U.S. patent application number 14/336023 was filed with the patent office on 2014-11-06 for laser apparatus.
The applicant listed for this patent is GIGAPHOTON INC., KOMATSU LTD., USHIO DENKI KABUSHIKI KAISHA. Invention is credited to Tatsuo ENAMI, Junichi FUJIMOTO, Hakaru MIZOGUCHI.
Application Number | 20140328364 14/336023 |
Document ID | / |
Family ID | 39415482 |
Filed Date | 2014-11-06 |
United States Patent
Application |
20140328364 |
Kind Code |
A1 |
FUJIMOTO; Junichi ; et
al. |
November 6, 2014 |
LASER APPARATUS
Abstract
When a chamber of an oscillator and one or more amplifiers is to
be replaced at the timing when a predetermined period elapses, one
of the chambers of the oscillator and the amplifiers having a low
allowable deterioration limit is detached and this chamber is
attached in place of one of the chambers of the oscillator and the
amplifiers other than the one having the low allowable
deterioration limit. Thus, the chamber which has been used in one
of the oscillator and amplifiers having a low allowable
deterioration limit and has not reached the limit of deterioration
is reused in one of the oscillator and the amplifiers other than
the one having the low allowable deterioration limit. This enables
efficient use of oscillator and amplifier chambers in a multistage
amplification laser apparatus, minimizing the labor and parts
consumed for replacement thereof.
Inventors: |
FUJIMOTO; Junichi;
(Fujisawa-shi, JP) ; MIZOGUCHI; Hakaru;
(Hiratsuka-shi, JP) ; ENAMI; Tatsuo;
(Yokohama-shi, JP) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
GIGAPHOTON INC.
KOMATSU LTD.
USHIO DENKI KABUSHIKI KAISHA |
Tochigi
Tokyo
Tokyo |
|
JP
JP
JP |
|
|
Family ID: |
39415482 |
Appl. No.: |
14/336023 |
Filed: |
July 21, 2014 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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13152369 |
Jun 3, 2011 |
8813329 |
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14336023 |
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11984292 |
Nov 15, 2007 |
7984539 |
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13152369 |
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Current U.S.
Class: |
372/55 |
Current CPC
Class: |
Y10T 29/49718 20150115;
H01S 3/0014 20130101; H01S 3/2308 20130101; H01S 3/03 20130101;
Y10T 29/4973 20150115; Y10T 29/49826 20150115; H01S 3/225 20130101;
H01S 3/10092 20130101; Y10T 29/49721 20150115 |
Class at
Publication: |
372/55 |
International
Class: |
H01S 3/23 20060101
H01S003/23 |
Foreign Application Data
Date |
Code |
Application Number |
Nov 16, 2006 |
JP |
2006-310317 |
Claims
1. A laser apparatus comprising: an oscillator having an oscillator
chamber; and an amplifier having an amplifier chamber, wherein the
oscillator chamber and the amplifier chamber include a common
part.
2. A laser apparatus comprising: an oscillator having an oscillator
chamber; and an amplifier having an amplifier chamber, wherein the
oscillator chamber and the amplifier chamber have a same
configuration.
Description
[0001] This application is a Divisional of U.S. application Ser.
No. 13/152,369, filed Jun. 3, 2011, which is a Continuation of U.S.
application Ser. No. 11/984,292, filed Nov. 15, 2007.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention relates to a chamber replacing method
for use in a multistage amplification laser apparatus having an
oscillator and at least one amplifier, chambers of which are common
in configuration but have different tolerance limits of
deterioration from each other. The present invention particularly
relates to a chamber replacing method which is designed such that
one of the chambers attached to the oscillator and the one or more
amplifiers having a relatively low allowable deterioration limit is
detached and reattached to be reused in place of another one of the
chambers attached to the oscillator and the one or more amplifiers
other than the one having the low allowable deterioration
limit.
[0004] 2. Description of the Related Art
[0005] As semiconductor integrated circuits are improved by
refining their configuration and increasing the degree of
integration, semiconductor exposure devices (hereafter, referred to
as "exposure devices") are required to have improved resolution.
