U.S. patent application number 13/282745 was filed with the patent office on 2012-02-16 for lens cleaning module.
This patent application is currently assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. Invention is credited to Burn-Jeng Lin, David Lu.
Application Number | 20120038894 13/282745 |
Document ID | / |
Family ID | 35757050 |
Filed Date | 2012-02-16 |
United States Patent
Application |
20120038894 |
Kind Code |
A1 |
Lin; Burn-Jeng ; et
al. |
February 16, 2012 |
Lens Cleaning Module
Abstract
A lens cleaning module for a lithography system having an
exposure apparatus including an objective lens is disclosed. The
lens cleaning module includes a scanning stage for supporting a
wafer beneath the objective lens. A cleaning module is provided
adjacent to the scanning stage for cleaning the objective lens in a
non-manual cleaning process.
Inventors: |
Lin; Burn-Jeng; (Hsin-Chu,
TW) ; Lu; David; (Hsin-Chu City, TW) |
Assignee: |
TAIWAN SEMICONDUCTOR MANUFACTURING
COMPANY, LTD
Hsin-Chu
TW
|
Family ID: |
35757050 |
Appl. No.: |
13/282745 |
Filed: |
October 27, 2011 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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11222319 |
Sep 7, 2005 |
8054444 |
|
|
13282745 |
|
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|
10910480 |
Aug 3, 2004 |
7224427 |
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11222319 |
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Current U.S.
Class: |
355/30 |
Current CPC
Class: |
G03F 7/70341
20130101 |
Class at
Publication: |
355/30 |
International
Class: |
G03B 27/52 20060101
G03B027/52 |
Claims
1-20. (canceled)
21. A lithography system having an exposure apparatus including an
objective lens, the lithography system comprising: a lens cleaning
module operable to provide a cleaning fluid; an immersion fluid
module operable to provide an immersion fluid, the immersion fluid
module being different than the lens cleaning module and the
immersion fluid being different than the cleaning fluid; a scanning
stage for supporting a wafer beneath the objective lens; and a
fluid retaining wall carried by the scanning stage and operable to
retain the cleaning fluid on the scanning stage, wherein when the
lens cleaning module provides the cleaning fluid directly on the
scanning stage only the cleaning fluid contacts the objective lens
during cleaning of the objective lens.
22. The lithography system of claim 21, wherein the fluid retaining
wall is operable to retain the immersion fluid on the scanning
stage.
23. The lithography system of claim 22, wherein the fluid retaining
wall retains one of the immersion fluid and the cleaning fluid on
the scanning stage during exposure of the wafer.
24. The lithography system of claim 21, wherein the cleaning fluid
is retained by the fluid retaining wall such that the cleaning
fluid contacts the objective lens during exposure of the wafer.
25. The lithography system of claim 21, wherein the scanning stage
defines an exposure field, and wherein the fluid retaining wall is
coupled to the scanning stage around the exposure field.
26. The lithography system of claim 21, wherein the cleaning fluid
is one of isopropyl alcohol, acetone, or a solvent.
27. The lithography system of claim 21, further comprising a
heating/drying module associated with the lens cleaning module for
drying the objective lens.
28. The lithography system of claim 21, wherein the heating/drying
module uses one of thermal and gas spray for drying the objective
lens.
29. A method comprising: providing an immersion lithography system
having a lens cleaning module and an immersion fluid module that is
different from the lens cleaning module, the lens cleaning module
operable to provide a cleaning fluid and the immersion fluid module
operable to provide an immersion fluid; loading a wafer on a stage
of the lithography system; providing the cleaning fluid directly
onto the stage by the lens cleaning module, the cleaning fluid
retained by a fluid retaining wall associated with the stage, the
fluid retaining wall configured to retain the cleaning fluid such
that the cleaning fluid is in contact with an objective lens of the
immersion lithography system; and cleaning a surface of the
objective lens utilizing the cleaning fluid provided by the lens
cleaning module, wherein only the cleaning fluid contacts the
objective lens during the cleaning.
30. The method of claim 29, further comprising providing the
immersion fluid directly onto the stage by the immersion fluid
module, the immersion fluid retained by the fluid retaining wall
associated with the stage.
31. The method of claim 29, wherein the fluid retaining wall is
configured to retain the immersion fluid on the stage such that the
immersion fluid is in direct contact with the objective lens.
32. The method of claim 29, wherein the fluid retaining wall is
configured to allow for the passage of an exposure light through
the immersion fluid to an exposure field.
33. The method of claim 29, further comprising exposing the wafer
on the stage of the lithography system while cleaning the surface
of the objective lens utilizing the cleaning fluid provided by the
lens cleaning module.
34. The method of claim 29, wherein cleaning the surface of the
objective lens utilizing the cleaning fluid provided by the lens
cleaning module occurs while the objective lens is over the
wafer.
35. A lithography system comprising: a lens cleaning module having:
a scanning stage defining an exposure field; a cleaning stage
removably coupled to the scanning stage, the cleaning stage having
a top surface facing an objective lens of the lithography system;
and a cleaning unit coupled to the cleaning stage, the cleaning
unit comprising a dispensing nozzle and a cone-shaped collecting
annulus extending from the top surface of the cleaning stage toward
the objective lens, the cleaning unit configured to clean the
objective lens with a first fluid while the objective lens is over
the exposure field.
36. The lithography system of claim 35, furthering comprising an
immersion fluid module operable to provide a second fluid onto the
scanning stage, the second fluid being different than the first
fluid.
