U.S. patent application number 13/178368 was filed with the patent office on 2011-10-27 for method for measuring dopant concentration during plasma ion implantation.
Invention is credited to MAJEED A. FOAD, SHIJIAN LI.
Application Number | 20110259268 13/178368 |
Document ID | / |
Family ID | 41063479 |
Filed Date | 2011-10-27 |
United States Patent
Application |
20110259268 |
Kind Code |
A1 |
FOAD; MAJEED A. ; et
al. |
October 27, 2011 |
METHOD FOR MEASURING DOPANT CONCENTRATION DURING PLASMA ION
IMPLANTATION
Abstract
Embodiments of the invention generally provide apparatuses for
endpoint detection of dopants. In one embodiment, the apparatus has
a plasma chamber containing a body having sidewalls, a lid, and a
bottom encompassing an interior volume and a substrate support
assembly disposed within the body and having a substrate supporting
surface configured to support a substrate. The apparatus also has a
processing region disposed between the substrate supporting surface
and a gas distribution assembly--which contains a perforated plate
disposed above the substrate supporting surface. The apparatus also
has a plasma source coupled with the body and configured to form an
inductively coupled plasma within the interior region.
Additionally, the apparatus has an optical sensor disposed either
above or below the substrate supporting surface and coupled with a
controller, wherein the controller is configured to derive a
current dopant concentration relative to an amount of radiation
received by the optical sensor.
Inventors: |
FOAD; MAJEED A.; (Sunnyvale,
CA) ; LI; SHIJIAN; (San Jose, CA) |
Family ID: |
41063479 |
Appl. No.: |
13/178368 |
Filed: |
July 7, 2011 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
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12777085 |
May 10, 2010 |
7977199 |
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13178368 |
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12049047 |
Mar 14, 2008 |
7713757 |
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12777085 |
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Current U.S.
Class: |
118/708 |
Current CPC
Class: |
G01N 21/59 20130101;
H01L 22/12 20130101; H01L 22/26 20130101; H01L 21/26513 20130101;
G01N 21/68 20130101 |
Class at
Publication: |
118/708 |
International
Class: |
C23C 16/50 20060101
C23C016/50 |
Claims
1. An apparatus for doping and detecting a doping concentration of
a material disposed on a substrate surface during a plasma doping
process, comprising: a plasma chamber containing a body having
sidewalls, a lid, and a bottom encompassing an interior volume; a
substrate support assembly disposed within the body and having a
substrate supporting surface configured to support a substrate; a
gas distribution assembly containing a perforated plate disposed
above the substrate supporting surface; a processing region within
the interior region and disposed between the gas distribution
assembly and the substrate supporting surface; a plasma source
coupled with the body and configured to form an inductively coupled
plasma above the substrate supporting surface within the interior
region; and an optical sensor disposed below the substrate
supporting surface and coupled with a controller, wherein the
controller is configured to derive a current dopant concentration
relative to an amount of radiation received by the optical
sensor.
2. The apparatus of claim 1, wherein the optical sensor is
positioned to receive the amount of radiation transmitted through
the substrate.
3. The apparatus of claim 1, wherein the amount of radiation is
light generated by the inductively coupled plasma and the optical
sensor is positioned to receive a decreasing amount of the light
proportional to an increasing dopant concentration.
4. The apparatus of claim 1, further comprising a laser source
disposed above the substrate supporting surface, the amount of
radiation is light generated by the laser source, and the optical
sensor is positioned to receive a decreasing amount of the light
proportional to an increasing dopant concentration.
5. The apparatus of claim 1, wherein the optical sensor is
configured to detect light at a predetermined wavelength or
frequency emitted from the inductively coupled plasma generated
above the substrate supporting surface within the interior
region.
6. The apparatus of claim 5, wherein the emitted light is selected
from the group consisting of infrared light, visible light,
ultraviolet light, and combinations thereof.
7. The apparatus of claim 6, wherein the emitted light is infrared
light.
8. The apparatus of claim 1, wherein the plasma source is a
toroidal plasma source.
9. The apparatus of claim 1, wherein the amount of radiation is
light and the controller is configured to generate an initial
signal proportional to the light received by the optical
sensor.
10. The apparatus of claim 9, wherein the controller is configured
to implant the substrate with a dopant during a dopant implantation
process.
11. The apparatus of claim 10, wherein the controller is configured
to modulate light received by the optical sensor proportional to an
increasing dopant concentration.
12. The apparatus of claim 11, wherein the controller is configured
to generate an end point signal proportional to the light received
by the optical sensor once the substrate has a final concentration
of the dopant.
13. The apparatus of claim 12, wherein the controller is configured
to cease the dopant implantation process.
14. An apparatus for doping and detecting a doping concentration of
a material disposed on a substrate surface during a plasma doping
process, comprising: a plasma chamber containing a body having
sidewalls, a lid, and a bottom encompassing an interior volume; a
substrate support assembly disposed within the body and having a
substrate supporting surface configured to support a substrate; a
gas distribution assembly containing a perforated plate disposed
above the substrate supporting surface; a processing region within
the interior region and disposed between the gas distribution
assembly and the substrate supporting surface; a plasma source
coupled with the body and configured to form an inductively coupled
plasma above the substrate supporting surface within the interior
region; and an optical sensor disposed above the substrate
supporting surface and coupled with a controller, wherein the
controller is configured to derive a current dopant concentration
relative to an amount of radiation received by the optical
sensor.
15. The apparatus of claim 14, wherein the optical sensor is
positioned to receive the amount of radiation reflected from the
substrate.
16. The apparatus of claim 14, wherein the amount of radiation is
light generated by the inductively coupled plasma and the optical
sensor is positioned to receive an increasing amount of the light
proportional to an increasing dopant concentration.
