coating and developing apparatus supplies various kinds
of chemical liquids to the wafer in sequence using liquid
processing modules and performs various kinds of processes, such as
a resist coating process or developing process, included in the
photoresist process. For this reason, the coating and developing
apparatus includes an accommodation region for chemical liquid
containers in which various kinds of chemical liquids are stored,
and the chemical liquids are supplied to the respective liquid
processing modules therefrom.
[0005] When a process is performed on multiple wafers and a
chemical liquid container becomes empty, the empty ("completely
used") chemical liquid container is unloaded from the accommodation
region by, for example, an operator, and then replaced with a new
chemical liquid container. However, some of the chemical liquids
used in the coating and developing apparatus may be deteriorated in
characteristics by being contacted with air, and an operation of
opening the accommodation region and replacing the chemical liquid
container may cause a problem that a uniform process cannot be
stably preformed on the wafers. Further, when the chemical liquid
container is replaced, if foreign particles enter the container,
the chemical liquid mixed with the particles may be supplied to a
wafer and may contaminate the wafer.
[0006] Patent Document 1 describes a liquid supply device of
continuously supplying a liquid. In the liquid supply device, a
container, which stores a resist liquid or the like, is mounted on
a table configured to be moved up and down with respect to a cap
including a liquid suction pipe and the liquid suction pipe is
inserted into and separated from the container by moving the table
up and down. Further, in Patent Document 2, an IC tag seal, which
stores information on content of a processing liquid container, is
attached to the processing liquid container storing the processing
liquid. Further, after the container is provided in one of
arrangement regions capable of accommodating multiple containers,
information read from the IC tag seal is compared with information
on content of the containers to be provided in the respective
arrangement regions. As a result, the container, which stores the
wrong processing liquid, is suppressed from being provided in a
substrate processing apparatus, which performs a resist coating and
developing process.
[0007] However, both Patent Documents do not describe a technology
that suppresses a liquid from being deteriorated or particles from
being mixed with the liquid, when a completely used container
provided on a table or in an arrangement region is replaced with a
new container.
[0008] Patent Document 1: Japanese Utility Model Laid-open
Publication No. H05-082896 (Paragraphs 0006 to 0007, and FIG.
1)
[0009] Patent Document 2: Japanese Patent Laid-open Publication No.
2010-171258 (Claim 1, Paragraphs 0082 to 0083 and 0135 to 0136, and
FIG. 6)
SUMMARY
[0010] In view of the foregoing, example embodiments provide a
chemical liquid container replacement device, a container mounting
module, and a chemical liquid container replacement method of
replacing a chemical liquid container under the clean atmosphere.
Further, the example embodiments provide a substrate processing
apparatus in which the chemical liquid container can be replaced
without using the hands of the operator.
[0011] In one example embodiment, a chemical liquid container
replacement device includes a container arrangement section in
which multiple chemical liquid containers respectively connected
with base end sides of chemical liquid supply paths are arranged;
an attachment/detachment device configured to attach and detach the
base end side of the chemical liquid supply path with respect to
the chemical liquid container arranged in the container arrangement
section; a loading/unloading port through which a new chemical
liquid container storing therein a chemical liquid to perform a
liquid process on a substrate is loaded and a completely used
chemical liquid container is unloaded; and a container transfer
device configured to unloaded the completely used chemical liquid
container from the container arrangement section through the
loading/unloading port and load the new chemical liquid container
into the container arrangement section through the
loading/unloading port.
[0012] Further, the chemical liquid container replacement device
may further include a cover opening/closing device configured to
close a chemical liquid suction opening of the completely used
chemical liquid container, from which the chemical liquid supply
path is separated, with a cover, and configured to open a chemical
liquid suction opening of the new chemical liquid container by
separating a cover of the new chemical liquid container.
[0013] The cover opening/closing device may be provided to open and
close a cover of a chemical liquid container arranged in the
container arrangement section.
[0014] A transfer region of the container transfer device and the
container arrangement section may be provided within a space
partitioned from an external atmosphere.
[0015] The chemical liquid container replacement device may further
include a gas supply device configured to supply a clean gas into
the space partitioned from the external atmosphere.
[0016] The chemical liquid container replacement device may further
include an inert gas supply device configured to supply an inert
gas into the space partitioned from the external atmosphere.
[0017] The container arrangement section may be formed of a
container rack in which multiple plates for horizontally arranging
the multiple chemical liquid containers are vertically stacked.
[0018] Multiple arrangement regions where the chemical liquid
containers are respectively provided may be horizontally arranged
in the container arrangement section, and the container arrangement
section and processing blocks including a liquid processing module
configured to perform the liquid process on the substrate by
supplying the chemical liquid through the chemical liquid supply
path may be stacked.
[0019] The chemical liquid container replacement device may further
include an acquisition device configured to acquire identification
information for identifying a kind of the chemical liquid stored in
the chemical liquid container loaded through the loading/unloading
port; and a transfer controller configured to control the container
transfer device. Further, in the container arrangement section, the
chemical liquid containers storing different kinds of chemical
liquids therein may be respectively arranged to correspond to
preset arrangement positions, and when the kind of the chemical
liquid identified by the identification information acquired in the
acquisition device is identical with a kind of a chemical liquid
corresponding to the arrangement position of a transfer target
position of the chemical liquid container loaded through the
loading/unloading port, the transfer controller may transfer the
chemical liquid container to the arrangement position.
[0020] The chemical liquid supply paths may be connected to a
resist coating module configured to coat a resist on the substrate
and a developing module configured to supply a developing liquid to
the substrate after being exposed, and the chemical liquid
containers storing a resist liquid or a developing liquid therein
may be arranged in the container arrangement section.
[0021] In another example embodiment, a substrate processing
apparatus includes a carrier block to which a carrier accommodating
multiple substrates is loaded; a processing block, horizontally
arranged in parallel with the carrier block, including a liquid
processing module configured to perform a liquid process on a
substrate unloaded from the carrier within the carrier block by
supplying a chemical liquid to the substrate; and a chemical liquid
block arranged in a row to be parallel with the carrier block and
the processing block and configured to accommodate multiple
chemical liquid containers each storing the chemical liquid to be
supplied to the liquid processing module. Further, the chemical
liquid block includes a container arrangement section in which the
multiple chemical liquid containers are arranged in a direction
orthogonal to an arrangement direction of the carrier block and the
processing block; a loading/unloading port through which the
chemical liquid container is loaded and unloaded; and a device
configured to automatically replace a completely used chemical
liquid container with a new chemical liquid container between the
container arrangement section and the loading/unloading port.
[0022] A path for the substrate may be formed in the chemical
liquid block.
[0023] The path for the substrate may be surrounded by a
cylindrical member extended in a moving direction of the
substrate.
[0024] The chemical liquid block may be provided between the
carrier block and the processing block.
[0025] The processing block may include a first liquid processing
module configured to perform a liquid process on the substrate with
a chemical liquid in order to form a coating film including a
resist film on the substrate; and a second liquid processing module
configured to perform a developing process on the substrate after
being exposed with a developing liquid serving as the chemical
liquid. Further, an interface block connected to an exposure device
and configured to transfer the substrate between the processing
block and the exposure device may be provided at a side opposite to
the carrier block when viewed from the processing block, and the
chemical liquid block may be provided between the processing block
and the interface block.
[0026] When an arrangement direction of the carrier block and the
processing block is set to be a forward/backward direction, a
loading/unloading opening for the chemical liquid container may be
formed at least one of left and right sides of the chemical liquid
block while surrounding the chemical liquid block.
[0027] A loading/unloading opening for the chemical liquid
container may be formed on a ceiling portion surrounding the
chemical liquid block.
[0028] In accordance with the example embodiments, there is
provided the container arrangement section in which the chemical
liquid containers are arranged, the chemical liquid containers in
the container arrangement section are replaced using the container
transfer device, and the chemical liquid supply pipe is attached
and detached by the attachment/detachment device. Therefore, it is
possible to provide the container arrangement section within the
space partitioned from the external atmosphere and replace the
chemical liquid container without using the hands of the operator.
As a result thereof, it is possible to suppress contaminants such
as particles from being mixed with the chemical liquid container,
and also possible to reduce deterioration of the chemical liquid by
supplying the inert gas into the container arrangement section.