37. The lithography system of claim 35, wherein the dispending
nozzle is operable to provide the first liquid against the
objective lens such that the first liquid is deflected into the
cone-shaped collecting annulus.
38. The lithography system of claim 35, wherein the dispensing
nozzle is centrally disposed within the cone-shaped collecting
annulus.
39. The lithography system of claim 35, wherein the dispensing
nozzle and the cone-shaped collecting annulus are fixedly mounted
to the cleaning stage.
40. The lithography system of claim 35, wherein the dispensing
nozzle and the cone-shaped collecting annulus are pivotally mounted
to the cleaning stage such that the dispensing nozzle and the
cone-shaped collecting annulus each pivots relative to the cleaning
stage.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This is a continuation-in-part of application Ser. No.
10/910,480, filed Aug. 3, 2004.
FIELD OF THE INVENTION
[0002] The present invention relates to photolithography processes
used in the formation of integrated circuit (IC) patterns on
photoresist in the fabrication of semiconductor integrated
circuits. More particularly, the present invention relates td a
lens cleaning module which cleans an objective lens of a
lithography system exposure apparatus to enhance the integrity of
circuit pattern images transferred from a mask to a wafer.
BACKGROUND OF THE INVENTION
[0003] Various processing steps are used to fabricate integrated
circuits on a semiconductor wafer. These steps include deposition
of a conducting layer on the silicon wafer substrate; formation of
a photoresist or other mask such as titanium oxide or silicon
oxide, in the form of the desired metal interconnection pattern,
using standard lithographic or photolithographic techniques;
subjecting the wafer substrate to a dry etching process to remove
the conducting layer from the areas not covered by the mask,
thereby etching the conducting layer in the form of the masked
pattern on the substrate; removing or stripping the mask layer from
the substrate typically using reactive plasma and chlorine gas,
thereby exposing the top surface of the conductive interconnect
layer; and cooling and drying the wafer substrate by applying water
and nitrogen gas to the wafer substrate.
[0004] In a common IC fabrication technique known as a dual
damascene technique, lower and upper dielectric layers are
sequentially deposited on a substrate. A via opening is patterned
and etched in the lower dielectric layer, and a trench opening is
patterned and etched in the upper dielectric layer. At each step, a
patterned photoresist layer is used to etch the trench and via
openings in the corresponding dielectric layer. A conductive copper
line is then formed in the trench and via openings, typically using
electrochemical plating (ECP) techniques, to form the horizontal
and vertical IC circuit interconnects on the substrate.
[0005] Photoresist materials are coated onto the surface of a
wafer, or onto a dielectric or conductive layer on a wafer, by
dispensing a photoresist fluid typically on the center of the wafer
as the wafer rotates at high speeds within a stationary bowl or
coater cup. The coater cup catches excess fluids and particles
ejected from the rotating wafer during application of the
photoresist. The photoresist fluid dispensed onto the center of the
wafer is spread outwardly toward the edges of the wafer by surface
tension generated by the centrifugal force of the rotating wafer.
This facilitates uniform application of the liquid photoresist on
the entire surface of the wafer.
[0006] During the photolithography step of semiconductor
production, light energy is applied through a reticle or mask onto
the photoresist material previously deposited on the wafer to
define circuit patterns which will be etched in a subsequent
processing step to define the circuits on the wafer. A reticle is a
transparent plate patterned with a circuit image to be formed in
the photoresist coating on the wafer. A reticle contains the
circuit pattern image for only a few of the die on a wafer, such as
four die, for example, and thus, must be stepped and repeated
across the entire surface of the wafer. In contrast, a photomask,
or mask, includes the circuit pattern image for all of the die on a
wafer and requires only one exposure to transfer the circuit
pattern image for all of the dies to the wafer.
[0007] Spin coating of photoresist on wafers, as well as the other
steps in the photolithography process, is carried out in an
automated coater/developer track system using wafer handling
equipment which transport the wafers between the various
photolithography operation stations, such as vapor prime resist
spin coat, develop, baking and chilling stations. Robotic handling
of the wafers minimizes particle generation and wafer damage.
Automated wafer tracks enable various processing operations to be
carried out simultaneously. Two types of automated track systems
widely used in the industry are the TEL (Tokyo Electron Limited)
track and the SVG (Silicon Valley Group) track.
[0008] A typical method of forming a circuit pattern on a wafer
includes introducing the wafer into the automated track system and
then spin-coating a photoresist layer onto the wafer. The
photoresist is next cured by conducting a soft bake process. After
it is cooled, the wafer is placed in an exposure apparatus, such as
a stepper, which aligns the wafer with an array of die patterns
etched on the typically chrome-coated quartz reticle. When properly
aligned and focused, the stepper exposes a small area of the wafer,
then shifts or "steps" to the next field and repeats the process
until the entire wafer surface has been exposed to the die patterns
on the reticle. The photoresist is exposed to light through the
reticle in the circuit image pattern. Exposure of the photoresist
to this image pattern cross-links and hardens the resist in the
circuit pattern. After the aligning and exposing step, the wafer is
exposed to post-exposure baking and then is developed and
hard-baked to develop the photoresist pattern.