17. The apparatus of claim 14, further comprising a laser source
disposed above the substrate supporting surface, the amount of
radiation is light generated by the laser source, and the optical
sensor is positioned to receive an increasing amount of the light
proportional to an increasing dopant concentration.
18. The apparatus of claim 14, further comprising a laser source
disposed below the substrate supporting surface, the amount of
radiation is light generated by the laser source, and the optical
sensor is positioned to receive a decreasing amount of the light
proportional to an increasing dopant concentration.
19. The apparatus of claim 14, wherein the optical sensor is
adapted to detect an emitted light selected from the group
consisting of infrared light, visible light, ultraviolet light, and
combinations thereof.
20. The apparatus of claim 19, wherein the emitted light is
infrared light.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a continuation application of U.S. Ser.
No. 12/777,085 (APPM/011178.C1), filed May 10, 2010, and issued as
U.S. Pat. No. 7,977,199, which is a continuation of U.S. Ser. No.
12/049,047 (APPM/011178), filed Mar. 14, 2008, and issued as U.S.
Pat. No. 7,713,757, which are herein incorporated by reference in
their entirety.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] Embodiments of the invention generally relate to methods for
processing a substrate, and more particularly, to methods for
measuring a dopant concentration of a substrate during a doping
process.
[0004] 2. Description of the Related Art
[0005] It is important to control ion dosage during plasma
processes, such as plasma-enhanced chemical vapor deposition
(PE-CVD) process, high density plasma chemical vapor deposition
(HDP-CVD) process, plasma immersion ion implantation process (P3I),
and plasma etch process. Ion implantation processes in integrated
circuit fabrication particularly require instrumentation and
control to achieve a desired ion dose on a semiconductor
substrate.
[0006] The dose in ion implantation generally refers to the total
number of ions per unit area passing through a surface plane of the
substrate being processing. The implanted ions distribute
themselves throughout the volume of the substrate. The principal
variation in implanted ion density (number of ions per unit volume)
occurs along the direction of the ion flux, usually the
perpendicular (vertical) direction relative to the substrate
surface. The distribution of ion density (ions per unit volume)
along the vertical direction is referred to as the ion implantation
depth profile. Instrumentation and control systems for regulating
ion implant dose (ions per unit area) are sometimes referred to as
dosimetry.
[0007] Ion implantation may be performed in ion beam implant
apparatus and in plasma immersion ion implantation apparatus. Ion
beam implant apparatus, which generate a narrow ion beam that must
be raster-scanned over the surface of the substrate, typically
implant only a single atomic species at one time. The ion current
in such an apparatus is precisely measured and integrated over time
to compute the actual dose. Because the entire ion beam impacts the
substrate and because the atomic species in the beam is known, the
ion implant dose can be accurately determined. This is critical in
an ion beam implant apparatus, because it employs a DC ion source,
which is subject to significant drift in its output current, and
the various grids and electrodes employed in the beam implant
machine drift as well (due to the susceptibility of a DC source to
accumulation of deposited material on component surfaces).
Accordingly, precise dosimetry is essential in an ion beam implant
apparatus. The precisely monitored ion beam current is integrated
over time to compute an instantaneous current implant dose, and the
process is halted as soon as the dose reaches a predetermined
target value.
[0008] In contrast, plasma immersion ion implantation reactors
present a difficult problem in dosimetry. Typically, the atomic
weight of the ions incident on the substrate cannot be precisely
determined because such a reactor employs a precursor gas
containing the desired ion implantation species as well as other
species. For example, plasma immersion ion implantation of boron
usually employs a multi-element compound, such as the precursor
diborane, so that both boron and hydrogen ions may be incident on
the substrate. As a result, determining the boron dose from a
measured current is difficult. Another difficulty in implementing
dosimetry in a plasma immersion ion implantation reactor is that
the plasma ions impact the entire substrate continuously, so that
it is difficult to effect a direct measurement above the substrate
of the total ion current to the substrate. Instead, the dose must
be indirectly inferred from measurements taken over a very small
area. This is particularly true of reactors employing RF (radio
frequency) plasma source power or RF plasma bias power.
[0009] Therefore, there is a need for a method for determining an
end point at a predetermined dopant concentration during a plasma
doping process.
SUMMARY OF THE INVENTION
[0010] Embodiments of the invention generally provide methods and
apparatuses for end point detection at predetermined dopant
concentrations during plasma doping processes. In one embodiment, a
method for detecting a doping concentration on a substrate surface
during a plasma doping process is provided which includes
positioning a substrate within a process chamber, wherein the
substrate has a topside and a backside and is at a temperature of
less than about 250.degree. C., generating a plasma above the
substrate within the process chamber, transmitting a light
generated by the plasma through the substrate, wherein the light
enters the topside and exits the backside of the substrate, and
receiving the light by a sensor positioned below the substrate. The
method further provides generating a signal proportional to the
light received by the sensor, implanting the substrate with a
dopant during a doping process, generating multiple light signals
proportional to a decreasing amount of the light received by the
sensor during the doping process, generating an end point signal
proportional to the light received by the sensor once the substrate
has a final concentration of the dopant, and ceasing the dopant
implantation of the substrate.
[0011] In some embodiments, the method may include generating
multiple signals proportional to an increasing dopant
concentration. The light generated by the plasma may contain
infrared light, visible light, ultraviolet light, or combinations
thereof. In one example, the light contains infrared light.
Usually, the temperature of the substrate during the plasma doping
process may be within a range from about 0.degree. C. to about
90.degree. C., preferably, about 25.degree. C. to about 45.degree.
C., during the doping process.
[0012] In some embodiments, the dopant may be boron, phosphorous,
arsenic, antimony, nitrogen, oxygen, hydrogen, carbon, germanium,
or combinations thereof. The final concentration of the dopant may
be within a range from about 1.times.10.sup.14 cm.sup.-2 to about
1.times.10.sup.18 cm.sup.-2, preferably, from about
5.times.10.sup.15 cm.sup.-2 to about 1.times.10.sup.17 cm.sup.-2.