For this purpose, studies have been conducted to reduce the
wavelength of light emitted by an exposure light source. A gas
laser apparatus is used as the exposure light source in place of a
conventional mercury lamp. Nowadays, KrF excimer lasers emitting
ultraviolet rays having a wavelength of 248 nm and ArF excimer
lasers emitting ultraviolet rays having a wavelength of 193 nm are
used as exposure gas laser apparatuses.
[0006] Studies have been conducted on a next-generation exposure
technology referred to as immersion exposure technology in which
space between a wafer and an exposure lens of an exposure device
has liquid to change the index of refraction, whereby the apparent
wavelength of the exposure light source is reduced. When immersion
exposure is performed by using an ArF excimer laser as the exposure
light source, a wafer is irradiated with ultraviolet light having a
wavelength if 134 nm in water. This technology is referred to as
ArF immersion exposure technology (or ArF immersion
lithography).
[0007] One of next-next-generation exposure light sources is an EUV
light source. Immersion technology may be performed by using an F2
laser as the exposure light source. In this case, the wafer is
irradiated with ultraviolet light having a wavelength of 115
nm.
[0008] The lens transmittance is decreased due to increased
numerical aperture (NA) according to the immersion exposure
technology. Therefore, the output of laser as the light source must
be increased in order to achieve fixed exposure. The increase of
the laser output is also required to increase the throughput of the
exposure device. A double chamber laser apparatus 1 as shown in
FIG. 1 is one example of means for obtaining high output with the
spectral line width being narrowed. FIG. 1 shows an MOPA laser in
which both oscillator and amplifier have a laser resonator.
[0009] The double chamber laser apparatus 1 is comprised of an
oscillator 10 for outputting narrow-banded laser light, and an
amplifier 20 for amplifying the narrow-banded laser beam (referred
to as seed light). The double chamber laser apparatus 1 is
classified into two types, MOPO type and MOPA type, according to
amplification means used in the amplifier 20. The MOPO stands for
"master oscillator, power oscillator", and it is also referred to
as an injection lock type laser, in which a resonator is provided
before and after an amplifier chamber 21 of the amplifier 20. The
MOPA stands for "master oscillator, power amplifier" in which no
resonator is provided before or after the amplifier chamber of the
amplifier 20.
[0010] The following description will be made by way of example of
an MOPO laser. The oscillator 10 and the amplifier 20 are each
provided with an oscillator chamber 11 and an amplifier chamber 21
for containing laser gas. Windows 11a and 11b are attached to the
oscillator chamber 11 to allow free passage of light from inside
the chamber to the outside and from outside the chamber to the
inside. Windows 21a and 21b are attached to the amplifier chamber
21 to allow free passage of light from inside the chamber to the
outside and from outside the chamber to the inside. Further, each
of the chambers 11 and 21 is provided therein with a pair of main
discharge electrodes, a gas circulation fan, a gas cooler and
various other devices. These chambers 11 and 21 may have either
same configuration or different configurations.
[0011] First, in consideration of functional aspects, it is better
that the chambers 11 and 21 be designed independently in optimal
manner. The oscillator 10 has functions of generation and band
narrowing of laser light, while the amplifier 20 has functions of
amplification of laser light output from the oscillator 10. Thus,
the oscillator 10 and the amplifier 20 have different functions
from each other, and hence it is ideal that the chambers thereof
are respectively designed to suit their functions. In this case,
the chambers 11 and 21 may possibly not be compatible with each
other.
[0012] On the other hand, when taking the aspects of cost and
management into consideration, it is better that the chambers 11
and 21 have the same configuration. By using common parts for both
the oscillator chamber 11 and the amplifier chamber 21, the parts
management can be simplified, which makes it easy to reduce the
cost for deployment of the parts in servicing centers as well as
the production cost.