Further, in accordance with the example embodiments, the completely
used chemical liquid container is replaced with a new chemical
liquid container between the container arrangement section and the
loading/unloading port by the device configured to automatically
replace the chemical liquid containers. For this reason, the
container arrangement section can be provided such that the
multiple chemical liquid containers are arranged in parallel with
each other toward the direction orthogonal to the arrangement
direction of the carrier block and the processing block. Therefore,
it is possible to replace the chemical liquid container even if it
is difficult for the operator to perform the operation.
[0029] The foregoing summary is illustrative only and is not
intended to be in any way limiting. In addition to the illustrative
aspects, embodiments, and features described above, further
aspects, embodiments, and features will become apparent by
reference to the drawings and the following detailed
description.
BRIEF DESCRIPTION OF THE DRAWINGS
[0030] In the detailed description that follows, embodiments are
described as illustrations only since various changes and
modifications will become apparent to those skilled in the art from
the following detailed description. The use of the same reference
numbers in different figures indicates similar or identical
items.
[0031] FIG. 1 is a perspective view of external appearance of a
coating and developing apparatus in accordance with an example
embodiment;
[0032] FIG. 2 is a plane view of the coating and developing
apparatus;
[0033] FIG. 3 is a longitudinal side view of the coating and
developing apparatus;
[0034] FIG. 4 is a longitudinal front view of a chemical liquid
block provided in the coating and developing apparatus;
[0035] FIG. 5 is a first explanatory diagram of a container
transfer device provided in the chemical liquid block;
[0036] FIG. 6 is a second explanatory diagram of the container
transfer device;
[0037] FIG. 7 is a first explanatory diagram of a container
mounting module provided in the chemical liquid block;
[0038] FIG. 8 is a second explanatory diagram of the container
mounting module;
[0039] FIG. 9 is an explanatory diagram illustrating a chemical
liquid supply path in a chemical liquid nozzle;
[0040] FIG. 10 is a flowchart of an operation of replacing a
chemical liquid container in the chemical liquid block;
[0041] FIG. 11 is a plane view illustrating another example of the
container transfer device;
[0042] FIG. 12 is a front view illustrating still another example
of the container transfer device;
[0043] FIG. 13 is a schematic diagram illustrating a location where
the chemical liquid block can be arranged in a coating and
developing apparatus;
[0044] FIG. 14 is a perspective view of external appearance
illustrating a second arrangement example of the chemical liquid
block;
[0045] FIG. 15 is a perspective view of external appearance
illustrating a third arrangement example of the chemical liquid
block;
[0046] FIG. 16 is a perspective view of external appearance
illustrating a fourth arrangement example of the chemical liquid
block;
[0047] FIG. 17 is a perspective view of external appearance of a
coating and developing apparatus in accordance with a second
example embodiment;
[0048] FIG. 18 is a plane view of the second coating and developing
apparatus;
[0049] FIG. 19 is a longitudinal side view of the second coating
and developing apparatus;
[0050] FIG. 20 is a side view illustrating a configuration example
of a container transfer device provided in a chemical liquid block
of the second coating and developing apparatus;
[0051] FIG. 21 is a perspective view illustrating another
configuration example of an arm and a tray of a container transfer
device; and
[0052] FIG. 22 is a longitudinal front view of a chemical liquid
block in accordance with a third example embodiment.
DETAILED DESCRIPTION
[0053] In the following detailed description, reference is made to
the accompanying drawings, which form a part of the description. In
the drawings, similar symbols typically identify similar
components, unless context dictates otherwise. Furthermore, unless
otherwise noted, the description of each successive drawing may
reference features from one or more of the previous drawings to
provide clearer context and a more substantive explanation of the
current example embodiment. Still, the example embodiments
described in the detailed description, drawings, and claims are not
meant to be limiting. Other embodiments may be utilized, and other
changes may be made, without departing from the spirit or scope of
the subject matter presented herein. It will be readily understood
that the aspects of the present disclosure, as generally described
herein and illustrated in the drawings, may be arranged,
substituted, combined, separated, and designed in a wide variety of
different configurations, all of which are explicitly contemplated
herein.
[0054] A configuration of a coating and developing apparatus 1
(substrate processing apparatus) to which example embodiments are
applied will be explained with reference to FIG. 1 to FIG. 9. As
depicted in FIG. 1, the coating and developing apparatus 1 of the
present example embodiment includes a carrier block D1, a chemical
liquid block D2, a processing block D3, and an interface block D4
linearly connected to each other in this sequence. The interface
block D4 is further connected to an exposure device D5.
Hereinafter, the arrangement direction of the blocks D1 to D4 will
be referred to as "forward/backward direction" and one end side at
which the carrier block D1 is arranged will be referred to as
"front side".
[0055] The carrier block D1 is configured to load and unload a
wafer W between a carrier C including a FOUP (Front Opening Unified
Pod), which is configured to accommodate multiple wafers W of the
same lot, and the coating and developing apparatus 1. As depicted
in FIG. 2, the carrier block D1 includes a mounting table 21 for
the carrier C, an opening/closing device 22 configured to open and
close a cover of the carrier C, and a transfer arm 23 configured to
unload a wafer W from the carrier C and transfer the wafer W.
[0056] As depicted in FIG. 1 and FIG. 3, in the processing block
D3, first to sixth unit blocks B1 to B6 configured to perform a
liquid process on the wafer W are stacked in sequence from the
bottom. For convenience of explanation, in some cases, a process of
forming an anti-reflection film on the wafer W, a process of
forming a resist film on the wafer W, and a process of forming a
resist pattern on the exposed wafer W may be expressed as "BCT",
"COT", and "DEV", respectively. In the present example embodiment,
two BCT layers B1 and B2, two COT layers B3 and B4, and two DEV
layers B5 and B6 are stacked from the bottom. In the unit blocks of
the same type, the wafers W are transferred and processed at the
same time.
[0057] FIG. 2 illustrates the COT layer B3 (B4) as a representative
of the unit blocks. In the COT layer B3 (B4), a transfer region 31
is formed to be extended from the carrier block D1 toward the
interface block D4, and multiple rack units U are arranged in
parallel with each other in the forward/backward direction at one
side of the transfer region 31 (for example, at the left side when
viewed from the front side). Further, at the other side of the
transfer region 31 (for example, at the right side when viewed from
the front side), a resist film forming module COT and a protective
film forming module ITC as liquid processing modules configured to
supply various kinds of chemical liquids to the surface of a wafer
W being rotated and perform liquid processes on the wafer W are
arranged in parallel with each other in the forward/backward
direction.
[0058] The resist film forming module COT is configured to supply a
resist on the wafer W and form a resist film on the wafer W. The
protective film forming module ITC is configured to supply a preset
processing liquid on the resist film and forms a protective film
for protecting the resist film. Further, each rack unit U includes
a non-illustrated heating module, and the transfer region 31 is
provided with transfer arms F3 and F4 as transfer devices for the
wafer W.
[0059] The other unit blocks B1, B2, B5, and B6 have substantially
the same configuration as the unit blocks B3 and B4 except that
different chemical liquids are supplied to the wafer W. The unit
block B1 (B2) includes an anti-reflective film forming module BCT
as a liquid processing module instead of the resist film forming
module COT or the protective film forming module ITC, and the unit
block B5 (B6) includes a developing module DEV. In FIG. 3, the
transfer arms of the unit blocks B1 to B6 are expressed as F1 to
F6, respectively.
[0060] At the front side in the processing block D3, a tower T1
vertically extended over the unit blocks B1 to B6 and a delivery
arm 32 that is moved up and down to deliver the wafer W between
multiple modules provided in the tower T1 are provided. In the
tower T1, the multiple modules are vertically stacked, and among
the modules, delivery modules TRS provided to correspond to heights
of the respective unit blocks B1 to B6 are used to deliver wafers W
to the transfer arms F1 to F6 in the unit blocks B1 to B6.
[0061] Specific examples of the modules provided in the tower T1
may include the above-described delivery modules TRS used to
deliver the wafer W to the unit blocks B1 to B6, temperature
control modules CPL configured to control temperatures of the
wafers W, buffer modules BU configured to temporarily store
multiple wafers W, and hydrophobic process modules ADH configured
to perform a hydrophobic process on the surfaces of the wafers W.
