| Patent | Date |
|---|
Semiconductor Fabrication Apparatus And Method Of Using The Same
App 20220252989 - Chih; Yu-Der ; et al. | 2022-08-11 |
Micro detector
Grant 11,335,609 - Lin , et al. May 17, 2 | 2022-05-17 |
Detection Using Semiconductor Detector
App 20210407764 - KING; Ya-Chin ; et al. | 2021-12-30 |
Method of fabricating an integrated circuit with non-printable dummy features
Grant 11,061,317 - Lin , et al. July 13, 2 | 2021-07-13 |
Defect Measurement Method
App 20210159129 - LIN; Burn-Jeng ; et al. | 2021-05-27 |
Immersion lithography system using a sealed wafer bath
Grant 11,003,097 - Lin , et al. May 11, 2 | 2021-05-11 |
Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity
Grant 10,811,225 - Lin , et al. October 20, 2 | 2020-10-20 |
Micro Detector And Defect Measurement Method
App 20200321255 - LIN; Burn-Jeng ; et al. | 2020-10-08 |
Immersion Lithography System Using A Sealed Wafer Bath
App 20200124992 - Lin; Burn Jeng ; et al. | 2020-04-23 |
Method Of Fabricating An Integrated Circuit With A Pattern Density-outlier-treatment For Optimized Pattern Density Uniformity
App 20200027699 - LIN; Jyuh-Fuh ; et al. | 2020-01-23 |
Immersion lithography system using a sealed wafer bath
Grant 10,520,836 - Lin , et al. Dec | 2019-12-31 |
Method of Fabricating an Integrated Circuit with Non-Printable Dummy Features
App 20190339610 - Lin; Jyuh-Fuh ; et al. | 2019-11-07 |
Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity
Grant 10,431,423 - Lin , et al. O | 2019-10-01 |
Method of fabricating an integrated circuit with non-printable dummy features
Grant 10,359,695 - Lin , et al. | 2019-07-23 |
Method Of Fabricating An Integrated Circuit With A Pattern Density-outlier-treatment For Optimized Pattern Density Uniformity
App 20190214227 - LIN; Jyuh-Fuh ; et al. | 2019-07-11 |
Immersion Lithography System Using a Sealed Wafer Bath
App 20190113855 - Lin; Burn Jeng ; et al. | 2019-04-18 |
Immersion lithography system using a sealed wafer bath
Grant 10,168,625 - Lin , et al. J | 2019-01-01 |
Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity
Grant 10,170,276 - Lin , et al. J | 2019-01-01 |
Method and apparatus for planarizing material layers
Grant 9,934,991 - Lin April 3, 2 | 2018-04-03 |
Apparatus for charged particle lithography system
Grant 9,911,575 - Wang , et al. March 6, 2 | 2018-03-06 |
Systems and methods for high-throughput and small-footprint scanning exposure for lithography
Grant 9,810,994 - Lin , et al. November 7, 2 | 2017-11-07 |
Immersion Lithography System Using a Sealed Wafer Bath
App 20170299968 - Lin; Burn Jeng ; et al. | 2017-10-19 |
Immersion lithography system using a sealed wafer bath
Grant 9,696,634 - Lin , et al. July 4, 2 | 2017-07-04 |
Method Of Fabricating An Integrated Circuit With A Pattern Density-outlier-treatment For Optimized Pattern Density Uniformity
App 20170186584 - LIN; Jyuh-Fuh ; et al. | 2017-06-29 |
Method of Fabricating an Integrated Circuit With Non-Printable Dummy Features
App 20170176849 - LIN; JYUH-FUH ; et al. | 2017-06-22 |
Grid refinement method
Grant 9,678,434 - Wang , et al. June 13, 2 | 2017-06-13 |
Grid Refinement Method
App 20170102624 - Wang; Wen-Chuan ; et al. | 2017-04-13 |
Systems And Methods For High-throughput And Small-footprint Scanning Exposure For Lithography
App 20170082926 - Lin; Burn Jeng ; et al. | 2017-03-23 |