In one example, the dopant is boron and the doping process includes
exposing the substrate to a boron precursor, such as
trifluoroborane, diborane, plasmas thereof, derivatives thereof, or
combinations thereof. In another example, the dopant is phosphorous
and the doping process includes exposing the substrate to a
phosphorous precursor, such as trifluorophosphine, phosphine,
plasmas thereof, derivatives thereof, or combinations thereof. In
another example, the dopant is arsenic and the doping process
includes exposing the substrate to an arsenic precursor, such as
arsine, plasmas thereof, or derivatives thereof.
[0013] In another embodiment, a method for detecting a doping
concentration on a substrate surface during a plasma doping process
is provided which includes positioning a substrate within a process
chamber, wherein the substrate has a topside and a backside and is
at a temperature of less than about 250.degree. C., generating a
plasma above the substrate within the process chamber, transmitting
a light through the substrate, wherein the light enters the
backside and exits the topside of the substrate and the light is
generated by a light source positioned below the substrate, and
receiving the light by a sensor positioned above the substrate. The
method further provides generating a signal proportional to the
light received by the sensor, implanting the substrate with a
dopant during a doping process, generating multiple light signals
proportional to a decreasing amount of the light received by the
sensor during the doping process, generating an end point signal
proportional to the light received by the sensor once the substrate
has a final concentration of the dopant, and ceasing the dopant
implantation of the substrate.
[0014] Embodiments provide that the light source may be a laser,
such as an infrared laser. The light may contain infrared light,
visible light, ultraviolet light, or combinations thereof. In one
example, the sensor may be disposed on or coupled to a showerhead
assembly (e.g., gas distribution assembly) within the process
chamber. The light source may be coupled to, within, or disposed on
a substrate support assembly. The substrate support assembly may
have an electrostatic chuck.
[0015] In a specific example, the sensor is disposed on or in a
showerhead assembly and the light source is positioned to direct
the light substantially towards the sensor. The light source may be
an optical cable coupled to a remote light source, such as a laser
source which emits a laser beam. In some embodiments, the magnitude
of the plasma light signal may be subtracted from the magnitude of
the light signal during a calibration step.
[0016] In another embodiment, a method for detecting a doping
concentration on a substrate surface during a plasma doping process
is provided which includes positioning a substrate within a process
chamber, wherein the substrate has a topside and a backside and is
at a temperature of less than about 250.degree. C., generating a
plasma above the substrate within the process chamber, and
transmitting a light through the substrate. The method further
provides receiving the light by a sensor, generating an initial
signal proportional to the light received by the sensor, implanting
the substrate with a dopant during a dopant process, modulating the
light received by the sensor proportional to an increasing dopant
concentration, generating an end point signal proportional to the
light received by the sensor once the substrate has a final
concentration of the dopant, and ceasing the dopant implantation of
the substrate.
[0017] In one example, the light is generated by the plasma, the
light received by the sensor is decreasing proportional to the
increasing dopant concentration, and the sensor is positioned below
the substrate. In another example, the light is generated by a
light source (e.g., laser source) positioned below the substrate,
the light received by the sensor is decreasing proportional to the
increasing dopant concentration, and the sensor is positioned below
the substrate. In another example, the light is generated by a
light source positioned above the substrate, the light received by
the sensor is increasing proportional to the increasing dopant
concentration, and the sensor is positioned above the
substrate.
[0018] In another embodiment, a method for detecting a doping
concentration on a substrate surface during a plasma doping process
is provided which includes positioning a substrate within a process
chamber, wherein the substrate has a topside and a backside and is
at a temperature of less than about 250.degree. C., generating a
plasma above the substrate within the process chamber, generating a
light by a light source positioned above the substrate,
transmitting the light from the light source to the topside of the
substrate, and reflecting the light from the topside towards a
sensor positioned above the substrate. The method further provides
generating a signal proportional to the light received by the
sensor, implanting the substrate with a dopant during a doping
process, generating multiple light signals proportional to an
increasing amount of the light received by the sensor during the
doping process, generating an end point signal proportional to the
light received by the sensor once the substrate has a final
concentration of the dopant, and ceasing the dopant implantation of
the substrate.
[0019] Embodiments provide that the light may be shined towards the
topside of the substrate at an angle within a range from about
45.degree. to about 90.degree. relative to a plane expanding across
the topside of the substrate. Preferably, the angle may be within a
range from about 75.degree. to about 90.degree., and more
preferably, substantially about 90.degree.. In one example, the
light source may be coupled to or within the showerhead assembly,
the sensor may be disposed on or coupled to the showerhead
assembly, and the light source may be positioned to reflect the
light off the substrate and towards the sensor.
[0020] In another embodiment, a method for detecting a doping
concentration on a substrate surface during a plasma doping process
is provided which includes positioning a substrate within a process
chamber, wherein the substrate has a topside and a backside and is
at a temperature of less than about 250.degree. C., generating a
plasma above the substrate within the process chamber, reflecting a
light from the topside of the substrate, and receiving the light by
a sensor. The method further provides generating an initial signal
proportional to the light received by the sensor, implanting the
substrate with a dopant during a dopant process, increasing the
light received by the sensor proportional to an increasing dopant
concentration, generating an end point signal proportional to the
light received by the sensor once the substrate has a final
concentration of the dopant, and ceasing the dopant implantation of
the substrate.
BRIEF DESCRIPTION OF THE DRAWINGS
[0021] So that the manner in which the above recited features of
the invention can be understood in detail, a more particular
description of the invention, briefly summarized above, may be had
by reference to embodiments, some of which are illustrated in the
appended drawings. It is to be noted, however, that the appended
drawings illustrate only typical embodiments of this invention and
are therefore not to be considered limiting of its scope, for the
invention may admit to other equally effective embodiments.