For simplicity of explanation, illustration of the hydrophobic
process modules ADH, the temperature control modules CPL, and the
buffer modules BU is omitted herein.
[0062] The interface block D4 includes towers T2, T3, and T4
vertically extended over the unit blocks B1 to B6 (FIG. 2 and FIG.
3). In the interface block D4, an interface arm 41 that is moved up
and down to deliver the wafer W between the tower T2 and the tower
T3, an interface arm 42 that is moved up and down to deliver the
wafer W between the tower T2 and the tower T4, and an interface arm
43 that is moved up and down to deliver the wafer W between the
tower T3 and the exposure device D5 are provided.
[0063] In the tower T2, delivery modules TRS, buffer modules BU
configured to temporarily store multiple wafers W before being
exposed, buffer modules BU configured to temporarily store the
multiple wafers W after being exposed, and temperature control
modules CPL configured to control temperatures of the wafers W are
stacked. As is the case of the tower T1, illustration of the buffer
modules BU and the temperature control modules CPL is omitted
herein.
[0064] Further, in the tower T3 provided on the right of the tower
T2 when viewed from the front side, multiple post-exposure cleaning
modules PIR configured to perform a cleaning process on the wafer W
after being exposed are vertically stacked. In the tower T4
provided on the left of the tower T2, multiple back surface
cleaning modules BST configured to perform a back surface cleaning
process on the wafer W before being loaded into the exposure device
D5 are vertically stacked. Illustration of these modules is also
omitted herein.
[0065] The coating and developing apparatus 1 having the
configuration as described above in the present example embodiment
includes the chemical liquid block D2 configured to accommodate
multiple chemical liquid containers 50 in which chemical liquids to
be supplied to the anti-reflective film forming modules BCT, the
resist film forming modules COT, the protective film forming
modules ICT, and the developing modules DEV serving as liquid
processing modules are stored. Hereinafter, the detailed
configuration of the chemical liquid block D2 will be
explained.
[0066] The chemical liquid block D2 in the present example
embodiment is provided within a housing partitioned from the
atmosphere (external atmosphere) of a factory in which the coating
and developing apparatus 1 is provided and from the other blocks D1
and D3. Further, the chemical liquid block D2 is provided along the
arrangement direction of the carrier block D1 and the processing
block D3 such that the front side of the chemical liquid block D2
and the rear side thereof are positioned between the carrier block
D1 and the processing block D3.
[0067] The chemical liquid block D2 includes a tray mounting table
69 on which the chemical liquid container 50 loaded from the
outside is mounted while being accommodated in a tray 51; multiple
container mounting modules 6 constituting a container arrangement
region where the chemical liquid containers 50 are provided to
supply chemical liquids to the respective liquid processing
modules; and a container transfer device 7 configured to transfer
the chemical liquid container 50 between the tray mounting table 69
and each of the container mounting modules 6.
[0068] As depicted in FIG. 4, the tray mounting table 69 is formed
on a side wall surface of the chemical liquid block D2 and provided
to face a container loading/unloading opening 64a configured to be
opened and closed by an opening/closing device 641. Further, the
container loading/unloading opening 64a in the present example
embodiment is formed at a side wall on the right of the chemical
liquid block D2 when viewed from the front side, but the container
loading/unloading opening 64a may also be formed at a side wall on
the left thereof. The tray mounting table 69 may be horizontally
moved between a position where the chemical liquid container 50 is
loaded or unloaded through the container loading/unloading opening
64a by the operator and a position where the chemical liquid
container 50 is delivered to the container transfer device 7.
[0069] Above the tray mounting table 69 moved to the position where
the chemical liquid container 50 is delivered to the container
transfer device 7, a container loading/unloading path 64b for
vertically transferring the chemical liquid container 50 is formed.
An upper end (loading/unloading opening) of the container
loading/unloading path 64b is opened toward a ceiling surface of
the chemical liquid block D2, and this opening can be opened and
closed by the opening/closing device 641. At a ceiling portion of
the factory in which the coating and developing apparatus 1 in the
present example embodiment is installed, there is provided an OHT
(Overhead Hoist Transport) 101 configured to transfer the chemical
liquid container 50 along a rail track. The OHT 101 passes through
the opening of the container loading/unloading path 64b and
delivers the chemical liquid container 50 to the tray mounting
table 69 moved to be under the opening of the container
loading/unloading path 64b by moving a grasping device 102 up and
down.
[0070] The tray mounting table 69, the container loading/unloading
opening 64a, and the container loading/unloading path 64b
constitute a loading/unloading port of the present example
embodiment.
[0071] The chemical liquid container 50 loaded into the chemical
liquid block D2 through the container loading/unloading opening 64a
or the container loading/unloading path 64b is accommodated in the
tray 51. As depicted in FIG. 2 and FIG. 5, the tray 51 is a
container having a hexahedral structure with an open top, and
accommodates the main body of the chemical liquid container 50
which stores the chemical liquid. At a bottom portion within the
tray 51, there is provided a container receiving portion 511
configured to fix the chemical liquid container 50 at preset
position. Further, a non-illustrated grip portion is formed at a
side surface of the tray 51, so that the grasping device 102 of the
OHT 101 can grasp the tray 51 through the grip portion. Further, at
the bottom portion under the tray 51, there is formed a notch 512
through which an arm 722 of the container transfer device 7 to be
described later is inserted (see FIG. 5 and FIG. 7).
[0072] The chemical liquid container 50 is formed into a narrow
neck bottle made of, for example, plastic or glass, and is loaded
into the chemical liquid block D2 while its opening (chemical
liquid suction opening) is sealed by a cover 501 formed of a screw
cover or the like. On an outer surface of the main body of the
chemical liquid container 50, a barcode 502 as identification
information for identifying a kind of a chemical liquid stored in
the chemical liquid container 50 is attached. Further, near the
tray mounting table 69 moved to the position where the chemical
liquid container 50 is delivered to the container transfer device
7, there is provided a barcode reader 81 as an acquisition device
for acquiring information for identifying a chemical liquid. By
reading the barcode 502 with the barcode reader 81, it is possible
to identify a kind of a chemical liquid stored in the loaded
chemical liquid container 50. This barcode 502 may be attached to
the tray 51.
[0073] Herein, a method of acquiring identification information for
identifying a kind of a chemical liquid is not limited to
combination of the barcode 502 and the barcode reader 81. An IC tag
may be attached to the chemical liquid container 50 or the tray 51,
and a communication device configured to acquire identification
information by conducting communication with the IC tag may be
provided near the tray mounting table 69.
[0074] As depicted in FIG. 2 and FIG. 5, the container transfer
device 7 configured to transfer the chemical liquid container 50
has a configuration in which two pair of arms (a first arm 721 and
a second arm 722) configured to hold the chemical liquid container
50 are provided at a main body 71. The first and second arms 721
and 722 are provided on an upper surface side of the main body 71
while being connected to each other, and each of the arms 721 and
722 is extended from the main body 71 and configured to be
extensible and contractible between a position where the chemical
liquid container 50 is delivered to the tray mounting table 69 or
the container mounting module 6 and a position where the chemical
liquid container 50 is transferred on the main body 71 by folding
the arms 721 and 722. Further, at a front end portion and a rear
end portion of the first arm 721 in an extension direction, there
are provided tray guides 723 configured to regulate a position of
holding the tray 51 from the front side and the rear side in order
to suppress the position deviation of the tray 51 during the
transferring thereof.
[0075] The main body 71 is held on a supporting member 74 via a
rotation shaft 73 and configured to be rotated around a vertical
axis. As a result, the extension direction of each of the arms 721
and 722 can be changed between a direction (indicated by a solid
line in FIG. 2) in which the chemical liquid container 50 is
delivered to the tray mounting table 69 and a direction (indicated
by a dashed line in FIG. 2) in which the chemical liquid container
50 is delivered to the respective container mounting modules 6.
[0076] Further, as depicted in FIG. 2 and FIG. 3, the supporting
member 74 configured to hold the main body 71 is supported by two
elevating rails 751 vertically extended, and upper end portions and
lower end portions of the elevating rails 751 are supported by a
moving rail 752 horizontally extended along the vicinity of a
ceiling portion and the vicinity of a bottom portion of the
chemical liquid block D2. Furthermore, since the supporting member
74 is configured to be vertically moved and the elevating rails 751
are configured to be horizontally moved by a non-illustrated
driving device provided at the elevating rails 751 and the moving
rail 752, the main body 71 can be moved to any position on the
inner wall surface of the chemical liquid block D2. A region where
the container transfer device 7 (main body 71) is moved between the
tray mounting table 69 and the respective container mounting
modules 6 becomes a transfer region for the chemical liquid
container 50.