[0009] The circuit pattern defined by the developed and hardened
photoresist is next transferred to an underlying metal layer using
an etching process, in which metal in the metal layer not covered
by the cross-linked photoresist is etched away from the wafer with
the metal under the cross-linked photoresist that defines the
device feature protected from the etchant. Alternatively, the
etched material may be a dielectric layer in which via openings and
trench openings are etched according to the circuit pattern, such
as in a dual damascene technique. The via and trench openings are
then filled with a conductive metal such as copper to define the
metal circuit lines. As a result, a well-defined pattern of
metallic microelectronic circuits, which closely approximates the
cross-linked photoresist circuit pattern, is formed on the
wafer.
[0010] One type of lithography which is used in the semiconductor
fabrication industry is immersion lithography, in which an exposure
apparatus includes a mask and lens which are provided over an
optical transfer chamber. A water-containing exposure liquid is
distributed through the optical transfer chamber. In operation, the
optical transfer chamber is placed over an exposure field on a
photoresist-coated wafer. As the exposure liquid is distributed
through the optical transfer chamber, light is transmitted through
the mask, lens and exposure liquid in the optical transfer Chamber,
respectively, and onto the photoresist of the exposure field. The
circuit pattern image in the mask is therefore transferred by the
light transmitted through the exposure liquid to the photoresist.
The exposure liquid in the optical transfer chamber enhances the
resolution of the transmitted circuit pattern image on the
photoresist.
[0011] Prior to distribution of the exposure liquid through the
optical transfer chamber, the aqueous liquid is typically de-gassed
to remove most of the microbubbles from the liquid. However, some
of the microbubbles remain in the liquid during its distribution
through the optical transfer chamber. These remaining microbubbles
have a tendency to adhere to the typically hydrophobic surface of
the photoresist, thereby distorting the circuit pattern image
projected onto the photoresist. Accordingly, an apparatus and
method is needed to substantially obliterate microbubbles in an
exposure liquid during immersion lithography in order to prevent
distortion of the circuit pattern image projected onto the
photoresist in an exposure field.
[0012] An object of the present invention is to provide a novel
apparatus for substantially eliminating microbubbles in an exposure
liquid before or during immersion lithography.
[0013] Another object of the present invention is to provide a
novel megasonic exposure apparatus which is capable of
substantially eliminating microbubbles in an exposure liquid before
or during immersion lithography.
[0014] Still another object of the present invention is to provide
a novel megasonic exposure apparatus which enhances the quality of
a circuit pattern image projected onto a photoresist during
immersion lithography.
[0015] Yet another object of the present invention is to provide a
novel megasonic exposure apparatus in which sonic waves are used to
substantially obliterate microbubbles in an exposure liquid before
or during immersion lithography.
[0016] A still further object of the present invention is to
provide a novel megasonic immersion lithography exposure method in
which sonic waves are used to substantially obliterate microbubbles
in an exposure liquid before or during immersion lithography.
[0017] A still further object of the present invention is to
provide a novel megasonic immersion lithography exposure method in
which sonic waves are used to substantially obliterate microbubbles
and particles on exposure lens before or during immersion
lithography.
SUMMARY OF THE INVENTION
[0018] In accordance with these and other objects and advantages,
the present invention is generally directed to a novel megasonic
immersion lithography exposure apparatus for substantially
eliminating microbubbles from an exposure liquid before, during or
both before and during immersion lithography. In one embodiment,
the apparatus includes an optical transfer chamber which is
positioned over a resist-covered wafer, an optical housing which is
fitted with a photomask and lens provided over the optical transfer
chamber, and an inlet conduit for distributing an immersion liquid
into the optical transfer chamber. At least one megasonic plate
operably engages the inlet conduit to perpetuate sonic waves
through the immersion liquid as the liquid is distributed through
the inlet conduit and into the optical transfer chamber. The sonic
waves substantially obliterate microbubbles in the exposure liquid
such that the liquid enters the optical transfer chamber in a
substantially bubble-free state, for the exposure step. In another
embodiment, the apparatus includes an annular megasonic plate,
which encircles the optical transfer chamber.
[0019] The present invention is further directed to a method for
substantially eliminating microbubbles in an exposure liquid used
in an immersion lithography process for transferring a circuit
pattern image from a mask or reticle to a resist-covered wafer. The
method includes propagating sound waves through an exposure liquid
before, during or both before and during distribution of the
exposure liquid through an optical transfer chamber of an immersion
lithography exposure apparatus. The sound waves substantially
obliterate microbubbles in the exposure liquid and remove
microbubbles from the resist surface, thereby preventing
microbubbles from adhering to the resist on the surface of a wafer
and distorting the circuit pattern image transferred from the
apparatus, through the exposure liquid and onto the resist.
[0020] The present invention is further directed to a method for
substantially eliminating microbubbles and particle from exposure
lens used in an immersion lithography process for transferring a
circuit pattern image from a mask or reticle to a resist-covered
wafer. The method includes propagating sound waves through an
exposure liquid before, during or both before and during
distribution of the exposure liquid through an optical transfer
chamber of an immersion lithography exposure apparatus. The method
also includes changing the exposure liquid before, during or both
before and during exposure process. The sound waves substantially
obliterate microbubbles and particles on the lens surface, thereby
preventing microbubbles and particle from adhering to the surface
of a emersion lens and distorting the circuit pattern image
transferred from the apparatus, through the exposure liquid and
onto the resist.