[0022] FIG. 1 schematically illustrates an isometric
cross-sectional view of a plasma chamber in accordance with one
embodiment of the invention;
[0023] FIG. 2 schematically illustrates an isometric top view of
the plasma chamber of FIG. 1;
[0024] FIG. 3 illustrates a flowchart depicting a process for
detecting an end point at a final dopant concentration during a
plasma doping process, as described in embodiments herein;
[0025] FIG. 4 illustrates a flowchart depicting another process for
detecting an end point at a final dopant concentration during a
plasma doping process, as described in an embodiment herein;
[0026] FIG. 5 is a simplified diagram illustrating how a dopant
concentration in a substrate is controlled in real time with an
optical sensor provided in the plasma chamber shown in FIG. 1;
[0027] FIG. 6 illustrates a flowchart depicting another process for
detecting an end point at a final dopant concentration during a
plasma doping process, as described in another embodiment
herein;
[0028] FIG. 7 illustrates an alternate embodiment that uses an
optical sensor to detect an end point of a plasma ion implantation
process;
[0029] FIG. 8 illustrates a flowchart depicting another process for
detecting an end point at a final dopant concentration during a
plasma doping process, as described in another embodiment herein;
and
[0030] FIGS. 9A-9B illustrate other alternate embodiments that use
an optical sensor to detect an end point of a plasma ion
implantation process.
DETAILED DESCRIPTION
[0031] Embodiments of the invention provide methods and apparatuses
for measuring a doping concentration in a plasma ion implantation
system using an optical sensor. An end point of the plasma ion
implantation can be thereby controlled in an effective manner.
[0032] FIG. 1 schematically illustrates an isometric
cross-sectional view of a plasma chamber 100 in accordance with one
embodiment of the invention. Plasma chamber 100 may be configured
for a plasma-enhanced chemical vapor deposition (PE-CVD) process, a
high density plasma chemical vapor deposition (HDP-CVD) process, a
plasma-enhanced atomic layer deposition (PE-ALD) process, an ion
implantation process, an etch process, and other plasma
processes.
[0033] Plasma chamber 100 contains a toroidal plasma source 101
coupled to body 103 of plasma chamber 100. Body 103 contains
sidewalls 105 coupled to lid 106 and bottom 108, which bounds
interior volume 110. Other examples of plasma chamber 100 may be
found in U.S. Pat. Nos. 6,893,907 and 6,939,434, which are
incorporated by reference herein in their entireties.
[0034] Interior volume 110 includes processing region 125 formed
between gas distribution assembly 121 (e.g., showerhead assembly)
and substrate support assembly 123. Pumping region 128 surrounds a
portion of substrate support assembly 123. Pumping region 128 is in
selective communication with vacuum pump 124 through valve 126
disposed in port 127 formed in bottom 108. In one embodiment, valve
126 is a throttle valve adapted to control the flow of gas or vapor
from interior volume 110 and through port 127 to vacuum pump 124.
In one embodiment, valve 126 operates without the use of o-rings,
and is further described in U.S. Ser. No. 11/115,956, filed Apr.
26, 2005, and issued as U.S. Pat. No. 7,428,915, which is
incorporated by reference in its entirety.
[0035] Toroidal plasma source 101 is disposed on lid 106 of body
103. In one embodiment, toroidal plasma source 101 has first
conduit 150A having a general "U" shape and second conduit 150B
having a general "M" shape. First conduit 150A and second conduit
150B each include at least one antenna 170A and 170B, respectively.
Antennas 170A and 170B are configured to form an inductively
coupled plasma within interior region 155A, 155B of each of
conduits 150A/150B, respectively. As shown in FIG. 2, each antenna
170A/170B may be a winding or a coil coupled to a power source,
such as RF plasma power source 171A/172A. An RF impedance matching
systems 171B/172B may also be coupled to each antenna 170A/170B.
Process gases, such as helium, argon, and other gases, may be
provided to interior region 155A, 155B of each of the conduits
150A, 150B, respectively. In one embodiment, the process gases may
contain a dopant precursor gases that is supplied to interior
regions 155A/155B of each conduit 150A/150B. In one embodiment, the
process gases may be delivered to toroidal plasma source 101 from
gas panel 130B. In another embodiment, the process gases may be
delivered through gas distribution assembly 121 from gas panel 130A
connected to port 130 formed in body 103 of plasma chamber 100.
[0036] In one embodiment, each opposing end of the conduits
150A/150B is coupled to one of four respective ports which include
ports 131A-131B (only ports 131A and 131B are shown in this view
for conduit 150B) formed in lid 106 of plasma chamber 100. During
processing, a process gas is supplied to the interior region
155A/155B of each of conduits 150A/150B, and RF power is applied to
each antenna 170A/170B, to generate a circulating plasma path that
travels through the four ports (e.g., ports 131A-131B for conduit
150B and 2 ports for conduit 150A) and processing region 125.
Specifically, in FIG. 1, the circulating plasma path travels
through port 131A to port 131B, or vice versa, through processing
region 125 between gas distribution assembly 121 and substrate
support assembly 123. Each conduit 150A/150B has a plasma
channeling 140 coupled between respective ends of conduit 150A/150B
and two of the four respective ports which include ports 131A-131B
for conduit 150B and 2 other ports for conduit 150A. In one
embodiment, plasma channel 140 is configured to split and widen the
plasma path formed within each of the conduits 150A/150B.