[0077] The container transfer device 7 puts a mounting region for
the tray 51 positioned between the tray guides 723 provided at the
front end and the rear end of the second arm 722 into a space under
the tray 51 through the above-described notch 512, and receives the
chemical liquid container 50 from the tray mounting table 69 or the
container mounting module 6 by raising the second arm 722 (FIG. 5).
Then, by folding the first and second arms 721 and 722, the
chemical liquid container 50 is transferred while the tray 51 is
arranged on the main body 71 (FIG. 6). Further, in the main body
71, there is formed a groove configured to avoid interference with
a lower end portion of a side wall of the tray 51 downwardly
extending from the right and left positions of the notch 512 (see,
for example, a groove 711 depicted in FIG. 12 in accordance with a
modification example of the container transfer device 7).
[0078] At a region facing an inner wall surface of the chemical
liquid block D2 where the container transfer device 7 is vertically
and horizontally moved, there is provided a container rack 60 as a
container arrangement section in which the multiple container
mounting modules 6 are partitioned from each other, and vertically
and horizontally arranged in parallel with each other in a grid
pattern (FIG. 4). In the present example embodiment, the container
rack 60 includes four plates vertically stacked, and on each of the
plates, five container mounting modules 6 are horizontally
arranged. In the container rack 60, except a position where a wafer
transfer path 65 to be described later is formed, a total of 19
container mounting modules 6 are provided. As depicted in FIG. 2,
the container rack 60 is arranged toward a direction orthogonal to
the arrangement direction (forward/backward direction) of the
carrier block D1 and the processing block D3 such that the
container mounting modules 6 on each plate are arranged side by
side when viewed from the front side.
[0079] In the coating and developing apparatus 1, various kinds of
resist liquids having different concentrations or components are
separately used, and various kinds of chemical liquids, such as a
developing liquid used for developing a resist film after the
exposure, a thinner used for making it easy to spread a resist
liquid on the surface of a wafer, and a raw material liquid used
for forming an anti-reflective film or a protective film on an
upper surface or a lower surface of the resist film, are also used.
Each of the container mounting modules 6 in the container rack 60
is an arrangement position for each of the chemical liquid
containers 50 in which these various chemical liquids are stored.
Further, when any one of the chemical liquid containers 50 runs out
of its chemical liquid, in order to continuously supply the
corresponding chemical liquid from another chemical liquid
container 50, the chemical liquid container 50 which stores the
corresponding chemical liquid of the same kind is arranged in one
of the multiple container mounting modules 6, and the chemical
liquid container 50 may be replaced to supply the chemical
liquid.
[0080] As depicted in FIG. 7 and FIG. 8, each container mounting
module 6 has an open front surface facing the container transfer
device 7 and is provided within a partitioned rack, and includes a
suction nozzle 611 constituting a base end side of a chemical
liquid supply path to the liquid processing module; a nozzle
attachment/detachment device 61 configured to attach and detach the
suction nozzle 611 with respect to the chemical liquid container
50; a cover opening/closing device 62 configured to open and close
the cover 501 that seals the chemical liquid container 50; and an
inert gas supply device 63 configured to supply an inert gas into a
space within the container mounting module 6.
[0081] The nozzle attachment/detachment device 61 includes a
supporting arm 612 horizontally extended and an elevating device
613. The supporting arm 612 is configured to support an upper end
of the suction nozzle 611 which is downwardly extended. The suction
nozzle 611 is made of a resin or a metal, and is formed into a
narrow tube of which a lower end is open. The elevating device 613
is vertically extensible and contractible, and is configured to
support a base end of the supporting arm 612 opposite to a portion
where the suction nozzle 611 is supported.
[0082] The suction nozzle 611 has a length that enables the lower
end having an opening to approach the vicinity of the bottom
surface of the chemical liquid container 50 when the suction nozzle
611 is inserted into the chemical liquid container 50, and is
configured as a straw capable of sucking almost all of a chemical
liquid stored within the chemical liquid container 50. When the
suction nozzle 611 is inserted into the chemical liquid container
50, the suction nozzle 611 closes an opening of the chemical liquid
container 50 by pressing the opening from an upper surface side,
and is held by the supporting arm 612 via a holding member 614 made
of, for example, rubber. The elevating device 613 is configured to
move the supporting arm 612 up and down, so that the suction nozzle
611 is moved between a withdrawal position (FIG. 7) where the
entire suction nozzle 611 is retreated to an upper side of the
opening of the chemical liquid container 50 and an insertion
position (FIG. 8) where the suction nozzle 611 is inserted into the
chemical liquid container 50.
[0083] The cover opening/closing device 62 includes an
opening/closing device 621 configured to open and close the cover
501; a supporting arm 622 configured to hold the opening/closing
device 621; and an elevating device 623 configured to move the
supporting arm 622 up and down.
[0084] The opening/closing device 621 is a member having an
opening, and an outer peripheral surface of the cover 501, which
seals the chemical liquid container 50, is closely inserted and
fitted into the opening of the opening/closing device 621. Further,
the opening/closing device 621 is held by a front end of the
supporting arm 622 with the opening thereof downward. The
opening/closing device 621 is configured to be rotated around a
vertical axis by a non-illustrated driving device provided within
the supporting arm 622 in a direction in which the cover 501 is
opened and closed.
[0085] The supporting arm 622 in the present example embodiment
includes a base-side arm supported by the elevating device 623 and
a front end-side arm configured to hold the opening/closing device
621, which are connected to each other via a rotation shaft
vertically extended. Thus, the opening/closing device 621 can be
moved between an opening/closing position (FIG. 7) where the
opening/closing device 621 provided to face the upper end of the
chemical liquid container 50 opens and closes the cover 501 and a
retreat position (FIG. 8) where the opening/closing device 621 is
retreated to a side from the opening/closing position in order to
avoid interference with an operation of attaching and detaching the
suction nozzle 611 by the nozzle attachment/detachment device 61.
Further, when moved to the retreat position, the opening/closing
device 621 carries the separated cover 501.
[0086] Further, in the cover opening/closing device 62 in the
present example embodiment, the elevating device 623 is provided
at, for example, the surface of a partition wall that partitions
the adjacent container mounting modules 6. Further, the elevating
device 623 is configured to downwardly move the opening/closing
device 621 located to the opening/closing position in order for the
cover 501 to be inserted and fitted into the opening/closing device
621 or is configured to move the opening/closing device 621 up and
down according to the movement of the cover 501 when the cover 501
is opened and closed.
[0087] The inert gas supply device 63 includes an inert gas supply
line 631 of which an opening faces the region where the cover 501
is opened and closed by the opening/closing device 621; a filter
632 provided on the inert gas supply line 631 and configured to
remove particles in an inert gas to be supplied to the container
mounting module 6; and an inert gas supply source 633 provided at a
base end of the inert gas supply line 631 and configured to supply
an inert gas such as a nitrogen gas or an argon gas.
[0088] The inert gas supply line 631 supplies an inert gas toward
the opening of the chemical liquid container 50 in order to
suppress air from being introduced into the opened chemical liquid
container 50 during the opening and closing of the cover 501. As
depicted in FIG. 8, if the opening of the chemical liquid container
50 is closed by the holding member 614 when the suction nozzle 611
is inserted into the chemical liquid container 50, the nozzle
attachment/detachment device 61 may be provided with a device
configured to supply an inert gas into the chemical liquid
container 50 in order for the chemical liquid container 50 not to
have a vacuum atmosphere therein due to the suction of the chemical
liquid.
[0089] Further, if a pressure within the chemical liquid container
50 is maintained by introducing an ambient gas through the opening
thereof without closing the opening of the chemical liquid
container 50, after allowing the inside of the container mounting
module 6 to be sealable by providing an opening/closing door
(shutter) at a front end of the container mounting module 6, the
chemical liquid may be sucked while supplying an inert gas into the
partitioned region.
[0090] The filter 632 includes a gas filter such as a HEPA (High
Efficiency Particulate Air) filter within a filter cartridge.