Method of fabricating an integrated circuit with non-printable dummy features
Grant 9,594,862 - Lin , et al. March 14, 2 | 2017-03-14 |
Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity
Grant 9,552,964 - Lin , et al. January 24, 2 | 2017-01-24 |
Grid refinement method
Grant 9,529,271 - Wang , et al. December 27, 2 | 2016-12-27 |
Multiple edge enabled patterning
Grant 9,524,939 - Shieh , et al. December 20, 2 | 2016-12-20 |
Systems and methods for high-throughput and small-footprint scanning exposure for lithography
Grant 9,519,225 - Lin , et al. December 13, 2 | 2016-12-13 |
Apparatus for Charged Particle Lithography System
App 20160322199 - WANG; SHIH-CHI ; et al. | 2016-11-03 |
Method of fabricating an integrated circuit with optimized pattern density uniformity
Grant 9,436,787 - Lin , et al. September 6, 2 | 2016-09-06 |
Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity
Grant 9,436,788 - Lin , et al. September 6, 2 | 2016-09-06 |
Grid Refinement Method
App 20160246912 - WANG; WEN-CHUAN ; et al. | 2016-08-25 |
Apparatus for charged particle lithography system
Grant 9,390,891 - Wang , et al. July 12, 2 | 2016-07-12 |
Multiple Edge Enabled Patterning
App 20160190070 - Shieh; Ming-Feng ; et al. | 2016-06-30 |
Grid refinement method
Grant 9,329,488 - Wang , et al. May 3, 2 | 2016-05-03 |
Method and apparatus for planarizing a polymer layer
Grant 9,330,933 - Lin May 3, 2 | 2016-05-03 |
Systems And Methods For High-throughput And Small-footprint Scanning Exposure For Lithography
App 20160091795 - Lin; Burn Jeng ; et al. | 2016-03-31 |
Pattern generator for a lithography system
Grant 9,291,913 - Yu , et al. March 22, 2 | 2016-03-22 |
Multiple edge enabled patterning
Grant 9,287,125 - Shieh , et al. March 15, 2 | 2016-03-15 |
Grid Refinement Method
App 20160055291 - Wang; Wen-Chuan ; et al. | 2016-02-25 |
Apparatus for Charged Particle Lithography System
App 20160049278 - Wang; Shih-Chi ; et al. | 2016-02-18 |
Systems and methods for high-throughput and small-footprint scanning exposure for lithography
Grant 9,229,332 - Lin , et al. January 5, 2 | 2016-01-05 |
Method of Fabricating an Integrated Circuit with Non-Printable Dummy Features
App 20150370942 - Lin; Jyuh-Fuh ; et al. | 2015-12-24 |
Method of Fabricating an Integrated Circuit with a Pattern Density-Outlier-Treatment for Optimized Pattern Density Uniformity
App 20150371821 - Lin; Jyuh-Fuh ; et al. | 2015-12-24 |
Methods for electron beam patterning
Grant 9,182,660 - Wang , et al. November 10, 2 | 2015-11-10 |
Grid refinement method
Grant 9,176,389 - Wang , et al. November 3, 2 | 2015-11-03 |
Method of Fabricating an Integrated Circuit with Block Dummy for Optimized Pattern Density Uniformity
App 20150294057 - Lin; Jyuh-Fuh ; et al. | 2015-10-15 |
Method of Fabricating an Integrated Circuit with Optimized Pattern Density Uniformity
App 20150294056 - Lin; Jyuh-Fuh ; et al. | 2015-10-15 |
Method for image dithering for lithographic processes
Grant 9,147,377 - Chen , et al. September 29, 2 | 2015-09-29 |
Immersion Litography System Using A Sealed Wafer Bath
App 20150261103 - LIN; Burn Jeng ; et al. | 2015-09-17 |
Multiple-patterning overlay decoupling method
Grant 9,134,627 - Wang , et al. September 15, 2 | 2015-09-15 |
Pattern Generator For A Lithography System