[0037] Gas distribution assembly 121 has annular wall 122 and
perforated plate 132. Annular wall 122, perforated plate 132 and
lid 106 define plenum 230. Perforated plate 132 includes a
plurality of openings 133 formed therethrough in a symmetrical or
non-symmetrical pattern or patterns. In one embodiment, the dopant
precursor gases may be delivered to processing region 125 from gas
distribution assembly 121 connected to gas panel 130A. The process
gases, such as the dopant precursor gases, may be provided to
plenum 230 from port 130. Generally, the dopant precursor gas
contains a dopant precursor of the desired dopant element, such as
boron (a p-type conductivity impurity in silicon) or phosphorus (an
n-type conductivity impurity in silicon). Fluorides and/or hydrides
of boron, phosphorous or other dopant elements, such as arsenic,
antimony, may be used as a dopant precursor gas. For example, the
dopant precursor gas may contain boron trifluoride (BF.sub.3) or
diborane (B.sub.2H.sub.6) while implanting a boron dopant. The
gases may flow through openings 133 and into processing region 125
below perforated plate 132. In one embodiment, perforated plate 132
is RF biased to help generate and/or maintain a plasma in
processing region 125.
[0038] Substrate support assembly 123 has upper plate 142 and
cathode assembly 144. Upper plate 142 has a smooth substrate
supporting surface 143 configured to support a substrate thereon.
Upper plate 142 has an embedded electrode 145 which is connected to
a DC power source 146 to facilitate electrostatic attraction
between a substrate and substrate supporting surface 143 of upper
plate 142 during process. In one embodiment, embedded electrode 145
may also be used as an electrode for providing capacitive RF energy
to processing region 125. Embedded electrode 145 may be coupled to
a RF plasma bias power 147A via an RF impedance matching circuit
147B.
[0039] Substrate support assembly 123 may also include lift pin
assembly 160 that contains a plurality of lift pins 162 configured
to transfer one or more substrates by selectively lifting and
supporting a substrate above upper plate 142 and are spaced to
allow a robot blade to position therebetween.
[0040] FIG. 2 schematically illustrates an isometric top view of
plasma chamber 100 shown in FIG. 1. Sidewall 105 of plasma chamber
100 has substrate port 107 that may be selectively sealed by a slit
valve (not shown). Process gases are supplied to gas distribution
assembly 121 by gas panel 130A coupled to port 130. One or more
process gases may be supplied to each of the conduits 150A/150B
through gas panel 130B.
[0041] Referring to FIG. 1 again, plasma chamber 100 further
contains controller 170 configured to monitor and control processes
performed in plasma chamber 100. Controller 170 may be connected
with one or more sensors and configured to sampling, analyzing and
storing sensor data. In one embodiment, controller 170 may have the
capacity to perform control tasks for different processes.
Controller 170 may be connected to operating parts of plasma
chamber 100 and send control signals to the operating parts.
Controller 170 may perform a closed loop control task by adjusting
process parameters according to sensor data to achieve desired
process result. In one embodiment of the invention, controller 170
may be configured to perform dosage control of one or more species,
end point detection, and other control tasks.
[0042] In one embodiment, optical sensor 730 is installed
underneath substrate supporting surface 143, and is coupled to
controller 170. Optical sensor 730 is adapted to detect light at a
predetermined wavelength or frequency, which is emitted from the
plasma generated in processing region 125. The emitted light may
contain infrared light, visible light, ultraviolet light, or
combinations thereof. In one embodiment, optical sensor 730 is
configured to detect infrared light. When a substrate is processed
in processing region 125, the emitted light is transmitted through
the substrate placed on substrate supporting surface 143 before
reaching optical sensor 730. When the dopant concentration in the
substrate is low, light emitted from the plasma substantially
transmits through the substrate to reach the underlying optical
sensor 730. As the dopant concentration in the top surface of the
substrate increases, the top surface of the substrate becomes
opaque, causing less light to reach optical sensor 730. Based on
the relationship between the dopant concentration in the substrate
and the detected amount of light transmitted through the substrate,
controller 170 is thus operable to determine a target dopant
concentration of the substrate. Subsequently, the ion implantation
process may be terminated.
[0043] FIG. 3 depicts a flowchart illustrating the steps of process
300 which may be used to detect an end point of a plasma ion
implantation process, as described in embodiments herein. The
illustrated method may be applicable to any of the embodiments
shown in FIGS. 4-9B.
[0044] In step 302, substrate 702 to process is placed in the
processing region 25 between perforated plate 132 and substrate
supporting assembly 123. In step 304, optical sensor 730 and
controller 170 are calibrated before starting the ion implantation
process. In one embodiment, the calibration may be performed by
generating radiation incident on substrate 702, detecting an amount
of radiation received by optical sensor 730, and then associating a
dopant concentration reference with the detected amount of
radiation. In step 306, a plasma ion implantation then is performed
to implant a dopant in substrate 702. In step 308, while the ion
implantation is being conducted, controller 170 derives a current
dopant concentration of the implanted dopant in substrate 702 based
on an amount of radiation received by optical sensor 730. The
radiation detected by optical sensor 730 may contain radiation
transmitted through substrate 702 or reflected from substrate 702.
In step 310, when the dopant concentration reaches the desired or
final concentration, controller 170 outputs a control signal to
stop the plasma ion implantation process.
[0045] FIG. 4 illustrates a flowchart depicting process 400 that
may be used to detect an end point at a final dopant concentration
during a plasma doping process, as described in embodiments herein.
In step 402, a substrate may be positioned within a process
chamber, wherein the substrate has a topside and a backside. During
the doping process at step 404, the substrate may be maintained,
either by heating or cooling, at a temperature of less than about
250.degree. C., preferably, within a range from about 0.degree. C.
to about 90.degree. C., and more preferably, from about 25.degree.
C. to about 45.degree. C. In step 406, a plasma is generated above
the substrate within the process chamber. The light generated by
the plasma is transmitted through the substrate during step 408.