Further, the inert gas supply source 633 includes a gas reservoir
in which an inert gas is stored; and a flow rate controller, so
that the inert gas supply source 633 can control supply of the
inert gas or a flow rate of the inert gas. By way of example, the
inert gas supply source 633 may be a common source for multiple
inert gas supply lines 631 respectively supplying the inert gas to
the container mounting modules 6.
[0091] Herein, it is not required to provide the inert gas supply
device 63 with respect to all of the container mounting modules 6.
By way of example, the inert gas supply device 63 may not be
provided in the container mounting module 6 where the chemical
liquid container 50, which stores a chemical liquid having less
deterioration caused by being contacted with air and a smaller
effect caused by supplying the inert gas, is arranged.
[0092] FIG. 9 illustrates chemical liquid supply paths 338 from the
chemical liquid containers 50 provided with the suction nozzles 611
to chemical liquid nozzles 336 of each of liquid processing modules
33. Each of the chemical liquids is sucked from the chemical liquid
container 50 arranged in the container mounting module 6 by a
chemical liquid pump 681 provided at the chemical liquid supply
path 338, and then, supplied to the chemical liquid nozzle 336. At
a downstream side of the chemical liquid pump 681, an
opening/closing valve 682 is provided, and by driving the
opening/closing valve 682, the supply of the chemical liquid to
each chemical liquid nozzle 336 is controlled. The chemical liquid
pumps 681 and the opening/closing valves 682 provided at the
chemical liquid supply paths 338 are arranged together in a pump
arrangement section 68 depicted in FIG. 3 and FIG. 4, and the
chemical liquids sucked from the chemical liquid containers 50 are
supplied toward the liquid processing modules 33 in the respective
layers B1 to B6 by the chemical liquid pumps 681 arranged in the
pump arrangement section 68.
[0093] An overview of the liquid processing module 33 will be
explained. The nozzle arm 337 holds one or more chemical liquid
nozzles 336 in order to supply one or more kinds of chemical
liquids depending on a liquid process performed by the liquid
processing module 33. Further, the chemical liquids are supplied in
sequence in a preset amount from the chemical liquid nozzles 336 to
the surface of each wafer W held on a spin chuck 331 being rotated
around a vertical axis by a rotation driving device 332, so that a
liquid process can be performed on each wafer W. The chemical
liquids scattered from the wafer W being rotated are received by a
cup body 333 provided around the spin chuck 331 and drained out to
the outside through a liquid drain opening 335. Further, an air
flow introduced into the cup body 333 is discharged through an
exhaust opening 334.
[0094] Herein, the chemical liquids from the chemical liquid
containers 50 accommodated in the chemical liquid block D2 may be
supplied to, for example, a hydrophobic processing gas generation
device configured to supply a hydrophobic processing gas to the
hydrophobic process modules ADH that performs a hydrophobic process
on the surface of the wafer W as well as the above-described liquid
processing modules 33.
[0095] An amount of the chemical liquid within each of the chemical
liquid containers 50 mounted on the container mounting modules 6 is
monitored by, for example, a non-illustrated liquid level meter
provided within the container mounting module 6 or a
non-illustrated flowmeter provided at the chemical liquid supply
path 338. In the example embodiment, if an amount of the chemical
liquid within the chemical liquid container 50 is lower than a
preset level of a liquid surface, or if a preset flow rate is not
detected even when the opening/closing valve 682 is connected to
the chemical liquid nozzle 336 by driving the chemical liquid pump
681, the chemical liquid container 50 is determined to be
replaced.
[0096] Further, at the ceiling portion of the coating and
developing apparatus 1, there is provided a FFU (Fan Filter Unit)
67, and a downward flow of clean air can be formed within each of
the blocks D1 to D4 of the coating and developing apparatus 1.
Further, as depicted in FIG. 3, the FFU 67 forms the downward flow
of the clean air within the housing constituting the chemical
liquid block D2. By opening and closing the cover 501 and by
attaching and detaching the suction nozzle 611 under this
atmosphere, it is possible to suppress the chemical liquid from
being mixed with contaminants such as particles. From this point of
view, the FFU 67 corresponds to a clean gas supply device of the
present example embodiment.
[0097] As described herein, the chemical liquid block D2 is
arranged between the carrier block D1 and the processing block D3.
For this reason, the wafer W unloaded from the carrier block D1 or
the wafer W processed in the processing block D3 is transferred to
the blocks D3 and D1 as transfer target positions through the
chemical liquid block D2.
[0098] Within the chemical liquid block D2 where the covers 501 of
the chemical liquid containers 50 which store various kinds of
chemical liquids are opened and closed, the chemical liquids or
their solvents can be volatilized. Thus, it is not desirable to
expose the wafer W before or after being processed under an
atmosphere in which multiple kinds of chemical liquids are likely
to float. Further, since a transfer device configured to transfer
the wafers W is frequently moved between the blocks D3 and D1
together with the container transfer device 7, particles may be
generated and the inside of the chemical liquid block D2 may be
contaminated, which is not desirable.
[0099] Therefore, as depicted in FIG. 3 and FIG. 4, in the chemical
liquid block D2 of the present example embodiment, a square
tube-shaped wafer transfer path 65 connecting the carrier block D1
to the processing block D3 is provided to pass through the chemical
liquid block D2 in a horizontal direction. In the wafer transfer
path 65, there is formed a space surrounded by a square tube-shaped
cylindrical member, which is partitioned from the atmosphere within
the chemical liquid block D2 and from the atmospheres of the other
blocks D1 and D3. Within the wafer transfer path 65, there is
provided a shuttle arm 66, which transfers the wafer W between the
both blocks D1 and D3. The shuttle arm 66 transfers the wafer W
between the transfer arm 23 of the carrier block D1 and the
delivery modules TRS0 provided in the tower T1 within the
processing block D3.
[0100] The wafer transfer path 65 is provided to be horizontally
extended from the delivery module TRS0 toward the carrier block D1
at the front side. For this reason, at a position where the wafer
transfer path 65 passes through the container rack 60, the
container mounting module 6 is not provided (FIG. 4).
[0101] Further, in order to avoid interference with the elevating
rails 751 horizontally moved along the extension direction of the
moving rail 752, a notch 651 is provided at the wafer transfer path
65 to allow the elevating rails 751 to pass therethrough (FIG. 3).
The notch 651 has a small width such that the elevating rails 751
are allowed to be passed through and contamination with the
above-described chemical liquid components or particles generated
from the shuttle arm 66 by mixing the atmospheres within the wafer
transfer path 65 and the chemical block D2 is not a problem.
Further, in order for these atmospheres not to be mixed with each
other, an air curtain may be formed by allowing clean air to flow
from one side of a notch surface of the wafer transfer path 65
where the notch 651 is provided toward the other side.
[0102] The coating and developing apparatus 1 having the
above-described configuration is connected with a controller 8 as
depicted in FIG. 2, FIG. 5, FIG. 7, and FIG. 9. The controller 8
may be formed of a computer including a CPU and a storage device,
and the storage device stores a program including a process
(instruction) group for an operation of the coating and developing
apparatus 1, i.e., transfer of the wafer W or processes on the
wafer W in each of the blocks D1 to D4, transfer of the chemical
liquid container 50 within the chemical liquid block D2, or
transfer of the chemical liquid container 50 toward the correct
container mounting module 6 and replacement of the completely used
chemical liquid container 50 based on the information read from the
barcode 502 by the barcode reader 81 when the chemical liquid
container 50 is transferred or the chemical liquid container 50 of
the container mounting module 6 is replaced within the chemical
liquid block D2. This program may be stored in a storage medium,
such as a hard disc, a compact disc, a magneto optical disc, and a
memory card, and is installed in the computer.
[0103] In particular, regarding the transfer of the chemical liquid
container 50 in the chemical liquid block D2, information for
identifying multiple container mounting modules 6 (mounting
positions of the chemical liquid containers 50) provided in the
container rack 60 and information on the kinds of chemical liquids
stored in the chemical liquid containers 50 to be arranged in the
respective container mounting modules 6 are matched with each other
in advance to be stored in the controller 8. Further, a matching
relation between the information read from the barcode 502 by the
barcode reader 81 and the information on the kinds of chemical
liquids is also stored. Based on the these information, when the
chemical liquid container 50 in the container mounting module 6
needs to be replaced, another chemical liquid container 50 that
stores which one of the chemical liquids is determined to be
transferred to the corresponding container mounting module 6. As a
result, a transfer target position for the chemical liquid
container 50 transferred by the container transfer device 7 can be
specified. From this point of view, the controller 8 may constitute
a transfer control controller that controls a transfer target
position or whether or not to transfer the chemical liquid
container 50 by the container transfer device 7.