[0013] In some cases, the use of common parts in the oscillator
chamber 11 and the amplifier chamber 21 does not incur a
significant problem in terms of functions. This is because it is
possible to give the oscillator chamber 11 and the amplifier
chamber 21 appropriate characteristics for their functions by
adjusting parameters such as composition of the gas contained in
the oscillator chamber 11 and the amplifier chamber 21, reflectance
of a front mirror as a part not belonging to the chambers, and
rotation speed of a gas circulation fan. Therefore, it is also
possible for laser users to use common parts for both the
oscillator chamber 11 and the amplifier chamber 21, placing
priority to the advantages in cost and management aspects. The
following description is based on the configuration wherein the
oscillator chamber 11 and the amplifier chamber 21 have the same
configuration.
[0014] The oscillator chamber 11 and the amplifier chamber 21
(including their windows and parts inside and outside the chambers)
are deteriorated along with the increase of the cumulative
operation time of the double chamber laser apparatus 1, or the
cumulative number of laser shots. Deterioration of the oscillator
chamber 11 and the amplifier chamber 21 induces shortening of the
life of the laser. When the degree of deterioration of the chambers
is increased, the life of the laser per loading of gas will fail to
satisfy the specifications. Therefore, once the degree of
deterioration has reached a certain level, the oscillator chamber
11 and the amplifier chamber 21 need be replaced. A tolerance is
set for the degree of deterioration of the oscillator chamber 11
and amplifier chamber 21, and it is determined that the chamber has
reached the end of its service life once the degree of
deterioration reaches the limit, namely the allowable deterioration
limit.
[0015] FIG. 3 illustrates a concept of the service life of chambers
in the oscillator and amplifier. FIG. 3 shows relation between the
number of laser shots of the double chamber laser apparatus 1 and
the maximum output energy of the oscillator chamber 11 and
amplifier chamber 21. The vertical axis represents the chamber
output energy, and the horizontal axis represents the cumulative
number of laser shots. The maximum output energy can be considered
as a capability that the chamber holds at the time. It is known
that the capability of the chamber is proportional to the degree of
deterioration of the chamber. Accordingly, it can be said that the
graph in FIG. 3 also illustrates relation between the number of
laser shots and the degree of deterioration of the oscillator
chamber 11 and amplifier chamber 21.
[0016] As shown in FIG. 3, the maximum output energy of the
oscillator chamber 11 and amplifier chamber 21 decreases
substantially in proportion to the increase of the number of laser
shots. This means that the degree of deterioration of the
oscillator chamber 11 and amplifier chamber 21 increases
substantially in proportion to the increase of the number of laser
shots. It is assumed that the degree of deterioration increases
along with the increase of the number of laser shots substantially
equally between the oscillator 10 and the amplifier 20. Taking an
example of a case in which the service life of the chamber of the
oscillator 10 is shorter than that of the chamber of the amplifier
20, when the maximum output energy of a new chamber (the number of
laser shots of which is zero) is denoted by A, the degree of
deterioration of the oscillator chamber 11 reaches the upper limit
of the tolerance, or the allowable deterioration limit and the
chamber comes to the end of its service life at the time when the
maximum output energy of the oscillator 10 has dropped to B, that
is to say, the number of laser shots has reached Lo. As for the
amplifier 20, the degree of deterioration of the amplifier chamber
21 reaches the allowable deterioration limit and the chamber comes
to the end of its service life at the time when the maximum output
energy has dropped to C, that is to say, when the number of laser
shots has reached La.
[0017] Considering that A in FIG. 3 indicates zero degree of
deterioration and taking an example of a case in which the service
life of the chamber of the amplifier 20 is shorter than that of the
chamber of the oscillator 10, the range of allowable deterioration
for the chamber of the oscillator 10 corresponds to the range from
A to B, while the range of allowable deterioration for the chamber
of the amplifier 20 corresponds to the range from A to C. This
means that the allowable deterioration limit of the oscillator 10
is lower than that of the amplifier 20.