BRIEF DESCRIPTION OF THE DRAWINGS
[0021] The invention will now be described, by way of example, with
reference to the accompanying drawings, in which:
[0022] FIG. 1 is a schematic view of a megasonic immersion
lithography apparatus according to a first embodiment of the
present invention;
[0023] FIG. 2 is a schematic view of a megasonic immersion
lithography apparatus according to a second embodiment of the
present invention;
[0024] FIG. 3A is a flow diagram which illustrates sequential
process steps carried out according to a first embodiment of the
method of the present invention;
[0025] FIG. 3B is a flow diagram which illustrates sequential
process steps carried out according to a second embodiment of the
method of the present invention;
[0026] FIG. 3C is a flow diagram which illustrates sequential
process step carried out according to a third embodiment of the
method of the present invention.
[0027] FIG. 3D is a flow diagram which illustrates sequential
process step carried out according to a fourth embodiment of the
method of the present invention.
[0028] FIG. 3E is a flow diagram which illustrates sequential
process step carried out according to a fifth embodiment of the
method of the present invention.
[0029] FIG. 4 is a schematic view of an illustrative embodiment of
a lens cleaning module according to the present invention;
[0030] FIG. 5 is a schematic view of another illustrative
embodiment of a lens cleaning module according to the present
invention;
[0031] FIG. 6 is a schematic view of an exposure apparatus which is
compatible with the lens cleaning modules of the present
invention;
[0032] FIG. 7 is a schematic view of still another illustrative
embodiment of the lens cleaning module according to the present
invention;
[0033] FIG. 8A is a schematic view, partially in section, of
another embodiment of the lens cleaning module according to the
present invention; and
[0034] FIG. 8B is a schematic view, partially in section, of yet
another embodiment of the lens cleaning module according to the
present invention.
DETAILED DESCRIPTION OF THE INVENTION
[0035] The present invention contemplates a novel megasonic
immersion lithography exposure apparatus for substantially
eliminating microbubbles from an exposure liquid before, during, or
both before and during immersion lithography. In one embodiment,
the apparatus includes an optical housing which is fitted with a
photomask and a lens. An optical transfer chamber is provided
beneath the lens of the optical housing. An inlet conduit is
provided in fluid communication with the optical transfer chamber
to distribute an immersion liquid into the chamber. At least one
megasonic plate operably engages the inlet conduit to perpetuate
sonic waves through the immersion liquid as the liquid is
distributed through the inlet conduit and into the optical transfer
chamber. In another embodiment, an annular megasonic plate
encircles the optical transfer chamber of the apparatus.
[0036] In operation of the apparatus, the optical transfer chamber
is positioned over an exposure field on a photoresist-coated wafer.
The sonic waves generated by the megasonic plate or plates
substantially obliterate microbubbles in the exposure liquid, such
that the liquid enters the optical transfer chamber in a
substantially bubble-free state. During the exposure step, light is
transmitted through the photomask and lens, respectively, of the
optical housing; through the exposure liquid in the optical
transfer chamber; and onto the photoresist coated onto the wafer.
The exposure liquid, substantially devoid of microbubbles,
transmits the substantially distortion-free circuit pattern image
onto the photoresist with high resolution.
[0037] The present invention is further directed to a method for
substantially eliminating microbubbles in an exposure liquid used
in an immersion lithography process exposure step to transfer a
circuit pattern image from a mask or reticle to an exposure field
on a resist-covered wafer. In a first embodiment, the method
includes propagating sound waves through an exposure liquid to
obliterate microbubbles in the liquid before the exposure step. In
a second embodiment, the method includes propagating sound waves
through the exposure liquid both before and during the exposure
step. In a third embodiment, the method includes intermittently
propagating sound waves through the exposure liquid during the
exposure step. The megasonic power applied by the megasonic plate
or plates to the exposure liquid is preferably about 10-1,000
kHz.
[0038] Any of a variety of exposure liquids are suitable for the
megasonic immersion lithography method of the present invention. In
one embodiment, the exposure liquid includes NH.sub.4,
H.sub.2O.sub.2 and H.sub.2O in a concentration by volume ratio of
typically about 1:1:10.about.1:1:1000. In another embodiment, the
exposure liquid includes NH.sub.4 and H.sub.2O in a concentration
by volume ratio of typically about 1:10.about.1:1000. In still
another embodiment, the exposure liquid is deionized (DI) water. In
yet another embodiment, the exposure liquid is ozonated (O.sub.3)
water, having an ozone concentration of typically about
1.about.1000 ppm. The exposure liquid may include a non-ionic
surfactant, an anionic surfactant or a cationic surfactant having a
concentration in the range of typically about 1.about.1000 ppm.
[0039] Referring initially to FIG. 1, a megasonic immersion
lithography exposure apparatus, hereinafter exposure apparatus, of
the present invention is generally indicated by reference numeral
10. The exposure apparatus 10 includes a wafer stage 28 for
supporting a wafer 34 having a photoresist layer (not shown)
deposited thereon. An optical housing 12 contains an optical system
having a laser (not shown) and the last objective lens 16 which is
positioned above the wafer stage 28. A mask or reticle(not shown)
is removably inserted in the optical housing 12, above the lens 16.
The mask or reticle includes a circuit pattern (not shown) which is
to be transmitted onto the photoresist layer on the wafer 34 during
a lithography process, which will be hereinafter described. An
optical transfer water immersion chamber 18 is provided beneath the
last objective lens 16 and is disposed above the wafer stage 28.
During lithography, the laser beam through the mask or reticle,
which produces a circuit pattern image that is transmitted through
the last objective lens 16 and the optical transfer water immersion
chamber 18, respectively, and onto the wafer 34.