The light may contain infrared light, visible light, ultraviolet
light, or combinations thereof. In one example, the light contains
infrared light. The light enters the topside and exits the backside
of the substrate. Thereafter, the light may be received by a sensor
positioned below the substrate during step 410.
[0046] Process 400 further provides step 412 for generating a
signal proportional to the light received by the sensor. Process
400 may be performed in a plasma chamber as configured in FIG. 5.
Usually, the method includes generating multiple signals
proportional to an increasing concentration of the dopant. During
step 414, the substrate is implanted with a dopant during a doping
process. Multiple light signals proportional to a decreasing amount
of the light received by the sensor are generated at step 416
during the doping process. An end point signal proportional to the
light received by the sensor once the substrate has a final
concentration of the dopant is generated at step 418. Subsequently,
the doping process is ceased at step 420 once the substrate
contains the desired final, dopant concentration.
[0047] The substrate may be doped with a dopant, such as boron,
phosphorous, arsenic, antimony, nitrogen, oxygen, hydrogen, carbon,
germanium, or combinations thereof. The final dopant concentration
of the substrate may be within a range from about 1.times.10.sup.14
cm.sup.-2 to about 1.times.10.sup.18 cm.sup.-2, preferably, from
about 5.times.10.sup.15 cm.sup.-2 to about 1.times.10.sup.17
cm.sup.-2. In one example, the dopant is boron and the doping
process includes exposing the substrate to a boron precursor, such
as trifluoroborane, diborane, plasmas thereof, derivatives thereof,
or combinations thereof. In another example, the dopant is
phosphorous and the doping process includes exposing the substrate
to a phosphorous precursor, such as trifluorophosphine, phosphine,
plasmas thereof, derivatives thereof, or combinations thereof. In
another example, the dopant is arsenic and the doping process
includes exposing the substrate to an arsenic precursor, such as
arsine, plasmas thereof, or derivatives thereof.
[0048] FIG. 5 depicts an apparatus for determining an end point of
a doping process while measuring dopant concentrations. The
apparatus containing optical sensor 730 may be incorporated within
plasma chamber 100 of FIG. 1, as well as used to perform process
400. Substrate 702 is exposed to a plasma 704 generated between
perforated plate 132 and substrate support assembly 123. As
illustrated, the perforated plate 121 may be grounded, and
substrate supporting assembly 123 may be coupled to the RF plasma
bias power 147A via RF impedance matching circuit 147B. Plasma 704
is generated by an RF power supplied by the RF plasma bias power
147A. Optical sensor 730 coupled to controller 170 is located below
substrate 702.
[0049] Substrate 702 may be processed at a temperature of less than
about 250.degree. C., preferably, less than about 100.degree. C.,
more specifically within a range from about 0.degree. C. to about
90.degree. C., preferably, from about 25.degree. C. to about
45.degree. C. As substrate 702 is processed in the plasma
environment, radiation 706 emitted from plasma 704 transmit through
substrate 702 and strike on optical sensor 730. In one embodiment,
substrate 702 is transparent to radiation in a temperature
environment less than about 250.degree. C. In response to the
detected radiation, optical sensor 730 issues a corresponding
measure signal that is proportional to the detected amount of
radiation to controller 170.
[0050] During operation, ion impurities may also be fed to dope
substrate 702. Examples of used dopants that may contain, without
limitation, boron, phosphorous, arsenic, antimony, nitrogen,
oxygen, hydrogen, carbon, germanium, and combinations thereof. In
the illustrated embodiment, boron dopants may be exemplary
implanted in substrate 702 during a plasma implantation that uses
diborane (B.sub.2H.sub.6) as the plasma precursor. The plasma thus
may include boron ion species incident on the top surface of
substrate 702. To control the dose of boron dopants implanted in
substrate 702, controller 170 derives a dopant concentration of the
implanted boron dopants based on the measure signal provided by
optical sensor 730. While the ion implantation proceeds, the dopant
concentration of boron dopants in substrate 702, which is derived
by controller 170 in real time, increases as less radiation are
transmitted through substrate 702. When the desired or final dopant
concentration is reached, controller 170 outputs a control signal
to stop the supply of the plasma precursor, which thereby
terminates the ion implantation process. In one embodiment, the
target dopant concentration is within a range from about
1.times.10.sup.14 cm.sup.-2 to about 1.times.10.sup.18 cm.sup.-2,
and more preferably from about 5.times.10.sup.15 cm.sup.-2 to about
1.times.10.sup.17 cm.sup.-2.
[0051] As has been described above, a detected amount of radiation
transmitted through the substrate is thus used to derive a dopant
concentration in the substrate. However, in certain cases where the
target dopant concentration in the substrate is relatively higher,
the intensity of the radiation emitted from the plasma may not be
sufficient to pass through the substrate as it becomes more
opaque.
[0052] FIG. 6 illustrates a flowchart depicting process 600 that
may be used to detect an end point at a final dopant concentration
during a plasma doping process, as described in embodiments herein.
Process 600 may be performed in a plasma chamber as configured in
FIG. 7. In step 602, a substrate may be positioned within a process
chamber, wherein the substrate has a topside and a backside. During
step 604, the substrate may be maintained, either by heating or
cooling, at a temperature of less than about 250.degree. C.,
preferably, less than about 100.degree. C., more specifically
within a range from about 0.degree. C. to about 90.degree. C.,
preferably, from about 25.degree. C. to about 45.degree. C. In step
606, a plasma is generated above the substrate within the process
or plasma chamber.
[0053] A light generated by a light source (e.g., laser source) is
transmitted through the substrate during step 608. The light source
is positioned below the substrate and a sensor is positioned above
the substrate. Therefore, the light enters the backside and exits
the topside of the substrate. The light is received by the sensor
positioned above the substrate during step 610. The light may
contain infrared light, visible light, ultraviolet light, or
combinations thereof. In one example, the light contains infrared
light, such as from an infrared laser.