[0018] In FIG. 3, the relation that 2 Lo=La is established. The
allowable deterioration limit differs between the oscillator 10 and
the amplifier 20 because functions are different between the
oscillator 10 and the amplifier 20. The oscillator 10 has functions
of generating and narrow-banding laser light, while the amplifier
20 has a function of amplifying the laser light emitted by the
oscillator 10. Taking these functions into consideration, it can be
seen that the oscillator 10 is required to achieve higher quality
of laser oscillation. For this reason, more strict management is
required for the oscillator 10 than for the amplifier 20. As a
result, the range of allowable deterioration is set smaller, that
is the tolerance limit for deterioration is set lower for the
oscillator 10. It should be noted, however, that the relation that
2 Lo=La is just an example, and this relation is not necessarily
established in every case. However, the design can be made such
that at least the relation that Lo.ltoreq.La is established. The
setting can be made such that La is an integral multiple of (twice
or more) Lo, for example, such that the relation that 2 Lo=La or 3
Lo=La is established.
[0019] Conversely, the allowable deterioration limit is sometimes
lower for the chamber of the amplifier 20 than for the chamber of
the oscillator 10. When the output energy from the amplifier
chamber 21 is increased (when the amplification factor is
increased), the amplifier 20 reaches the allowable deterioration
limit for the amplifier chamber 21 at the time when the maximum
output energy has dropped to B. The oscillator 10 reaches the
allowable deterioration limit for the oscillator chamber 11 at the
time when the maximum output energy has dropped to C. Since the
output energy required for the amplifier chamber 21 is high, the
range of allowable deterioration is set small, that is, the
allowable deterioration limit is set low. In this case as well, the
setting can be made such that Lo is an integral multiple of (twice
or more) La, for example, such that the relation that 2 La=Lo or 3
La=Lo is established.
[0020] Description will be made of a conventionally practiced
chamber replacing method, taking an example of a case in which the
allowable deterioration limit is set lower for the chamber of the
oscillator 10 than for the chamber of the amplifier 20.
[0021] FIG. 4 illustrates an example of a chamber replacement cycle
according to a conventional method (a case in which 2 Lo=La). The
figures with the symbol "#" in FIG. 4 represent serial numbers of
the chambers 11 and 21 used in the oscillator 10 and amplifier 20.
When the number of laser shots reaches Lo, the oscillator chamber
11 (#2) of the oscillator 10 is replaced with a new oscillator
chamber 11 (#3). When the number of laser shots reaches 2 Lo (=La),
the amplifier chamber 21 (#1) of the amplifier 20 is replaced with
a new amplifier chamber 21 (#4), and the oscillator chamber 11 (#3)
of the oscillator 10 is replaced with a new oscillator chamber 11
(#5). Likewise, from then on, every time the number of laser shots
is increased by Lo, the oscillator chamber 11 of the oscillator 10
is replaced, and every time the number of laser shots is increased
by 2 Lo (=La), the amplifier chamber 21 of the amplifier 20 is
replaced. The term "new chamber" as used herein means not only a
brand-new chamber but also a recycled chamber obtained by
overhauling (replacing the parts and cleaning the interior of) a
used chamber and having equivalent performance to that of a
brand-new one.
[0022] When the chambers are replaced according to the replacement
cycle shown in FIG. 4, it is determined that the oscillator chamber
11 has reached the allowable deterioration limit for the oscillator
10 every time the number of laser shots is increased by Lo, and the
oscillator chamber 11 is overhauled or discarded. However, even if
the oscillator chamber 11 has reached the allowable deterioration
limit for the oscillator 10, it has not reached the allowable
deterioration limit for the amplifier 20. This means that the
oscillator chamber 11 is still usable when viewing the whole of the
double chamber laser apparatus. If the oscillator chamber 11 is
nevertheless overhauled or discarded, it is a waste of labor to
overhaul the same and waste of replaced parts.
[0023] The present invention has been made in view of such
problems, and it is an object of the present invention to enable,
in a multistage amplification laser apparatus having an oscillator
and at least one amplifier, efficient use of chambers of the
oscillator to thereby reduce the labor and parts consumed by
replacement of the chambers (to reduce the related cost).