[0040] An inlet liquid reservoir 20, from which extends an inlet
conduit 22, contains a supply of exposure liquid 32. A discharge
conduit 22a extends from the inlet conduit 22 and is provided in
fluid communication with the optical transfer chamber 18. An outlet
liquid reservoir 26 is provided in fluid communication with the
optical transfer chamber 18 through a collecting conduit 24a and an
outlet conduit 24, respectively. According to the present
invention, a megasonic plate 30 is provided on the inlet conduit
22, according to the knowledge of those skilled in the art, to
generate sonic waves (not shown) in the exposure liquid 32 as the
liquid 32 is distributed through the inlet conduit 22.
[0041] In operation of the exposure apparatus 10, as hereinafter
further described, the exposure liquid 32 is distributed from the
inlet liquid reservoir 20, through the inlet conduit 22 and
discharge conduit 22a, respectively, and into the optical transfer
water immersion chamber 18. The megasonic plate 30 generates sonic
waves (not shown) in the exposure liquid 32, obliterating all or
most of the microbubbles in the exposure liquid 32. The laser beam
from the optical housing 12 which produces a circuit pattern image
is transmitted through the lens last objective 16 and exposure
liquid 32 contained in the optical transfer water immersion chamber
18, respectively, and is projected onto the photoresist coated on
the wafer 34. The exposure liquid 32 is continuous pumped from the
optical transfer water immersion chamber 18, through the collecting
conduit 24a and outlet conduit 24, respectively, and into the
outlet liquid reservoir 26.
[0042] Referring next to FIGS. 3A-3C, in conjunction with FIG. 1,
the exposure apparatus 10 can be operated according to one of three
modes. According to the flow diagram of FIG. 3A, the optical
transfer water immersion chamber 18 is initially positioned over an
exposure field on the wafer 34, as indicated in step 1. The
megasonic plate 30 is then turned on (step 2), followed by
distribution of the exposure liquid 32 from the inlet liquid
reservoir 20, through the inlet conduit 22 and into the optical
transfer water immersion chamber 18, respectively (step 3). As the
exposure liquid 32 passes through the inlet conduit 22, the
megasonic plate 30 induces the formation of sonic waves in the
exposure liquid 32. The sonic waves obliterate microbubbles in the
exposure liquid 32, such that the exposure liquid 32 is
substantially devoid of microbubbles upon entry into the optical
transfer chamber 18, Furthermore, the sonic waves also obliterate
the microbubbles on the resist surface through the sonic wave
transfer from discharge conduit 22a to optical transfer water
immersion chamber 18.
[0043] As indicated in step 4, the megasonic plate 30 is turned off
prior to exposing the exposure field on the wafer 34 to the circuit
pattern image transmitted through the exposure liquid 32 (step 5),
the exposure liquid 32 transmits a high-resolution circuit pattern
image, which is undistorted by microbubbles onto the surface of the
photoresist on the wafer 34. After completion of the exposure step
5, the optical transfer chamber 18 is moved to the next exposure
field on the wafer 34 and steps 1-5 are repeated, as indicated in
step 6.
[0044] According to the flow diagram of FIG. 3B, the optical
transfer water immersion chamber 18 is initially positioned over an
exposure field on the wafer 34, as indicated in step 1a. The
megasonic plate 30 is then turned on (step 2a), followed by
distribution of the exposure liquid 32 from the inlet liquid
reservoir 20, through the inlet conduit 22 and into the optical
transfer water immersion chamber 18, respectively (step 3a). The
sonic waves generated by the megasonic plate 30 obliterate
microbubbles in the exposure liquid 32 passing through the inlet
conduit 22, such that the exposure liquid 32 is substantially
devoid of microbubbles upon entry into the optical transfer chamber
18 and the microbubbles adhered on the wafer 34 is therefore
obliterate.
[0045] As indicated in step 4a, while the megasonic plate 30
remains on, the photoresist on the wafer 34 is exposed.
Accordingly, during the exposure step (step 4a), the megasonic
plate 20 continues to obliterate microbubbles in the exposure
liquid 32 and on the wafer resist surface 34. The circuit pattern
image transmitted from the optical housing 12 through the optical
transfer chamber 18 is therefore undistorted by microbubbles and is
projected onto the surface of the photoresist on the wafer 34 with
a high resolution. After completion of the exposure step 4a, the
megasonic plate 30 may be turned off (FIG. 5a). The optical
transfer chamber 18 is then moved to the next exposure field on the
wafer 34 and steps 1-5 are repeated, as indicated in step 6a.
[0046] According to the flow diagram of FIG. 3C, the optical
transfer chamber 18 is initially positioned over an exposure field
on the wafer 34, as indicated in step 1b. The megasonic plate 30 is
then turned on (step 2b), and the exposure liquid 32 is distributed
from the inlet liquid reservoir 20, through the inlet conduit 22
and into the optical transfer chamber 18, respectively (step 3b).
The sonic waves generated by the megasonic plate 30 obliterate
microbubbles in the exposure liquid 32 and on the wafer resist
surface 34, such that the exposure liquid 32 is substantially
devoid of microbubbles upon entry into the optical transfer chamber
18 and adhesion on top of the resist surface 34.
[0047] As indicated in step 4b, the exposure step is carried out
while the megasonic plate 30 is intermittently turned on and off.
Accordingly, during exposure of the wafer 34, the megasonic plate
20 continues to obliterate microbubbles in the exposure liquid 32.