App 20150212423 - Yu; Chen-Hua ; et al. | 2015-07-30 |
Immersion lithography system using a sealed wafer bath
Grant 9,046,789 - Lin , et al. June 2, 2 | 2015-06-02 |
Pattern generator for a lithography system
Grant 9,001,308 - Yu , et al. April 7, 2 | 2015-04-07 |
Mask assignment optimization
Grant 9,003,336 - Huang , et al. April 7, 2 | 2015-04-07 |
Efficient scan for E-beam lithography
Grant 8,987,689 - Chen , et al. March 24, 2 | 2015-03-24 |
Systems And Methods For High-throughput And Small-footprint Scanning Exposure For Lithography
App 20150077731 - Lin; Burn Jeng ; et al. | 2015-03-19 |
Long-range lithographic dose correction
Grant 8,984,452 - Chen , et al. March 17, 2 | 2015-03-17 |
Method for electron beam proximity correction with improved critical dimension accuracy
Grant 8,972,908 - Chen , et al. March 3, 2 | 2015-03-03 |
Long-range Lithographic Dose Correction
App 20150052489 - Chen; Cheng-Hung ; et al. | 2015-02-19 |
Photoresist and patterning process
Grant 8,956,806 - Wang , et al. February 17, 2 | 2015-02-17 |
Method for Electron Beam Proximity Correction with Improved Critical Dimension Accuracy
App 20150040079 - Chen; Cheng-Hung ; et al. | 2015-02-05 |
Method for Image Dithering
App 20150035851 - Chen; Cheng-Hung ; et al. | 2015-02-05 |
Systems and methods providing electron beam writing to a medium
Grant 8,927,947 - Wang , et al. January 6, 2 | 2015-01-06 |
Grid Refinement Method
App 20140368806 - Wang; Wen-Chuan ; et al. | 2014-12-18 |
Stacked mask
Grant 8,906,583 - Lin , et al. December 9, 2 | 2014-12-09 |
Electron beam lithography system and method for improving throughput
Grant 8,852,849 - Shin , et al. October 7, 2 | 2014-10-07 |
Photoresist materials and photolithography processes
Grant 8,848,163 - Wang , et al. September 30, 2 | 2014-09-30 |
Electron beam lithography system and method for improving throughput
Grant 8,846,278 - Shin , et al. September 30, 2 | 2014-09-30 |
Multiple Edge Enabled Patterning
App 20140252559 - Shieh; Ming-Feng ; et al. | 2014-09-11 |
Multiple-grid exposure method
Grant 8,828,632 - Wang , et al. September 9, 2 | 2014-09-09 |
Mask Assignment Optimization
App 20140248768 - Huang; Wen-Chun ; et al. | 2014-09-04 |
Grid refinement method
Grant 8,822,106 - Wang , et al. September 2, 2 | 2014-09-02 |
Grid refinement method
Grant 8,822,107 - Wang , et al. September 2, 2 | 2014-09-02 |
Systems And Methods Providing Electron Beam Writing To A Medium
App 20140217305 - Wang; Wen-Chuan ; et al. | 2014-08-07 |
Immersion lithography system using direction-controlling fluid inlets
Grant 8,767,178 - Lin , et al. July 1, 2 | 2014-07-01 |
Stacked Mask
App 20140178804 - Lin; Burn Jeng ; et al. | 2014-06-26 |
Method for proximity correction
Grant 8,762,900 - Shin , et al. June 24, 2 | 2014-06-24 |
Method for metal correlated via split for double patterning
Grant 8,762,899 - Lin , et al. June 24, 2 | 2014-06-24 |
Multiple edge enabled patterning
Grant 8,730,473 - Shieh , et al. May 20, 2 | 2014-05-20 |
Devices and methods for improved reflective electron beam lithography
Grant 8,722,286 - Yu , et al. May 13, 2 | 2014-05-13 |
Apparatus for method for immersion lithography
Grant 8,693,115 - Lin April 8, 2 | 2014-04-08 |
Multiple tools using a single data processing unit
Grant 8,688,254 - Lin April 1, 2 | 2014-04-01 |
Patterning process and photoresist with a photodegradable base