SUMMARY OF THE INVENTION
[0024] A first aspect of the invention relates to a chamber
replacing method for use in a multistage amplification laser
apparatus designed such that light generated in an oscillator
chamber is amplified in one or more amplifier chambers for
generating gain, the oscillator chamber and the amplifier chambers
have the same configuration, and the allowable deterioration limit
is different between the oscillator chamber and the one or more
amplifier chambers. The method includes the steps of: detaching a
chamber "a" from one of the chambers of the oscillator and the one
or more amplifiers having a low allowable deterioration limit at
the timing when a predetermined period elapses; attaching a new
chamber in place of the chamber "a"; and detaching a chamber "b"
from one of the chambers of the oscillator and the one or more
amplifiers other than the one having the low allowable
deterioration limit and attaching the chamber "a" in place of the
chamber "b".
[0025] A second aspect of the invention relates to the first aspect
of the invention, in which when the allowable deterioration limit
for the chamber "b" can be set to an integral multiple of (twice or
more) the allowable deterioration limit for the chamber "a", the
chamber "a" is replaced with the chamber "b" at the timing when the
deterioration of the chamber "a" reaches the allowable
deterioration limit.
[0026] A third aspect of the invention relates to the second aspect
of the invention, in which the degree of deterioration of each
chamber is proportional to a number of laser shots, and the chamber
"a" is replaced with the chamber "b" at the timing when the chamber
"a" reaches the number of laser shots corresponding to the
allowable deterioration limit.
[0027] In a multistage amplification laser apparatus having an
oscillator and at least one amplifier, the range of allowable
deterioration differs among the chambers depending on design
thereof For example, even if the oscillator chamber reaches its
allowable deterioration limit as the number of laser shots is
increased, it has not reached yet the allowable deterioration limit
for the amplifier chamber. In another case, even if the amplifier
chamber reaches its allowable deterioration limit as the number of
laser shots is increased, it has not reached yet the allowable
deterioration limit for the oscillator chamber. In still another
case, even if one of two or more amplifier chambers reaches its
allowable deterioration limit as the number of laser shots is
increased, it has not reached yet the allowable deterioration limit
for the other amplifier chambers.
[0028] The following description will be made, by way of example,
of an MOPO laser, and of a case in which the range of allowable
deterioration for the amplifier chamber is greater than that for
the oscillator chamber. For example, when it is assumed that the
oscillator chamber has a allowable deterioration limit
corresponding to the number of laser shots Lo, and the amplifier
chamber has a allowable deterioration limit corresponding to the
number of laser shots 2 Lo (=La), the oscillator chamber has not
reached the allowable deterioration limit for the amplifier chamber
at the time when it has reached its allowable deterioration limit,
and oscillator chamber still has remaining service life
corresponding to the number of laser shots Lo.
[0029] Further, when it is assumed that the oscillator chamber has
a allowable deterioration limit corresponding to a number of laser
shots Lo, and the amplifier chamber has a allowable deterioration
limit corresponding to a number of laser shots 3 Lo (=La), the
oscillator chamber has not reached the allowable deterioration
limit for the amplifier chamber at the time when it has reached its
allowable deterioration limit, and oscillator chamber still has
remaining service life corresponding to the number of laser shots 2
Lo.
[0030] Therefore, when the oscillator and amplifier chambers are to
be replaced every time a predetermined period has elapsed, the
oscillator chamber is always replaced with a new one while the
amplifier chamber is always replaced with the chamber detached form
the oscillator. In this manner, the remaining service life that the
detached oscillator chamber has is consumed in the amplifier.
[0031] Further, when the relation that n Lo=La (n is an integer of
two or more) is established, the oscillator and amplifier chambers
are replaced at the timing when the oscillator chamber reaches its
allowable deterioration limit.
[0032] Contrary to the description above, in the case in which the
oscillator chamber has a greater range of allowable deterioration
than the amplifier chamber, the amplifier chamber is always
replaced with a new chamber while the oscillator chamber is always
replaced with the chamber detached from the amplifier, when the
oscillator and amplifier chambers are to be replaced at the timing
when a predetermined period has elapsed similarly to the
description above. In this manner, the remaining service life that
the amplifier chamber has is consumed in the oscillator.
[0033] It should be understood that the term "new chamber" as used
herein includes not only a brand-new chamber but also a recycled
chamber obtained by overhauling a used chamber (by replacing parts
and cleaning the interior). The recycled chamber has equivalent
performance to that of the brand-new chamber.