After completion of the exposure step 4b, the optical transfer
chamber 18 is moved to the next exposure field on the wafer 34 and
steps 1-5 are repeated, as indicated in step 5b.
[0048] According to the flow diagram of FIG. 3D, the optical
transfer water immersion chamber 18 is initially positioned over an
exposure field on the wafer 34, as indicated in step 1c. The
megasonic plate 30 is then turned on (step 2c), followed by
distribution of the exposure liquid 32 from the inlet liquid
reservoir 20, through the inlet conduit 22 and into the optical
transfer water immersion chamber 18, respectively (step 3c). The
sonic waves generated by the megasonic plate 30 obliterate
microbubbles in the exposure liquid 32 passing through the inlet
conduit 22, such that the exposure liquid 32 is substantially
devoid of microbubbles upon entry into the optical transfer chamber
18 and the microbubbles adhered on the wafer 34 is therefore
obliterate.
[0049] As indicated in step 4a, while the megasonic plate 30
remains on, the photoresist on the wafer 34 is exposed.
Accordingly, during the exposure step (step 4c), the megasonic
plate 20 continues to obliterate microbubbles in the exposure
liquid 32 and on the wafer resist surface 34. The circuit pattern
image transmitted from the optical housing 12 through the optical
transfer chamber 18 is therefore undistorted by microbubbles and is
projected onto the surface of the photoresist on the wafer 34 with
a high resolution. After completion of the exposure step 4a, the
megasonic plate 30 may be still turned on. The optical transfer
chamber 18 is then moved to the next exposure field on the wafer 34
and steps 4c-5c are repeated, as indicated in step 6c.
[0050] According to the flow diagram of FIG. 3E, the optical
transfer water immersion chamber 18 is initially positioned over an
exposure field on the wafer 34, as indicated in step 1d. The
megasonic plate 30 is then turned on (step 2d), followed by
distribution of the first liquid 32 from the inlet liquid reservoir
20, through the inlet conduit 22 and into the optical transfer
water immersion chamber 18, respectively (step 3d). The sonic waves
generated by the megasonic plate 30 obliterate microbubbles in the
exposure liquid 32 passing through the inlet conduit 22 and
removing particle on the low surface of the last objective lens
108, such that the exposure liquid 32 is substantially devoid of
microbubbles upon entry into the optical transfer chamber 18 and
the particles adhered on the low surface of the last objective lens
108 is therefore obliterate.
[0051] As indicated in step 4D, while the megasonic plate 30
remains on, followed by distribution of the second liquid from the
inlet liquid reservoir 20, through the inlet conduit 22 and into
the optical transfer water immersion chamber 18 to replace the
first liquid (step 4d), the photoresist on the wafer 34 is exposed.
Accordingly, during the exposure step (step 6d), the megasonic
plate does not turn on (step 5d). The circuit pattern image
transmitted from the optical housing 12 through the optical
transfer water immersion chamber 18 is therefore undistorted by
particles and is projected onto the surface of the photoresist on
the wafer 34 with a high resolution. After completion of the
exposure step 6d, the optical transfer chamber 18 is then moved to
the next exposure field on the wafer 34 and steps 6d-7d are
repeated, as indicated in step 6d.
[0052] According to the flow diagram of FIG. 3F, the optical
transfer water immersion chamber 18 is initially positioned over an
exposure field on the wafer 34, as indicated in step 1e. The
megasonic plate 30 is then turned on (step 2e), followed by
distribution of the first liquid 32 from the inlet liquid reservoir
20, through the inlet conduit 22 and into the optical transfer
water immersion chamber 18, respectively (step 3e). The sonic waves
generated by the megasonic plate 30 obliterate microbubbles in the
exposure liquid 32 passing through the inlet conduit 22 and
removing particle on the low surface of the last objective lens
108, such that the exposure liquid 32 is substantially devoid of
microbubbles upon entry into the optical transfer chamber 18 and
the particles adhered on the low surface of the last objective lens
108 is therefore obliterate.
[0053] As indicated in step 4e, while the megasonic plate 30
remains on, followed by distribution of the second liquid from the
inlet liquid reservoir 20, through the inlet conduit 22 and into
the optical transfer water immersion chamber 18 to replace the
first liquid (step 4e), the photoresist on the wafer 34 is exposed.
Accordingly, during the exposure step (step 5e), the megasonic
plate still turn on (step 2e). The circuit pattern image
transmitted from the optical housing 12 through the optical
transfer water immersion chamber 18 is therefore undistorted by
particles and is projected onto the surface of the photoresist on
the wafer 34 with a high resolution. After completion of the
exposure step 5e, the optical transfer chamber 18 is then moved to
the next exposure field on the wafer 34 and steps 5e-6e are
repeated, as indicated in step 5e.
[0054] Referring next to FIG. 2, in an alternative embodiment of
the exposure apparatus, generally indicated by reference numeral
10a, an annular megasonic plate 30a is provided around the optical
transfer water immersion chamber 18. The exposure apparatus 10a can
be operated according to the flow diagram of FIG. 3A, wherein the
annular megasonic plate 30a is operated after the exposure liquid
32 is distributed into the optical transfer water immersion chamber
18 and then turned off prior to the exposure step; according to the
flow diagram of FIG. 3B, wherein the annular megasonic plate 30a
remains on during distribution of the exposure liquid 32 into the
optical transfer water immersion chamber 18 and throughout the
exposure process; or according to the flow diagram of FIG. 3C,
wherein the annular megasonic plate 30a is turned on intermittently
during the exposure step. In any case, the exposure liquid 32
contained in the optical transfer chamber 18 is substantially
devoid of microbubbles which could otherwise distort the circuit
pattern image transmitted to the wafer 34 during the exposure
step.