Grant 8,658,344 - Wang , et al. February 25, 2 | 2014-02-25 |
Apparatus for method for immersion lithography
Grant 8,659,843 - Lin February 25, 2 | 2014-02-25 |
Method For Proximity Correction
App 20140007023 - Shin; Jaw-Jung ; et al. | 2014-01-02 |
Systems and methods providing electron beam writing to a medium
Grant 8,610,083 - Wang , et al. December 17, 2 | 2013-12-17 |
Electron Beam Lithography System and Method for Improving Throughput
App 20130330670 - Shin; Jaw-Jung ; et al. | 2013-12-12 |
Electron Beam Lithography System and Method For Improving Throughput
App 20130327962 - Shin; Jaw-Jung ; et al. | 2013-12-12 |
Devices And Methods For Improved Reflective Electron Beam Lithography
App 20130320225 - Yu; Chen-Hua ; et al. | 2013-12-05 |
Methods For Electron Beam Patterning
App 20130323918 - Wang; Wen-Chuan ; et al. | 2013-12-05 |
Efficient Scan For E-beam Lithography
App 20130320243 - Chen; Cheng-Hung ; et al. | 2013-12-05 |
Non-directional dithering methods
Grant 8,584,057 - Liu , et al. November 12, 2 | 2013-11-12 |
Anisotropic Phase Shifting Mask
App 20130293858 - Lin; Burn Jeng ; et al. | 2013-11-07 |
Device and method for providing wavelength reduction with a photomask
Grant 8,563,198 - Lin , et al. October 22, 2 | 2013-10-22 |
Apparatus and method for immersion lithography
Grant 8,564,759 - Chang , et al. October 22, 2 | 2013-10-22 |
Grid Refinement Method
App 20130273474 - Wang; Wen-Chuan ; et al. | 2013-10-17 |
Grid Refinement Method
App 20130273475 - Wang; Wen-Chuan ; et al. | 2013-10-17 |
Multiple-grid exposure method
Grant 8,530,121 - Wang , et al. September 10, 2 | 2013-09-10 |
Non-directional Dithering Methods
App 20130232453 - Liu; Pei-Yi ; et al. | 2013-09-05 |
Error Diffusion And Grid Shift In Lithography
App 20130232455 - Liu; Pei-Yi ; et al. | 2013-09-05 |
Electron beam lithography system and method for improving throughput
Grant 8,524,427 - Shin , et al. September 3, 2 | 2013-09-03 |
Photoresist materials and photolithography processes
Grant 8,507,177 - Wang , et al. August 13, 2 | 2013-08-13 |
Error diffusion and grid shift in lithography
Grant 8,510,687 - Liu , et al. August 13, 2 | 2013-08-13 |
Multiple-Grid Exposure Method
App 20130203001 - Wang; Wen-Chuan ; et al. | 2013-08-08 |
Immersion fluid for immersion lithography, and method of performing immersion lithography
Grant 8,488,102 - Yeo , et al. July 16, 2 | 2013-07-16 |
Multiple-Patterning Overlay Decoupling Method
App 20130157389 - Wang; Wen-Chuan ; et al. | 2013-06-20 |
Systems And Methods Providing Electron Beam Writing To A Medium
App 20130146780 - Wang; Wen-Chuan ; et al. | 2013-06-13 |
Method For Metal Correlated Via Split For Double Patterning
App 20130130410 - LIN; Burn Jeng ; et al. | 2013-05-23 |
Method for metal correlated via split for double patterning
Grant 8,381,139 - Lin , et al. February 19, 2 | 2013-02-19 |
Systems and methods providing electron beam writing to a medium
Grant 8,368,037 - Wang , et al. February 5, 2 | 2013-02-05 |
Immersion Lithography System Using A Sealed Wafer Bath
App 20120320351 - Lin; Burn Jeng ; et al. | 2012-12-20 |
Electron Beam Lithography System And Method For Improving Throughput
App 20120264062 - Shin; Jaw-Jung ; et al. | 2012-10-18 |
Systems and Methods Providing Electron Beam Writing to a Medium