[0034] According to the present invention, a chamber which has been
used in the oscillator but has not reached its allowable
deterioration limit is reused so that the remaining service life of
the chamber is consumed in the amplifier. Alternatively, a chamber
which has been used in the amplifier but has not reached its
allowable deterioration limit is reused so that the remaining
service life of the chamber is consumed in the oscillator.
Alternatively, a chamber which has been used in an amplifier but
has not reached its allowable deterioration limit is reused so that
the remaining service life thereof is consumed in another
amplifier. In this manner, unlike the prior arts, the opportunity
to overhaul or discard chambers which have not reached the limit of
deterioration and are still usable is minimized, enabling reduction
of the labor and parts consumed for the replacement.
BRIEF DESCRIPTION OF THE DRAWINGS
[0035] FIG. 1 shows a configuration example of an MOPO-type double
chamber laser apparatus;
[0036] FIG. 2 is a diagram illustrating a mode of chamber
replacement cycle according to a method of an embodiment of the
present invention;
[0037] FIG. 3 is a diagram illustrating a concept of service life
of oscillator and amplifier chambers; and
[0038] FIG. 4 is a diagram illustrating a mode of chamber
replacement cycle according to a conventional method.
DETAILED DESCRIPTION OF THE INVENTION
[0039] Embodiments of the present invention will be described with
reference to the accompanying drawings.
[0040] FIG. 1 shows a configuration example of an MOPO-type double
chamber laser apparatus.
[0041] A double chamber laser apparatus 1 has an oscillator 10 for
generating and narrow-banding light, an amplifier 20 for amplifying
the light output from the oscillator 10, a beam steering module 30
for guiding the laser light output from the oscillator 10 to the
amplifier 20, a monitor module 40 for detecting the laser light
output from the amplifier 20, and a shutter 50 for switching
between a state in which the laser light is output to the outside
of the laser apparatus and a state in which the laser light is shut
off
[0042] The oscillator 10 has an oscillator chamber 11 for
containing laser gas. The oscillator chamber 11 has windows 11a and
11b attached thereto to allow free passage of light from inside the
chamber to the outside and from outside the chamber to the inside.
The oscillator chamber 11 is provided therein with a pair of main
discharge electrodes facing each other, a gas circulation fan, a
gas cooler, and various other devices.
[0043] A narrowbanding module 12 is provided on a laser light path
on the rear side of the oscillator chamber 11, and an oscillator
front mirror 13 is provided on a laser light path on the front side
of the oscillator chamber 11. The narrowbanding module 12 is
provided with optical elements such as a prism beam expander and a
grating. The narrowbanding module 12 and the oscillator front
mirror 13 together make up an optical resonator.
[0044] An oscillator pulse power module 14 has a switching element
and a magnetic compression circuit, and supplies charging energy to
the main discharge electrodes within the oscillator chamber 11
through the magnetic compression circuit, in response to a trigger
signal output by a controller (not shown) to the switching
element.
[0045] The amplifier 20 has an amplifier chamber 21 containing
laser gas. The amplifier chamber 21 has windows 21a and 21b
attached thereto to allow free passage of light from inside the
chamber to the outside and from outside the chamber to the inside.
The amplifier chamber 21 is provided therein with a pair of main
discharge electrodes facing each other, a gas circulation fan, a
gas cooler, and various other devices.
[0046] An amplifier rear mirror 22 is provided on a laser light
path on the rear side of the amplifier chamber 21, and an amplifier
front mirror 23 is provided on a laser light path on the front side
of the amplifier chamber 21.
[0047] An amplifier pulse power module 24 has a switching element
and a magnetic compression circuit, and supplies charging energy to
the main discharge electrodes within the amplifier chamber 21
through the magnetic compression circuit, in response to a trigger
signal output by a controller (not shown) to the switching
element.
[0048] The oscillator chamber 11 provided in the oscillator 10 has
same configuration as that of the amplifier chamber 21 provided in
the amplifier 20.
[0049] A beam steering module 30 has one or more mirrors in its
casing, and these mirrors guide the laser light output from the
oscillator 10 to the amplifier 20.