[0104] Hereinafter, an operation of the coating and developing
apparatus 1 in accordance with the present example embodiment will
be explained. Further, for the convenience of explanation, in some
cases, explanation of some processes such as a process in a
non-illustrated module may be omitted.
[0105] The wafers W are unloaded one by one from the carrier C, and
then, delivered by the transfer arm 23 to the shuttle arm 66 within
the wafer transfer path 65. After the wafer W is transferred to the
inside of the wafer transfer path 65, the wafer W is mounted on the
delivery module TRS0. The wafer W on the delivery module TRS0 is
delivered to the BCT layer B1 or B2 through the delivery module
TRS1 or TRS2, respectively, by the delivery arm 32.
[0106] The wafer W loaded into the BCT layer B1 or B2 is processed
while being transferred in sequence of the anti-reflective film
forming module, the heating module and the TRS1 or TRS2,
respectively, and then transferred to the COT layer B3 or B4
through the delivery module TRS3 or TRS4, respectively, by the
delivery arm 32.
[0107] The wafer W loaded into the COT layer B3 or B4 is processed
while being transferred in sequence of the resist film forming
module, the heating module, the protective film forming module
(ITC), the heating module, and the delivery module TRS of the tower
T2.
[0108] The wafer W loaded into the delivery module TRS of the tower
T2 is transferred into a non-illustrated buffer module SBU. Then,
after, the wafer W is loaded into the back surface cleaning module
BST of the tower T4 by the interface arm 42, a back surface
cleaning process is performed on the wafer W. The wafer W on which
the back surface cleaning process is performed is loaded into the
exposure device D5 through the temperature control module CPL (not
illustrated) of the tower T2 by the respective interface arms 42,
41, and 43.
[0109] The wafer W after being exposed is loaded from the delivery
module TRS of the tower T2 to the post-exposure cleaning modules
PIR of the tower T3 by the interface arms 43 and 41. After being
cleaned, the wafer W is delivered to the DEV layer B5 or B6 through
the delivery module TRS5 or TRS6 of the tower T2.
[0110] The wafer W loaded into the DEV layer B5 or B6 is processed
while being transferred in sequence of the heating module, the
developing module, the heating module, and the delivery module TRS
of the tower T1. After the wafer W is moved to and mounted on the
delivery module TRS0 for the delivery with respect to the carrier
block D1, the wafer W is transferred within the wafer transfer path
65 by the shuttle arm 66 and returned back to the carrier C by the
transfer arm 23.
[0111] While the operations of transferring and processing the
wafers W are performed, the operation of loading and unloading the
chemical liquid container 50 or the operation of replacing the
chemical liquid container 50 in the container mounting module 6 is
performed within the chemical liquid block D2. Hereinafter, these
operations will be explained with reference to the flowchart of
FIG. 10.
[0112] As depicted in FIG. 4, the chemical liquid container 50 are
arranged in each of the container mounting modules 6 of the
container rack 60, and the chemical liquid container 50 connected
to each of the liquid processing modules 33 supplies the chemical
liquid according to a status of the liquid process (Start). Herein,
a process of monitoring a liquid surface level of the chemical
liquid in the chemical liquid container 50 within each of the
container mounting modules 6 and detecting whether or not there is
a completely used chemical liquid container 50 (block S101) is
carried out, and if there is no completely used chemical liquid
container 50, the monitoring process is continuously performed
(block S101; NO).
[0113] If a completely used chemical liquid container 50 is
detected (block S101; YES), information that the chemical liquid
container needs to be replaced and information on the kind of the
chemical liquid is outputted (block S102). By way of example, the
outputted information is transmitted to the operator as being
displayed on a non-illustrated panel display provided at an outer
wall surface of the coating and developing apparatus 1, or the
information that the chemical liquid container needs to be replaced
and the information on the kind of the chemical liquid is outputted
to a host computer that manages the apparatuses in the factory.
[0114] As a result, a new chemical liquid container 50 is loaded
into the chemical liquid block D2 through the container
loading/unloading opening 64a by the operator, or a new chemical
liquid container 50 is loaded through the container
loading/unloading path 64b by the OHT 101 instructed by the host
computer.
[0115] During this period, the coating and developing apparatus 1
waits for the new chemical liquid container 50 (block S103) and
maintains a standby state until the loading of the new chemical
liquid container 50 is detected (block S103; NO).
[0116] If the loading of the new chemical liquid container 50 is
detected (block S103; YES), the barcode 502 of the chemical liquid
container 50 is read by the barcode reader 81, a kind of the
chemical liquid stored in the chemical liquid container 50 is
identified, and the loading of the correct chemical liquid
container 50 is confirmed (block S104). Then, the kind of the
chemical liquid set for the container mounting module 6 where the
completely used chemical liquid container 50 is arranged is
compared with the kind of the chemical liquid stored in the new
chemical liquid container 50.
[0117] As a result, if the chemical liquid container 50 storing the
correct chemical liquid is not loaded (block S105; NO), an error
message of the kind of the chemical liquid is transmitted to the
panel display or the host computer, and the completely used
chemical liquid container 50 still waits for being replaced (block
S106). If a new chemical liquid container 50 is loaded (block S103;
YES), a kind of the chemical liquid stored in the new chemical
liquid container 50 is repeatedly identified (block S104).
[0118] If the chemical liquid container 50 storing the correct
chemical liquid is loaded (block S105; YES), the container transfer
device 7 receives the chemical liquid container 50 from the tray
mounting table 69 and transfers the chemical liquid container 50
toward the container mounting module 6 where the replacement target
is arranged (block S107). In this case, the container transfer
device 7 is moved toward the container mounting module 6 for the
replacement target while avoiding interference with the wafer
transfer path 65 depicted in FIG. 3 and FIG. 4.
[0119] In the container mounting module 6 for the replacement
target, the suction nozzle 611 is separated from the completely
used chemical liquid container 50, and the corresponding chemical
liquid container 50 is in a standby state while being assembled
with the cover 501 by the cover opening/closing device 62 (FIG. 7).
The container transfer device 7 moved to the container mounting
module 6 controls the first and second arms 721 and 722, which do
not hold the chemical liquid container 50, to face the
corresponding container mounting module 6 and receive the
completely used chemical liquid container 50 from the container
mounting module 6. Then, the main body 71 is rotated, the first and
second arms 721 and 722, which hold the newly loaded chemical
liquid container 50, are arranged to face the container mounting
module 6, and the new chemical liquid container 50 is delivered to
the container mounting module 6. In the container mounting module
6, the cover 501 is separated by the cover opening/closing device
62 and moved to the retreat position, and then, the suction nozzle
611 is inserted. As such, the replacement of the chemical liquid
container 50 is completed (block S108, FIG. 8).
[0120] Then, the completely used chemical liquid container 50 is
transferred to the tray mounting table 69 by the container transfer
device 7 and waits for being unloaded (block S109), and the
corresponding chemical liquid container 50 is unloaded to the
outside by the operator or the OHT 101.
[0121] If the completely used chemical liquid container 50 is
replaced with the new chemical liquid container 50 through the
above-described operations, whether or not there are any other
chemical liquid containers 50, which is completely used, is
continuously monitored (block S101).
[0122] The coating and developing apparatus 1 in accordance with
the present example embodiment has the following effects. The
container rack 60 (container mounting section) includes multiple
container mounting modules 6 where the chemical liquid containers
50 are arranged, the chemical liquid container 50 in the container
rack 60 is replaced using the container transfer device 7. Further,
the operation of attaching and detaching the suction nozzle 611 is
performed by the nozzle attachment/detachment device 61 in each
container mounting module 6. Therefore, it is possible to provide
the container rack 60 within the chemical liquid block D2
partitioned from the external atmosphere and replace the chemical
liquid container 50 without using the operator's hands. Further, a
used chemical liquid container 50 is replaced with a new chemical
liquid container 50 between the container rack 60 (container
arrangement section) and the tray mounting table 69
(loading/unloading port) using the container transfer device 7
configured to automatically replace the chemical liquid containers.