[0054] In some examples, the sensor may be disposed on or coupled
to a showerhead assembly (e.g., gas distribution assembly) within
the process chamber. Also, the light source may be coupled to,
within, or disposed on a substrate support assembly. In one
example, the substrate support assembly may be an electrostatic
chuck.
[0055] In a specific example, the sensor is disposed on or in a
showerhead assembly and the light source is positioned to direct
the light substantially towards the sensor. The light source may be
an optical cable coupled to a remote light source, such as a laser
source which emits a laser beam. In an alternative embodiment, a
plasma light signal derived from light emitted from the plasma and
is generated by the sensor. The magnitude of the plasma light
signal may be subtracted from the magnitude of the light signal
during a calibration step.
[0056] Process 600 further provides step 612 for generating a
signal proportional to the light received by the sensor. Usually,
the method includes generating multiple signals proportional to an
increasing concentration of the dopant. During step 614, the
substrate is implanted with a dopant during a doping process.
Multiple light signals proportional to a decreasing amount of the
light received by the sensor are generated at step 616 during the
doping process. An end point signal proportional to the light
received by the sensor once the substrate has a final dopant
concentration of the substrate is generated at step 618.
Subsequently, the doping process is ceased at step 620 once the
substrate contains the desired dopant concentration.
[0057] The substrate may be doped with a dopant, such as boron,
phosphorous, arsenic, antimony, nitrogen, oxygen, hydrogen, carbon,
germanium, or combinations thereof. The final dopant concentration
of the substrate may be within a range from about 1.times.10.sup.14
cm.sup.-2 to about 1.times.10.sup.18 cm.sup.-2, preferably, from
about 5.times.10.sup.15 cm.sup.-2 to about 1.times.10.sup.17
cm.sup.-2. In one example, the dopant is boron and the doping
process includes exposing the substrate to trifluoroborane,
diborane, plasmas thereof, derivatives thereof, or combinations
thereof. In another example, the dopant is phosphorous and the
doping process includes exposing the substrate to
trifluorophosphine, phosphine, plasmas thereof, derivatives
thereof, or combinations thereof. In another example, the dopant is
arsenic and the doping process includes exposing the substrate to
arsine, plasmas thereof, or derivatives thereof.
[0058] FIG. 7 depicts an apparatus for determining an end point of
a doping process while measuring dopant concentrations, which may
be incorporated within plasma chamber 100 of FIG. 1, as well as
used to perform process 600. The apparatus contains a light source
720, such as a laser source, that is connected to optical cable
722. Optical cable 722 may be guided through substrate support
assembly 123. Optical sensor 730 is arranged above the top surface
of substrate supporting assembly 123, facing the position of
optical cable 722. In one embodiment, optical sensor 730 may be
embedded in perforated plate 132.
[0059] In operation, optical cable 722 emits a light beam 724, such
as a laser beam, from cable end 723 onto the backside of substrate
702. Light beam 724 may contain infrared light, visible light,
ultraviolet light, or combinations thereof. The emitted light beam
724 transmits through substrate 702, and then strikes on optical
sensor 730. During an ion implantation process, a transmitted
portion 725 of the light beam 724 received by optical sensor 730
progressively decreases because substrate 702 becomes less
transparent owing to an increase in the amount of dopants therein.
Based on the amount of transmitted laser radiation received by
optical sensor 730, controller 170 thus is able to derive the
actual dopant concentration in substrate 702. When the target
dopant concentration in substrate 702 is reached, controller 170
can output a control signal to terminate the ion implantation
process.
[0060] FIG. 8 illustrates a flowchart depicting process 800 that
may be used to detect an end point at a final dopant concentration
during a plasma doping process, as described in embodiments herein.
Process 800 may be performed in a plasma chamber as configured in
FIGS. 9A-9B. In step 802, a substrate may be positioned within a
process chamber, wherein the substrate has a topside and a
backside. During step 804, the substrate may be maintained, either
by heating or cooling, at a temperature of less than about
250.degree. C., preferably, less than about 100.degree. C., more
specifically within a range from about 0.degree. C. to about
90.degree. C., preferably, from about 25.degree. C. to about
45.degree. C. In step 806, a plasma is generated above the
substrate within the process chamber.
[0061] A light generated by a light source (e.g., laser source)
positioned above the substrate is transmitted to the topside of the
substrate and reflected therefrom during step 808. The reflected
light is received by a sensor positioned above the substrate during
step 810. The light may contain infrared light, visible light,
ultraviolet light, or combinations thereof. In one example, the
light contains infrared light, such as from an infrared laser.
[0062] Embodiments provide that the light may be shined towards the
topside of the substrate at an angle within a range from about
45.degree. to about 90.degree. relative to a plane expanding across
the topside of the substrate. Preferably, the angle may be within a
range from about 75.degree. to about 90.degree., and more
preferably, substantially about 90.degree.. The light source may be
coupled to or within the showerhead assembly, the sensor may be
disposed on or coupled to the showerhead assembly, and the light
source may be positioned to reflect the light off the substrate and
towards the sensor.
[0063] The light source may be an optical cable coupled to a remote
light source, such as a laser source which emits a laser beam. In
one example, the substrate support assembly may be an electrostatic
chuck. In other embodiments, the magnitude of the plasma light
signal may be subtracted from the magnitude of the light signal
during a calibration step.
[0064] Process 800 further provides step 812 for generating a
signal proportional to the light received by the sensor. Usually,
the method includes generating multiple signals proportional to an
increasing concentration of the dopant. During step 814, the
substrate is implanted with a dopant during a doping process.
Multiple light signals proportional to an increasing amount of the
light received by the sensor are generated at step 816 during the
doping process. An end point signal proportional to the light
received by the sensor once the substrate has a final dopant
concentration of the substrate is generated at step 818.