[0050] The monitor module 40 has a beam splitter and an optical
sensor. Laser light entering the monitor module 40 is split by the
beam splitter. One of the split beams is emitted out of the monitor
module 40, while the other enters the optical sensor. Output energy
and spectral bandwidth are determined on the basis of an output
from the optical sensor.
[0051] The switching of the shutter 50 is controlled by a
controller (not shown). For example, the shutter 50 is opened
during exposure of a semiconductor, and closed during oscillation
adjustment.
[0052] A chamber replacing method according to an embodiment of the
invention will be described, taking as an example of a case in
which the allowable deterioration limit is set lower for the
chamber of the oscillator 10 than for the chamber of the amplifier
20.
[0053] FIG. 2 illustrates a mode of chamber replacement cycles
according to the method of the embodiment (the case in which 2
Lo=La). Like in FIG. 4, the figures with the symbol "#" in FIG. 2
represent serial numbers of the chambers 11 and 21 used in the
oscillator 10 and amplifier 20. The method of the embodiment is
different from the conventional method in that the oscillator
chamber 11 which has reached the allowable deterioration limit for
the oscillator 10 is reused as an amplifier chamber 21. Procedures
to replace the chambers according to the embodiment of the
invention will be described.
[0054] First, prior to starting laser oscillation, that is to say,
at the time when the number of laser shots is zero, an amplifier
chamber 21 (#1) is attached to the amplifier 20 and an oscillator
chamber 11 (#2) is attached to the oscillator 10.
[0055] When the laser oscillation is started and the number of
laser shots reaches Lo, the deterioration of the oscillator chamber
11 (#2) reaches the allowable deterioration limit for the
oscillator chamber 11. The oscillator chamber 11 (#2) is then
detached from the oscillator 10, and a new oscillator chamber 11
(#3) is attached in place of the oscillator chamber 11 (#2).
Although the deterioration of the oscillator chamber 11 (#2)
detached from the oscillator 10 has reached the allowable
deterioration limit for the oscillator chamber 11, it has not
reached yet the allowable deterioration limit for the amplifier
chamber 21, and has remaining service life corresponding to the
number of laser shots Lo. Thus, the amplifier chamber 21 (#1) is
detached from the amplifier 20 and the oscillator chamber 11 (#2)
detached from the oscillator 10 is attached in place thereof, so
that this oscillator chamber 11 (#2) is reused as an amplifier
chamber 21 (#2).
[0056] On the other hand, the deterioration of the amplifier
chamber 21 (#1) detached from the amplifier 20 also still has
remaining service life corresponding to the number of laser shots
Lo before reaching the allowable deterioration limit for the
amplifier chamber 21. Therefore, this amplifier chamber 21 (#1) may
be reused in another laser apparatus 1 or may be overhauled.
[0057] When laser oscillation is further carried out after the
replacement of the chambers and the number of laser shots reaches 2
Lo (=La), the deterioration of the oscillator chamber 11 (#3)
reaches the allowable deterioration limit for the oscillator
chamber 11. Thus, the oscillator chamber 11 (#3) is detached from
the oscillator 10, and a new oscillator chamber 11 (#4) is attached
in place thereof Although the deterioration of the oscillator
chamber 11 (#3) has reached the allowable deterioration limit for
the oscillator chamber 11, it has not reached yet the allowable
deterioration limit for the amplifier chamber 21 and still has
remaining service life corresponding to the number of laser shots
Lo. Therefore, the amplifier chamber 21 (#2) is detached from the
amplifier 20, and the oscillator chamber 11 (#3) detached from the
oscillator 10 is attached in place thereof, so that this oscillator
chamber 11 (#3) is reused as an amplifier chamber 21 (#3).
[0058] On the other hand, the amplifier chamber 21 (#2) detached
from the amplifier 20 has consumed its life time corresponding to
the number of laser shots Lo in the oscillator 10 and has
additionally consumed its life time corresponding to the number of
laser shots Lo in the amplifier 20, that is to say, it has consumed
its life time corresponding to the number of laser shots 2 Lo (=La)
in total. This means that the deterioration of this amplifier
chamber 21 (#2) has reached the allowable deterioration limit for
the amplifier chamber 21 and hence the amplifier chamber 21 (#2) is
overhauled or discarded.