App 20120235063 - Wang; Wen-Chuan ; et al. | 2012-09-20 |
Immersion Lithography System Using Direction-Controlling Fluid Inlets
App 20120236276 - Lin; Burn Jeng ; et al. | 2012-09-20 |
Patterning process and chemical amplified photoresist with a photodegradable base
Grant 8,216,767 - Wang , et al. July 10, 2 | 2012-07-10 |
Immersion lithography system using a sealed wafer bath
Grant 8,208,116 - Lin , et al. June 26, 2 | 2012-06-26 |
Method For Metal Correlated Via Split For Double Patterning
App 20120135600 - LIN; Burn Jeng ; et al. | 2012-05-31 |
Protective layer on objective lens for liquid immersion lithography applications
Grant 8,179,516 - Lin , et al. May 15, 2 | 2012-05-15 |
Wafer repair system
Grant 8,180,141 - Lin , et al. May 15, 2 | 2012-05-15 |
Multiple Edge Enabled Patterning
App 20120074400 - Shieh; Ming-Feng ; et al. | 2012-03-29 |
High-volume manufacturing massive e-beam maskless lithography system
Grant 8,143,602 - Chen , et al. March 27, 2 | 2012-03-27 |
Apparatus and method for immersion lithography
Grant 8,125,611 - Chang , et al. February 28, 2 | 2012-02-28 |
Lens Cleaning Module
App 20120038894 - Lin; Burn-Jeng ; et al. | 2012-02-16 |
High resolution lithography system and method
Grant 8,110,345 - Lin , et al. February 7, 2 | 2012-02-07 |
Lens cleaning module for immersion lithography apparatus
Grant 8,054,444 - Lin , et al. November 8, 2 | 2011-11-08 |
Apparatus for Method for Immersion Lithography
App 20110267591 - Lin; Burn Jeng | 2011-11-03 |
Apparatus for Method for Immersion Lithography
App 20110261334 - Lin; Burn Jeng | 2011-10-27 |
Device And Method For Providing Wavelength Reduction With A Photomask
App 20110244378 - Lin; Burn Jeng ; et al. | 2011-10-06 |
System and method for manufacturing a mask for semiconductor processing
Grant 7,999,910 - Chen , et al. August 16, 2 | 2011-08-16 |
Immersion lithography apparatus and methods
Grant 7,986,395 - Chang , et al. July 26, 2 | 2011-07-26 |
Apparatus for method for immersion lithography
Grant RE42,556 - Lin July 19, 2 | 2011-07-19 |
Novel Photoresist Materials And Photolithography Processes
App 20110164234 - Wang; Hsien-Cheng ; et al. | 2011-07-07 |
Novel Photoresist Materials And Photolithography Processes
App 20110165515 - Wang; Hsien-Cheng ; et al. | 2011-07-07 |
Photoresist materials and photolithography process
Grant 7,972,761 - Wang , et al. July 5, 2 | 2011-07-05 |
Method and system for a pattern layout split
Grant 7,934,177 - Shin , et al. April 26, 2 | 2011-04-26 |
Anti-corrosion layer on objective lens for liquid immersion lithography applications
Grant 7,924,397 - Lin , et al. April 12, 2 | 2011-04-12 |
Seal ring arrangements for immersion lithography systems
Grant 7,924,401 - Lin , et al. April 12, 2 | 2011-04-12 |
Photoresist And Patterning Process
App 20110070542 - Wang; Chien-Wei ; et al. | 2011-03-24 |
Patterning Process And Chemical Amplified Photoresist With A Photodegradable Base
App 20110059396 - Wang; Chien-Wei ; et al. | 2011-03-10 |
System and method for direct writing to a wafer
Grant 7,851,774 - Lin , et al. December 14, 2 | 2010-12-14 |
Pellicle stress relief
Grant 7,829,248 - Lin , et al. November 9, 2 | 2010-11-09 |
High-volume Manufacturing Massive E-beam Maskless Lithography System
App 20100248158 - Chen; Jeng-Horng ; et al. | 2010-09-30 |