[0055] Referring next to FIGS. 4 and 6, an illustrative embodiment
of a non-manual lens cleaning module according to the present
invention is generally indicated by reference numeral 101 in FIG.
4. As shown in FIG. 6, the lens cleaning module 101 is suitable for
implementation in conjunction with an exposure apparatus, 130,
which may be conventional. A UV source 131 which emits ultraviolet
light is provided at one end of the exposure apparatus 130.
Preferably, the UV source 131 emits UV light having less than 480
nm. An objective lens 133 is provided at the opposite end of the
exposure apparatus 130. Preferably, the objective lens 133 has an
N.A. of larger than about 0.35. A condenser element 132 is provided
between the UV source 131 and the objective lens 133 to condense
the ultraviolet light before it passes through the objective lens
133. A mask 134 is provided between the condenser element 132 and
the objective lens 133. A wafer 135 is supported on a wafer stage
(not shown) beneath or adjacent to the objective lens 133. The lens
cleaning module 101 may include a heating/drying module 114 for
drying the lens 110 after cleaning.
[0056] In operation of the exposure apparatus 130, the UV source
131 emits a beam of ultraviolet light, which passes first through
the condenser element 132, then through the mask 134 and objective
lens 133, respectively. The mask 134 enables passage of light which
corresponds to the circuit pattern to be transferred to the wafer
135. The objective lens 133 focuses the light, in the circuit
pattern image defined by the mask 134, on the wafer 135. The lens
cleaning module 101 can be incorporated into the exposure apparatus
130 to remove particles, liquid marks and residues from the
objective lens 133 in order to enhance the exposure quality of the
exposure apparatus 130.
[0057] As shown in FIG. 4, the lens cleaning module 101 typically
includes a scanning stage 102 which has bi-directional movement
capability and is adapted to support a wafer 112 beneath the
exposure apparatus (not shown), such as the exposure apparatus 130
which was heretofore described with respect to FIG. 6, for example.
A dish 103 is provided above the scanning stage 102. The dish 103
includes a central dish opening 104 having a beveled dish surface
105. A cleaning fluid 108 is contained in the dish opening 104 of
the dish 103. The objective lens 110 of the exposure apparatus is
seated against the beveled dish surface 105 of the dish 103 and
contacts the cleaning fluid 108. The mask 111 of the exposure
apparatus is provided above the lens 110. The cleaning fluid 108
may be acetone, IPA (isopropyl alcohol) or other solvent which does
not contain water or fluoride and is incapable of damaging,
corroding or reacting with the surface coating of the objective
lens 110. Accordingly, before, during and after exposure of the
wafer 112 through the mask 111 and lens 110, the fluid 108 removes
particles, liquid marks and residues from the lens 110, thereby
enhancing the exposure quality of the exposure apparatus and the
precision of circuit pattern images transferred from the mask 111
to the wafer 112. The heating/drying module 114 may utilize
thermal, gas spray or other methods known by those skilled in the
art to facilitate the evaporation of the cleaning fluid 108 from
the objective lens 110.
[0058] Referring next to FIG. 5, another illustrative embodiment of
the lens cleaning module, of the present invention is generally
indicated by reference numeral 116. The lens cleaning module 116
typically includes a scanning stage 117, which may have
bi-directional movement capability, as shown by the arrow, and is
adapted to support a wafer 124. A fluid retaining wall 118 is
provided on the scanning stage 117 and is adapted to contain a
cleaning fluid 119 on the scanning stage 117. The lens 122 of the
exposure apparatus contacts the cleaning fluid 119, and the mask
123 is provided above the lens 122. Accordingly, during exposure of
the wafer 124, the cleaning fluid 119 removes particles, liquid
marks and residues from the lens 122, thereby enhancing the
exposure quality of the exposure apparatus and the precision of
circuit pattern images transferred from the mask 123 to the wafer
124. The lens cleaning module 116 may include a heating/drying
module 126 which may utilize thermal, gas spray or other methods
known by those skilled in the art to facilitate the evaporation of
the cleaning fluid 119 from the objective lens 122.
[0059] Referring next to FIG. 7, still another illustrative
embodiment of the lens cleaning module of the present invention is
generally indicated by reference numeral 140. The lens cleaning
module 140 includes a wafer stage 141 which is adapted to support a
wafer 156. The optical housing 142 of the exposure apparatus is
disposed above the wafer stage 141, and the lens 143 is provided on
the optical housing 142. A liquid supply tank 146 is provided at
one side of the optical housing 142 and contains a supply of
cleaning liquid 144. A liquid supply conduit 147 extends from the
liquid supply tank 146 to a liquid collecting area 148 beneath the
lens 143. A liquid recovery tank 150 is provided at the opposite
side of the optical housing 142. A liquid recovery conduit 149
extends from the liquid recovery tank 150 to the liquid collecting
area 148, typically opposite the liquid supply conduit 147. A
liquid sealing member 152 may be supported by a support 153 and
engage the upper edge of the wafer stage 141, beneath the liquid
recovery tank 150, to prevent the inadvertent flow of cleaning
liquid 144 from the wafer stage 141. The lens cleaning module 140
may include a heating/drying module 158 which may utilize thermal,
gas spray or other methods known by those skilled in the art to
facilitate the evaporation of the cleaning liquid 144 from the
objective lens 143.