Subsequently, the doping process is ceased at step 820 once the
substrate contains the desired dopant concentration.
[0065] The substrate may be doped with a dopant, such as boron,
phosphorous, arsenic, antimony, nitrogen, oxygen, hydrogen, carbon,
germanium, or combinations thereof. The final dopant concentration
of the substrate may be within a range from about 1.times.10.sup.14
cm.sup.-2 to about 1.times.10.sup.18 cm.sup.-2, preferably, from
about 5.times.10.sup.15 cm.sup.-2 to about 1.times.10.sup.17
cm.sup.-2. In one example, the dopant is boron and the doping
process includes exposing the substrate to trifluoroborane,
diborane, plasmas thereof, derivatives thereof, or combinations
thereof. In another example, the dopant is phosphorous and the
doping process includes exposing the substrate to
trifluorophosphine, phosphine, plasmas thereof, derivatives
thereof, or combinations thereof. In another example, the dopant is
arsenic and the doping process includes exposing the substrate to
arsine, plasmas thereof, or derivatives thereof.
[0066] In another embodiment, FIG. 9A-9B depict an apparatus for
determining an end point of a doping process while measuring dopant
concentrations on the top surface of a substrate, which may be
incorporated within plasma chamber 100 of FIG. 1, as well as used
to perform process 800. As shown in FIGS. 9A-9B, light source 720
is placed approximately above the top surface of substrate
supporting assembly 123, on the same side of the substrate as
optical sensor 730. Substrate 702 is exposed to plasma 704
generated between perforated plate 132 and substrate support
assembly 123.
[0067] In one embodiment, light source 720 is configured to emit an
incident light beam 726, such as a laser beam, that is almost
perpendicular to the normal of the top surface of substrate 702.
Light beam 726 shines onto and reflects from the top surface of
substrate 702 before it reaches optical sensor 730. When dopants
are implanted in substrate 702, a reflected portion 728 of the
incident light beam 726 received by optical sensor 730 is modulated
by the progressively increasing dopant concentration within
substrate 702. Based on the reflected portion 728 detected by
optical sensor 730, controller 170 thus is able to derive the
actual dopant concentration in substrate 702. When the desired,
final dopant concentration in substrate 702 is reached, controller
170 outputs a control signal to terminate the ion implantation
process. Light beam 726 may contain infrared light, visible light,
ultraviolet light, or combinations thereof.
[0068] FIG. 9A illustrates light source 720 and optical sensor 730
both positioned above substrate 702. Light source 720 and optical
sensor 730 may independently be coupled to or fixed on the chamber
sidewalls, the chamber lid, the gas distribution assembly, such as
perforated plate 132, or on another inner surface of the plasma
chamber (not shown). FIG. 9B also depicts light source 720 and
optical sensor 730 both positioned above substrate 702. In one
embodiment, light source 720 may be a remote source of light, such
as a laser source, that is connected to optical cable 722. Optical
cable 722 may be guided through perforated plate 132. In operation,
optical cable 722 emits light beam 726, such as a laser beam, from
cable end 721 of optical cable 722.
[0069] It is understood that the methods and mechanisms described
herein may be generally applicable to measure in real time the
concentration of dopants being implanted into a substrate. This may
be achieved by associating a specific level of infrared radiation
with one particular type of dopant during calibration. Thus, the
method and apparatus of the invention may be used to monitor and
control dosage of a variety of dopants, such as arsenic,
phosphorus, hydrogen, oxygen, fluorine, silicon, and other species
used in a plasma process.
[0070] In another embodiment, a method for detecting a dopant
concentration on a substrate surface during a plasma doping process
is provided which includes positioning a substrate within a process
chamber, wherein the substrate has a topside and a backside and is
at a temperature of less than about 250.degree. C., generating a
plasma above the substrate within the process chamber, and
transmitting a light through the substrate. The method further
provides receiving the light by a sensor, generating an initial
signal proportional to the light received by the sensor, implanting
the substrate with a dopant during a dopant process, modulating the
light received by the sensor proportional to an increasing dopant
concentration, generating an end point signal proportional to the
light received by the sensor once the substrate has a final dopant
concentration of the substrate, and ceasing the implantation of the
substrate by the dopant.
[0071] In one example, the light is generated by the plasma, the
light received by the sensor is decreasing proportional to the
increasing dopant concentration, and the sensor is positioned below
the substrate. In another example, the light is generated by a
light source (e.g., laser source) positioned below the substrate,
the light received by the sensor is decreasing proportional to the
increasing dopant concentration, and the sensor is positioned below
the substrate. In another example, the light is generated by a
light source positioned above the substrate, the light received by
the sensor is increasing proportional to the increasing dopant
concentration, and the sensor is positioned above the
substrate.
[0072] In another embodiment, a method for detecting a dopant
concentration on a substrate surface during a plasma doping process
is provided which includes positioning a substrate within a process
chamber, wherein the substrate has a topside and a backside and is
at a temperature of less than about 250.degree. C., generating a
plasma above the substrate within the process chamber, reflecting a
light from the topside of the substrate, and receiving the light by
a sensor. The method further provides generating an initial signal
proportional to the light received by the sensor, implanting the
substrate with a dopant during a dopant process, increasing the
light received by the sensor proportional to an increasing dopant
concentration generating an end point signal proportional to the
light received by the sensor once the substrate has a final dopant
concentration of the substrate, and ceasing the implantation of the
substrate by the dopant.
[0073] In another embodiment, the multiple optical sensors disposed
below the substrate, such as within a substrate support assembly,
optical sensors may be adapted to monitor the uniformity of the
dopant concentration across the substrate surface.
[0074] While the foregoing is directed to embodiments of the
invention, other and further embodiments of the invention may be
devised without departing from the basic scope thereof, and the
scope thereof is determined by the claims that follow.
* * * * *