Resist collapse prevention using immersed hardening
Grant 7,767,984 - Lin , et al. August 3, 2 | 2010-08-03 |
Immersion Fluid for Immersion Lithography, and Method of Performing Immersion Lithography
App 20100177289 - Yeo; Yee-Chia ; et al. | 2010-07-15 |
Immersion fluid for immersion lithography, and method of performing immersion lithography
Grant 7,700,267 - Yeo , et al. April 20, 2 | 2010-04-20 |
Exposure scan and step direction optimization
Grant 7,666,576 - Liang , et al. February 23, 2 | 2010-02-23 |
Level adjustment systems and adjustable pin chuck thereof
Grant 7,659,964 - Lin , et al. February 9, 2 | 2010-02-09 |
Method And Apparatus For Planarizing A Polymer Layer
App 20090309253 - Lin; Burn Jeng | 2009-12-17 |
System and Method for Direct Writing to a Wafer
App 20090268184 - Lin; Burn Jeng ; et al. | 2009-10-29 |
Seal Ring Arrangements for Immersion Lithography Systems
App 20090180087 - Lin; Burn Jeng ; et al. | 2009-07-16 |
Seal ring arrangements for immersion lithography systems
Grant 7,517,639 - Lin , et al. April 14, 2 | 2009-04-14 |
Immersion lithography system with wafer sealing mechanisms
Grant 7,501,226 - Lin , et al. March 10, 2 | 2009-03-10 |
Pellicle Stress Relief
App 20090029268 - Lin; Burn Jeng ; et al. | 2009-01-29 |
Method for forming a lithography pattern
Grant 7,482,280 - Chang , et al. January 27, 2 | 2009-01-27 |
Method of heating semiconductor wafer to improve wafer flatness
Grant 7,479,466 - Lu , et al. January 20, 2 | 2009-01-20 |
Supercritical developing for a lithographic process
Grant 7,473,517 - Chang , et al. January 6, 2 | 2009-01-06 |
Apparatus And Method For Immersion Lithography
App 20080309891 - Chang; Ching-Yu ; et al. | 2008-12-18 |
Multiple Tools Using A Single Data Processing Unit
App 20080311314 - Lin; Burn Jeng | 2008-12-18 |
Apparatus And Method For Immersion Lithography
App 20080304025 - Chang; Ching-Yu ; et al. | 2008-12-11 |
Exposure method and apparatus for immersion lithography
Grant 7,420,188 - Chang , et al. September 2, 2 | 2008-09-02 |
Resist collapse prevention using immersed hardening
App 20080203322 - Lin; Burn-Jeng ; et al. | 2008-08-28 |
Double-Decker Pellicle-Mask Assembly
App 20080199783 - Chang; Shih-Ming ; et al. | 2008-08-21 |
Method and System For a Pattern Layout Split
App 20080189672 - Shin; Jaw-Jung ; et al. | 2008-08-07 |
Complementary replacement of material
Grant 7,399,709 - Lin , et al. July 15, 2 | 2008-07-15 |
Mask superposition for multiple exposures
Grant 7,394,080 - Lin July 1, 2 | 2008-07-01 |
Resist collapse prevention using immersed hardening
Grant 7,384,726 - Lin , et al. June 10, 2 | 2008-06-10 |
System and method for photolithography in semiconductor manufacturing
Grant 7,371,671 - Chang , et al. May 13, 2 | 2008-05-13 |
Immersion Lithography System Using A Sealed Wafer Bath
App 20080106710 - Lin; Burn Jeng ; et al. | 2008-05-08 |
Immersion Lithography System Using A Sealed Wafer Bath
App 20080106715 - Lin; Burn Jeng ; et al. | 2008-05-08 |
Process control method
Grant 7,356,380 - Yu , et al. April 8, 2 | 2008-04-08 |
Novel Wafer Repair Method Using Direct-writing
App 20080054191 - Lin; Chin-Hsiang ; et al. | 2008-03-06 |
Novel Photoresist Materials And Photolithography Process
App 20080030692 - WANG; Hsien-Cheng ; et al. | 2008-02-07 |
Method of heating semiconductor wafer to improve wafer flatness