[0059] In this manner, every time the number of laser shots is
increased by Lo, the chambers 11 and 21 are detached from the
oscillator 10 and the amplifier 20, and a new oscillator chamber 11
(#x) is attached to the oscillator 10 and the oscillator chamber 11
(#x-1) detached from the oscillator 10 is attached to the amplifier
20. This means that, a chamber is used through a cycle in the
sequence of the oscillator 10, the amplifier 20, and overhaul.
[0060] It should be understood that although FIG. 2 shows the case
in which 2 Lo=La, a case in which 3 Lo=La is also possible.
[0061] In the case in which 3 Lo=La, the replacement may be
performed, for example, by a method in which, every time the number
of laser shots is increased by Lo, the chambers 11 and 21 are
detached from the oscillator 10 and the amplifier 20, respectively,
and a new oscillator chamber 11 (#x) is attached to the oscillator
10 while the oscillator chamber 11 (#x-1) detached from the
oscillator 10 is attached to the amplifier 20. In this case, the
deterioration of the amplifier chamber 21 detached from the
amplifier 20 has not reached yet the allowable deterioration limit
for the amplifier chamber 21 and still has remaining service life
corresponding to the number of laser shots Lo. Accordingly, this
chamber 21 may be used in another laser apparatus 1 or may be
overhauled.
[0062] Another example of the chamber replacing method in the case
in which 3 Lo=La may be such that every time the number of laser
shots is increased by Lo, the oscillator chamber 11 is detached
from the oscillator 10 and a new oscillator chamber 11 is attached
thereto, while every time the number of laser shots is increased by
2 Lo (by 3 Lo only for the first time), the amplifier chamber 21 is
detached from the amplifier 20 and the oscillator chamber 11
detached from the oscillator 10 is attached thereto.
[0063] The description so far has been made of the cases in which 2
Lo=La and 3 Lo=La. As seen from the description above, a relation
that n Lo=La (n is an integer of two or more) can generally be
established between the number of laser shots Lo and the number of
laser shots La. Although there are some cases in which this
relation that n Lo=La is not established, the design can be made
such that at least a relation that Lo.ltoreq.La is established. The
present invention is applicable so far as this relation that
Lo.ltoreq.La is established.
[0064] Although, according to the present embodiment, the chamber
replacement is performed at the timing when the oscillator chamber
11 and the amplifier chamber 21 reach their allowable deterioration
limits, the chamber replacement may be performed at any time before
the oscillator chamber 11 and the amplifier chamber 21 reach their
allowable deterioration limits. In this case, it is preferable in
view of the ease of the chamber replacement work to preset a
certain number of laser shots so that the chamber replacement is
performed every time the number of laser shots is increased by that
preset number.
[0065] Although the description of the embodiment above has been
made of the case of replacing the chambers of the oscillator and
amplifier of the double chamber laser apparatus, the present
invention is also applicable to a multi-chamber laser apparatus
having an oscillator and a plurality of amplifiers. When applied to
a multi-chamber laser apparatus, the chamber detached from the
oscillator may be attached to one of the plurality of amplifiers,
or a chamber detached from one of the amplifiers may be attached to
another amplifier. Further, the present invention is also
applicable to a laser apparatus having a ring-type amplifier.
[0066] According to the present embodiment, if a chamber detached
from the oscillator has not reached its limit of deterioration, the
chamber is reused in the amplifier to consume its remaining service
life. Therefore, unlike the prior arts, the opportunity to overhaul
or discard chambers which have not reached the limit deterioration
and are still usable is minimized, enabling reduction of the labor
and parts consumed for the replacement.
[0067] When the oscillator chamber has a greater range of allowable
deterioration than the amplifier chamber, the chamber replacement
is performed in the same procedures as the description above but
with the oscillator chamber and the amplifier chamber being
interchanged in FIG. 2.
[0068] The description has been made by way of example of the MOPO
laser. However, the present invention is also applicable to an MOPA
laser and the chamber replacement can be performed in the same
manner.
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