For this reason, the plates of the container rack 60 are arranged
such that the multiple chemical liquid containers 50 are arranged
in parallel with each other toward the direction orthogonal to the
arrangement direction of the carrier block D1 and the processing
block D3 arranged in a row. Accordingly, it is possible to replace
the chemical liquid container 50 even if it is difficult to perform
the operation with the operator's hands. As a result thereof, it is
possible to suppress contaminants such as particles from being
mixed into the chemical liquid container 50, and also possible to
reduce deterioration of the chemical liquid by supplying the inert
gas into the container mounting module 6.
[0123] Further, the container rack 60 or the container transfer
device 7 may be arranged at a portion where the operator is
difficult to be entered, so that it is possible to suppress the
increase in a footprint of the coating and developing apparatus,
which caused by providing the chemical liquid block D2. In this
case, as a maintenance of the container mounting modules 6 or the
container transfer device 7, the chemical liquid blocks D2 may be
unloaded toward any one direction of the right and left directions
when viewed from the front side, or the carrier block D1 or the
processing block D3 may be separated from the chemical liquid block
D2.
[0124] The configuration of the container transfer device 7
configured to transfer the chemical liquid container 50 is not
limited to the example illustrated in FIG. 2 and the like. By way
of example, FIG. 11 and FIG. 12 illustrate other configuration
examples. In these examples, components having the same functions
as those of the above-described container transfer device 7 will be
assigned the same reference numerals as assigned in the
above-explained drawings (hereinafter, applied to the following
coating and developing apparatuses 1a to 1d in the same
manner).
[0125] In a container transfer device 7a depicted in FIG. 11, the
main body 71 is configured to be horizontally moved along the
extension direction of the moving rail 752, and the first and
second arms 721 and 722 of each pair are configured to be
extensible and contractible toward a direction intersecting with a
movement direction of the main body 71, i.e., toward an arrangement
direction of the container rack 60 (container mounting module 6)
(see FIG. 2 and FIG. 3). Since the main body 71 is not rotated, a
space required for moving the container transfer device 7a becomes
small, so that an installation space for the chemical liquid block
D2 can be small. In the case of using this container transfer
device 7a, instead of providing the tray mounting table 69 at a
side of the container loading/unloading opening 64a or under the
container loading/unloading path 64b, the container transfer device
7a may be moved to the corresponding position, and the chemical
liquid container 50 may be directly loaded and unloaded with
respect to the container transfer device 7a.
[0126] Further, FIG. 12 illustrates a container transfer device 7b
in which the chemical liquid containers 50 are vertically arranged
in parallel to each other. In the present example, the first and
second arms 721 and 722 are arranged in each of transfer racks 71a
vertically stacked. Further, the transfer racks 71a are rotated as
a whole around a rotation shaft 73 to face the tray mounting table
69 or the respective container mounting modules 6. Then, while the
transfer racks 71a are moved up and down, the chemical liquid
container 50 may be replaced. Even in this example, the rotation
radius of the transfer racks 71a becomes small, so that an
installation space for the chemical liquid block D2 can be
small.
[0127] Hereinafter, a variation in an arrangement position of the
chemical liquid block D2 will be explained. FIG. 13 illustrates
arrangement positions of chemical liquid blocks D2, D2a to D2e
indicated as hatched with diagonal lines.
[0128] Since the wafer transfer path 65 is provided, if the wafer W
is transferred through a space partitioned from the atmosphere
within the chemical liquid block D2, the chemical liquid blocks D2a
to D2c may be arranged between an arrangement region for the
delivery arm 32 or the tower T1 in the processing block D3 and the
region where the unit blocks B1 to B6 are stacked (chemical liquid
block D2a in FIG. 13), between the processing block D3 and the
interface block D4 (chemical liquid block D2b in FIG. 13), and
between the interface block D4 and the exposure device D5 (chemical
liquid block D2c in FIG. 13), in addition to the examples
illustrated in FIG. 3 and FIG. 4. By way of example, FIG. 14
illustrates an example where the chemical liquid block D2a is
arranged between the processing block D3 and the interface block
D4. In this case, the wafer transfer path 65 and the shuttle arm 66
are provided such that the wafer W can be transferred at the
delivery position between the delivery module TRS of the tower T2
provided in the interface block D4 and the unit blocks B1 to B6 of
the processing block D3.
[0129] Further, as depicted in FIG. 15, in a coating and developing
apparatus 1b, the chemical liquid block D2d may be provided above
the mounting table 21 for the carriers C at the front side of the
carrier block D1. Besides, as depicted in FIG. 16, the chemical
liquid blocks D2e may be provided on the both sides of a main body
(carrier block D1 in the example of FIG. 16) of a coating and
developing apparatus 1c. Instead of providing the chemical liquid
blocks D2e on the both sides of the main body of the coating and
developing apparatus 1c as shown in the example of FIG. 16, the
chemical liquid blocks D2e may be arranged on any one side thereof
(see FIG. 13).
[0130] Hereinafter, a configuration of a coating and developing
apparatus 1d in accordance with a second example embodiment will be
explained with reference to FIG. 17 to FIG. 20. The coating and
developing apparatus 1d in accordance with the second example
embodiment is different from the coating and developing apparatus 1
of the first example embodiment, in which the container arrangement
section is formed of the container rack 60 including the container
mounting modules 6 vertically stacked, in that the container
arrangement section is formed by horizontally arranging multiple
container mounting modules 6 as arrangement regions where the
chemical liquid containers 50 are arranged.
[0131] As depicted in FIG. 17 and FIG. 19, a chemical liquid block
D2f of the second example embodiment is arranged under the region
where the unit blocks B1 to B6 are stacked within the processing
block D3, and is provided within a housing partitioned from the
external atmosphere and the other blocks D1, D3, and D4. Each of
the container mounting modules 6 has the same configuration as
explained in the example with reference to FIG. 7 and FIG. 8, and,
thus, redundant explanation thereof will be omitted.
[0132] As depicted in FIG. 18 and FIG. 19, in the present example
embodiment, five container mounting modules 6 (arrangement regions)
are horizontally arranged in a row, and four rows are arranged as
such. Thus, the container arrangement section is configured to
accommodate a total of 20 chemical liquid containers 50. As
depicted in FIG. 18, the rows of the container mounting modules 6
are arranged at intervals for moving the container transfer device
7c, and between these rows, a driving rail 76 forming a moving
route of the container transfer device 7c is arranged in a U
shape.
[0133] As depicted in FIG. 20, the container transfer device 7c has
a configuration in which the above-described main body 71, the
first and second arms 721 and 722, and the rotation shaft 73 are
arranged on a frame body 771 including guide wheels 773 guided by
the driving rail 76 like, for example, a straddle-type monorail.
Further, container transfer device 7c is moved along a bottom
surface of a chemical liquid block D2f through driving wheels 772.
From a ceiling portion of the chemical liquid block D2f, for
example, the clean air from the FFU 67 through a duct is supplied,
so that a downward flow of the clean air is formed within a space
of the chemical liquid block D2f.
[0134] In the coating and developing apparatus 1d of the present
example embodiment, the operator may open the opening/closing
device 641 depicted in FIG. 18 and mount the chemical liquid
container 50 on the tray mounting table 69. Alternatively, the tray
mounting table 69 may be moved to the outside of the coating and
developing apparatus 1d through the container loading/unloading
opening 64a with the opening/closing device 641 opened, and then,
the chemical liquid container 50 may be mounted on the tray
mounting table 69 from the OHT 101 and may be introduced into the
chemical liquid block D2f.
[0135] Further, the chemical liquid block D2f may be provided on an
upper end of the unit blocks B1 to B6 instead of providing the
chemical liquid block D2f under the unit blocks B1 to B6 as
depicted in FIG. 17 and FIG. 19. In this case, there is formed an
opening which can be opened and closed by the opening/closing
device 641 on the ceiling surface of the coating and developing
apparatus 1d, and the chemical liquid container 50 may be loaded
and unloaded through this opening by the OHT 101.