App 20080014763 - Lu; Hsiao-Tzu ; et al. | 2008-01-17 |
Apparatus And Method For Immersion Lithography
App 20080002164 - Chang; Ching-Yu ; et al. | 2008-01-03 |
System and method for processing masks with oblique features
Grant 7,314,689 - Lin , et al. January 1, 2 | 2008-01-01 |
Exposure Scan And Step Direction Optimization
App 20070285639 - LIANG; Fu-Jye ; et al. | 2007-12-13 |
Wafer repair method using direct-writing
Grant 7,307,001 - Lin , et al. December 11, 2 | 2007-12-11 |
Double-decker mask-pellicle assembly
App 20070264582 - Chang; Shih-Ming ; et al. | 2007-11-15 |
Method of forming a fine pattern
App 20070264598 - Chang; Ching-Yu ; et al. | 2007-11-15 |
Level adjustment systems and adjustable pin chuck thereof
App 20070236857 - Lin; Burn-Jeng ; et al. | 2007-10-11 |
Method for manipulating the topography of a film surface
Grant 7,279,267 - Gau , et al. October 9, 2 | 2007-10-09 |
Layout generation and optimization to improve photolithographic performance
Grant 7,266,803 - Chou , et al. September 4, 2 | 2007-09-04 |
Method to reduce CD non-uniformity in IC manufacturing
Grant 7,252,909 - Shin , et al. August 7, 2 | 2007-08-07 |
Method for improving the critical dimension uniformity of patterned features on wafers
Grant 7,234,128 - Gau , et al. June 19, 2 | 2007-06-19 |
Megasonic immersion lithography exposure apparatus and method
Grant 7,224,427 - Chang , et al. May 29, 2 | 2007-05-29 |
Protective Layer On Objective Lens For Liquid Immersion Lithography Applications
App 20070091288 - LIN; Burn Jeng ; et al. | 2007-04-26 |
Wafer edge cleaning process
App 20070093067 - Chang; Ching-Yu ; et al. | 2007-04-26 |
Immersion Lithography Apparatus And Methods
App 20070091287 - CHANG; Ching-Yu ; et al. | 2007-04-26 |
Lithography process to reduce interference
App 20070087291 - Gau; Tsai-Sheng ; et al. | 2007-04-19 |
Exposure method and apparatus for immersion lithography
App 20070085034 - Chang; Ching-Yu ; et al. | 2007-04-19 |
Immersion optical projection system
Grant 7,180,572 - Shih , et al. February 20, 2 | 2007-02-20 |
Method For Forming A Lithography Pattern
App 20070037410 - CHANG; Ching-Yu ; et al. | 2007-02-15 |
Layout generation and optimization to improve photolithographic performance
App 20070028206 - Chou; Shou-Yen ; et al. | 2007-02-01 |
Seal ring arrangements for immersion lithography systems
App 20070008508 - Lin; Burn Jeng ; et al. | 2007-01-11 |
Methods and system for inhibiting immersion lithography defect formation
App 20070004182 - Chang; Ching-Yu ; et al. | 2007-01-04 |
Method for imaging wafers using a projection mask aligner
Grant 7,151,593 - Lin December 19, 2 | 2006-12-19 |
System and method for manufacturing a mask for semiconductor processing
App 20060246357 - Chen; Chia-Jen ; et al. | 2006-11-02 |
Process control method
App 20060196960 - Yu; Shing-Sheng ; et al. | 2006-09-07 |
Apparatus and method for mounting a hard pellicle
App 20060187440 - Lin; Burn Jeng | 2006-08-24 |
Apparatus and method for immersion lithography
Grant 7,091,502 - Gau , et al. August 15, 2 | 2006-08-15 |
System and method for photolithography in semiconductor manufacturing
App 20060172520 - Chang; Ching-Yu ; et al. | 2006-08-03 |
Resist collapse prevention using immersed hardening
App 20060166143 - Lin; Burn-Jeng ; et al. | 2006-07-27 |
Novel wafer repair method using direct-writing