[0060] In use of the lens cleaning module 140, cleaning liquid 144
is distributed from the liquid supply tank 146, through the liquid
supply conduit 147 to the liquid collecting area 148, respectively.
Simultaneously, the cleaning liquid 144 is pumped from the liquid
collecting area 148, through the liquid recovery area 149 and into
the liquid recovery tank 150, respectively. Accordingly, the lens
143 is continually exposed to the cleaning liquid 144 flowing
through the liquid collecting area 148, thus removing particles,
liquid marks and residues from the lens 122 and enhancing the
exposure quality of the exposure apparatus and the precision of
circuit pattern images transferred from the mask 123 to the wafer
124.
[0061] Referring next to FIG. 8A, yet another illustrative
embodiment of the lens cleaning module according to the present
invention is generally indicated by reference numeral 160. The lens
cleaning module 160 includes a scanning stage 161 for supporting a
wafer (not shown). A cleaning stage 162, which may be removable, is
positional above the scanning stage 161, and at least one cleaning
unit 163 is provided on the upper surface of the cleaning stage
162, beneath the objective lens 168 of the exposure apparatus. Each
cleaning unit 163 may be fixedly or pivotally mounted on the
cleaning stage 162. Each cleaning unit 163 typically includes a
central dispensing nozzle 164, and a collecting annulus 165, which
encircles the dispensing nozzle 164. An inlet conduit 166 extends
through the cleaning stage 162 and is provided in fluid
communication with the dispensing nozzle 164. A supply reservoir
(not shown) which contains a supply of cleaning liquid 169 is
provided in fluid communication with the inlet conduit 166. An
outlet conduit 167 extends from the collecting annulus 165. A
stand-by area (not shown) for the cleaning stage 162 may be
provided next to the lens cleaning module 160. The lens cleaning
module 160 may include a heating/drying module 182 which may
utilize thermal, gas spray or other methods known by those skilled
in the art to facilitate the evaporation of the cleaning liquid 169
from the objective lens 168.
[0062] In use of the lens cleaning module 160, the cleaning liquid
169 is distributed through the inlet conduit 166 and ejected from
the dispensing nozzle 164 and against the lens 168 to remove
particles, liquid marks and residues from the lens 168. The
cleaning liquid 169 falls into the collecting annulus 165 and is
distributed through the outlet conduit 167 to a suitable receptacle
or outlet (not shown).
[0063] Referring next to FIG. 8B, still another embodiment of the
lens cleaning module according to the present invention is
generally indicated by reference numeral 170. The lens cleaning
module 170 includes a scanning stage 171 for supporting a wafer
(not shown). A cleaning stage 172 is provided above the scanning
stage 171. At least one cleaning unit 179 is provided on the
cleaning stage 172. Each cleaning unit 179 may be fixedly or
pivotally mounted on the cleaning stage 172. Each cleaning unit 179
includes a dispensing nozzle 173 which is directed toward the
objective lens 177 of the exposure apparatus and a collector 174
which is adjacent to the dispensing nozzle 173. An inlet conduit
175 is provided in fluid communication with the dispensing nozzle
173 and is connected to a supply (not shown) of cleaning liquid
178. An outlet conduit 176 extends from the collector 174. The lens
cleaning module 170 may include a heating/drying module 184 which
may utilize thermal, gas spray or other methods known by those
skilled in the art to facilitate the evaporation of the cleaning
liquid 178 from the objective lens 177.
[0064] In use of the lens cleaning module 170, the cleaning liquid
178 is distributed through the inlet conduit 175 and ejected from
the dispensing nozzle 173, against the lens 177 to remove
particles, liquid marks and residues from the lens 177. After
striking the lens 177, the cleaning liquid 178 falls into the
collector 174 and is distributed through the outlet conduit 176 to
a suitable receptacle or outlet (not shown).
[0065] In the various embodiments, the lens cleaning modules of the
present invention can be integrated with the lithography system of
which they are a part for automated cleaning of the objective lens
in the exposure apparatus. Accordingly, pre-cleaning and
post-cleaning of the objective lens before and after exposure,
respectively, is possible. The cycle time of each cleaning cycle
may be set by recipe for automatic implementation. The frequency of
lens cleaning can be as high as once per exposed wafer, thus
decreasing periodic maintenance (PM) manpower and cycle time to
maintain consistent maintenance quality. Furthermore, the lens
cleaning module can be movable with respect to the exposure
apparatus to facilitate cleaning and maintenance of the lens
cleaning module, for example. Moreover, each lens cleaning module
may utilize contact with a physical object such as a sponge, for
example, alone or in combination with a cleaning fluid or immersion
liquid, as was heretofore described. In that case, the lens
cleaning module typically includes a contacting material such as a
sponge; a cleaning fluid or solvent which is contacted by the
contacting material prior to contact of the material with the lens;
and a collecting system for collecting the fluid or solvent.
Referring again to FIG. 6, each lens cleaning module may be adapted
to additionally or alternatively clean the condenser element 132,
windows (not shown) or other element or elements of the exposure
apparatus 130 of which they are a part.
[0066] While the preferred embodiments of the invention have been
described above, it will be recognized and understood that various
modifications can be made in the invention and the appended claims
are intended to cover all such modifications which may fall within
the spirit and scope of the invention.
* * * * *