[0136] Even in the coating and developing apparatus 1d of the
present example embodiment, it is possible to provide the container
mounting module 6 within the chemical liquid block D2 partitioned
from the external atmosphere and replace the chemical liquid
container 50 without using the operator's hands. As a result, it is
possible to replace the chemical liquid container 50 under the
clean atmosphere and reduce contamination of the chemical liquid.
Further, it is also possible to reduce deterioration of the
chemical liquid by supplying the inert gas into the container
mounting module 6.
[0137] Herein, a device of attaching and detaching the base end
side of the chemical liquid supply path 338 with respect to the
chemical liquid container 50 is not limited to the example of the
nozzle attachment/detachment device 61 for the suction nozzle 611
as depicted in FIG. 7 and FIG. 8. By way of example, instead of the
cover 501, a cover, which is formed of a rubber member and pushed
into the opening of the chemical liquid container 50, may be
connected to the base end side of the chemical liquid supply path
338. After the cover 501 is fitted into the chemical liquid
container 50, the chemical liquid container 50 is reversed up and
down. As a result, the chemical liquid can be supplied. In this
case, the device of attaching and detaching the cover connected to
the chemical liquid supply path 338 may serve as the
above-described attachment/detachment device.
[0138] Further, instead of providing the cover opening/closing
device 62 in each container mounting module 6, for example, a
common cover opening/closing device 62 may be provided at a
delivery position for the chemical liquid container 50 between the
cover opening/closing device 62 and the container transfer device
7. After the cover 501 is opened here, the chemical liquid
container 50 in an open state may be transferred to each container
mounting module 6. The cover 501 separated from the chemical liquid
container 50 may be collected into, for example, a common waste box
and may be separately discarded. Furthermore, the completely used
chemical liquid container 50 may be unloaded as being separated
from the cover 501. In the present example embodiment, the chemical
liquid container 50 is transferred as being separated from the
cover 501, and, thus, the whole space within the chemical liquid
block D2 may become under an inert gas atmosphere in order to
suppress deterioration of the chemical liquid.
[0139] Herein, the ambient gas is introduced through the opening of
the chemical liquid container 50 as described above. Therefore, the
configuration in which the opening/closing door (shutter) is
provided at the container mounting module 6 is not limited to the
case where the inert gas is supplied into a region of the container
mounting module 6. Even if the inert gas is not supplied, for
example, the opening/closing door is usually closed and the
opening/closing door is opened only when the chemical liquid
container 50 is replaced. Therefore, it is possible to suppress
introduction of particles from a space where the container transfer
device 7 is moved. As a result, a chemical liquid can be supplied
within a clean space.
[0140] Further, it is not required to necessarily provide the cover
opening/closing device 62 in the container mounting module 6. By
way of example, if a vial of which an opening is covered with a
rubber sheet is used as the chemical liquid container 50, the
suction nozzle 611 may be inserted into the chemical liquid
container 50 by piercing the rubber sheet instead of separating the
cover 501 with the cover opening/closing device 62.
[0141] Furthermore, if the container rack 60 is provided, in the
container mounting section (row of the container mounting modules 6
in FIG. 18 or the container rack 60 in FIG. 4), it is not required
to necessarily provide a partition configured to partition adjacent
container mounting modules 6, and the chemical liquid container 50
may be arranged on a preset position (arrangement region) of a
horizontally long common plate or table. In this case, the nozzle
attachment/detachment device 61 or the cover opening/closing device
62 may be configured to be moved between multiple chemical liquid
containers 50, so that the nozzle attachment/detachment device 61
or the cover opening/closing device 62 may be shared. Further, in
this case, a mounting table, on which a base end of the chemical
liquid supply path 338 or the cover 501 is mounted, may be provided
near the arrangement region of each chemical liquid container
50.
[0142] Besides, a timing for providing the suction nozzle 611 or
the chemical liquid supply path 338 to the chemical liquid
container 50 is not limited to a timing after the chemical liquid
container 50 is mounted on the container mounting module 6. After
the chemical liquid container 50 is transferred into a region of
the container mounting module 6, while the chemical liquid
container 50 is held by the container transfer device 7, the cover
501 may be separated and the suction nozzle 611 and the like may be
provided. Thereafter, the chemical liquid container 50 may be
mounted on the container mounting module 6.
[0143] FIG. 21 illustrates another configuration example of arms
722a and a tray 51a of the container transfer device 7 (7a to 7c).
In the present example, on a top surface of the tray 51a, there is
provided a flange 513 horizontally protruded in all directions and
configured to be grasped by the grasping device 102 of the OHT 101.
At each side of the flange 513, through holes 514 penetrating
through the flange 513 are formed. Further, the two straight
rod-shaped arms 722a provided at the container transfer device 7
(7a to 7c) and connected to each other at a base end side are
inserted into these through holes 514 to raise the tray 51a. Thus,
the chemical liquid container 50 accommodated within the tray 51a
can be transferred.
[0144] Further, since a total of eight through holes 514 are formed
at the sides of the flange 513, the arms 722a can be inserted into
the tray 51a in any direction. As a result thereof, when the tray
51a is loaded into the chemical liquid block D2, even if a
direction of the tray 51a is not matched with a preset direction,
the tray 51a can be delivered to the container transfer device 7
(7a to 7c).
[0145] FIG. 22 illustrates a longitudinal front view of a chemical
liquid block in accordance with a third example embodiment. In a
chemical liquid block D2g of the present example embodiment, the
container arrangement section has a configuration in which a
transfer belt 601 provided along the right and left inner wall
surfaces, the ceiling surface, and the bottom surface thereof holds
the container mounting module 6. Further, the transfer belt 601 is
driven by a non-illustrated driving device and each container
mounting module 6 is moved to the delivery position with respect to
the tray mounting table 69. Then, the chemical liquid container 50
is replaced by a container transfer device 7c.
[0146] Each of the container mounting modules 6 is connected to the
chemical liquid pump 681 via a collective line 602 collecting the
chemical liquid supply paths 338 formed of flexible line members
made of a resin. In the present example embodiment, a driving range
where the collective line 602 can be moved without being interfered
with the wafer transfer path 65 becomes the driving range of the
transfer belt 601.
[0147] In the chemical liquid block D2g of the present example, it
is not necessary to provide a space for moving the container
transfer device 7c. Accordingly, it is possible to further reduce a
width of the chemical liquid block D2g in the forward/backward
direction.
[0148] Further, the wafer transfer path 65 provided in the chemical
liquid block D2 (D2a to D2g) is not limited to be formed inside the
cylindrical member. By way of example, plates serving as the
ceiling surface and the bottom surface of the wafer transfer path
65 may be vertically arranged to face each other, and an air
curtain may be formed at sides of the upper and lower plates opened
toward a space within the chemical liquid block D2 such that the
wafer transfer path 65 partitioned from the atmosphere of the
chemical liquid block D2 can be formed.
[0149] Further, the container transfer device 7 or 7a to 7c does
not need to transfer the chemical liquid container 50 as being
accommodated in the tray 51 or 51a. A robot arm or the like may
transfer the chemical liquid container 50 while directly holding a
side surface or a bottom surface of the main body of the chemical
liquid container 50.
[0150] Furthermore, the container transfer device 7 does not need
to have a function of transferring multiple chemical liquid
containers 50 at the same time. In this case, the completely used
chemical liquid container 50 is unloaded from the container
mounting module 6 where the chemical liquid container 50 is to be
replaced to be transferred to the tray mounting table 69. After the
completely used chemical liquid container 50 is unloaded, a new
chemical liquid container 50 is received and transferred to the
container mounting module 6 from which the completely used chemical
liquid container 50 has been unloaded.
[0151] Moreover, a substrate processing apparatus to which the
example embodiments can be applied is not limited to the coating
and developing apparatus 1 that performs the resist coating and
developing process on the wafer W. By way of example, the example
embodiments can be applied to a cleaning apparatus in which
multiple cleaning modules, each performing a cleaning process by
supplying an alkaline or acid chemical liquid to a front surface or
a rear surface of the wafer W, are provided within a processing
block.
[0152] From the foregoing, it will be appreciated that various
embodiments of the present disclosure have been described herein
for purposes of illustration, and that various modifications may be
made without departing from the scope and spirit of the present
disclosure. Accordingly, the various embodiments disclosed herein
are not intended to be limiting, with the true scope and spirit
being indicated by the following claims.
* * * * *