App 20060148109 - Lin; Chin-Hsiang ; et al. | 2006-07-06 |
Mask superposition for multiple exposures
App 20060139603 - Lin; Burn Jeng | 2006-06-29 |
Supercritical developing for a lithographic process
App 20060141399 - Chang; Ching-Yu ; et al. | 2006-06-29 |
Apparatus and method for mounting a hard pellicle
Grant 7,061,589 - Lin June 13, 2 | 2006-06-13 |
Photomask with wavelength reduction material and pellicle
App 20060083997 - Lin; Burn Jeng ; et al. | 2006-04-20 |
Lens cleaning module
App 20060028628 - Lin; Burn-Jeng ; et al. | 2006-02-09 |
Megasonic immersion lithography exposure apparatus and method
App 20060028626 - Chang; Ching-Yu ; et al. | 2006-02-09 |
Immersion optical projection system
App 20050286030 - Shih, Jen-Chieh ; et al. | 2005-12-29 |
Immersion lithography system with wafer sealing mechanisms
App 20050286033 - Lin, Burn Jeng ; et al. | 2005-12-29 |
Method of defining forbidden pitches for a lithography exposure tool
Grant 6,973,636 - Shin , et al. December 6, 2 | 2005-12-06 |
Apparatus and method for immersion lithography
App 20050253090 - Gau, Tsai Sheng ; et al. | 2005-11-17 |
Printable assist lines and the removal of such
Grant 6,929,887 - Lin , et al. August 16, 2 | 2005-08-16 |
System and method for processing masks with oblique features
App 20050164098 - Lin, Burn Jeng ; et al. | 2005-07-28 |
High resolution lithography system and method
App 20050147921 - Lin, Chin-Hsiang ; et al. | 2005-07-07 |
Device and method for providing wavelength reduction with a photomask
App 20050100798 - Lin, Burn Jeng ; et al. | 2005-05-12 |
Anti-corrosion layer on objective lens for liquid immersion lithography applications
App 20050100745 - Lin, Burn Jeng ; et al. | 2005-05-12 |
Method of defining forbidden pitches for a lithography exposure tool
App 20050086629 - Shin, Jaw-Jung ; et al. | 2005-04-21 |
Method for improving the critical dimension uniformity of patterned features on wafers
App 20050076323 - Gau, Tsai-Sheng ; et al. | 2005-04-07 |
Method for manipulating the topography of a film surface
App 20050042552 - Gau, Tsai-Sheng ; et al. | 2005-02-24 |
Immersion fluid for immersion Lithography, and method of performing immersion lithography
App 20050036183 - Yeo, Yee-Chia ; et al. | 2005-02-17 |
Apparatus for method for immersion lithography
Grant 6,788,477 - Lin September 7, 2 | 2004-09-07 |
Apparatus for method for immersion lithography
App 20040075895 - Lin, Burn Jeng | 2004-04-22 |
New method to reduce CD non-uniformity in IC manufacturing
App 20040063038 - Shin, Jaw-Jung ; et al. | 2004-04-01 |
Apparatus and method for mounting a hard pellicle
App 20040043309 - Lin, Burn Jeng | 2004-03-04 |
Hole printing by packing and unpacking using alternating phase-shifting masks
Grant 6,664,011 - Lin , et al. December 16, 2 | 2003-12-16 |
Hole printing by packing and unpacking using alternating phase-shifting masks
App 20030104286 - Lin, Burn-Jeng ; et al. | 2003-06-05 |
Simple repair method for phase shifting masks
Grant 5,795,685 - Liebmann , et al. August 18, 1 | 1998-08-18 |
Step and repeat apparatus having enhanced accuracy and increased throughput
Grant 5,715,064 - Lin February 3, 1 | 1998-02-03 |
Beam address optical storage head
Grant 3,877,784 - Lin April 15, 1 | 1975-04-15 |
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